KR830003751A - How to cast the correct shading of a mask with periodically dispensed slits to a support - Google Patents

How to cast the correct shading of a mask with periodically dispensed slits to a support Download PDF

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Publication number
KR830003751A
KR830003751A KR1019800003618A KR800003618A KR830003751A KR 830003751 A KR830003751 A KR 830003751A KR 1019800003618 A KR1019800003618 A KR 1019800003618A KR 800003618 A KR800003618 A KR 800003618A KR 830003751 A KR830003751 A KR 830003751A
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KR
South Korea
Prior art keywords
mask
support
slit
periodically
wave
Prior art date
Application number
KR1019800003618A
Other languages
Korean (ko)
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KR830001721B1 (en
Inventor
기에르 장루이스 루미
미첼 네비에르
Original Assignee
루미기에르 장루이스
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Publication date
Application filed by 루미기에르 장루이스 filed Critical 루미기에르 장루이스
Priority to KR1019800003618A priority Critical patent/KR830001721B1/en
Publication of KR830003751A publication Critical patent/KR830003751A/en
Application granted granted Critical
Publication of KR830001721B1 publication Critical patent/KR830001721B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Abstract

내용 없음No content

Description

주기적으로 분배된 슬릿이 뚫려 있는 마스크의 정확한 음영을 지지물에 캐스팅시키는 방법How to cast the correct shading of a mask with periodically dispensed slits to a support

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 발명의 방법을 사용함으로써 재형성될 수 있는 마스크(mask)의 상부 평면도. 제2도는 발명의 방법에 부합하여 뚫려진 마스크의 슬릿들 중 하나를 도시하는, 제1도의 선 II－II의 확대단면도. 제3도는 감광층으로 덮혀진 지지물 위에 위치된 마스크 캐스트의 음영을 도시하는, 제2도와 유사한 부분 확대도.1 is a top plan view of a mask that can be reformed by using the method of the invention. FIG. 2 is an enlarged cross-sectional view of line II-II of FIG. 1 showing one of the slits of the mask drilled in accordance with the method of the invention. FIG. 3 is a partial enlarged view similar to FIG. 2 showing the shading of a mask cast positioned on a support covered with a photosensitive layer.

Claims (3)

본문에서 설명하고 도면에서 예시한 바와 같이As described in the text and illustrated in the drawings 주기적으로 정확히 분배된 평행슬릿들이 뚫려있는 마스크를 정확하게 재형성시키는 캐스트음영을 지지물 위에 획득시키기 위한 방법에 있어서, 전기장벡터가 슬릿에 대해 평행하도록 입사면에 대해 수직으로 편광되는 평단색파로써 마스크가 조명되며,A method for acquiring a cast shade on a support that accurately reforms a mask with periodically precisely distributed parallel slits, wherein the mask is a flat monochromatic wave polarized perpendicular to the plane of incidence such that the electric field vector is parallel to the slit. Illuminated, 상기 방법은, 마스크의 평균면의 각각의 측부에 위치되는 두개의 반－공간의 각각에 대해 단지개의 회절오더들을 존재시키기 위한 평입사파의 파장의 선택과, 거울처럼 반사되는 반사오더가 아닌 반사회절오더가 역방향으로가 아니고 입사파의 방향으로 투과되도록 하게하는 평파의 입사각 조정으로 구성된다는 점에서 특징되는 주기적으로 분배된 슬릿이 뚫려 있는 마스크의 정확한 음영을 지지물에 캐스팅시키는 방법.The method involves the selection of the wavelength of the planarized wave to present only diffraction orders for each of two semi-spaces located on each side of the average plane of the mask, and the reflection rather than the mirror reflected reflection. A method for casting the correct shade of a mask with a periodically distributed slit perforated in a support characterized in that the diffraction order consists of an adjustment of the angle of incidence of the flat wave to allow transmission in the direction of the incident wave rather than in the reverse direction. 청구범위 제1항의 방법에 있어서,In the method of claim 1, 상기 방법이 임의의 단면을 갖는 슬릿을 갖는 마스크의 사용으로 구성되는 주기적으로 분배된 슬릿이 뚫려있는 마스크의 정확한 음영을 지지물에 캐스팅시키는 방법.A method for casting the correct shade of a mask with a periodically dispensed slit drilled into a support, the method comprising the use of a mask having a slit having an arbitrary cross section. 청구범위 제1항 또는 2항의 방법에 있어서, 사용된 마스크가 α로 표시된 피치로 주기적으로 분배된 슬릿을 포함하며,The method of claim 1, wherein the mask used comprises slits periodically distributed at a pitch indicated by α, 상기 방법이 약 2d/3와 2d사이의 파장을 갖는 평단색파의 사용으로 구성된다는 점에서 특징되는 주기적으로 분배된 슬릿이 뚫려있는 마스크의 정확한 음영을 지지물에 캐스팅시키는 방법.Casting a precise shade of a mask with a periodically distributed slit perforated in the support, characterized in that the method consists in the use of a flat monochromatic wave having a wavelength between about 2d / 3 and 2d. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019800003618A 1980-09-15 1980-09-15 How to cast the correct shading of a mask with periodically distributed slits on a support KR830001721B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019800003618A KR830001721B1 (en) 1980-09-15 1980-09-15 How to cast the correct shading of a mask with periodically distributed slits on a support

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019800003618A KR830001721B1 (en) 1980-09-15 1980-09-15 How to cast the correct shading of a mask with periodically distributed slits on a support

Publications (2)

Publication Number Publication Date
KR830003751A true KR830003751A (en) 1983-06-22
KR830001721B1 KR830001721B1 (en) 1983-08-31

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KR1019800003618A KR830001721B1 (en) 1980-09-15 1980-09-15 How to cast the correct shading of a mask with periodically distributed slits on a support

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Publication number Publication date
KR830001721B1 (en) 1983-08-31

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