KR20230068314A - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

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Publication number
KR20230068314A
KR20230068314A KR1020220144296A KR20220144296A KR20230068314A KR 20230068314 A KR20230068314 A KR 20230068314A KR 1020220144296 A KR1020220144296 A KR 1020220144296A KR 20220144296 A KR20220144296 A KR 20220144296A KR 20230068314 A KR20230068314 A KR 20230068314A
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KR
South Korea
Prior art keywords
substrate
mold
imprint
unit
holding unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020220144296A
Other languages
English (en)
Korean (ko)
Inventor
나오키 마루야마
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230068314A publication Critical patent/KR20230068314A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90—Measuring, controlling or regulating
    • B29C2037/903—Measuring, controlling or regulating by means of a computer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020220144296A 2021-11-10 2022-11-02 임프린트 장치 및 물품 제조 방법 Pending KR20230068314A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021183520A JP7730727B2 (ja) 2021-11-10 2021-11-10 インプリント装置、及び物品の製造方法
JPJP-P-2021-183520 2021-11-10

Publications (1)

Publication Number Publication Date
KR20230068314A true KR20230068314A (ko) 2023-05-17

Family

ID=86229363

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220144296A Pending KR20230068314A (ko) 2021-11-10 2022-11-02 임프린트 장치 및 물품 제조 방법

Country Status (3)

Country Link
US (1) US12447666B2 (https=)
JP (1) JP7730727B2 (https=)
KR (1) KR20230068314A (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6039917B2 (ja) * 2012-05-22 2016-12-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6363838B2 (ja) * 2014-01-08 2018-07-25 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6465577B2 (ja) * 2014-07-11 2019-02-06 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6611450B2 (ja) * 2015-03-31 2019-11-27 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP2017157639A (ja) * 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置、および物品の製造方法

Also Published As

Publication number Publication date
US20230145758A1 (en) 2023-05-11
US12447666B2 (en) 2025-10-21
JP7730727B2 (ja) 2025-08-28
JP2023070981A (ja) 2023-05-22

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St.27 status event code: A-0-1-A10-A12-nap-PA0109

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St.27 status event code: A-1-2-D10-D21-exm-PE0902