KR20220091705A - Electrode structure, touch sensor, window laminate and image display device therewith - Google Patents

Abstract

The present invention relates to an electrode structure comprising a base material, a refractive index matching layer (IML) formed on the base material, and an electrode layer formed on the refractive index matching layer (IML), wherein the refractive index matching layer (IML) has a silicon (Si) content of a surface layer part for which is 0.5-5.0 at.%; and a touch sensor, a window laminate, and an image display device comprising the same. Therefore, the present invention is capable of reducing a failure generation rate of the device.

Description

Electrode structure, touch sensor including same, window laminate and image display device {ELECTRODE STRUCTURE, TOUCH SENSOR, WINDOW LAMINATE AND IMAGE DISPLAY DEVICE THEREWITH}

The present invention relates to an electrode structure, a touch sensor including the same, a window laminate, and an image display device.

Recently, in image display/information processing apparatuses such as smart phones and smart pads, a touch screen panel (TSP) is employed. For example, in a capacitive touch panel, a transparent conductive layer is formed on a substrate and the transparent conductive layer is etched in a predetermined pattern shape for touch recognition, so that a channel region through which electricity flows and a non-channel region through which electricity does not flow area can be formed.

The capacitive touch panel can recognize the input coordinates by detecting the change in capacitance in each channel where the pattern is formed when a finger or the like is in contact, and can be manufactured to have a thinner thickness compared to the resistive type, and Touch implementation is possible.

In the channel region, for example, ITO electrode patterns may be formed. However, when the electrode pattern is visually recognized by the change in transmittance and reflectance due to the ITO electrode pattern, the display quality of the display device may be deteriorated.

In order to solve this problem, a method of providing a layer (eg, an index matching layer (IML), etc.) for preventing a sudden change in optical properties under the electrode pattern has been proposed.

Korean Patent Laid-Open No. 10-2016-0002196 also discloses a transparent electrode film having improved optical properties by providing a primer layer under the transparent conductive electrode.

The primer and layers such as the index matching layer (IML) not only serve to reduce the difference in optical properties depending on the position of each electrode pattern, but also include an electrode layer provided on the upper surface of the refractive index matching layer and , serves to improve adhesion to a substrate provided on a bottom surface of the refractive index matching layer.

Accordingly, the index matching layer (IML) may be prepared by adding a surfactant or the like for planarization of the film because it is very important to secure not only excellent adhesion but also flatness.

However, when the amount of the surfactant component (eg, silicon (Si)), particularly, the surfactant component contained in the surface layer of the index matching layer (IML) is excessive, the flatness is excellent, but the slip property is also As it increases, there is a problem in that adhesion with the electrode layer disposed thereon is lowered.

When the index matching layer (IML) has lower adhesion to the upper electrode layer, device defects may occur due to peeling of all or part of the electrode layer, so that both flatness and adhesion to the upper electrode layer are improved. It is necessary to develop an Index Matching Layer (IML) and an electrode structure including the same.

Republic of Korea Patent Publication No. 10-2016-0002196

An object of the present invention is to provide an electrode structure having improved flatness and adhesion of a refractive index matching layer (IML).

Another object of the present invention is to provide an electrode structure in which the visibility of an electrode pattern is reduced.

In addition, an object of the present invention is to provide a touch sensor, a window laminate, and an image display device including the electrode structure.

The present invention, the base substrate; a refractive index matching layer (IML) formed on the base substrate; and an electrode layer formed on the index matching layer (IML), wherein the index matching layer (IML) has a silicon (Si) content of 0.5 to 5.0 at.% in the surface layer, It relates to an electrode structure.

In the present invention, in the first aspect, the surface layer portion may be a region up to 10 nm in the thickness direction from the outermost surface of the index matching layer (IML).

In the second aspect of the present invention, the index matching layer (IML) may include at least one of an organic material and an inorganic material.

According to the third aspect of the present invention, the organic material may include at least one selected from the group consisting of an acryl-based compound and a silicone-based compound.

In the present invention, in the fourth aspect, the inorganic material is zirconium oxide (ZrO ₂ ), niobium oxide (Nb ₂ O ₅ ), zinc oxide (ZnO), silicon oxide (SiO ₂ ), cerium oxide (CeO ₂ ) , indium oxide (In ₂ O ₃ ) and titanium oxide (TiO ₂ ) may include one or more selected from the group consisting of.

In the present invention, in the fifth aspect, the index matching layer (IML) may have a refractive index between the refractive index of the base substrate and the refractive index of the electrode layer.

