KR20160150258A - Organic light emmiting diode display apparatus - Google Patents

Organic light emmiting diode display apparatus Download PDF

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KR20160150258A
KR20160150258A KR1020150087822A KR20150087822A KR20160150258A KR 20160150258 A KR20160150258 A KR 20160150258A KR 1020150087822 A KR1020150087822 A KR 1020150087822A KR 20150087822 A KR20150087822 A KR 20150087822A KR 20160150258 A KR20160150258 A KR 20160150258A
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unsubstituted
substituted
meth
acrylate
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KR1020150087822A
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KR101892335B1 (en
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이지연
남성룡
고성민
김미선
김혜진
최미정
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삼성에스디아이 주식회사
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    • H01L27/3274—
    • H01L51/0062—
    • H01L51/5237—
    • H01L2227/32—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06—Polymers
    • H01L2924/0635—Acrylic polymer

Abstract

The present invention provides an organic light emitting diode (OLED) display apparatus including an organic layer with high anti-plasma properties. According to the present invention, the OLED display apparatus comprises: a substrate including a lighting region and a non-lighting region placed in an outer part of the lighting region; one or more OLED devices formed in the lighting region; an encapsulation layer to encapsulate the OLED device; and a dam formed in the non-lighting region. The encapsulation layer includes a structure alternatingly stacking one or more inorganic layers and one or more organic layers. The organic layer is formed by a display encapsulation composition, and the display encapsulation composition comprises: (A) 10 to 70 wt% of non-silicone based di(meth)acrylate; (B) 20 to 70 wt% of silicone based di(meth)acrylate; (C) 5 to 40 wt% of mono(meth)acrylate; and (D) 1 to 10 wt% of initiator. The silicone based di(meth)acrylate (B) is expressed in a chemical formula 1.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an organic light-

The present invention relates to an organic light emitting display.

The organic light emitting element is easily deteriorated or deteriorated by moisture and / or oxygen. In the organic light emitting element, the interface between the metal electric field and the light emitting layer can be peeled off by moisture. Further, the organic light emitting element can be made highly resistant to oxidation of the metal, and the organic matter in the light emitting layer can be changed by moisture and / or oxygen. Further, the outgas generated from the outside or the inside may cause the oxidation of the light emitting layer and the metal electric field, and the emission of the organic light emitting element may be deteriorated. Therefore, the organic light emitting element should be sealed by a composition for a sealing material which protects it from moisture and / or gas.

The organic light emitting device may be encapsulated with a multilayer encapsulating layer in which an inorganic layer and an organic layer are alternately formed. The inorganic layer can be formed by vapor deposition by plasma. However, the organic layer can be etched by plasma. The etching can damage the sealing function of the organic layer and adversely affect the formation of the inorganic layer. The organic layer is formed in contact with the inorganic layer. When the organic layer is etched by the plasma, formation of the inorganic layer may be difficult. As a result, the organic luminescent device may have poor luminescence characteristics and poor reliability.

The organic layer may be formed by a method such as vapor deposition and / or ink jet. However, if the edges of the organic layer are exposed to the edge of the sealing layer without being protected, the sealing property of protecting the organic light emitting element from moisture and / or oxygen may be deteriorated. Further, when forming an organic layer by inkjet, the composition for a sealing material for forming a liquid organic layer may spread outside the light emitting region or the substrate, and the edge portion of the sealing layer may be thickened.

The background art of the present invention is disclosed in Korean Patent Laid-Open Publication No. 2011-0071039.

SUMMARY OF THE INVENTION The present invention provides an organic light emitting display device including an organic layer having high plasma resistance.

Another object of the present invention is to provide an organic light emitting display including an organic layer having a significantly low moisture permeability and oxygen permeability.

Another object of the present invention is to provide an organic light emitting display device including an organic layer having excellent transparency.

Another problem to be solved by the present invention is to provide an organic light emitting display device including an organic layer capable of protecting an organic light emitting element from an environment containing moisture and / or oxygen to provide reliability over time.

Another object of the present invention is to provide an organic light emitting diode display in which the organic layer is suppressed from being formed or exposed outside the light emitting region or the substrate and the edge of the organic layer can be suppressed from being thickened.

The organic light emitting display of the present invention includes a substrate including a light emitting region and a non-emitting region located outside the light emitting region, at least one organic light emitting element formed in the light emitting region, a sealing layer sealing the organic light emitting element, Wherein the sealing layer comprises a structure in which at least one inorganic layer and at least one organic layer are alternately laminated, the organic layer is formed of a composition for a display sealing material, and the composition for a display sealing material comprises (Meth) acrylate, (B) 10 to 70% by weight of silicone-based di (meth) acrylate, (C) 5 to 70% by weight of mono (meth) (D) an initiator, and (B) the silicone-based di (meth) acrylate may be represented by the following formula (1):

≪ Formula 1 >

Figure pat00001

X 1 , X 2 , X 3 , X 4 , X 5 , X 6 , and n are as described in the description of the present invention.) In the formula (1), R 1 , R 2 , R 3 , R 4 , X 1 ,

The present invention provides an organic light emitting display device including an organic layer having high plasma resistance.

The present invention provides an organic light emitting display device including an organic layer having a significantly low moisture permeability and oxygen permeability.

The present invention provides an organic light emitting display device including an organic layer having excellent transparency.

The present invention provides an organic light-emitting display device including an organic layer that can protect the apparatus from the influence of the environment including moisture and gas, and can give reliability to the apparatus with time.

The present invention provides an organic light emitting display in which the organic layer is suppressed from being formed or exposed outside the light emitting region or the substrate and the edge of the organic layer can be suppressed from being thickened.

1 is a schematic plan view of an OLED display according to an embodiment of the present invention.
2 is a partial cross-sectional view of an OLED display according to an embodiment of the present invention.
3 is a partial cross-sectional view of an OLED display according to another embodiment of the present invention.
4 is a partial cross-sectional view of an OLED display according to another embodiment of the present invention.
5 is a partial cross-sectional view of an OLED display according to another embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to embodiments of the present application, examples of which are illustrated in the accompanying drawings. However, the techniques disclosed in this application are not limited to the embodiments described herein but may be embodied in other forms. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the widths and thicknesses of components are slightly enlarged in order to clearly illustrate each component. In addition, although only a part of the components is shown for convenience of explanation, those skilled in the art can easily grasp the rest of the components. It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention.

The terms "upper" and "lower" in this specification are defined with reference to the drawings, wherein "upper" may be changed to "lower", "lower" What is referred to as "on" may include not only superposition, but also intervening other structures in the middle. On the other hand, what is referred to as "directly on" or "directly above"

As used herein, "(meth) acryl" may mean acryl and / or methacryl.

As used herein, "substituted" means that at least one hydrogen atom of the functional group is replaced by a halogen (e.g. F, Cl, Br or I), a hydroxy group, a nitro group, a cyano group, , = NR, R is C1 to C10 alkyl groups), amino groups (-NH 2, -NH (R ' ), -N (R ") (R"'), wherein R ', R ", R"' are each A C1 to C30 alkyl group, a C6 to C30 aryl group, a C3 to C30 cycloalkyl group, a C3 to C30 heteroaryl group, a C3 to C30 heteroaryl group, a C3 to C30 heteroaryl group, Substituted by a C2 to C30 heterocycloalkyl group.

As used herein, the term " aryl group "means a functional group in which all the elements of the substituent which is cyclic are p-orbital, and these p-orbital forms a conjugation. The aryl group includes monocyclic, non-fused polycyclic or fused polycyclic functional groups. In this case, fusion refers to a ring shape in which carbon atoms divide adjacent pairs. The aryl group also includes a biphenyl group, a terphenyl group, or a quarter-phenyl group in which two or more aryl groups are connected through a sigma bond. The aryl group may mean a phenyl group, a naphthyl group, an anthracenyl group, a phenanthrenyl group, a pyrenyl group, a chrysenyl group, or the like.

The term " heteroaryl group "as used herein means a functional group containing 1 to 3 hetero atoms selected from the group consisting of N, O, S, P and Si in the aryl group and the remainder carbon. Heteroaryl groups also include those wherein two or more heteroaryl groups are linked directly via a sigma bond. The heteroaryl group also includes two or more heteroaryl groups fused together. When a heteroaryl group is fused, each ring may contain 1 to 3 of said heteroatoms. The heteroaryl group may be, for example, a pyridinyl group, a pyrimidinyl group, a pyrazinyl group, a pyridazinyl group, a triazinyl group, a quinolinyl group, an isoquinolinyl group or the like.

