KR20220091083A - Mask supporting module, mask aligning module, and substrate processing apparatus - Google Patents

Abstract

The present invention relates to a substrate processing apparatus, and more particularly, to a mask support module for supporting a mask, a mask alignment module, and a substrate processing apparatus.
The present invention, at least two adjustment support post parts (410, 420) for adjusting the horizontal position of the mask (20) and; and a plurality of dependent support post parts 430 passively horizontally moved together with the mask 20 while supporting the mask 20 according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420, At least one of the at least two adjustable support post parts 410 and 420 and the plurality of subordinate support post parts 430 includes a support rod part 840 installed to be movable in the vertical direction; and a mask support module 800 coupled to the upper end of the support rod 840 to support the mask 20 by surface contact, and the mask support module 800 includes the mask 20 by surface contact. a mask support member 820 for supporting the; The mask support member 820 is supported so that only rotational movement of the mask support member 820 about the support rotation axis C in the vertical direction is possible according to the adjustment of the horizontal position of the adjustment support posts 410 and 420 . Disclosed is a mask alignment module comprising an upper coupling part 830 coupled to an upper end of the rod part 840 .

Description

Mask supporting module, mask aligning module, and substrate processing apparatus

The present invention relates to a substrate processing apparatus, and more particularly, to a mask support module for supporting a mask, a mask alignment module, and a substrate processing apparatus.

The substrate processing apparatus refers to an apparatus that performs substrate processing such as depositing and etching the surface of a substrate seated on a susceptor under the shape of a process condition by applying power to a closed processing space.

At this time, for substrate processing using a mask for patterned substrate processing, a process of aligning the horizontal positions of the substrate and the mask is essential, and vision alignment is used for aligning the substrate and the mask.

Vision alignment is a technique for recognizing a specific point of an object to be aligned and aligning the object to an accurate position, and is used in a substrate processing apparatus to align a mask to an accurate alignment position with respect to a substrate.

On the other hand, alignment between the mask and the substrate is performed using a mask alignment system such as Patent Document 1 and the like.

Specifically, in the mask alignment system according to Patent Document 1, as shown in FIG. 6A of Patent Document 1, the mask is moved by point contact by a spherical ball bearing so that the mask can be moved while supporting the bottom surface of the mask. It has a structure that supports the bottom.

On the other hand, as substrates such as liquid crystal display (LCD), organic light emitting diode (OLED), solar cells and semiconductors are becoming larger, the substrate processing apparatus is also increasing in size.

In addition, the mask is also enlarged to cover the enlarged substrate, and the number of mask support posts installed in the substrate processing apparatus to support the mask while maintaining the flatness of the mask is also increasing.

In particular, as the number of mask support posts increases, the contact point between the mask and the mask support post increases, and friction and stress generated during alignment at the contact point between the mask and the mask support post due to the weight of the enlarged mask increases.

In addition, as the self-weight of the mask increases, the number of mask support posts for supporting the mask also increases, so that friction and stress at each support point increase due to the increase of the support points of the mask support posts.

Therefore, friction and stress are increased by the support by the contact point of the mask support post to the mask, which acts as a contamination source during substrate processing due to the generation of particles due to friction and scratches, and furthermore, is formed on the bottom surface of the mask by friction and stress. There is a problem in that it is difficult to perform precise mask alignment due to scratches.

In addition, friction and stress generated due to an increase in the self-weight of the mask make it impossible to move the mask in horizontal and/or vertical directions with respect to the mask support post, thereby making it difficult to align the mask.

(Patent Document 1) KR20-0484209 Y1

An object of the present invention is to minimize the generation of particles by enabling alignment of the substrate and the mask in a state in which the mask is supported by surface contact in order to solve the above problems and to perform precise alignment by preventing the formation of scratches. To provide a mask support module, a mask alignment module, and a substrate processing apparatus.

The present invention was created to achieve the object of the present invention as described above, and the present invention includes a process chamber 100 for performing substrate processing using a rectangular mask 20; a substrate support unit 200 installed in the process chamber 100 to support the substrate 10; A mask alignment module 400 of a substrate processing apparatus including a mask alignment unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10, for adjusting the horizontal position of the mask 20 at least two adjustable support posts for (410, 420) and; and a plurality of dependent support post parts 430 passively horizontally moved together with the mask 20 while supporting the mask 20 according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420, At least one of the at least two adjustable support post parts 410 and 420 and the plurality of subordinate support post parts 430 includes a support rod part 840 installed to be movable in the vertical direction; and a mask support module 800 coupled to the upper end of the support rod 840 to support the mask 20 by surface contact, and the mask support module 800 includes the mask 20 by surface contact. a mask support member 820 for supporting the; The mask support member 820 is supported so that only rotational movement of the mask support member 820 about the support rotation axis C in the vertical direction is possible according to the horizontal position adjustment of the adjustment support posts 410 and 420 . Disclosed is a mask alignment module comprising an upper coupling part 830 coupled to an upper end of the rod part 840 .

The mask 20 has a rectangular shape having a first side d1 to a fourth side d4 in a clockwise direction, and the adjustment support post parts 410 and 420 include the first side (d1) and a first adjustment support post portion 410 located in the first setting area (CR1) set among the second side (d2); The mask 20 may include a second adjustment support post 420 positioned in the second setting region CR2 set to be point-symmetric with the first setting region CR1 based on the rectangular planar shape of the mask 20 .

In accordance with the adjustment of the horizontal position of the adjustment support post parts 410 and 420, a horizontal movable part 500 installed on the support rod part 840 so that only horizontal linear movement of the mask support member 820 is possible. may include

The horizontal movable part 500 may include a body part 510 having a fixed position on a horizontal plane, and a sliding part 520 installed on an upper side of the body part 510 to be horizontally movable.

The horizontal movable part 500 may be installed outside the processing space S under the process chamber 100 .

The horizontal movable part 500, when the sliding part 520 deviates from the center C0, a restoring force forming member 540 that forms a restoring force so that the sliding part 520 is positioned at the center C0 is added. can be included as

The horizontal movable part 500 is connected through a piston part 521 installed to be movable up and down in the body part 510, and the sliding part 520 and the center shaft 523, and the body part ( It may include a disk part 527 which is installed to be horizontally movable in the 510 and whose horizontal movement is determined by vertical movement of the piston part 521 .

