KR20210082097A - Electron gun device and deposition device - Google Patents

Abstract

Provided is an electron gun device with high reliability and improved scanning ability. A yoke plate in an electron gun device has a first main surface, a second main surface opposite to the first main surface, and a centerline orthogonal to a direction from the first main surface to the second main surface. An electron beam source is positioned on the first main surface side of the yoke plate and emits an electron beam from the first main surface side of the yoke plate to the second main surface side of the yoke plate. A magnetic field generating source is installed on the second main surface of the yoke plate and has a first magnet arranged on one side of both sides of the centerline and a second magnet arranged on the other side of both sides. A first pole and a second pole of the first magnet and a first pole and a second pole of the second magnet are opposite to each other and stand side by side in the direction. The magnetic field generating source deflects an orbit of the electron beam in the second main surface side of the yoke plate with a magnetic field formed by the second pole of the first magnet and the first pole of the second magnet. A magnetic field formed by the first pole of the first magnet and the second pole of the second magnet is confined in the yoke plate.

Description

Electron gun device and deposition device {ELECTRON GUN DEVICE AND DEPOSITION DEVICE}

The present invention relates to an electron gun apparatus and a deposition apparatus.

In a vapor deposition apparatus having an electron gun device and a crucible, the deposition material is heated by irradiating an electron beam emitted from the electron gun device to the deposition material accommodated in the crucible, and the deposition material is evaporated from the crucible to form a deposition film on the substrate.

In such an apparatus, since it is necessary to focus the electron beam before irradiating the vapor deposition material, a protruding member called a pole piece is sometimes applied to the electron gun apparatus (see, for example, Patent Document 1).

International Publication No. 2013/153604

However, when a pole piece is applied to an electron gun device, for example, when a deposition material is deposited on the pole piece during deposition, when the deposition material peeled off from the pole piece falls into a crucible, the component of the deposition material dropped There is a possibility that this will re-evaporate. This causes contamination of the vapor deposition film. In addition, since the pole piece is protruding, there is a possibility that the effect of the pole piece may change depending on, for example, a thermal history before and after its maintenance or during vapor deposition.

In this case, the magnetic field formed by the pole piece subtly changes every maintenance, and the focusing property of the electron beam becomes unstable. Moreover, when the temperature of the pole piece changes due to the thermal history, the magnetic permeability may change. Thereby, a case where the magnetic field formed by the pole piece is changed and the position of the electron beam is shifted is also conceivable.

Moreover, in the electron gun device provided with the pole piece, since a strong magnetic field is locally formed between a pair of pole pieces, the scanning range of the electron beam in the state which maintained the electron beam focusing has reached what is called a limit.

In view of the above circumstances, an object of the present invention is to provide an electron gun device with high reliability and improved scanability, and a vapor deposition device provided with the electron gun device.

In order to achieve the above object, an electron gun device according to one aspect of the present invention includes a yoke plate, an electron beam source, and a magnetic field generating source.

The yoke plate includes a magnetic material, and has a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface.

The electron beam source may be located on the first main surface side of the yoke plate, and may emit an electron beam from the first main surface side of the yoke plate to the second main surface side of the yoke plate.

The magnetic field generating source is provided on the second main surface of the yoke plate, and has a first magnet disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides. The first pole and the second pole of the first magnet and the first pole and the second pole of the second magnet are opposite to each other and stand side by side in the above direction. The magnetic field generating source deflects the trajectory of the electron beam on the side of the second main surface of the yoke plate by the magnetic field formed by the second pole of the first magnet and the first pole of the second magnet. A magnetic field formed by the first pole of the first magnet and the second pole of the second magnet is trapped in the yoke plate.

In such an electron gun device, since the first main surface side of the yoke plate is magnetically blocked by the yoke plate, and a magnetic field for deflection is formed on the second main surface side of the yoke plate, an electron gun device with high reliability and improved scanability is provided. .

In order to achieve the above object, an electron gun device according to one aspect of the present invention includes a support plate, an electron beam source, and a magnetic field generating source.

The support plate has a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface.

The electron beam source may be located on the first main surface side of the support plate, and may emit an electron beam from the first main surface side of the support plate to the second main surface side of the support plate.

The magnetic field generating source is installed on the second main surface of the support plate, and has a first magnet disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides. The first pole and the second pole of the first magnet and the first pole and the second pole of the second magnet are opposite to each other so as to stand side by side in the direction. The magnetic field generating source deflects the trajectory of the electron beam on the second main surface side of the support plate by the magnetic field formed by the second pole of the first magnet and the first pole of the second magnet.

The auxiliary magnet is reversible in a direction from the first pole to the second pole in the direction, at least a part is exposed from the support plate in the direction, and the center line extends in the direction when the support plate is viewed from the direction It stands side by side with the electron beam source.

In the magnetic field formed by the second pole of the first magnet and the first pole of the second magnet, the magnetic field formed by the second pole of the first magnet and the first pole of the auxiliary magnet, or the second A magnetic field formed by the first pole of the second magnet and the second pole of the auxiliary magnet may overlap.

In such an electron gun device, a magnetic field for deflection is formed on the second main surface side of the support plate, and the magnetic field formed by the auxiliary magnet is superimposed on the magnetic field for deflection, so the electron gun device with high reliability and improved scanability is provided.

In the electron gun device, the yoke plate is provided with a hole or a recess-shaped opening penetrating from the first main surface to the second main surface, the opening overlaps the center line, and the electron beam source passes through the opening in the yoke plate The electron beam may be emitted from the first main surface side of the yoke plate to the second main surface side of the yoke plate.

In such an electron gun device, since an electron beam is emitted from the first main surface side to the second main surface side of the yoke plate through an opening formed in the yoke plate, an electron gun device with high reliability and improved scanning property is provided.

In the above electron gun device, the direction from the first pole to the second pole in the direction is further provided with an auxiliary magnet reversible. At least a portion of the auxiliary magnet is exposed from the yoke plate in the direction, and the auxiliary magnet is aligned with the electron beam source in a direction in which the center line extends when the yoke plate is viewed from the direction, and the second In the magnetic field formed by the first pole of the magnet and the second pole of the first magnet, the magnetic field formed by the first pole of the auxiliary magnet and the second pole of the first magnet, or of the second magnet A magnetic field formed by the first pole and the second pole of the auxiliary magnet may overlap.