More specifically, the C6 to C30 aryl group and / or the C3 to C30 heteroaryl group may be substituted or unsubstituted phenyl group, substituted or unsubstituted naphthyl group, substituted or unsubstituted anthracenyl group, substituted or unsubstituted phenanthryl group A substituted or unsubstituted naphthacenyl group, a substituted or unsubstituted pyrenyl group, a substituted or unsubstituted biphenyl group, a substituted or unsubstituted p-terphenyl group, a substituted or unsubstituted m-terphenyl group, a substituted or unsubstituted pyrazinyl group, A substituted or unsubstituted thienyl group, a substituted or unsubstituted thienyl group, a substituted or unsubstituted thienyl group, a substituted or unsubstituted thienyl group, a substituted or unsubstituted thienyl group, a substituted or unsubstituted thienyl group, A substituted or unsubstituted thiazolyl group, a substituted or unsubstituted oxazolyl group, a substituted or unsubstituted pyrazolyl group, a substituted or unsubstituted imidazolyl group, a substituted or unsubstituted thiazolyl group, a substituted or unsubstituted oxazolyl group, A substituted or unsubstituted thiadiazolyl group, a substituted or unsubstituted pyridyl group, a substituted or unsubstituted pyrimidinyl group, a substituted or unsubstituted pyrazinyl group, a substituted or unsubstituted pyrazinyl group, a substituted or unsubstituted pyrazinyl group, a substituted or unsubstituted pyrazinyl group, A substituted or unsubstituted thiazolyl group, a substituted or unsubstituted benzofuranyl group, a substituted or unsubstituted benzothiophenyl group, a substituted or unsubstituted benzimidazolyl group, a substituted or unsubstituted indolyl group, a substituted or unsubstituted quinoline group, Substituted or unsubstituted quinoxalinyl groups, substituted or unsubstituted quinoxalinyl groups, substituted or unsubstituted naphthyridinyl groups, substituted or unsubstituted benzoxazinyl groups, substituted or unsubstituted quinoxalinyl groups, substituted or unsubstituted quinazolinyl groups, substituted or unsubstituted quinazolinyl groups, substituted or unsubstituted naphthyridinyl groups, A substituted or unsubstituted benzothiazyl group, a substituted or unsubstituted acridinyl group, a substituted or unsubstituted phenazinyl group, a substituted or unsubstituted phenothiazine group, a substituted or unsubstituted pyrazine group, A substituted or unsubstituted dibenzofuranyl group, a substituted or unsubstituted dibenzothiophenylene group, or a combination thereof, but is not limited thereto.

In the present specification, the term " etching rate of an organic layer by plasma "or" plasma etching rate "means the measurement of an initial height (T1, unit: 탆) of an organic layer formed by depositing and photocuring a composition for a display sealing material to a predetermined thickness, Plasma was generated by ICP-CVD using an inductively coupled plasma (ICP) power of 2500 W, a RF power of 300 W, a DC bias of 200 V, an Ar flow of 50 sccm, an etching time of 1 min, and a pressure of 10 mTorr. And the height of the organic layer (T2, unit: 占 퐉) after the treatment is measured. At this time, the initial height (T1) of the organic layer may be 1 탆 to 10 탆. The lower the value calculated by the formula (2), the better the plasma resistance of the organic layer.

<Formula 2>

Etching rate (%) of organic layer by plasma = (T1-T2) / T1 x 100

The organic light emitting display of the present invention includes a substrate including a light emitting region and a non-emitting region located outside the light emitting region, at least one organic light emitting element formed in the light emitting region, a sealing layer sealing the organic light emitting element, Emitting layer, wherein the sealing layer includes a structure in which one or more inorganic layers and one or more organic layers are alternately laminated, and the organic layer may be formed of a composition for a display sealing material of the present invention have.

The composition for a display sealing material of the present invention can realize an organic layer having high plasma resistance and excellent flatness even when an inorganic layer is formed. Therefore, the organic light emitting display device of the present invention is formed by contacting the organic layer with the inorganic layer, thereby preventing the planarization effect of the inorganic layer and the defect of the inorganic layer, effectively preventing the penetration of moisture and oxygen from the outside and thinning the sealing layer .

The composition for a display sealing material of the present invention can realize an organic layer having a significantly low moisture permeability and oxygen permeability. Therefore, the organic light emitting diode display of the present invention can further suppress the penetration of moisture and / or oxygen to the organic light emitting device, and can improve the reliability of the organic light emitting device with the lapse of time.

The organic light emitting diode display of the present invention may include a dam. The dam can prevent the edges of the organic layer from being exposed to the outside. Therefore, the organic light emitting diode display of the present invention can further suppress penetration of the organic light emitting element by external moisture and / or oxygen, and can improve the reliability of the organic light emitting element over time.

The organic light emitting diode display of the present invention may include a dam. The dam can prevent the composition for the sealing material forming the organic layer from flowing over the outside of the light emitting region or the substrate when the organic layer is formed, thereby preventing the organic layer from being formed in the light emitting region or the substrate and preventing the edge of the organic layer from being thickened.

For example, in the organic light emitting display of the present invention, the inorganic layer may be further formed on the dam. In one example, the dam and the inorganic layer may be sequentially formed on the substrate. In another example, the inorganic layer includes a first inorganic layer and a second inorganic layer, and the dam, the first inorganic layer, and the second inorganic layer may be sequentially formed on the substrate.

Further, in the organic light emitting diode display of the present invention, the sealing layer may be further formed on the dam. In one example, the dam, the organic layer, and the inorganic layer may be sequentially formed on the substrate. In another example, the inorganic layer includes a first inorganic layer and a second inorganic layer, the organic layer includes a first organic layer, and the dam, the first inorganic layer, the first organic layer, And the second inorganic layer may be sequentially formed.

Further, in the organic light emitting diode display of the present invention, the first organic layer may be formed in a state of being separated from the light emitting region and the non-light emitting region by the dam.

Hereinafter, an OLED display according to an embodiment of the present invention will be described with reference to FIGS. 1 and 2. FIG. 1 is a schematic plan view of an OLED display according to an embodiment of the present invention. 2 is a partial cross-sectional view of an OLED display according to an embodiment of the present invention.

Referring to FIG. 1, the OLED display 100 according to an exemplary embodiment of the present invention may include a substrate 110, a dam 140, and a light emitting region 100a. The substrate 110 may include a light emitting region 110a in which one or more organic light emitting devices are formed and a non-emitting region in which the dam 140 is formed at an outer portion of the light emitting region 110a.

Referring to FIG. 2, the OLED display 100 according to an exemplary embodiment of the present invention may include a substrate 110, an organic light emitting diode 120, an encapsulation layer 130, and a dam 140.

The substrate 110 may be formed under the organic light emitting diode 120, the encapsulation layer 130 and the dam 140 to support the organic light emitting diode 120, the encapsulation layer 130, and the dam 140 . The substrate 110 may include a light emitting region where one or more organic light emitting devices 120 and the sealing layer 130 are formed, and a non-emitting region where the dam 140 is formed.

The substrate 110 may be a glass substrate, a quartz substrate, or a transparent plastic substrate. The transparent plastic substrate can be used for a flexible use by providing the organic light emitting display device with flexibility. The transparent plastic substrate may be formed of at least one of a polyester resin and a sulfonic acid resin including, but not limited to, polyimide resin, acrylic resin, polyacrylate resin, polycarbonate resin, polyether resin, polyethylene terephthalate and the like .

The organic light emitting diode 120 may be formed in the light emitting region of the substrate 110 to drive the OLED display. The organic light emitting device may be a self-emitting device, and may include conventional structures known to those skilled in the art.

Specifically, the organic light emitting device may include a structure in which an anode electrode, a hole transporting region, a light emitting layer, an electron transporting region, and a cathode electrode are sequentially stacked. The hole transporting region may include at least one of a hole injecting layer, a hole transporting layer, and an electron blocking layer. The electron transporting region may include at least one of a hole blocking layer, an electron transporting layer, and an electron injection layer. The holes generated from the anode electrode and the electrons generated from the cathode electrode enter the light emitting layer to emit light. The details of the anode electrode, the hole transporting region, the light emitting layer, the electron transporting region, and the cathode electrode follow the conventional contents known to those skilled in the art.

Specifically, the anode electrode is preferably a material having a large work function to facilitate injection of holes into the light emitting layer. Specific examples of the material for forming the anode electrode include metal oxides such as nickel, platinum, vanadium, chromium, copper, zinc and gold or alloys thereof, zinc oxide, indium oxide, indium tin oxide and indium zinc oxide , A combination of zinc oxide and aluminum or a metal and a metal oxide such as tin oxide and antimony. The cathode electrode is preferably a material having a small work function so as to facilitate injection of electrons into the light emitting layer. Specific examples of the material forming the cathode electrode include metals such as magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, tin, lead, cesium, barium, have.