The mask support member 820 includes a rod portion 821 having a support surface 821a at an upper end that supports the bottom surface of the mask 20 by surface contact and extending in the support rotation axis C direction, and the It is coupled to the lower end of the rod portion 821 and includes a hub portion 822 having an outer diameter greater than the outer diameter of the rod portion 821 , wherein the upper coupling portion 830 is an upper end of the support rod portion 840 . A lower coupling member 831 coupled to the , and an upper coupling member 832 coupling the hub part 822 to the lower coupling member 831 so that the support surface 821a of the rod part 821 protrudes upward. ) may be included.

At least one of between the upper coupling member 832 and the hub part 822 and between the lower coupling member 831 and the hub part 822 limits the horizontal movement of the mask support member 820 and Rotation means may be provided to enable only rotation of the mask support member 820 with the support rotation shaft C as the rotation axis.

The rotation means includes a plurality of balls 833 arranged in a circle centered on the support rotation axis C, and the hub part so that a portion of the balls 833 are inserted in the direction of the support rotation axis C. One or more first insertion grooves 823 and 824 formed in 822, and the hub portion 822 of the upper coupling member 832 so that a portion of the ball 833 is inserted in the direction of the support rotation axis C and one or more second insertion grooves 832a formed on a surface opposite to can form a single ring shape.

The rotation means includes one or more third insertion grooves ( 831a), and the third insertion groove (831a) may form a ring shape centered on the support rotation shaft (C).

The third insertion groove (831a) and the first insertion groove (824) corresponding to the third insertion groove (831a) may form a plurality of concentric ring shapes centered on the support rotation shaft (C).

An auxiliary pressing member 850 is additionally installed between the hub part 822 and the lower coupling member 831, and the rotation means includes a portion of the ball 833 inserted in the direction of the support rotation axis C. One or more fourth insertion grooves 851 formed on a surface of the auxiliary pressing member 850 opposite to the hub portion 822 are included, and the fourth insertion grooves 851 are, the support rotation shaft (C) A ring shape centered on can be achieved.

The rotation means includes a plurality of balls 833 arranged in a circle centered on the support rotation axis C, and the hub part so that a portion of the balls 833 are inserted in the direction of the support rotation axis C. The hub portion 822 of the upper coupling member 832 such that at least one fifth insertion hole 825 formed vertically through the 822 and a portion of the ball 833 in the direction of the support rotation axis C are inserted. ), one or more second insertion grooves (832a) formed on a surface opposite to the other, and the hub portion (822) of the lower coupling member (831) so that a portion of the ball (833) is inserted in the direction of the support rotation axis (C). at least one third insertion groove (831a) formed on a surface opposite to It can form a single ring shape.

The mask support module 800 may further include an elastic means for directly or indirectly pressing the hub part 822 upward.

The elastic means may include one or more springs 834 installed between the hub part 822 and the lower coupling member 831 .

The present invention also includes a process chamber 100 for performing substrate processing using a rectangular mask 20; a substrate support unit 200 installed in the process chamber 100 to support the substrate 10; A mask alignment module 400 of a substrate processing apparatus including a mask alignment unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10, for adjusting the horizontal position of the mask 20 at least two adjustable support posts for (410, 420) and; and a plurality of dependent support post parts 430 horizontally moved together with the mask 20 while supporting the mask 20 according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420, wherein the at least two At least one of the adjustable support post portions 410 and 420 and the plurality of dependent support post portions 430 includes a support rod portion 840 installed to be movable in the vertical direction; As a mask support module 800 of the mask alignment module which is coupled to the upper end of the support rod 840 and includes a mask support module 800 for supporting the mask 20 by surface contact, the mask support module ( 800) discloses a mask support module, characterized in that it is composed of a mask support module 800 having the configuration as described above.

The present invention also includes a process chamber 100 for performing substrate processing using a rectangular mask 20; a substrate support unit 200 installed in the process chamber 100 to support the substrate 10; A substrate processing apparatus including a mask aligning unit 400 for aligning a relative horizontal position of a mask 20 with respect to a substrate 10, wherein the mask aligning unit 400 includes a mask alignment unit having the above configuration Disclosed is a substrate processing apparatus, characterized in that the module (400).

The horizontal movable unit 500 includes a free mode in which the mask support member 820 can be horizontally linearly moved according to the adjustment of the horizontal position of the adjustable support post parts 410 and 420 , and the adjustable support post part 410 . , controlling the operation of the sliding unit 520 between the free mode and the fixed mode so as to vary between the fixed modes in which the horizontal linear movement of the mask support member 820 is prevented after the adjustment of the horizontal position of the 420 is completed It may further include an operation control unit.

The operation control unit may include pneumatic control valves V1 , V2 , and V3 that transmit air pressure to the inside of the body 510 to control the vertical movement of the piston unit 521 .

It may further include a gas injection unit 300 installed on the substrate support unit 200 to inject a gas for performing the process.

The mask support module, the mask alignment module and the substrate processing apparatus according to the present invention enable the substrate and the mask to be aligned in a state in which the mask is supported by surface contact so that rotation about the vertical direction as a rotation axis is possible. During alignment, friction and stress on the mask are minimized to minimize the generation of particles, and there is an advantage in that precise alignment can be performed by preventing the formation of scratches on the mask.

Furthermore, the mask support module, the mask alignment module and the substrate processing apparatus according to the present invention have the advantage of preventing substrate contamination by minimizing the generation of particles, and greatly improving the production yield of the substrate by performing precise alignment.

In addition, when aligning the substrate and the mask, the upper surface supporting the mask generates a horizontal movement component with respect to the mask and a rotational movement component with the vertical direction as the axis of rotation depending on the mask support position. The mask support module and mask alignment module according to the present invention and the substrate processing apparatus can rotate about the vertical direction as a rotation axis, and by supporting the mask so that it can move horizontally with respect to the mask, it absorbs the horizontal movement component and the rotational movement component according to the alignment of the substrate and the mask, so that the plane relative to the mask Support by contact is possible.

1 is a cross-sectional view showing a substrate processing apparatus according to the present invention.
FIG. 2 is a partial perspective view showing a part of a mask and a mask alignment module in the substrate processing apparatus of FIG. 1 .
FIG. 3 is a plan view of the mask and mask alignment module shown in FIG. 2 .
4A is a partial bottom view showing an example of the first groove positioned in the first setting area in FIG. 3 , and FIG. 4B is a cross-sectional view taken along the IV-IV direction in FIG. 4A in FIG. 3 .
5A is a partial bottom view showing an example of the second groove positioned in the second setting area in FIG. 3 , and FIG. 5B is a cross-sectional view in the V-V direction in FIG. 5A in FIG. 3 .
6 is a cross-sectional view showing an example of the horizontal movable part shown in FIG.
7 is a partial cross-sectional view showing an example of the support post shown in FIG.
8A is a cross-sectional view showing an example of a mask support module constituting the support post shown in FIGS. 1 and 7 .
8B is an exploded perspective view of the mask support module shown in FIG. 8A.
9 is a cross-sectional view showing a modified example of the mask support module shown in FIGS. 8A and 8B.
10A and 10B are cross-sectional views showing another modified example of the mask supporting module shown in FIGS. 8A and 8B, respectively, and a perspective view showing a mask supporting member constituting the same.