In such an electron gun device, a magnetic field for deflection is formed on the second main surface side of the yoke plate, and the magnetic field formed by the auxiliary magnet is superimposed on the magnetic field for deflection, so the electron gun device with high reliability and improved scanability is provided.

In the electron gun device, the electron beam source has a filament for emitting an electron beam, and a focusing coil for focusing the electron beam, and the electron beam focused by the focusing coil is transmitted from the first main surface side of the yoke plate through the opening. It may pass to the side of the said 2nd main surface of the said yoke plate.

In such an electron gun device, since an electron beam excellent in focusing property passes from the first main surface side to the second main surface side of the yoke plate through the opening, an electron gun apparatus having high reliability and improved scanning property is provided.

The electron gun device includes a non-magnetic material, and further includes a cover for covering the electron beam source, the yoke plate, and the magnetic field generating source. An opening through which the electron beam passes may be provided in the cover.

In such an electron gun apparatus, since an electron beam source, a yoke plate, and a magnetic field generating source are covered by a cover, the maintenance of an electron gun apparatus becomes easy.

In the electron gun device, the filament included in the electron beam source in the direction may overlap a part of the cover.

In such an electron gun device, since the filament included in the electron beam source overlaps a part of the cover, the attachment of foreign matter to the filament is prevented.

In the above electron gun device, a cooling circuit may be formed on the first main surface or the second main surface of the yoke plate.

In such an electron gun device, since the cooling circuit is formed in the yoke plate, the magnetic permeability of the yoke plate and the magnet provided in the yoke plate is maintained substantially constant.

In order to achieve the above object, a vapor deposition apparatus according to one aspect of the present invention includes the electron gun apparatus and a crucible.

The crucible is standing side by side with the yoke plate in a direction in which the center line extends when the yoke plate is viewed from the direction, and can accommodate the deposition material.

In such a vapor deposition apparatus, by providing the said electron gun apparatus, the reliability of an electron gun apparatus is high, and the vapor deposition apparatus which improved scanability is provided.

In the above deposition apparatus, in the above direction, the height of the electron beam source may be lower than the height of the top of the crucible.

With such a vapor deposition apparatus, inflow of the vapor deposition material from the crucible to the electron beam source is prevented.

The deposition apparatus further includes a cover comprising a non-magnetic material, covering the electron gun apparatus, and provided with an opening through which the electron beam passes. In the above direction, the height of the cover may be equal to or less than the height of the top of the crucible.

With such a vapor deposition apparatus, inflow of the vapor deposition material from the crucible to the electron beam source is prevented.

As described above, according to the present invention, an electron gun device with high reliability and improved scanability, and a vapor deposition device provided with the electron gun device are provided.

BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic perspective view which shows the electron gun apparatus of this embodiment.
It is a schematic perspective view which shows an example of the action|action of an electron gun apparatus.
It is another schematic perspective view which shows an example of the action|action of an electron gun apparatus.
It is a schematic diagram which shows an example of the action|action of an electron gun apparatus.
It is a schematic perspective view which shows an example of the action|action of the electron gun apparatus at the time of operating an auxiliary magnet.
6 is a schematic diagram showing the trajectory of an electron beam according to a comparative example.
It is a schematic diagram which shows the other form of the electron gun apparatus which concerns on this embodiment.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described, referring drawings. XYZ coordinates may be introduced in each drawing. Moreover, the same code|symbol may be attached|subjected to the same member or the member which has the same function, and after demonstrating the member, description may be abbreviate|omitted suitably.

Fig. 1 (a), (b) is a schematic perspective view which shows the electron gun apparatus of this embodiment. 1 (a), (b), the X-axis direction of the XYZ-axis coordinates is shown in a direction parallel to the center line 30c of the yoke plate 30, and the Z-axis direction corresponds to the vertical line of the yoke plate 30, and , the Y-axis direction corresponds to the direction orthogonal to the center line 30c and the vertical line.

The electron gun apparatus 1 shown to Fig.1 (a) is a deflection-type electron gun applied to the vapor deposition apparatus of an electron beam heating type, for example.

The electron gun device 1 includes an electron beam source 10 , a magnetic field generating source 20 , and a yoke plate 30 . The yoke plate 30 is also a support plate of the magnetic field generating source 20 .

The electron beam source 10 is located on the side of the lower surface 30d (first main surface) of the yoke plate 30 . Here, the lower surface 30d is a surface opposite to the upper surface 30u (second main surface) of the yoke plate 30 . The electron beam source 10 may emit an electron beam from the side of the lower surface 30d of the yoke plate 30 to the side of the upper surface 30u of the yoke plate 30 . In the example of Fig. 1 (a), the electron beam source 10 is arranged so that, for example, its central axis 10c is oblique with respect to the lower surface 30d (or the upper surface 30u) of the yoke plate 30, have.

For example, the yoke plate is provided with an opening 30h constituted of a hole penetrating from the lower surface 30d to the upper surface 30u. The opening 30h overlaps the center line 30c of the yoke plate 30, for example. The electron beam source 10 emits an electron beam from the side of the lower surface 30d of the yoke plate 30 to the side of the upper surface 30u of the yoke plate 30 through the opening 30h. In addition, the opening 30h is not limited to a through-hole, For example, the opening of the recessed shape from the edge part of the yoke plate 30 toward the inside may be sufficient.

The magnetic field generating source 20 is installed on the upper surface 30u of the yoke plate 30 . The magnetic field generating source 20 has, for example, at least one first magnet juxtaposed in the X-axis direction and at least one second magnet juxtaposed in the X-axis direction. In the example of Fig.1 (a), for example, a set of 1st magnets 201A, 201B are side by side in the X-axis direction, and a set of 2nd magnets 202A, 202B are side by side in an X-axis direction, for example. is standing An opening 30h of the yoke plate 30 is formed between the gap between the first magnets 201A and 201B aligned in the X-axis direction and the gap between the second magnets 202A, 202B aligned in the X-axis direction. is located

The number of each of the first magnet and the second magnet is not limited to this example. The first magnet and the second magnet are, for example, permanent magnets formed of a magnetic material such as ferritic or samarium cobalt.

Further, the first magnets 201A and 201B are disposed on one side of both sides of the center line 30c of the yoke plate 30, and the second magnets 202A, 202B are disposed on the other side of both sides of the center line 30c. is placed in Here, the first magnet 201A is placed side by side with the second magnet 202A in the Y-axis direction with the center line 30c interposed therebetween. The first magnet 201B is placed side by side with the second magnet 202B with the center line 30c interposed therebetween in the Y-axis direction.

