KR20210131015A - Compound, antireflection film comprising the same and display device - Google Patents

Abstract

The objective of the present invention is to provide a compound capable of absorbing light in the blue short wavelength region, or the near-blue wavelength region of a light source. To this end, the present invention provides a compound represented by chemical formula 1, an anti-reflection film comprising the same, and a display device comprising the anti-reflection film. In chemical formula 1, each substituent is the same as defined in the specification.

Description

COMPOUND, ANTIREFLECTION FILM COMPRISING THE SAME AND DISPLAY DEVICE

The present disclosure relates to a compound, an antireflection film comprising the same, and a display device comprising the antireflection film.

In a typical liquid crystal display (LCD), light emitted from a white light source passes through the RGB color filter of each pixel to form sub-pixels of each color, and by combining them, colors in the RGB range can be produced.

Recently, new displays using light emitting materials such as quantum dots or organic/inorganic phosphors that emit color of each subpixel have been developed. A method of using a light source has been proposed.

When a UV light source is used, each color is generated by a blue, green, and red light emitting body, but when a blue light source is used, each color is generated by a green and red light source, and the blue pixel transmits the light source as it is. .

In the case of quantum dot-containing display materials that are recently commercialized or under development, the emission of green quantum dots and red quantum dots through a blue light source or a white light source is used. The quantum dot-containing display device is intended to improve color gamut and luminance by using a quantum dot material, and development of a panel using quantum dot light emission using various types of light sources is continuing. In addition, it is possible to improve the viewing angle according to the application position of the quantum dot material in the panel configuration. The next-generation quantum dot display device is being developed in the direction of increasing the intensity of the light source in order to improve the luminous efficiency of the quantum dot or in the direction of developing the light source in which the blue region is extended.

In the quantum dot display device, the spectrum of the light source reaching the quantum dot material has a very close effect on the efficiency of the quantum dot, and since the characteristics are different depending on the current light source type, a new approach to improve the efficiency of the quantum dot for each light source is introduced in various ways. Efforts are continuing in

On the other hand, in the case of a new display using a light emitting body, it is necessary to lower the reflectance due to external light or to adjust the panel color due to scattered reflection. In order to solve this problem, there was an attempt to use a dye in the optical member constituting the panel. When quantum dots are used as the light emitting body, there is a problem in that it is difficult to lower the reflectance due to external light or adjust the color of the panel.

Accordingly, in the case of new displays, an anti-reflection film with improved luminance loss or color correction has been introduced. Attempts to additionally apply azo dyes are continuing.

However, although the cyanine-based dye or azo-based dye can absorb light in a short wavelength region, there is a problem in that light resistance reliability is lowered, so it is difficult to apply it to an anti-reflection film.

One embodiment is to provide a compound capable of absorbing light in a short blue wavelength region of a light source, that is, in a near blue wavelength region.

Another embodiment is to provide an anti-reflection film comprising the compound.

Another embodiment is to provide a display device including the anti-reflection film.

One embodiment provides a compound represented by the following formula (1).

[Formula 1]

In Formula 1,

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom or a metal oxide atom,

R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided ^{that at least one of R 1} to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,

R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided ^{that at least two of R 9} to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.

At least one of R ¹ and R ² and at least one of R ⁵ and R ⁶ may each independently be a halogen atom, a cyano group, a carbonyl group, or a nitro group.

At least one of R ³ and R ⁴ and at least one of R ⁷ and R ⁸ may each independently be a halogen atom, a cyano group, a carbonyl group, or a nitro group.

At least one or more of R ¹ and R ² , at least one or more of R ³ and R ⁴ , at least one or more of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently a halogen atom, a cyano group, It may be a carbonyl group or a nitro group.

M may be Cu, Co, Zn, V(=O), or Ag.

Wherein R ^{9 To} R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ) can be.

At least two or more of R ⁹ to R ¹³ and at least two or more of R ¹⁴ to R ¹⁸ may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , and at least two or more of R ¹⁹ to R ²³ may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , at least two or more of R ¹⁹ to R ²³ , and at least two or more of R ²⁴ to R ²⁸ are each independently substituted or unsubstituted C1 to C20 alkoxy group.

The compound may be represented by any one of the following Chemical Formulas 1-1 to 1-9.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

The compound exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 500 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths.

The compound may be a dye.

Another embodiment provides an anti-reflection film comprising the compound.

The antireflection film may include an adhesive layer and an antireflection layer formed on the adhesive layer, and the compound may be included in the adhesive layer.

The antireflection film may include an adhesive layer, a dye-containing layer, and an antireflection layer formed on the dye-containing layer, and the compound may be included in the dye-containing layer.

Another embodiment provides a display device including the anti-reflection film.

The display device may further include a quantum dot-containing layer.

The display device may further include a quantum dot-containing layer, a light source, a color filter, and a substrate.

In the display device, the quantum dot-containing layer is positioned on the light source, the color filter is positioned on the quantum dot-containing layer, the substrate is positioned on the color filter, and the anti-reflection film is positioned on the substrate.

The light source may be a blue light source.

The substrate may include a glass substrate.

The specific details of other aspects of the invention are included in the detailed description below.

By using a compound having near-ultraviolet (350 nm to 470 nm) absorption and a maximum absorption wavelength at 420 nm to 435 nm, solubility is improved, the reflectance by external light of the display device is lowered, and light resistance reliability is improved, as well as luminance loss is improved. and color gamut improvement.

1 and 2 are schematic views each independently showing an anti-reflection film according to an embodiment.
3 and 4 are schematic diagrams each independently showing a display device according to an embodiment.
5 is a graph showing transmittance according to wavelength of each compound according to Synthesis Examples 1 to 3 and Comparative Synthesis Example 1. FIG.

Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, and "cycloalkenyl group" means a C3 to C20 cycloalkenyl group, , "heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C6 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It refers to an arylene group, and "alkoxyylene group" refers to a C1 to C20 alkoxyylene group.

Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or a salt thereof, sulfonic acid group or a salt thereof, phosphoric acid or a salt thereof, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof means substituted with a substituent.

In addition, unless otherwise specified in the present specification, "hetero" means that at least one hetero atom among N, O, S and P is included in the formula.

In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" is "acrylic acid" and "methacrylic acid" “It means that both are possible.

Unless otherwise specified herein, "combination" means mixing or copolymerization.

Unless otherwise defined in the chemical formulas in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.

In the present specification, when describing a numerical range, “X to Y” means “X or more and Y or less” (X ≤ and ≤ Y).

In the present specification, "X to Y" in a description other than a numerical range means "from X to Y".

In the present specification, the "maximum absorption wavelength (λ _max )" of the compound (dye) refers to the wavelength at which the maximum absorbance appears when the absorbance is measured for a compound (dye) solution with a concentration of 10 ppm in cyclohexanone. The maximum absorbance can be measured according to a method known to those skilled in the art.

