KR840001228A - 높은 투자율, 낮은 항자율, 낮은 ac 코어손실 낮은 여자력 및 높은 열안정성을 갖는 금속 유리 - Google Patents
높은 투자율, 낮은 항자율, 낮은 ac 코어손실 낮은 여자력 및 높은 열안정성을 갖는 금속 유리 Download PDFInfo
- Publication number
- KR840001228A KR840001228A KR1019820003736A KR820003736A KR840001228A KR 840001228 A KR840001228 A KR 840001228A KR 1019820003736 A KR1019820003736 A KR 1019820003736A KR 820003736 A KR820003736 A KR 820003736A KR 840001228 A KR840001228 A KR 840001228A
- Authority
- KR
- South Korea
- Prior art keywords
- atomic percent
- low
- particles
- nickel
- cobalt
- Prior art date
Links
- 239000005300 metallic glass Substances 0.000 title claims 3
- 230000005284 excitation Effects 0.000 title claims 2
- 230000035699 permeability Effects 0.000 title claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 11
- 239000002245 particle Substances 0.000 claims 11
- 229910052751 metal Inorganic materials 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 7
- 239000011521 glass Substances 0.000 claims 6
- 229910052759 nickel Inorganic materials 0.000 claims 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 5
- 229910052796 boron Inorganic materials 0.000 claims 5
- 229910052804 chromium Inorganic materials 0.000 claims 5
- 239000011651 chromium Substances 0.000 claims 5
- 229910017052 cobalt Inorganic materials 0.000 claims 5
- 239000010941 cobalt Substances 0.000 claims 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 5
- 229910052742 iron Inorganic materials 0.000 claims 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 229910052735 hafnium Inorganic materials 0.000 claims 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 4
- 229910052750 molybdenum Inorganic materials 0.000 claims 4
- 239000011733 molybdenum Substances 0.000 claims 4
- 229910052758 niobium Inorganic materials 0.000 claims 4
- 239000010955 niobium Substances 0.000 claims 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- 229910052715 tantalum Inorganic materials 0.000 claims 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 4
- 239000010936 titanium Substances 0.000 claims 4
- 229910052719 titanium Inorganic materials 0.000 claims 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 4
- 229910052721 tungsten Inorganic materials 0.000 claims 4
- 239000010937 tungsten Substances 0.000 claims 4
- 229910052720 vanadium Inorganic materials 0.000 claims 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 4
- 229910052726 zirconium Inorganic materials 0.000 claims 4
- 239000000956 alloy Substances 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000000137 annealing Methods 0.000 claims 1
- 230000004907 flux Effects 0.000 claims 1
- 230000005389 magnetism Effects 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 238000001556 precipitation Methods 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Soft Magnetic Materials (AREA)
- Adornments (AREA)
- Powder Metallurgy (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (10)
- 약 66-82 원자퍼센트의 철 : 약 1-8원자퍼센트의 닉켈 및 또는 코발트 : 약 1-6원자퍼센트의 크롬, 몰리브덴, 텅스텐, 바나듐, 니오븀, 탄탈, 티타늄, 지르코늄 또는 하프늄 : 약 17-28원자퍼센트의 붕소 약 0.5-6원자퍼센트의 실리콘 : 및 또는 약 2원자퍼센트 이하의 탄소로 구성되며, 높은 투자율, 낮은 항자율, 낮은 자기변형, 낮은 AC 코어속실, 낮은 여자력 및 높은 열안정성을 갖는, 근본적으로 유리질인 금속유리.
- 금속성분이 근본적으로 62-79원자퍼센트 : 2-8원자퍼센트의 닉켈 및/또는 코발트 및 2-4원자퍼센트의 크롬, 몰리브덴, 텅스텐, 바나듐, 니오븀, 탄탈, 티타늄, 지르코늄 및 또는 하프늄으로 구성된 주장 1의 금속유리.
- 비금속원소 성분이 근본적으로 붕소, 0.5-4원자퍼센트의 실리콘 및 0-2원자퍼센트의 탄소로 구성되는, 주장 1의 금속유리.