As the first magnet of the present embodiment, a continuous magnet in which the first magnet 201A and the first magnet 201B are not separated in the X-axis direction may be applied, and the second magnet 202A and the second magnet 202A in the X-axis direction A continuous magnet in which the second magnet 202B is not separated can also be applied.

The length in the X-axis direction, the width in the Y-axis direction, and the direction of magnetic poles of the first magnet 201B in the X-axis direction are, for example, the length in the X-axis direction and the width in the Y-axis direction of the first magnet 201A. , and stimuli. The length in the X-axis direction, the width in the Y-axis direction, and the direction of magnetic poles of the second magnet 202B in the X-axis direction are, for example, the length in the X-axis direction and the width in the Y-axis direction of the second magnet 202A. , and stimuli.

The distance between the first magnet 201B and the second magnet 202B in the Y-axis direction and the connection state to the yoke plate 30 are, for example, the Y-axis of the first magnet 201A and the second magnet 202A. The spacing in the direction is the same as the state of connection to the yoke plate 30 . The magnetic flux densities of the first magnet 201A and the first magnet 201B may be the same or different. The magnetic flux densities of the second magnet 202A and the second magnet 202B may be the same or different.

The first magnet 201A, the center line 30c, and the second magnet 202A are side by side in this order in the Y-axis direction. For example, the distance from the first magnet 201A to the center line 30c is equal to the distance from the second magnet 202A to the center line 30c. Moreover, the 1st magnet 201B, the center line 30c, and the 2nd magnet 202B are side by side in this order in the Y-axis direction. For example, the distance from the first magnet 201B to the center line 30c is equal to the distance from the second magnet 202B to the center line 30c.

In the example of Fig.1 (a), the lower surface of the 1st magnet 201A is an N pole (first pole), and the upper surface of the 1st magnet 201A is an S pole (second pole). Further, the upper surface of the second magnet 202A is the N pole, and the lower surface of the second magnet 202A is the S pole. Here, the lower surface of each of the first magnet 201A and the second magnet 202A is a surface facing the upper surface 30u of the yoke plate 30 or a surface in contact with the upper surface 30u. For example, in the example of FIG. 1A , the lower surfaces of the first magnet 201A and the second magnet 202A are in contact with the upper surface 30u of the yoke plate 30 .

Further, the lower surface of the first magnet 201B is the N pole, and the upper surface of the first magnet 201B is the S pole. The upper surface of the second magnet 202B is the N pole, and the lower surface of the second magnet 202B is the S pole.

In the magnetic field generating source 20, the N pole and S pole of the first magnet 201A, and the N pole and S pole of the second magnet 202A are opposite to each other, respectively, and stand side by side in the Z-axis direction. For example, the S pole of the first magnet 201A and the N pole of the second magnet 202A face the same direction in the Z-axis direction. Further, the N pole of the first magnet 201A and the S pole of the second magnet 202A face the same direction in the Z-axis direction.

As a result, on the side of the upper surface 30u of the yoke plate 30, from the N pole of the second magnet 202A to the S pole of the first magnet 201A, for example, an arcuate magnetic force line convex upwards. is formed The magnetic force line is formed so as to ride over the center line 30c with, for example, just above the center line 30c as a vertex. Moreover, the same arcuate magnetic force line is also formed by the 1st magnet 201B and the 2nd magnet 202B.

Similarly, the N pole and S pole of the first magnet 201B and the N pole and S pole of the second magnet 202B are respectively opposite to each other and are aligned in the Z-axis direction. As a result, on the side of the upper surface 30u of the yoke plate 30, from the N pole of the second magnet 202B to the S pole of the first magnet 201B, for example, an arcuate magnetic force line convex upwards. is formed This magnetic force line crosses over the center line 30c, for example, with the vertex directly above the center line 30c. If this line of magnetic force is described as a vector field, it becomes a field in which the vector of each point is drawn in a shape revolving around the center line 30c on the Y-Z axis plane.

This magnetic force line (magnetic field) deflects the trajectory of the electron beam placed on the upper surface 30u of the yoke plate 30 by the electron beam source 10 on the side of the upper surface 30u of the yoke plate 30 .

The yoke plate 30 uses, for example, iron, which is a ferromagnetic material. For example, as the yoke plate 30, JIS G 3101 rolled steel for general structure can be used. In this embodiment, for example, SS400 is used. Moreover, as needed, pure iron or JIS C 2531 iron nickel soft magnetic material with high magnetic permeability can also be used. The yoke plate 30 is supported on a support plate 40 made of a non-magnetic material such as SUS, and the support plate 40 is supported on a base 41 made of a non-magnetic material such as SUS.

The yoke plate 30 has a lower surface 30d, an upper surface 30u opposite to the lower surface 30d, and a center line 30c. The center line 30c is orthogonal to the Z-axis direction from the lower surface 30d toward the upper surface 30u. Moreover, the center line 30c forms a part of the upper surface 30u. The yoke plate 30 has, for example, an opening 30h overlapping the center line 30c. In addition, "orthogonal" is used in the meaning of substantially orthogonal, and includes the state which intersects perpendicularly (90 degrees), especially with a slight error from perpendicular|vertical.

Since the yoke plate 30 is made of a ferromagnetic material, a magnetic field (magnetic line of force) formed by the N pole of the first magnet 201A and the S pole of the second magnet 202A is trapped in the yoke plate 30 . . Further, a magnetic field (magnetic line of force) formed by the N pole of the first magnet 201B and the S pole of the second magnet 202B is trapped in the yoke plate 30 . Here, "to be trapped" is used in the sense of being substantially trapped. For example, even if a small amount of magnetic flux leaks from the lower side of the yoke plate 30, if it has the same effect as the state in which the magnetic flux is completely trapped by the yoke plate 30, it is called a trapped state.

That is, in the magnetic field generating source 20, the magnetic force line formed by the N pole of the second magnet 202A and the S pole of the first magnet 201A on the side of the upper surface 30u of the yoke plate 30, and the yoke plate ( 30), a magnetic circuit is formed by the N pole of the first magnet 201A and the S pole of the second magnet 202A. Similarly, in the magnetic field generating source 20, the magnetic force line formed by the N pole of the second magnet 202B and the S pole of the first magnet 201B on the side of the upper surface 30u of the yoke plate 30, and the yoke plate A magnetic circuit is also formed by the N pole of the first magnet 201B and the S pole of the second magnet 202B inside (30).

