KR20250073648A - 레지스트 조성물 및 그의 제조 방법 - Google Patents

레지스트 조성물 및 그의 제조 방법 Download PDF

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Publication number
KR20250073648A
KR20250073648A KR1020257013150A KR20257013150A KR20250073648A KR 20250073648 A KR20250073648 A KR 20250073648A KR 1020257013150 A KR1020257013150 A KR 1020257013150A KR 20257013150 A KR20257013150 A KR 20257013150A KR 20250073648 A KR20250073648 A KR 20250073648A
Authority
KR
South Korea
Prior art keywords
resist composition
acid
boron
organic
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257013150A
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English (en)
Korean (ko)
Inventor
아키라 니시무라
Original Assignee
가부시키가이샤 닛폰 쇼쿠바이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 닛폰 쇼쿠바이 filed Critical 가부시키가이샤 닛폰 쇼쿠바이
Publication of KR20250073648A publication Critical patent/KR20250073648A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2224—Compounds having one or more tin-oxygen linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
KR1020257013150A 2022-12-08 2023-12-01 레지스트 조성물 및 그의 제조 방법 Pending KR20250073648A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2022-196306 2022-12-08
JP2022196306 2022-12-08
PCT/JP2023/043095 WO2024122460A1 (ja) 2022-12-08 2023-12-01 レジスト組成物及びその製造方法

Publications (1)

Publication Number Publication Date
KR20250073648A true KR20250073648A (ko) 2025-05-27

Family

ID=91379408

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257013150A Pending KR20250073648A (ko) 2022-12-08 2023-12-01 레지스트 조성물 및 그의 제조 방법

Country Status (5)

Country Link
US (1) US20260050210A1 (https=)
JP (1) JPWO2024122460A1 (https=)
KR (1) KR20250073648A (https=)
TW (1) TW202433172A (https=)
WO (1) WO2024122460A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201341440A (zh) * 2004-06-08 2013-10-16 Sandisk Corp 奈米結構之沉積後包封：併入該包封體之組成物、裝置及系統
JP6292058B2 (ja) * 2014-07-09 2018-03-14 Jsr株式会社 感放射線性樹脂組成物、硬化膜及びその形成方法、並びに表示素子
WO2022209950A1 (ja) * 2021-03-31 2022-10-06 株式会社日本触媒 高エネルギー線用レジスト組成物、高エネルギー線用レジスト組成物の製造方法、レジストパターン形成方法、及び半導体装置の製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
비특허문헌 1: Jarich Haitjema et al., "Extreme ultraviolet patterning of tin-oxo cages", J. Micro/Nanolith. MEMS MOEMS., 16(3), 033510(2017)

Also Published As

Publication number Publication date
TW202433172A (zh) 2024-08-16
US20260050210A1 (en) 2026-02-19
WO2024122460A1 (ja) 2024-06-13
JPWO2024122460A1 (https=) 2024-06-13

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