The light emitting layer may comprise conventional materials known to those skilled in the art. But are not limited to, fluorene derivatives, metal complexes, and the like.

The hole-transporting region may be selected from the group consisting of m-MTDATA, TDATA, 2-TNATA, NPB,? -NPB, TPD, Spiro-TPD, Spiro-NPB,? -NPB, TAPC, HMTPD, PEDOTT / Poly (4-styrenesulfonate)), PANI / PSS (polyaniline / poly (4-styrenesulfonate)), and the like.

Figure pat00002

The hole blocking layer may include, but is not limited to, at least one of the following BCP and Bphen:

Figure pat00003

The electron transporting layer is not the BCP, Bphen, to but can include Alq 3, BAlq, TAZ, NTAZ , ET1, ET2, at least one, limited to:

Figure pat00004

Figure pat00005

The electron injection layer may include at least one of LiF, NaCl, CsF, Li 2 O, and BaO, but is not limited thereto:

The sealing layer 130 is formed directly on the organic light emitting diode 120. The sealing layer 130 may encapsulate the organic light emitting diode 120. Means that no adhesive layer, adhesive layer, and / or air layer is interposed between the sealing layer 130 and the organic light emitting diode 120.

The sealing layer 130 may comprise a multi-layer structure in which one or more inorganic layers and one or more organic layers are alternately laminated. FIG. 2 shows an organic light emitting display device including an encapsulation layer in which an inorganic layer and an organic layer are alternately stacked in three layers in total. That is, FIG. 2 shows an organic light emitting display device including an encapsulation layer 130 in which a first inorganic layer 131, a first organic layer 132, and a second inorganic layer 133 are alternately stacked. However, the sealing layer may be alternately stacked with the inorganic layer and the organic layer in total of 5 to 15 layers, specifically, 5 to 7 layers. For example, when the sealing layer is composed of five layers in total, the sealing layer may be formed by laminating the first inorganic layer, the first organic layer, the second inorganic layer, the second organic layer, and the third inorganic layer in this order. When the sealing layer has seven layers in total, the first inorganic layer, the first organic layer, the second inorganic layer, the second organic layer, the third inorganic layer, the third organic layer and the fourth inorganic layer may be stacked in this order. The inorganic layer or organic layer in the encapsulation layer 130 may be formed directly on the organic light emitting element to encapsulate the organic light emitting element. Of the sealing layer 130, the outermost layer from the organic light emitting element may be an inorganic layer.

Hereinafter, a case where the sealing layer 130 is laminated in this order of the first inorganic layer 131, the first organic layer 132, and the second inorganic layer 133 will be described with reference to FIG.

The first inorganic layer 131 and the second inorganic layer 133 are different in component from the first organic layer 132 and can complement the effect of the first organic layer 131. The first inorganic layer 131 and the second inorganic layer 133 can inhibit penetration of moisture and / or oxygen into the organic light emitting element 130, respectively. The outermost layer of the sealing layer 130 may be an inorganic layer, that is, a second inorganic layer 133.

The first inorganic layer 131 may be formed directly on the organic light emitting diode 120 to seal the organic light emitting diode 120. The first inorganic layer 131 is further formed on the dam 140.

The first inorganic layer 131 is formed in direct contact with the organic light emitting diode 120 and the dam 140. A portion of the first inorganic layer 131 formed directly on the organic light emitting diode 120 and a portion of the first inorganic layer 131 formed directly on the dam 140 are formed integrally with each other. In this specification, "integrally formed" means that the corresponding portions are formed as one without being separated from each other independently. Accordingly, the first inorganic layer 131 can suppress the penetration of moisture and / or oxygen to the organic light emitting diode 120. The above-mentioned "direct contact formation" means that any adhesive layer, adhesive layer and / or air layer between the organic light emitting element 120 and the first inorganic layer 131, between the dam 140 and the first inorganic layer 131, .

The second inorganic layer 133 may be formed on the organic light emitting diode 120 to seal the organic light emitting diode 120. The second inorganic layer 133 may be further formed on the dam 140.

The second inorganic layer 133 is formed directly on the first organic layer 132. The first organic layer 132 is formed of the composition for a display sealing material of the present invention. Therefore, the second inorganic layer 133 has a low surface roughness value, and has a good flatness, so that the sealing layer 130 can be thinned.

The second inorganic layer 133 is formed directly on the first inorganic layer 131 formed on the dam 140. Therefore, the second inorganic layer 133 is integrally formed like the first inorganic layer 131, so that the penetration of moisture and / or oxygen outside the organic light emitting element 120 can be further suppressed, 1 lifting and / or peeling between the first inorganic layer 131 and the second inorganic layer 133 can be prevented. The organic light emitting diode display 100 according to the present embodiment may have a structure in which a dam 140, a first inorganic layer 131, and a second inorganic layer 133 are sequentially formed on a substrate 110 .

4, the first organic layer 132 may be formed directly on the organic light emitting device 120, and the first inorganic layer 131 may be formed on the first organic layer 132 to further reduce the thickness of the sealing layer 130 ".

The first inorganic layer 131 and the second inorganic layer 133 may each be formed of an inorganic material having excellent light transmittance. The first inorganic layer 131 and the second inorganic layer 133 may be formed of the same or different inorganic materials, respectively. Specifically, the inorganic material may be a metal, a nonmetal, an intermetallic compound or alloy, an intermetallic compound or alloy, an oxide of a metal or a nonmetal, a fluoride of a metal or a nonmetal, a nitride of a metal or a nonmetal, a carbide of a metal or a non- Oxygen nitride, a metal or non-metal boride, a metal or non-metal oxygen boride, a metal or non-metal silicide, or a mixture thereof. The metal or base metal may be selected from the group consisting of Si, Al, Selenium, Zn, Sb, In, Ge, Sn, Bi, Metal, lanthanide metal, and the like, but is not limited thereto. Specifically, the first inorganic layer and the second inorganic layer are made of a material selected from the group consisting of silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ), ZnSe, ZnO, Sb 2 O 3 , Al 2 O 3, and so on may be AlO x, In 2 O 3, SnO 2 , including. In the above, x and y are each 1 to 5.

The thicknesses of the first inorganic layer 131 and the second inorganic layer 133 may be the same or different. Specifically, the first inorganic layer 131 and the second inorganic layer 133 may each have a thickness of 40 nm to 1000 nm, specifically 100 nm to 1000 nm. Within this range, it may be effective to prevent penetration of moisture and / or oxygen outside.

The first organic layer 132 is formed on the first inorganic layer 131 directly above the first inorganic layer 131 that encapsulates the organic light emitting diode 120 and between the first inorganic layer 131 and the second inorganic layer 133 As shown in Fig. The first organic layer 132 may seal the organic light emitting diode 120 to prevent moisture and / or oxygen from penetrating into the organic light emitting diode 120. In addition, the first organic layer 132 has a low etch rate with respect to the plasma, so that the thickness of the second inorganic layer 133 can be uniform.

The thickness of the first organic layer 132 may be 0.2 탆 to 15 탆, specifically 1 탆 to 15 탆. In the above range, the effect of leveling the inorganic layer and the defect of the inorganic layer can be prevented to prevent penetration of moisture and oxygen from the outside.

The first organic layer 132 may be formed of a composition for a display sealing material according to embodiments of the present invention.

Hereinafter, a composition for a display sealing material according to embodiments of the present invention will be described.

Hereinafter, a composition for a display sealing material according to an embodiment of the present invention will be described.

(A) 10 to 70% by weight of non-silicon di (meth) acrylate, (B) 20 to 70% by weight of silicone based di (meth) acrylate, (Meth) acrylate, (C) 5 to 40% by weight of mono (meth) acrylate, and (D) 1 to 10% by weight of initiator Can be:

&Lt; Formula 1 >

Figure pat00006

(Wherein R 1 , R 2 , R 3 , R 4 , X 1 , X 2 , X 3 , X 4 , X 5 , X 6 and n are described below)

The composition for a display sealing material of one embodiment of the present invention comprises (A) a non-silicone di (meth) acrylate, (B) silicone di (meth) acrylate, D) initiator. The composition for a display sealing material according to one embodiment of the present invention comprises (A) a non-silicone di (meth) acrylate, (B) silicone di (meth) acrylate, And (D) an initiator in the above specified amounts. Thus, the composition for a display sealing material of one embodiment of the present invention can remarkably improve the photo-curing rate. In addition, the composition for a display sealing material of one embodiment of the present invention can realize an organic layer having excellent light transmittance after curing and remarkably high plasma resistance. Accordingly, the composition for a display sealing material of the embodiment of the present invention can realize an organic layer having a low etching rate by a plasma used for forming an inorganic layer, and as a result, the reliability of the organic light emitting device can be improved.

