KR20240020673A - 임프린트 방법, 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 방법, 임프린트 장치 및 물품 제조 방법 Download PDF

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Publication number
KR20240020673A
KR20240020673A KR1020230099459A KR20230099459A KR20240020673A KR 20240020673 A KR20240020673 A KR 20240020673A KR 1020230099459 A KR1020230099459 A KR 1020230099459A KR 20230099459 A KR20230099459 A KR 20230099459A KR 20240020673 A KR20240020673 A KR 20240020673A
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KR
South Korea
Prior art keywords
pattern
area
mold
substrate
imprint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020230099459A
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English (en)
Korean (ko)
Inventor
유지 사카타
Original Assignee
캐논 가부시끼가이샤
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20240020673A publication Critical patent/KR20240020673A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020230099459A 2022-08-08 2023-07-31 임프린트 방법, 임프린트 장치 및 물품 제조 방법 Pending KR20240020673A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022126391A JP2024022936A (ja) 2022-08-08 2022-08-08 インプリント方法、インプリント装置、及び物品の製造方法
JPJP-P-2022-126391 2022-08-08

Publications (1)

Publication Number Publication Date
KR20240020673A true KR20240020673A (ko) 2024-02-15

Family

ID=89769901

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230099459A Pending KR20240020673A (ko) 2022-08-08 2023-07-31 임프린트 방법, 임프린트 장치 및 물품 제조 방법

Country Status (3)

Country Link
US (1) US20240045347A1 (https=)
JP (1) JP2024022936A (https=)
KR (1) KR20240020673A (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7433925B2 (ja) * 2020-01-20 2024-02-20 キヤノン株式会社 インプリント方法、インプリント装置、および物品製造方法
JP7603395B2 (ja) * 2020-08-26 2024-12-20 キヤノン株式会社 インプリント装置、および物品の製造方法

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Publication number Publication date
US20240045347A1 (en) 2024-02-08
JP2024022936A (ja) 2024-02-21

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