KR20220072836A - Method for manufacturing transparent conductive film - Google Patents

Abstract

Provided is a method for manufacturing a transparent conductive film including metal nanowires and having small conductive anisotropy.
The method for producing a transparent conductive film of the present invention comprises: an application step of forming an application layer by applying a composition for forming a transparent conductive layer containing metal nanowires to the substrate while conveying a long substrate; and a blowing step of drying the coating layer to form a transparent conductive layer on the substrate; includes blowing of

Description

Method for manufacturing transparent conductive film

The present invention relates to a method for producing a transparent conductive film.

BACKGROUND ART Conventionally, in an image display device having a touch sensor, a transparent conductive film obtained by forming a metal oxide layer such as ITO (indium-tin composite oxide) on a transparent resin film is used as an electrode of the touch sensor. However, the transparent conductive film provided with this metal oxide layer has a problem that it is easy to lose electroconductivity by bending|flexion, and it is difficult to use for uses which require flexibility, such as a flexible display.

On the other hand, as a transparent conductive film with high flexibility, the transparent conductive film containing a metal nanowire is known. A metal nanowire is a wire-like conductive substance whose diameter is a nanometer size. In the transparent conductive film composed of metal nanowires, when the metal nanowires become mesh-like, a good electrical conduction path is formed with a small amount of metal nanowires, and openings are formed in the gaps between the meshes, so that high light transmittance is realized. . On the other hand, since a metal nanowire is a wire form, it is easy to arrange|position in the state which has orientation, Therefore, there exists a problem that electrically conductive anisotropy arises in the transparent conductive film containing a metal nanowire.

Japanese Patent Publication No. 2009-505358 Japanese Patent No. 6199034

The present invention has been made in order to solve the above problems, and an object thereof is to provide a method for manufacturing a transparent conductive film containing metal nanowires and having small conductive anisotropy.

The method for producing a transparent conductive film of the present invention is a method for producing a transparent conductive film comprising a substrate and a transparent conductive layer disposed on one side of the substrate, wherein metal nanowires are applied to the substrate while conveying the elongated substrate. A coating step of forming a coating layer by applying the composition for forming a transparent conductive layer containing includes blowing.

In one embodiment, the ventilation in the said ventilation process is implemented from two or more directions.

In one embodiment, the direction of the ventilation in the ventilation process seen from the said application layer surface side of the said base material includes the direction toward the width direction both outer sides from the width direction inner side of the base material.

In one embodiment, the direction of the ventilation in the ventilation process seen from the said application layer surface side of the said base material includes the direction toward the width direction inner side from the width direction both outer sides of the base material.

In one embodiment, the ventilation in the said ventilation process is spiral ventilation.

ADVANTAGE OF THE INVENTION According to this invention, the method of manufacturing a transparent conductive film with small electrically conductive anisotropy can be provided.

1(a)-(e) is a schematic plan view explaining the ventilation direction in the ventilation process in one Embodiment of this invention. (a') - (e') are schematic diagrams explaining the ventilation direction in the ventilation process in one Embodiment of this invention.
It is a schematic sectional drawing of the transparent conductive film obtained by the manufacturing method by one Embodiment of this invention.

A. Outline of manufacturing method of transparent conductive film

A method for producing a transparent conductive film of the present invention includes a coating step of forming an application layer by applying a composition for forming a transparent conductive layer containing metal nanowires to the substrate while conveying a long substrate; including a blowing process. According to the manufacturing method of this invention, the transparent conductive film provided with the transparent conductive layer arrange|positioned on one side of a base material and a base material is obtained. The manufacturing method of this invention may include other arbitrary appropriate processes other than the said application|coating process and a ventilation process. In one embodiment, the manufacturing method may further include a drying process of drying the application layer after the blowing process. In another embodiment, the said ventilation process is a process which can dry the said application layer, and a transparent conductive layer is formed through a ventilation process.