Specifically, the composition for a display sealing material of one embodiment of the present invention may have a photo-curing rate of 88% or more, for example, 88% to 99%. Further, the composition for a display sealing material of one embodiment of the present invention may have a light transmittance of 93% or more, for example, 93.5% to 100% at a wavelength of 380 nm to 700 nm after curing. In addition, the composition for a display sealing material of one embodiment of the present invention may have an etching rate of the organic layer by the plasma after curing of 20% or less, for example, 17% or less, for example, 0.1% to 20%. The composition for a sealing material of one embodiment of the present invention can remarkably increase the reliability of the organic light emitting device in the range of the light curing rate, the light transmittance and the etching rate of the organic layer by plasma.

In one embodiment, the composition for a display sealant of one embodiment of the present invention comprises (A) a non-silicon based di (meth) acrylate based on the total weight of (A), (B), (C) (Meth) acrylate is contained in an amount of 10 to 50 wt%, (B) 20 to 70 wt% of silicone di (meth) acrylate, (C) 5 to 40 wt% (D) an initiator may be included in an amount of 1 wt% to 10 wt%.

In the present specification, (A) non-silicon based di (meth) acrylate, (B) silicone based di (meth) acrylate, (C) mono (meth) acrylate and (D) initiator are each different compounds.

Hereinafter, (A) non-silicone di (meth) acrylate, (B) silicone di (meth) acrylate, (C) mono (meth) acrylate and (D) initiator will be described in detail.

(A) a non-silicone-based di (meth) acrylate

(A) Non-silicone di (meth) acrylate is a photocurable monomer that does not contain silicon (Si) and has two (meth) acrylate groups. Thus, the composition for a sealant can improve the photo-curability and the light transmittance after curing. In addition, (A) the non-silicone di (meth) acrylate has a low viscosity at 25 ° C, which can lower the viscosity of the composition for a sealant. Accordingly, the composition for a sealing material can easily form an organic layer on an inorganic layer that encapsulates the organic light emitting device or the organic light emitting device by an ink jet method or the like.

(A) Non-silicon based di (meth) acrylates are non-aromatic systems which do not contain aromatic groups and may include non-silicon based di (meth) acrylates containing substituted or unsubstituted long chain alkylene groups . In this case, the composition for the sealing material is easy to form an organic layer on the inorganic layer that encapsulates the organic light emitting element or the organic light emitting element by a method such as vapor deposition.

Specifically, (A) the non-silicone di (meth) acrylate may be a di (meth) acrylate having a substituted or unsubstituted C1 to C20 alkylene group. More specifically, (A) the non-silicone based di (meth) acrylate may include a di (meth) acrylate having an unsubstituted C1 to C15 alkylene group between the (meth) acrylate groups. Here, the number of carbon atoms in the alkylene group means only the number of carbon atoms in the alkylene group itself excluding the carbon in the di (meth) acrylate group.

In one embodiment, (A) the non-silicon based di (meth) acrylate can be represented by the following formula:

(2)

Figure pat00007

(In the formula (2)

R 3 and R 4 are each independently hydrogen or a methyl group,

And R &lt; 5 &gt; is a substituted or unsubstituted C1 to C20 alkylene group.

The composition for a display sealing material of the present invention contains (A) non-silicon di (meth) acrylate represented by the general formula (2) above, which can further increase the photo-curability and lower the viscosity.

For example, in Formula 2, R 5 may be an unsubstituted C 8 to C 12 alkylene group. More specifically, (A) the non-silicone based di (meth) acrylate is selected from the group consisting of octanediol di (meth) acrylate, nonanediol di (meth) acrylate, decanediol di (meth) acrylate, undecanediol Acrylate, and dodecanediol (meth) acrylate.

(A) Non-silicone di (meth) acrylate may be included in the composition for a display sealing material, alone or in combination of two or more.

(A) The non-silicone di (meth) acrylate may be contained in an amount of 10% by weight to 70% by weight based on the total weight of (A), (B), (C) and (D). In one example, (A) the non-silicone di (meth) acrylate is present in an amount of from 10% to 50% by weight or from 35% by weight to 48% by weight, based on the total weight of (A) % &Lt; / RTI &gt; by weight. Within this range, the photo-curability of the composition for a sealant can be improved, and an organic layer having a high light transmittance and a low plasma etching rate can be realized.

(B) a silicone-based di (meth) acrylate

(B) silicone-based di (meth) acrylate includes at least one substituted or unsubstituted C6 to C30 aryl group connected to a silicon atom. As a result, the composition for a display encapsulant can realize an organic layer having a high plasma resistance and a low plasma etching rate.

(B) silicone-based di (meth) acrylate can be represented by the following formula (1).

&Lt; Formula 1 >

Figure pat00008

(In the formula 1,

R 1 and R 2 each independently represent a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C30 alkylene ether group, * -N (R ') - (R " ) - * (* is the connecting site of the element, R 'is hydrogen or a substituted or unsubstituted C1 to C30 alkyl group, R "is a substituted or unsubstituted C1 to C20 alkylene group), a substituted or unsubstituted C6 A substituted or unsubstituted C 7 to C 30 arylalkylene group, or a substituted or unsubstituted C 7 to C 30 arylalkylene group, or * - (R ') - O - ** wherein * And R 'is a substituted or unsubstituted C1 to C30 alkylene group)

X 1 , X 2 , X 3 , X 4 , X 5 and X 6 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 A substituted or unsubstituted C 3 to C 30 cycloalkyl group, a substituted or unsubstituted C 1 to C 30 alkyl ether group, * -N (R ') (R ") (* And R "are each independently hydrogen or a substituted or unsubstituted C1 to C30 alkyl group), a substituted or unsubstituted C1 to C30 alkyl sulfide group, a substituted or unsubstituted C6 to C30 aryl group, a substituted Or an unsubstituted C2 to C30 heteroaryl group or a substituted or unsubstituted C7 to C30 arylalkyl group,

At least one of X 1 , X 2 , X 3 , X 4 , X 5 and X 6 is a substituted or unsubstituted C6 to C30 aryl group or a substituted or unsubstituted C2 to C30 heteroaryl group,

R 3 and R 4 are each independently hydrogen or a methyl group,

n is 0 To Or an average value of n is 0 to 30).

Said "single bond" means that Si and O in formula (1) are directly connected (Si-O).

Specifically, in Formula 1, R 1 and R 2 independently of each other may be a single bond, a substituted or unsubstituted C1 to C20 alkylene group, or a substituted or unsubstituted C1 to C30 alkylene ether group . X 1 , X 2 , X 3 , X 4 , X 5 and X 6 are each independently selected from the group consisting of hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 alkyl group, A substituted or unsubstituted C1 to C30 alkyl ether group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a substituted or unsubstituted C7 And at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 may be a substituted or unsubstituted C6 to C30 aryl group.

More specifically, R 1 and R 2 in formula (1) may each independently be a single bond or a substituted or unsubstituted C1 to C20 alkylene group. In this case, there may be more effects of lowering the plasma etching rate.

More specifically, X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 in Formula (1) are each independently a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C10 And at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 may be a substituted or unsubstituted C6 to C10 aryl group. More specifically, each of X 1 , X 2 , X 3 , X 4 , X 5 and X 6 may independently be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a phenyl group, a biphenyl group, or a naphthyl group And one, two, three or six of X 1 , X 2 , X 3 , X 4 , X 5 and X 6 may be a phenyl group or a naphthyl group. In this case, there may be more effects of lowering the plasma etching rate.

More specifically, n may be an integer of 1 to 5. In this case, there may be more effects of lowering the plasma etching rate.

More specifically, (B) the silicone-based di (meth) acrylate can be represented by any one of the following formulas (3) to (8)

(3)

Figure pat00009

&Lt; Formula 4 >

Figure pat00010

&Lt; Formula 5 >

Figure pat00011

(6)

Figure pat00012

&Lt; Formula 7 >

Figure pat00013

(8)

Figure pat00014

(B) silicone-based di (meth) acrylate may be included in the composition for a display sealing material, alone or in combination of two or more.

(B) silicone di (meth) acrylate may be contained in an amount of 20 to 70% by weight based on the total weight of (A), (B), (C) and (D). For example, the silicone-based di (meth) acrylate (B) may be contained in an amount of 25% by weight to 45% by weight based on the total weight of (A), (B), (C) and (D). The light curing rate of the composition for a sealing material can be increased within the above range. Further, in the above range, the light transmittance of the organic layer can be increased and the plasma etching rate can be lowered.

The total sum of (A) the non-silicone di (meth) acrylate and (B) the silicone di (meth) acrylate of the formula (1) Based on the total weight of the composition, 50 wt% to 90 wt%, specifically 60 wt% to 90 wt%. In the above range, an organic layer having a low plasma etching rate can be realized.

