KR20200144716A - Wet surface treatment method of nonconductive plastic - Google Patents

Wet surface treatment method of nonconductive plastic Download PDF

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KR20200144716A
KR20200144716A KR1020190072711A KR20190072711A KR20200144716A KR 20200144716 A KR20200144716 A KR 20200144716A KR 1020190072711 A KR1020190072711 A KR 1020190072711A KR 20190072711 A KR20190072711 A KR 20190072711A KR 20200144716 A KR20200144716 A KR 20200144716A
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conductive plastic
treatment
plastic
treatment method
metal
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KR102241457B1 (en
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김선영
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대영엔지니어링 주식회사
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    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition

Abstract

According to the present invention, a wet surface treatment method of nonconductive plastic comprises: a step of performing a surface modification treatment on the nonconductive plastic; a pre-dipping step of treating the surface-modified nonconductive plastic surface with hydrochloric acid, and controlling the surface pH and surface charge; a step of using at least one between an activation solution containing a precious metal colloid and an ionogenic precious metal activation solution on the surface of the pre-dipped nonconductive plastic to metalize the surface of the nonconductive plastic; and a step of plating the metalized surface of the nonconductive plastic to give conductivity to the surface of the nonconductive plastic.

Description

비 전도성 플라스틱의 습식 표면처리 방법{WET SURFACE TREATMENT METHOD OF NONCONDUCTIVE PLASTIC}Wet surface treatment method of non-conductive plastics{WET SURFACE TREATMENT METHOD OF NONCONDUCTIVE PLASTIC}

본 발명은 비 전도성 플라스틱의 습식 표면처리 방법에 관한 것이다.The present invention relates to a method for wet surface treatment of non-conductive plastics.

플라스틱 소재는 우리 생활에 광범위하게 사용되고 있지만, 제품을 고급화 할 수 있는 표면 처리 기술은 많지 않은 실정이다. Plastic materials are widely used in our daily lives, but there are not many surface treatment technologies that can enhance products.

플라스틱의 고급화를 위해 전착도장이 적용될 수 있다. 전착도장을 위해서는 비전도성 플라스틱 표면에 전도성을 부여하는 도금 공정이 필요하다.Electrodeposition coating can be applied to enhance the quality of plastic. Electrodeposition coating requires a plating process that imparts conductivity to the non-conductive plastic surface.

최근까지 플라스틱 도금은 비교적 화학적 에칭이 수월한 ABS 소재 및 PC/ABS 소재에만 주로 적용되고 있으며, PET, PU, PE, PS, PVC, PP, PC, PMMA 등의 소재에 대하여는 많은 연구가 진행되지 않고 있다. Until recently, plastic plating was mainly applied only to ABS materials and PC/ABS materials with relatively easy chemical etching, and much research has not been conducted on materials such as PET, PU, PE, PS, PVC, PP, PC, and PMMA. .

또한 기존 플라스틱 재료의 표면처리에 사용되는 크롬도금은 환경오염 문제와 높은 생산원가의 한계를 드러내고 있는 실정으로 플라스틱 소재의 크롬도금을 대신하는 신공법에 대한 요구가 증가되고 있는 추세이다.In addition, as chromium plating used for surface treatment of existing plastic materials reveals environmental pollution problems and high production cost limitations, there is a growing demand for a new method instead of chromium plating for plastic materials.

신공법중 하나인 건식표면처리기술은 금속피막층 두께를 기존의 방식보다 얇게 조절할 수 있는 장점이 있어 점차 그 응용범위가 늘어나고 있다.Dry surface treatment technology, which is one of the new methods, has the advantage of being able to control the thickness of the metal film layer to be thinner than that of the existing method, and its application range is gradually increasing.

하지만 건식표면처리기술에 의한 폴리머필름소재의 금속화 공정에서는 증착금속입자의 불균일성, 기공형성에 의한 불량 발생과 함께 생산 공정의 이원화에 의한 상대적으로 낮은 생산성과 고가의 설비투자 등 단점이 발생한다.However, in the metallization process of a polymer film material using dry surface treatment technology, there are disadvantages such as non-uniformity of the deposited metal particles, defects due to pore formation, and relatively low productivity and expensive equipment investment due to the dualization of the production process.

