KR20210143998A - Polishing system - Google Patents

Abstract

The present invention relates to a polishing system, capable of efficiently polishing both surfaces of a workpiece through a continuous process, which comprises: a forward conveyor for transferring a tray; a return conveyor installed in parallel with the forward conveyor; a first lifter; a second lifter; a plurality of primary polishing devices for polishing a first surface; a plurality of secondary polishing devices for polishing a second surface; and a workpiece pressurization fixing device.

Description

Polishing system {POLISHING SYSTEM}

The present invention relates to a polishing system, and more particularly, to a polishing system capable of efficiently polishing both surfaces of a workpiece by a continuous process.

Grinding is a processing method of smoothing the surface of a material using another material, and an abrasive material is generally used to increase polishing efficiency. As an example of a workpiece, a cover glass is a mobile device such as a smart phone, a tablet computer, a personal digital assistant (PDA), etc., a TFT-LCD (Thin film) It is a tempered glass mounted on the front of a flat display such as a transistor-liquid crystal display (PDP) or a plasma display panel (PDP), and serves to protect the display. The cover glass is manufactured in a three-dimensional shape in which an edge is bent and is called a three-dimensional cover glass, edge curved glass, or the like. In addition, curved plate glass, such as a side mirror of a car, a concave mirror, and a convex mirror, is called a three-dimensional glass. The front and back surfaces of the three-dimensional glass are subjected to a polishing process.

As an example of a polishing system, Korean Patent Registration No. 10-1604186 'polishing apparatus for curved glass substrates' has a support for supporting a curved glass substrate, a polishing wheel for grinding a curved glass substrate, and rotating the support. It consists of a rotation driving unit and a moving unit that moves at least one of the support unit and the polishing wheel in the X-axis, Y-axis and Z-axis directions. The curved glass substrate can be naturally polished by bringing the curved glass substrate into close contact with the polishing wheel by the rotation of the support and movement of the polishing wheel in the X, Y and Z directions.

As another example of a polishing system, Korean Patent Registration No. 10-1686235 'a method for manufacturing window glass for a smartphone and a polishing machine for manufacturing window glass for a smartphone' includes a jig for fixing a glass panel, a support provided on the upper side of the jig, Position adjusting means for adjusting the relative positions of the support and the jig in the horizontal direction, a lift coupled to the support, a driving means for raising and lowering the lift, an auxiliary lift coupled to the lift, and an auxiliary It consists of a support means for elastically supporting the elevator platform, a chuck provided on the auxiliary elevator platform to which a polishing tool for polishing a glass panel is coupled, and a driving motor for rotating the chuck. It is possible to effectively polish the window glass in which the hole is formed. The contents disclosed in the above patent documents are incorporated herein by reference.

The conventional polishing system as described above is configured to grind the surface of the workpiece with a polishing tool while transferring the support, the jig, etc. on which the workpiece is mounted by the operation of the conveyor, but loading, polishing , there is a problem in that both sides of the workpiece cannot be continuously polished because it is composed of a batch type in which the workpiece is polished by one cycle of unloading. That is, in order to grind both surfaces of the workpiece by a continuous process, the workpiece must be inverted during the process line. In order to implement a continuous process by a batch-type grinding system, a semi-zero electric device is installed between the primary grinding device that grinds one side of the workpiece and the secondary grinding device that grinds the other side of the workpiece, and the primary grinding After unloading the workpiece that has undergone the primary grinding in the device, it is reversed by the reversing device and reloaded to the secondary grinding device to be polished. There is a problem with this degradation.

On the other hand, a vacuum table such as a support part for vacuum adsorbing a plurality of workpieces and transporting them along a process line is a vacuum source such as a vacuum pump, an air pump, or an air compressor. (Vacuum source) and the pipeline (Pipe line) should be connected. In order to grind both sides of a workpiece by a continuous process, it entails many problems in connecting the vacuum table and the vacuum source, which are transported. First, the length of the pipeline and the vacuum source become longer and more complicated. Second, a cable drag chain, which is also called a cableveyor (trade name) for wiring and piping, is commonly used, but the length of use of the cable drag chain is limited. Third, in order to transport the vacuum table connected by the vacuum source and the pipeline from the downstream to the upstream of the continuous processing line, the pipeline must be separated and transported. Connection and separation of the vacuum table and the vacuum source There is this troublesome and complicated problem.

In a conventional polishing system, a relatively large and heavy workpiece may be polished while being transported by mounting the workpiece on a tray without using a vacuum table. However, the workpiece is moved by frictional force with the polishing tool, resulting in a polishing defect. Therefore, the workpiece is clamped to the tray by the jaw of the clamping unit, but it takes a lot of time to clamp the workpiece, so there is a problem in that productivity is lowered. Also, depending on the shape and size of the workpiece, the grinding may be affected by interference between the abrasive tool and the clamping unit.