(B) silicone-based di (meth) acrylate can be prepared by a conventional method. For example, (B) a silicone-based di (meth) acrylate is a compound in which a substituted or unsubstituted C6 to C30 aryl group or a substituted or unsubstituted C2 to C30 heteroaryl group is bonded to at least one silicon atom, (Meth) acryloyl chloride by reacting a compound (for example, an allyl alcohol) which reacts with (meth) acryloyl chloride. Or (B) a silicone-based di (meth) acrylate is a siloxane compound in which a substituted or unsubstituted C6 to C30 aryl group or a substituted or unsubstituted C2 to C30 heteroaryl group is bonded to at least one silicon atom and (meth) &Lt; / RTI &gt; but not limited thereto.

(C) mono (meth) acrylate

(C) Mono (meth) acrylate is contained in the composition for a display sealing material, and the light curing rate of the composition for a sealing material can be increased. Further, the mono (meth) acrylate (C) can increase the light transmittance of the organic layer and lower the plasma etching rate.

(C) Mono (meth) acrylate may include non-silicone mono (meth) acrylate that does not include silicon. Specifically, (C) the mono (meth) acrylate may include at least one of an aromatic mono (meth) acrylate having an aromatic group and a non-aromatic mono (meth) acrylate having no aromatic group.

(C) mono (meth) acrylate may be included singly or in combination of two or more. (C) mono (meth) acrylate, aromatic mono (meth) acrylate may be contained in a mixture of two or more. The non-aromatic mono (meth) acrylate in the (C) mono (meth) acrylate may be contained in a mixture of two or more kinds.

 In one embodiment, (C) mono (meth) acrylate may comprise a mono (meth) acrylate having an aromatic group. The mono (meth) acrylate having an aromatic group and the above-mentioned (B) silicone-based di (meth) acrylate have an aromatic group and are particularly excellent in compatibility in a composition for a display sealing material when used together. Accordingly, (C) the mono (meth) acrylate can further improve the miscibility with the (B) silicone-based di (meth) acrylate. In such a case, the composition for a sealant may have an effect of remarkably lowering the plasma etching rate of the organic layer.

The aromatic mono (meth) acrylate may include a mono (meth) acrylate having a substituted or unsubstituted aromatic group. The 'aromatic group' may include monocyclic or fused forms, and the like. Means a polycyclic aromatic group, or a form in which a single ring is connected by a sigma bond. For example, the aromatic group may be a substituted or unsubstituted C6 to C50 aryl group, a substituted or unsubstituted C7 to C50 arylalkyl group, a substituted or unsubstituted C3 to C50 heteroaryl group, a substituted or unsubstituted C3 to C50 heteroaryl group, C50 &lt; / RTI &gt; heteroaryl &lt; RTI ID = 0.0 &gt; alkyl &lt; / RTI &gt; More specifically, the aromatic group is selected from the group consisting of phenyl, biphenyl, terphenyl, quaterphenyl, naphthyl, anthracenyl, phenanthrenyl, chrysenyl, triphenylenyl, tetracenyl, pyrenyl, benzopyranyl, pentacenyl, , Ovalenyl, coranprenyl, benzyl, pyridinyl, pyrazinyl, pyrimidinyl, pyridazinyl, triazinyl, quinolinyl, isoquinolinyl, quinoxalinyl, acridinyl, quinazolinyl, Thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, pyrazolyl, indazolyl, imidazolyl, benzimidazolyl, furidinyl, thiophenyl, Benzothiophenyl, furanyl, benzofuranyl, isobenzofuranyl. &Lt; / RTI &gt;

For example, the aromatic mono (meth) acrylate may be represented by the following formula (9): &lt; EMI ID =

&Lt; Formula 9 >

Figure pat00015

(In the above formula (9)

R 3 is hydrogen or a methyl group,

s is an integer from 0 to 10,

R 6 is a substituted or unsubstituted C6 to C50 aryl group or a substituted or unsubstituted C6 to C50 aryloxy group.

For example, R 6 may be a phenylphenoxy group, a phenoxyethyl group, a benzyl group, a phenyl group, a phenylphenoxy group, a phenoxy group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a methylphenylethyl group, a propylphenylethyl group, , A cyclohexylphenylethyl group, a chlorophenylethyl group, a bromophenylethyl group, a methylphenyl group, a methylethylphenyl group, a methoxyphenyl group, a propylphenyl group, a cyclohexylphenyl group, a chlorophenyl group, a bromophenyl group, a phenylphenyl group, a biphenyl group, a terphenyl ), A quaterphenyl group, an anthracenyl group, a naphthalene group, a triphenylenyl group, a methylphenoxy group, an ethylphenoxy group, a methylethylphenoxy group, a methoxyphenyloxy group, a propylphenoxy group, a cyclohexyl A phenoxy group, a chlorophenoxy group, a bromophenoxy group, a biphenyloxy group, a terphenyloxy group, a quaterphenyloxy group, an anthracenyloxy group, a naphthalenyloxy group (na phthalenyloxy group, and triphenylenyloxy group.

Specific examples of the aromatic mono (meth) acrylate include 2-phenylphenoxyethyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenyl (meth) acrylate, phenoxy (meth) (Meth) acrylate, benzyl (meth) acrylate, 2-phenylethyl (meth) acrylate, 3-phenylpropyl (meth) (Meth) acrylate, 2- (4-methylphenyl) ethyl (meth) acrylate, 2- (Meth) acrylate, 2- (4-cyclohexylphenyl) ethyl (meth) acrylate, 2- (Meth) acrylate, 2- (4-chlorophenyl) ethyl (meth) acrylate, 2- Acrylate, 2- (3-phenylphenyl) ethyl (meth) acrylate, 4- (biphenyl-2- yloxy) butyl (meth) (Meth) acrylate, 1- (biphenyl-2-yloxy) butyl (meth) acrylate, 2- (Meth) acrylate, 2- (biphenyl-2-yloxy) propyl (meth) acrylate, 3- (Meth) acrylate, 3- (biphenyl-2-yloxy) ethyl (meth) acrylate, (Meth) acrylate, 2- (biphenyl-2-yloxy) ethyl (meth) acrylate, 1- (Meth) acrylate, 1- (4-benzylphenyl) ethyl (meth) acrylate, or a structural isomer thereof But is not limited thereto. In other words, the (meth) acrylate mentioned in the present invention is not limited to only one example, and the present invention includes all the acrylates having the structural isomerism. For example, although only 2-phenylethyl (meth) acrylate is mentioned as an example of the present invention, the present invention includes all of 3-phenylethyl (meth) acrylate and 4-phenyl (meth) acrylate.

The non-aromatic mono (meth) acrylate may be a mono (meth) acrylate having a substituted or unsubstituted C1 to C20 alkyl group. Specifically, the non-aromatic mono (meth) acrylate is a mono (meth) acrylate having an unsubstituted straight-chain C1 to C20 alkyl group, more specifically an unsubstituted straight-chain C10 to C20 alkyl group (Meth) acrylate. For example, the non-aromatic mono (meth) acrylate is selected from the group consisting of decyl (meth) acrylate, undecyl (meth) acrylate, lauryl (meth) acrylate, tridecyl (meth) acrylate, (Meth) acrylate, nonadecyl (meth) acrylate, heptadecyl (meth) acrylate, octadecyl (meth) acrylate, Rate, but is not limited thereto.

(C) The mono (meth) acrylate may be contained in an amount of 5 to 40% by weight based on the total weight of (A), (B), (C) and (D). For example, the (C) mono (meth) acrylate may be included in an amount of 5 to 30% by weight based on the total weight of (A), (B), (C) and (D). The light curing rate of the composition for a sealing material can be increased within the above range. Further, the light transmittance of the organic layer can be increased, and the plasma etching rate can be further reduced.

(D) initiator

(D) an initiator is used to form an organic layer by curing (A) non-silicon di (meth) acrylate, (B) silicone di (meth) acrylate, and (C) mono Of a photopolymerization initiator.

(D) The initiator may include, but is not limited to, one or more of a triazine-based initiator, an acetophenone-based initiator, a benzophenone-based initiator, a thioxanone-based initiator, a benzoin-based initiator, a phosphorus-based initiator, and a oxime-based initiator. Examples of the phosphorus initiator include diphenyl (2,4,6-trimethylbenzoyl) phosphine oxide, benzyl (diphenyl) phosphine oxide, bis (2,6-dimethoxybenzoyl) 4-trimethylpentyl) phosphine oxide or mixtures thereof. For example, when using a phosphorus initiator, the composition of the present invention may exhibit better initiation performance at long wavelength UVs.

