KR20210125332A - Composition for encapsulating organic light emitting diodes and organic light emitting diodes display comprising organic layer prepared using the same - Google Patents

Abstract

The present invention relates to a composition for encapsulating an organic light emitting element comprising polymer composed of only carbon and hydrogen; one or more of a first photocurable monomer and a second photocurable monomer; and an initiator. Provided are a composition for encapsulating an organic light emitting element comprising 0.1 to 10 wt% of polymer composed of only carbon and hydrogen in the composition based on solid content; and an organic light emitting element display device comprising an organic layer formed therefrom. According to the present invention, the composition for encapsulating an organic light emitting element can form an organic layer having plasma resistance after curing.

Description

A composition for encapsulating an organic light emitting device and an organic light emitting device display device comprising an organic layer prepared therefrom

The present invention relates to a composition for encapsulating an organic light emitting device and an organic light emitting device display device including an organic layer prepared therefrom. More specifically, the present invention lowers the plasma etch rate after curing and at the same time lowers the dielectric constant (permitivity, ε) and inkjet coating is good, an organic light emitting device comprising a composition for encapsulating an organic light emitting device and an organic layer prepared therefrom It relates to a device display device.

When external moisture, oxygen, or the like penetrates, the organic light emitting diode may be easily damaged and lose its function, thereby reducing reliability. Accordingly, the organic light emitting device must be sealed by an encapsulation layer (a laminate of an organic layer and an inorganic layer) including an inorganic layer together with an organic layer formed of a composition for encapsulating an organic light emitting device.

The organic layer may be formed by applying a composition for encapsulating an organic light emitting device to a predetermined thickness and then curing the composition. Recently, an ink jet method is being considered as a method of applying a composition for encapsulating an organic light emitting device. The inkjet method is a method in which a composition for encapsulating an organic light emitting device is put into a nozzle and then dropped at a predetermined temperature and dropping rate. In order to be applied to the inkjet method, a method of lowering the viscosity of the composition may be considered. However, lowering the viscosity does not necessarily mean that the inkjet coating is good.

In the organic light emitting device display device, in addition to the encapsulation layer, various display devices are additionally stacked on the upper and lower portions of the organic light emitting device. However, various electric, static or electromagnetic waves emitted from the display device inevitably affect the organic light emitting device. Various types of electricity, static electricity, or electromagnetic waves emitted from these display devices may cause malfunction or cancel function of the organic light emitting device. Therefore, it is necessary to minimize the influence even if additional elements are stacked on the organic light emitting device because the dielectric constant is low while having the basic function of encapsulating the organic light emitting device.

Background art of the present invention is described in Korean Patent Application Laid-Open No. 10-2016-0150255 and the like.

It is an object of the present invention to provide a composition for encapsulating an organic light emitting device that forms an organic layer having excellent plasma resistance after curing.

Another object of the present invention is to provide a composition for encapsulating an organic light emitting device that forms an organic layer having a low dielectric constant even at a wide frequency after curing.

Another object of the present invention is to provide a composition for encapsulating an organic light emitting device that is well applied by inkjet.

Another object of the present invention is to provide a composition for encapsulating an organic light emitting device that forms an organic layer having high photocurability and high light transmittance after curing.

One aspect of the present invention is a composition for encapsulating an organic light emitting device.

The composition for encapsulating an organic light emitting device includes a polymer consisting only of carbon and hydrogen; at least one of a first photocurable monomer and a second photocurable monomer; and an initiator, wherein the polymer consisting only of carbon and hydrogen is included in an amount of 0.1 wt% to 10 wt% of the composition based on solid content.

The organic light emitting device display device of the present invention includes an organic layer formed of the composition for encapsulating an organic light emitting device of the present invention.

The present invention provides a composition for encapsulating an organic light emitting device that forms an organic layer having excellent plasma resistance after curing.

The present invention provides a composition for encapsulating an organic light emitting device that forms an organic layer having a low dielectric constant even at a wide frequency after curing.

The present invention provides a composition for encapsulating an organic light emitting device that can be easily applied by inkjet.

The present invention provides a composition for encapsulating an organic light emitting device that forms an organic layer having high photocurability and high light transmittance after curing.

1 is a cross-sectional view of an organic light emitting display device according to an embodiment of the present invention.
2 is a cross-sectional view of an organic light emitting display device according to another exemplary embodiment of the present invention.

With reference to the accompanying drawings, the present invention will be described in detail so that those skilled in the art can easily carry out the present invention by way of example. The present invention may be embodied in many different forms and is not limited to the embodiments described herein. In order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar components throughout the specification. The length and size of each component in the drawings are for explaining the present invention, and the present invention is not limited to the length and size of each component described in the drawings.

As used herein, "(meth)acryl" means acrylic and/or methacrylic.

In the present specification, unless otherwise defined, "substituted" means that at least one hydrogen atom among the functional groups of the present invention is a halogen (F, Cl, Br or I), a hydroxy group, a nitro group, a cyano group, an imino group (=NH , =NR, R is an alkyl group having 1-10 carbon atoms), an amino group (-NH ₂ , -NH(R'), -N(R")(R"'), R', R", R"' each independently an alkyl group having 1 to 10 carbon atoms), amidino group, hydrazine or hydrazone group, carboxy group, alkyl group having 1 to 20 carbon atoms, aryl group having 6 to 30 carbon atoms, cycloalkyl group having 3 to 30 carbon atoms, cycloalkyl group having 3 to 30 carbon atoms It may mean substituted with a heteroaryl group of, or a heterocycloalkyl group having 2-30 carbon atoms.

As used herein, the term "aryl group" refers to a functional group in which all elements of a cyclic substituent have p-orbitals, and these p-orbitals form a conjugate. Aryl groups include monocyclic, non-fused polycyclic or fused polycyclic functional groups. In this case, fusion means a ring form in which carbon atoms divide adjacent pairs. The aryl group also includes a biphenyl group, a terphenyl group, or a quaterphenyl group in which two or more aryl groups are connected through a sigma bond. The aryl group may mean a phenyl group, a naphthyl group, an anthracenyl group, a phenanthrenyl group, a pyrenyl group, a chrysenyl group, and the like.

When describing the numerical range of the present specification, "X to Y" means "X or more and Y or less" (X≤ and ≤Y).

The inventor of the present invention has a high photocuring rate, good inkjet coating, excellent plasma resistance after curing, and a composition for sealing an organic light emitting device that can form an organic layer with a low dielectric constant even at a wide frequency (hereinafter referred to as "composition") ) was provided.