대한민국 공개특허 제2011-0029602호 (2011년 03월 23일 공개)Republic of Korea Patent Publication No. 2011-0029602 (published on March 23, 2011)

본 발명의 목적은 비 전도성 플라스틱의 습식 표면처리 방법을 제공하는 것이다. It is an object of the present invention to provide a method for wet surface treatment of non-conductive plastics.

본 발명은 비 전도성 플라스틱의 도금방법에 있어서, 상기 비 전도성 플라스틱 표면의 이물질을 제거하는 세정 단계; 상기 세정 단계 이 후 적어도 하나의 에칭 용액으로 상기 비 전도성 플라스틱을 표면 처리하는 단계; 상기 표면 처리된 비전도성 플라스틱 표면을 귀금속 콜로이드를 함유하는 활성 용액 및 이온성(ionogenic) 귀금속 활성 용액 중 적어도 어느 하나를 사용하여 금속화하는 단계; 및 상기 금속화된 상기 비 전도성 플라스틱 표면을 전도성 부여를 위해 도금 처리하는 단계를 포함하는 비 전도성 플라스틱의 표면특성 개선을 위한 도금방법에 관한 것이다.The present invention provides a method for plating a non-conductive plastic, comprising: a cleaning step of removing foreign substances from the surface of the non-conductive plastic; Surface-treating the non-conductive plastic with at least one etching solution after the cleaning step; Metallizing the surface-treated non-conductive plastic surface using at least one of an active solution containing a noble metal colloid and an ionic noble metal active solution; And plating the metallized surface of the non-conductive plastic to impart conductivity to a plating method for improving surface properties of a non-conductive plastic.

상기 세정 단계는, 상기 비 전도성 플라스틱을 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 순차적으로 처리하는 단계; 및 상기 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 처리 후, 초음파로 처리하는 단계를 포함할 수 있다.The cleaning step may include sequentially treating the non-conductive plastic in an acid bath and an alkali bath; And after treatment in the acid bath (Acid bath) and alkali bath (Alkali bath), it may include the step of ultrasonic treatment.

상기 산욕(Acid bath) 처리는 황산과 계면활성제(Surfactant)를 포함하는 용액에서 수행되며, 상기 알칼리 욕(Alkali bath) 처리는 수산화나트륨, 탄산나트륨, 인산3나트륨 및 계면활성제를 포함하는 용액에서 수행될 수 있다.The acid bath treatment is performed in a solution containing sulfuric acid and a surfactant, and the alkali bath treatment is performed in a solution containing sodium hydroxide, sodium carbonate, trisodium phosphate, and a surfactant. I can.

상기 표면 처리 단계는, 상기 세정 처리된 상기 비 전도성 플라스틱을 에칭 용액으로 1차 에칭 처리 하는 단계; 및 상기 1차 에칭 처리된 비 전도성 플라스틱에 금속염이 포함된 에칭 용액으로 2차 에칭 처리 하는 단계를 포함할 수 있다.The surface treatment step may include performing a primary etching treatment on the cleaned non-conductive plastic with an etching solution; And performing a second etching treatment with an etching solution containing a metal salt on the non-conductive plastic subjected to the first etching treatment.

상기 1차 에칭 처리 시 사용하는 에칭 용액은, (i) 적어도 하나의 산; 및 (ii) 알칼리 금속 과망간산염 및 알칼리 토금속 과망간산염으로부터 선택된 과망간산염 중 적어도 어느 하나를 포함할 수 있다.The etching solution used in the first etching treatment may include (i) at least one acid; And (ii) an alkali metal permanganate and an alkaline earth metal permanganate.

상기 2차 에칭 처리 시 사용하는 에칭 용액은, FeCl3, FeCl2, TiCl3, CaCl2, CuCl2, CrCl3, ZnCl2, MgCl2, MnCl2 및 Cr(NO3)3으로 이루어지는 군으로부터 선택되는 적어도 하나의 금속염을 포함할 수 있다.The etching solution used in the secondary etching treatment may include at least one metal salt selected from the group consisting of FeCl3, FeCl2, TiCl3, CaCl2, CuCl2, CrCl3, ZnCl2, MgCl2, MnCl2, and Cr(NO3)3. .