The present invention is to solve the problems of the polishing system as described above, and it is possible to rapidly and accurately grind both sides of a workpiece by a continuous process, and to provide a new polishing system capable of automatically transporting a tray to which a workpiece is mounted and transported. intended to provide Another object of the present invention is to provide a polishing system capable of improving the productivity of a work by fixing a work piece by vacuum adsorption or pressure fixing method according to the state of the work piece.

According to one aspect of the present invention, a polishing system is provided. An abrasive system according to the present invention comprises a loading station for loading a workpiece into a tray capable of loading and transporting a workpiece having a first surface and a second surface opposite the first surface, the loading station being disposed downstream of the loading station and a primary polishing station for abrading the first surface; a reversing station disposed downstream of the primary polishing station for inverting the workpiece to abrade a second surface; a secondary polishing station for polishing the second surface, and a forward conveyor arranged downstream of the secondary polishing station to transport trays along the unloading station for unloading workpieces; a return conveyor installed in parallel with the forward conveyor under the forward conveyor to transport the tray from the unloading station to the loading station; a first lifter installed upstream of the forward conveyor and the return conveyor so as to take the tray from the return conveyor and hand it over to the forward conveyor; a second lifter installed downstream of the forward conveyor and the return conveyor so as to take the tray from the forward conveyor and hand it over to the return conveyor; a plurality of primary polishing apparatuses installed in the primary polishing station to polish the first surface; a plurality of secondary polishing apparatuses installed in the secondary polishing station to polish the second surface; and a workpiece pressing and fixing device for pressing and fixing the workpiece by following the shape of the workpiece mounted on the tray by the cam motion.

In addition, in the polishing system according to the present invention, the tray has a plurality of air intake holes formed to allow vacuum suction of the workpiece, and a plurality of air intake lines connected to the plurality of air intake holes and exposed on both sides. and a buffer table having a plurality of check valves mounted at the ends of each of a plurality of air intake lines exposed on both sides. The polishing system according to the present invention further includes a vacuum source capable of discharging air from the vacuum table, and a plurality of vacuum docking devices installed along the forward conveyor to intermittently connect each of the plurality of check valves and the vacuum source. .

Each of the workpiece pressing and holding devices of the polishing system according to the present invention includes a pair of cams mounted on both sides of the upper surface of the tray so as to be parallel to each other along the conveying direction of the workpiece, and the forward conveyor. A lifting plate arranged to be raised and lowered at intervals along the primary and secondary grinding stations on the upper side, and a pair of cam followers coupled to both sides of the lifting plate for camming along a pair of cams. a cam mechanism having; a pressing and fixing mechanism interlocking with the cam motion of the cam mechanism for pressing and fixing the workpiece; and a vertical linear actuator that cooperates with the cam motion of the cam mechanism, and applies a preload so that the pressure fixing mechanism presses and fixes the workpiece. The cam mechanism that follows the shape of the work piece and the vertical linear actuator interlock to apply a preload to the pressurization mechanism, so that the work piece can be stably fixed by the pressurization of the pressurization mechanism.

The polishing system according to the present invention can rapidly and accurately grind both sides of a workpiece by a continuous process consisting of loading, primary grinding, inversion, secondary grinding and unloading of the workpiece. In addition, the polishing system according to the present invention automatically conveys a tray carrying a plurality of workpieces with the cooperation of a return conveyor and first and second lifters to increase productivity and reduce production costs. can do. The polishing system according to the present invention can simplify the structure of the pipeline by intermittently performing the connection of the vacuum source and the vacuum source to the tray to which the workpiece is mounted and transported by the vacuum docking device.