In one embodiment, the composition of the present invention may implement an organic layer having an etch rate of 6.5% or less, specifically 0% to 6.5%, of the organic layer by the plasma of Equation 2 after curing. In the above range, when the inorganic layer is formed on the organic layer, the lifespan of the organic light emitting device can be extended by not damaging the organic layer:

[Equation 2]

Etching rate of organic layer by plasma (%) = (T1-T2)/T1 x 100

(In Equation 2, T1 is the initial thickness (unit: μm) of the organic layer obtained by photo-curing the composition by depositing the composition on a silicon (Si) wafer and ^{irradiating light at 100 mW/cm 2 for 10 seconds,}

T2 is ICP power: 2500W, RE power: 300W, DC bias: 200V, Ar flow: 50sccm, ethching time: 1min, pressure: 10mtorr on the organic layer using ICP CVD (BMR Technology) inductively coupled plasma ( The thickness of the organic layer (unit: μm) after treatment with ICP, inductively coupled plasma). The thickness (or height) of the organic layer may be measured by FE-SEM (Hitachi High Technologies Corporation), but is not limited thereto.

In one embodiment, the composition of the present invention may have a dielectric constant of 2.95 or less after curing, specifically 1.0 to 2.95, 2.0 to 2.95. Within the above range, the performance of the organic light emitting diode may be well realized without being affected by external static electricity or electricity. In particular, the composition of the present invention forms an organic layer that is alternately laminated with the inorganic layer described in detail below. In order to form an organic layer having plasma resistance while securing a low dielectric constant in such an alternating laminated structure, the composition of the present invention has a dielectric constant of 2.95 or less after curing.

In the composition of the present invention, the dielectric constant after curing was able to secure the above-mentioned range even at a wide frequency range. For example, the composition of the present invention can secure a dielectric constant of 2.95 or less at a frequency of 200 kHz to 1 GHz, for example, 200 kHz to 500 kHz.

In one embodiment, the composition of the present invention is suitable for inkjet application. Here, the inkjet coating means applying the composition with an inkjet printer at a dropping rate of 2.5 to 3.5 μm/s of the composition to be applied and a head temperature of 20° C. to 50° C. of the inkjet coating device.

The composition of one embodiment of the present invention is a polymer consisting of only carbon and hydrogen; at least one of a first photocurable monomer and a second photocurable monomer; and an initiator, and the polymer consisting only of carbon and hydrogen is included in an amount of 0.1 wt% to 10 wt% in the composition based on the solid content. In the above range, it is possible to form an organic layer having excellent plasma resistance after curing and a low dielectric constant even at a wide frequency after curing, and inkjet coating can be performed well. Preferably, the polymer consisting only of carbon and hydrogen may be included in an amount of 2 wt% to 10 wt% of the composition based on the solid content.

Hereinafter, each component in the composition of the present invention will be described in detail.

Polymers made of only carbon and hydrogen

The composition of the present invention contains a polymer consisting only of carbon and hydrogen in an amount of 0.1 wt% to 10 wt% of the composition based on the solid content. In the above range, it is possible to form an organic layer having excellent plasma resistance after curing and a low dielectric constant even at a wide frequency after curing, and inkjet coating can be performed well. In the present specification, "based on solid content" means the total of the remaining components excluding the solvent in the composition. In one embodiment, the solids basis is a polymer consisting solely of carbon and hydrogen; photocurable monomer(s) detailed below; and the sum of the initiators.

Polymers made of only carbon and hydrogen are non-photocurable. The polymer may not cure and react with the photocurable monomer described in detail below, but may lower the dielectric constant of the organic layer and allow the composition to be easily applied by inkjet.

Polymers consisting solely of carbon and hydrogen do not contain polar pendant functional groups in the main and/or side chains of the polymer. When a polymer containing a polar pendant functional group is included, there may be a problem in that the effect of the present invention is not well realized.

In one embodiment, the polymer made of only carbon and hydrogen may include a hydrogenated polymer. In another embodiment, a polymer consisting solely of carbon and hydrogen may include an unhydrogenated polymer having double or triple bonds in the backbone and/or side chains.

The polymer composed of only carbon and hydrogen may have a weight average molecular weight of 1,000 to 500,000. Within the above range, there may be an effect that the effect of the present invention is well implemented.

In one embodiment, the polymer consisting of only carbon and hydrogen may include a polymer of a monomer mixture including a diene-based compound having 3 to 6 carbon atoms.

The diene-based compound having 3 to 6 carbon atoms may be in a cis or trans form, and may include at least one of 1,2-propadiene, 1,3-butadiene, isoprene, and 1,3-pentadiene. have. The diene-based compound having 3 to 6 carbon atoms may be included in one or more or two or more of the monomer mixture. Preferably, the diene-based compound having 3 to 6 carbon atoms may include at least one of 1,3-butadiene and isoprene.

The monomer mixture may further include a monomer polymerizable with the diene-based compound having 3 to 6 carbon atoms. The monomer may include at least one of an aromatic group-containing monomer, a (meth)acrylic acid ester having an alkyl group having 1 to 5 carbon atoms, and a chlorine-based monomer. The aromatic group-containing monomer may include, for example, at least one of styrene, alpha-methylstyrene, and ethyl styrene as a styrene-based monomer. The (meth)acrylic acid ester having an alkyl group having 1 to 5 carbon atoms may include at least one of methyl (meth)acrylate and ethyl (meth)acrylate. The chlorine-based monomer may include vinyl chloride and the like.

The polymer composed of only carbon and hydrogen may be a homopolymer or a copolymer, and may include a random, alternating, or block polymer. Preferably, the effect of the present invention may be better realized by including the block polymer as a polymer composed of only carbon and hydrogen.

In one embodiment, the polymer made of only carbon and hydrogen may include at least one of polybutadiene, a styrene-butadiene block copolymer, and a styrene-isoprene block copolymer.

first photocurable monomer

The first photocurable monomer forms an organic layer by curing reaction. The first photocurable monomer is included in an appropriate content range in the composition, so that the polymers made of only carbon and hydrogen are included in the range of the present invention, respectively, so that the composition of the present invention can help to lower the dielectric constant after curing and make inkjet application better. have.

In one embodiment, the first photocurable monomer is 0% to 95% by weight of the composition on a solids basis, specifically 20% to 95% by weight, more specifically 85% to 95% by weight or 20% to 70% by weight of the composition It may be included in weight %. In the above range, the photocuring rate of the composition is increased, the strength of the organic layer is increased, the dielectric constant of the present invention can be secured, and inkjet coating can be performed well.

In one embodiment, the first photocurable monomer may include a non-silicone-based photocurable monomer that does not contain silicone.

In one embodiment, the first photocurable monomer may include a photocurable monomer that does not have an alicyclic group and an aromatic group.

The first photocurable monomer includes a photocurable monomer containing a long-chain alkyl group or a long-chain alkylene group. The first photocurable monomer may include a (meth)acrylate group as a photocurable functional group.