In the present specification, “light resistance reliability” refers to a display device in a Xenon Test Chamber (Q-SUN) [light source lamp: Xenon lamp, irradiation intensity: 0.35W/cm ² , irradiation temperature: 63°C, irradiation time: 500 hours, irradiation Direction: Light transmittance before and after irradiation under the conditions of [Irradiation from the antireflection film side] was measured at the maximum absorption wavelength of the dye and then evaluated as the amount of change in light transmittance.

In addition, unless otherwise specified in the present specification, "*" means a moiety connected to the same or different atoms or chemical formulas.

According to one embodiment, there is provided a compound represented by the following formula (1).

[Formula 1]

In Formula 1,

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom or a metal oxide atom,

R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided ^{that at least one of R 1} to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,

R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided ^{that at least two of R 9} to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.

Conventionally, attempts have been made to improve the color purity of a display device by absorbing neon color using an azaporphyrin-based compound, but the purpose of the display device containing quantum dots is different due to the use of a scatterer. The quantum dot-containing display device is intended to lower the reflectance in order to improve the reflection of external light due to the scatterer, which helps to improve the black visual perception of the device. Specifically, it is effective to use an anti-reflection film using a dye capable of absorbing mixed colors (Violet/Cyan/Neon/Near-IR) in order to lower the reflectance and minimize the deterioration of the RGB color purity of the panel. In particular, the absorption wavelength range is 480 nm to 520 nm Absorption of external light of a cyan color of phosphorus and a neon color having an absorption wavelength range of 530 nm to 670 nm is effective for reducing reflectance. However, if only dyes that absorb cyan and neon colors are used, it is difficult to implement neutral black in display devices. Therefore, Violet color with absorption wavelength range of 350 nm to 450 nm and Near-IR (Red) color with absorption wavelength range of 605 nm to 790 nm are difficult to implement. It is possible to correct the color of the anti-reflection film and the display device by mixing the absorbing dye. That is, by using a dye capable of absorbing mixed colors (Violet/Cyan/Neon/Near-IR), the reflectance can be lowered, the black visual perception can be improved, and the color reproducibility can also be increased. On the other hand, the compound represented by Formula 1 can improve solubility, which is one of the disadvantages of conventional porphyrin-based dyes, and improve light resistance reliability. That is, when the compound represented by Formula 1 according to an embodiment is applied to the anti-reflection film, it is possible to secure the light resistance reliability of the film. In particular, there is no known attempt to improve color gamut by using a specific compound to absorb mixed colors in a display device using a quantum dot light emitter. For example, in the case of cyan color, the absorption wavelength region is 480 nm to 520 nm, in the case of neon color, the absorption wavelength region is 530 nm to 670 nm, and in the case of near-IR color, the absorption wavelength region is 605 nm to 790 nm. The compound represented by 1 exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm, more specifically 420 nm to 430 nm among the absorption wavelengths, the compound represented by Formula 1 In the case of an antireflection film and a display device including a dye, it may be easy to secure light resistance reliability while minimizing a decrease in blue luminance.

As will be described later, in consideration of the spectrum of the blue light source, it is necessary to effectively absorb the short wavelength region (about 430 nm or more) of the blue light source to effectively improve the color gamut of the panel. For example, if the maximum absorption wavelength of the compound applied to the antireflection film is 435 nm, for example, longer than 430 nm and wide at half maximum, it is difficult to effectively absorb the short wavelength region of the blue light source, so it is difficult to secure light resistance reliability and improve the color gamut of the panel. . In addition, even when the maximum absorption wavelength of the compound applied to the antireflection film is much shorter than 435 nm, the short wavelength region of the blue light source cannot be effectively absorbed. Therefore, as the maximum absorption wavelength of the compound applied to the antireflection film approaches 435 nm, more specifically, 430 nm, the shorter wavelength region of the blue light source can be effectively absorbed. The compound represented by Formula 1 according to an embodiment has a maximum absorption wavelength at 420 nm to 435 nm, more specifically 420 nm to 430 nm, due to its structural specificity, and thus effectively absorbs the short wavelength region of the blue light source, and light resistance reliability It is possible to effectively improve the securing and color gamut of the panel.

For example, in Formula 1, ^{at least one of R 1} and R ² and at least one of R ⁵ and R ⁶ are each independently an electron withdrawing group, such as a halogen atom, a cyano group, a carbonyl group or a nitro group. can

For example, in Formula 1, ^{at least one of R 3} and R ⁴ and at least one of R ⁷ and R ⁸ are each independently an electron withdrawing group, such as a halogen atom, a cyano group, a carbonyl group, or a nitro group. can

For example, in Formula 1, ^{at least one or more of R 1} and R ² , at least one or more of R ³ and R ⁴ , at least one of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently as a halogen atom, a cyano group, a carbonyl group or a nitro group.

In Formula 1, when R ¹ to R ⁸ are the same as above, an effect of shifting the maximum absorption wavelength of the compound toward a long wavelength within a wavelength range of 435 nm or less can be implemented, so that a short wavelength region of a blue light source is effectively absorbed and the light resistance reliability is also improved. Furthermore, as the number ^{of electron withdrawing groups, for example, halogen atoms, increases among R 1} to R ⁸ , the effect of movement toward the long wavelength side increases, so that the absorption amount of the blue light source can be effectively controlled, and the light resistance reliability will also be improved. can

However, ^{as the number of electron acceptors such as halogen atoms among R 1} to R ⁸ increases, the solubility of the porphyrin-based compound decreases.

However, the present inventors defined R ⁹ to R ²⁸ in Formula 1 as above (R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group, with the proviso that R ⁹ to At least two or more of R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups), thereby maximally improving the solubility of the compound represented by Formula 1 above.

That is, the compound represented by Formula 1 has improved solubility compared to conventional porphyrin-based dyes, and at the same time has excellent long-wavelength shift effect and light resistance reliability of the maximum absorption wavelength, so it is very suitable for application to an anti-reflection film.

For example, in Formula 1, M may be Cu, Co, Zn, V(=O), or Ag. For example, in Formula 1, M may be Cu.

For example, in Formula 1, R ⁹ to R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted a cyclic C1 to C15 alkyl group).

For example, in Formula 1, ' ^{at least two or more of R 9} to R ¹³ ' and 'at least two or more of R ¹⁴ to R ¹⁸ ' may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

For example, in Formula 1, ' ^{at least two or more of R 9} to R ¹³ ', 'at least two or more of R ¹⁴ to R ¹⁸ ' and 'at least two or more of R ¹⁹ to R ²³ ' are each independently substituted or unsubstituted It may be a C1 to C20 alkoxy group.

For example, in Formula 1, ' ^{At least two or more of R 9} to R ¹³ ', 'At least two or more of R ¹⁴ to R ¹⁸ ', 'At least two or more of R ¹⁹ to R ²³ ', and 'R ²⁴ to R ²⁸ At least two or more' may be each independently a substituted or unsubstituted C1 to C20 alkoxy group. When ^{any one of R 9} to R ¹³ , any one of R ¹⁴ to R ¹⁸ , any one of R ¹⁹ to R ²³ , and any one of R ²⁴ to R ²⁸ is a substituted or unsubstituted C1 to C20 alkoxy group, Although the effect of improving light resistance reliability is insignificant, it is not preferable because the decrease in solubility is very severe.