상기 표면 처리 단계 이 후, 상기 비 전도성 플라스틱 표면을 염산으로 처리하여, 표면 pH 및 표면전하를 조절하는 사전침적(Pre-dip) 단계를 더 포함할 수 있다.After the surface treatment step, a pre-dip step of controlling the surface pH and surface charge by treating the non-conductive plastic surface with hydrochloric acid may be further included.

상기 금속화 단계는, 상기 비 전도성 플라스틱 표면에 주석(Sn)을 흡착시키는 제1금속화 단계; 상기 제1단계 처리 후 팔라듐(Pd)을 흡착시키는 제2금속화단계; 및 상기 비 전도성 플라스틱 표면에 흡착된 상기 주석(Sn)을 제거하고 팔라듐(Pd)을 금속화하는 제3금속화단계를 포함할 수 있다.The metallization step may include: a first metallization step of adsorbing tin (Sn) on the surface of the non-conductive plastic; A second metallization step of adsorbing palladium (Pd) after the first step treatment; And a third metallization step of removing the tin (Sn) adsorbed on the surface of the non-conductive plastic and metallizing palladium (Pd).

상기 도금 처리 단계는, 무전해 도금공정에 의해 수행될 수 있다.The plating treatment step may be performed by an electroless plating process.

상기 비 전도성 플라스틱은, 폴리에틸렌테레프탈레이트(PET), 폴리우레탄(PU), 폴리에틸렌(PE), 폴리카보네이트(PC), 폴리염화비닐(PVC), 폴리스티렌(PS), 폴리메틸메타크릴레이트(PMMA) 및 폴리프로필렌(PP) 중 적어도 어느 하나를 포함할 수 있다.The non-conductive plastics are polyethylene terephthalate (PET), polyurethane (PU), polyethylene (PE), polycarbonate (PC), polyvinyl chloride (PVC), polystyrene (PS), polymethyl methacrylate (PMMA) And at least one of polypropylene (PP).

본 발명에 따르면 비 전도성 플라스틱의 습식 표면처리에 따라 균일한 금속피막층을 형성하여 전도성 부여 및 밀착성이 향상 될 수 있는 습식표면처리 방법이 제공된다. According to the present invention, there is provided a wet surface treatment method capable of providing conductivity and improving adhesion by forming a uniform metal film layer according to the wet surface treatment of a non-conductive plastic.

도 1은 본 발명의 일실시예에 따른 비 전도성 플라스틱의 습식 표면처리 방법을 나타낸 것이고,
도 2는 본 발명의 제1실시예에 따른 폴리프로필렌(PP)의 습식 표면처리(에칭 처리)에 따른 표면조직을 전자현미경으로 관찰한 실험예이며,
도 3은 본 발명의 제1실시예에 따른 폴리프로필렌(PP)의 습식 표면처리에 따른 접합력(밀착성) 평가결과를 나타낸 것이고,
도 4는 본 발명의 제2실시예에 따른 폴리프로필렌(PP)의 습식 표면처리(에칭 처리)에 따른 표면조직을 전자현미경으로 관찰한 실험예이며,
도 5는 본 발명의 제2실시예에 따른 폴리프로필렌(PP)의 습식 표면처리에 따른 접합력(밀착성) 평가결과를 나타낸 것이다.
1 shows a wet surface treatment method of a non-conductive plastic according to an embodiment of the present invention,
2 is an experimental example of observing the surface texture of polypropylene (PP) according to the wet surface treatment (etching treatment) according to the first embodiment of the present invention with an electron microscope,
3 shows the results of evaluation of bonding strength (adhesion) according to the wet surface treatment of polypropylene (PP) according to the first embodiment of the present invention,
4 is an experimental example of observing the surface structure of polypropylene (PP) according to the wet surface treatment (etching treatment) according to the second embodiment of the present invention with an electron microscope,
5 shows the results of evaluation of bonding strength (adhesion) according to the wet surface treatment of polypropylene (PP) according to the second embodiment of the present invention.