A photocurable monomer containing a long-chain alkyl group or a long-chain alkylene group may be included in the composition to facilitate implementation of the effects of the present invention. The "long chain alkyl group" means an alkyl group having 8 to 12 carbon atoms, and the "long chain alkylene group" means an alkylene group having 6 to 15 carbon atoms, where "the number of carbon atoms" is a (meth) acrylate group. It means only the number of carbons in the alkylene group itself, excluding carbon.

The long-chain alkyl group-containing photocurable monomer is a photocurable monomer (mono(meth)acrylate) having one (meth)acrylate group, and (meth)acryl having a straight-chain alkyl group having 8 to 12 carbon atoms unsubstituted at the ester moiety rate may be included.

For example, mono (meth) acrylate is octyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate (lauryl (meth)acrylate) may be included. Preferably, the mono(meth)acrylate may include mono(meth)acrylate having an unsubstituted straight-chain alkyl group having 10 to 12 carbon atoms.

The long-chain alkylene group-containing photocurable monomer is a photocurable monomer (di(meth)acrylate) having two (meth)acrylate groups, and is an alkylene group having 6 to 15 carbon atoms that is substituted or unsubstituted between (meth)acrylate groups. Preferably, it may include an unsubstituted di(meth)acrylate having an alkylene group having 6 to 12 carbon atoms. For example, di(meth)acrylate may be represented by the following formula (1):

[Formula 1]

(In Formula 1,

R ₁₀ , R ₁₁ are each independently hydrogen or a methyl group;

R ₁₂ is a substituted or unsubstituted alkylene group having 6 to 15 carbon atoms).

For example, in Formula 1, R ₁₂ may be an unsubstituted alkylene group having 6 to 12 carbon atoms. Di(meth)acrylate is 1,6-hexanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10- It may include at least one of decanediol di(meth)acrylate, 1,11-undecanediol di(meth)acrylate, and 1,12-dodecanediol di(meth)acrylate.

second photocurable monomer

The second photocurable monomer forms an organic layer by curing reaction. The second photocurable monomer is included in an appropriate content range in the composition so that the polymer consisting of only carbon and hydrogen is included in the range of the present invention, respectively, so that the composition of the present invention helps to lower the dielectric constant after curing and inkjet coating can be done well. have.

In one embodiment, the second photocurable monomer is 0% to 95% by weight of the composition on a solids basis, specifically 20% to 95% by weight, more specifically 60% to 95% by weight or 20% to 75% by weight of the composition It may be included in weight % or 85% by weight to 95% by weight. In the above range, the photocuring rate of the composition is increased, the strength of the organic layer is increased, the dielectric constant of the present invention can be secured, and inkjet coating can be performed well.

In one embodiment, the second photocurable monomer may include a non-silicone-based photocurable monomer that does not contain silicone.

The second photocurable monomer includes at least one of a photocurable monomer having an alicyclic group and a photocurable monomer having an aromatic group.

The alicyclic group-containing photocurable monomer may include a monomer of Formula 2 below:

[Formula 2]

(In Formula 2,

A, B, C, and D are each independently a substituted or unsubstituted C 1 to C 20 alkylene group, a substituted or unsubstituted C 1 to C 20 alkyl ether group, a substituted or unsubstituted C 1 to C 20 agent a secondary or tertiary amino group, a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, a substituted or unsubstituted arylalkylene group having 7 to 30 carbon atoms, or a substituted or unsubstituted alkoxyene group having 1 to 20 carbon atoms,

E and F are each independently hydrogen, a substituted or unsubstituted C1-C20 alkyl group or a substituted or unsubstituted C6-C20 aryl group,

l, m, n are each independently 0 or 1, l+m+n is not 0,

B ₁ , C _m , D _n may each independently form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group connected to A,

C _m , D _n may each independently form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group connected to _{B 1 , or}

D _n may be each independently _{connected to C m} to form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group,

X and Y are each independently hydrogen or Formula 3 below, and at least one of X and Y is Formula 3 below.

[Formula 3]

(In Formula 3, * is a connection site of an element,

R ₁ is a single bond, a substituted or unsubstituted C 1 to C 20 alkylene group or a substituted or unsubstituted C 6 to C 20 arylene group,

R ₂ is hydrogen or a methyl group).

In Formula 2, when l is 0, that is, B ₀ means that B is not included in Formula 2, and when l is 1, that is, B ₁ means that B is included in Formula 2. In Formula 2, when m is 0, that is, C ₀ means that C is not included in Formula 2, and when m is 1, that is, C ₁ means that C is included in Formula 2. In Formula 2, when n is 0, that is, D ₀ means that D is not included in Formula 2, and when n is 1, that is, D ₁ means that D is included in Formula 2.

Preferably, A, B, C, and D may each independently be a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms. Preferably, E and F may each independently be hydrogen or a substituted or unsubstituted C 1 to C 5 alkyl group.

In one embodiment, the compound of Formula 2 may include at least one of Formula 2-1, Formula 1-2, and Formula 2-3:

[Formula 2-1]

(In Formula 2-1, E, F, X, and Y are as defined in Formula 2)

[Formula 2-2]

(In Formula 2-2, E, F, X, Y are as defined in Formula 2,

R ₃ is a substituted or unsubstituted C1-C20 alkylene group)

[Formula 2-3]

(In Formula 2-3, E, F, X, Y are as defined in Formula 2,

R ₄ is a substituted or unsubstituted C1-C20 alkylene group).

For example, the compound of Formula 2 is isobornyl (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, 1-adamantyl (meth) acrylate, 2-adamantyl (meth) ) may include at least one of adamantyl (meth)acrylate and dicyclopentanyl (meth)acrylate including acrylate.

The compound of Formula 2 may be prepared and used by a conventional method known to those skilled in the art, or a commercially available material may be used.

The aromatic group-containing photocurable monomer is a photocurable monomer having one (meth)acrylate group (aromatic mono(meth)acrylate), and a photocurable monomer having two (meth)acrylate groups (aromatic di(meth)acryl) rate) may be included.