For example, the substituted or unsubstituted C1 to C20 alkoxy group may be represented by Formula A below.

[Formula A]

In the above formula (A),

L ¹ is a substituted or unsubstituted C1 to C8 alkylene group,

R ²⁹ to R ³¹ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C8 alkyl group.

For example, the compound represented by Formula 1 may be represented by any one of Formulas 1-1 to 1-9, but is not limited thereto.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

The compound represented by Formula 1 exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths. As described above, when the compound represented by Formula 1 has a maximum absorption wavelength in the above range, it can effectively absorb a short wavelength region of a blue light source, thereby effectively improving light resistance reliability and color gamut of the panel.

For example, the compound represented by Formula 1 may be a dye.

Another embodiment provides an anti-reflection film comprising the compound.

The anti-reflection film may include the compound represented by Formula 1 in an amount of 0.001 wt % to 0.5 wt % based on solid content. When the compound represented by Formula 1 is included in the content range, it is easy to adjust the panel color of the display device to which the anti-reflection film is applied, and it can be mixed with dyes in other absorption regions to improve the neutral black. have.

The antireflection film may include an adhesive layer and an antireflection layer formed on the adhesive layer, and the compound represented by Formula 1 may be included in the adhesive layer.

In addition, the antireflection film may include an adhesive layer, a dye-containing layer, and an antireflection layer formed on the dye-containing layer, and the compound represented by Formula 1 may be included in the dye-containing layer.

That is, in the laminated structure of the antireflection film according to the embodiment, the compound represented by Formula 1 may be included in the adhesive layer or may be included in a separate dye-containing layer. (See Figs. 1 and 2)

The anti-reflection layer may consist of only a low refractive layer or may include a low refractive layer.

The low-refractive layer may lower the reflectance of the anti-reflection film by a difference in refractive index with a base material to be described later and/or a high refractive index layer to be described later.

The low refractive layer contains a curable binder resin, a fluorine atom-containing monomer, and fine particles having an average particle diameter of 5 nm to 300 nm (eg, hollow silica, etc.), and the thickness of the low refractive layer may be 0.01 μm to 0.15 μm. The refractive index of the low refractive layer may be 1.20 to 1.40.

A functional coating layer is further formed on one surface of the low refractive index layer, that is, an upper surface of the low refractive index layer, thereby providing an additional function to the anti-reflection film. The functional coating layer may include, but is not limited to, an anti-fingerprint layer, an antistatic layer, a hard coating layer, an anti-glare layer, a barrier layer, and the like.

The anti-reflection layer may further include a high refractive index layer.

The high refractive layer may be formed between the substrate and the low refractive layer to be described later, and have a refractive index between the substrate and the low refractive layer to lower the reflectance of the antireflection layer. The high refractive index layer is directly formed with the substrate and the low refractive index layer, respectively. The above “directly formed” means layer to layer without any other layers between them.

The high refractive layer has a thickness of 0.05 μm to 20 μm, a refractive index of 1.45 to 2, and the haze value specified in JIS-K7361 is not different from the haze value of the substrate, or the difference from the haze value of the substrate is 10% or less. and excellent anti-reflection properties.

The hard coating layer increases the hardness of the anti-reflection layer, so that even if the anti-reflection layer is used in the outermost part of the display device, there is no occurrence of scratches. The hard coating layer is not necessarily provided. If a target hardness can be secured in the high refractive index layer or the low refractive index layer, the hard coating layer may be omitted.

The hard coating layer may be formed between the substrate and the high refractive index layer or between the substrate and the low refractive index layer.

The hard coating layer may be a cured layer in which ultrafine metal oxide particles having an average particle diameter of 1 nm to 30 nm and a particle size distribution range of ±5 nm or less are uniformly mixed in a cured binder. The hard coating layer may have a thickness of 1 μm to 15 μm, and the refractive index of the hard coating layer may be 1.54 or more.

The anti-reflection layer may have a thickness of 50 μm to 500 μm, such as 50 μm to 300 μm, such as 50 μm to 150 μm. When the anti-reflection layer has a thickness within the above range, it may be easily applied to a display device.

The adhesive layer may be formed on a lower surface of the anti-reflection layer to adhere an optical member such as a display to a panel or the like. The adhesive layer may include the compound (dye) represented by Formula 1 as described above.

The adhesive layer may have a glass transition temperature of -70°C to 0°C, such as -65°C to -20°C. When the glass transition temperature of the adhesive layer is within the above range, adhesion to the panel may be excellent.

The adhesive layer may be a thermosetting adhesive layer or a photocurable adhesive layer. Preferably, since the pressure-sensitive adhesive layer is a thermosetting pressure-sensitive adhesive layer, it is not necessary to consider the effect of ultraviolet rays due to the absorption wavelength of the compound (dye) represented by Formula 1, thereby facilitating the manufacture of the pressure-sensitive adhesive layer. The “thermosetting adhesive layer” may include an adhesive layer cured at room temperature (eg, 20° C. to 30° C.) as well as an adhesive layer cured through a predetermined heat treatment at 40° C. to 100° C.

The adhesive layer may be formed of a composition for an adhesive layer including an adhesive resin and a curing agent.

The type of the adhesive resin is not limited as long as it can secure the glass transition temperature of the adhesive layer. For example, the adhesive resin may be a silicone-based, urethane-based, (meth)acrylic-based, etc., but preferably a (meth)acrylic-based adhesive resin may be used.

The adhesive resin may have a glass transition temperature of -70°C to 0°C, preferably -65°C to -20°C. When the glass transition temperature of the adhesive resin is within the above range, adhesion to the panel may be excellent.

The adhesive resin may have a weight average molecular weight of 500,000 g/mol to 2,000,000 g/mol, such as 800,000 g/mol to 1,500,000 g/mol. When the weight average molecular weight of the adhesive resin is within the above range, adhesion to the panel may be excellent.

The adhesive resin may include a (meth)acrylic monomer having an alkyl group; (meth)acrylic monomers having a hydroxyl group; and a (meth)acrylic monomer having an aromatic group, a (meth)acrylic monomer having an alicyclic group, and a copolymer of at least one mixture of (meth)acrylic monomer having a heteroalicyclic group, preferably a random copolymer.

The (meth)acrylic monomer having an alkyl group may include a (meth)acrylic acid ester having an unsubstituted C1 to C10 alkyl group. Specifically, the (meth)acrylic monomer having an alkyl group is methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, t-butyl (meth) acrylate , iso-butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, iso- It may include, but is not limited to, at least one of octyl (meth) acrylate, nonyl (meth) acrylate, and decyl (meth) acrylate. These may be included alone or in mixture of two or more. The (meth)acrylic monomer having an alkyl group may be included in an amount of 60 wt% to 99.99 wt%, such as 60 wt% to 90 wt%, such as 80 wt% to 99.9 wt% of the monomer mixture.