- 비금속원소 함량이 17-26원자퍼센트인 주장 1의 금속유리.
- 약 70-79원자퍼센트의 철 : 2-4원자퍼센트의 닉켈 및 또는 코발트 : 2-4원자퍼센트의 볼리브덴 또는 크롬 : 및 17-22원자퍼센트의 붕소 및 또는 실리콘으로 구성된 주장 1의 금속유리.
- 평균 크기가 0.1-0.3㎛이고 평균 입자간격은 약 1-1O㎛인 불연속성 입자들의 존재에 의하여 특징지어지는 최소한 85%가 무정형인 주장 1의 금속유리.
- 불연속성 입자들이 약 0.005-0.01의 평균 볼륨 후랙션(volume fraction)을 갖는 주장 6의 금속유리.
- 무정형 금속 매트릭스내에서 불연속성 입자들의 침전을 유도하기에 충분한 온도와 시간하에서 합금을 어닐링하여 주장 1의 합금의 자성을 향상시키는 방법.
- 불연속성 입자들이 bcc 구조를 갖는 입자들을 포함한 입자혼합물로 구성되며, 입자들은 근본적으로 철 및 22원자퍼센트까지의 닉켈, 코발트, 크롬, 몰리브덴, 텅스텐, 바나듐, 니오븀, 탄탈, 티타늄, 지르코늄, 하프늄, 실리콘 및 또는 탄소로 구성된 주장 8에 따른 방법.
- 불연속성 입자들이 결정성 Fe3B 구조를 갖는 입자들을 포함한 입자혼합물로 구성되며, 입자들은 근본적으로 철 및 붕소로 구성되되 14원자퍼센트까지의 철이 닉켈, 코발트, 크롬, 몰리브덴, 텅스텐, 바나듐, 니오븀, 탄탈, 티타늄, 지르코늄 및 하프늄으로 대치되고 또한 2원자퍼센트까지의 붕소가 탄소로 대치될 수 있는 주장에 따른 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29516581A | 1981-08-21 | 1981-08-21 | |
| US295,165 | 1981-08-21 | ||
| US31951481A | 1981-11-09 | 1981-11-09 | |
| US319,514 | 1981-11-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR840001228A true KR840001228A (ko) | 1984-03-28 |
| KR870001283B1 KR870001283B1 (ko) | 1987-06-30 |
Family
ID=26968961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR8203736A KR870001283B1 (ko) | 1981-08-21 | 1982-08-19 | 자성을 갖는 비정질 금속합금 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0072893B1 (ko) |
| JP (1) | JPH0639663B2 (ko) |
| KR (1) | KR870001283B1 (ko) |
| AU (1) | AU557318B2 (ko) |
| CA (1) | CA1222646A (ko) |
| DE (1) | DE3274562D1 (ko) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4588452A (en) * | 1983-03-16 | 1986-05-13 | Allied Corporation | Amorphous alloys for electromagnetic devices |
| AU573895B2 (en) * | 1984-09-17 | 1988-06-23 | Ovonic Synthetic Materials Company, Inc. | Hard magnetic material |
| US4881989A (en) * | 1986-12-15 | 1989-11-21 | Hitachi Metals, Ltd. | Fe-base soft magnetic alloy and method of producing same |
| JP3279399B2 (ja) * | 1992-09-14 | 2002-04-30 | アルプス電気株式会社 | Ｆｅ基軟磁性合金の製造方法 |
| JP3231149B2 (ja) * | 1993-07-30 | 2001-11-19 | アルプス電気株式会社 | ノイズフィルタ |
| US5628840A (en) * | 1995-04-13 | 1997-05-13 | Alliedsignal Inc. | Metallic glass alloys for mechanically resonant marker surveillance systems |
| US6093261A (en) * | 1995-04-13 | 2000-07-25 | Alliedsignals Inc. | Metallic glass alloys for mechanically resonant marker surveillance systems |
| US6187112B1 (en) | 1995-04-13 | 2001-02-13 | Ryusuke Hasegawa | Metallic glass alloys for mechanically resonant marker surveillance systems |
| JP4636365B2 (ja) * | 2004-07-05 | 2011-02-23 | 日立金属株式会社 | Ｆｅ基非晶質合金薄帯および磁心体 |
| US8704134B2 (en) | 2005-02-11 | 2014-04-22 | The Nanosteel Company, Inc. | High hardness/high wear resistant iron based weld overlay materials |
| US7935198B2 (en) | 2005-02-11 | 2011-05-03 | The Nanosteel Company, Inc. | Glass stability, glass forming ability, and microstructural refinement |
