KR20260025405A - 감광성 수지 조성물, 필름 형상 수지 및 수지 시트 - Google Patents

감광성 수지 조성물, 필름 형상 수지 및 수지 시트

Info

Publication number
KR20260025405A
KR20260025405A KR1020267001709A KR20267001709A KR20260025405A KR 20260025405 A KR20260025405 A KR 20260025405A KR 1020267001709 A KR1020267001709 A KR 1020267001709A KR 20267001709 A KR20267001709 A KR 20267001709A KR 20260025405 A KR20260025405 A KR 20260025405A
Authority
KR
South Korea
Prior art keywords
enoate
proposal
composition
less
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020267001709A
Other languages
English (en)
Korean (ko)
Inventor
히로키 다카마츠
다쿠야 미나미
다쿠 사와키
나츠키 도다
겐스케 요시하라
Original Assignee
가부시끼가이샤 레조낙
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 레조낙 filed Critical 가부시끼가이샤 레조낙
Publication of KR20260025405A publication Critical patent/KR20260025405A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
KR1020267001709A 2023-06-26 2024-06-13 감광성 수지 조성물, 필름 형상 수지 및 수지 시트 Pending KR20260025405A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023104223 2023-06-26
JPJP-P-2023-104223 2023-06-26
PCT/JP2024/021577 WO2025004836A1 (ja) 2023-06-26 2024-06-13 感光性樹脂組成物、フィルム状樹脂及び樹脂シート

Publications (1)

Publication Number Publication Date
KR20260025405A true KR20260025405A (ko) 2026-02-24

Family

ID=93938937

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020267001709A Pending KR20260025405A (ko) 2023-06-26 2024-06-13 감광성 수지 조성물, 필름 형상 수지 및 수지 시트

Country Status (6)

Country Link
EP (1) EP4733840A1 (https=)
JP (1) JPWO2025004836A1 (https=)
KR (1) KR20260025405A (https=)
CN (1) CN121420246A (https=)
TW (1) TW202505304A (https=)
WO (1) WO2025004836A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120089246B (zh) * 2025-02-23 2025-12-05 上海大学 基于机器学习设计高玻璃化转变温度芯片底填胶的方法、系统及应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005257812A (ja) * 2004-03-09 2005-09-22 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP6136101B2 (ja) 2012-04-10 2017-05-31 日立化成株式会社 感光性樹脂組成物、フィルム状樹脂、樹脂シート、樹脂パターン、樹脂層付半導体ウェハ、樹脂層付透明基板、半導体装置及び半導体装置の製造方法
CN116209571A (zh) * 2020-08-07 2023-06-02 株式会社力森诺科 感光性树脂组合物、感光性元件、抗蚀剂图案的形成方法及印刷线路板的制造方法
JP2023104223A (ja) 2022-01-17 2023-07-28 ソニーグループ株式会社 導光板及び画像表示装置

Also Published As

Publication number Publication date
EP4733840A1 (en) 2026-04-29
TW202505304A (zh) 2025-02-01
JPWO2025004836A1 (https=) 2025-01-02
WO2025004836A1 (ja) 2025-01-02
CN121420246A (zh) 2026-01-27

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