The aromatic mono(meth)acrylate may include a mono(meth)acrylate having a substituted or unsubstituted aromatic group. In this case, the 'aromatic group' refers to a polycyclic aromatic group including a monocyclic or fused form, or a form in which a single ring is connected by a sigma bond. For example, the aromatic group is a substituted or unsubstituted C6 to C50 aryl group, a substituted or unsubstituted C7 to C50 arylalkyl group, a substituted or unsubstituted C3 to C50 heteroaryl group, substituted Or it may mean one or more of an unsubstituted C 3 to C 50 heteroarylalkyl group. Specifically, aromatic groups are phenyl, biphenyl, terphenyl, quaterphenyl, naphthyl, anthracenyl, phenanthrenyl, chrysenyl, triphenylenyl, tetracenyl, pyrenyl, benzopyrenyl, pentacenyl, coronenyl, Ovalenyl, coranulenyl, benzyl, pyridinyl, pyrazinyl, pyrimidinyl, pyridazinyl, triazinyl, quinolinyl, isoquinolinyl, quinoxalinyl, acridinyl, quinazolinyl, cinnori nyl, phthalazinyl, thiazolyl, benzothiazolyl, isoxazolyl, benzisoxazolyl, oxazolyl, benzoxazolyl, pyrazolyl, indazolyl, imidazolyl, benzimidazolyl, purinyl, thiophenyl, benzo It may be one or more of thiophenyl, furanyl, benzofuranyl, and isobenzopranyl.

For example, the aromatic mono (meth) acrylate may be represented by the following Chemical Formula 4:

[Formula 4]

(In Formula 4,

R ₁₃ is hydrogen or a methyl group, s is an integer from 0 to 10,

R ₁₄ is a substituted or unsubstituted C6 to C50 aryl group or a substituted or unsubstituted C6 to C50 aryloxy group).

For example, R ₁₄ is a phenylphenoxyethyl group, a phenoxyethyl group, a benzyl group, a phenyl group, a phenylphenoxy group, a phenoxy group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a methylphenylethyl group, a propylphenylethyl group, a methoxyphenylethyl group , cyclohexylphenylethyl group, chlorophenylethyl group, bromophenylethyl group, methylphenyl group, methylethylphenyl group, methoxyphenyl group, propylphenyl group, cyclohexylphenyl group, chlorophenyl group, bromophenyl group, phenylphenyl group, biphenyl group, terphenyl ) group, quaterphenyl group, anthracenyl group, naphthalenyl group, triphenylenyl group, methylphenoxy group, ethylphenoxy group, methylethylphenoxy group, methoxyphenyloxy group, propylphenoxy group, cyclohexyl group Phenoxy group, chlorophenoxy group, bromophenoxy group, biphenyloxy group, terphenyloxy group, quaterphenyloxy group, anthracenyloxy group, naphthalenyloxy group, tri It may be a triphenylenyloxy group.

Specifically, aromatic mono (meth) acrylate is 2-phenylphenoxyethyl (meth) acrylate (o-phenylphenol EO (ethylene oxide) (meth) acrylate), phenoxyethyl (meth) acrylate, phenyl (meth) acrylate, phenoxy (meth) acrylate, 2-ethylphenoxy (meth) acrylate, benzyl (meth) acrylate, 2-phenylethyl (meth) acrylate, 3-phenylpropyl (meth) acrylic Rate, 4-phenylbutyl (meth)acrylate, 2-(2-methylphenyl)ethyl (meth)acrylate, 2-(3-methylphenyl)ethyl (meth)acrylate, 2-(4-methylphenyl)ethyl (meth) ) acrylate, 2- (4-propylphenyl) ethyl (meth) acrylate, 2- (4- (1-methylethyl) phenyl) ethyl (meth) acrylate, 2- (4-methoxyphenyl) ethyl ( Meth) acrylate, 2- (4-cyclohexylphenyl) ethyl (meth) acrylate, 2- (2-chlorophenyl) ethyl (meth) acrylate, 2- (3-chlorophenyl) ethyl (meth) acrylate , 2- (4-chlorophenyl) ethyl (meth) acrylate, 2- (4-bromophenyl) ethyl (meth) acrylate, 2- (3-phenylphenyl) ethyl (meth) acrylate, 4- ( Xenyl-2-yloxy) butyl (meth) acrylate, 3- (biphenyl-2-yloxy) butyl (meth) acrylate, 2- (biphenyl-2-yloxy) butyl (meth) acrylate , 1- (biphenyl-2-yloxy) butyl (meth) acrylate, 4- (biphenyl-2-yloxy) propyl (meth) acrylate, 3- (biphenyl-2-yloxy) propyl ( Meth) acrylate, 2- (biphenyl-2-yloxy) propyl (meth) acrylate, 1- (biphenyl-2-yloxy) propyl (meth) acrylate, 4- (biphenyl-2-ylox) C) ethyl (meth) acrylate, 3- (biphenyl-2-yloxy) ethyl (meth) acrylate, 2- (biphenyl-2-yloxy) ethyl (meth) acrylate, 1- (biphenyl At least one of -2-yloxy)ethyl (meth)acrylate, 2-(4-benzylphenyl)ethyl (meth)acrylate, 1-(4-benzylphenyl)ethyl (meth)acrylate, or structural isomers thereof may include, but is not limited thereto. That is, the (meth)acrylate mentioned in the present invention is only an example and is not limited thereto, and the present invention includes all acrylates in a structural isomer relationship. For example, although only 2-phenylethyl (meth) acrylate is mentioned as an example of the present invention, the present invention includes all isomers including 3-phenylethyl (meth) acrylate and 4-phenyl (meth) acrylate. include

Specifically, in Formula 3, s is an integer of 1 to 5, R ₁₄ is a substituted or unsubstituted phenylphenoxy group, a substituted or unsubstituted phenylphenylthiol group, a substituted or unsubstituted biphenylphenoxy group, a substituted or It may be an unsubstituted terphenylphenoxy group, and the substituents in substituted or unsubstituted are deuterium, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 18 carbon atoms, 3 to carbon atoms. 18 may be a heteroaryl group, or a thiol group.

The composition may further include a third photocurable monomer.

third photocurable monomer

The third photocurable monomer may be included in the composition to provide an effect of further lowering the dielectric constant of the organic layer formed of the composition.

In one embodiment, the third photocurable monomer may include a silicone-based photocurable monomer containing silicon. When silicon is additionally included, the dielectric constant of the organic layer may be lower than when silicon is not included. In one embodiment, silicon may be included as siloxane (*-O-Si-O-*, * is a connection site of an element).

The third photocurable monomer may include a compound of Formula 5 below:

[Formula 5]

(In Formula 5,

R ₁₅ , R ₁₆ are each independently a single bond, a substituted or unsubstituted C 1-20 alkylene group, a substituted or unsubstituted C 1-30 C 1-30 alkylene ether group, *-N(R')-R "-* (* is a connection site of an element, R' is a substituted or unsubstituted C1-C30 alkyl group, R" is a substituted or unsubstituted C1-C20 alkylene group), substituted or unsubstituted C6 -30 arylene group, substituted or unsubstituted arylalkylene group having 7-30 carbon atoms, or *-OR"-* (where * is a connection site of an element, R" is a substituted or unsubstituted C1-20 arylalkylene group alkylene group),

X ₁ ,X ₂ ,X ₃ ,X ₄ ,X ₅ ,X ₆ are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted alkyl ether group having 1 to 30 carbon atoms, *-N(R')(R") (wherein * is a connecting site of an element, R' and R" are the same or different, and hydrogen or a substituted or unsubstituted C1-C30 alkyl group), substituted or unsubstituted an alkyl sulfide group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted arylalkyl group having 7 to 30 carbon atoms,

One or more of X ₁ , X ₂ , X ₃ , X ₄ , X ₅ , and X ₆ is a substituted or unsubstituted C6-C30 aryl group,

Y ₁ , Y ₂ are each independently represented by Formula 6,

[Formula 6]

(In Formula 6, * is a connection site of an element, and R ₁₇ is hydrogen or a methyl group)

n is an integer from 0 to 30, or the average value of n is 0-30).