The (meth)acrylic monomer having a hydroxyl group includes a (meth)acrylic monomer having a C1 to C20 alkyl group having at least one hydroxyl group, a (meth)acrylic monomer having a C3 to C20 cycloalkyl group having at least one hydroxyl group, and at least one hydroxyl group It may include at least one of (meth)acrylic monomers having a C6 to C20 aromatic group. Specifically, the (meth)acrylic monomer having a hydroxyl group is preferably a (meth)acrylic monomer having a C1 to C20 alkyl group having one or more hydroxyl groups, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth) ) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 1-chloro-2-hydroxypropyl (meth) acrylic It may include one or more of the rates. These may be included alone or in mixture of two or more. The (meth)acrylic monomer having a hydroxyl group may be included in an amount of 0.01 wt% to 20 wt%, for example, 0.1 wt% to 10 wt% in the monomer mixture.

The (meth)acrylic monomer having an aromatic group may include a (meth)acrylic acid ester having a C6 to C20 aryl group or a C7 to C20 arylalkyl group. Specifically, the (meth)acrylic monomer having an aromatic group may include, but is not limited to, phenyl (meth)acrylate, benzyl (meth)acrylate, and the like. The (meth)acrylic monomer having the aromatic group may be included in an amount of 0 wt% to 50 wt%, for example, 0 wt% to 20 wt% in the monomer mixture.

In the present specification, when an alicyclic group and an alkyl group are mixed among the monomers, it is classified as a (meth)acrylic monomer having an alicyclic group.

The (meth)acrylic monomer having an alicyclic group is a (meth)acrylic acid ester having an alicyclic group of C5 to C20 monocyclic or heterocyclic cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl It may include at least one of (meth)acrylate, methylcyclohexyl (meth)acrylate, and dicyclopentenyl (meth)acrylate. The (meth)acrylic monomer having the alicyclic group may be included in an amount of 0 wt% to 50 wt%, such as 1 wt% to 30 wt%, and 1 wt% to 20 wt% of the monomer mixture.

The (meth)acrylic monomer having a heteroalicyclic group may include a (meth)acrylic acid ester having a C4 to C9 heteroalicyclic group containing at least one of nitrogen, oxygen, or sulfur. Specifically, the (meth)acrylic monomer having a heteroalicyclic group may include (meth)acryloylmorpholine, but is not limited thereto. The (meth)acrylic monomer having the heteroalicyclic group may be included in an amount of 0 wt% to 50 wt%, for example 0 wt% to 10 wt% of the monomer mixture.

The adhesive resin is 70 wt% to 99.99 wt% of the (meth)acrylic monomer having the alkyl group, such as 90 wt% to 99.5 wt%, 0.01 wt% to 30 wt% of the (meth)acrylic monomer having the hydroxyl group, such as 0.5 wt% % to 10% by weight of the monomer mixture may include a (meth)acrylic copolymer. When each of the monomers constituting the adhesive resin has the above range, it may be easy to secure adhesive strength.

The curing agent may include an isocyanate-based curing agent. The curing agent may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.01 parts by weight to 10 parts by weight, for example, 0.1 parts by weight to 4 parts by weight based on 100 parts by weight of the adhesive resin. When the curing agent has the above range, it is possible to form an adhesive layer by crosslinking the composition, and to prevent deterioration of transparency and poor reliability due to excessive use.

The composition may further include conventional additives such as a silane coupling agent, an antioxidant, a tackifying resin, a plasticizer, an antistatic agent, a rework agent, and a curing catalyst. The silane coupling agent may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.01 parts by weight to 10 parts by weight, for example, 0.1 parts by weight to 4 parts by weight based on 100 parts by weight of the adhesive resin. When the silane coupling agent has the above range, it is possible to control the adhesive force and prevent the phenomenon of poor reliability.

The composition for the pressure-sensitive adhesive layer may improve coating properties by further including a solvent-free type or a conventional organic solvent.

The adhesive layer may have a thickness of 1 μm to 50 μm, for example, 5 μm to 25 μm. When the adhesive layer has a thickness within the above range, it may be easily used in a display device.

According to another embodiment, there is provided a display device including the anti-reflection film. For example, it is possible to provide a display device including the anti-reflection film and the quantum dot-containing layer.

For example, the display device may further include a light source, a color filter, and a substrate.

For example, in the display device, the quantum dot-containing layer is positioned on the light source, the color filter is positioned on the quantum dot-containing layer, the substrate is positioned on the color filter, and the anti-reflection film is positioned on the substrate. can have a structure. (See Figs. 3 and 4)

For example, the light source may be a blue light source.

For example, the substrate may be a glass substrate.

Components constituting the quantum dot-containing layer may further include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, a diffusing agent, and other additives in addition to the quantum dots, which will be described later.

The quantum dots may have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dot has a half width in the above range, as the color purity is high, color gamut is increased when used as a color material in a color filter.

The quantum dots may each independently be an organic material or an inorganic material or a hybrid (hybrid material) of an organic material and an inorganic material.

The quantum dots may each independently consist of a core and a shell surrounding the core, wherein the core and the shell are each independently made of a group II-IV, group III-V, etc., a core, a core/shell, a core/first shell/ It may have a structure such as a second shell, an alloy, an alloy/shell, and the like, but is not limited thereto.

For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof. , but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

In one embodiment, since interest in the environment has recently increased significantly around the world and regulations on toxic substances are being strengthened, instead of a light emitting material having a cadmium-based core, quantum yield is somewhat low, but eco-friendly Although a non-cadmium-based light emitting material (InP/ZnS) was used, it is not necessarily limited thereto.

The structure of the quantum dot is not particularly limited, but in the case of the quantum dot of the core/shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example 5 nm to 15 nm.

For example, the quantum dots may include red quantum dots, green quantum dots, or a combination thereof. For example, the quantum dots may include both green quantum dots and red quantum dots. In this case, the green quantum dot may be included in an amount greater than that of the red quantum dot. The red quantum dots may have an average particle diameter of 10 nm to 15 nm. The green quantum dots may have an average particle diameter of 5 nm to 8 nm.

On the other hand, for the dispersion stability of the quantum dots, a dispersant may be used together. The dispersing agent helps to uniformly disperse a light conversion material such as quantum dots in the curable composition, and nonionic, anionic or cationic dispersants may all be used. Specifically, polyalkylene glycol or its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkyl amide alkylene oxide Adducts, alkyl amines, etc. may be used, and these may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt% to 100 wt%, for example 10 wt% to 20 wt%, based on the solid content of the light conversion material such as quantum dots.

The quantum dots may be included in an amount of 1 part by weight to 40 parts by weight, for example, 1 part by weight to 10 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the quantum dots are included within the above range, the light conversion rate is excellent and the pattern characteristics and the development characteristics are not impaired, and thus excellent processability may be obtained.