Hereinafter, a mask support module, a mask alignment module, and a substrate processing apparatus according to the present invention will be described with reference to the accompanying drawings.

As shown in FIG. 1, a substrate processing apparatus according to the present invention includes a process chamber 100 for performing substrate processing using a rectangular mask 20; a substrate support unit 200 installed in the process chamber 100 to support the substrate 10; and a mask alignment unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10 .

Here, the substrate 10 to be processed is a substrate on which substrate processing such as patterned deposition and etching is performed by attaching the mask 20 to the substrate 10, and is a flat surface such as a substrate for LCD manufacturing, a substrate for OLED manufacturing, a substrate for solar cell manufacturing, etc. Any substrate is possible as long as the shape is a substrate having a rectangular shape.

And, if the substrate processing performed by the substrate processing apparatus according to the present invention is a substrate processing process that performs substrate processing such as deposition and etching using the mask 20 in the closed processing space S, a PECVD process, evaporation deposition, etc. Any process, such as a process, is possible.

On the other hand, the mask 20 is located on the upper side of the substrate 10 and is installed in close contact with the substrate 10 or spaced apart from it to perform substrate processing such as deposition and etching in a preset pattern, and has a preset pattern. Various configurations are possible, such as forming the openings of the.

Here, as shown in FIG. 2 , the mask 20 preferably has a rectangular shape corresponding to the planar shape of the rectangular substrate 10 .

In addition, as shown in FIG. 2 , the mask 20 is coupled to the edge of the mask sheet 22 and the mask sheet 22 having openings in a preset pattern according to deposition conditions by welding or the like. 22) may include a mask frame 21 supporting the.

In particular, the opening pattern formed in the mask sheet 22 may be formed in various patterns according to the required patterned substrate processing.

The process chamber 100 is configured to form a closed processing space (S) for substrate processing, and various configurations are possible.

For example, the process chamber 100 may include a chamber body 110 having an upper side opened, and an upper lid 120 detachably coupled to the opening of the chamber body 110 .

The chamber body 110 is a configuration in which the substrate support unit 200 is installed, and various configurations are possible, and one or more gates (not shown) on the inner wall for introducing and discharging the substrate 10 to the processing space S are possible. city) can be formed. And the process chamber 100 may be grounded.

In addition, the process chamber 100 can be configured in various ways depending on the type of substrate processing to be performed, and a gas supply unit 300 for supplying a processing gas for performing substrate processing according to process conditions, and for performing substrate processing. A power supply system, an exhaust system for pressure control and exhaust of the processing space S, etc. may be connected or installed.

For example, the gas ejection unit 300 is installed on the substrate support unit 200 to inject gas for process execution, and various configurations such as a showerhead are possible.

The gas injection unit 300 may include an injection plate (not shown) in which a plurality of gas injection ports (not shown) are formed, and is grounded as an upper electrode facing the substrate support unit 200 or RF power is applied. can be

In addition, the substrate support unit 200 is installed below the processing space S in the process chamber 100 to support the substrate 10 , and various configurations are possible depending on the substrate support structure.

For example, the substrate support unit 200 includes a substrate seating plate having a substrate seating surface on which the substrate 10 is mounted, and a support shaft installed below the substrate seating plate so that the substrate seating plate can move vertically. can do.

As shown in FIG. 1 , the substrate support unit 200 may be installed to be vertically movable for introduction and discharge of the substrate 10 through a gate (not shown), and furthermore, heating the substrate 10 . Alternatively, a temperature control member such as a heater may be additionally installed for temperature control such as cooling.

Also, the substrate support unit 200 may be grounded as a lower electrode of the substrate processing apparatus or RF power may be applied thereto.

In this case, the substrate support unit 200 may further include a lift pin 600 for lifting the substrate during loading or unloading of the substrate.

The lift pin 600 is installed through the substrate support unit 200 and lifts the substrate 10 from the upper surface of the substrate support unit 200 through relative vertical movement with the substrate support unit 200 or the upper surface of the substrate support unit 200 . can be mounted on

When alignment of the mask 20 with respect to the substrate 10 is required, the mask aligning unit 400 moves the substrate 10 and the mask 20 relative horizontally while supporting the mask 20 by lifting. ) as a configuration for aligning the relative horizontal position deviation, various configurations are possible depending on the relative movement and alignment method of the substrate 10 and the mask 20 .

For example, the mask aligning unit 400 includes a plurality of support post parts 410 , 420 , 430 supporting the bottom surface of the mask 20 , and a plurality of support post parts 410 , 420 , 430 up and down. An alignment module for aligning the relative horizontal positions of the substrate 10 and the mask 20 by horizontally moving at least some of the lifting unit 490 and the plurality of support post units 410 , 420 and 430 . (not shown) may be included.

The lifting unit 490 is a configuration that moves the plurality of support post parts 410, 420, 430 up and down, and individually raises and lowers the support post parts 410, 420, 430, or the support post part. Various configurations are possible, such as elevating one or more of the (410, 420, 430) as a group, or elevating the entire support post (410, 420, 430) at once.

The alignment module (not shown) is a configuration for aligning the relative horizontal positions of the substrate 10 and the mask 20 by horizontally moving at least some of the plurality of support post parts 410, 420, 430, Various configurations are possible according to the moving structure of at least some of the plurality of support post parts (410, 420, 430).

For example, the alignment module (not shown) may horizontally move at least two of the plurality of support post parts 410 , 420 , and 430 , for example, the two support posts 410 , 420 to form the substrate 10 . ) and the relative horizontal position of the mask 20 may be configured to align.

Meanwhile, the alignment module (not shown) may adopt the same structure as in Patent Document 1, but is not necessarily limited thereto.

The support post parts 410 , 420 , 430 include at least two adjustment support post parts 410 , 420 for adjusting the horizontal position of the mask 20 for horizontal alignment of the substrate 10 and the mask 20 . )Wow; It may include a plurality of subordinate support post parts 430 passively horizontally moved together with the mask 20 in a state in which the mask 20 is supported according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420 .