In the present invention, in the sixth aspect, the transmittance of the index matching layer (IML) may be 95% or more.

In the seventh aspect of the present invention, the index matching layer (IML) may include two or more layers having different refractive indices.

According to the eighth aspect of the present invention, the base substrate may include a separation layer and a protective layer.

In the present invention, in the ninth aspect, the electrode layer is Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), Zinc Oxide (ZnO), Indium Zinc Tin Oxide (Indium Zinc Tin) Oxide; IZTO), Cadmium Tin Oxide (CTO), Aluminum Zinc Oxide (AZO), Gallium Zinc Oxide (GZO), PEDOT (poly(3,4-ethylenedioxythiophene)), Carbon Nanotubes (Carbon Nano Tube; CNT), graphene (Graphene), may include one or more selected from the group consisting of a metal wire and a metal mesh (mesh).

In addition, the present invention relates to a touch sensor including the electrode structure.

In addition, the present invention, the window substrate; and the touch sensor laminated on one surface of the window substrate.

In the tenth aspect, the present invention may further include a polarizing layer laminated on the one surface of the window substrate.

In the eleventh aspect of the present invention, an upper surface of the polarizing layer may be laminated on the one surface of the window substrate, and an upper surface of the touch sensor may be laminated on a lower surface of the polarizing layer.

In the twelfth aspect, the present invention may include a hard coating layer laminated on the other surface opposite to the one surface of the window substrate.

In the thirteenth aspect, the present invention may further include a wear-resistant layer laminated on the other surface of the window substrate.

In the fourteenth aspect of the present invention, the bottom surface of the hard coating layer may be laminated on the other surface of the window substrate, and the bottom surface of the wear resistance layer may be laminated on the upper surface of the hard coating layer.

In addition, the present invention provides a display panel; and the window laminate laminated on the display panel.

According to the electrode structure of the present invention, the flatness and adhesion of the refractive index matching layer (Index Matching Layer; IML) is improved, it is possible to reduce the defect rate of the device.

In addition, according to the electrode structure of the present invention, the visibility of the electrode pattern is reduced, it is possible to improve the image quality of the device.

1 and 2 are cross-sectional views schematically showing an electrode structure according to an embodiment of the present invention.

The present invention relates to an electrode structure having improved flatness and adhesion by controlling the silicon content (Si) of the surface layer of the index matching layer (IML), and a touch sensor, a window laminate, and an image display device including the same.

Specifically, the present invention, the base substrate; a refractive index matching layer (IML) formed on the base substrate; and an electrode layer formed on the index matching layer (IML), wherein the index matching layer (IML) has a silicon (Si) content of 0.5 to 5.0 at.% in the surface layer, It relates to an electrode structure.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the drawings. However, the following drawings attached to the present specification illustrate preferred embodiments of the present invention, and serve to further understand the technical spirit of the present invention together with the above-described content of the present invention, so the present invention is described in such drawings It should not be construed as being limited only to the matters.

The terminology used herein is for the purpose of describing the embodiments, and is not intended to limit the present invention. In this specification, the singular also includes the plural unless otherwise specified in the phrase.

As used herein, includes and/or comprising refers to the presence or addition of one or more other components, steps, operations and/or elements other than the recited elements, steps, operations and/or elements. It is used in the sense of not being excluded. Like reference numerals refer to like elements throughout.

Spatially relative terms "lower", "bottom", "lower", "upper", "top", "upper", etc., as shown in the drawings, refer to one element or component and another element or component as shown in the drawings. It can be used to easily describe the correlation with The spatially relative terms should be understood as terms including different orientations of the device during use or operation in addition to the orientation shown in the drawings. For example, when an element shown in the drawings is turned over, an element described as "below" or "below" another element may be placed "above" the other element. Accordingly, the exemplary term “down” may include both the downward and upward directions. The device may also be oriented in other orientations, and thus spatially relative terms may be interpreted according to orientation.

1 and 2 are cross-sectional views schematically showing an electrode structure according to an embodiment of the present invention.

Referring to FIG. 1 , an electrode structure according to an embodiment of the present invention includes a base substrate 100 , an Index Matching Layer (IML) 200 formed on the base substrate 100 , and the refractive index. The electrode layer 300 formed on the index matching layer (IML) 200 may be included.

The base substrate 100 is not particularly limited as long as it serves as a base that can structurally support the index matching layer (IML) 200 and the electrode layer 300, etc., and a film type It may include a description of the.

