KR20250025624A - 감광성 수지 조성물, 경화물 및 그 형성 방법, 격벽 그리고 화상 표시 장치 - Google Patents

감광성 수지 조성물, 경화물 및 그 형성 방법, 격벽 그리고 화상 표시 장치 Download PDF

Info

Publication number
KR20250025624A
KR20250025624A KR1020247041501A KR20247041501A KR20250025624A KR 20250025624 A KR20250025624 A KR 20250025624A KR 1020247041501 A KR1020247041501 A KR 1020247041501A KR 20247041501 A KR20247041501 A KR 20247041501A KR 20250025624 A KR20250025624 A KR 20250025624A
Authority
KR
South Korea
Prior art keywords
group
ethylenically unsaturated
resin composition
photosensitive resin
unsaturated compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247041501A
Other languages
English (en)
Korean (ko)
Inventor
시하루 히라오카
마사아키 이케다
가즈히로 나카타니
도모코 스나도메
Original Assignee
미쯔비시 케미컬 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔비시 케미컬 주식회사 filed Critical 미쯔비시 케미컬 주식회사
Publication of KR20250025624A publication Critical patent/KR20250025624A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
KR1020247041501A 2022-06-22 2023-06-22 감광성 수지 조성물, 경화물 및 그 형성 방법, 격벽 그리고 화상 표시 장치 Pending KR20250025624A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022100020 2022-06-22
JPJP-P-2022-100020 2022-06-22
PCT/JP2023/023061 WO2023249070A1 (ja) 2022-06-22 2023-06-22 感光性樹脂組成物、硬化物及びその形成方法、隔壁並びに画像表示装置

Publications (1)

Publication Number Publication Date
KR20250025624A true KR20250025624A (ko) 2025-02-24

Family

ID=89380064

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247041501A Pending KR20250025624A (ko) 2022-06-22 2023-06-22 감광성 수지 조성물, 경화물 및 그 형성 방법, 격벽 그리고 화상 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2023249070A1 (https=)
KR (1) KR20250025624A (https=)
CN (1) CN119404143A (https=)
TW (1) TW202411266A (https=)
WO (1) WO2023249070A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018101314A1 (ja) 2016-12-02 2018-06-07 三菱ケミカル株式会社 着色感光性樹脂組成物、顔料分散液、隔壁、有機電界発光素子、画像表示装置及び照明

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6028360B2 (ja) * 2011-06-29 2016-11-16 東洋インキＳｃホールディングス株式会社 感光性樹脂組成物とその硬化物、及び感光性樹脂の製造方法
JP6019791B2 (ja) * 2012-06-19 2016-11-02 日立化成株式会社 隔壁形成材料、これを用いた感光性エレメント、隔壁の形成方法及び画像表示装置の製造方法
KR102300331B1 (ko) * 2017-03-31 2021-09-09 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN112313579B (zh) * 2018-07-20 2025-05-13 三菱化学株式会社 感光性着色树脂组合物、固化物、图像显示装置及照明

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018101314A1 (ja) 2016-12-02 2018-06-07 三菱ケミカル株式会社 着色感光性樹脂組成物、顔料分散液、隔壁、有機電界発光素子、画像表示装置及び照明

Also Published As

Publication number Publication date
JPWO2023249070A1 (https=) 2023-12-28
CN119404143A (zh) 2025-02-07
WO2023249070A1 (ja) 2023-12-28
TW202411266A (zh) 2024-03-16

Similar Documents

Publication Publication Date Title
KR102739353B1 (ko) 착색 감광성 수지 조성물, 안료 분산액, 격벽, 유기 전계 발광 소자, 화상 표시 장치 및 조명
KR102562409B1 (ko) 착색 감광성 수지 조성물, 격벽, 유기 전계 발광 소자, 화상 표시 장치 및 조명
KR102706032B1 (ko) 감광성 착색 수지 조성물, 경화물, 화상 표시 장치 및 조명
JP7658276B2 (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルタ及び画像表示装置
KR102752122B1 (ko) 감광성 착색 수지 조성물, 경화물, 격벽 및 화상 표시 장치
JP7331371B2 (ja) 感光性着色樹脂組成物、硬化物、及び画像表示装置
JP2021124704A (ja) 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置
JP7841536B2 (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター、画像表示装置、及び硬化物の形成方法
KR20250025624A (ko) 감광성 수지 조성물, 경화물 및 그 형성 방법, 격벽 그리고 화상 표시 장치
JP7563029B2 (ja) 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置
JP2021051235A (ja) 感光性樹脂組成物、硬化物、及び画像表示装置
KR20250128958A (ko) 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터, 화상 표시 장치, 및 경화물의 형성 방법
KR20240144187A (ko) 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터 및 화상 표시 장치
KR20240004389A (ko) 감광성 착색 수지 조성물, 경화물, 격벽 및 화상 표시 장치
JP2022114818A (ja) 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20241213

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application