The at least two adjustment support post parts 410 and 420 are configured to adjust the horizontal position of the mask 20, and are horizontal by the alignment module (not shown) described above in a state in which the mask 20 is supported. They are the moving support post parts (410, 420).

In particular, the adjustment support post parts 410 and 420 have a first side ( d1) and a first adjustment support post part 410 positioned (a01) in the first setting region CR1 set among the second side d2; It may include a second adjustment support post part 420 positioned (a02) in the second setting area CR2 set to be point-symmetric with the first setting area CR1 based on the rectangular planar shape of the mask 20. .

The first adjustment support post part 410 is a support post part positioned in the first setting area CR1 set among the first side d1 and the second side d2, and supports the mask 20 . is preferably fixed.

At this time, as shown in FIGS. 4A and 4B to fix the position of the mask 20, particularly the portion supported by the first adjustment support post 410 among the bottom surfaces of the mask frame 21, the first adjustment A first recess 21a into which a portion of the upper end of the support post 410 is inserted may be formed.

The first groove 21a is a groove formed to fix a portion supported by the first adjustment support post portion 410 into which a portion of the upper end of the first adjustment support post portion 410 is inserted. It may be formed to correspond to the shape of the upper end of the support post 410 .

The second adjustment support post unit 420 is a support post located in the second setting region CR2 set in point symmetry with the first setting region CR1 based on the rectangular planar shape of the mask 20, Similar to the first adjustment support post part 410 , it is preferable that the position for supporting the mask 20 is fixed.

At this time, as shown in FIGS. 5A and 5B , in order to fix the position of the mask 20, in particular, the portion supported by the second adjustment support post 420 among the bottom surfaces of the mask frame 21, the second adjustment A second concave groove 21b into which a portion of the upper end of the support post 420 is inserted may be formed.

The second groove 21b is a groove formed to fix a portion supported by the second adjustment support post portion 420 into which a portion of the upper end of the second adjustment support post portion 420 is inserted. It may be formed to correspond to the shape of the upper end of the support post 420 .

On the other hand, the planar shape of the first concave groove 21a and the second concave groove 21b is the top planar shape of the first adjustment support post 410, such as circular and polygonal, respectively, for precise alignment, the second adjustment It is preferable to have substantially the same or slightly larger shape corresponding to the top planar shape of the support post part 420 .

That is, the first concave groove 21a and the second concave groove 21b may have the same planar shape as each other.

However, in the substrate processing apparatus according to the present invention, when the substrate processing can be performed in a high temperature environment, thermal expansion may occur. As shown in 5b, it may have a slot shape (slot-shaped recess with a constant length) extending in the direction of the virtual straight line L connecting the first recess 21a and the center of the planar shape of the mask 20. .

As shown in FIGS. 2 and 3 , the plurality of subordinate support post parts 430 support the mask 20 in a state in which the mask 20 is supported according to the horizontal position adjustment of the adjustment support post parts 410 and 420 . ) as support posts that are passively horizontally moved along with the third setting area along the edge of the mask 20 so as to stably support the mask 20 when the horizontal position is adjusted by the adjustment support post parts 410 and 420 Like (CR3), it can be placed in the positions (a1 to a6).

On the other hand, the support post portions (410, 420, 430) including the adjustable support post portions (410, 420) and the dependent support post portions 430, the support rod portion 840 is installed movably in the vertical direction and; It may include a mask support module 800 coupled to the upper end of the support rod 840 to support the mask 20 by surface contact.

The support rod part 840 is composed of one or more rods having a length in the vertical direction, and is installed to be movable in the vertical direction. ), various configurations are possible, such as being installed through the

The mask support module 800 is coupled to the upper end of the support rod 840 to support the mask 20 by surface contact, and various configurations are possible depending on the support structure of the mask 20 .

In particular, the mask support module 800 is a member separate from the support rod part 840 for maintenance in consideration of frequent contact with the mask 20, and is detachably installed with the support rod part 840. There is this.

On the other hand, the support post parts 410 , 420 , 430 including the adjustment support post parts 410 , 420 and the dependent support post parts 430 are to support the bottom surface of the mask 20 , in particular the mask frame 21 . do.

However, as the size of the mask 20 increases, the self-weight of the mask 20 increases, so that the support post parts 410 , 420 , 430 support the mask 20 , particularly the bottom surface of the mask frame 21 by point contact. There is a problem in that particles may be generated due to friction and stress concentration, or a misalignment may occur due to the formation of scratches on the bottom surface of the mask.

Accordingly, at least one of the support post parts 410 , 420 , 430 preferably supports the mask 20 , in particular, the bottom surface of the mask frame 21 by surface contact.

However, for the alignment of the substrate 10 and the mask 20, the relative movement of the mask 20 with respect to the substrate 10 is a linear component in the X and Y directions and a rotation component with the Z axis as the rotation axis. As configured, in order for the support post parts 410 , 420 , 430 to support the mask 20 , in particular, the bottom surface of the mask frame 21 by surface contact, the support post parts 410 , 420 , 430 are axial and Y It is necessary to absorb both the linear component in the lateral direction and the rotation component with the Z axis as the rotation axis.

Accordingly, at least one of the at least two adjustable support post parts 410 and 420 and the plurality of dependent support post parts 430 is, as shown in FIGS. 6 to 10 , the mask support module 800 surface a mask support member 820 for supporting the mask 20 by contact; In accordance with the horizontal position adjustment of the adjustment support posts (410, 420), the mask support member (820) is rotated around the support rotation axis (C) in the vertical direction to enable only the rotational movement of the mask support member (820) to the support rod part (840). ) may include an upper coupling portion 830 coupled to the upper end.

The mask support member 820 is a configuration in which the mask support module 800 supports the mask 20 by surface contact. Any configuration is possible as long as it can be configured.

For example, the mask support member 820 has a support surface 821a on the upper end that supports the bottom surface of the mask 20 by surface contact, and a rod portion 821 extending in the direction of the support rotation axis C and , may include a hub portion 822 coupled to the lower end of the rod portion 821 having an outer diameter greater than the outer diameter of the rod portion 821 .

Here, the horizontal cross-sectional shape of the rod part 821 is preferably circular in consideration of rotation with the support rotation shaft C as the rotation shaft.

The rod part 821 has a support surface 821a on its upper end that supports the bottom surface of the mask 20 by surface contact, and extends in the support rotation axis C direction. The upper coupling part 830 to be described later. It is installed so that at least a part of the upper side protrudes.