In one or more embodiments, the base substrate 100 is glass; Cyclic olefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallylate (polyallylate), Polyimide (PI), cellulose acetate propionate (CAP), polyether sulfone (PES), cellulose triacetate (TAC), polycarbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA) ) and the like polymeric substances; and/or an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, or metal oxide.

Referring to FIG. 2 , in the electrode structure according to another embodiment of the present invention, the base substrate 100 may include a separation layer 110 and a protective layer 120 .

The separation layer 110 may be included as a functional layer for easily performing a subsequent peeling process from the carrier substrate.

In one or a plurality of embodiments, the separation layer 110 is polyimide, polyvinyl alcohol, polyamic acid, polyamide, polyethylene, polystyrene ( polystylene), polynorbornene, phenylmaleimide copolymer, polyazobenzene, polyphenylenephthalamide, polyester, polymethyl methacrylate , polyarylate, cinnamate, coumarin, phthalimidine, chalcone, and a polymer such as aromatic acetylene. These may be used alone or in combination of two or more.

The separation layer 110 may be made of a material having a peeling force of 1N/25mm or less to the carrier substrate so as to be easily peeled off from the carrier substrate and not peeled from the protective layer 120 .

In one embodiment, the thickness of the separation layer 110 may be about 10 to 1,000 nm, preferably about 50 to 500 nm. When the thickness of the separation layer 110 is less than about 10 nm, the film uniformity is deteriorated, and the electrode pattern formation of the electrode layer 300 may be non-uniform. In addition, tearing may occur due to an increase in peeling force locally, or after separation from the carrier substrate, curl of the electrode structure may be caused. When the thickness of the separation layer 110 exceeds 1,000 nm, the peeling force is no longer lowered, and the flexibility of the electrode structure may be reduced.

The protective layer 120 is formed on the separation layer 110 , and covers the index matching layer (IML) 200 together with the separation layer 110 during the peeling process from the carrier substrate. Breakage of the matching layer (IML) 200 and the electrode layer 300 may be suppressed.

The protective layer 120 may include an inorganic insulating material such as an inorganic oxide or an inorganic nitride, or a polymer-based organic insulating material. Examples of the inorganic oxide include silicon oxide, alumina, and titanium oxide, and examples of the inorganic nitride include silicon nitride and titanium nitride. In terms of realizing high transmittance, the protective layer 120 may be formed of silicon oxide.

The heat resistance of the electrode structure is improved by the protective layer 120 , and thermal deformation and cracks of the index matching layer (IML) 200 to the electrode layer 300 may be prevented. Accordingly, the electrode layer 300 having a lower resistance may be formed by performing high-temperature deposition and annealing processes. In addition, the chemical resistance of the electrode structure is improved by the protective layer 120 , so that swelling and peeling of the separation layer 110 can be suppressed.

The index matching layer (IML) 200 serves to improve the optical uniformity of the touch screen panel.

Specifically, it serves to reduce the optical characteristic difference due to the structural difference for each position of each pattern of the electrode layer 300 formed thereon, and when the index matching layer (IML) 200 is included. , it is possible to reduce the difference in reflectance between the pattern portion and the non-pattern portion of the detection pattern, thereby reducing the visibility of the detection pattern.

Also, the index matching layer (IML) 200 serves to improve adhesion between the base substrate 100 and the electrode layer 300 .

The index matching layer (IML) 200 may include a silicon atom (Si)-containing compound to improve optical uniformity and adhesion. For example, a surfactant may be added, and the surfactant may include silicon (Si) or the like. In an embodiment, the silicon (Si) content of the surface layer portion of the index matching layer (IML) 200 is preferably 0.5 to 5.0 at.%, more preferably 1 to 4 at.%. .

The surface layer part refers to the surface area of the index matching layer (IML) 200, and may be an area from the outermost surface to 10 nm in the thickness direction, preferably an area up to 6 nm, and more Preferably, the region may be up to 3 nm.

The content of the silicon (Si) is an atomic percentage (at.%) of a silicon atom (Si) with respect to a carbon atom (C), an oxygen atom (O) and a silicon atom (Si), which is calculated according to the following Equation 1 it could be

[Equation 1]

Silicon (Si) content (Atomic %)={N _Si /(N _C +N _O +N _Si )}x100

(In Equation 1, N _Si is the number of silicon atoms, N _C is the number of carbon atoms, and _NO is the number of oxygen atoms.)

When the content of silicon (Si) included in the surface layer portion of the index matching layer (IML) 200 satisfies the above range, the flatness and adhesion of the index matching layer (IML) 200 are improved. Thus, it is possible to improve optical uniformity and at the same time reduce the incidence of device defects.

Specifically, when the content of silicon (Si) is less than the above range, the flatness of the index matching layer (IML) 200 is poor, which is disadvantageous in terms of optical uniformity, and when it exceeds the above range, As silicon (Si) is concentrated in the surface layer portion, adhesion is lowered, thereby increasing the possibility of device failure.

In an embodiment, the index matching layer (IML) 200 may further include a surfactant including other components in addition to silicon (Si) if necessary.

The component for forming the index matching layer (IML) 200 may be used without particular limitation as long as it is commonly used in the art to which the present invention pertains, for example, an organic material and/or an inorganic material. may include

In one or a plurality of embodiments, the organic material may include at least one selected from the group consisting of an acrylic compound and a silicone compound.

In one or more embodiments, the inorganic material is zirconium oxide (ZrO ₂ ), niobium oxide (Nb ₂ O ₅ ), zinc oxide (ZnO), silicon oxide (SiO ₂ ), cerium oxide (CeO ₂ ), It may include at least one selected from the group consisting of indium oxide (In ₂ O ₃ ) and titanium oxide (TiO ₂ ).

The index matching layer (IML) 200 may be formed in a single-layer structure having one refractive index, or in a multi-layer structure including two or more layers having different refractive indices.

When the index matching layer (IML) 200 is formed in a multilayer structure, the high refractive index layer/low refractive index layer may be stacked on the base substrate 100 in order. In this case, by optimizing the material and thickness of the high refractive index layer and the material and thickness of the low refractive index layer to further reduce the difference in optical properties, the visibility of the electrode pattern can be reduced.

The refractive index of the index matching layer (IML) 200 is not particularly limited as long as it can minimize the difference in optical properties due to the structural difference for each position of each electrode pattern. In one embodiment, the index matching layer (Index Matching Layer; IML) 200 has a refractive index between the refractive index of the base substrate 100 disposed on the bottom and the refractive index of the electrode layer 300 disposed on the top surface. can In this case, the difference in optical properties between the base substrate 100 , the index matching layer (IML) 200 , and the electrode layer 300 can be minimized, thereby reducing the visibility of the electrode pattern.

The transmittance of the index matching layer (IML) 200 may be 95% or more. When the transmittance satisfies the above range, the optical uniformity can be improved by reducing the visibility of the sensing pattern, and the occurrence rate of device defects can be reduced.

The thickness of the index matching layer (IML) 200 is not particularly limited, but, for example, in the case of an inorganic thin film may be 10 to 1,000 Å, preferably 50 to 200 Å, and in the case of an organic film, 0.5 to It may be 10 μm, preferably 1 to 3 μm.

Although the method of forming the index matching layer (IML) 200 is not particularly limited, for example, a gravure method, a vacuum deposition method, a sputtering method, an ion plating method, etc. may be used, and the method as described above may be used. It can be easily manufactured in the form of a thin film through

The electrode layer 300 is formed on the index matching layer (IML) 200 and may include a plurality of sensing patterns.

The electrode layer 300 serves as an electrode for providing information on the coordinates of the touched point of the touched point, and each of the plurality of sensing patterns includes unit patterns arranged in the same row or column direction.

The unit pattern provides information on the X and Y coordinates of the touched point. For example, the plurality of sensing patterns may be a first pattern and a second pattern. The first pattern and the second pattern are respectively arranged in the same row or column direction to provide information about the X coordinate and the Y coordinate of the touched point. Specifically, when a person's hand or an object comes into contact with the transparent substrate, the change in capacitance according to the contact position is transmitted to the driving circuit via the first pattern, the second pattern, and the position detection line. Then, the change in capacitance is converted into an electrical signal by the X and Y input processing circuit, and the contact position is grasped.

A component for forming the electrode layer 300 may be used without any particular limitation, and a component having transparency is more preferable.

In one or more embodiments, the electrode layer 300 is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (Indium) Zinc Tin Oxide (IZTO), Cadmium Tin Oxide (CTO), Aluminum Zinc Oxide (AZO), Gallium Zinc Oxide (GZO), PEDOT (poly(3,4-ethylenedioxythiophene)) , may include at least one selected from the group consisting of , carbon nanotubes (CNT), graphene, metal wires and metal meshes, preferably indium tin oxide (Indium Tin) Oxide (ITO) may be used. In addition, the metal used in the metal wire or metal mesh is not particularly limited, for example, silver (Ag), gold (Au), aluminum (Al), copper (Cu), iron (Fe), nickel (Ni), Titanium (Ti), tellurium (Te), chromium (Cr), etc. are mentioned. These can be used individually or in mixture of 2 or more types.