이하 첨부된 도면을 참조하여 본 발명의 실시예를 상세히 설명한다. 그러나 본 실시예는 이하에서 개시되는 실시예에 한정되는 것이 아니라 서로 다양한 형태로 구현될 수 있으며, 단지 본 실시예는 본 발명의 개시가 완전하도록 하며, 통상의 지식을 가진 자에게 발명의 범주를 완전하게 알려주기 위해 제공하는 것이다. 도면에서의 요소의 형상 등은 보다 명확한 설명을 위하여 과장되게 표현된 부분이 있을 수 있으며, 도면상에서 동일 부호로 표시된 요소는 동일 요소를 의미한다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present embodiment is not limited to the embodiments disclosed below, but may be implemented in various forms, only this embodiment makes the disclosure of the present invention complete, and the scope of the invention to those of ordinary skill It is provided to be fully informed. The shape of elements in the drawings may be exaggerated for more clear explanation, and elements indicated by the same reference numerals in the drawings mean the same elements.

도 1은 본 발명의 일실시예에 따른 비 전도성 플라스틱의 습식 표면처리 방법을 나타낸 것이다. 1 shows a wet surface treatment method of a non-conductive plastic according to an embodiment of the present invention.

본 발명의 일실시예에 따른 비 전도성 플라스틱의 표면특성 개선을 위한 방법(이하, “ 본 발명 방법”이라고 한다)에 있어서, 대상이 되는 플라스틱은 폴리에틸렌테레프탈레이트(PET), 폴리우레탄(PU), 폴리에틸렌(PE), 폴리카보네이트(PC), 폴리염화비닐(PVC), 폴리스티렌(PS), 폴리메틸메타크릴레이트(PMMA) 및 폴리프로필렌(PP) 중 적어도 어느 하나를 포함한다. In the method for improving the surface characteristics of a non-conductive plastic according to an embodiment of the present invention (hereinafter referred to as “the method of the present invention”), the target plastic is polyethylene terephthalate (PET), polyurethane (PU), Polyethylene (PE), polycarbonate (PC), polyvinyl chloride (PVC), polystyrene (PS), polymethyl methacrylate (PMMA), and at least one of polypropylene (PP).

비 전도성 플라스틱의 습식 표면처리 방법에 있어, 먼저 비 전도성 플라스틱의 표면 개질을 위한 표면개질 처리 단계(S1)를 수행한다.In the wet surface treatment method of a non-conductive plastic, first, a surface modification treatment step (S1) for surface modification of the non-conductive plastic is performed.

표면개질 처리 단계(S1)는 비 전도성 플라스틱의 표면의 오염물질을 제거하는 세정 단계(S1-1); 세정 단계 이 후 에칭 용액으로 에칭 처리하는 에칭 처리 단계(S1-2); 및 에칭 처리된 비 전도성 플라스틱의 표면 거칠기를 조절하는 표면 거칠기 조절 단계(S1-3)를 통해 수행된다. The surface modification treatment step (S1) includes a cleaning step (S1-1) of removing contaminants from the surface of the non-conductive plastic; An etching treatment step of etching with an etching solution after the cleaning step (S1-2); And a surface roughness adjusting step (S1-3) of adjusting the surface roughness of the etched non-conductive plastic.

세정 단계(S1-1)는, 소재 제조공정상 존재하는 부산물이나 취급시 표면의 오염물질을 제거하는 전처리 과정에 해당하며, 비 전도성 플라스틱을 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 순차적으로 처리하는 단계(S1-1-1); 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 처리 후 초음파로 처리하는 단계(S1-1-2)를 통해 수행된다. The cleaning step (S1-1) corresponds to a pretreatment process of removing by-products present in the material manufacturing process or contaminants on the surface during handling, and non-conductive plastics are sequentially treated in an acid bath and an alkali bath. Processing step (S1-1-1); It is carried out through a step (S1-1-2) of ultrasonic treatment after treatment in an acid bath and an alkali bath.

