KR20240129201A - 실리콘 공급 튜브 불활성 가스 제어를 수반하는 단결정 실리콘 잉곳들을 성장시키기 위한 방법들 - Google Patents
실리콘 공급 튜브 불활성 가스 제어를 수반하는 단결정 실리콘 잉곳들을 성장시키기 위한 방법들 Download PDFInfo
- Publication number
- KR20240129201A KR20240129201A KR1020247026043A KR20247026043A KR20240129201A KR 20240129201 A KR20240129201 A KR 20240129201A KR 1020247026043 A KR1020247026043 A KR 1020247026043A KR 20247026043 A KR20247026043 A KR 20247026043A KR 20240129201 A KR20240129201 A KR 20240129201A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon
- ingot
- inert gas
- melt
- supply tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/002—Continuous growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/570,141 | 2022-01-06 | ||
| US17/570,146 | 2022-01-06 | ||
| US17/570,146 US12037698B2 (en) | 2022-01-06 | 2022-01-06 | Ingot puller apparatus having a flange that extends from the funnel or from the silicon feed tube |
| US17/570,141 US11866845B2 (en) | 2022-01-06 | 2022-01-06 | Methods for growing single crystal silicon ingots that involve silicon feed tube inert gas control |
| PCT/EP2023/050146 WO2023131634A1 (en) | 2022-01-06 | 2023-01-05 | Methods for growing single crystal silicon ingots that involve silicon feed tube inert gas control |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20240129201A true KR20240129201A (ko) | 2024-08-27 |
Family
ID=84982293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020247026043A Pending KR20240129201A (ko) | 2022-01-06 | 2023-01-05 | 실리콘 공급 튜브 불활성 가스 제어를 수반하는 단결정 실리콘 잉곳들을 성장시키기 위한 방법들 |
Country Status (5)
| Country | Link |
|---|---|
| EP (2) | EP4534739A3 (https=) |
| JP (1) | JP2025500603A (https=) |
| KR (1) | KR20240129201A (https=) |
| TW (1) | TW202328509A (https=) |
| WO (1) | WO2023131634A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117966255B (zh) * | 2024-04-01 | 2024-06-25 | 浙江晶盛机电股份有限公司 | 可消除共振的籽晶系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4341379B2 (ja) * | 2003-11-12 | 2009-10-07 | 信越半導体株式会社 | 単結晶の製造方法 |
| JP2005213097A (ja) * | 2004-01-30 | 2005-08-11 | Sumitomo Mitsubishi Silicon Corp | シリコン単結晶の引上げ方法 |
| DE102005006186A1 (de) * | 2005-02-10 | 2006-08-24 | Siltronic Ag | Verfahren zur Herstellung eines Einkristalls aus Silizium mit kontrolliertem Kohlenstoffgehalt |
| JP5437565B2 (ja) * | 2007-04-24 | 2014-03-12 | Sumco Techxiv株式会社 | 半導体単結晶の製造装置 |
| KR100894295B1 (ko) * | 2008-02-15 | 2009-04-24 | 주식회사 실트론 | 실리콘 단결정 잉곳 생산장치의 유량제어방법 및 이를이용한 실리콘 단결정 잉곳 생산방법 |
| KR20150106204A (ko) * | 2014-03-11 | 2015-09-21 | (주)기술과가치 | 잉곳 제조 장치 |
| CN207091548U (zh) * | 2017-07-27 | 2018-03-13 | 隆基绿能科技股份有限公司 | 一种物料供给装置及晶体生长系统 |
-
2023
- 2023-01-03 TW TW112100133A patent/TW202328509A/zh unknown
- 2023-01-05 EP EP25159723.3A patent/EP4534739A3/en active Pending
- 2023-01-05 JP JP2024540745A patent/JP2025500603A/ja active Pending
- 2023-01-05 KR KR1020247026043A patent/KR20240129201A/ko active Pending
- 2023-01-05 EP EP23700590.5A patent/EP4460593A1/en active Pending
- 2023-01-05 WO PCT/EP2023/050146 patent/WO2023131634A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023131634A8 (en) | 2024-08-22 |
| WO2023131634A1 (en) | 2023-07-13 |
| EP4460593A1 (en) | 2024-11-13 |
| TW202328509A (zh) | 2023-07-16 |
| EP4534739A3 (en) | 2025-04-16 |
| JP2025500603A (ja) | 2025-01-09 |
| EP4534739A2 (en) | 2025-04-09 |
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| Date | Code | Title | Description |
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St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
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St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| D16 | Fast track examination requested |
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| P11-X000 | Amendment of application requested |
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| P13 | Application amended |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PA0302 | Request for accelerated examination |
St.27 status event code: A-1-2-D10-D16-exm-PA0302 |
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| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |