KR20210149540A - Both Side Processing Apparatus of Substrate - Google Patents

Abstract

The present invention relates to an apparatus capable of processing both sides of a substrate in a solar cell manufacturing apparatus. The present invention can provide an apparatus of processing both sides of a substrate. The apparatus includes: a fixing unit for processing the substrate; and a moving unit for moving from the fixed unit. Each of the fixing unit and the moving unit is provided with a plurality of fixing members and moving members on which a substrate to be processed can be seated. The moving member is provided between the plurality of fixing members. The polarity of the moving member is switched when the moving member moves to a second position in a state in which it faces the first position among the plurality of fixing members.

Description

Both Side Processing Apparatus of Substrate

The present invention relates to an apparatus capable of processing both sides of a substrate in a solar cell manufacturing apparatus.

Recently, due to serious environmental pollution problems and depletion of fossil energy, the importance of developing next-generation clean energy is being emphasized.

Among them, solar cells have low pollution, infinite resources, and semi-permanent lifespan, so they are spotlighted as a major means to solve future energy problems.

High efficiency is required in the development of solar cells. As an example of a high-efficiency crystalline silicon solar cell, PERC (Passivated Emitter Rear Cell) solar cells are known.

PERC solar cell, a high-efficiency solar cell, is a technology necessary for improving the efficiency of PERC solar cells and for mass production. Overcoming the performance limitations of screen printing technology when forming electrodes, forming fine metal electrodes, and improving the contact interface between electrodes and silicon layers. Research and development such as area reduction and surface passivation technology are required.

In manufacturing a substrate (wafer) constituting such a solar cell, a boat apparatus in which a plurality of substrates are provided so that the processing time of the substrate can be shortened has been developed.

For example, a thin film is deposited on a substrate through a PECVD process. The boat device consists of a plurality of plates provided at intervals and a plurality of substrates seated on one surface of the plurality of plates, in which case the plate functions as an electrode. , a deposition process of the substrate may be performed between the plurality of plates through plasma discharge.

However, during the deposition process of the substrate, since deposition is performed only on one surface of the substrate, in order to deposit the same or different type of thin film on the other surface of the substrate, the deposition-treated substrate is separated in the chamber, and the other side of the substrate is After changing the position to the side, it has no choice but to insert it back into the chamber and perform the deposition process.

Therefore, the double-sided deposition process of the substrate takes a lot of time and may be inefficient.

In order to solve this disadvantage, separate deposition equipment may be provided to deposit the other side of the substrate on one side, but in this case, additional cost is incurred, and it is necessary to move from one deposition equipment to another deposition equipment. Therefore, as much time delay and logistics facilities for movement were required.

Korean Patent Publication No. 10-2013-0069310 (published date: June 26, 2013)

The present invention was invented to solve the problems of the prior art, and the problem to be solved by the present invention is to provide an apparatus for processing both sides of a substrate that can facilitate the processing of both sides of the substrate.

Solving means for solving the problems of the present invention is a fixing unit for processing a substrate; a mobile unit moving from the fixed unit;

The fixing unit and the moving unit are provided with a plurality of fixing members and moving members on which a substrate to be processed can be seated, respectively, and the moving members are provided between the plurality of fixing members, There may be provided a double-sided processing apparatus for the substrate in which the moving member is moved from the first position facing each other to the second position and the polarity is switched when facing each other.

As described above, the present invention is composed of a fixed unit and a moving unit moving from the inside of the fixed unit, and includes a plurality of fixed and moving members on which the substrate to be processed is seated, respectively, from the fixed member to the moving unit. By moving the moving member, both-side deposition of the substrate may be performed.

According to the present invention, a movable member is provided between a plurality of fixing members, is set in a first position for deposition on one side of the substrate, and can be moved to a second position for deposition on the other side of the substrate.

The polarity of the movable member may be switched by an external polarity switching device when the moving member is switched from the first position to the second position, or the polarity may be automatically switched according to a change in the facing position with the fixed member having the polarity.

1 is a conceptual diagram of a batch type boat apparatus of the present invention.
2 is a perspective view of a batch type boat apparatus of the present invention.
3 is a perspective view showing the fixing unit of the boat apparatus of the present invention.
4 is a perspective view showing the moving unit of the boat apparatus of the present invention.
5 is a plan view illustrating a tray on which a substrate provided in the moving unit is mounted.
6 is an arrangement state diagram of the elastic member provided in the fixed unit and the moving unit of the present invention.
7 is a bottom perspective view of the boat apparatus of the present invention.
8 is a partially enlarged cross-sectional view of a specific structure of an electrode unit.
9 is an equivalent circuit diagram of FIG. 8 .
FIG. 10 is an enlarged cross-sectional view of part A of FIG. 6 .
11 is an enlarged cross-sectional view of part B of FIG. 6 .
12 is a schematic view showing before and after the moving unit of the present invention is moved from the fixed unit.
13 is a cross-sectional view schematically showing a PERC solar cell manufactured by the boat device of the present invention.

Hereinafter, an embodiment according to the present invention will be described in detail with reference to the accompanying drawings.

1 is a conceptual diagram illustrating the characteristics of a batch type boat apparatus according to the present invention.

Referring to FIG. 1 , the boat apparatus 1 according to the present invention may be equipped with a fixed unit for processing a substrate, and a moving unit moving from the fixed unit.

A plurality of fixing members 2 and a moving member 4 on which the substrate S to be processed can be seated may be provided in the fixed unit and the moving unit, respectively, and the moving member is disposed between the plurality of fixed members 2 . (4) is placed so that it can be moved for double-sided treatment of the substrate.

One or more through-holes may be formed in each of the fixing member 2 and the moving member 4 .

For example, for convenience of description, the fixing member 2 is provided with the first fixing member 2a, the second fixing member 2b, and the third fixing member 2c, and the movable member 4 is the first movable member. (4a), the 2nd moving member 4b, the 3rd moving member 4c, and 4th moving member 4d are comprised and demonstrated.

The stationary member 2 and the movable member 4 may be supplied with voltage to become electrodes, respectively.

In the present invention, for example, when a deposition thin film is generated during a processing process of a substrate used as a solar cell, both-side deposition of the substrate may be performed.

That is, the first substrate S1 and the second substrate S2 for performing the deposition process are respectively seated on the fixing member 2 and the moving member 4 provided in plurality at intervals to perform the first deposition process. can do.

As shown in the left side of FIG. 1 , when the first deposition process is performed, the movable members 4 face each other on the upper surface of the fixing member 2 and are in the first position, and when a voltage is applied, the first movable member 4a A negative voltage is applied to the first fixing member 2a and a negative voltage is applied to the second movable member 4b and the second fixing member 2b, and a positive voltage is applied to the third movable member 4c and the third fixing member 2b. 2c) may be a negative voltage, and a (+) voltage may be applied to the fourth moving member 4c.

Then, between the first fixing member 2a and the second moving member 4b, between the second fixing member 2b and the third moving member 4c, the third fixing member 2c and the fourth moving member ( Plasma (P) discharge may occur between 4d) and deposition of the substrate may be performed.

By the discharge of plasma P, one surface of the substrate S1 of the first fixing member 2a, one surface of the substrate S2 of the second moving member 4b, one surface of the second fixing member 2b, and the third moving member Thin film deposition may be performed on one surface of (4c), one surface of the third fixing member 2c, and one surface of the fourth moving member 4d.

That is, a deposition thin film may be formed on one surface of each substrate provided on the fixing member 2 and the moving member 4 .

After performing the first deposition process on one surface of the substrate, the movable member 4 may move with respect to the fixing member 2 in order to perform the second deposition process on the other surface of the substrate.

1, the first moving member 4a, the second moving member 4b, the first moving member 4c, and the fourth moving member 4d are separately provided driving means (not shown). can move to the second position at the same time.

Then, the first moving member 4a to the fourth moving member 4d are separated from the first fixing member 2a to the third fixing member 2c, wherein the second moving member 4b is 2a), the third moving member 4c may face the second fixing member 2b, and the fourth moving member 4d may face the third fixing member 2c.

The first moving member 4a becomes a (+) electrode at the second position, and the second moving member 4b faces the first fixing member 2a while changing the polarity to become a (-) electrode, and a third The movable member 4c faces the second fixing member 2b to become a (+) electrode, and the fourth movable member 4d faces the third fixing member 2c to become a (-) electrode. can

The polarity switching may be switched through an external polarity switching device, and the polarity switching may also be possible automatically.

The uppermost and lowermost ends of the moving member 2 and the fixing member 4 may be blanking members without a substrate. In FIG. 1 , the first moving member 4a corresponding to the uppermost end of the stacked moving member 2 and the fixing member 4 may be a blind member without a substrate.

In this state, when a voltage is applied, between the first moving member 4a and the first fixing member 2a, between the second moving member 4b and the second fixing member 2b, and the third moving member 4c ) and the third fixing member 2c, a plasma P discharge may occur, and a thin film may be deposited on the other non-deposited surfaces of the first substrate S1 and the second substrate S2.

Accordingly, the boat apparatus 1 according to the present invention can perform a double-sided deposition process on a substrate.

2 is a detailed perspective view of a batch type boat apparatus of the present invention.

Referring to FIG. 2 , the batch type boat apparatus 1 according to the present invention may include a fixed unit 10 and a moving unit 20 movably provided inside the fixed unit 10 .

The boat apparatus 1 of the present invention can be applied to, for example, a substrate processing apparatus that performs a deposition process. A substrate processing apparatus for performing a deposition process may be used in the manufacture of a solar cell, a semiconductor, a flat panel display, etc., and a chemical vapor deposition apparatus such as LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma-Enhanced Chemical Vapor Deposition) and sputtering (Sputtering) may be a physical vapor deposition apparatus such as.

In the embodiment of the present invention, the PECVD process will be described.

Various types of reactive gases or inert gases are introduced through the nozzle unit for each process in a chamber that maintains a constant reaction temperature or pressure. A doping layer, a passivation layer, a capping layer, an anti-reflection layer, etc. may be deposited on the substrate in the chamber according to the type of the reactive gas or the inert gas.

Since processing a plurality of substrates at once is advantageous for productivity improvement, a plurality of substrates may be inputted at once by the boat apparatus 1 . The boat apparatus 1 on which the substrate is loaded is put into the chamber through an inlet of the chamber, and a heater for supplying heat to the chamber may be installed inside or outside the chamber.

3 is a perspective view showing the fixing unit 10. Referring to FIG. 3, the fixing units 10 constituting the boat apparatus 1 of the present invention have a predetermined height and are provided with a plurality of supports at intervals. (11), it may be composed of a first fixed support plate 12 and a second fixed support plate 13 provided on the upper and lower portions of the support 11, respectively.

A support jaw 11a may be formed on one surface of the support 11 at intervals along the longitudinal direction of the support 11 .

4 is a perspective view showing the moving unit 20. Referring to FIG. 4, the moving unit 20 has a predetermined height and a plurality of supports 21 at intervals similar to the fixed unit 10. , may be formed of a first movable support plate 22 and a second movable support plate 23 provided on the upper and lower portions of the support 21 , respectively.

A plurality of support jaws 21a may be formed on one surface of the support 21 at intervals along the height direction.

The moving unit 20 may be inserted into the fixed unit 10 and may be provided to be movable along the height direction. Accordingly, the total height of the moving unit 20 may be formed smaller than the total height of the fixed unit 10 so as to be movable in the height direction from the inside of the fixed unit 10 .

A tray 30 may be provided between the support 11 of the fixed unit 10 and the support 21 of the mobile unit 20 . The tray 30 may be provided detachably while being supported by the support jaws 11a of the support 11 and the support jaws 21a formed on one surface of the support 21 .

5 is a plan view showing the tray 30 . Referring to FIG. 5 , the tray 30 may include a frame portion 31 forming a periphery, and a plurality of seating portions 32 formed inside the frame portion 31 .

A plurality of through-holes 32a may be formed in the seating portion 32 , and a support surface 32b may be formed at a corner portion of each through-hole 32a. A substrate S for forming a thin film through a deposition process may be seated on the mounting portion 32 .

The tray 30 may include a fixed tray 30a fixed to the fixed unit 10 , and a moving tray 30b provided in the moving unit 10 and positioned between the fixed trays 30 .

The fixed tray 30a and the movable tray 30b may have the same structure, and a plurality of substrates S may be mounted thereon, respectively, and may be electrodes.

In order for the fixed tray 30a and the moving tray 30b to become electrodes, an electrode unit 40 may be provided.

The electrode unit 40 may be provided on one or both sides of the fixed unit 10 and the moving unit 20 , and the electrode unit 40 includes a fixed electrode unit 42 and a moving electrode unit 44 . can

The fixed electrode part 42 and the movable electrode part 44 are stacked with a plurality of electrode blocks 46 having a predetermined unit length along the height direction so as to be connected to the fixed unit 10 and the mobile unit 20, respectively. can be

The plurality of electrode blocks 46 may be formed in a cylindrical pipe shape, and an electrode bar 47 for fixing to the fixed unit 10 and the moving unit 20 may be coupled into the electrode block 46 . .

A connection piece capable of supplying voltage to the fixed tray 30a of the fixed unit 10 and the moving tray 30b of the moving unit 10 between the plurality of stacked electrode blocks 46 and the electrode block 46 . (46a) can be connected.

7 and 8 , the electrode block 46 may be formed in a cylindrical (tubular) shape, and may be made of, for example, quartz (auartz). The electrode bar 47 is through-coupled to the inside of the electrode block 46 , and a plurality of fixing rings 48 and the elastic member 49 may be supported on the outer circumferential surface of the electrode bar 47 at intervals therebetween.

In other words, the electrode blocks 46 have a unit length and are provided in plurality, and between the plurality of electrode blocks 46, the connection pieces 46a in contact with the tray 30 are provided, so that the connection pieces 46a and A fixing ring 48 and an elastic member 49 may be provided between the connection pieces 46a.

Two fixing rings 48 are provided between the connection piece 46a and the connection piece 46a, the first fixing ring 48a faces one side of the connection piece 46a, and the second fixing ring 48b may be fixed at a position spaced apart from the connecting piece 46a provided on the opposite side.

9 is a view showing an equivalent circuit of the structure of the electrode unit 40 of FIG. 8, using the electrode bar 47 as a main conducting wire, and using the elastic member 49 and the fixing ring 48 as a secondary conducting wire in the main conducting wire In this way, a structure in which parallel resistors are arranged can be achieved. Then, it is possible to prevent the elastic member 49 from being disconnected due to the plasma current at high temperature.

If the structure of the electrode unit 40 is not arranged to be a parallel resistance, voltage is applied only to the elastic member 49 and there is a risk of being disconnected due to resistance heat. Therefore, by implementing the parallel resistance arrangement structure as in the present invention, it is possible to reduce the resistance heat of the elastic member 49, thereby preventing the disconnection phenomenon.

In the electrode unit 40 , the electrode block 46 is made of quartz having a small thermal expansion coefficient to reduce thermal expansion in the longitudinal direction.

In addition, the electrode block 46 can shield the electrode bar 47 for applying a current provided therein, and the contact between the connecting piece 46a and the electrode bar 47 is more reliable by the elastic member 49 . can be done

6 and 10 , the fixed elastic unit 50 and the movable elastic unit 60 may be provided at the upper end of the fixed electrode part 42 and the upper end of the moving electrode part 44 , respectively.

The fixed elastic unit 50 penetrates the first fixed support plate 12 of the fixed unit 10 and is supported on the outer peripheral surface of the fastening member 52 and the fastening member 52 coupled to the upper portion of the fixed electrode part 42 . It may include an elastic member 54 .