The binder resin may include an acrylic resin, an epoxy resin, or a combination thereof.

The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of 5 wt% to 50 wt%, for example 10 wt% to 40 wt%, based on the total amount of the acrylic binder resin.

The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene or vinylbenzylmethyl ether; Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth) acrylate and phenyl (meth) acrylate; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; Vinyl cyanide compounds, such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.

Specific examples of the acrylic resin include polybenzyl methacrylate, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2 -Hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, etc. may be mentioned, but are not limited thereto, and these may be used alone or in two or more types. may be used in combination.

The weight average molecular weight of the acrylic resin may be 1,000 g/mol to 15,000 g/mol.　When the weight average molecular weight of the acrylic resin is within the above range, the adhesion to the substrate is excellent, the physical and chemical properties are good, and the viscosity is appropriate.

The epoxy resin is a monomer or oligomer that can be polymerized by heat, and may include a compound having a carbon-carbon unsaturated bond and a carbon-carbon cyclic bond.

The epoxy resin may further include a bisphenol A-type epoxy resin, a bisphenol F-type epoxy resin, a phenol novolak-type epoxy resin, a cyclic aliphatic epoxy resin, and an aliphatic polyglycidyl ether.

As commercial products of these compounds, YX4000, YX4000H, YL6121H, YL6640, YL6677 of Yuka Shell Epoxy Co., Ltd.; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027 of Nippon Kayaku Co., Ltd. and Epicoat 180S75 of Yuka Shell Epoxy Co., Ltd.; Examples of the bisphenol A-type epoxy resin include Epicoat 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 of Yuka Shell Epoxy Co., Ltd.; Examples of the bisphenol F-type epoxy resin include Epicoat 807 and 834 of Yuka Shell Epoxy Co., Ltd.; Examples of the phenol no-block type epoxy resin include Epicoat 152, 154, and 157H65 of Yuka Shell Epoxy Co., Ltd. and EPPN 201 and 202 of Nippon Kayaku Co., Ltd.; Other cyclic aliphatic epoxy resins include CIBA-GEIGY AG's CY175, CY177 and CY179, UCC's ERL-4234, ERL-4299, ERL-4221 and ERL-4206, Showa Denko Co., Ltd.'s Shodyne 509 , Araldite CY-182, CY-192 and CY-184 from CIBA-GEIGY AG, Epikron 200 and 400 from Dainippon Ink Kogyo Co., Ltd., Epicoat 871, 872 from Eucashell Epoxy Co., Ltd. and EP1032H60, ED-5661 and ED-5662 of Celanese Coatings Co., Ltd.; Examples of the aliphatic polyglycidyl ether include Epicoat 190P and 191P from Yukashell Epoxy Co., Ltd., Eporite 100MF from Kyoesha Yushi Chemical Industry Co., Ltd., and Epiol TMP from Nippon Yushi Co., Ltd. can

The binder resin may be included in an amount of 1 to 40 parts by weight, for example, 5 to 20 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the binder resin is included within the above range, excellent sensitivity, developability, resolution, and straightness of the pattern can be obtained.

The reactive unsaturated compound may be used by mixing monomers or oligomers generally used in conventional photocurable compositions and thermosetting compositions.

The reactive unsaturated compound may be an acrylate-based compound. For example, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, Pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate , novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6 - One or more types of hexanediol dimethacrylate may be selected or mixed and used.

The reactive unsaturated compound may be used after treatment with an acid anhydride in order to provide better developability.

The reactive unsaturated compound may be included in an amount of 1 to 10 parts by weight, for example, 1 to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the reactive unsaturated compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process, and reliability is excellent, and heat resistance, light resistance, chemical resistance, resolution and adhesion of the pattern are also excellent.

The photopolymerization initiator may include an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, and the like.

Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.

Examples of the benzophenone-based compound include benzophenone, benzoylbenzoic acid, methylbenzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethyl amino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.

Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4' -dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine , 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine , 2-Biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)- 4,6-bis(trichloromethyl)-s-triazine,2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4 -bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. are mentioned. .

Examples of the oxime-based compound include an O-acyloxime-based compound, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, and 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. can be used Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate, 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime- O-acetate etc. are mentioned.

As the photopolymerization initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound may be used in addition to the above compound.

The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like. can be heard

The photopolymerization initiator may be included in an amount of 0.1 parts by weight to 10 parts by weight, for example, 0.1 parts by weight to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the photopolymerization initiator is included within the above range, it is possible to obtain a pattern having excellent resolution without a residual film due to excellent balance between sensitivity and developability during exposure.

The quantum dot-containing layer may further include a diffusing agent.

For example, the diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconia (ZrO ₂ ), or a combination thereof.

The diffusing agent reflects the light not absorbed by the quantum dots, and allows the reflected light to be absorbed again by the quantum dots. That is, the diffusing agent may increase the amount of light absorbed by the quantum dots, thereby increasing the light conversion efficiency of the curable composition.

The diffusing agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the diffusing agent is within the above range, a more excellent light diffusion effect may be obtained, and light conversion efficiency may be increased.

The diffusing agent may be included in an amount of 0.1 wt% to 20 wt%, for example 0.1 wt% to 5 wt%, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the diffusion agent is included in an amount of less than 0.1% by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer, it is difficult to expect the effect of improving the light conversion efficiency by using the diffusion agent, and when it contains more than 20% by weight, There is a possibility that the pattern characteristics may be deteriorated.

In order to improve the stability and dispersibility of the quantum dots, the quantum dot-containing layer may further include a thiol-based additive.

The thiol-based additive may be substituted on the shell surface of the quantum dot to improve the dispersion stability of the quantum dot to a solvent, thereby stabilizing the quantum dot.

The thiol-based additive may have 2 to 10, for example, 2 to 4 thiol groups (-SH) at the terminal depending on the structure thereof.

For example, the thiol-based additive may include at least two or more functional groups represented by the following Chemical Formula 2 at the terminal thereof.

[Formula 2]

In Formula 2,

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted It is a C2 to C20 heteroarylene group.

For example, the thiol-based additive may be represented by the following formula (3).

[Formula 3]

In Formula 3,

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted is a C2 to C20 heteroarylene group,

u1 and u2 are each independently an integer of 0 or 1.

For example, in Formulas 2 and 3, L ⁷ and L ⁸ may each independently represent a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

Specific examples of the thiol-based additive include pentaerythritol tetrakis (3-mercaptopropionate) represented by the following Chemical Formula 2a, and trimethylolpropane tris (3) represented by the following Chemical Formula 2b. -mercaptopropionate) (trimethylolpropane tris (3-mercaptopropionate)), pentaerythritol tetrakis (mercaptoacetate) represented by the following formula 2c Pentaerythritol tetrakis (mercaptoacetate), trimethylolpropane tris ( Any selected from the group consisting of 2-mercaptoacetate) (trimethylolpropane tris(2-mercaptoacetate)), glycol di-3-mercaptopropionate represented by the following formula 2e, and combinations thereof can take one

[Formula 2a]

[Formula 2b]

[Formula 2c]

[Formula 2d]

[Formula 2e]

The thiol-based additive may be included in an amount of 0.1 parts by weight to 10 parts by weight, for example, 0.1 parts by weight to 5 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the thiol-based additive is included within the above range, the stability of the light conversion material such as quantum dots can be improved, and the thiol group in the component reacts with the acrylic group of the resin or monomer to form a covalent bond, thereby improving the heat resistance of the light conversion material such as quantum dots may have an effect.