1 is a plan view schematically showing a polishing system according to the present invention.
FIG. 2 is a front view of FIG. 1 ;
3 is a front view showing the first lifter in the polishing system according to the present invention.
4 is a front view showing the second lifter in the polishing system according to the present invention.
5 is a perspective view showing an example of primary and secondary polishing apparatus in the polishing system according to the present invention.
6 is a front view of FIG. 5 .
7 is a perspective view showing an example of a tray in the polishing system according to the present invention.
8 is a plan view illustrating the tray of FIG. 7 .
9 is a front view showing the tray of FIG.
FIG. 10 is a perspective view partially illustrating the tray of FIG. 7 .
11 is a perspective view showing another example of the tray in the polishing system according to the present invention.
12 is a plan view illustrating the tray of FIG. 11 .
13 is a perspective view showing a tray and a buffer docking device in the polishing system according to the present invention.
14 is a perspective view partially showing a tray and a buffer docking apparatus in the polishing system according to the present invention.
15 is a perspective view showing a buffer docking device in the polishing system according to the present invention.
16 is a plan view showing a state in which the tray and the buffer docking device are separated in the polishing system according to the present invention.
17 is a perspective view showing a state in which the tray and the buffer docking device are coupled in the polishing system according to the present invention.
18 is a perspective view showing a configuration in which a workpiece pressurizing device is installed in the primary and secondary polishing apparatuses in the polishing system according to the present invention.
19 is a front view of FIG. 18 ;
20 is a cross-sectional view illustrating the operation of the workpiece pressurizing device in the polishing system according to the present invention.
21 is a perspective view showing a work piece pressurization fixing device in the polishing system according to the present invention.
22 is a partial perspective view of a workpiece press and hold device in the polishing system according to the present invention.

Other objects, specific advantages and novel features of the present invention will become more apparent from the following detailed description and preferred embodiments taken in conjunction with the accompanying drawings.

Hereinafter, preferred embodiments of the polishing system according to the present invention will be described in detail with reference to the accompanying drawings.

First, referring to FIGS. 1 to 4 , the polishing system 10 according to the present invention includes a forward conveyor 20 that sequentially transports the workpiece 2 according to the process sequence for polishing the workpiece 2 . As shown in FIG. 7 , the workpiece 2 may be a three-dimensional glass 4 having a curve such as a side mirror of a car, a concave mirror, a convex mirror, and the like. In addition, as shown in FIG. 11 , the workpiece 2 may be a three-dimensional cover glass 4 or edge curved glass used in a mobile device such as a smart phone.

1 and 2 , the forward conveyor 20 includes a loading station S1 for loading the workpiece 2 , and is disposed downstream of the loading station S1 to load the workpiece 2 . A primary polishing station (S2) for primary polishing of a first surface (2a) of 2) a reverse station (S3) for reversing the workpiece (2) so that the second surface (2b) of 2) can be polished secondary 2 A secondary polishing station (S4) for secondary polishing of the surface (2b), and an unloading station (Unloading) disposed downstream of the secondary polishing station (S4) for unloading the workpiece (2) station: S5) is provided. In this embodiment, the primary polishing station S2 is configured to be capable of polishing the workpiece 2 in three steps. The secondary grinding station S4 is configured to grind the workpiece 2 in six steps. The forward conveyor 20 may include a roller conveyor 22 , a chain conveyor, and the like.

1 to 4 and 7 to 13 , the workpiece 2 is mounted on a tray 30 or a workpiece carrier and driven by the roller conveyor 22 at each station S1 to S5 ) are transferred sequentially. The tray 30 shown in FIGS. 7 to 10 and 13 can be used to transfer a relatively heavy curved three-dimensional glass 4 to the workpiece 2 . The tray 30A of another example shown in FIGS. 11 and 12 is configured as a vacuum table 32 and can be used to transfer the cover glass 6 to the workpiece 2 .

The tray 30 is configured so that a plurality of workpieces 2 can be arranged and mounted in a Cartesian coordinate system. The tray 30 is composed of a vacuum table (32). The vacuum table 32 includes a plurality of air intake holes 32a formed for vacuum adsorption of the workpiece 2, and a plurality of air intake holes 32a formed to connect both sides of the vacuum table 32 and the air intake holes 32a. of an air suction line (32b).

A plurality of pads (Pads: 34, 34a) is further mounted on the upper surface of the vacuum table 32 so as to seat the plurality of workpieces (2) in predetermined positions. The pads 34 and 34a may be made of silicone rubber or elastomer, flexible plastic, or the like. The pads 34 and 34a are coupled so as to be detachably attached to the upper surface of the tray 30 by bolting. A plurality of check valves (Check valves: 36) are mounted at the starting points of each of the air intake lines (32b) exposed on both sides of the vacuum table (32). A plurality of locator holes (38) or positioning holes (Positioning holes) are formed on both sides of the holding table (32) so as to be adjacent to the starting point of the air intake lines (32b).

1 to 4 again, the polishing system 10 according to the present invention is at the bottom of the forward conveyor 20 so as to transfer the tray 30 from the unloading station S5 to the loading station S1. A return conveyor (40) installed in parallel with the forward conveyor (20), and a forward conveyor (20) to take over the tray (30) from the return conveyor (40) and hand it over to the forward conveyor (20) and a first lifter (50) installed upstream of the return conveyor 40, and a forward conveyor ( 20) and a second lifter (Second lifting conveyor: 60) installed upstream of the return conveyor (40).