The "single bond" means that Si and Y ₁ are directly connected without any element interposed (Y ₁ -Si), or Si and Y ₂ are directly connected without any element interposed (Si-Y ₂ ). it means.

Specifically, R ₁₅ , R ₁₆ may be an alkylene group having 1 to 5 carbon atoms or a single bond. Specifically, X ₁ ,X ₂ ,X ₃ ,X ₄ ,X ₅ ,X ₆ is an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 10 carbon atoms, and X ₁ ,X ₂ ,X ₃ ,X ₄ ,X _At least one of 5 and X ₆ may be an aryl group having 6 to 10 carbon atoms. More specifically, X ₁ ,X ₂ ,X ₃ ,X ₄ ,X ₅ ,X ₆ is an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 10 carbon atoms, X ₁ ,X ₂ ,X ₃ ,X ₄ , _{1, 2, 3 or 6} of X ₅ , X 6 may be an aryl group having 6 to 10 carbon atoms. More specifically, X ₁ ,X ₂ ,X ₃ ,X ₄ ,X ₅ ,X ₆ is a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a phenyl group, or a naphthyl group, and X ₁ ,X ₂ ,X ₃ 1, 2, 3 or 6 of ,X ₄ ,X ₅ ,X ₆ may be a phenyl group or a naphthyl group. n may be an integer from 1 to 5.

Specifically, the third photocurable monomer may be represented by any one of the following Chemical Formulas 5-1 to 5-6:

[Formula 5-1]

[Formula 5-2]

[Formula 5-3]

[Formula 5-4]

[Formula 5-5]

[Formula 5-6]

The third photocurable monomer may be prepared by a conventional method or a commercially available product may be used. For example, the third photocurable monomer may be prepared by reacting a siloxane compound having one or more silicon-linked aryl groups with a compound extending the number of carbon atoms (eg, allyl alcohol), and reacting (meth)acryloyl chloride, It is not limited thereto. Alternatively, the silicone-based di(meth)acrylate may be prepared by reacting a siloxane compound having one or more silicone-linked aryl groups with (meth)acryloyl chloride, but is not limited thereto.

The third photocurable monomer may be included in an amount of 0 wt% to 30 wt%, specifically 1 wt% to 20 wt%, based on the solid content of the composition. In the above range, there may be an effect of lowering the dielectric constant of the organic layer in a range that does not impair other physical properties of the composition.

initiator

The initiator may include, without limitation, a conventional photopolymerization initiator capable of performing a photocuring reaction. For example, the photopolymerization initiator may include a triazine-based, acetophenone-based, benzophenone-based, thioxanthone-based, benzoin-based, phosphorus-based, oxime-based, or mixture thereof.

The phosphorus base may be diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, benzyl(diphenyl)phosphine oxide, or mixtures thereof. For example, when a phosphorus-based initiator is used, the composition of the present invention may exhibit better initiation performance in long-wavelength UV. The initiator may be included alone or in a mixture of two or more.

The initiator may be included in an amount of 0.1% to 7% by weight, specifically 1% to 5% by weight, and 2% to 4% by weight of the composition based on the solid content. In the above range, photopolymerization may sufficiently occur during exposure, and a decrease in transmittance due to unreacted initiator remaining after photopolymerization may be prevented.

In one embodiment, the composition comprises 0.1 wt% to 10 wt% of a polymer consisting only of carbon and hydrogen, 0 wt% to 95 wt% of a first photocurable monomer, 0 wt% to 95 wt% of a second photocurable monomer based on the solid content , may be 0.1 wt% to 7 wt% of the initiator.

In one embodiment, the composition comprises 0.1 wt% to 10 wt% of a polymer consisting only of carbon and hydrogen, 20 wt% to 70 wt% of the first photocurable monomer, 20 wt% to 75 wt% of the second photocurable monomer based on the solid content , 0.1% to 7% by weight of the initiator may be included. Within the above range, the effects of the present invention can be well realized.

In one embodiment, the composition may include 0.1 wt% to 10 wt% of a polymer consisting only of carbon and hydrogen, 85 wt% to 95 wt% of the first photocurable monomer, and 0.1 wt% to 7 wt% of an initiator based on the solid content have. Within the above range, the effects of the present invention can be well realized.

In one embodiment, the composition comprises 0.1 wt% to 10 wt% of a polymer consisting only of carbon and hydrogen, 60 wt% to 95 wt% of the second photocurable monomer, 1 wt% to 30 wt% of the third photocurable monomer based on the solid content , 0.1% to 7% by weight of the initiator may be included. Within the above range, the effects of the present invention can be well realized.

The composition of the present invention may be formed by mixing the above-mentioned components. The composition of the present invention may be formed in a solvent-free type that does not contain a solvent.

The composition of the present invention is a photocurable composition, and may be photocured by irradiation at UV wavelength from 10mW/cm ² to 500mW/cm ² for 1 second to 50 seconds to form an encapsulation layer.

The composition of the present invention may further comprise conventional additives known to those skilled in the art. The additive may include, but is not limited to, a heat stabilizer, an antioxidant, a UV absorber, and the like.

The composition of the present invention may have a viscosity of 5 cps to 100 cps, specifically 7 cps to 75 cps, more specifically 15 cps to 75 cps at 25±2° C. (23° C. to 27° C.). In the above range, the inkjet process of the composition for encapsulation may be possible.

The composition of the present invention may have a photocuring rate of 85% or more, specifically 90% to 100%. Within the above range, the film strength of the organic layer formed of the composition may be excellent to extend the device lifespan.

The composition of the present invention can be used to encapsulate an organic light emitting device. Specifically, the composition may form an organic layer in an encapsulation structure in which an inorganic layer and an organic layer are sequentially formed.

The composition of the present invention decomposes by permeation of gases or liquids in the surrounding environment, such as oxygen and/or moisture and/or water vapor in the atmosphere, and chemicals used in processing into electronic products, as members for devices, especially for display devices. It can also be used for encapsulation of members for devices that may be damaged or defective. For example, the device member may be a lighting device, a metal sensor pad, a microdisk laser, an electrochromic device, a photochromic device, a microelectromechanical system, a solar cell, an integrated circuit, a charge coupled device, a light emitting polymer, etc. It is not limited thereto.