The initiator (D) may be incorporated in the composition for a sealing material for an organic light emitting device, either singly or in combination.

(D) The initiator may be included in an amount of 1 wt% to 10 wt% based on the total weight of (A), (B), (C), and (D). In the above range, the composition for a sealing material can sufficiently perform photopolymerization upon exposure. In addition, the unreacted initiator remaining after the photopolymerization can be reduced, and the light transmittance of the organic layer can be further improved. Specifically, the initiator (D) may be contained in an amount of 2 to 5 wt% based on the total weight of (A), (B), (C), and (D).

The composition for a display sealant can be formed by mixing (A) non-silicone di (meth) acrylate, (B) silicone di (meth) acrylate, (C) mono (meth) acrylate and . For example, the composition for a display sealing material can be formed into a solventless type that does not contain a solvent. For example, when the organic light emitting diode is a non-solvent type, the weight percentage may be selected from the group consisting of (A) non-silicon di (meth) acrylate, (B) silicone di (meth) acrylate, , And (D) the initiator.

The composition for the display sealant may include silicon (Si) in an amount of 10 wt% to 50 wt% of the composition for the entire display sealing material. Within this range, the composition for the encapsulant may further have the effect of lowering the plasma etching rate of the organic layer.

The composition for the display sealant may have a viscosity of 0 cps to 200 cps, specifically 100 cps or less, more specifically 5 cps to 50 cps, 5 cps to 40 cps or 5 cps to 30 cps at 25 占 폚 (23 占 폚 to 27 占 폚). In this range, the composition for a display sealing material can facilitate formation of an organic layer. In addition, within the above range, it may be advantageous to carry out a method such as vapor deposition, ink-jetting or the like in forming the organic layer.

The composition for the display encapsulant can be cured by irradiation for 1 to 100 seconds at 10 mW / cm 2 to 500 mW / cm 2 at the UV wavelength, but is not limited thereto.

The composition for the display sealant may further comprise a heat stabilizer.

Hereinafter, a composition for a display sealing material according to another embodiment of the present invention will be described.

The composition for a display sealing material of another embodiment of the present invention comprises (A) a non-silicone di (meth) acrylate, (B) a silicone di (meth) acrylate, (C) a mono (meth) acrylate, Based on the total weight of (A), (B), (C) and (D), the silicone-based di (meth) (A) a non-silicon based di (meth) acrylate is contained in an amount of 10 to 70% by weight, (B) (Meth) acrylate is contained in an amount of 5 wt% to 40 wt%, and (D) the initiator is included in an amount of 1 wt% to 10 wt%.

As a result, the composition for a display sealing material of another embodiment of the present invention can suppress the change in viscosity at room temperature of the composition for a sealing material. The composition for a display sealing material of another embodiment of the present invention can further increase the light transmittance and the photo-curability and further lower the plasma etching rate compared to the composition for a sealing material containing no heat stabilizer. Is the same as the composition for a display sealing material of one embodiment of the present invention except that it further contains a heat stabilizer. Hereinafter, only the heat stabilizer will be described.

(E) The heat stabilizer is included in the composition for the sealant to suppress the viscosity change at room temperature of the composition for the sealant. The heat stabilizer (E) is sterically hindered, Phenolic thermal stabilizers can be used.

Specifically, the heat stabilizer (E) is pentaerythritol tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], stearyl- 1,3,5-tris (2,6-dimethyl-3-hydroxy-4-t-butylbenzyl) isocyanurate, 1,3,5- Tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, 1,3,5-tris (2-hydroxyethyl) isocyanurate, pentaerythritol tetrakis [ (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) isocyanurate. But is not limited thereto.

(E) The heat stabilizer may be contained in an amount of not more than 2000 ppm, specifically 0.01 ppm to 2000 ppm, more specifically 100 ppm to 800 ppm, based on the total weight of (A), (B), (C) and (D). In the above range, the heat stabilizer can improve the storage stability and fairness of the liquid state of the composition for a sealant.

In one embodiment, in the composition for a sealant, the (A) non-silicon based di (meth) acrylate includes di (meth) acrylate having a C1 to C20 alkylene group, and the (B) Acrylate is represented by any one of the above formulas (3) to (8), (C) the mono (meth) acrylate is represented by the above formula (9) Heat stabilizers.

The dam 140 may be formed on the non-emission region of the substrate 110 to distinguish the emission region from the non-emission region. The dam 120 is thicker than the organic light emitting diode 120. Accordingly, the dam 140 can protect the organic light emitting diode 120 from external moisture and / or oxygen, can provide side sealing performance to the organic light emitting display, and can prevent the organic layer from being exposed to the outside have. Also, the dam 140 can prevent the composition for the display sealing material from spreading out of the light emitting region or the substrate and the edge of the sealing layer becoming thick when the organic layer is formed.

The dam 140 may be formed of an optically transparent material capable of blocking external moisture and / or oxygen. Specifically, the dam may be formed of at least one of the hole transporting region, the electron transporting region, and the material forming the light emitting layer, but is not limited thereto. The dam 140 may be formed of one layer of the material, but may be formed of a plurality of layers.

Although not shown in FIGS. 1 and 2, the organic light emitting diode display 100 may include a driving circuit for driving the organic light emitting diode 120. Although not shown in FIGS. 1 and 2, a thin film transistor (TFT) layer and a buffer layer may be further formed between the substrate 110 and the organic light emitting diode 120 in the OLED display 100. The TFT layer drives the organic light emitting element and may include a gate line, a data line, a driving power supply line, a reference power supply line, and a capacitor. Although not shown in FIGS. 1 and 2, the organic light emitting diode display may further include an adhesive layer covering the sealing layer and the dam, and a substrate adhered to the adhesive layer to seal the organic light emitting diode. The adhesive layer may be a transparent adhesive film. The adhesive layer and the material forming the substrate may comprise conventional materials known to those skilled in the art.

Hereinafter, an OLED display according to another embodiment of the present invention will be described with reference to FIG.

Referring to FIG. 3, the OLED display 200 may include a substrate 110, an organic light emitting diode 120, a sealing layer 130 ', and a dam 140. Except that the sealing layer 130 'is formed instead of the sealing layer 130. The organic light emitting display according to an embodiment of the present invention is similar to the organic light emitting display according to the embodiment of the present invention. Hereinafter, only the sealing layer 130 'will be described.

The sealing layer 130 'may include a first inorganic layer 131, a first organic layer 132, and a second inorganic layer 133. The sealing layer 130 'may seal the organic light emitting element 120. The sealing layer 130 'is further formed on the dam 140. The organic light emitting diode display 200 according to the present embodiment includes the dam 140, the first inorganic layer 131, the first organic layer 132, and the second inorganic layer 133 on the substrate 110 sequentially As shown in FIG. Therefore, the organic light emitting display device may have an effect of suppressing moisture and / or oxygen penetration from the outside.

The first organic layer 132 is not formed continuously but is spaced apart from the light emitting region and the non-light emitting region by the dam 140. Therefore, if the organic layer is weaker than the inorganic layer, there may be an effect of more effectively blocking external moisture and oxygen that can permeate through the organic layer that may occur.

Hereinafter, an OLED display according to another embodiment of the present invention will be described with reference to FIG. 4 is a partial cross-sectional view of an OLED display according to another embodiment of the present invention.

4, an OLED display 300 according to an exemplary embodiment of the present invention may include a substrate 110, an organic light emitting diode 120, an encapsulation layer 130 ", and a dam 140. [ Except that an encapsulation layer 130 " is formed instead of the encapsulation layer 130 in the organic light emitting display according to an embodiment of the present invention. Hereinafter, only the sealing layer 130 "will be described.

The sealing layer 130 "includes a first inorganic layer 131 and a first organic layer 132.

The first organic layer 132 is formed directly on the organic light emitting diode 120.

The first inorganic layer 131 is formed just above the first organic layer 132 and directly above the dam 140. Accordingly, the OLED display according to the present embodiment may have a structure in which the dam 140 and the first inorganic layer 131 are sequentially formed on the substrate 110.

A part of the first inorganic layer 131 formed immediately on the first organic layer 132 and a part of the first inorganic layer 131 formed directly on the dam 140 are formed integrally with each other. Therefore, there may be an effect of suppressing moisture and / or oxygen penetration from the outside.

Hereinafter, an OLED display according to another embodiment of the present invention will be described with reference to FIG. 5 is a partial cross-sectional view of an OLED display according to another embodiment of the present invention.

5, the organic light emitting diode display 400 according to the present exemplary embodiment may include a substrate 110, an organic light emitting diode 120, a sealing layer 130 '', and a dam 140. [ Is substantially the same as the organic light emitting display according to an embodiment of the present invention, except that a sealing layer 130 "'is formed instead of the layer 130. Hereinafter, only the sealing layer 130 "'will be described.