The return conveyor 40 may be configured as a roller conveyor 42 , a chain conveyor, or the like. Each of the first and second lifters 50 and 60 includes a frame 52 and 62 , a lifting conveyor 54 and 64 , a vertical linear actuator 56 and 66 and a plurality of linear motions. It is composed of a guide (Linear motion guide: 58, 68). Frames 52 and 62 are arranged adjacent to each other upstream and downstream of forward and return conveyors 20 and 40, respectively. The lifting conveyors 54 and 64 have an ascending position P1 disposed on the same horizontal plane as the forward conveyor 20 and a descending position disposed on the same horizontal plane as the return conveyor 40 so that the tray 30 can be taken over. It is arrange|positioned on the frames 52 and 62 so that it can raise/lower between (P2).

The vertical linear actuators 56 and 66 are connected to the lifting conveyors 54 and 64 so as to elevate the lifting conveyors 54 and 64 . The vertical linear actuators 56 and 66 include servomotors 56a and 66a mounted on frames 52 and 62 so as to provide driving force for elevating the lifting conveyors 54 and 64, and servomotors 56a, A chain transmission mechanism connecting between the servo motors 56a and 66a and the lifting conveyors 54 and 64 so as to elevate the lifting conveyors 54 and 64 by driving 66a) (Chain transmission mechanism 56b, 66b) is composed of The servomotors 56a and 66a may be configured as geared motors. The vertical linear actuators 56 and 66 include a servomotor, a lead screw, a nut block, a lead screw linear actuator having a slider or a carriage, and a pneumatic cylinder. (Pneumatic cylinder), a belt driven linear actuator, a pneumatic rodless linear actuator, a rack and pinion actuator, etc. may be configured.

Each of the linear motion guides 58 and 68 is provided near the four corners of the lifting conveyors 54 and 64 to guide the lifting and lowering of the lifting conveyors 54 and 64 in a linear motion by the operation of the vertical linear actuators 56 and 66, respectively. It is arranged to guide and consists of a guide bar (Guide bar: 58a, 68a) and a guide bush (Guide bush: 58b, 68b). Guide bars 58a and 68a stand on frames 52 and 62 and stand on frames 52 and 62 to pass through lifting conveyors 54 and 64. The guide bushes 58b and 68b are mounted on the lifting conveyors 54 and 64 so that the guide bars 58a and 68a are inserted and guided. Each of the linear motion guides 58 and 68 is a guide rail and a monorail type having a slider coupled to the lifting conveyors 54 and 64 to slide along the guide rail. may be configured. The first and second lifters 50 and 60 have a plurality of dampers 70 or shock-ups mounted on the frames 52 and 62 to support the lowering lifting conveyors 54 and 64 to cushion the impact. A shock absorber is further provided.

1 , 2 , 5 and 6 , a polishing system 10 according to the present invention is installed in a primary polishing station S2 to polish a first surface 2a of a workpiece 2 . of the primary polishing apparatus 80; 80-1 to 80-3, and the second surface 2b or rear surface of the workpiece 2 installed in the secondary polishing station S4 and opposite to the first surface 2a A plurality of secondary polishing devices (90; 90-1 to 90-6) for polishing the The primary polishing apparatuses 80 (80-1 to 80-3) are configured to polish the first surface 2a in three steps. The secondary polishing devices 90 (90-1 to 90-6) are configured to polish the second surface 2b in six steps. Each of the primary and secondary polishing apparatuses 80 and 90 includes a servomotor, a polishing tool 82 and 92 rotated by the drive of the servomotor, and elevating the polishing tool with respect to the workpiece 2 . It may consist of a vertical linear actuator. The abrasive tools 82 and 92 may be configured as a wheel type, a brush type, or the like, depending on the type of grinding of the workpiece 2 .

1 and 2, the polishing system 10 according to the present invention is installed in a loading station S1 to mount a workpiece 2 on a tray 30. A Workpiece loader 100, It is installed in the unloading station (S5) to unload the workpiece (2) from the tray 30 (Workpiece unloader: 110), and installed in the reversing station (S3) is mounted on the tray (30) It further includes an inversion handler (120) for inverting the workpiece (2) and mounting it again. Each of the workpiece loaders and unloaders 100 , 110 and the reversing handler 120 is a transfer feeder having an end effector such as a vacuum adsorption device for loading and unloading the workpiece 2 . (Transfer feeder), it may be composed of a multi degree of freedom robot (Multi degree of freedom robot), etc. In some embodiments, the loading, unloading and reversing of the workpiece 2 may be performed manually by an operator.

