JPH0830267B2 - Electronic beam evaporation source device - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to an evaporation source device mainly for vacuum evaporation in which a substance in a cavity is irradiated with an output electron beam of an electron gun to heat and evaporate.

(Prior Art) Conventionally, as an evaporation source device of this type, for example, Japanese Patent Publication No.
As seen in Japanese Patent No. 6025, a crucible and an electron gun in front of and below the crucible are provided between the left and right magnetic pole plates of the exciter, and the output electron beam of the electron gun is bent by the magnetic field action between the two magnetic pole plates. A pair of left and right auxiliary excitation coils are provided along the path of the output electron beam so as to guide the material in the crucible from the front upper surface thereof, and further to apply general heating to the material in the crucible. It is known that the output electron beams are alternately excited in opposite directions to generate left and right alternating deflections.

(Problems to be solved by the invention) In the above, if the current value of the exciter is changed, the output electron beam is moved back and forth in the crucible, and at the same time, the auxiliary excitation coil is alternately excited to output the output. Since the electron beam can be moved left and right, it is possible to irradiate the output electron beam as a whole with the substance in the crucible, but the sweep frequency of these exciting coil and auxiliary exciting coil is Since the eddy current flows a lot and the reactance becomes large due to the large number of turns, it drops to 22Hz or less in a normal AC power supply. Therefore, when the output electron beam is swept on the evaporation surface, the energy density is varied on the evaporation surface, uniform evaporation is difficult, and the reproducibility of the vapor deposition film thickness distribution deteriorates. In particular, when a sublimate such as Cr is vapor-deposited, the substance at the irradiation point of the output electron beam sublimes. Therefore, it is desirable to increase the sweep frequency to prevent uneven distribution of evaporation in order to obtain a uniform film thickness distribution.

It is an object of the present invention to provide an electron beam evaporation source device that does not suffer from such a decrease in sweep frequency.

(Means for Solving the Problems) In the present invention, a crucible and an electron gun on the lower front side of the crucible are provided between a pair of left and right magnetic pole plates on both outer sides of an exciting coil and other exciter bodies. In the one in which the output electron beam is guided from the upper side of the front surface into the crucible that is bent by the action of the magnetic field between the magnetic pole plates, the first coil in which the left and right winding directions are changed to the annular core, An auxiliary coil is constructed by providing a second coil whose winding start is shifted from that of the first coil and whose left and right winding directions are changed, and guides the output electron beam to the crucible through the annular core of the auxiliary coil. By applying an alternating current to the first and second coils, the output electron beam is deflected forward, backward, leftward and rightward to solve the above problem.

(Operation) When the evaporation source device is installed in vacuum and the electron gun is operated, the electron beam output from this is guided into the crucible by the action of the magnetic field between the magnetic pole plates of the exciter, and the evaporation material in the crucible is evaporated. However, when the first and second coils of the auxiliary electron coil are energized, the output electron beam is swiftly deflected back and forth, right and left in the crucible at approximately the same frequency as the power supply frequency, and the energy density of the evaporation surface is reduced. The density is reduced, uniform evaporation can be performed, and a vapor deposition film having a uniform film thickness distribution can be formed.

(Embodiment) The first embodiment of the present invention will be described with reference to the attached drawings.
In FIG. 3 to FIG. 3, reference numeral (1) is an exciting body composed of an exciting coil or a permanent magnet, and (2) and (2) are provided on both outer sides of the exciting body (1) in the front-back direction. (1) A pair of magnetic pole plates excited by the N pole and the S pole by (1), (3) a crucible provided between the magnetic pole plates (2) and (2) for accommodating the vaporized substance (4), (5) ) Indicates an electron gun provided on the lower front side of the crucible (3), and the output electron beam (6) from the electron gun (5) is bent by the action of the magnetic fields of the magnetic pole plates (2) and (2). The evaporation material (4) was introduced into the crucible (3) from the front upper side so that the evaporation material (4) was heated and evaporated. Such a configuration is similar to the conventional one, and in order to heat the vaporized substance (4) with the output electron beam (6) as a whole, the output electron beam (6) is deflected forward, backward, leftward and rightward. 3), but if the frequency of the deflection, that is, the sweep frequency, is small at that time, the density of energy density varies on the evaporation surface of the evaporation material (4), and it becomes difficult to perform uniform evaporation. It is desirable to increase.