산욕(Acid bath) 처리는 황산(H2SO4)과 계면활성제(Surfactant)를 포함하는 용액에서 30 내지 100℃에서, 10분 내지 40분간 수행될 수 있다. 구체적으로는 황산(H2SO4) 400 내지 600 ml/L 및 계면활성제 0.5 내지 3 g/L를 혼합한 수용액을 준비하고, 50 내지 85℃에서, 15 내지 30분 동안 처리할 수 있다.Acid bath treatment may be performed in a solution containing sulfuric acid (H 2 SO 4 ) and a surfactant (Surfactant) at 30 to 100° C. for 10 to 40 minutes. Specifically, an aqueous solution in which 400 to 600 ml/L of sulfuric acid (H 2 SO 4 ) and 0.5 to 3 g/L of a surfactant are mixed may be prepared and treated at 50 to 85°C for 15 to 30 minutes.

산욕(Acid bath) 처리 이후 알칼리 욕(Alkali bath)에서 비 전도성 플라스틱을 처리하게 되는데, 알칼리 욕(Alkali bath) 처리는 수산화나트륨(NaOH), 탄산나트륨(Na2CO3), 인산3나트륨(Na3FO4) 및 계면활성제를 포함하는 용액에서 30 내지 100℃에서, 10분 내지 40분간 수행될 수 있다. 구체적으로는 수산화나트륨(NaOH) 25 내지 45 g/L, 탄산나트륨(Na2CO3) 20 내지 40 g/L, 인산3나트륨(Na3FO4) 20 내지 40 g/L 및 계면활성제 3 내지 7 g/L를 포함한 수용액을 준비하고, 50 내지 85℃에서, 15 내지 30분 처리할 수 있다.After the acid bath treatment, the non-conductive plastic is treated in an alkali bath, and the alkali bath treatment is performed with sodium hydroxide (NaOH), sodium carbonate (Na 2 CO 3 ), and trisodium phosphate (Na 3). FO 4 ) and in a solution containing a surfactant at 30 to 100° C., it may be performed for 10 to 40 minutes. Specifically, sodium hydroxide (NaOH) 25 to 45 g/L, sodium carbonate (Na 2 CO 3 ) 20 to 40 g/L, trisodium phosphate (Na 3 FO 4 ) 20 to 40 g/L, and surfactant 3 to 7 An aqueous solution containing g/L may be prepared and treated at 50 to 85°C for 15 to 30 minutes.

비 전도성 플라스틱을 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 순차적으로 처리한 이후에는 초음파를 이용한 세정 단계(S1-1-2)를 수행한다.After sequentially treating the non-conductive plastic in an acid bath and an alkali bath, a cleaning step (S1-1-2) using ultrasonic waves is performed.

초음파를 이용한 세정 단계는, 초음파 배쓰(bath)에서 수행되며, 1 내지 30 분, 바람직하게는 2 내지 20 분 및 더욱 바람직하게는 5 내지 15 분 동안 수행된다. The cleaning step using ultrasonic waves is carried out in an ultrasonic bath, and is carried out for 1 to 30 minutes, preferably 2 to 20 minutes and more preferably 5 to 15 minutes.

초음파 배쓰(bath)는 40 내지 60 와트/L 범위의 전력으로, 40 내지 60℃의 온도에서 비 전도성 플라스틱 표면의 이물질을 제거하게 된다. The ultrasonic bath is a power in the range of 40 to 60 watts/L and removes foreign matter from the surface of the non-conductive plastic at a temperature of 40 to 60°C.

(도시되어 있지는 않지만) 초음파 세정 후 수성 헹굼 용액으로 처리하는 단계가 추가로 수행 될 수 있다. Treatment with an aqueous rinse solution after ultrasonic cleaning (though not shown) may be additionally performed.

수성 헹굼 용액은 유기용매를 포함하며, 유기용매의 함량은 2중량% 내지 15%중량%일 수 있다. The aqueous rinse solution contains an organic solvent, and the content of the organic solvent may be 2% to 15% by weight.