Typically, the coating process and the blowing process (and other processes such as a drying process if necessary) are performed while the base material in a roll state is drawn out and the base material is conveyed, and the base material and the base material are arranged on one side A long transparent conductive film provided with a transparent conductive layer is formed. In one embodiment, the said transparent conductive film is wound up after formation. In the present invention, the blowing in the blowing step includes blowing in a direction different from the conveying direction of the substrate. The direction different from the conveyance direction of a base material is a direction different from the conveyance direction of a base material when viewed from the application layer surface side of a base material; a direction not parallel to the substrate surface; And it is a concept including the direction which is different from the conveyance direction of a base material, and is not parallel to the surface of a base material, when it sees from the application layer surface side of a base material. In one embodiment, the blowing in a direction different from the conveyance direction of a base material is a direction different from the conveyance direction of a base material as seen from the application layer surface side of a base material, and is parallel or not parallel to the base material surface. In another embodiment, the blowing in a direction different from the conveyance direction of the substrate is a direction different from the conveyance direction of the substrate or a direction substantially parallel to the conveyance direction of the substrate when viewed from the application layer surface side of the substrate, and A direction that is not parallel to the surface. In addition, in this specification, the "non-parallel direction" means that the angle with respect to the direction/plane (substrate surface) used as a reference|standard is 5 degrees or less.

1(a) - (e) are schematic plan views explaining the ventilation direction in the ventilation process in one Embodiment of this invention. 1(a') - (e') are schematic diagrams explaining the ventilation direction in the ventilation process in one Embodiment of this invention. Fig. 1 (a') is a schematic front view (viewed from the transparent conductive film winding side) of Fig. 1 (a), and Fig. 1 (b') is a schematic front view of Fig. 1 (b). Fig. 1(c') is a schematic side view of Fig. 1(c), and Fig. 1(d') is a schematic side view of Fig. 1(d). Fig. 1(e') is a schematic front view of Fig. 1(e).

In one embodiment, as shown to Fig.1 (a) and (b), the blowing direction in the blowing process seen from the application layer 21 surface side of the base material 10 is at least the application layer surface side of a base material. It is a direction different from the conveyance direction of a base material as seen from, and the said ventilation is implemented in two or more directions.

In the embodiment shown in FIG. 1( a ), the direction (also referred to as the ventilation direction X) of the ventilation in the ventilation step seen from the application layer 21 surface side of the substrate 10 is the width direction of the substrate 10 . It includes a direction toward the inside in the width direction from both sides. In this embodiment, the angle between the conveying direction A of the substrate and the blowing direction X is greater than 0° and less than 180°, preferably 30° to 150°, more preferably 60° to 120°, still more preferably Preferably it is 60 degrees - 100 degrees, More preferably, it is 60 degrees - 95 degrees, More preferably, it is 75 degrees - 95 degrees, Especially preferably, it is 85 degrees - 95 degrees. In addition, you may blow the wind from the width direction outside of the base material 10 to the width direction inner side in fan shape.

In the embodiment shown in FIG. 1(b) , the direction (also referred to as the ventilation direction X) of the ventilation in the ventilation step viewed from the application layer 21 surface side of the substrate 10 is the width direction of the substrate 10 . It includes directions from the inside toward both sides in the width direction. In this embodiment, the angle between the conveying direction A of the substrate and the blowing direction X is greater than 0° and less than 180°, preferably 30° to 150°, more preferably 60° to 120°, further Preferably it is 60 degree - 100 degree, More preferably, it is 60 degree - 95 degree, More preferably, it is 75 degree - 95 degree, Especially preferably, it is 85 degree - 95 degree. In addition, you may blow the wind from the width direction inner side of the base material 10 to the width direction outer side in fan shape.

As an embodiment in which the blowing is performed in two or more directions, as shown in Figs. 1(c) and (d), in addition to the form shown in Figs. flow as a spiral) embodiment. In the case of spirally blowing air, the direction X' of the spiral axis of the wind as seen from the surface side of the coating layer 21 of the substrate 10 may be parallel to, or parallel to, the conveyance direction A of the substrate, as shown in Fig. 1(c). This may not be the case. In one embodiment, the angle between the direction X' of the spiral axis of the wind seen from the application layer 21 face side of the substrate 10 and the conveyance direction A of the substrate is preferably 0° to 60°, and more Preferably it is 0 degree - 45 degree, More preferably, it is 0 degree - 30 degree. In another embodiment, the angle between the direction X' of the spiral axis of the wind seen from the application layer 21 face side of the substrate 10 and the conveyance direction A of the substrate is preferably 60° to 120°, more preferably It is usually 80° to 100°. In another embodiment, the angle between the direction X' of the helical axis of the wind seen from the surface side of the application layer 21 of the substrate 10 and the conveyance direction A of the substrate is preferably 120° to 180°, and more Preferably it is 150 degree - 180 degree. When the wind is blown spirally, the direction Z' of the helical axis of the wind as seen from the side surface of the base material 10 may be parallel to the conveyance direction A of the base material (Fig. 1(c')) or may not be parallel. . In one embodiment, the angle between the direction Z' of the helical axis of the wind and the conveyance direction A of the substrate as viewed from the side surface of the substrate 10 is preferably 0° to 60°, more preferably 0° ° to 30 °. In another embodiment, the angle between the direction Z' of the helical axis of the wind and the conveyance direction A of the substrate as viewed from the side surface of the substrate 10 is preferably 60° to 120°, more preferably 80° ˜100° (FIG. 1(d')). In addition, in this specification, in order to distinguish it from the wind blowing in a spiral shape, like the wind shown in FIGS. 1(a), (b) and (e), a wind blowing in a substantially constant direction rather than a spiral is called a rectifying wind. .