The quantum dot-containing layer may further include a polymerization inhibitor including a hydroquinone-based compound, a catechol-based compound, or a combination thereof. Since the quantum dot-containing layer further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, it is possible to prevent cross-linking at room temperature during exposure after printing (coating) the composition including quantum dots.

For example, the hydroquinone-based compound, the catechol-based compound, or a combination thereof is hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di- t -butyl hydroquinone, 2,5- Bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyroga roll, 2,6-di- t -butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O')aluminum (Tris(N-hydroxy-N) -nitrosophenylaminato-O,O')aluminium) or a combination thereof, but is not necessarily limited thereto.

The hydroquinone-based compound, the catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of the dispersion is a quantum dot and fluorescent dye-containing layer or a quantum dot-containing layer (no fluorescent dye). It may be included in an amount of 0.001 part by weight to 1 part by weight, for example, 0.01 part by weight to 0.1 part by weight based on parts. When the stabilizer is included within the above range, it is possible to solve the problem of aging at room temperature and, at the same time, to prevent a decrease in sensitivity and a surface peeling phenomenon.

The quantum dot-containing layer may include malonic acid in addition to the thiol-based additive and polymerization inhibitor; 3-amino-1,2-propanediol; silane-based coupling agent; leveling agent; fluorine-based surfactants; Or it may further include a combination thereof.

For example, the quantum dot-containing layer may further include a silane-based coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.

Examples of the silane-based coupling agent include trimethoxysilyl benzoic acid, γ methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ isocyanate propyl triethoxysilane, γ glycidoxy propyl and trimethoxysilane and β-epoxycyclohexyl)ethyl trimethoxysilane, and these may be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the silane-based coupling agent is included within the above range, adhesion and storage properties are excellent.

In addition, the quantum dot-containing layer may further include a surfactant, such as a fluorine-based surfactant, to improve coating properties and prevent defect formation, if necessary.

As the fluorine-based surfactant, BM-1000 ^® of BM Chemie, BM-1100 ^® and the like; ^{Mecha Pack F 142D ®} , F 172 ^® , F 173 ^® , F 183 ^® etc. manufactured by Dai Nippon Inky Chemical Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ^® , FC-170C ^® , FC-430 ^® , FC-431 ^®, etc.; Asahi Grass Co., Ltd.'s Saffron S-112 ^® , Copper S-113 ^® , Copper S-131 ^® , Copper S-141 ^® , Copper S-145 ^®, etc.; ^{SH-28PA ®} , Copper-190 ^® , Copper ^{-193 ®} , SZ-6032 ^® , SF-8428 ^®, etc. of Toray Silicone Co., Ltd.; F-482, F-484, F-478, F-554 commercially available fluorine-based surfactants of DIC Co., Ltd. may be used.

The fluorine-based surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the fluorine-based surfactant is included within the above range, coating uniformity is ensured, stains do not occur, and wettability to a glass substrate is excellent.

In addition, in the quantum dot-containing layer, other additives such as antioxidants and stabilizers may be further added in a certain amount within a range that does not impair physical properties.

The manufacturing method of each of the quantum dot-containing layers includes the steps of forming a pattern by applying a curable composition including the above-described components on a substrate by an inkjet spraying method (S1); and curing the pattern (S2).

(S1) forming a pattern

The curable composition is preferably applied on the substrate in a thickness of 0.5 to 10 μm by an inkjet dispersion method. In the inkjet jetting, a pattern may be formed by jetting only a single color and repeatedly jetting according to the required number of colors, or a pattern may be formed by simultaneously jetting the required number of colors in order to reduce the process.

(S2) curing step

A cured resin film can be obtained by curing the obtained pattern. At this time, as a method of hardening, a thermosetting process is preferable. The thermosetting process may be a process of curing by heating at a temperature of about 100° C. or higher for about 3 minutes to first remove the solvent in the curable composition, and then heating to a temperature of 160° C. to 300° C., and more preferably 180 It may be a process of curing by heating at a temperature of ℃ to 250 ℃ for about 30 minutes.

In addition, each of the quantum dot-containing layers may be prepared without inkjetting. The manufacturing method in this case uses a suitable method such as spin coating, roller coating, spray coating, etc. on a substrate subjected to predetermined pretreatment with a curable composition containing the above-mentioned components, for example, 0.5 μm to 10 μm. is applied to a thickness of , and irradiated with light to form a pattern required for the color filter. As a light source used for irradiation, UV, electron beam, or X-ray may be used, and for example, UV in the range of 190 nm to 450 nm, specifically 200 nm to 400 nm, may be irradiated. It can also be carried out by further using a photoresist mask in the irradiating step. After performing the irradiating step in this way, the layer of the composition irradiated with the light source is treated with a developer. At this time, the unexposed portion of the composition layer is dissolved to form a pattern required for the color filter. A color filter having a desired pattern can be obtained by repeating this process according to the required number of colors. In addition, if the image pattern obtained by development in the above process is heated again or cured by irradiation with actinic rays, crack resistance, solvent resistance, and the like can be improved.

The curable composition may further include a solvent.

Examples of the solvent include alcohols such as methanol and ethanol; glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether, and propylene glycol methyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; lactic acid alkyl esters such as methyl lactate and ethyl lactate; hydroxyacetic acid alkyl esters such as methyl hydroxyacetate, ethyl hydroxyacetate, and butyl hydroxyacetate; acetic acid alkoxyalkyl esters such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethoxymethyl acetate, and ethoxyethyl acetate; 3-hydroxypropionic acid alkyl esters such as methyl 3-hydroxypropionate and ethyl 3-hydroxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate and methyl 3-ethoxypropionate; 2-hydroxypropionic acid alkyl esters such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate and propyl 2-hydroxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate and methyl 2-ethoxypropionate; 2-hydroxy-2-methylpropionic acid alkyl esters such as methyl 2-hydroxy-2-methylpropionate and ethyl 2-hydroxy-2-methylpropionate; 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, and methyl 2-hydroxy-3-methylbutanoate; or ketonic acid esters such as ethyl pyruvate, and also N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, and N,N-dimethylacetamide. , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid Ethyl, diethyl oxalate, diethyl maleate, γ butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, dimethyl adipate, etc. may be used, but the present invention is not limited thereto.

For example, the solvent may include glycol ethers such as ethylene glycol monoethyl ether and ethylene diglycol methyl ethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; It is preferable to use alcohols, such as ethanol, or a combination thereof.