유기 용매는 알코올 또는 디메틸 술폭시드 (DMSO) 와 같은 공지된 극성 수-혼화성 용매이거나, 메탄올, 에탄올 또는 프로판올과 같은 수-혼화성 알코올일 수 있다.The organic solvent may be a known polar water-miscible solvent such as alcohol or dimethyl sulfoxide (DMSO), or may be a water-miscible alcohol such as methanol, ethanol or propanol.

다른 실시예에서는 비 전도성 플라스틱의 표면 상태가 양호할 경우 에탄올이나 아세톤을 사용한 간단한 세척만으로 세정 단계를 대신할 수도 있다. 또한 초음파를 사용하는 대신에 세정 효과를 높이기 위해 수세수를 분사하거나, 수세수 분사와 동시에 진동 교반을 통해 세정 단계를 수행 할 수도 있다. In another embodiment, when the surface condition of the non-conductive plastic is good, the cleaning step may be replaced with only simple washing with ethanol or acetone. In addition, instead of using ultrasonic waves, washing water may be sprayed to increase the cleaning effect, or the washing step may be performed by vibrating agitation simultaneously with the washing water injection.

세정 단계 이후 비 전도성 플라스틱을 에칭 용액으로 에칭 처리하는 에칭 처리 단계(S1-2)를 수행 한다.After the cleaning step, an etching treatment step (S1-2) of etching the non-conductive plastic with an etching solution is performed.

에칭 처리 단계(S1-2)는 비 전도성 플라스틱 표면에 화학적으로는 카르복실기나 아민기 등의 기능적 그룹(functional group)을 생성시켜 친수성을 부여하는 것이고, 물리적으로는 스웰링(swelling) 또는 표면 조면화(anchoring)을 통해 비 전도성 플라스틱 표면에 더 많은 금속이온이 흡착 될 수 있도록 흡착 사이트(site)를 제공하는 것이다. The etching treatment step (S1-2) is to impart hydrophilicity by chemically creating functional groups such as carboxyl groups or amine groups on the surface of non-conductive plastics, and physically swelling or surface roughening An adsorption site is provided so that more metal ions can be adsorbed on the non-conductive plastic surface through (anchoring).

에칭 처리 단계(S1-2)는 세정 단계(S1-1)를 통해 표면의 이물질이 제거된 비 전도성 플라스틱에 에칭 용액을 처리하는 것으로서, 크롬산(CrO3) 및 황산(H2SO4)을 포함하는 수용액에서 30 내지 100℃에서, 10분 내지 60분 동안 수행될 수 있다. 예를 들어, 크롬산(CrO3) 30 내지 60 g/L 및 황산(H2SO4) 300 내지 600 ml/L를 혼합한 수용액을 준비하고, 50 내지 85℃에서, 25 내지 35분 동안 수행한다.The etching treatment step (S1-2) is to treat the etching solution on the non-conductive plastic from which foreign matters on the surface have been removed through the cleaning step (S1-1), and includes chromic acid (CrO 3 ) and sulfuric acid (H 2 SO 4 ). It can be carried out for 10 to 60 minutes at 30 to 100 ℃ in an aqueous solution. For example, an aqueous solution of chromic acid (CrO 3 ) 30 to 60 g/L and sulfuric acid (H 2 SO 4 ) 300 to 600 ml/L is prepared and carried out at 50 to 85° C. for 25 to 35 minutes. .

에칭 처리 될 비 전도성 플라스틱 표면의 축축함(moistening)을 향상시키기 위해서, 에칭 용액은 습윤제를 더 함유할 수 있다. 습윤제의 농도는 당업자에 의해 적절히 조절하여 사용될 수 있다.In order to improve the moistening of the non-conductive plastic surface to be etched, the etching solution may further contain a wetting agent. The concentration of the wetting agent can be appropriately adjusted and used by a person skilled in the art.

본 발명의 일실시예에서는 에칭 용액으로 크롬산(CrO3) 및 황산(H2SO4)을 포함하는 용액을 사용하여 에칭 처리 하고 있으나, 다른 실시예에서는 (i) 적어도 하나의 산; 및/또는 (ii) 알칼리 금속 과망간산염 및 알칼리 토금속 과망간산염으로부터 선택된 적어도 하나의 과망간산염을 포함하는 에칭 용액의 처리를 통해 수행할 수도 있다. In one embodiment of the present invention, etching is performed using a solution containing chromic acid (CrO 3 ) and sulfuric acid (H 2 SO 4 ) as an etching solution, but in another embodiment, (i) at least one acid; And/or (ii) an etching solution containing at least one permanganate selected from alkali metal permanganate and alkaline earth metal permanganate.