In one embodiment, as shown in Fig. 1(e), the blowing direction in the blowing step viewed from the application layer 21 surface side of the substrate 10 is a direction different from the conveying direction of the substrate, In addition, the said ventilation is implemented in one direction. In this embodiment, the angle between the conveyance direction A of the substrate and the blowing direction X is greater than 0° and less than 90° or greater than 90° and less than 180°, preferably 30° to 60° or 120° to 150° to be. In addition, you may make the wind blow in fan shape.

When blowing a rectified wind to the application layer 21, the blowing direction Z in the blowing process seen from the side surface side of the base material 10 may be parallel to the base material surface (FIG. 1(a') and (b')) ), may not be parallel (Fig. 1(e')). The angle between the blowing direction Z in the blowing step seen from the side of the substrate 10 and the conveying direction A on the surface of the substrate is preferably 0° to 60°. In one embodiment, the blowing direction Z in the blowing process seen from the side side of the base material 10 is substantially parallel to the base material surface (that is, the angle between the air blowing direction Z and the base material surface is 10 degrees or less). In this way, a transparent conductive layer excellent in surface smoothness is formed. In another embodiment, the angle between the blowing direction Z in the blowing step seen from the side of the substrate 10 and the surface of the substrate is greater than 10° and less than or equal to 60°.

In this invention, the orientation of a metal nanowire is disturbed by making the wind direction in a ventilation process into a specific direction, As a result, a transparent conductive film with small electrically conductive anisotropy can be manufactured. Such an effect becomes more remarkable by performing ventilation from two or more directions. Moreover, when ventilation is performed in two or more directions, the transparent conductive film with remarkably high dispersion|distribution uniformity of a metal nanowire can be obtained.

B. Application process

As mentioned above, in an application|coating process, the composition for transparent conductive layer formation containing a metal nanowire is apply|coated to the said base material, conveying a long base material, and an application layer is formed.

(write)

Any suitable material may be used as the material constituting the substrate. Specifically, for example, a polymer substrate such as a film or a plastic substrate is preferably used. It is because it is excellent in the smoothness of a base material and the wettability with respect to the composition for transparent conductive layer formation, and productivity can be improved significantly by continuous production with a roll.

The material constituting the substrate is typically a polymer film containing a thermoplastic resin as a main component. As a thermoplastic resin, For example, polyester-type resin; Cycloolefin resins, such as polynorbornene; acrylic resin; polycarbonate resin; Cellulose-type resin etc. are mentioned. Among them, a polyester-based resin, a cycloolefin-based resin or an acrylic resin is preferable. These resins are excellent in transparency, mechanical strength, thermal stability, moisture shielding property, and the like. The said thermoplastic resin may be used individually or in combination of 2 or more types. Moreover, the optical film used for a polarizing plate, for example, a low retardation base material, a high retardation base material, retardation plate, a brightness improving film, etc. can also be used as a base material.

The thickness of the substrate is preferably 20 µm to 200 µm, and more preferably 30 µm to 150 µm.

The total light transmittance of the substrate is preferably 30% or more, more preferably 35% or more, and still more preferably 40% or more.

As a method of conveying the substrate, any suitable method may be employed. For example, conveyance by a conveyance roll, conveyance by a conveyance belt, these combinations, etc. are mentioned. A conveyance speed is 5 m/min - 50 m/min, for example.