| US7553382B2 (en) * | 2005-02-11 | 2009-06-30 | The Nanosteel Company, Inc. | Glass stability, glass forming ability, and microstructural refinement |
| KR100904664B1 (ko) * | 2008-06-03 | 2009-06-25 | 주식회사 에이엠오 | 전류 센서용 자기 코어 |
| CN102099503B (zh) * | 2008-06-16 | 2013-07-03 | 纳米钢公司 | 延性金属玻璃 |
| WO2012010941A1 (fr) | 2010-07-21 | 2012-01-26 | Rolex S.A. | Composant horloger comprenant un alliage métallique amorphe |
| EP2596141B1 (fr) | 2010-07-21 | 2014-11-12 | Rolex Sa | Alliage métallique amorphe |
| US11198927B1 (en) * | 2019-09-26 | 2021-12-14 | United States Of America As Represented By The Secretary Of The Air Force | Niobium alloys for high temperature, structural applications |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052201A (en) * | 1975-06-26 | 1977-10-04 | Allied Chemical Corporation | Amorphous alloys with improved resistance to embrittlement upon heat treatment |
| US4152146A (en) * | 1976-12-29 | 1979-05-01 | Allied Chemical Corporation | Glass-forming alloys with improved filament strength |
| US4152144A (en) * | 1976-12-29 | 1979-05-01 | Allied Chemical Corporation | Metallic glasses having a combination of high permeability, low magnetostriction, low ac core loss and high thermal stability |
| US4188211A (en) * | 1977-02-18 | 1980-02-12 | Tdk Electronics Company, Limited | Thermally stable amorphous magnetic alloy |
| US4225339A (en) * | 1977-12-28 | 1980-09-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Amorphous alloy of high magnetic permeability |
| US4140525A (en) * | 1978-01-03 | 1979-02-20 | Allied Chemical Corporation | Ultra-high strength glassy alloys |
| US4219355A (en) * | 1979-05-25 | 1980-08-26 | Allied Chemical Corporation | Iron-metalloid amorphous alloys for electromagnetic devices |
| US4409041A (en) * | 1980-09-26 | 1983-10-11 | Allied Corporation | Amorphous alloys for electromagnetic devices |
-
1982
- 1982-05-24 DE DE8282104504T patent/DE3274562D1/de not_active Expired
- 1982-05-24 EP EP82104504A patent/EP0072893B1/en not_active Expired
- 1982-05-31 AU AU84338/82A patent/AU557318B2/en not_active Ceased
- 1982-07-12 CA CA000407099A patent/CA1222646A/en not_active Expired
- 1982-08-19 KR KR8203736A patent/KR870001283B1/ko active
-
1991
- 1991-03-11 JP JP3072435A patent/JPH0639663B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| AU557318B2 (en) | 1986-12-18 |
| DE3274562D1 (en) | 1987-01-15 |
| JPH0639663B2 (ja) | 1994-05-25 |
| JPH04314846A (ja) | 1992-11-06 |
| CA1222646A (en) | 1987-06-09 |
| AU8433882A (en) | 1983-02-24 |
| EP0072893B1 (en) | 1986-12-03 |
| EP0072893A1 (en) | 1983-03-02 |
| KR870001283B1 (ko) | 1987-06-30 |
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