Referring to FIGS. 1, 5, 6 and 13 to 18 , the polishing system 10 according to the present invention includes the holding table 32 at each station S1 to S5 along the forward conveyor 20 . It further includes a plurality of buffer docking device 140 installed so as to intermittently connect the air suction line (32b) and the vacuum source (130). The vacuum source 130 may be composed of a vacuum pump 132 , an air pump, an air compressor, etc. that generate suction force of air for vacuum adsorption of the workpiece 2 . The vacuum pump 132 is connected to a pipeline (Pipeline: 134). The vacuum docking device 140 includes a pair of linear actuators 142 , a first moving plate 144 , a second moving plate 146 , and a plurality of vacuum pipes 148 . is composed of

The linear actuators 142 are mounted at intervals from each other along the forward conveyor 20 so as to be adjacent to both sides of the vacuum table 32 at each station S1 to S5 . The linear actuators 142 may be configured as pneumatic cylinders. The first moving plate 144 is connected to the linear actuators 142 so as to move along the approaching and spaced apart directions with respect to both sides of the vacuum table 32 . The second moving plate 146 is disposed between the hold table 32 and the first moving plate 144 so as to move along the approach and spaced apart directions with respect to both sides of the hold table 32 . The plurality of buffer pipes 32 are coupled to the first and second moving plates 144 and 146 at intervals to connect the first and second moving plates 144 and 146 to each other. Each of the air intake lines 32b and the vacuum pump 132 may be connected by each of the vacuum pipes 32 .

A plurality of vacuum pads 150 are connected to each of the vacuum pipes 148 to protrude from the rear surface of the second moving plate 146 facing the vacuum table 32 . A plurality of tube fittings (Tube fittings: 152) are coupled to the front surface of the first moving plate (144) so as to be connected to each of the vacuum pipes (148). A pipeline 134 is connected to each of the tube fittings 152 . A plurality of locator pins (Locator pins: 154) or positioning pins (Positioning pins) of the second moving plate (146) to fit into each of the locator holes (38) in a one-to-one correspondence for positioning the holding table (32) It is more attached to the rear.

7 to 9, 13 and 18 to 22, the polishing system 10 according to the present invention follows the outer shape of the workpiece 2 mounted on the tray by a cam motion. A plurality of workpiece pressure fixed device for fixing (Workpiece pressure fixed device: 160) is provided. Each of the workpiece pressure fixing devices 160 is composed of a cam mechanism 170 , a pressure fixed mechanism 180 , and a vertical linear actuator 190 .

The cam mechanism 170 is configured to follow the curvature of the work 2 and to move linearly in the vertical direction, that is, to be able to move up and down. The cam mechanism 170 is composed of a pair of cams 172 , a lifting plate 174 , and a pair of cam followers 176 . The cams 172 are mounted on both sides of the upper surface of the tray 30 so as to be parallel to each other along the transport direction of the workpiece 2 . The cams 172 have a cam curve formed on the upper surface to conform to the curvature of the workpiece 2 . The lifting plate 174 is disposed above the forward conveyor 20 so that it can be raised and lowered at intervals along the primary and secondary polishing stations S2 and S4. Cam followers 176 are mounted on either side of the lifting plate 174 by Brackets 178 to allow cam movement along the cams 172 . The cam followers 176 are configured as rollers to reduce frictional resistance with the cams 172 . In some embodiments, when using the tray 30 for holding the workpiece 2 by the operation of the workpiece pressurization devices 160 , the tray 30 is not configured as the holding table 32 and is docked. Devices 140 may be excluded.

The press fixing mechanism 180 is configured to press and fix the workpiece 2 in conjunction with the cam motion of the cam mechanism 170 . The pressure fixing mechanism 180 includes a pair of support bars 182 , a cover plate 184 , and a press roller 186 . Each of the support bars 182 is coupled to both sides of the lifting plate 174 . Both sides of the cover plate 184 are coupled to the support bars 182 . The press roller 186 is rotatably mounted on the lower side of the cover plate 184 by rolling friction with the workpiece 2 . The press roller 186 presses and holds the workpiece 2 against the tray 30 .