(Metal Nanowire)

The metal nanowire refers to a conductive material made of a metal, having a needle-like shape or a filamentous shape, and having a diameter of nanometers. The metal nanowire may be linear or curved. When a transparent conductive layer composed of metal nanowires is used, the metal nanowires become reticulated, so that even a small amount of metal nanowires can form a good electrical conduction path, and a transparent conductive film with low electrical resistance can be obtained. In addition, when the metal nanowires become mesh-like, openings are formed in the gaps between the meshes, and a transparent conductive film with high light transmittance can be obtained.

The ratio (aspect ratio: L/d) of the thickness d to the length L of the metal nanowire is preferably 10 to 100,000, more preferably 50 to 100,000, and particularly preferably 100 to 10,000. As described above, when a metal nanowire having a large aspect ratio is used, the metal nanowire crosses favorably, and high conductivity can be expressed with a small amount of the metal nanowire. As a result, a transparent conductive film with high light transmittance can be obtained. In addition, in this specification, "thickness of a metal nanowire" means the diameter when the cross section of the metal nanowire is circular, and when it is elliptical, it means the minor diameter, and in the case of a polygon, the longest diagonal is it means. The thickness and length of a metal nanowire can be confirmed with a scanning electron microscope or a transmission electron microscope.

The thickness of the metal nanowire is preferably less than 500 nm, more preferably less than 200 nm, particularly preferably 10 nm to 100 nm, and most preferably 10 nm to 50 nm. If it is such a range, a transparent conductive layer with high light transmittance can be formed.

The length of the metal nanowire is preferably 1 µm to 1000 µm, more preferably 10 µm to 500 µm, and particularly preferably 10 µm to 100 µm. If it is such a range, a transparent conductive film with high electroconductivity can be obtained.

As the metal constituting the metal nanowire, any suitable metal may be used as long as it is a conductive metal. As a metal which comprises the said metal nanowire, silver, gold|metal|money, copper, nickel, etc. are mentioned, for example. Moreover, you may use the material which gave plating process (for example, gold plating process) to these metals. Among them, from the viewpoint of conductivity, silver, copper, or gold is preferable, and silver is more preferable.

Any suitable method may be employed as a method for manufacturing the metal nanowire. For example, a method of reducing silver nitrate in a solution, applying a voltage or current to the surface of the precursor from the tip of the probe, withdrawing a metal nanowire from the tip of the probe, and continuously forming the metal nanowire, etc. are mentioned. have. In the method of reducing silver nitrate in solution, silver nanowires can be synthesized by liquid-phase reduction of silver salts such as silver nitrate in the presence of polyol such as ethylene glycol and polyvinylpyrrolidone. Silver nanowires of uniform size are described in, for example, Xia, Y. et al., Chem. Mater. (2002), 14, 4736-4745, Xia, Y. et al., Nano letters (2003) 3(7), according to the method described in 955-960, mass production is possible.

(Composition for forming a transparent conductive layer)

The composition for forming a transparent conductive layer contains metal nanowires. In one embodiment, a metal nanowire is disperse|distributed to arbitrary appropriate solvents, and the composition for transparent conductive layer formation is prepared. Examples of the solvent include water, alcohol solvents, ketone solvents, ether solvents, hydrocarbon solvents, aromatic solvents, and the like. Moreover, the composition for transparent conductive layer formation may further contain additives, such as resin (binder resin), electroconductive materials other than a metal nanowire (for example, electroconductive particle), and a leveling agent. In addition, the composition for forming a transparent conductive layer includes a plasticizer, a heat stabilizer, a light stabilizer, a lubricant, an antioxidant, an ultraviolet absorber, a flame retardant, a colorant, an antistatic agent, a compatibilizer, a crosslinking agent, a thickener, an inorganic particle, a surfactant, and a dispersant. Additives may be included.

The viscosity of the composition for forming a transparent conductive layer is preferably 5 mP·s/25°C to 300 mP·s/25°C, more preferably 10 mP·s/25°C to 100 mP·s/25°C . If it is such a range, the effect obtained by making the wind direction in a ventilation process into a specific direction becomes large. The viscosity of the composition for transparent conductive layer formation can be measured with a rheometer (For example, MCR302 of Antonpa Corporation).