The hub portion 822 is coupled to the lower end of the rod portion 821 to be coupled to the support rod portion 840 by the upper coupling portion 830 to have an outer diameter greater than the outer diameter of the rod portion 821 . is composed

Meanwhile, the mask support member 820 may be made of an insulating material, for example, a ceramic material, for example, ZrO ₂ .

The upper coupling part 830 is a mask support member so that only rotational movement of the mask support member 820 about the support rotation axis C in the vertical direction is possible according to the horizontal position adjustment of the adjustment support posts 410 and 420 . As a configuration for coupling the 820 to the upper end of the support rod part 840 , various configurations are possible depending on the coupling structure of the mask support member 820 .

For example, the upper coupling part 830 includes a lower coupling member 831 coupled to the upper end of the support rod part 840 and a hub part such that the support surface 821a of the rod part 821 protrudes upward. It may include an upper coupling member 832 for coupling the 822 to the lower coupling member 831 .

The lower coupling member 831 is a configuration coupled to the upper end of the support rod portion 840, and extends the support rod portion 840 described above to the upper side and is attached to the upper end of the support rod portion 840 by a bolt or the like. Any configuration that can be combined is possible.

In addition, the lower coupling member 831 is a configuration for fixing the mask support member 820 , in particular the hub part 822 together with the upper coupling member 832 , and the upper coupling member 832 and the hub part 822 . Depending on the bonding structure of the structure can be determined.

The upper coupling member 832 is configured to couple the hub part 822 to the lower coupling member 831 so that the support surface 821a of the rod part 821 protrudes upward, and has a cylindrical rod part 821 . A through hole 832d is formed so as to protrude upward, and it extends downward to surround the hub portion 822 and may be configured to be coupled to the upper end of the lower coupling member 831 by a bolt.

Specifically, the upper coupling member 832 may have a cylindrical shape in which a through hole 832d is formed on the upper side and an inner shape corresponds to the outer shape of the hub part 822 .

The upper coupling member 832 and the lower coupling member 831 may have aluminum or an aluminum alloy material as a metal material, and the surface is preferably anodized.

On the other hand, the upper coupling part 830 composed of the upper coupling member 832 and the lower coupling member 831 restricts the horizontal movement of the mask support member 820 and uses the support rotation shaft C as the rotation axis. It is characterized in that the mask support member 820 is detachably coupled to the support rod part 840 so that only rotation of the support member 820 is possible.

Accordingly, in at least one of between the upper coupling member 832 and the hub portion 822 and between the lower coupling member 831 and the hub portion 822, the horizontal movement of the mask support member 820 is restricted and the support rotation shaft ( It is preferable that a rotation means is provided so that only rotation of the mask support member 820 with C) as the rotation axis is possible.

The rotation means is provided in at least one of between the upper coupling member 832 and the hub portion 822 and between the lower coupling member 831 and the hub portion 822 to limit the horizontal movement of the mask support member 820 and As a configuration in which only the rotation of the mask support member 820 with the support rotation shaft C as the rotation axis is possible, various possibilities are possible.

That is, the rotation means is a plurality of balls and one or more grooves formed in the upper coupling portion 830 and the mask support member 820 to limit the movement of the balls so that only rotational movement of the balls is possible with the support rotation shaft C as the rotation axis. can be composed of

As a specific example, the rotating means, as shown in Figs. 8a and 8b, a plurality of balls 833 arranged in a circle centered on the support rotation axis (C), and the support rotation axis (C) in the direction One or more first insertion grooves 823 and 824 formed in the hub portion 822 so that a portion of the ball 833 is inserted, and the upper coupling member 832 so that a portion of the ball 833 is inserted in the direction of the support rotation axis C ) may include one or more second insertion grooves (832a) formed on the surface opposite to the hub portion (822) of.

The plurality of balls 833 are installed in at least one of between the upper coupling member 832 and the hub part 822 and between the lower coupling member 831 and the hub part 822 to perform the function of the rotating means. As such, the diameter and number can be determined according to the installation location.

The material of the ball 833 is the same as or similar to that of the mask support member 820 , and may include a material of ceramic, for example, ZrO ₂ .

The one or more first insertion grooves 823 and 824 are grooves formed in the hub portion 822 so that a portion of the ball 833 is inserted in the direction of the support rotational axis C, and is a second insertion groove 832a to be described later. formed to correspond.

The one or more second insertion grooves 832a are grooves formed on the surface opposite to the hub portion 822 of the upper coupling member 832 so that a portion of the ball 833 is inserted in the direction of the support rotation axis C.

On the other hand, the first insertion grooves 823 and 824 and the second insertion grooves 832a limit the horizontal movement of the mask support member 820 and limit the rotation with the support rotation shaft (C) as the rotation axis so that only rotation is possible. It is preferable that at least one form a ring shape centered on the support rotation shaft (C).

That is, when the first insertion grooves 823 and 824 and the second insertion grooves 832a form an annular shape and further concentric circle shape around the support rotation shaft C, the balls 822 to be inserted are horizontally Since the movement is impossible, the horizontal movement of the mask support member 820 is limited, and only rotation with the support rotation axis C as the rotation axis may be possible.

On the other hand, the rotation means, one or more third insertion grooves (831a) formed on the surface opposite to the hub portion (822) of the lower coupling member (831) so that a part of the ball (833) is inserted in the direction of the supporting rotational axis (C). may include

That is, the ball 833 may be located on the bottom surface of the hub portion 822 , and one or more third insertion grooves 831a formed on a surface opposite to the hub portion 822 may be formed.

And the third insertion groove (831a) may form a ring shape centered on the support rotation shaft (C).

In addition, the third insertion recess 831a and the first insertion recess 824 corresponding to the third insertion recess 831a may form a plurality of concentric ring shapes centered on the support rotation shaft C.

On the other hand, a fine inclination, ie, tilting, can be achieved with respect to the support rotation axis C according to the support state of the mask support member 820 supporting the bottom surface of the mask 20, so it needs to be configured to absorb it.

Accordingly, an elastic means for directly or indirectly pressing the hub part 822 upward may be additionally installed between the hub part 822 and the lower coupling member 831 .

The elastic means is installed between the hub part 822 and the lower coupling member 831 to directly or indirectly press the hub part 822 upward, and may include one or more installed springs 834. have.

Specifically, the elastic means may be installed as a coil spring centered on the support rotation shaft (C), or may be installed in plurality in the circumferential direction around the support rotation shaft (C).