The method of forming the electrode layer 300 is not particularly limited, but may be formed by various thin film deposition techniques such as, for example, physical vapor deposition (PVD), chemical vapor deposition (CVD), and the like. In an embodiment, it may be formed by reactive sputtering, which is an example of a physical vapor deposition method.

Also, the electrode layer 300 may be formed by a printing process. During this printing process, various printing methods such as gravure off set, reverse off set, screen printing, and gravure printing may be used. In particular, when the electrode layer 300 is formed by a printing process, it may be formed of a printable paste material. For example, it may be formed using a carbon nano tube (CNT), a conductive polymer, and a silver nano wire ink (Ag nano wire ink).

The thickness of the electrode layer 300 according to the present invention is not particularly limited, but may be, for example, 10 to 200 nm, preferably 10 to 35 nm. When the thickness of the electrode layer 300 satisfies the above range, the visibility of the sensing pattern may be reduced.

The transmittance of the electrode layer 300 is not particularly limited, but may be, for example, 80% or more, preferably 95% or more. In addition, the sheet resistance of the electrode layer 300 is not particularly limited, but may be, for example, 150 Ω or less, preferably 130 Ω or less. When the transmittance and sheet resistance in the above ranges are satisfied, the visibility of the sensing pattern may be reduced.

The electrode structure of the present invention, if necessary, within the range that does not impair the purpose of the present invention, an insulating layer (Insulator), a bridge electrode (Bridge Electrode), a protective film layer (Protective Film), a passivation layer (Passivation), an adhesive layer ( Adhesive Layer) and the like may be further included.

The present invention provides a touch sensor including the electrode structure.

Since the electrode structure according to the present invention has excellent visibility, flatness and adhesion, it can be usefully used as a sensing electrode of a touch sensor. The electrode structure according to the present invention can be applied to both a capacitive touch sensor and a pressure sensitive touch sensor.

In addition, the present invention provides a touch screen panel including the touch sensor. As a method of applying the touch sensor according to the present invention to a touch screen panel, a method known in the art to which the present invention pertains may be applied without particular limitation.

The present invention provides a window laminate and an image display device including the touch sensor.

In an embodiment, the window laminate may include a window substrate and the touch sensor, and may further include a polarizing plate if necessary.

In an embodiment, a light blocking pattern may be formed on a peripheral portion of one surface of the window substrate. The light blocking pattern may include, for example, a color printing pattern, and may have a single-layer or multi-layer structure. A bezel part or a non-display area of the image display apparatus may be defined by the light blocking pattern.

The polarizing layer may include a coated polarizer or a polarizing plate. The coating-type polarizer may include a liquid crystal coating layer including a polymerizable liquid crystal compound and a dichroic dye. In this case, the polarizing layer may further include an alignment layer for imparting alignment to the liquid crystal coating layer.

The polarizing plate may include, for example, a polyvinyl alcohol-based polarizer and a protective film attached to at least one surface of the polyvinyl alcohol-based polarizer.

The polarizing layer may be directly bonded to one surface of the window substrate or may be attached through an adhesive layer.

The touch sensor may be included in the window laminate in the form of a film or panel. In an embodiment, the touch sensor may be coupled to the polarization layer through an adhesive layer. In some embodiments, the touch sensor may be directly transferred onto the window substrate or the polarization layer.

In an embodiment, the window laminate may further include a hard coating layer and/or an abrasion resistance layer.

The hard coating layer is not particularly limited as long as it is for protecting other substrates or image display devices such as a polarizing plate and a touch sensor from external physical and chemical impact, and a conventionally or later developed hard coating layer may be used.

The hard coating layer may be formed by applying a composition for forming a hard coating layer on a window substrate and then curing it by light or heat, in one embodiment. The composition for forming the hard coating layer is not particularly limited, and may include, for example, a photocurable compound and a photoinitiator.

The photocurable compound and the photoinitiator may be used without limitation, those generally used in the art, for example, the photocurable compound may be a photopolymerizable monomer, a photopolymerizable oligomer, etc., for example, monofunctional and / or polyfunctional (meth)acrylate is mentioned, and an oxime ester type etc. are mentioned as a photoinitiator.

The abrasion-resistant layer serves to improve abrasion resistance of the surface of the viewer side or to prevent contamination by external substances.