The fastening member 52 may include a bolt 52a and a plurality of nuts 52b coupled to the bolt 52a.

The bolt 52a may be coupled by sliding through the first fixing support plate 12 of the fixing unit 10 .

The elastic member 54 may press the plurality of electrode blocks 46 provided under the elastic member 54 to always maintain a tight state.

The moving elastic unit 60 penetrates the first moving support plate 22 and includes a fastening member 62 coupled to the upper portion of the fixed electrode part 62 , and an elastic member 64 supported on the outer circumferential surface of the fastening member 62 . may include

The fastening member 62 may include a bolt 62a and a plurality of nuts 62b coupled to the bolt 62a.

The bolt 62a may be coupled by sliding through the first moving support plate 22 of the moving unit 10 .

The elastic member 64 can always be kept in a tight state by pressing the plurality of electrode blocks 46 provided thereunder.

Referring to FIG. 6 , the moving unit 20 is set in a first position and may be changed to a second position by moving downward from the first position.

When the moving unit 20 is changed from the first position to the second position, when the moving unit 20 moves downward, the first moving support plate 22 presses the elastic member 64 , and the elastic member 64 . can be contracted. Since the bolt 62a constituting the fastening member 62 may slide through the first movable support plate 22 , the first movable support plate 22 may slide along the bolt 62a.

Accordingly, since the moving trays 30b installed at intervals along the longitudinal direction of the support 21 of the moving unit 20 move at the same time, the substrate S seated on the moving tray 30b can also move at the same time.

The movable tray 30b may face the fixed tray 30a in a first position, and may be changed to a second position to face the fixed tray 30a in different positions.

Accordingly, the facing state of the first substrate S1 seated on the fixed tray 10 and the second substrate S2 seated on the movable tray 20 may be different.

The first moving support plate 22 of the moving unit 20 may be provided with a guide member 70 that smoothly guides the moving unit 20 when it moves.

In FIG. 6 , it may be important to set the gap G between the fixed tray 30a and the moving tray 30b to an appropriate length. That is, when the gap G is small, since the distance between the fixed tray 30a and the movable tray 30b becomes close, it may affect the next electrode facing each other, and thus an abnormal arcing may occur.

Conversely, when the gap G is large, the deposition rate may decrease and the uniformity of the deposition film may be deteriorated.

Therefore, the gap (G) may be preferably set to 5mm ~ 20mm.

Referring to FIG. 11 , the guide member 70 includes the first fixed support plate 12 of the fixed unit 10 so that the guide piece 72 protruding from the first moving support plate 22 and the guide piece 72 can slide. ) may be made of a roller bushing 74 provided in.

The guide piece 72 may be fixed to the first movable support plate 22 by the fastening member 72a.

12 is a schematic view showing before and after the moving unit of the present invention is moved from the fixed unit. Referring to the left drawing of FIG. 12 , the moving unit 20 is in a first position with respect to the fixed unit 10 , which may be a position during the first deposition process of the substrate.

In the first position, the transfer tray 30b faces the fixed tray 30a, and at this time, the fixed tray 30a and a thin film deposited by plasma discharge on one surface of a plurality of substrates seated on the transfer tray 30b can be formed.

Referring to the right drawing of FIG. 12 , the moving unit 20 is in a second position with respect to the fixed unit 10 , which may be a position during the second deposition process of the substrate.

In the second position, the moving tray 30b may be spaced apart from the fixed tray 30a at the first position, and when facing at a position different from the facing state in the first position, the fixed tray 30a and the moving tray 30b) A thin film deposited by plasma discharge may be formed on the other surfaces of the plurality of substrates seated on the . In this way, both-side deposition of the substrate can be achieved.

13 is a cross-sectional view schematically illustrating a PERC solar cell manufactured by the manufacturing apparatus and manufacturing method of the present invention.

