KR20210092789A - 적층체, 조성물, 및 적층체 형성용 키트 - Google Patents

적층체, 조성물, 및 적층체 형성용 키트 Download PDF

Info

Publication number
KR20210092789A
KR20210092789A KR1020217018502A KR20217018502A KR20210092789A KR 20210092789 A KR20210092789 A KR 20210092789A KR 1020217018502 A KR1020217018502 A KR 1020217018502A KR 20217018502 A KR20217018502 A KR 20217018502A KR 20210092789 A KR20210092789 A KR 20210092789A
Authority
KR
South Korea
Prior art keywords
preferable
group
mass
protective layer
layer
Prior art date
Application number
KR1020217018502A
Other languages
English (en)
Korean (ko)
Inventor
히데키 타카쿠와
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20210092789A publication Critical patent/KR20210092789A/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/02—Homopolymers or copolymers of unsaturated alcohols
    • C08L29/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
KR1020217018502A 2018-12-20 2019-12-16 적층체, 조성물, 및 적층체 형성용 키트 KR20210092789A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018238472 2018-12-20
JPJP-P-2018-238472 2018-12-20
PCT/JP2019/049085 WO2020129873A1 (ja) 2018-12-20 2019-12-16 積層体、組成物、及び、積層体形成用キット

Publications (1)

Publication Number Publication Date
KR20210092789A true KR20210092789A (ko) 2021-07-26

Family

ID=71101300

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217018502A KR20210092789A (ko) 2018-12-20 2019-12-16 적층체, 조성물, 및 적층체 형성용 키트

Country Status (4)

Country Link
JP (1) JPWO2020129873A1 (ja)
KR (1) KR20210092789A (ja)
TW (1) TW202041378A (ja)
WO (1) WO2020129873A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006041317A (ja) 2004-07-29 2006-02-09 Sony Corp 有機半導体パターン及び有機半導体層のパターニング方法、有機半導体装置及びその製造方法、並びに表示装置
WO2016175220A1 (ja) 2015-04-28 2016-11-03 富士フイルム株式会社 積層体およびキット

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008276255A (ja) * 2008-07-14 2008-11-13 Fujifilm Corp カラーフィルターの形成方法及びそれに用いるカラーフィルター形成材料並びにカラーフィルター

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006041317A (ja) 2004-07-29 2006-02-09 Sony Corp 有機半導体パターン及び有機半導体層のパターニング方法、有機半導体装置及びその製造方法、並びに表示装置
WO2016175220A1 (ja) 2015-04-28 2016-11-03 富士フイルム株式会社 積層体およびキット

Also Published As

Publication number Publication date
WO2020129873A1 (ja) 2020-06-25
JPWO2020129873A1 (ja) 2021-10-07
TW202041378A (zh) 2020-11-16

Similar Documents

Publication Publication Date Title
JP6261285B2 (ja) 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物
WO2021182399A1 (ja) 除去液、キット及び半導体デバイス
WO2020195995A1 (ja) 積層体、組成物、及び、積層体形成用キット
KR20210092789A (ko) 적층체, 조성물, 및 적층체 형성용 키트
KR20200115609A (ko) 적층체, 수용성 수지 조성물, 키트
JP7170123B2 (ja) 積層体、組成物、及び、積層体形成用キット
JP7182007B2 (ja) 保護層形成用組成物、層状膜、保護層、積層体および半導体デバイスの製造方法
WO2020184406A1 (ja) 積層体、組成物、及び、積層体形成用キット
JP7149418B2 (ja) 保護層形成用組成物の製造方法、保護層形成用組成物の保存方法およびこの保存方法の応用
EP4210089A1 (en) Method for manufacturing organic layer pattern, and method for manufacturing semiconductor device
WO2019163951A1 (ja) 感光層、積層体、感光性樹脂組成物、キット
JP2021107473A (ja) 保護層形成用組成物、層状膜、保護層、積層体、キット及び半導体デバイス
WO2019163859A1 (ja) 感光層、積層体、感光性樹脂組成物、キットおよび感光性樹脂組成物の製造方法
JP2021110796A (ja) 感光性樹脂組成物、層状膜、感光層、積層体、キット及び半導体デバイス

Legal Events

Date Code Title Description
WITB Written withdrawal of application