The dispersion density|concentration of the metal nanowire in the composition for transparent conductive layer formation becomes like this. Preferably they are 0.01 weight% - 5 weight%. If it is such a range, the effect of this invention becomes remarkable.

Any suitable method may be employed as a method of applying the composition for forming the transparent conductive layer. Examples of the coating method include spray coating, bar coating, roll coating, die coating, inkjet coating, screen coating, dip coating, embossing printing method, intaglio printing method, and gravure printing method.

The weight of the coating layer is preferably 0.3 g/m 2 to 30 g/m 2 , and more preferably 1.6 g/m 2 to 16 g/m 2 . If it is such a range, a metal nanowire is disperse|distributed favorably by the ventilation in a ventilation process, and a transparent conductive film with a smaller electrically conductive anisotropy can be manufactured.

The film thickness of the said application layer becomes like this. Preferably they are 1 micrometer - 50 micrometers, More preferably, they are 2 micrometers - 40 micrometers.

C. Blowing process

As mentioned above, in a ventilation process, it blows to the said application layer side, and let the orientation of the metal nanowire in the said application layer be an appropriate orientation. The direction of blowing is the same as described in section A.

Ventilation to the application layer can be performed by any suitable method. In one embodiment, using the blower arrange|positioned above (the side opposite to a base material), and/or a side of an application layer, ventilation to an application layer can be performed. The blowing direction can be adjusted with the direction of the said louver, for example by providing a louver in a blower. In one embodiment, the blowing direction is defined by the opening direction of a louver. In addition, in the case of sending a spiral wind, a blower having a spiral wind direction plate in the air outlet may be used.

The wind speed of the wind is preferably 0.5 m/s to 10 m/s, and more preferably 1 m/s to 5 m/s. If it is such a range, a metal nanowire is disperse|distributed favorably and a transparent conductive film with a smaller conductive anisotropy can be manufactured. Moreover, the transparent conductive film excellent in surface smoothness and uniformity of thickness can be obtained. The wind speed can be set suitably according to the solvent etc. contained in the composition for transparent conductive layer formation. When using the composition for transparent conductive layer formation prepared with water, the said wind speed becomes like this. Preferably they are 0.5 m/s - 10 m/s, More preferably, they are 1 m/s - 5 m/s. In addition, in this specification, wind speed means the wind speed at the time of reaching an application layer.

The temperature of the wind is preferably 10°C to 50°C, more preferably 15°C to 30°C. The wind speed can be set suitably according to the solvent etc. contained in the composition for transparent conductive layer formation. When using the composition for transparent conductive layer formation prepared with water, the temperature of the said wind becomes like this. Preferably it is 10 degreeC - 50 degreeC, More preferably, it is 15 degreeC - 30 degreeC. In addition, in this specification, the temperature of wind means the temperature of the wind at the time of reaching an application layer.

Blowing time becomes like this. Preferably they are 1 minute - 10 minutes, More preferably, they are 2 minutes - 5 minutes. If it is such a range, a metal nanowire is disperse|distributed favorably and a transparent conductive film with a smaller conductive anisotropy can be manufactured. Specifically, if the blowing area is determined so that the blowing time is within the above range, the metal nanowires can be appropriately dispersed in the entire coating layer, and a transparent conductive film having smaller conductive anisotropy can be manufactured. Moreover, the transparent conductive film excellent in surface smoothness and uniformity of thickness can be obtained.

In one embodiment, the said ventilation is performed with respect to the base material (substrate with an application layer) on a conveyance roll. In this way, metal nanowires are disperse|distributed favorably, and a transparent conductive film with a smaller electrically conductive anisotropy can be manufactured. Moreover, the transparent conductive film excellent in surface smoothness and uniformity of thickness can be obtained.

In a ventilation process, you may divide and implement ventilation into multiple steps. For example, zone separation may be carried out so that a wind direction, wind speed, temperature, etc. may differ, and you may perform ventilation in stages. Moreover, you may reduce the thickness of an application layer by methods, such as oven heating and natural drying, before a ventilation process. The weight of the coating layer at the start of the blowing step is preferably 0.001 g/m 2 to 0.09 g/m 2 , more preferably 0.005 g/m 2 to 0.05 g/m 2 .