In other words, although the magnetic field B is formed in the space on the side of the upper surface 30u of the yoke plate 30 (the upper side of the yoke plate 30 ), the space on the side of the lower surface 30d of the yoke plate 30 . A magnetic field is not substantially formed in (lower side of the yoke plate 30).

A cooling circuit 35 (cooling pipe) surrounding the opening 30h may be installed on the upper surface 30u or the lower surface 30d of the yoke plate 30 . Accordingly, even if the yoke plate 30, the first magnets 201A, 201B, and the second magnets 202A, 202B receive thermal radiation from the outside, the temperature of the yoke plate 30 and the first magnet 201A , 201B), and each of the second magnets 202A, 202B can suppress the temperature rise. That is, by circulating the medium through the cooling circuit 35, the magnetic permeability of each of the yoke plate 30, the first magnets 201A, 201B, and the second magnets 202A, 202B is stabilized during deposition of the deposition material. , a stable magnetic field is formed on the side of the upper surface 30u of the yoke plate 30 .

The electron gun device 1 of this embodiment is provided with the auxiliary magnet 25 further. The auxiliary magnet 25 is supported on the base 41 , for example. The auxiliary magnet 25 is constituted by a magnet whose direction from the N pole to the S pole in the Z-axis direction is reversible. For example, the auxiliary magnet 25 is constituted by an electromagnet, and a coil is wound around a core material of a magnetic material extending in the Z-axis direction, and by changing the direction of the current flowing through the coil, the upper end 25u is N The pole and the lower end 25d become the S pole, or the upper end 25u becomes the S pole and the lower end 25d becomes the N pole. In addition, the current value flowing through the coil can be changed, and the density of the magnetic force line emitted by the auxiliary magnet 25 is appropriately changed.

At least a part of the auxiliary magnet 25 is exposed from the yoke plate 30 in the Z-axis direction. For example, in the example of FIG. 1A, the upper end 25u of the auxiliary magnet 25 is exposed from the yoke plate 30 in the Z-axis direction. The auxiliary magnet 25 stands in line with the electron beam source 10 or the opening 30h in the direction in which the center line 30c extends when the yoke plate 30 is viewed from the Z-axis direction. The auxiliary magnet 25 is positioned between the first magnet 201A and the second magnet 202A in the Y-axis direction.

For example, when the upper end 25u of the auxiliary magnet 25 is set to the N pole, the magnetic field formed by the N pole of the second magnet 202A and the S pole of the first magnet 201A is assisted. The magnetic field formed by the N pole of the magnet 25 and the S pole of the first magnet 201A overlaps. Alternatively, when the upper end 25u of the auxiliary magnet 25 is set to the S pole, the second magnet is applied to the magnetic field formed by the N pole of the second magnet 202A and the S pole of the first magnet 201A. The magnetic field formed by the N pole of 202A and the S pole of the auxiliary magnet 25 overlaps.

In addition, the electron gun device 1 may be equipped with a cover 80 comprising a non-magnetic material (FIG. 1 (b)). The cover 80 covers the electron beam source 10 , the magnetic field generating source 20 , and the yoke plate 30 while maintaining a non-connected state with the magnetic field generating source 20 and the yoke plate 30 . This unconnected state also contributes to the effect of inhibiting heat inflow to the yoke. The cover 80 is provided with an opening 80h through which the electron beam emitted from the electron gun device 1 passes. In the Z-axis direction, the filaments of the electron beam source 10 overlap a portion of the cover 80 . That is, the openings 80h of the cover 80 are not located directly above the filaments of the electron beam source 10, and they are in an offset relationship in the X-axis direction or the Y-axis direction.

It is a schematic perspective view which shows an example of the action|action of an electron gun apparatus. Here, in FIG. 2, a part of the member shown in FIG. 1 is appropriately omitted.

2 shows a deposition apparatus 5 having an electron gun apparatus 1 and a crucible 50 . The crucible 50 contains the deposition material 51 . When the yoke plate 30 is viewed from the Z-axis direction, the crucible 50 is in the direction in which the center line 30c extends, the yoke plate 30, the electron gun device 1, the opening 30h, or the auxiliary magnet 25 ) stand side by side.

For example, when the yoke plate 30 is viewed from the Z-axis direction, in the example of Fig. 2, in the X-axis direction, the electron gun device 1, the opening 30h, and a set of three magnets (first magnet 201A) , the second magnet 202A, and the auxiliary magnet 25) and the crucible 50 are placed side by side in this order, and the auxiliary magnet 25 is positioned between the crucible 50 and the opening 30h. However, the distance between the set of the first magnet 201A and the second magnet 202A and the crucible 50 is rather than the distance between the set of the first magnet 201B and the second magnet 202B and the crucible 50 . side is short

In Fig. 2, the lines of magnetic force formed by the first magnet 201A and the second magnet 202A and the magnetic force lines formed by the first magnet 201B and the second magnet 202B are schematically indicated by broken lines. Hereinafter, this broken line is referred to as a magnetic force line (B). Or, there are cases where it is simply called a magnetic field (B), a magnetic field for deflection (B), and the like.

For example, the electron beam 10E immediately after being emitted by the electron beam source 10 does not have a magnetic field on the side of the lower surface 30d of the yoke plate 30, or because the magnetic field is very weak, it is difficult to be affected by the magnetic field. For this reason, the electron beam 10E travels linearly from the side of the lower surface 30d of the yoke plate 30 to the vicinity of the opening 30h. In addition, since the central axis 10c of the electron beam source 10 is disposed obliquely with respect to the lower surface 30d of the yoke plate 30 , the electron beam 10E is aligned with the normal line of the upper surface 30u of the yoke plate 30 . The exit angle from the exit is acute (<90°).

When the electron beam 10E passes through the opening 30h of the yoke plate 30 and is affected by the magnetic force line B from the side of the upper surface 30u of the yoke plate 30, the direction in which the electron beam 10E travels and Since the lines of magnetic force (B) are almost perpendicular to each other, the Lorentz force acts on the electrons. Thereby, the trajectory of the electron beam 10E is deflected.