The encapsulation layer 130 '' 'includes a first inorganic layer 131 and a first organic layer 132. The encapsulation layer 130' 'is formed directly above the organic light emitting diode 120, As shown in FIG.

The first organic layer 132 is formed directly above the organic light emitting diode 120 and directly above the dam 140. The first organic layer 132 is not formed continuously but is spaced apart from the light emitting region and the non-light emitting region by the dam 140.

The first inorganic layer 131 is formed directly on the first organic layer 132. A part of the first inorganic layer 131 formed immediately on the first organic layer 132 and a part of the first inorganic layer 131 formed directly on the dam 140 are formed integrally with each other. Accordingly, the OLED display 400 according to the present embodiment may have a structure in which a dam 140, a first organic layer 132, and a first inorganic layer 131 are sequentially formed on a substrate 110. Therefore, there may be an effect of suppressing moisture and / or oxygen penetration from the outside.

Hereinafter, a method of manufacturing an organic light emitting display according to embodiments of the present invention will be described.

The organic light emitting display according to the present invention includes a step of forming an organic light emitting device and a dam on a substrate and forming an encapsulation layer in which an inorganic layer and an organic layer are alternately formed on the organic light emitting device, May be formed of a composition for a display sealing material according to embodiments of the present invention.

Thereby forming an organic light emitting element and a dam on the substrate. First, an anode is formed on a substrate, and a light-emitting layer is formed by a dry film formation method such as vacuum deposition, sputtering, plasma plating and ion plating or a wet film formation method such as spin coating, dipping or flow coating, Thereby forming an organic light emitting element on the substrate. The dam may be formed by laminating the predetermined material described above in an area surrounding the organic light emitting element.

The inorganic layer is formed by a suitable method and can be formed by a conventional vacuum process including sputtering, evaporation, sublimation, CVD, PECVD, electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) It is not limited. The organic layer may include, but is not limited to, deposition, spin coating, printing, inkjet printing and / or spraying. A mask may be used for forming the inorganic layer and the organic layer.

Hereinafter, the configuration and operation of the present invention will be described in more detail with reference to preferred embodiments of the present invention. It is to be understood, however, that the same is by way of illustration and example only and is not to be construed in a limiting sense.

Production Example 1

To a 1000 ml flask equipped with a cooling tube and a stirrer was added 300 ml of ethyl acetate and 25 g of 3-phenyl-1,1,3,5,5-pentamethyltrisiloxane (Gelest) and 43 g of allyl alcohol Gold) was purged with nitrogen for 30 minutes. Thereafter, 72 ppm of Pt on carbon black powder (Aldrich) was added to the mixture, the temperature in the flask was raised to 80 캜, and the mixture was stirred for 4 hours. The residual solvent was removed by distillation to obtain the compound. 71.5 g of the obtained compound was placed in 300 ml of dichloromethane, 39 g of triethylamine was added, and 34.3 g of acryloyl chloride was added slowly while stirring at 0 占 폚. The residual solvent was removed by distillation to obtain a monomer having the following formula (molecular weight: 522.85 g / mol) in an HPLC purity of 97%. (1H NMR:? 7.61, m, 3H;? 7.12, m, 2H; M, 4H;? 1.54, m, 4H;? 0.58, d, 2H;? 6.02, dd, 2H; m, 4H;? 0.02, m, 15H).

(3)

Figure pat00016

Production Example 2

In Production Example 1, 21 g of 3,3-diphenyl-1,1,5,5-tetramethyltrisiloxane was used instead of 25 g of 3-phenyl-1,1,3,5,5-pentamethyltrisiloxane , And a monomer (molecular weight: 584.92 g / mol) of the following formula (4) was obtained in an amount of 96% in the same manner, except that 30.2 g of methacryloyl chloride was used instead of 34.3 g of acryloyl chloride. D, 2H,? 5.82, t, 1H;? 5.59, d, 2H, 2H,? 3.86, m, 4H;? 1.52, m, 4H;? 0.58, m, 4H;? 0.04, m, 12H).

&Lt; Formula 4 >

Figure pat00017

Production Example 3

Except that 21 g of 3,3-diphenyl-1,1,5,5-tetramethyltrisiloxane was used instead of 25 g of 3-phenyl-1,1,3,5,5-pentamethyltrisiloxane in Production Example 1 (1 H NMR:? 7.61, m, 6H;? 7.12, m, 4H;? 6.25, m, 4H) in the same manner as in Example 1 was obtained in the same manner as the monomer (molecular weight: 646.99 g / mol) m, 4H;? 0.58, m, 4H;? 0.02, m, 4H;? 1.54, 12H).

&Lt; Formula 5 >

Figure pat00018

Specific specifications of the components used in Examples and Comparative Examples are as follows.

(A1) 1,12-dodecanediol dimethacrylate (Sartomer), (A2) 1,10-decanediol dimethacrylate (Shinnakamura Co.)

(B1) the monomer of Production Example 1, (B2) the monomer of Production Example 2, (B3) the monomer of Production Example 3 (B)

(C) mono (meth) acrylate: (C1) HRI-07 (Daelim Chemical), (C2) benzylmethacrylate (TCI), (C3) lauryl acrylate

(D) Initiator: Darocur TPO (BASF)

(E) Heat stabilizer: IRGANOX 1010 (BASF)

(F) A monomer (molecular weight: 460.78 g / mol, X-22-164, Shin-Yatsu Co., Ltd.)

&Lt; Formula 10 >

Figure pat00019

Example 1

47.8 parts by weight of (A1), 28.7 parts by weight of (B1), 19.2 parts by weight of (C1) and 4.3 parts by weight of (D) were placed in a 125 mL brown polypropylene bottle and mixed at room temperature for 3 hours using a shaker, And a viscosity of 21 cps at 25 캜).

Examples 2 to 13 and Comparative Examples 1 to 4

Except that the kind and / or the content of (A), (B), (C), (D) and (E) in Example 1 were changed to the following Table 1 To prepare a sealing composition.

Comparative Example 5

A sealing composition was prepared in the same manner as in Example 1, except that 28.7 parts by weight of (F) monomer was used instead of 28.7 parts by weight of the monomer (B1) of Production Example 1 in Example 1.

The sealing compositions prepared in Examples and Comparative Examples were measured for the physical properties shown in Table 1 below, and the results are shown in Table 1 and Table 2.

Example One 2 3 4 5 6 7 8 9 10 11 12 13 A A1 47.8 47.8 38.8 38.8 47.8 48.5 38.25 38.8 - - - 47.8 47.8 A2 - - - - - - - - 38.3 38.3 38.3 - - B B1 28.7 28.7 38.8 29.1 - - - - 28.7 - - - - B2 - - - - 28.7 29.1 38.25 29.1 - 28.7 - 28.7 - B3 - - - - - - - - - - 28.7 - 40.2 C C1 19.2 19.2 19.5 29.1 19.2 19.5 19.2 29.1 28.7 28.7 28.7 - - C2 - - - - - - - - - - - - - C3 - - - - - - - - - - - 19.2 7.7 D 4.3 4.3 2.9 3.0 4.3 2.9 4.3 3.0 4.3 4.3 4.3 4.3 4.3 E (ppm) - 750 750 750 750 750 750 750 750 750 750 750 750 F - - - - - - - - - - - - - Light curing rate
(%) 94.7 95.7 95.9 94.2 95.4 95.4 96.2 95.2 96.4 95.2 94.7 95.3 96.6 Light transmittance
(%) 93.5 93.7 93.8 94.6 94.2 94.2 94.6 94.4 95.2 96.1 95.8 94.8 95.2 Plasma etching rate
(%) 11.5 11.5 11.1 10.9 7.5 7.6 7.3 7.2 9.8 6.5 6.8 15.8 14.2

Comparative Example One 2 3 4 5 A A1 76.7 67.0 67.0 67.0 47.8 A2 - - - - - B B1 16 28.7 - - - B2 - - - - - B3 - - - - - C C1 3 - - - 19.2 C2 - - 28.7 - - C3 - - - 28.7 - D 4.3 4.3 4.3 4.3 4.3 E (ppm) - 750 750 750 - F - - - - 28.7 Light curing rate (%) 92.5 94.2 93.5 92.4 89.5 Light transmittance (%) 91.5 90.4 87.5 86.5 91.8 Plasma etching rate (%) 23.5 22.1 32.5 38.7 25.5

As shown in Table 1, the composition for encapsulating an organic light emitting diode of the present invention can realize an organic barrier layer having a high photo-curability and a high light transmittance and a low etching rate against plasma.