You may perform arbitrary appropriate processes after a ventilation process. For example, when the composition for transparent conductive layer formation containing binder resin is used, you may perform hardening process by ultraviolet irradiation etc. Moreover, you may implement a drying process after a sending process. As a drying method, oven heating, natural drying, etc. are mentioned, for example.

D. Transparent conductive film

A transparent conductive film is formed by said manufacturing method. It is a schematic sectional drawing of the transparent conductive film obtained by the manufacturing method by one Embodiment of this invention. The transparent conductive film 100 includes a substrate 10 and a transparent conductive layer 20 disposed on one side of the substrate 10 .

The surface resistance value of the transparent conductive film is preferably 0.1 Ω/□ to 1000 Ω/□, more preferably 0.5 Ω/□ to 300 Ω/□, particularly preferably 1 Ω/□ to 200 Ω/□. □ is. The ratio (TD/MD) of the surface resistance value in TD (direction orthogonal to MD) to the surface resistance value in MD (transport direction) of the transparent conductive film is preferably 0.7 to 1.5, and more Preferably it is 0.8-1.2, More preferably, it is 0.9-1.1. A surface resistance value can be measured with "resistivity automatic measurement system MCP-S620 type/MCP-S521 type" by Mitsubishi Chemical Analytech.

The haze value of the said transparent conductive film becomes like this. Preferably it is 20 % or less, More preferably, it is 10 % or less, More preferably, it is 0.1 % - 5 %.

The total light transmittance of the transparent conductive film is preferably 30% or more, more preferably 35% or more, and particularly preferably 40% or more.

The weight per unit area of the transparent conductive layer is preferably 0.001 g/m 2 to 0.09 g/m 2 , more preferably 0.005 g/m 2 to 0.05 g/m 2 .

The content ratio of the metal nanowire in the transparent conductive layer is preferably 0.1 parts by weight to 50 parts by weight, more preferably 0.1 parts by weight to 30 parts by weight with respect to 100 parts by weight of the binder resin constituting the transparent conductive layer. is part by weight. If it is such a range, the transparent conductive film excellent in electroconductivity and light transmittance can be obtained.

Example

Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited in any way by these Examples. The evaluation method in an Example is as follows. In addition, thickness was formed by cutting with an ultramicrotome after embedding process with an epoxy resin, and it measured using the Hitachi High-Technologies company scanning electron microscope "S-4800".

(1) Surface resistance value

The surface resistance value (the surface resistance value of MD and TD) of the transparent conductive film was measured by the eddy current method using the non-contact surface resistance meter brand name "EC-80" by the Nafson Corporation. The measurement temperature was 23 degreeC.

[Production Example 1] Preparation of a composition for forming a transparent conductive layer

Chem. Mater. 2002, 14, based on the method described in 4736-4745, silver nanowires were synthesized.

In pure water, 0.2 weight% of the silver nanowire obtained above and dodecyl-pentaethylene glycol were disperse|distributed so that it might become a density|concentration of 0.1 weight%, and the composition for transparent conductive layer formation was obtained.

[Example 1]

A PET film (manufactured by Mitsubishi Resin, trade name “S100”) was used as the substrate. While conveying this substrate using a conveying roll, the composition for forming a transparent conductive layer prepared in Production Example 1 was applied on the substrate using a bar coater (manufactured by Jeil Hwa Co., Ltd., product name “Bar Coater No. 16”). An application layer having a thickness of an average weight of 0.015 g/m 2 and a wet film thickness of 15 µm was formed. Then, conveying the base material with an application layer, the rectifying wind was blown to the application layer, the application layer was dried, the transparent conductive layer was formed, and the transparent conductive film provided with a base material and a transparent conductive layer was obtained.

As shown in Fig. 1(b) , the air is blown from the center of the substrate to both ends in the direction from the inner side to both sides in the width direction, and the conveying direction A of the substrate and the blowing direction X (the blowing direction seen from the coating layer surface side) The angle formed by ) was set to 90°, and the angle formed between the conveyance direction A of the substrate and the blowing direction Z (the blowing direction viewed from the side of the coating layer) was set to 0°. Moreover, the wind speed was 2 m/s, and the temperature of the wind was 25 degreeC. In addition, the ventilation time (drying time) was made into 2 minutes.

The obtained transparent conductive film was subjected to the above evaluation (1). A result is shown in Table 1.