The organic light emitting device display device of the present invention may include an organic layer formed of the composition for encapsulating an organic light emitting device according to an embodiment of the present invention. Specifically, the organic light emitting device display device includes an organic light emitting device and a barrier stack formed on the organic light emitting device and including an inorganic layer and an organic layer, and the organic layer may be formed of the composition for encapsulating an organic light emitting device according to an embodiment of the present invention. . As a result, the reliability of the organic light emitting diode display may be improved.

Hereinafter, an organic light emitting diode display according to an embodiment of the present invention will be described with reference to FIG. 1 . 1 is a cross-sectional view of an organic light emitting diode display according to an embodiment of the present invention.

Referring to FIG. 1 , an organic light emitting device display device 100 includes a substrate 10 , an organic light emitting device 20 formed on the substrate 10 , and an inorganic layer 31 and an organic layer formed on the organic light emitting device 20 . and a barrier stack 30 including 32, the inorganic layer 31 is in contact with the organic light emitting device 20, and the organic layer 32 is the composition for encapsulating an organic light emitting device according to an embodiment of the present invention can be formed with

The substrate 10 is not particularly limited as long as it is a substrate on which an organic light emitting device can be formed. For example, it may be made of a material such as transparent glass, a plastic sheet, silicon or a metal substrate.

Although not shown in FIG. 1 as commonly used in an organic light emitting diode display device, the organic light emitting device 20 includes a first electrode, a second electrode, and an organic light emitting film formed between the first electrode and the second electrode. The light emitting layer may be one in which a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer are sequentially stacked, but is not limited thereto.

The barrier stack 30 includes an organic layer and an inorganic layer, and each of the organic layer and the inorganic layer has different components constituting the layers, so that the organic light emitting device encapsulation function may be implemented.

Since the inorganic layer has different components from the organic layer, the effect of the organic layer may be supplemented. For example, the inorganic layer may be a metal, nonmetal, intermetallic compound or alloy, nonmetallic compound or alloy, metal or nonmetal oxide, metal or nonmetal fluoride, metal or nonmetal nitride, metal or nonmetal carbide, metal or nonmetal of oxynitride, metal or non-metal boride, metal or non-metal oxyboride, metal or non-metal silicide, or a mixture thereof. Metals or non-metals are silicon (Si), aluminum (Al), selenium (Se), zinc (Zn), antimony (Sb), indium (In), germanium (Ge), tin (Sn), bismuth (Bi), transition metal, lanthanide metal, etc., but is not limited thereto. Specifically, the inorganic layer is AlOx, In ₂ O ₃ , SnO including silicon oxide (SiOx), silicon nitride (SiNx), silicon oxygen nitride (SiOxNy), ZnSe, ZnO, Sb ₂ O ₃ , Al ₂ O _{3 , etc. 2} can be

The inorganic layer may be deposited by a plasma process, a vacuum process such as sputtering, chemical vapor deposition, plasma chemical vapor deposition, evaporation, sublimation, electron cyclotron resonance-plasma vapor deposition, and combinations thereof.

When the organic layer is alternately deposited with the inorganic layer, smoothing properties of the inorganic layer can be secured and defects of the inorganic layer can be prevented from propagating to another inorganic layer.

The organic layer may be formed by a combination of coating, vapor deposition, curing, etc. of the composition for encapsulating an organic light emitting device according to an embodiment of the present invention. For example, a composition for encapsulating an organic light emitting device may be coated to a thickness of 1 μm to 50 μm, and ^{cured by irradiation at 10 to 500 mW/cm 2} for 1 second to 50 seconds.

The barrier stack includes an organic layer and an inorganic layer, but the total number of the organic layer and the inorganic layer is not limited. The total number of organic and inorganic layers may vary depending on the level of permeation resistance to oxygen and/or moisture and/or water vapor and/or chemicals. For example, the total number of organic layers and inorganic layers may be 10 or less, for example, 2 to 7 layers, specifically in the order of inorganic layer/organic layer/inorganic layer/organic layer/inorganic layer/organic layer/inorganic layer. It may be formed in 7 layers.

In the barrier stack, organic and inorganic layers may be alternately deposited. This is due to the effect on the organic layer produced due to the physical properties of the composition described above. Due to this, the organic layer and the inorganic layer can supplement or enhance the encapsulation effect on the device.

Hereinafter, an organic light emitting diode display according to another embodiment of the present invention will be described with reference to FIG. 2 . 2 is a cross-sectional view of an organic light emitting diode display according to another embodiment of the present invention.

Referring to FIG. 2 , the organic light emitting diode display 200 includes a substrate 10 , an organic light emitting device 20 formed on the substrate 10 , and an inorganic layer 31 and an organic layer formed on the organic light emitting device 20 . The barrier stack 30 including the 32 is included, the inorganic layer 31 encapsulates the internal space 40 in which the organic light emitting device 20 is accommodated, and the organic layer 32 is the organic light emitting device of the embodiment of the present invention. It may be formed of a composition for encapsulation. It is substantially the same as the organic light emitting diode display according to the embodiment of the present invention, except that the inorganic layer does not contact the organic light emitting diode.

Hereinafter, the configuration and operation of the present invention will be described in more detail through preferred embodiments of the present invention. However, this is presented as a preferred example of the present invention and cannot be construed as limiting the present invention in any sense.

Preparation Example 1: Preparation of a compound of Formula 5-2

Put 300 ml of ethyl acetate in a 1000 ml flask equipped with a cooling tube and a stirrer, and then add 21 g of 3,3-diphenyl-1,1,5,5-tetramethyltrisiloxane and 43 g of allyl alcohol (Daejeong Chemical Co., Ltd.) for 30 minutes. After nitrogen purging for a while, 72 ppm of Pt on carbon black powder (Aldrich) was added, and the temperature in the flask was raised to 80° C. and stirred for 4 hours. Residual solvent was removed by distillation. 71.5 g of the obtained compound was placed in 300 ml of dichloromethane, 39 g of triethylamine was added, and 30.2 g of methacryloyl chloride was slowly added while stirring at 0°C. The residual solvent was removed by distillation to obtain a compound of Formula 5-2 with an HPLC purity of 96%. ( ¹ H NMR: δ7.52, m, 6H; δ7.42, m, 4H; δ6.25, d, 2H; δ6.02, dd, 2H; δ5.82, t, 1H; δ5.59, d , 2H;δ3.86, m, 4H;δ1.52, m, 4H;δ0.58, m, 4H;δ0.04, m, 12H)

[Formula 5-2]

Specific specifications of the components used in Examples and Comparative Examples are as follows.