It is preferable that the abrasion-resistant layer contains the structure derived from a fluorine compound. The fluorine compound may have a silicon atom and a hydrolyzable functional group such as an alkoxy group or halogen on the silicon atom.

The hydrolyzable functional group serves to form a coating film by a dehydration condensation reaction and to improve adhesion of the wear-resistant layer by reacting with active hydrogen on the surface of the substrate.

The fluorine compound may include a perfluoroalkyl group, a perfluoroalkylene group, a perfluoropolyether structure, etc. For example, a fluorine-containing polyorganosiloxane compound having a perfluoropolyether structure and a long-chain alkyl group having 4 or more carbon atoms; There may be a fluorinated organosiloxane compound containing an alkylene group having 2 or more carbon atoms and a perfluoroalkylene group. In this case, water repellency can be imparted, and contamination by external substances can be effectively prevented.

The thickness of the wear-resistant layer is not particularly limited, but may be 1 to 20 nm, and as it exhibits water repellency, the water contact angle is 100° to 125°, the contact angle hysteresis according to the sliding contact angle measurement method is 3 to 20°, and the dynamic contact angle is 2 to 55°.

The wear-resistant layer may further include various additives such as silanol condensation catalyst, antioxidant, corrosion inhibitor, ultraviolet absorber, light stabilizer, antibacterial agent, deodorant, pigment, flame retardant, antistatic agent, etc. have.

In an embodiment, the wear-resistant layer may be formed on the upper surface of the hard coating layer, and may further include a primer layer between the wear-resistant layer and the hard coating layer. In one or more embodiments, the primer layer may include a primer agent such as an epoxy-based compound of an ultraviolet curing agent, a thermal curing agent, a moisture curing agent, or a two-component curing agent. Polyamic acid and silane coupling agents may also be used as primers.

In one embodiment, the thickness of the primer layer is preferably 0.001 to 2 ㎛.

The method of forming the wear-resistant layer is not particularly limited, but for example, a primer layer is formed by applying, drying, and curing a primer agent as necessary on the upper surface of the hard coating layer, and then for forming a wear-resistant layer containing a fluorine-based compound It can be formed by applying and drying the composition. As the coating method, for example, dip coating, roll coating, bar coating, spin coating, spray coating, die coating, gravure coating, etc. may be used.

On the other hand, it is preferable to perform a hydrophilic treatment such as corona treatment or ultraviolet treatment on the coated surface before applying the primer or the composition for forming an abrasion resistance layer.

The window laminate according to an embodiment may be disposed in the order of the abrasion-resistant layer, the hard coating layer, the window substrate, the polarizing plate, and the touch sensor from the user's viewing side. In this case, since the sensing electrodes of the touch sensor are disposed under the polarization layer, it is possible to more effectively prevent the pattern recognition phenomenon. The window laminate according to some embodiments may be disposed in the order of the abrasion-resistant layer, the hard coating layer, the window substrate, the touch sensor, and the polarization layer from the user's viewing side.

The image display device may include a display panel and the above-described window laminate coupled to the display panel.

The display panel may include a pixel electrode, a pixel defining layer, a display layer, a counter electrode, an encapsulation layer, and the like disposed on the panel substrate.

A pixel circuit including a thin film transistor (TFT) may be formed on the panel substrate, and an insulating layer may be formed to cover the pixel circuit. The pixel electrode may be electrically connected to, for example, a drain electrode of the TFT on the insulating layer.

A pixel defining layer may be formed on the insulating layer to expose the pixel electrode to define a pixel area. A display layer is formed on the pixel electrode, and the display layer may include, for example, a liquid crystal layer or an organic light emitting layer.

A counter electrode may be disposed on the pixel defining layer and the display layer. The counter electrode may be provided as, for example, a common electrode or a cathode of the image display device. An encapsulation layer for protecting the display panel may be stacked on the opposite electrode.

In some embodiments, the display panel and the window laminate may be coupled through an adhesive layer. For example, the adhesive layer may have a viscoelasticity of about 0.2 MPa or less at -20 to 80°C. In this case, noise from the display panel may be shielded, and interfacial stress may be relieved during bending to suppress damage to the window laminate. In one embodiment, the viscoelasticity may be about 0.01 to 0.15 MPa.

The image display device may be inserted or mounted in an optical imaging device such as VR equipment, and substantially the above-described pixel unit and pixel circuit may be concealed through holes formed in the touch sensor. Accordingly, only desired images can be collected and edited and transformed through the optical imaging device.