[Example 2]

As shown in FIG. The angle formed between the conveying direction A of the substrate and the blowing direction X (the blowing direction viewed from the coating layer side) is 90°, and the angle formed between the conveying direction A of the substrate and the blowing direction Z (the blowing direction as viewed from the side of the coating layer) is 0 °. Moreover, the wind speed was 2 m/s, and the temperature of the wind was 25 degreeC. In addition, the ventilation time (drying time) was made into 2 minutes.

The obtained transparent conductive film was subjected to the above evaluation (1). A result is shown in Table 1.

[Example 3]

It carried out similarly to Example 1, and formed the application layer on the base material. Then, while conveying the base material on which the application layer was formed, using a circulator, a spiral flow was blown to the application layer to dry the application layer, a transparent conductive layer was formed, and a transparent conductive film comprising a substrate and a transparent conductive layer got As shown in Figs. 1(c) and (c'), the blowing is performed such that the direction X' of the helical axis seen from the coated layer surface side of the substrate is parallel to the conveying direction A of the substrate, and the helical axis seen from the side surface of the substrate is The direction Z' was implemented so that it might become parallel to the conveyance direction A of a base material. The wind speed was 2 m/s, and the temperature of the wind was 25°C. In addition, the ventilation time (drying time) was made into 2 minutes.

The obtained transparent conductive film was subjected to the above evaluation (1). A result is shown in Table 1.

[Example 4]

It carried out similarly to Example 1, and formed the application layer on the base material. Then, while conveying the base material with an application layer, using a circulator, a spiral flow is blown from above the application layer, the application layer is dried, a transparent conductive layer is formed, and the transparent which comprises a base material and a transparent conductive layer. A conductive film was obtained. As shown in Figs. 1(d) and (d'), the ventilation was performed at an angle between the direction X' of the helical axis viewed from the coated layer surface side of the substrate and the conveying direction A of the substrate at an angle of 90°. The wind speed was 2 m/s, and the temperature of the wind was 25°C. In addition, the ventilation time (drying time) was made into 2 minutes.

The obtained transparent conductive film was subjected to the above evaluation (1). A result is shown in Table 1.

[Example 5]

As shown in Fig. 1(e), the blowing method is performed from the left side of the substrate, and the angle between the conveying direction A of the substrate and the blowing direction X (the blowing direction viewed from the coated layer surface side) is 40°, The angle formed by the conveyance direction A of a base material and the ventilation direction Z (the ventilation direction seen from the coating layer side) was made into 0 degree. Moreover, the wind speed was 2 m/s, and the temperature of the wind was 25 degreeC. In addition, the ventilation time (drying time) was made into 2 minutes.

[Comparative Example 1]

It carried out similarly to Example 1, and formed the application layer. Then, the base material with an application layer was thrown into oven with a furnace temperature of 100 degreeC for 2 minutes, and the transparent conductive film was obtained. The obtained transparent conductive film was subjected to the above evaluation (1). A result is shown in Table 1.

10: description
20: transparent conductive layer
100: transparent conductive film

Claims (6)

A method for producing a transparent conductive film comprising: a substrate; and a transparent conductive layer disposed on one side of the substrate;
A coating step of forming an application layer by applying a composition for forming a transparent conductive layer containing metal nanowires to the substrate while conveying the elongated substrate;
Including a blowing step of blowing air to the application layer,
The blowing in the blowing step includes blowing in a direction different from the conveying direction of the substrate,
A method for producing a transparent conductive film. The method of claim 1,
The method for manufacturing a transparent conductive film, wherein the blowing in the blowing step includes at least blowing in a direction different from the conveying direction of the substrate when viewed from the side of the coating layer surface of the substrate. 3. The method according to claim 1 or 2,
The manufacturing method of the transparent conductive film in which the ventilation in the said ventilation process is performed from two or more directions. 4. The method of claim 3,
The method for producing a transparent conductive film, wherein the direction of air blowing in the blowing step viewed from the side of the coating layer surface of the substrate includes a direction from the widthwise inner side of the substrate toward both outer sides in the width direction. 4. The method of claim 3,
The method for producing a transparent conductive film, wherein the direction of air blowing in the blowing step viewed from the side of the coating layer surface of the substrate includes a direction from both outer sides in the width direction to the inner side in the width direction of the substrate. The method of claim 1,
The transparent conductive film whose ventilation in the said ventilation process is spiral ventilation.

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