For example, the electron beam 10E rises once away from the yoke plate 30 from the opening 30h, but flies while receiving a Lorentz force on the yoke plate 30 . For this reason, the electron beam 10E descends while drawing a convex trajectory while riding over the auxiliary magnet 25 , and hits the crucible 50 located at the end of the yoke plate 30 . In this case, when the electron beam 10E is viewed from the Z-axis direction, the trajectory of the electron beam 10E almost overlaps the center line 30c.

That is, the trajectory of the electron beam 10E almost overlaps on the center line 30c. The position where the vapor deposition material 51 is irradiated with the electron beam 10E is called a spot 51p. The outer shape of the spot 51p viewed from the Z-axis direction is preferably, for example, a shape closer to a true circle. For this reason, excellent focusing properties are required for the electron beam 10E.

When the vapor deposition material 51 in the crucible 50 is irradiated with the electron beam 10E, the vapor deposition material 51 is heated by the electron beam 10E, and the vapor pressure of the vapor deposition material 51 at the site rises. . Thereby, the vapor deposition material 51 evaporates upward from the crucible 50. As shown in FIG.

It is another schematic perspective view which shows an example of the action|action of an electron gun apparatus. Here, in Fig. 3, the electron beam source 10, the first magnet 201A, and the auxiliary magnet 25 when the vapor deposition apparatus 5 is viewed from the XZ axis plane along the center line 30c of the yoke plate 30. , the yoke plate 30 , the crucible 50 , the vapor deposition material 51 , the cover 80 , and the like are shown. The electron beam source 10 is, for example, a cathode, and has a filament 10f that emits an electron beam (hot electrons), and an annular anode 10a opposed to the filament 10f. In addition, although the 2nd magnet 202A is not shown in figure, in the example of FIG. 3, it is located in front of the 1st magnet 201A.

In FIG. 3 , a parallel line in the direction on the center line 30c along the top surface of the cover 80 is the X axis, and the direction normal to the top surface 80u of the cover 80 is the Z axis. The Z axis intersects the vertex of the electron beam 10E.

When the two-dimensional coordinates are divided into first to fourth orthants (1st to 4th), the electron beam source 10 belongs to, for example, the third orthant. The yoke plate 30 belongs, for example, to the third orthant. The yoke plate 30 may be folded into the fourth orthant. However, the opening 30h of the yoke plate 30 belongs to the third upper limit (orthant). The cover 80 belongs, for example, to the third and fourth orthants. However, the opening 80h of the cover 80 belongs to the third upper limit (orthant).

The first magnet 201A belongs to, for example, the third and fourth upper limits. However, there are cases where the first magnet 201A belongs only to the third upper limit. Similarly, the second magnet 202A (not shown) belongs to, for example, the third and fourth upper limits. However, there are cases where the second magnet 202A belongs only to the third upper limit. The auxiliary magnet 25 belongs to, for example, the fourth upper limit. However, the auxiliary magnet 25 may belong to the 3rd and 4th upper limit, or may belong only to the 4th upper limit. The crucible 50 and the vapor deposition material 51 belong to the 4th upper limit, for example. Moreover, the magnetic field B is formed in the 1st upper limit, the 2nd upper limit, and the upper limit of the upper side of the yoke plate 30. As shown in FIG.

Further, in the Z-axis direction, each of the openings 30h and 80h and the filament 10f of the electron beam source 10 are separated from each other. In the Z-axis direction, the height of the electron beam source 10 is lower than the height of the top of the crucible 50 . In the Z-axis direction, the height of the cover 80 is equal to or less than the height of the top of the crucible 50 . For example, in the Z-axis direction, the upper surface 80u of the cover 80 is located at a position lower than the crucible 50 and the vapor deposition material 51 .

In this configuration, when the electron beam 10E is emitted from the electron beam source 10 at the third upper limit, the electron beam 10E is emitted from the normal line 80N at a predetermined emission angle and then enters the second upper limit. In particular, due to the magnetic blocking by the yoke plate 30 , there is no magnetic field in the third upper limit, or the magnetic field is very weak. Alternatively, the magnetic blocking effect of the yoke plate 30 is set so that the magnetic field in the third upper limit becomes a vector field to a degree that the deflection amount of the electron beam 10E is negligible.

In addition, the first magnet 201A and the first magnet 201B move away from each other in the X-axis direction, and the second magnet 202A and the second magnet 202B move away from each other in the X-axis direction. For this reason, on the side of the upper surface 30u of the yoke plate 30, the magnetic field intensity|strength is relatively low above the opening 30h.

Thereby, the electron beam 10E emitted from the electron beam source 10 goes straight in the 3rd upper limit, and goes out linearly for a while also in the 2nd upper limit. And when the electron beam 10E starts to be influenced by the magnetic field B at the second upper limit, the electron beam 10E starts to be deflected to the second upper limit by the Lorentz force. In Fig. 3, the point at which the electron beam 10E starts to deflect is referred to as an inflection point 10p.

After that, the electron beam 10E rises away from the yoke plate 30, but because it flies while receiving a Lorentz force at the first and second upper limits, it rides on the auxiliary magnet 25 while drawing a convex trajectory. It crosses, and then hits the crucible 50 located inside the yoke plate 30 .

Here, if the pole of the upper end 25u of the auxiliary magnet 25 is inverted to the N pole or the S pole, for example, the following operation occurs.

Fig.4 (a), (b) is a schematic diagram which shows an example of the action|action of an electron gun device. 4A and 4B are diagrams schematically illustrating a magnetic field viewed from the X-axis direction.

Fig. 4(a) shows an example in the case where the upper end 25u of the auxiliary magnet 25 is set to the N pole. In this case, in the magnetic field B formed by the N pole of the second magnet 202A and the S pole of the first magnet 201A, the N pole of the auxiliary magnet 25 and the S pole of the first magnet 201A A magnetic field (B ₁ ) as if formed by is superimposed, and a resultant magnetic field is formed by the magnetic field (B) and the magnetic field (B _{1 ).} Thereby, the Lorentz force F ₁ received by the magnetic field B _{1 in} addition to the Lorentz force F ₀ received by the magnetic field B is synthesized in the electron beam 10E.

Here, the Lorentz force F0 acts perpendicular to the yoke plate 30 because the magnetic force line forming the magnetic field B is almost parallel to the Y-axis direction just above the auxiliary magnet 25 . On the other hand, the Lorentz force F ₁ has a higher curvature of the magnetic force line forming the magnetic field B ₁ than the magnetic force line of the magnetic field B, and is approaching the first magnet 201A. while being inclined toward the first magnet 201A.