For example, the solvent is propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene diglycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethylacetamide, 2-butoxyethanol, N It may be a solvent comprising -methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, dimethyl adipate, or a combination thereof.

The solvent may be included in a balance with respect to the total amount of the curable composition.

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.

(Example)

(Synthesis example)

Synthesis Example 1: Synthesis of the compound represented by Formula 1-1

(reaction formula)

(1) Put 3,4-bis(1-methylbutoxy)benzaldehyde (100 g, 0.36 mol), 800 g of propionic acid, and pyrrole (24 g, 0.36 mol) in a round-bottom flask, raise the temperature to 130°C, and stir for 6 hours. When the reaction is completed, the temperature is lowered to room temperature, and 100 g of acetone is added thereto and stirred. The resulting solid compound was filtered through a filter, washed with acetone, and dried to synthesize a porphyrin intermediate (23 g, 20%).

(2) Put the porphyrin intermediate (23g, 17.6 mmol), DMF 140g, and copper acetate (6.4g, 35.3 mmol) in a round-bottom flask, and after stirring at 100° C. for 5 hours, the reaction is terminated. After lowering the temperature, 700 g of methanol is added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to obtain a porphyrin-based dye (18 g, 75%). ([M+H] ⁺ 1366)

(3) Put the porphyrin-based dye (18 g, 13.2 mmol), tetrachloroethane 360 mL and NCS (N-chlorosuccinimide, 11.4 g, 85.7 mmol) in a round-bottom flask and stirred at 100 ° C. for 4 hours, followed by reaction end After lowering the temperature, 1600 mL of methanol is added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by the following Chemical Formula 1-1 (15 g, 80%).

[Formula 1-1]

[M+H] ⁺ 1573, λ _max = 429 nm

Synthesis Example 2: Synthesis of a compound represented by Formula 1-2

(reaction formula)

The porphyrin-based dye (16 g, 11.7 mmol) obtained in (2) of Synthesis Example 1 was put into a round-bottom flask, and 320 mL of tetrachloroethane and NCS (N-chlorosuccinimide, 8.6 g, 64.5 mmol) were added thereto, and 100 ° C. After stirring for 4 hours, the reaction is terminated. After lowering the temperature, 1200 mL of methanol is added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by the following Chemical Formula 1-2 (13 g, 75%).

[Formula 1-2]

[M+H] ⁺ 1504, λ _max = 426 nm

Synthesis Example 3: Synthesis of a compound represented by Formula 1-3

(reaction formula)

The porphyrin-based dye (15 g, 11.0 mmol) obtained in (2) of Synthesis Example 1 was put into a round-bottom flask, and 300 mL of tetrachloroethane and NCS (N-chlorosuccinimide, 3.7 g, 27.5 mmol) were added thereto, and 100 ° C. After stirring for 4 hours, the reaction is terminated. After lowering the temperature, 1000 mL of methanol is added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by the following Chemical Formula 1-3 (12 g, 75%).

[Formula 1-3]

[M+H] ⁺ 1435, λ _max = 424 nm

Synthesis Example 4: Synthesis of a compound represented by Formula 1-4

A compound represented by the following Chemical Formula 1-4 was synthesized in the same manner as in Synthesis Example 1 except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-4]

[M+H] ⁺ 1460, λ _max = 429 nm

Synthesis Example 5: Synthesis of a compound represented by Formula 1-5

A compound represented by the following Chemical Formula 1-5 was synthesized in the same manner as in Synthesis Example 2 except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-5]

[M+H] ⁺ 1391, λ _max = 426 nm

Synthesis Example 6: Synthesis of a compound represented by Formula 1-6

A compound represented by the following Chemical Formula 1-6 was synthesized in the same manner as in Synthesis Example 3 except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-6]

[M+H] ⁺ 1323, λ _max = 424 nm

Synthesis Example 7: Synthesis of a compound represented by Formula 1-7

A compound represented by the following Chemical Formula 1-7 was synthesized in the same manner as in Synthesis Example 1 except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-7]

[M+H] ⁺ 1573, λ _max = 429 nm

Synthesis Example 8: Synthesis of a compound represented by Formula 1-8

A compound represented by the following Chemical Formula 1-8 was synthesized in the same manner as in Synthesis Example 2 except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-8]

[M+H] ⁺ 1504, λ _max = 426 nm

Synthesis Example 9: Synthesis of a compound represented by Formula 1-9

A compound represented by the following Chemical Formula 1-9 was synthesized in the same manner as in Synthesis Example 3 except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-9]

[M+H] ⁺ 1435, λ _max = 424 nm

Comparative Synthesis Example 1: Synthesis of a compound represented by Formula C-1

A compound represented by the following Chemical Formula C-1 was synthesized in the same manner as in Synthesis Example 1 except that 4-(2-ethylhexoxy)benzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula C-1]

[M+H] ⁺ 1190, λ _max = 419 nm

Comparative Synthesis Example 2: Synthesis of a compound represented by Formula C-2

A compound represented by the following Chemical Formula C-2 was synthesized in the same manner as in Synthesis Example 3 except that 4-(2-ethylhexoxy)benzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula C-2]

[M+H] ⁺ 1259, λ _max = 421 nm

(Evaluation 1: Wavelength matching)

From the structures of the compounds according to Synthesis Examples 1 to 9, Comparative Synthesis Example 1 and Comparative Synthesis Example 2 and the maximum absorption wavelength of each compound, the compound according to one embodiment has a structure represented by Formula 1 It can be seen that it has a maximum absorption wavelength close to 430 nm. In particular, it can be seen that as the number of halogen atoms increases, more specifically, when there are 5 to 6 chlorine atoms, the maximum absorption wavelength is closest to 430 nm.

(Evaluation 2: Solubility)

In addition, by measuring the maximum dissolving weight of each compound based on 10 g of methyl ethyl ketone, the weight of the compound with respect to the total weight is calculated as a percentage. Synthesis Examples 1 to 9, Comparative Synthesis for methyl ethyl ketone The solubility of the compounds of Example 1 and Comparative Synthesis Example 2 was measured and shown in Table 1 below.

Solubility (%) Synthesis Example 1 5.1% Synthesis Example 2 7.4% Synthesis Example 3 11.0% Synthesis Example 4 2.5% Synthesis Example 5 3.5% Synthesis Example 6 4.0% Synthesis Example 7 3.4% Synthesis Example 8 4.3% Synthesis Example 9 5.2% Comparative Synthesis Example 1 2.0% Comparative Synthesis Example 2 0.8%

From Table 1, it can be seen that the compounds according to Synthesis Examples 1 to 9 have better solubility than the compounds according to Comparative Synthesis Examples 1 to 2.