A: Polymer composed of only carbon and hydrogen

A1: Styrene-butadiene block copolymer (Aldrich, non-hydrogenated)

A2: Styrene-isoprene block copolymer (Aldrich, non-hydrogenated)

A3: polybutadiene (Aldrich, non-hydrogenated)

B: first photocurable monomer

B1:1,12-dodecanediol diacrylate (Sartomer)

B2:1,6-hexanediol diacrylate (Sartomer)

B3: Lauryl Acrylate (Sartomer)

C: second photocurable monomer

C1: DCP-A (Kyoeisha, dimethylol tricyclodecane diacrylate)

C2: isobornyl acrylate (Kowa)

C3:o-phenylphenol EO (ethylene oxide) acrylate (M1142, Miwon)

D: Third photocurable monomer: the compound of Preparation Example 1

E: Initiator: Irgacure TPO ((BASF), phosphorus initiator)

Example 1

(A1) 5 parts by weight, (B2) 20 parts by weight, (C2) 72 parts by weight, and (E) 3 parts by weight were put in a 125 ml brown polypropylene bottle and mixed at room temperature for 3 hours using a shaker to prepare a composition .

Examples 2 to 9 and Comparative Examples 1 to 5

A composition was prepared in the same manner as in Example 1, except that the content of each component in Example 1 was changed as shown in Table 1 (unit: parts by weight). In Table 1 below, "-" means that the component is not contained.

Detailed configurations of the compositions of Examples and Comparative Examples are shown in Table 1 below.

Example
comparative example
One 2 3 4 5 6 7 8 9 One 2 3 4 5 A A1 5 5 5 5 - - 2 - - - - - - 0.05 A2 - - - - 5 - - 2 - - - - - - A3 - - - - - 10 - - 5 - - - 12 - B B1 - 30 - - - - 20 20 20 63 68 68 - 67.95 B2 20 - 40 - 20 20 - - - - - - 20 - B3 - 62 - - - - - 45 - - 19 19 - 19 C C1 - - 32 - - - - 30 - - - - - - C2 72 - - 72 72 67 75 - 72 - - - 65 - C3 - - 20 - - - - - - 34 10 - - 10 D - - - 20 - - - - - - - 10 - - E 3 3 3 3 3 3 3 3 3 3 3 3 3 3 sum 100 100 100 100 100 100 100 100 100 100 100 100 100 100

The following physical properties were measured for the compositions prepared in Examples and Comparative Examples, and the results are shown in Tables 2 and 3.

(1) Viscosity (unit: cps): For the compositions of Examples and Comparative Examples, the viscosity was measured at 24.8° C. with a viscometer LV DV-II Pro (Brookfield) with a spindle number (No. spindle) 40.

^{(2) Photocuring rate (unit: %): In the vicinity of 1635 cm -1} (C = C), 1720 cm ^-1 (C = O) using FT-IR (NICOLET 4700, Thermo) for the composition for encapsulation. Measure the intensity of the absorption peak. A composition for encapsulation is applied by spraying on a glass substrate ^{and UV-cured by irradiating at 100 mW/cm 2} for 10 seconds to obtain a specimen of 20 cm x 20 cm x 3 μm (width x length x thickness). Obtain a cured film and, FT-IR (NICOLET 4700, Thermo社) is used to 1635cm ^-1 measured intensity of the absorption peak in the vicinity of the (C = C), 1720cm ^-1 vicinity (C = O) a. The photocuring rate is calculated according to Equation 1 below.

[Equation 1]

Photocuring rate (%) = ｜1-(A/B)｜ x 100

(In Equation 1, A is the ratio of the intensity of the absorption peak in the vicinity of ^{1635 cm -1} to the intensity of the absorption peak in the vicinity of ^{1720 cm -1 for the cured film,}

B is the ratio of the intensity of the absorption peak in the vicinity of ^{1635 cm -1} to the intensity of the absorption peak in the vicinity of ^{1720 cm -1} for the composition for sealing).

(3) Etching rate of organic layer by plasma (unit: %): The composition for encapsulation was deposited on a Si wafer and ^{irradiated with 100 mW/cm 2} for 10 seconds to form an organic layer by photocuring. By photocuring, the initial thickness (T1, unit: μm) of the organic layer was measured. ICP power: 2500W, RE power: 300W, DC bias:200V, Ar flow: 50sccm, ethching time: 1min, pressure: 10mtorr. The thickness (T2, unit: μm) was measured. The etch rate of the organic layer by plasma was calculated by Equation 2 below. The height (thickness) of the organic layer was measured by FE-SEM Hitachi High Technologies Corporation.

[Equation 2]

Etching rate of organic layer by plasma (%) = (T1-T2)/T1 x 100

(4) Dielectric constant (no unit): The composition for sealing of Examples and Comparative Examples is applied to a predetermined thickness on a chromium (Cr) plate, and ^{irradiated with 100 mW/cm 2} for 10 seconds to photocuring, thereby forming a coating film having a thickness of 8 μm. did. After depositing an aluminum electrode (electrode for measuring the dielectric constant) on the coating film, the dielectric constant was measured at 200 kHz and 25° C. with an impedance measuring instrument (RDMS-200).

(5) Whether inkjet is possible: 10 to 20 picograms of the compositions of Examples and Comparative Examples were dropped using an inkjet printer (OMNIJET, Unijet). The dropping rate of the composition was 2.5 to 3.5 µm/s, and the head temperature of the inkjet printer was 25°C to 50°C. Dropping occurrence and jetting possibility were evaluated during dropping.

Example One 2 3 4 5 6 7 8 9 Viscosity 49.7 72.1 53.6 62.7 39.5 42.6 35.4 31.7 24.7 light curing rate 91.7 92.8 92.4 92.1 93.6 92.2 90.8 92.1 91.6 Plasma etch rate 5.6 5.9 5.8 5.8 5.7 6.1 5.9 5.7 6.2 permittivity 2.74 2.71 2.76 2.68 2.73 2.79 2.81 2.91 2.85 inkjet possible possible possible possible possible possible possible possible possible

comparative example One 2 3 4 5 Viscosity 21.1 16.9 14.2 107.9 20.2 light curing rate 92.3 92.6 93.1 - 91.8 Plasma etch rate 6.1 9.8 8.9 - 8.9 permittivity 3.12 3.28 3.46 - 3.19 inkjet possible possible possible impossible possible

* In Table 3, "-" means that the composition of Comparative Example 4 was not measured because it was impossible to form an organic layer because inkjet coating was impossible.

As shown in Table 2, the composition for encapsulating an organic light emitting device of the present invention is well inkjet coated, can secure a dielectric constant of 2.95 or less, and form an organic layer having a low plasma etching rate.