And, for the installation of the elastic means, the hub portion 822 and the lower coupling member 831 may have installation recesses 832e and 834a for spring installation, respectively.

The installation grooves 832e and 834a are grooves formed in the hub portion 822 and the lower coupling member 831 for the installation of the elastic means, and the grooves formed for the stable installation of the elastic means such as a coil spring are All is possible.

In addition, the elastic means is installed between the hub part 822 and the lower coupling member 831 to apply elasticity to the mask support member 820 , that is, the hub part 822 , so that it has a fine inclination with respect to the support rotation axis C, that is, While tilting is applied, the hub portion 822 may be pressed by the upper coupling member 832 with the ball 833 interposed therebetween.

In addition, the elastic means also serves to provide a buffer and restoring force for the load applied to the mask support member 820 by the mask 20 , so that the stress applied to the mask 20 by the mask support member 820 . can be minimized.

On the other hand, the mask support module 800 having the above configuration has various embodiments other than the embodiment shown in FIGS. 8A and 8B according to the hub part 822, the upper coupling member 832 and the lower coupling member 831. It is possible.

As a modification, as shown in FIG. 9 , in the mask support module 800 , an auxiliary pressing member 850 may be additionally installed between the hub part 822 and the lower coupling member 831 .

The auxiliary pressing member 850 is a complementary structure to the embodiment shown in FIGS. 8A and 8B , and is installed between the hub part 822 and the lower coupling member 831 on the upper and lower surfaces of the hub part 822 . As a configuration in which the positioned ball 833 is in close contact, it may have a shape similar to that of the hub part 822 .

At this time, the auxiliary pressing member 850 is a part of the rotation means, and on the surface opposite to the hub part 822 of the auxiliary pressing member 850 so that a part of the ball 833 is inserted in the direction of the supporting rotation axis (C). One or more fourth insertion grooves 851 may be formed.

The fourth insertion groove 851 is a groove formed on the surface opposite to the hub part 822 of the auxiliary pressing member 850 so that a part of the ball 833 is inserted in the direction of the support rotation axis C, FIG. It is a groove replacing the third insertion groove 831a shown in 8a.

Meanwhile, the fourth insertion groove 851 may have a ring shape centered on the support rotation shaft (C).

And the elastic means, as shown in Figure 9, is installed in the auxiliary pressing member 850 and the lower coupling member 831, the auxiliary pressing member 850 and the lower coupling member 831 is each of the installation of the elastic means For installation grooves (852, 834b) may be formed.

As a modification, the mask support module 800, as shown in FIGS. 10A and 10B, as an elastic means, a plurality of balls 833 arranged in a circle centered on the support rotation axis C are installed. and at least one fifth insertion hole 825 formed vertically through the hub portion 822 so that a portion of the ball 833 is inserted in the direction of the support rotational axis (C), and the ball 833 in the direction of the support rotational axis (C). At least one second insertion groove (832a) formed on the surface opposite to the hub part (822) of the upper coupling member (832) to insert a portion of the ball (833) in the direction of the support rotation axis (C) so that a portion of the ball (833) is inserted One or more third insertion grooves (831a) formed on the surface opposite to the hub portion (822) of the lower coupling member (831) may be included.

In the embodiment shown in FIGS. 10A and 10B , the ball 833 is installed through the hub part 822 , and the protruding parts from the ball 822 to the upper and lower surfaces of the hub part 822 are inserted. It is characterized in that the second insertion groove (832a) and the third insertion groove (831a) are formed in the upper coupling member (832) and the lower coupling member (831), respectively.

The fifth insertion hole 825 is formed as a hole having an inner diameter corresponding to the outer diameter of the ball 833 in the circumferential direction with respect to the support rotation shaft C.

And at least one of the second insertion groove (832a) and the third insertion groove (831a) may form a ring shape centered on the support rotation shaft (C).

The mask support module 800 having the above structure may be coupled to the upper end of the support rod part 840 to support the mask 20, particularly the bottom surface of the mask frame 21 by surface contact.

And the mask support module 800 having the above structure, among the plurality of support post parts 410, 420, 430, together with the mask 20 by the active movement of the adjustment support post parts 410 and 420 Considering that the plurality of subordinate support post parts 430 are passively horizontally moved, it is preferably applied to the plurality of subordinate support post parts 430 in order to prevent friction with the mask 20 .

On the other hand, the mask support module 800 having the above structure has a problem in that it is impossible to move in the horizontal direction as the mask 20, in particular, the bottom surface of the mask frame 21 is supported by surface contact.

Accordingly, in combination with the mask support module 800 having the above structure, horizontal movement among the plurality of support post parts 410 , 420 , 430 is possible to enable horizontal movement according to the alignment state of the mask 20 . The support post requiring ) may be additionally included.

As shown in FIGS. 6 and 7 , the horizontal movable part 500 includes a body part 510 having a fixed position on a horizontal plane, and a sliding part installed horizontally movably on the upper side of the body part 510 . 520 may be included.

At this time, the horizontal movable part 500 may be installed at the lower end of the support rod part 840 , in particular, outside the process chamber 100 , and an upper plate member 526 for coupling with the support rod part 840 . It can be installed on the upper side.

The upper plate member 526 is a configuration in which the upper plate member 526 is installed on the upper side so as to be coupled to the lower end of the support rod part 840, and maintains airtightness of the processing space S between the process chambers 100. A bellows member (B) may be installed along the circumference of the support rod part 840 for this purpose.

The sliding table 520 may be coupled to the lower side of the support rod 840 in a configuration to be slidably installed on a horizontal plane within a preset movement range with respect to the body 510 .

The upper end of the support rod part 840 is coupled to a mask support module 800 that supports the mask 20 by surface contact, and when the mask 20 moves, the sliding table 520 moves with the body part 510 ) can be moved horizontally, and as a result, the surface contact state of the mask support module 800 and the mask 20 can be maintained.

In addition, the horizontal movable unit 500, the horizontal movable unit 500, when the sliding table 520 deviates from the center (C0), the sliding table 520 is located in the center (C0) to form a restoring force to form a restoring force A member 528 may be further included.

The restoring force forming member 528 is an elastic member that forms a restoring force so that the sliding table 520 is positioned at the center C0 when the sliding table 520 deviates from the center C0, and various configurations are possible.

That is, when the support rod part 840 is horizontally moved by the restoring force forming member 528 and the external force due to the interaction between the support rod part 840 and the mask 20 disappears, the support rod part 840 automatically centers It can be returned to (C0).