Hereinafter, examples of the present invention will be specifically described. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms, and only these embodiments allow the disclosure of the present invention to be complete, and common knowledge in the art to which the present invention pertains It is provided to fully inform those who have the scope of the invention, and the present invention is only defined by the scope of the claims.

<Examples and Comparative Examples>

Examples 1-1 to 11-1 and Comparative Examples 1-1 to 2-1

Propylene glycol monomethyl ether acetate (propylene glycol monomethyl ether) in a concentration of 10 wt% of 50 parts by weight of melamine-based resin and 50 parts by weight of cinnamate-based resin on a 700 μm-thick carrier substrate made of soda lime glass. A separation layer composition diluted in acetate, PGMEA) was applied to a thickness of 300 nm. Thereafter, a separation layer was formed by drying at 150° C. for 30 minutes.

On the separation layer, a protective layer composition (40 parts by weight of a polyfunctional acrylic monomer and 60 parts by weight of an epoxy resin was mixed, and 30 parts by weight of diethylene glycol methyl ethyl ether (MEDG), PGMEA and 3-methoxybutanol, respectively, 40 parts by weight parts and 30 parts by weight of the solvent mixed so that the solid content has a ratio of 20 parts by weight) is applied to a thickness of 2 μm, photocured by irradiating UV at 200mJ/cm ² , and dried and cured at 230° C. for 30 minutes Thus, a protective layer was formed.

A refractive index matching solution (trade name: THRI-A02015PM, manufactured by TOK) was applied to a thickness of 90 nm on the protective layer, and photocured by irradiating UV at 200mJ/cm ² , and dried and cured at 230° C. for 30 minutes. Then, by using a sputter-etching process to etch the surface to show the surface silicon (Si) component content according to Table 1 below to form a refractive index matching layer, Examples 1-1 to 11 -1 and electrode structures according to Comparative Examples 1-1 to 2-1 were formed.

division Si content (at. %) Example 1-1 5 Example 2-1 4.5 Example 3-1 4 Example 4-1 3.5 Example 5-1 3 Example 6-1 2.5 Example 7-1 2 Example 8-1 1.5 Example 9-1 One Example 10-1 0.7 Example 11-1 0.5 Comparative Example 1-1 0 Comparative Example 2-1 5.5 surface component analysis device
Apparatus: XPS (Quantera II (Ulvac-PHI), manufactured by Ulvac Phi Co., Ltd.)
Vacuum reached: 3.8 x 10 ^-7 Torr
Excitation source: monochromatic Al Kα (1486.6 eV)
Output: 50 W, 15 kV
Detection area: 200 μmφ
Incident angle: 45°
Take-out angle: 45°
Pass energy: 55eV
Heavy gun: 1.0V, 20.0も
Elements to be analyzed: carbon (C), oxygen (O), silicon (Si)

Examples 1-2 to 11-2 and Comparative Examples 1-2 to 2-2

ITO was deposited to a thickness of 35 nm on the refractive index matching layer of the electrode structures of Examples 1-1 to 11-1 and Comparative Examples 1-1 to 2-1 at room temperature 25° C., and the ITO layer was deposited at 180° C. for 30 minutes. During annealing, electrode structures of Examples 1-2 to 11-2 and Comparative Examples 1-2 to 2-2 were prepared.

<Experimental example>

flatness evaluation

The electrode structures according to Examples 1-1 to 11-1 and Comparative Examples 1-1 to 2-1 were measured with a measuring device (MCPD-2000, manufactured by OTSUKA ELECTRONICS CO., LTD.) at wavelengths of 450 nm and 550 nm. was measured for transmittance. When the measured transmittance was 95% or more, flatness was evaluated as good, and the evaluation results are shown in Table 2 below.

<Criteria for flatness evaluation>

○: transmittance 95% or more

X: Transmittance less than 95%

division flattened Example 1-1 ○ Example 2-1 ○ Example 3-1 ○ Example 4-1 ○ Example 5-1 ○ Example 6-1 ○ Example 7-1 ○ Example 8-1 ○ Example 9-1 ○ Example 10-1 ○ Example 11-1 ○ Comparative Example 1-1 X Comparative Example 2-1 X

Adhesion evaluation

After attaching the adhesive film on the electrode structure according to Examples 1-2 to 11-2 and Comparative Examples 1-2 to 2-2, high-speed peeling was performed to evaluate the adhesion between the refractive index matching layer and the ITO electrode layer, and the evaluation result is shown in Table 3 below.