The vertical linear actuator 190 applies a pre-load to the press fixing mechanism 180 that presses the workpiece 2 in conjunction with the cam motion of the cam mechanism 170 to transfer the workpiece 2 to the tray 30. It is designed to be fixed to the The vertical linear actuator 190 includes a mounting plate 192 and a pair of pneumatic cylinders 194 . The mounting plate 192 is fixed to each of the primary and secondary polishing apparatuses 80 and 90 so as to be disposed above the return conveyor 40 . The pneumatic cylinders 194 are mounted on both sides of the upper surface of the mounting plate 192 . Each of the pneumatic cylinders 194 has a cylinder rod 196 connected to a lifting plate 174 through a mounting plate 192 . The cylinder rod 196 is connected to the lifting plate 174 by a connecting rod 198 . The pneumatic cylinders 194 maintain a position at which the press roller 186 can stably press the workpiece 2 at all times by means of a preload. In some embodiments, the vertical linear actuator 190 converts the displacement of the rod connected to the lifting plate 174 into an electrical signal to actuate the rod. It may be configured as a solenoid actuator.

From now on, the operation of the polishing system according to the present invention having such a configuration will be described.

1, 7 and 11, the workpiece 2, such as the three-dimensional glass 4 and the cover glass 6, is placed on the holding table ( 32) is installed. The workpiece 2 may be manually mounted on the buffer table 32 . When the workpiece 2 is mounted on the vacuum table 32 , the vacuum table 32 is transferred from the loading station S1 to the primary polishing station S2 by the operation of the forward conveyor 20 .

13 to 15 and 17 , when the vacuum table 32 is disposed in the primary polishing station S2, the linear actuators 142 of each of the vacuum docking devices 140 are operated to operate the first and second 2 The moving plates 144 and 146 are advanced. As the first and second moving plates 144 and 146 advance, each of the locator pins 154 is fitted into each of the locator holes 38 to position and fix the vacuum table 32 . In addition, each of the vacuum pads 150 is in close contact with each of the check valves 36 to allow air to be discharged. When each of the vacuum pads 150 is in close contact with each of the check valves 36 , an air suction force is generated through the air suction holes 32a by the operation of the vacuum pump 132 , thereby vacuum adsorbing the workpiece 2 . . In this way, when the workpiece 2 is polished by the operation of the primary polishing devices 80, the workpiece 2 is vacuum-adsorbed by the docking of the vacuum table 32 and the buffer docking devices 140 to fix the workpiece 2 can be reliably maintained, and it is possible to prevent abrasive defects occurring while the workpiece 2 moves.

4, 5 and 16, when the workpiece 2 is vacuum-adsorbed and fixed to the vacuum table 32, the first surface 2a of the workpiece 2 is caused by the operation of the primary polishing apparatuses 80 ), that is, the upper surface is first polished. The primary polishing process of the first surface 2a may be performed in three steps. In order to transport the buffer table 32 to each step in the primary polishing process, the buffer table 32 and the buffer docking devices 140 are undocked, and then the buffer table 32 is operated by the forward conveyor 20. should be transported The linear actuators 142 of each of the buffer docking devices 140 are operated to retract the first and second moving plates 144 and 146 . Retraction of the first and second moving plates 144 , 146 causes each of the locator pins 154 to be pulled out from each of the locator holes 38 , and each of the vacuum pads 150 is removed from each of the check valves 36 . As it falls, the fixing and vacuum of the holding table 32 are released. Each of the check valves 36 prevents the discharge of air through the air intake line 32b even when the vacuum pads 150 are separated, thereby maintaining the vacuum adsorption force to the extent that the workpiece 2 does not move on the vacuum table 32 . will do it Therefore, it is possible to prevent the separation of the workpiece (2) during the transfer of the buffer table (32).

1 to 4, when the primary polishing process of the workpiece 2 is completed, the buffer table 32 is moved from the primary polishing station S2 to the inversion station S3 by the operation of the forward conveyor 20. is transferred to The reversal handler 120 inverts and reloads the workpiece 2 mounted on the vacuum table 32 such that the polished first surface 2a faces down and the unpolished second surface 2b faces up. make it When the reversing of the workpiece 2 is completed, the vacuum table 32 is transferred from the reversing station S3 to the secondary polishing station S4 by the operation of the forward conveyor 20 . When the vacuum table 32 is placed in the secondary polishing station S4, the vacuum table 32 and the vacuum docking devices 140 are docked and the workpiece 2 is vacuum-adsorbed by the operation of the vacuum pump 132. , the second surface 2b is polished in six steps by the operation of the secondary polishing apparatuses 90 .

1, 2 and 8, when the secondary polishing process of the workpiece 2 is completed, the holding table 32 is unloaded from the primary polishing station S2 by the operation of the forward conveyor 20. It is transferred to station S5. The workpiece 2 is unloaded from the vacuum table 32 by operation of the workpiece unloader 110 at the unloading station S5. The lifting conveyor 64 is raised to a raised position P1 of the same horizontal plane aligned with the forward conveyor 20 by the operation of the vertical linear actuator 66 .