Thereby, the _{Lorentz force combined with F 0} and F ₁ inclines toward the first magnet 201A, and the trajectory of the electron beam 10E deviates to the side of the first magnet 201A on the center line 30c.

On the other hand, when the upper end 25u of the auxiliary magnet 25 is set to the S pole, the N pole and the auxiliary magnet ( _{The magnetic field B 2} as formed by the S pole of 25) overlaps, and a resultant magnetic field is formed by the magnetic field B and the magnetic field B _{2 .} Thereby, the Lorentz force F ₂ received by the magnetic field B _{1 in} addition to the Lorentz force F ₀ received by the magnetic field B is synthesized in the electron beam 10E.

The Lorentz force F ₂ has a curvature of the magnetic force line forming the magnetic field B ₂ is higher than the magnetic force line of the magnetic field B, and is approaching the second magnet 202A, 2 is inclined toward the magnet (202A).

Thereby, the _{Lorentz force combined with F 0} and F ₂ inclines toward the second magnet 202A, and the trajectory of the electron beam 10E deviates to the side of the second magnet 202A on the center line 30c.

It is a schematic perspective view which shows an example of the action|action of the electron gun apparatus at the time of operating an auxiliary magnet.

When the pole of the upper end 25u of the auxiliary magnet 25 is set to the N pole, the electron beam 10E deviates from the upper side of the auxiliary magnet 25 to the side of the first magnet 201A, and the spot 51p is shown in FIG. It shifts to the left of the state. On the other hand, when the pole of the upper end 25u of the auxiliary magnet 25 is set to the S pole, the electron beam 10E deviates from the upper side of the auxiliary magnet 25 to the side of the second magnet 202A, and the spot 51p is formed. It shifts to the right more than the state of FIG. That is, the poles of the upper end 25u of the auxiliary magnet 25 are N pole, non-magnetic, S pole, non-magnetic, N pole... By repeating ?, the spot 51p vibrates in the Y-axis direction with respect to the center of the crucible 50 .

Here, in the electron gun device to which a pole piece is applied, a pair of pole pieces is opposed to each other, and a strong magnetic field is locally formed between the pair of pole pieces, so that the scanning range of the electron beam is limited. For example, it vibrates in the range of ±25mm from side to side centering on the center point of the crucible.

On the other hand, in the electron gun device 1 of this embodiment, it is not necessary to form a local strong magnetic field in a narrow area, such as between pole pieces, and to vibrate an electron beam in the Y-axis direction. For example, instead of the pole piece, the magnetic field B formed by the first magnet 201A and the second magnet 202A, located in front of the crucible 50 and provided on both sides of the yoke plate 30 ) The magnetic field (magnetic field (B ₁ ) or magnetic field (B ₂ )) formed by the auxiliary magnet 25 is superimposed thereon. Thereby, the trajectory of the electron beam 10E deviates from the center line 30c just before the crucible 50, and the spot 51p can be vibrated over a wide range in the Y-axis direction with respect to the center of the crucible 50. have.

For example, Table 1 is a table showing the relationship between the coil current flowing through the auxiliary magnet 25 and the moving distance of the spot 51p from the center of the crucible 50 . Point P is the center point of the upper end 25u of the auxiliary magnet 25 shown in Fig. 5, and point Q is a point indicating the position of the end of the second magnet 202A on the auxiliary magnet 25 side. Table 1 shows the magnetic flux densities (gauss) measured at P and Q points using a magnetic flux density meter. Moreover, the value obtained by multiplying the measured value at the point Q by (-1) corresponds to the magnetic flux density at the position of the end of the first magnet 201A on the auxiliary magnet 25 side.

Since the second magnet 202A is a permanent magnet, the magnetic flux density at the Q point is 290 gauss (fixed) regardless of the value of the coil current. Since the auxiliary magnet 25 is an electromagnet, as the coil current increases, the magnetic flux density at the point P increases. And as the coil current increases, the superimposition effect of the magnetic field formed by the auxiliary magnet 25 to the magnetic field B increases, the amount of deviation of the electron beam 10E increases, and the movement distance of the spot 51p increases.

For example, as shown in Table 1, as the moving distance of the spot 51p from the center of the crucible 50, a maximum of 35 mm is obtained. That is, the spot 51p vibrates greatly in the range of ±35 mm left and right around the center point of the crucible 50 .

Further, in the X-axis direction, for example, by weakening or increasing the acceleration energy keV of the electron beam 10E, the spot 51p k is brought closer to the side of the auxiliary magnet 25, or the spot 51p is moved closer to the side of the auxiliary magnet 25. It can be away from the auxiliary magnet 25 or it can be done. Thereby, also in the X-axis direction, the spot 51p can vibrate largely in the range of +/-35 mm centering on the center point of the crucible 50. As shown in FIG. That is, in this embodiment, the spot 51p of the electron beam 10E is spread over a wide range of 70 square mm.

In addition, according to this embodiment, the trajectory of the electron beam 10E immediately after exiting from the electron beam source 10 is not changed, but the trajectory of the electron beam 10E just before the crucible 50 is changed. For this reason, the focusing of the electron beam source 10 is maintained at a long distance from the emission of the electron beam source 10 to just before the crucible 50, and the electron beam source 10 vibrates on the central axis 30 as a reference. Even if this is done, the external shape (for example, spot diameter) of the spot 51p is less likely to be disturbed. Thereby, even when the electron beam source 10 is vibrated in the Y-axis direction with respect to the central axis 30 as a reference, the electron beam 10E is suppressed from protruding into the crucible 50, and the entire spot of the electron beam source 10 is covered. The vapor deposition material 51 can be irradiated more reliably.

For example, FIGS. 6A to 6C are schematic diagrams showing electron beam trajectories according to Comparative Examples. 6(a) to 6(c), the electron beam 10E is directed in the Y-axis direction by a scanning coil (not shown) immediately after being emitted from the electron beam source 10 without providing the auxiliary magnet 25 . A state in which the electron beam 10E vibrates left and right is shown.

For example, as shown in Fig. 6(a), the electron beam 10Ec is an electron beam emitted on the center line 30c, and the electron beam 10El is turned left on the center line 30c, and the electron beam 10El is right on the center line 30c. The electron beam turned to is an electron beam 10Er.