On the other hand, as shown in Table 2, Comparative Example 1 in which the contents of (A), (B), and (C) were out of the composition for encapsulating an organic light emitting diode of the present invention had a problem of high plasma etching rate. In addition, Comparative Examples 2 to 4, which did not include any one of (B) and (C), also had a problem that the plasma etching rate was high. In addition, Comparative Example 5 including silicon-based di (meth) acrylate and silicon-containing di (meth) acrylate having no aryl group also had a problem of high plasma etching rate.

&Lt; Property evaluation method &

(1) photo-ratio: the intensity of the absorption peak in the FT-IR (NICOLET 4700, Thermo Co.) to the vicinity of 1635cm -1 (C = C), 1720cm -1 vicinity (C = O) with respect to the composition for sealing . The composition for sealing is applied on a glass substrate by spraying and irradiated for 10 seconds at 100 mW / cm 2 to be UV-cured to obtain a specimen of 20 cm x 20 cm x 3 m (width x length x thickness). Obtain a cured film and, FT-IR (NICOLET 4700, Thermo Co.) is used in the vicinity of 1635cm -1 (C = C), 1720cm -1 measured intensity of the absorption peak in the vicinity of the (C = O) a. The photo-curing rate is calculated according to the following formula (1).

<Formula 1>

Photocuring rate (%) = | 1- (A / B) | x 100

(Where A is the ratio of the intensity of the absorption peak at around 1635 cm -1 to the intensity of the absorption peak at around 1720 cm -1 for the cured film,

B is the ratio of the intensity of the absorption peak near 1635 cm -1 to the intensity of the absorption peak near 1720 cm -1 for the sealing composition).

(2) Light transmittance: A film having a thickness of 10 탆 was prepared by UV-curing the composition for encapsulation under N 2 condition, and the light transmittance of the film was measured with a Lambda 950 (Perkin Elmer) at a wavelength of 550 nm in a visible light region.

(3) Plasma etching rate: The deposition height of the organic sealing layer (T1, 1 탆 to 10 탆) was measured by evaporating and photocuring the sealing composition to a predetermined thickness. (T2, unit: μm) after plasma treatment of the organic barrier layer at an ICP power of 2500 W, RF power of 300 W, DC bias of 200 V, Ar flow of 50 sccm, ethching time of 1 min, Were measured. The etch rate of the organic barrier layer by plasma was calculated by Equation (2).

<Formula 2>

Etching rate (%) of organic barrier layer by plasma = (T1-T2) / T1 x 100

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (16)

Emitting region and a non-emission region located outside the emission region, at least one organic light-emitting device formed in the emission region, a sealing layer sealing the organic light-emitting device, and a dam formed in the non- Including,
Wherein the sealing layer comprises a structure in which one or more inorganic layers and one or more organic layers are alternately laminated,
The organic layer is formed of a composition for a display sealing material,
Wherein the composition for the display sealant comprises (A) 10 to 70% by weight of non-silicon di (meth) acrylate, (B) 20 to 70% by weight of silicone di (meth) acrylate, ) Acrylate, and (D) 1% to 10% by weight of initiator,
Wherein the (B) silicone-based di (meth) acrylate is represented by the following general formula (1)
Organic light emitting display:
&Lt; Formula 1 >
Figure pat00020

(In the formula 1,
R 1 and R 2 each independently represent a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C30 alkylene ether group, * -N (R ') - (R " ) - * (* is the connecting site of the element, R 'is hydrogen or a substituted or unsubstituted C1 to C30 alkyl group, R "is a substituted or unsubstituted C1 to C20 alkylene group), a substituted or unsubstituted C6 A substituted or unsubstituted C7 to C30 arylalkylene group, or a substituted or unsubstituted C7 to C30 arylalkylene group, or * - (R ') - O- ** wherein * is a linking site for O in Formula And R 'is a substituted or unsubstituted C1 to C30 alkylene group)
X 1 , X 2 , X 3 , X 4 , X 5 and X 6 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 A substituted or unsubstituted C 3 to C 30 cycloalkyl group, a substituted or unsubstituted C 1 to C 30 alkyl ether group, * -N (R ') (R ") (* And R "are each independently hydrogen or a substituted or unsubstituted C1 to C30 alkyl group), a substituted or unsubstituted C1 to C30 alkyl sulfide group, a substituted or unsubstituted C6 to C30 aryl group, a substituted Or an unsubstituted C2 to C30 heteroaryl group or a substituted or unsubstituted C7 to C30 arylalkyl group,
At least one of X 1 , X 2 , X 3 , X 4 , X 5 and X 6 is a substituted or unsubstituted C6 to C30 aryl group or a substituted or unsubstituted C2 to C30 heteroaryl group,
R 3 and R 4 are each independently hydrogen or a methyl group,
n is 0 To Or an average value of n is 0 to 30). The organic light emitting display according to claim 1, wherein the thickness of one of the organic layers is 0.2 탆 to 15 탆. According to claim 1, wherein in that the inorganic layer is silicon oxide, silicon nitride, silicon oxygen nitride, ZnSe, ZnO, Sb 2 O 3, Al 2 O 3, In 2 O 3, SnO formed by one or more of the 2, Organic light emitting display. The OLED display according to claim 1, wherein the inorganic layer is further formed on the dam. 5. The method of claim 4, wherein the inorganic layer comprises a first inorganic layer and a second inorganic layer,
Wherein the organic light emitting display device has a structure in which the dam, the first inorganic layer, and the second inorganic layer are sequentially formed on the substrate. 5. The method of claim 4, wherein the inorganic layer comprises a first inorganic layer,
Wherein the organic light emitting display device has a structure in which the dam and the first inorganic layer are sequentially formed on the substrate. The OLED display according to claim 1, wherein the sealing layer is further formed on the dam. 8. The organic electroluminescent device according to claim 7, wherein the inorganic layer comprises a first inorganic layer and a second inorganic layer, the organic layer comprises a first organic layer,
Wherein the organic light emitting display device has a structure in which the dam, the first inorganic layer, the first organic layer, and the second inorganic layer are sequentially formed on the substrate. 8. The organic electroluminescent device according to claim 7, wherein the inorganic layer comprises a first inorganic layer, the organic layer comprises a first organic layer,
Wherein the organic light emitting diode display has a structure in which the dam, the first organic layer, and the first inorganic layer are sequentially formed on the substrate. 10. The organic light emitting diode display according to claim 8 or 9, wherein the first organic layer is formed by the dam so as to be spaced apart from the light emitting region and the non-light emitting region. The compound according to claim 1, wherein in formula (1)
R 1 and R 2 are, independently of each other, a single bond, a substituted or unsubstituted C1 to C20 alkylene group, or a substituted or unsubstituted C1 to C30 alkylene ether group,
X 1 , X 2 , X 3 , X 4 , X 5 and X 6 each independently represent hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, an unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted A substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a substituted or unsubstituted C7 to C30 arylalkyl group,
And at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 is a substituted or unsubstituted C6 to C30 aryl group. The OLED display according to claim 1, wherein the (B) silicon-based di (meth) acrylate is represented by any of the following formulas (3) to (8)
(3)
Figure pat00021

&Lt; Formula 4 >
Figure pat00022

&Lt; Formula 5 >
Figure pat00023

(6)
Figure pat00024

&Lt; Formula 7 >
Figure pat00025

(8)
Figure pat00026
. The OLED display according to claim 1, wherein the (A) non-silicon based di (meth) acrylate is represented by the following formula (2):
(2)
Figure pat00027

(In the formula (2)
R 3 and R 4 are each independently hydrogen or a methyl group,
And R < 5 > is a substituted or unsubstituted C1 to C20 alkylene group. The OLED display of claim 1, wherein the (C) mono (meth) acrylate comprises at least one of an aromatic mono (meth) acrylate and a non-aromatic mono (meth) acrylate. The OLED display according to claim 1, wherein the composition for a display sealing material further comprises a heat stabilizer. 16. The method of claim 15,
The (A) non-silicone di (meth) acrylate includes a di (meth) acrylate having a C1 to C20 alkylene group,
The (B) silicone-based di (meth) acrylate is represented by any one of the following formulas (3) to (8)
(3)
Figure pat00028

&Lt; Formula 4 >
Figure pat00029

&Lt; Formula 5 >
Figure pat00030

(6)
Figure pat00031

&Lt; Formula 7 >
Figure pat00032

(8)
Figure pat00033

The (C) mono (meth) acrylate is represented by the following general formula (9)
&Lt; Formula 9 >
Figure pat00034

(In the above formula (9)
R 3 is hydrogen or a methyl group,
s is an integer from 0 to 10,
R 6 is a substituted or unsubstituted C6 to C50 aryl group or a substituted or unsubstituted C6 to C50 aryloxy group.
Wherein the initiator (D) comprises a phosphorus-based initiator.
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