Subsequently, when the unloading of the workpiece 2 is completed, the holding table 32 is unloaded by the operation of the forward conveyor 20 and the lifting conveyor 64 raised to the lifting position P1. is transferred to the lifting conveyor 64 of the second lifter 60 . Therefore, the buffer table 32 transferred by the operation of the forward conveyor 20 is smoothly taken over by the lifting conveyor 64 . When the holding table 32 is taken over by the lifting conveyor 64 , the lifting conveyor 64 is lowered by the operation of the vertical linear actuator 66 . When the lifting conveyor 64 being lowered is disposed at the lowering position P2 in the same horizontal plane as the return conveyor 40, the vertical linear actuator 66 is stopped. Dampers 70 support the lowering lifting conveyor 64 to cushion the impact.

1, 2 and 7 , the storage table 32 loaded on the lifting conveyor 64 by the operation of the return conveyor 40 and the lifting conveyor 64 is taken over by the return conveyor 40 . The return conveyor 40 transfers the taken over holding table 32 from the downstream to the upstream, that is, from the second lifter 60 side to the first lifter 50 side. The transported holding table 32 is taken over by a lifting conveyor 54 that is being lowered. After the lifting conveyor 54 is raised by the operation of the vertical linear actuator 56 , the holding table 32 is sent to the forward conveyor 20 . The forward conveyor 20 transfers the vacuum table 32 taken over from the lifting conveyor 54 to the loading station S1. Due to the circulation structure of the vacuum table 32 as described above, it is possible to increase productivity by reducing the wasted time required for loading and unloading the workpiece 2 .

7, 13 and 18 to 22, in the polishing system 10 according to the present invention, the relatively heavy three-dimensional glass 4 is mounted on the tray 30 and transported to the tray by its own weight. Although not separated from (30), it is necessary to prevent movement due to friction with the abrasive tools 82 and 92 during primary and secondary grinding. When the tray 30 is transported by the operation of the forward conveyor 20 , the cam followers 176 move along the cams 172 mounted on the upper surface of the tray 30 . When the cam followers 176 are raised and lowered by the cam motion, the lifting plate 174 and the press roller 186 are raised and lowered together.

Subsequently, the cylinder rod 196 of the pneumatic cylinders 194 is expanded and contracted by the lifting of the lifting plate 174 . The pneumatic cylinders 194 apply a preload to a position where the press roller 186 can always press the three-dimensional glass 4 . As described above, the press roller 186 presses the three-dimensional glass 4 against the tray 30 and firmly fixes it so that it does not move. ), the three-dimensional glass 4 can be polished stably and efficiently. As described above, in the polishing system 10 according to the present invention, the press and fixation of the workpiece pressurization device 160 according to the shape and size of the workpiece 2 such as the curved three-dimensional glass 4, the cover glass 6, etc. Since the workpiece 2 can be stably fixed and efficiently polished by the vacuum suction of the vacuum table 32 and the vacuum docking device 140 , it is possible to prevent polishing defects and improve productivity.

The embodiment described above is only a description of a preferred embodiment of the present invention, the scope of the present invention is not limited to the described embodiment, and within the technical spirit and claims of the present invention, those skilled in the art Various changes, modifications or substitutions will be possible by, and it should be understood that such embodiments fall within the scope of the present invention.

10: grinding system 20: forward conveyor
30: tray 32: hold table
38: check valve 40: locator hole
40: return conveyor 50: first lifter
54, 64: lifting conveyor 56, 66: vertical linear actuator
58, 68: linear motion guide 60: second lifter
70: damper 80: primary grinding device
90: secondary grinding device 100: workpiece loader
110: workpiece unloader 120: reversal handler
130: vacuum source 132: vacuum pump
140: vacuum docking device 142: linear actuator
144: first moving plate 146: second moving plate
148: holding pipe 150: holding pad
152: tube fitting 154: locator pin
160: workpiece pressure fixing device 170: cam mechanism
172: cam 174: lifting plate
176: cam follower 180: pressure fixing mechanism
182: support bar 184: cover plate
186: press roller 190: vertical linear actuator
192: mounting plate 194: pneumatic cylinder