<Adhesiveness evaluation criteria>

◎ : Excellent adhesion

○: Good adhesion

△: normal adhesion

X: Poor adhesion

division adhesion Example 1-2 △ Example 2-2 △ Example 3-2 ○ Example 4-2 ◎ Example 5-2 ◎ Example 6-2 ◎ Example 7-2 ◎ Example 8-2 ◎ Example 9-2 ○ Example 10-2 △ Example 11-2 △ Comparative Example 1-2 X Comparative Example 2-2 X

Referring to Tables 2 and 3, the surface layer portion silicon (Si) content of the refractive index matching layer is 0.5 to 5 at.% Comparative Examples 1 to 11 in which the adhesion and flatness of the electrode structures shown in Examples 1 to 11 are out of the above range It can be seen that the adhesion and flatness of the electrode structure represented by 2 are superior to those of the electrode structure.

In particular, the electrode structures represented by Examples 3 to 9, in which the surface layer portion of the refractive index matching layer has a silicon (Si) content of 1 to 4 at.%, exhibit more improved adhesion compared to the electrode structures represented by Examples 1, 2, 10 and 11. It can be seen that there is

Therefore, the electrode structure of the present invention includes a refractive index matching layer with improved adhesion and flatness by appropriately setting the silicon (Si) content of the surface layer portion, thereby reducing the incidence of device defects compared to the conventional electrode structure and, at the same time, the image quality can be improved.

100: base material
110: separation layer
120: protective layer
200: refractive index matching layer
300: electrode layer

Claims (18)

base substrate;
a refractive index matching layer (IML) formed on the base substrate; and
Including an electrode layer formed on the refractive index matching layer (Index Matching Layer; IML),
The refractive index matching layer (Index Matching Layer; IML), the silicon (Si) content of the surface layer portion is 0.5 to 5.0 at.%, the electrode structure.
The electrode structure according to claim 1, wherein the surface layer portion is a region from the outermost surface of the index matching layer (IML) to 10 nm in the thickness direction.
The electrode structure of claim 1 , wherein the index matching layer (IML) includes at least one of an organic material and an inorganic material.
The electrode structure of claim 3 , wherein the organic material includes at least one selected from the group consisting of an acrylic compound and a silicone compound.
The method according to claim 3, wherein the inorganic material is zirconium oxide (ZrO ₂ ), niobium oxide (Nb ₂ O ₅ ), zinc oxide (ZnO), silicon oxide (SiO ₂ ), cerium oxide (CeO ₂ ), indium oxide (In ₂ ) O ₃ ) and titanium oxide (TiO ₂ ) Containing at least one selected from the group consisting of, the electrode structure.
The method according to claim 1, The refractive index matching layer (Index Matching Layer; IML) has a refractive index between the refractive index of the base substrate and the refractive index of the electrode layer, the electrode structure.
The method according to claim 1, The refractive index matching layer (Index Matching Layer; IML) transmittance is 95% or more, the electrode structure.
The electrode structure of claim 1 , wherein the index matching layer (IML) includes two or more layers having different refractive indices.
The electrode structure according to claim 1, wherein the base substrate includes a separation layer and a protective layer.
The method according to claim 1, wherein the electrode layer is Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), Zinc Oxide (ZnO), Indium Zinc Tin Oxide (IZTO), Cadmium Cadmium Tin Oxide (CTO), Aluminum Zinc Oxide (AZO), Gallium Zinc Oxidel GZO, PEDOT (poly(3,4-ethylenedioxythiophene)), Carbon Nano Tube CNT), graphene (Graphene), including at least one selected from the group consisting of a metal wire and a metal mesh (mesh), the electrode structure.
A touch sensor comprising the electrode structure of any one of claims 1 to 10.
window substrate; and
A window laminate comprising the touch sensor of claim 11 laminated on one surface of the window substrate.
The window laminate of claim 12 , further comprising a polarizing layer laminated on the one surface of the window substrate.
The window laminate of claim 13 , wherein an upper surface of the polarizing layer is laminated on the one surface of the window substrate, and an upper surface of the touch sensor is laminated on a lower surface of the polarizing layer.
The window laminate of claim 12 , further comprising a hard coating layer laminated on the other surface of the window substrate opposite to the one surface.
The window laminate of claim 15 , further comprising a wear-resistant layer laminated on the other surface of the window substrate.
The window laminate of claim 16 , wherein a bottom surface of the hard coating layer is laminated on the other surface of the window substrate, and a bottom surface of the abrasion resistance layer is laminated on an upper surface of the hard coating layer.
display panel; and
An image display device comprising the window laminate of claim 12 laminated on the display panel.

Images