Referring to FIG. 13 , an emitter 110 may be deposited on the entire surface of the substrate 100 , and an anti-reflection layer 112 (ARC) may be stacked on the emitter 110 . The substrate 100 including silicon (Si) may be doped to become a P-type semiconductor. The emitter 110 is formed on the substrate 100 and may be an N-type semiconductor. The p-type semiconductor and the n-type semiconductor have a diode-like junction structure, and when light is incident on the solar cell of the junction structure, the photovoltaic effect between the light and the material constituting the semiconductor of the solar cell ( An electron with a -) charge and a hole with a (+) charge are generated in pairs, and as they move, an electric current flows.

For example, electrons move in the direction of the front electrode 114 bonded to the upper portion of the n-type semiconductor emitter 110 , and for example, the rear electrode 124 bonded to the lower portion of the p-type semiconductor substrate 100 . ) to allow holes to move. Accordingly, power can be obtained by electrically connecting the front electrode 114 and the rear electrode 124 .

The passivation layer 120 forming step ( S2 ) is a step in which the substrate 100 of the PERC solar cell is put into the chamber 210 , and the passivation layer 120 is formed on the back surface of the substrate 100 in the chamber 210 . .

Passivation refers to applying a protective film to a semiconductor chip surface or a junction by an appropriate treatment. By blocking the harmful environment, device characteristics can be stabilized. For example, when an alkali ion such as Na+ adheres to the SiO2 film, it easily diffuses inside and changes the Si/SiO2 interface situation to form an inversion layer. Therefore, the leakage current at the junction increases and the current amplification rate fluctuates. MOS threshold voltage change and noise increase. Since the passivation acts as a protective film for the interface, it can be a blocking means to block the absorption or movement of these harmful ions.

As an embodiment, the back passivation layer 120 of the present invention is formed by growing an AlOx film on the substrate 100 including Si.

1.... Boat unit 2... Fixed member
4... moving parts 10... fixed units
11... Support 11a... Support jaw
12... first fixed support plate 13... second fixed support plate
20... mobile unit 21... support
21a... Support jaw 22... First moving support plate
23... 2nd movable support plate 30... Tray
30a... Fixed tray 30b... Moving tray
31... Frame 32... Seat
32a... Through hole 32b... Support surface
34... blind tray 40... electrode unit
42... fixed electrode part 44... moving electrode part
46... Electrode block 46a... Connection piece
47... Electrode bar 48... Retaining ring
49... elastic member
50... fixed elastic unit 52... fastening member
54... elastic member 60... moving elastic unit
70... Guide member 72... Guide piece
72a... fastening member 74... roller bushing
100...substrate 110...emitter
112...Antireflection coating (ARC) layer
114...front electrode 120...passivation layer
122...capping layer 124...back electrode
G... Gap S... Substrate
S1... first substrate S2... second substrate

Claims (5)

a fixing unit for processing the substrate;
a moving unit moving from the fixed unit;
including,
In the fixed unit and the moving unit,
A plurality of fixing members and moving members on which a substrate to be processed can be seated are provided, respectively.
The movable member is provided between the plurality of fixing members, and between the plurality of fixing members, the movable member moves to a second position in a state facing in the first position, and the polarity is switched when facing. processing unit.
According to claim 1,
When the movable member faces in the first position among the plurality of fixing members, the fixing member and the movable member have the same polarity, and a plasma discharge is generated between the fixing member and the movable member that are not facing each other to one side of the substrate. A double-sided processing apparatus for a substrate on which a vapor deposition thin film is formed.
3. The method of claim 2,
A double-sided processing apparatus for a substrate, wherein the movable member is moved from a first position to a second position to face each other between the plurality of fixing members, and a deposited thin film is formed on the other side of the substrate by plasma discharge.
According to claim 1,
The polarity switching of the movable member is switched through a polarity switching device, or the polarity is automatically switched when the face-to-face state in the first position is switched from the face-to-face state to the second position.
According to claim 1,
A double-sided processing apparatus for a substrate in which at least one through hole for exposing both surfaces of the substrate is formed in the fixing member and the moving member, respectively.

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