Claims (12)

a loading station for loading a workpiece on a tray capable of loading and transporting a workpiece having a first surface and a second surface opposite the first surface; a primary polishing station for abrading; a reversing station disposed downstream of the primary polishing station and disposed downstream of the reversing station for inverting the workpiece to abrade the second surface; a secondary polishing station for polishing two surfaces and a forward conveyor disposed downstream of the secondary polishing station to transport the tray along an unloading station for unloading the workpiece;
a return conveyor installed in parallel with the forward conveyor under the forward conveyor to transport the tray from the unloading station to the loading station;
a first lifter installed upstream of the forward conveyor and the return conveyor so as to take the tray from the return conveyor and hand it over to the forward conveyor;
a second lifter installed downstream of the forward conveyor and the return conveyor to receive the tray from the forward conveyor and hand it over to the return conveyor;
a plurality of primary polishing apparatuses installed in the primary polishing station to polish the first surface;
a plurality of secondary polishing apparatuses installed in the secondary polishing station to polish the second surface;
and a workpiece pressing and fixing device for pressing and fixing the workpiece by following the shape of the workpiece mounted on the tray by a cam motion. According to claim 1,
Each of the first and second lifters,
frame;
a lifting conveyor disposed on the frame so as to be able to take over the tray between an elevated position disposed on the same horizontal plane as the forward conveyor and a descending position disposed on the same horizontal plane as the return conveyor;
a vertical linear actuator capable of elevating the lifting conveyor;
A polishing system comprising a plurality of linear motion guides for guiding the lifting and lowering of the lifting conveyor in a linear motion. 3. The method of claim 2,
Each of the forward conveyor, the return conveyor, and the lifting conveyors of the first and second lifters is made of a roller conveyor, and each of the first and second lifters supports the lowering lifting conveyor to cushion the impact. The polishing system further comprising a plurality of dampers mounted on the frame. According to claim 1,
The polishing system further comprising a reversing handler installed in the reversing station to invert and re-mount the workpiece mounted on the tray. 5. The method according to any one of claims 1 to 4,
The tray has a plurality of air intake holes formed to allow vacuum adsorption of the workpiece, a plurality of air intake lines connected to the plurality of air intake holes and exposed on both sides, and exposed on both sides. A polishing system comprising: a vacuum table having a plurality of check valves mounted at the ends of each of the plurality of air intake lines; and a vacuum source capable of discharging air from the vacuum table. 6. The method of claim 5,
installed along the forward conveyor to intermittently connect each of the plurality of check valves and the vacuum source at each of the loading station, the primary polishing station, the reversing station, the secondary polishing station and the unloading station A polishing system further comprising a plurality of buffer docking devices. 7. The method of claim 6,
Each of the plurality of buffer docking devices,
a pair of linear actuators mounted at intervals along the forward conveyor so as to be adjacent to both sides of the vacuum table;
a first moving plate connected to the pair of linear actuators so as to move in a direction approaching and spaced apart from both sides of the buffer table;
a second moving plate disposed between the vacuum table and the first moving plate so as to move in a direction approaching and separating from both sides of the buffer table;
A plurality of vacuum pipes coupled to the first and second moving plates at a distance from each other to connect the first and second moving plates, respectively, connecting the plurality of air intake lines and the vacuum source; grinding system. 8. The method of claim 7,
It is connected to each of the plurality of vacuum pipes so as to protrude from the rear surface of the second moving plate facing the vacuum table and is in close contact with each of the plurality of check valves to enable air to be discharged through each of the plurality of check valves A polishing system further comprising a plurality of buffer pads. 8. The method of claim 7,
A plurality of locator holes are further formed to be adjacent to the ends of each of the plurality of air intake lines, and a locator pin coupled to the rear surface of the moving plate so as to be fitted into each of the plurality of locator holes for positioning the holding table Polishing system further comprising a. According to claim 1,
Each of the plurality of workpiece pressing and fixing devices,
A pair of cams mounted on both sides of the upper surface of the tray so as to be parallel to each other along the conveying direction of the workpiece, and disposed above the forward conveyor so as to be able to ascend and descend at intervals along the primary and secondary grinding stations, a cam mechanism having a lifting plate provided therein and a pair of cam followers coupled to both sides of the lifting plate so as to be capable of camming along the pair of cams;
a pressing and fixing mechanism interlocking with the cam motion of the cam mechanism and pressing and fixing the work piece;
and a vertical linear actuator that cooperates with a cam motion of the cam mechanism and applies a preload so that the pressure holding mechanism presses and fixes the workpiece. 11. The method of claim 10,
The pressure fixing mechanism,
a pair of support bars coupled to both sides of the lifting plate;
a cover plate coupled to the pair of support bars;
A polishing system comprising a press roller that is rotatably mounted below the cover plate and presses the workpiece. 11. The method of claim 10,
The vertical linear actuator is
a mounting plate fixed to each of the plurality of primary and secondary polishing devices so as to be disposed above the return conveyor;
A polishing system comprising a pair of pneumatic cylinders mounted on both sides of the upper surface of the mounting plate and having a cylinder rod passing through the mounting plate and connected to the lifting plate.

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