Here, the center C0 in which the support rod part 840 is positioned in a state where no external force is applied to the support rod part 840 may be defined as a reference position of the support rod part 840 .

In one embodiment, the horizontal movable unit 500, as shown in FIG. 6, may be configured like a centering module.

Specifically, the horizontal movable part 500 is connected through a piston part 521 installed movably up and down in the body part 510, a sliding table 520 and a center shaft 523, and the body part ( It is installed to be horizontally movable in the 510 and may further include a disk portion 527 whose position is fixed or released by vertical movement of the piston portion 521 .

At this time, the restoring force forming member 528 may be installed between the central shaft 523 and the piston part 521 as an elastic member (conical spring).

When the fixation of the disk portion 527 is released by the piston portion 521 , the disk portion 527 , the center shaft 523 , and the sliding table 520 may be horizontally moved with respect to the body portion 510 , , when it is deviating from the center C0 by the restoring force forming member 528, it may be restored back to the center C0 if there is no other external force.

Since the support rod part 840 is coupled to the sliding table 520, it can be moved in conjunction with each other on a horizontal plane.

On the other hand, when the mask 20 itself needs to be replaced after repeating the substrate processing process or when an alignment mark needs to be imaged for alignment, the horizontal position of the support rod part 840 needs to be fixed at a specific point This can happen.

To this end, the horizontal movable unit 500 includes a free mode operated by horizontal movement of the mask 20 supported by the support rod unit 840 within a preset movement range on a horizontal plane, and the support rod unit 840 . ), the operation mode can be varied between fixed modes in which it is fixed at a specific position within the movement range.

To this end, the substrate processing apparatus may further include an operation control unit for changing the operation of the sliding table 520 between the free mode and the fixed mode.

In this case, the operation control unit may include a pneumatic control valve (V1, V2, V3) for transmitting air pressure into the body portion 510 to control the vertical movement of the piston unit 521 .

To this end, two air spaces for vertical movement of the piston part 521 may be formed in the body part 510 .

Air ports (P1, P2) are respectively connected to the two air spaces, and pneumatic control valves (V2, V2) are connected to the air ports (P1, P2), respectively, so that air in-out to each air port (P1, P2) This can be controlled.

For example, when air is introduced into the air port P1 and air is discharged through the air port P2, the piston part 521 moves downward and presses the disk part 527 accordingly to fix the disk part 527. have.

Since the disk part 527 is fixed by the piston part 521 , the horizontal movable part 500 may operate in a fixed mode in which it is fixed at a specific position within a movement range.

Conversely, when air is discharged to the air port P1 and air is introduced to the air port P2, the piston unit 521 moves upward, and thus the pressure of the disk unit 527 may be released.

Since the disk part 527 is released by the piston part 521 , the horizontal movable part 500 may operate in a free mode operated by the frictional force within a preset movement range.

In the free mode, a restoring force may be applied to the sliding table 520 to return to the center C0 by the restoring force forming member 528 .

The operation control unit, by controlling the pneumatic control valves (V1, V2, V3), the sliding table 520 can be fixed by changing the free mode to the fixed mode at a position deviated from the center (C0) to the sliding table (520) .

Alternatively, the operation control unit may fix the sliding table 520 to the center C0 by controlling the pneumatic control valves V1, V2, and V3.

The pneumatic control valve V3, which has not been described, is a valve connected to the air port P3 communicating with the space where the disk part 527 under the body part 510 is installed, and for discharging the particles inside the body part 510 to the outside. It may be a valve for

Although not shown, the horizontal movable unit 500 may further include means for allowing the sliding table 520 to be accurately positioned at the center C0 and fixed to the center C0 in addition to the restoring force forming member 528. .

Reference numeral 700 not described in FIG. 1 denotes a vision camera for alignment, and an alignment mark on the substrate 10 and the mask 20 through the window 702 of the process chamber 100 and the opening of the substrate support unit 200 . can be imaged.

The imaged alignment mark may be used to determine whether the substrate 10 and the mask 20 are aligned.

Meanwhile, the horizontal movable unit 500 is preferably installed outside the processing space S under the process chamber 100 in consideration of the pneumatic control described above.

Since the above has only been described with respect to some of the preferred embodiments that can be implemented by the present invention, as noted, the scope of the present invention should not be construed as being limited to the above embodiments, and It will be said that the technical idea and the technical idea accompanying the fundamental are all included in the scope of the present invention.

100: process chamber 200: substrate support part
400: mask alignment module 410, 420, 430: support post part
800: mask support module 840: support rod part
820: mask support member 830: upper coupling part

Claims (20)