In the present invention, the output electron beam (6) is guided to the crucible (3) through the annular shape of the auxiliary coil (7) in order to satisfy such a demand, and the output electron beam (6) is connected to the first coil (8) of the auxiliary coil (7). An alternating current was applied to the second coil (9). The details of the auxiliary coil (7) are as shown in FIGS. 3 to 5, and the first coil (8) is obtained by changing the winding direction in the left and right halves of the annular core (10) as shown in FIG. Winding, and by overlapping it and changing the winding direction by left and right halves as shown in FIG. 5, and by shifting the winding position (11) of the first coil (8) by 90 °, for example, the second coil It is configured by winding (9). And the first
When an alternating current of, for example, 50 Hz is applied to the coil (8) and the second coil (9) from one or two power sources (12) and (12), an output electron beam (which is guided through the ring of the annular core (10) ( 6) is induced by a magnetic field generated by both coils (8) and (9) and is deflected back and forth and right and left in the crucible (3), and the direction of the magnetic field is small and the eddy current in the annular core (10) is small. Since it can be generated by reducing the number of turns of the coils (8) and (9), the direction of the magnetic field can be changed at a frequency substantially the same as the frequency of the power supplies (12) and (12).

Output electron beam (6) at the evaporation surface of the crucible (3)
The magnetic flux density of B ₂ is required for the auxiliary coil (7) in order to deflect or sweep in the X direction of FIG. 6, and the magnetic flux density of B ₁ is required for sweeping in the Y direction. By providing two coils (8) and (9) of different windings on one annular core (10), one auxiliary coil (7) can be used.
The magnetic flux density of B ₁ and B ₂ can be obtained, and each coil (8)
The sweep range in the X and Y directions can be controlled by changing the current value to (9).

The auxiliary coil (7) can also be used as an electron beam deflector of an electron beam irradiation device or an ion beam deflector of an ion implantation device.

(Effects of the Invention) As described above, according to the present invention, the output electron beam from the electron gun is displaced from the first coil in which the left and right winding directions are changed to the annular core and the winding start position is shifted and the left and right windings are wound. The second coil whose line direction was changed was guided to the crucible via the auxiliary coil configured by winding, and the alternating current was supplied to these first and second coils. Therefore, at the same frequency as the frequency of the alternating current. The output electron beam can be deflected back and forth and left and right inside the crucible, and the evaporation can be heated uniformly with reduced energy density, and the film thickness distribution of the evaporated film can be made uniform, and in particular evaporation of sublimates can be performed uniformly. There are advantages such as being advantageous.

[Brief description of drawings]

1 is an overall perspective view of an embodiment of the present invention, FIG. 2 is a sectional view taken along the line II-II of FIG. 1, FIG. 3 is a plan view of an auxiliary coil, and FIG.
FIG. 5 and FIG. 5 are explanatory diagrams of winding states of the first coil and the second coil of the auxiliary coil, and FIG. 6 is an explanatory diagram of a used state. (1) ... Exciter, (2) (2) ... Magnetic pole plate (3) ... Crucible, (5) ... Electron gun (6) ... Output electron beam, (7) ... Auxiliary coil (8) ... First coil, (9)… Second coil (10)… Annular iron core

Claims (1)

[Claims] 1. A crucible and an electron gun on the front lower side of the crucible are provided between a pair of left and right pole plates on both outer sides of an exciting coil and other exciters, and an electron beam output from the crucible is provided between the pole plates. In a structure in which the front side is guided from the upper side of the front surface into the crucible that is bent by the action of a magnetic field, a ring-shaped iron core is used with the first coil whose left and right winding directions are changed, and the winding start is the first coil. A second coil, which is shifted and whose left and right winding directions are changed, is provided to form an auxiliary coil, and the output electron beam is guided to the crucible through the annular core of the auxiliary coil, and each of the first and second coils is provided.
An electron beam evaporation source device, characterized in that the output electron beam is deflected forward, backward, leftward, and rightward by applying an alternating current to the coil.