KR20240148835A - 광 검출 장치 및 전자 기기 - Google Patents

광 검출 장치 및 전자 기기 Download PDF

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Publication number
KR20240148835A
KR20240148835A KR1020247026705A KR20247026705A KR20240148835A KR 20240148835 A KR20240148835 A KR 20240148835A KR 1020247026705 A KR1020247026705 A KR 1020247026705A KR 20247026705 A KR20247026705 A KR 20247026705A KR 20240148835 A KR20240148835 A KR 20240148835A
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South Korea
Prior art keywords
transistor
pixel
region
semiconductor region
semiconductor
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Pending
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KR1020247026705A
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English (en)
Korean (ko)
Inventor
가즈히로 요네다
아키라 다이초
히로시 후쿠나가
유스케 오타케
스즈노리 엔도
게이이치 나카자와
히데토시 오이시
Original Assignee
소니 세미컨덕터 솔루션즈 가부시키가이샤
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Publication of KR20240148835A publication Critical patent/KR20240148835A/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H01L27/14603—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/803—Pixels having integrated switching, control, storage or amplification elements
    • H10F39/8037—Pixels having integrated switching, control, storage or amplification elements the integrated elements comprising a transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • H01L27/1461—
    • H01L27/14612—
    • H01L27/14621—
    • H01L27/14625—
    • H01L27/1463—
    • H01L27/14636—
    • H01L27/1464—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • H10F39/8027—Geometry of the photosensitive area
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/803—Pixels having integrated switching, control, storage or amplification elements
    • H10F39/8033—Photosensitive area
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8063—Microlenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/807—Pixel isolation structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/813—Electronic components shared by multiple pixels, e.g. one amplifier shared by two pixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/199—Back-illuminated image sensors

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  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
KR1020247026705A 2022-02-15 2023-02-14 광 검출 장치 및 전자 기기 Pending KR20240148835A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263310267P 2022-02-15 2022-02-15
US63/310,267 2022-02-15
PCT/JP2023/004902 WO2023157819A1 (ja) 2022-02-15 2023-02-14 光検出装置および電子機器

Publications (1)

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KR20240148835A true KR20240148835A (ko) 2024-10-11

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Country Link
US (1) US20250133845A1 (https=)
EP (1) EP4481827A4 (https=)
JP (2) JP7364826B1 (https=)
KR (1) KR20240148835A (https=)
CN (1) CN118302861A (https=)
TW (1) TWI882374B (https=)
WO (1) WO2023157819A1 (https=)

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WO2025204812A1 (ja) * 2024-03-29 2025-10-02 ソニーセミコンダクタソリューションズ株式会社 光検出装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019220945A1 (ja) 2018-05-18 2019-11-21 ソニーセミコンダクタソリューションズ株式会社 撮像素子、電子機器

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JP5564874B2 (ja) 2009-09-25 2014-08-06 ソニー株式会社 固体撮像装置、及び電子機器
JP5581698B2 (ja) * 2010-01-06 2014-09-03 株式会社ニコン 固体撮像素子
JP6299058B2 (ja) * 2011-03-02 2018-03-28 ソニー株式会社 固体撮像装置、固体撮像装置の製造方法及び電子機器
JPWO2012160802A1 (ja) * 2011-05-24 2014-07-31 パナソニック株式会社 固体撮像装置
JP2015153772A (ja) * 2014-02-10 2015-08-24 株式会社東芝 固体撮像装置
JP2016039315A (ja) * 2014-08-08 2016-03-22 株式会社東芝 固体撮像素子
JP7117110B2 (ja) 2018-01-31 2022-08-12 ソニーグループ株式会社 光電変換素子および撮像装置
JP2019145544A (ja) * 2018-02-16 2019-08-29 ソニーセミコンダクタソリューションズ株式会社 撮像素子
DE112019002463T5 (de) * 2018-05-16 2021-04-22 Sony Semiconductor Solutions Corporation Festkörperbildgebungselement und festkörperbildgebungsvorrichtung
CN109166873B (zh) * 2018-08-31 2021-05-25 上海华力微电子有限公司 一种像素结构及其制造方法
US12136639B2 (en) 2018-11-06 2024-11-05 Sony Semiconductor Solutions Corporation Imaging element and electronic equipment
CN113614932B (zh) * 2019-03-28 2024-01-09 松下知识产权经营株式会社 光检测器
CN115380381A (zh) * 2020-04-20 2022-11-22 索尼半导体解决方案公司 固态摄像元件
US11450700B2 (en) 2020-07-29 2022-09-20 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor image sensor pixel isolation structure for reducing crosstalk

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019220945A1 (ja) 2018-05-18 2019-11-21 ソニーセミコンダクタソリューションズ株式会社 撮像素子、電子機器

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JPWO2023157819A1 (https=) 2023-08-24
EP4481827A1 (en) 2024-12-25
JP2023179619A (ja) 2023-12-19
TW202433950A (zh) 2024-08-16
CN118302861A (zh) 2024-07-05
EP4481827A4 (en) 2025-10-08
WO2023157819A1 (ja) 2023-08-24
TWI882374B (zh) 2025-05-01
JP7364826B1 (ja) 2023-10-18
JP7589310B2 (ja) 2024-11-25
US20250133845A1 (en) 2025-04-24

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Patent event date: 20240808

Patent event code: PA01051R01D

Comment text: International Patent Application

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