In this case, as shown in Fig. 6B, the Lorentz force Fl acting on the electron beam 10El and the Lorentz force Fl acting on the electron beam 10Er rather than the Lorentz force Fc acting on the electron beam 10Ec are Runtz force (Fr) increases. Thereby, the electron beam 10El and the electron beam 10Er will reach further forward than the electron beam 10Ec, ie, to the electron beam source 10 side.

For this reason, as shown in FIG.6(c), the spot 51pl of the electron beam 10El and the spot 51pr of the electron beam 10Er are located in front of the spot 51pc of the electron beam 10Ec.

In opposition to these Lorentz force Fl acting on the electron beam 10El and the Lorentz force Fr acting on the electron beam 10Er, the spot 51pl and the spot 51pr are set to the spot 51pc along the Y-axis. In order to line up in series in the direction, it is necessary to further deflect the electron beams 10El and 10Er in the X-axis direction or the Y-axis direction. As a result, it is necessary to make the electron beams 10El and 10Er fly in a magnetic field distribution different from that of the electron beam 10Ec flying on the central axis 30c, and the focusing of the electron beams 10El and 10Er is reduced to that of the electron beam 10Ec. It becomes difficult to keep it the same as the shape.

In addition, in this embodiment, since irradiation to the vapor deposition material 51 (impact) is a state (the angle with respect to the Z axis becomes small) which becomes more perpendicular than the vapor deposition material 51 compared with the comparative example, the vapor deposition material 51 ) is consumed and the irradiation surface of the vapor deposition material 51 moves downward in the Z-axis direction, the outer shape and irradiation position of the spot 51p are difficult to change. As a result, the evaporation amount of the vapor deposition material 51 becomes constant, and the phenomenon that the irradiation range to the vapor deposition material 51 regulated by the upper end of the crucible 50 is reduced is minimized.

In addition, in this embodiment, since the pole piece is not applied to the electron gun apparatus 1, there is no case where the vapor deposition material is deposited on the pole piece during vapor deposition, and the vapor deposition material re-evaporates from the pole piece, causing contamination of the vapor deposition film. or the film peeled off from the pole piece is mixed in the crucible, and the phenomenon of re-evaporation is eliminated.

In addition, in this embodiment, since the pole piece is not applied to the electron gun apparatus 1, the problem that the effect of the pole piece generated by the thermal history before and after maintenance or during vapor deposition changes is eliminated. In the conventional example, since the three-dimensional protrusion shape was used for the pole piece, it was physically difficult to make the temperature near the protrusion uniform at all times, and temperature fluctuations cause the magnetic permeability of the pole piece to fluctuate. As a result, the magnetic field distribution formed by the pole piece may fluctuate. Incidentally, the fluctuation of the three-dimensional position was unavoidable due to the influence of the thermal expansion coefficient and maintenance of each supporting member, but in this embodiment in which the pole piece is not used, the focusing property of the electron beam 10E becomes more stable.

Moreover, in this embodiment, the height of the electron beam source 10 is lower than the height of the upper end of the crucible 50 in the Z-axis direction. Thereby, according to the cosine side of vapor deposition, the inflow to the electron beam source 10 of the vapor deposition material 51 which evaporates from the crucible 50 is suppressed reliably.

Moreover, in the Z-axis direction, in the present embodiment, the height of the cover 80 is equal to or less than the height of the upper end of the crucible 50 . Thereby, it is enough just to deposit the vapor deposition material 51 evaporated from the crucible 50 on the cover 80, and the inflow of the vapor deposition material 51 to the electron beam source 10 is suppressed reliably.

Moreover, the electron gun apparatus 1 is covered with the cover 80 in this embodiment. For this reason, the vapor deposition material 51 scatters toward the electron gun device 1, foreign substances such as flakes and dust fall on the electron gun device 1, or the sea-island cover 80 is cleaned or replaced by the electron gun device ( 1) maintenance is completed. Thereby, the mass productivity of vapor deposition improves.

In addition, in this embodiment, the opening 80h of the cover 80 is not located directly above the filament 10f of the electron beam source 10, but they have an offset relationship in the X-axis direction or the Y-axis direction. Thereby, even if the foreign material in a vacuum container falls from the upper direction of the electron gun apparatus 1 to the electron gun apparatus 1, a foreign material does not fall directly to the filament 10f. Thereby, an electrical short circuit of the filament 10f is prevented.

It is a schematic diagram which shows the other form of the electron gun apparatus which concerns on this embodiment.

The electron beam source 10 may have a focusing coil 60 as a substitute for a pole piece in order to focus the electron beam 10E. The focusing coil 60 is provided between, for example, the anode 10a of the electron beam 10E and the yoke plate 30 . For example, the electron beam 10E emitted from the filament 10f is accelerated by the anode 10a and, when passing through the anode 10a, is focused by the focusing coil 60 . And the focused electron beam 10E passes from the side of the lower surface 30d of the yoke plate 30 to the side of the upper surface 30u of the yoke plate 30 through the opening 30h.

In this embodiment, the magnetic field B of the focusing coil 60 interferes with the magnetic field B because the yoke plate 30 makes it difficult for the magnetic field B to leak to the side of the lower surface 30d of the yoke plate 30 . it becomes difficult to do Thereby, control of the focusing of the electron beam 10E by the focusing coil 60 is improved, and further, the electron beam 10E excellent in focusing property can be irradiated to the vapor deposition material 51 .

In addition, an auxiliary scanning coil may be provided between the focusing coil 60 and the yoke plate 30 . Thereby, the degree of freedom of scanning in the Y-axis direction or the X-axis direction of the spot 51p is further increased.

As mentioned above, although embodiment of this invention was described, this invention is not limited only to embodiment mentioned above, It goes without saying that various changes can be added. Each embodiment is not limited to an independent form, Comprising is possible as technically possible.