On the other hand, as shown in Table 3, Comparative Examples 1 to 3, which do not include a polymer made of only carbon and hydrogen, have difficulty in securing a dielectric constant of 2.95 or less, or cannot achieve the plasma etch rate targeted by the present invention. In Comparative Example 4 containing a polymer consisting of only carbon and hydrogen in an amount of more than 10% by weight in the composition, the inkjet coating itself was not performed at all, and thus an organic layer could not be formed. Comparative Example 5 including a polymer consisting only of carbon and hydrogen in an amount of less than 0.1% by weight in the composition realized an organic layer having a high plasma etching rate, and the organic layer had a dielectric constant of 2.95.

Simple modifications or changes of the present invention can be easily carried out by those of ordinary skill in the art, and all such modifications or changes can be considered to be included in the scope of the present invention.

Claims (14)

polymers made of only carbon and hydrogen; at least one of a first photocurable monomer and a second photocurable monomer; And a composition for encapsulating an organic light emitting device comprising an initiator,
The polymer consisting only of carbon and hydrogen is contained in an amount of 0.1% to 10% by weight of the composition based on the solid content, the composition for encapsulating an organic light emitting device.
The composition for encapsulating an organic light emitting device according to claim 1, wherein the polymer consisting only of carbon and hydrogen comprises a polymer of a monomer mixture including a diene-based compound having 3 to 6 carbon atoms.
The composition of claim 2, wherein the monomer mixture further comprises at least one of an aromatic group-containing monomer, a (meth)acrylic acid ester having an alkyl group having 1 to 5 carbon atoms, and a chlorine-based monomer. .
According to claim 1, wherein the polymer made of only carbon and hydrogen is polybutadiene, styrene-butadiene block copolymer, styrene-isoprene block copolymer comprising at least one of, the organic light emitting device encapsulation composition.
According to claim 1, wherein the first photo-curable monomer comprises a long-chain alkyl group or a long-chain alkylene group-containing photo-curable monomer, the organic light emitting device encapsulation composition.
The composition of claim 1, wherein the second photocurable monomer comprises a photocurable monomer having an alicyclic group and a photocurable monomer having an aromatic group.
The composition for encapsulating an organic light emitting device according to claim 6, wherein the photocurable monomer having an alicyclic group includes a monomer of Formula 2 below:
[Formula 2]

(In Formula 2,
A, B, C, and D are each independently a substituted or unsubstituted C 1 to C 20 alkylene group, a substituted or unsubstituted C 1 to C 20 alkyl ether group, a substituted or unsubstituted C 1 to C 20 agent a secondary or tertiary amino group, a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, a substituted or unsubstituted arylalkylene group having 7 to 30 carbon atoms, or a substituted or unsubstituted alkoxyene group having 1 to 20 carbon atoms,
E and F are each independently hydrogen, a substituted or unsubstituted C1-C20 alkyl group or a substituted or unsubstituted C6-C20 aryl group,
l, m, n are each independently 0 or 1, l+m+n is not 0,
B ₁ , C _m , D _n may each independently form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group connected to A,
C _m , D _n may each independently form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group connected to _{B 1 , or}
D _n may be each independently _{connected to C m} to form a ring of a substituted or unsubstituted C 1 to C 20 alkylene group,
X and Y are each independently hydrogen or Formula 3 below, and at least one of X and Y is Formula 3 below.
[Formula 3]

(In Formula 3, * is a connection site of an element,
R ₁ is a single bond, a substituted or unsubstituted C 1 to C 20 alkylene group or a substituted or unsubstituted C 6 to C 20 arylene group,
R ₂ is hydrogen or a methyl group).
The method according to claim 1, wherein the composition for encapsulating an organic light emitting device is based on a solid content.
0.1 wt% to 10 wt% of the polymer consisting only of carbon and hydrogen;
0 wt% to 95 wt% of the first photocurable monomer;
0 wt% to 95 wt% of the second photocurable monomer;
The initiator of 0.1% to 7% by weight, the organic light emitting device encapsulation composition.
The method according to claim 8, wherein the composition for encapsulating an organic light emitting device is based on a solid content.
0.1 wt% to 10 wt% of the polymer consisting only of carbon and hydrogen;
20% to 70% by weight of the first photocurable monomer;
20% to 75% by weight of the second photocurable monomer;
The composition for encapsulating an organic light emitting device comprising 0.1% to 7% by weight of the initiator.
The composition according to claim 8, wherein the composition comprises 0.1 wt% to 10 wt% of the polymer consisting only of carbon and hydrogen, 85 wt% to 95 wt% of the first photocurable monomer, 0.1 wt% to 7 wt% of the initiator based on solid content A composition for encapsulating an organic light emitting device comprising a.
The composition of claim 1, wherein the composition for encapsulating an organic light emitting device further comprises a third photocurable monomer.
The composition of claim 11, wherein the third photocurable monomer comprises a compound of Formula 5 below:
[Formula 5]

(In Formula 5,
R ₁₅ , R ₁₆ are each independently a single bond, a substituted or unsubstituted C 1-20 alkylene group, a substituted or unsubstituted C 1-30 C 1-30 alkylene ether group, *-N(R')-R "-* (* is a connection site of an element, R' is a substituted or unsubstituted C1-C30 alkyl group, R" is a substituted or unsubstituted C1-C20 alkylene group), substituted or unsubstituted C6 -30 arylene group, substituted or unsubstituted arylalkylene group having 7-30 carbon atoms, or *-OR"-* (where * is a connection site of an element, R" is a substituted or unsubstituted C1-20 arylalkylene group alkylene group),
X ₁ ,X ₂ ,X ₃ ,X ₄ ,X ₅ ,X ₆ are each independently hydrogen, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C1-C30 alkylether group, *-N(R')(R") (wherein * is a connecting site of an element, R' and R" are the same or different, hydrogen or a substituted or unsubstituted C1-C30 alkyl group), substituted or unsubstituted an alkylsulfide group having 1 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted arylalkyl group having 7 to 30 carbon atoms,
One or more of X ₁ , X ₂ , X ₃ , X ₄ , X ₅ , and X ₆ is a substituted or unsubstituted C6-C30 aryl group,
Y ₁ , Y ₂ are each independently represented by Formula 6,
[Formula 6]

(In Formula 6, * is a connection site of an element, and R ₁₇ is hydrogen or a methyl group)
n is an integer from 0 to 30, or the average value of n is 0-30).
The composition for encapsulating an organic light emitting device according to claim 11, wherein the third photocurable monomer is included in an amount of 1% to 30% by weight of the composition for encapsulating an organic light emitting device based on a solid content.
An organic light emitting device display device comprising an organic layer formed of the composition for encapsulating an organic light emitting device according to any one of claims 1 to 13.

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