(Preparation of anti-reflection film)

Example 1

100 parts by weight of a monomer mixture containing 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl acrylate, 150 parts by weight of ethyl acetate in a 1L reactor in which nitrogen gas is refluxed and a cooling device is installed to facilitate temperature control Nitrogen gas was introduced for 1 hour while being added and stirred to replace oxygen in the reactor with nitrogen, and then the temperature of the reactor was maintained at 70°C. 0.06 parts by weight of 2,2'-azobisisobutyronitrile as an initiator was added and reacted for 8 hours to prepare a (meth)acrylic copolymer-containing solution. The (meth)acrylic copolymer had a Tg of -46° C. and a weight average molecular weight of 1,100,000 g/mol. Ethyl acetate was added to prepare a (meth)acrylic copolymer solution of 19.4% by weight. Based on the solid content of 100 parts by weight of the (meth)acrylic copolymer, 0.193 parts by weight of an XDI-based isocyanate-based crosslinking agent (TD-75, 75% solids, Soken Corporation), 3-glycidoxypropyl trimethoxysilane (KBM) as a silane coupling agent -403, ShinEtsu) 0.154 parts by weight and 0.06 parts by weight of the compound of Synthesis Example 1 (represented by Formula 1-1) were mixed, respectively. Then, 25 parts by weight of methyl ethyl ketone was added to prepare an adhesive layer composition.

The adhesive layer composition with a bar coater on the lower surface of the PET film, which is the base film of the anti-reflection layer (a hard coating layer, a high refractive layer, and a low refractive layer sequentially stacked on the upper surface of the PET film, reflectance: 0.2%, DNP company) was applied directly and dried in an oven at 90° C. for 4 minutes to prepare an anti-reflection film having a thickness of 20 μm.

Example 2

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 2 (represented by Formula 1-2) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 3

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 3 (represented by Formula 1-3) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 4

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 4 (represented by Formula 1-4) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 5

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 5 (represented by Formula 1-5) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 6

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 6 (represented by Formula 1-6) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 7

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 7 (represented by Formula 1-7) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 8

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 8 (represented by Formula 1-8) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Example 9

An anti-reflection film was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 9 (represented by Formula 1-9) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1 did.

Comparative Example 1

In the same manner as in Example 1, except that the compound of Comparative Synthesis Example 1 (represented by Formula C-1) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1, an anti-reflection film was prepared prepared.

Comparative Example 2

In the same manner as in Example 1, except that the compound of Comparative Synthesis Example 2 (represented by Formula C-2) was used instead of the compound of Synthesis Example 1 (represented by Formula 1-1) of Example 1, an anti-reflection film was prepared prepared.

Comparative Example 3

In the same manner as in Example 1, except that FDB-003 (Yamada), which is a compound mainly applied to the existing anti-reflection film, was used instead of the compound of Synthesis Example 1 of Example 1 (represented by Formula 1-1) , an anti-reflection film was prepared.

(Evaluation 3: Light resistance reliability)

In order to check whether the light resistance reliability of the film for the panel to which the quantum dots are applied, an optical member (manufactured by laminating the anti-reflection film on the other side of the glass having a quantum dot-containing layer on one side) is manufactured, and then the Xenon for the optical member In the Test Chamber (Q-SUN), [Light source lamp: Xenon lamp, Irradiation intensity: 0.35W/cm ² , Irradiation temperature: 63℃, Irradiation time: 500 hours, Irradiation direction: Irradiation from the anti-reflection film side] After measuring the light transmittance at the maximum absorption wavelength of each compound before and after irradiation, the light resistance reliability was evaluated by the amount of light transmittance change, and the results are shown in Table 2 below. The amount of change in light transmittance is the absolute value of the difference between transmittance before irradiation and transmittance after irradiation.

Light fastness reliability (ΔT%) Example 1 0.1 Example 2 0.3 Example 3 1.1 Example 4 0.1 Example 5 0.2 Example 6 0.8 Example 7 0.1 Example 8 0.3 Example 9 0.9 Comparative Example 1 4.7 Comparative Example 2 3.1 Comparative Example 3 26

From Table 2, in the case of Examples 1 to 9, it can be confirmed that the light resistance reliability is improved compared to Comparative Examples 1 to 3. That is, it can be expected that the antireflection film to which the dye compound according to the embodiment is applied and the display device containing quantum dots can effectively absorb the short wavelength region of the blue light source, thereby improving the color gamut of the panel.

The present invention is not limited to the above embodiments, but can be manufactured in various different forms, and those of ordinary skill in the art to which the present invention pertains can take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented as Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

10 blue light source
20 Quantum dot-containing layer
30 color filter
40 entries
50 adhesive layer
60 dye-containing layer
70 anti-reflection layer
80 anti-reflection film
100 display devices

Claims (20)

A compound represented by the following formula (1):
[Formula 1]

In Formula 1,
M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom or a metal oxide atom,
R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided ^{that at least one of R 1} to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,
R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided ^{that at least two of R 9} to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.
According to claim 1,
At least one of R ¹ and R ² and at least one of R ⁵ and R ⁶ are each independently a halogen atom, a cyano group, a carbonyl group, or a nitro group.
According to claim 1,
At least one or more of R ¹ and R ² , at least one or more of R ³ and R ⁴ , at least one or more of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently a halogen atom, a cyano group, A compound that is a carbonyl group or a nitro group.
According to claim 1,
Wherein M is Cu, Co, Zn, V (= O) or Ag compound.
According to claim 1,
wherein R ⁹ to R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ) is a compound.
According to claim 1,
At least two or more of R ⁹ to R ¹³ and at least two or more of R ¹⁴ to R ¹⁸ are each independently a substituted or unsubstituted C1 to C20 alkoxy group.
According to claim 1,
At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , and at least two or more of R ¹⁹ to R ²³ are each independently a substituted or unsubstituted C1 to C20 alkoxy group.
According to claim 1,
At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , at least two or more of R ¹⁹ to R ²³ , and at least two or more of R ²⁴ to R ²⁸ are each independently substituted or unsubstituted C1 to a C20 alkoxy group.
According to claim 1,
The compound is a compound represented by any one of the following Chemical Formulas 1-1 to 1-9.
[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

According to claim 1,
The compound exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and has a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths.
According to claim 1,
The compound is a dye.
An antireflection film comprising the compound according to any one of claims 1 to 11.
13. The method of claim 12,
The antireflection film includes an adhesive layer and an antireflection layer formed on the adhesive layer,
The compound is an anti-reflection film included in the adhesive layer.
13. The method of claim 12,
The anti-reflection film includes an adhesive layer, a dye-containing layer and an anti-reflection layer formed on the dye-containing layer,
The compound is an antireflection film included in the dye-containing layer.
A display device comprising the antireflection film according to claim 12 .
16. The method of claim 15,
The display device further comprises a quantum dot-containing layer.
17. The method of claim 16,
The display device further includes a light source, a color filter, and a substrate.
18. The method of claim 17,
The display device is
The quantum dot-containing layer is positioned on the light source,
The color filter is positioned on the quantum dot-containing layer,
The substrate is positioned on the color filter,
A display device in which the anti-reflection film is positioned on the substrate.
18. The method of claim 17,
The light source is a blue light source.
18. The method of claim 17,
The substrate is a display device including a glass substrate.

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