a process chamber 100 for performing substrate processing using a rectangular mask 20;
a substrate support unit 200 installed in the process chamber 100 to support the substrate 10;
A mask alignment module 400 of a substrate processing apparatus comprising a mask alignment unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10, comprising:
at least two adjustment support posts 410 and 420 for adjusting the horizontal position of the mask 20;
It includes a plurality of dependent support post parts 430 that are passively horizontally moved together with the mask 20 while supporting the mask 20 according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420,
At least one of the at least two adjustable support post parts (410, 420) and the plurality of dependent support post parts (430),
a support rod unit 840 installed to be movable in the vertical direction;
and a mask support module 800 coupled to the upper end of the support rod 840 to support the mask 20 by surface contact,
The mask support module 800,
a mask support member 820 for supporting the mask 20 by means of a surface contact;
The mask support member 820 is supported so that only rotational movement of the mask support member 820 about the support rotation axis C in the vertical direction is possible according to the adjustment of the horizontal position of the adjustment support posts 410 and 420 . Mask alignment module comprising an upper coupling portion 830 coupled to the upper end of the rod portion (840). The method according to claim 1,
The mask 20 has a rectangular shape having a first side (d1) to a fourth side (d4) along a clockwise plane shape,
The adjustment support post part (410, 420) includes: a first adjustment support post part (410) positioned in a first setting area (CR1) set among the first side (d1) and the second side (d2);
and a second adjustment support post part 420 positioned in a second setting area CR2 set in point symmetry with the first setting area CR1 based on the rectangular planar shape of the mask 20. mask alignment module. The method according to claim 1,
In accordance with the adjustment of the horizontal position of the adjustment support post parts 410 and 420, a horizontal movable part 500 installed on the support rod part 840 so that only horizontal linear movement of the mask support member 820 is possible. Mask alignment module, characterized in that it comprises. 4. The method according to claim 3,
The horizontal movable unit 500,
A mask alignment module comprising: a body part 510 fixedly installed in a horizontal position; and a sliding part 520 installed horizontally movably on an upper side of the body part 510 . 5. The method according to claim 4,
The horizontal movable part (500) is a mask alignment module, characterized in that installed outside the processing space (S) under the process chamber (100). 5. The method according to claim 4,
The horizontal movable unit 500,
Mask alignment, characterized in that it further comprises a restoring force forming member 540 for forming a restoring force so that the sliding part 520 is positioned at the center (C0) when the sliding part 520 deviates from the center (C0) in-module. 5. The method according to claim 4,
The horizontal movable unit 500,
A piston part 521 installed movably up and down in the body part 510 is connected through the sliding part 520 and the center shaft 523 and is installed movably horizontally in the body part 510, The mask alignment module, characterized in that it comprises a disk part (527) whose horizontal movement is determined by the vertical movement of the piston part (521). The method according to claim 1,
The mask support member 820,
A support surface 821a is formed on the upper end to support the bottom surface of the mask 20 by surface contact, and a rod portion 821 extending in the direction of the support rotation axis C;
and a hub portion 822 coupled to the lower end of the rod portion 821 and having an outer diameter greater than the outer diameter of the rod portion 821,
The upper coupling portion 830,
a lower coupling member 831 coupled to the upper end of the support rod 840;
Mask alignment comprising an upper coupling member 832 coupling the hub portion 822 to the lower coupling member 831 so that the support surface 821a of the rod portion 821 protrudes upward. module. 9. The method of claim 8,
At least one of between the upper coupling member 832 and the hub portion 822 and between the lower coupling member 831 and the hub portion 822,
A mask alignment module, characterized in that the mask alignment module is provided with rotation means for limiting the horizontal movement of the mask support member (820) and allowing only the rotation of the mask support member (820) with the support rotation shaft (C) as the rotation axis. 10. The method of claim 9,
The rotating means,
A plurality of balls (833) arranged in a circle centered on the support rotation shaft (C),
One or more first insertion grooves (823, 824) formed in the hub part (822) so that a part of the ball (833) is inserted in the direction of the support rotation axis (C);
At least one second insertion groove (832a) formed on the surface opposite to the hub part (822) of the upper coupling member (832) so that a portion of the ball (833) is inserted in the direction of the support rotational axis (C) and ,
At least one of the first insertion grooves (823, 824) and the second insertion grooves (832a) has a ring shape centered on the support rotation shaft (C). 11. The method of claim 10,
The rotating means,
At least one third insertion groove (831a) formed in the surface opposite to the hub part (822) of the lower coupling member (831) so that a part of the ball (833) is inserted in the direction of the support rotational axis (C) and ,
The third insertion groove (831a) is,
Mask alignment module, characterized in that forming a ring shape centered on the support rotation shaft (C). 12. The method of claim 11,
The third insertion recess (831a) and the first insertion recess (824) corresponding to the third insertion recess (831a) are formed in a plurality of concentric ring shapes centered on the support rotation shaft (C), characterized in that Mask alignment module. 11. The method of claim 10,
An auxiliary pressing member 850 is additionally installed between the hub part 822 and the lower coupling member 831,
The rotating means,
One or more fourth insertion grooves 851 formed on the surface opposite to the hub portion 822 of the auxiliary pressing member 850 so that a part of the ball 833 is inserted in the direction of the support rotation axis C. ,
The fourth insertion groove 851 is,
Mask alignment module, characterized in that forming a ring shape centered on the support rotation shaft (C). 10. The method of claim 9,
The rotating means,
A plurality of balls (833) arranged in a circle centered on the support rotation shaft (C),
At least one fifth insertion hole 825 vertically penetrating through the hub portion 822 so that a portion of the ball 833 is inserted in the direction of the support rotation axis C;
One or more second insertion grooves (832a) formed on the surface opposite to the hub part (822) of the upper coupling member (832) so that a part of the ball (833) is inserted in the direction of the support rotation axis (C);
At least one third insertion groove (831a) formed in the surface opposite to the hub part (822) of the lower coupling member (831) so that a part of the ball (833) is inserted in the direction of the support rotational axis (C) and ,
At least one of the second insertion groove (832a) and the third insertion groove (831a) is,
Mask alignment module, characterized in that forming a ring shape centered on the support rotation shaft (C). 11. The method of claim 10,
Mask alignment module, characterized in that it further comprises an elastic means for directly or indirectly pressing the hub portion (822) upward. 16. The method of claim 15,
The elastic means,
The mask alignment module, characterized in that it includes one or more springs (834) installed between the hub part (822) and the lower coupling member (831). a process chamber 100 for performing substrate processing using a rectangular mask 20; a substrate support unit 200 installed in the process chamber 100 to support the substrate 10; A mask alignment module 400 of a substrate processing apparatus comprising a mask alignment unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10, comprising:
at least two adjustment support posts 410 and 420 for adjusting the horizontal position of the mask 20;
It includes a plurality of dependent support post parts 430 that are horizontally moved together with the mask 20 while supporting the mask 20 according to the adjustment of the horizontal position of the adjustment support post parts 410 and 420,
At least one of the at least two adjustable support post parts (410, 420) and the plurality of dependent support post parts (430),
a support rod unit 840 installed to be movable in the vertical direction;
As a mask support module 800 of the mask alignment module including a mask support module 800 coupled to the upper end of the support rod 840 to support the mask 20 by surface contact,
The mask support module 800 is a mask support module, characterized in that the mask support module 800 according to any one of claims 1 to 16. a process chamber 100 for performing substrate processing using a rectangular mask 20;
a substrate support unit 200 installed in the process chamber 100 to support the substrate 10;
A substrate processing apparatus including a mask aligning unit 400 for aligning a relative horizontal position of the mask 20 with respect to the substrate 10,
The mask alignment unit 400 is a substrate processing apparatus, characterized in that the mask alignment module 400 according to any one of claims 1 to 16. 19. The method of claim 18,
The horizontal movable unit 500,
a free mode in which the mask support member 820 can be horizontally linearly moved in accordance with the adjustment of the horizontal position of the adjustment support post parts 410 and 420;
After the adjustment of the horizontal position of the adjustment support post parts 410 and 420 is completed, the horizontal linear movement of the mask support member 820 is changed between the fixed modes in which it is prevented.
and an operation control unit for controlling the operation of the sliding unit (520) between the free mode and the fixed mode. 20. The method of claim 19,
The operation control unit,
and a pneumatic control valve (V1, V2, V3) for transmitting pneumatic pressure into the body part (510) to control vertical movement of the piston part (521).

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