1: electron gun apparatus 5: vapor deposition apparatus
10: electron beam source 10E, 10Ec, 10El, 10Er: electron beam
10a: positive electrode 10f: filament
10c: central axis 10p: inflection point
20: magnetic field generating source 25: auxiliary magnet
25u: top 25d: bottom
30: yoke plate 3: center line
30u: top 30d: bottom
30h: opening 35: cooling circuit
40: support plate 41: gas
50: crucible 51: vapor deposition material
51p, 51pl, 51pc, 51pr: spot 60: focusing coil
80: cover 80u: top
80h: openings 201A, 201B: first magnet
202A, 202B: second magnet

Claims (11)

A yoke plate comprising a magnetic material and having a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface;
an electron beam source located on the first main surface side of the yoke plate and capable of emitting an electron beam from the first main surface side of the yoke plate to the second main surface side of the yoke plate;
A first magnet provided on the second main surface of the yoke plate and disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides, the first pole of the first magnet and a second pole and the first pole and the second pole of the second magnet are opposite to each other and stand side by side in the direction, and the trajectory of the electron beam from the side of the second main surface of the yoke plate is determined by the direction of the first magnet. Deflected by the magnetic field formed by the second pole and the first pole of the second magnet, the magnetic field formed by the first pole of the first magnet and the second pole of the second magnet is trapped in the yoke plate a magnetic field generator,
The direction from the first pole to the second pole in the direction is reversible, at least a portion is exposed from the yoke plate in the direction, and the electron beam source in a direction in which the center line extends when the yoke plate is viewed from the direction and an auxiliary magnet standing side by side with
In the magnetic field formed by the first pole of the second magnet and the second pole of the first magnet, the magnetic field formed by the first pole of the auxiliary magnet and the second pole of the first magnet, or the second 2 Electron gun device that can overlap the magnetic field formed by the first pole of the magnet and the second pole of the auxiliary magnet. a support plate having a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface;
an electron beam source located on the first main surface side of the support plate and capable of emitting an electron beam from the first main surface side of the support plate to the second main surface side of the support plate;
A first magnet provided on the second main surface of the support plate and disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides, the first pole of the first magnet and A second pole and the first pole and the second pole of the second magnet are opposite to each other and stand side by side in the direction, and the trajectory of the electron beam from the side of the second main surface of the support plate is determined by the second pole of the first magnet. a magnetic field generating source deflecting by the magnetic field formed by the pole and the first pole of the second magnet;
The direction from the first pole to the second pole in the direction is reversible, at least a portion is exposed from the support plate in the direction, and is parallel to the electron beam source in the direction in which the center line extends when the support plate is viewed from the direction Equipped with a standing auxiliary magnet,
In the magnetic field formed by the second pole of the first magnet and the first pole of the second magnet, the magnetic field formed by the second pole of the first magnet and the first pole of the auxiliary magnet, or the second 2 Electron gun device that can overlap the magnetic field formed by the first pole of the magnet and the second pole of the auxiliary magnet. According to claim 1,
The yoke plate is provided with a hole or a recessed opening penetrating from the first main surface to the second main surface,
the opening overlaps the centerline;
The electron beam source emits the electron beam from the side of the first main surface of the yoke plate to the side of the second main surface of the yoke plate through the opening. 4. The method of claim 3,
The electron beam source has a filament for emitting an electron beam, and a focusing coil for focusing the electron beam,
An electron gun device through which the electron beam focused by the focusing coil passes from the first main surface side of the yoke plate to the second main surface side of the yoke plate through the opening. 5. The method of claim 1, 3 or 4,
A cover comprising a non-magnetic material, the cover covering the electron beam source, the yoke plate, and the magnetic field generating source is further provided,
The cover is provided with an opening through which the electron beam passes. 6. The method of claim 5,
In the direction, the filament included in the electron beam source overlaps a portion of the cover. 4. The method of claim 1 or 3,
An electron gun device in which a cooling circuit is formed on the first main surface or the second main surface of the yoke plate. A yoke plate comprising a magnetic material and having a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface;
an electron beam source located on the first main surface side of the yoke plate and capable of emitting an electron beam from the first main surface side of the yoke plate to the second main surface side of the yoke plate;
A first magnet provided on the second main surface of the yoke plate and disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides, the first pole of the first magnet and a second pole and the first pole and the second pole of the second magnet are opposite to each other and stand side by side in the direction, and the trajectory of the electron beam from the side of the second main surface of the yoke plate is determined by the direction of the first magnet. Deflected by the magnetic field formed by the second pole and the first pole of the second magnet, the magnetic field formed by the first pole of the first magnet and the second pole of the second magnet is trapped in the yoke plate a magnetic field generator,
The direction from the first pole to the second pole in the direction is reversible, at least a portion is exposed from the yoke plate in the direction, and the electron beam source in a direction in which the center line extends when the yoke plate is viewed from the direction An electron gun device having an auxiliary magnet standing side by side with
A crucible is provided which stands side by side on the yoke plate in a direction in which the center line extends when the yoke plate is viewed from the direction, and which can accommodate a deposition material,
In the magnetic field formed by the first pole of the second magnet and the second pole of the first magnet, the magnetic field formed by the first pole of the auxiliary magnet and the second pole of the first magnet, or the second 2 A deposition apparatus capable of overlapping a magnetic field formed by a first pole of the magnet and a second pole of the auxiliary magnet. a support plate having a first main surface, a second main surface opposite to the first main surface, and a center line orthogonal to a direction from the first main surface to the second main surface;
an electron beam source located on the first main surface side of the support plate and capable of emitting an electron beam from the first main surface side of the support plate to the second main surface side of the support plate;
A first magnet provided on the second main surface of the support plate and disposed on one side of both sides of the center line, and a second magnet disposed on the other side of the both sides, the first pole of the first magnet and A second pole and the first pole and the second pole of the second magnet are opposite to each other and stand side by side in the direction, and the trajectory of the electron beam from the side of the second main surface of the support plate is determined by the second pole of the first magnet. a magnetic field generating source deflecting by the magnetic field formed by the pole and the first pole of the second magnet;
The direction from the first pole to the second pole in the direction is reversible, at least a portion is exposed from the support plate in the direction, and is parallel to the electron beam source in the direction in which the center line extends when the support plate is viewed from the direction An electron gun device having a standing auxiliary magnet, and
and a crucible which stands side by side on the support plate in a direction in which the center line extends when the support plate is viewed from the direction, and which can accommodate a deposition material;
In the magnetic field formed by the second pole of the first magnet and the first pole of the second magnet, the magnetic field formed by the second pole of the first magnet and the first pole of the auxiliary magnet, or the second 2 A deposition apparatus capable of overlapping a magnetic field formed by a first pole of the magnet and a second pole of the auxiliary magnet. 10. The method according to claim 8 or 9,
In the above direction, the height of the electron beam source is lower than the height of the top of the crucible. 10. The method according to claim 8 or 9,
A non-magnetic material, covering the electron gun device, further comprising a cover provided with an opening for passing the electron beam,
In the above direction, the height of the cover is equal to or less than the height of the top of the crucible.

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