산을 사용할 경우, 무기산을 사용하며, 무기산은 황산, 질산 및 인산으로 이루어지는 군에서 선택된 적어도 하나가 사용된다.When an acid is used, an inorganic acid is used, and the inorganic acid is at least one selected from the group consisting of sulfuric acid, nitric acid, and phosphoric acid.

과망간산염을 사용할 경우, 알칼리 금속 과망간산염은 과망간산 칼륨, 과망간산 나트륨, 과망간산 리튬 및 과망간산 루비듐 중 어느 하나를 사용할 수 있으며, 특히, 과망간산 칼륨 또는 과망간산 나트륨을 사용할 수 있다. 알칼리 토금속 과망간산염은 과망간산 마그네슘 및 과망간산 칼슘을 사용한다. When using a permanganate, the alkali metal permanganate may be any one of potassium permanganate, sodium permanganate, lithium permanganate, and rubidium permanganate, and in particular, potassium permanganate or sodium permanganate may be used. As alkaline earth metal permanganate, magnesium permanganate and calcium permanganate are used.

에칭 처리 단계(S1-2) 이 후, 비 전도성 플라스틱 표면의 표면 거칠기를 조절하는 표면 거칠기 조절 단계(S1-3)를 수행한다.After the etching treatment step (S1-2), a surface roughness adjusting step (S1-3) of adjusting the surface roughness of the non-conductive plastic surface is performed.

표면 거칠기 조절 단계(S1-3)는 에칭 처리된 플라스틱 표면을 팽윤(Swelling)처리 하거나 또는 플라스틱 표면을 조면화(Anchoring)시켜 플라스틱 표면의 거칠기를 조절하게 된다. In the surface roughness adjustment step (S1-3), the etched plastic surface is swelled or the plastic surface is anchored to adjust the roughness of the plastic surface.

표면 거칠기 조절 단계(S1-3)에 의해 플라스틱의 표면에는 관능기, 구체적으로는 히드록실기, 카르복실기 등의 친수성의 관능기가 부여되며, 금속이온의 흡착을 용이하게 하고, 동시에 플라스틱 표면에 미세한 공동을 형성시켜 표면 거칠기(roughness)를 높여 석출된 금속피막과 플라스틱 표면간의 밀착력을 향상시키게 된다.By the surface roughness control step (S1-3), a functional group, specifically, a hydrophilic functional group such as a hydroxyl group or a carboxyl group, is given to the surface of the plastic, facilitating the adsorption of metal ions, and at the same time creating a fine cavity on the plastic surface. It is formed to increase the surface roughness to improve the adhesion between the deposited metal film and the plastic surface.

표면 처리 단계(S1) 이 후, 비 전도성 플라스틱 표면을 염산으로 처리하여, 표면 pH 및 표면전하를 조절하는 사전침적(Pre-dip) 단계(S2)를 수행한다.After the surface treatment step (S1), a pre-dip step (S2) of controlling the surface pH and surface charge is performed by treating the surface of the non-conductive plastic with hydrochloric acid.

표면 처리 단계(S1)를 통해 플라스틱 표면은 오염물이 제거되며, 에칭에 의해 친수성이 부여되고, 표면 거칠기 조절에 의해 플라스틱 표면이 개질된다. 이때 개질된 표면 대부분은 alkali를 띄게 되며, 이후 공정의 불안정성을 야기 시키게 된다. Contaminants are removed from the plastic surface through the surface treatment step (S1), hydrophilicity is imparted by etching, and the plastic surface is modified by adjusting the surface roughness. At this time, most of the modified surface has alkali, which causes instability of the subsequent process.

사전침적(Pre-dip) 단계(S2)는 이러한 불안정성 해결을 위해 비 전도성 플라스틱 표면을 염산으로 처리하며, 표면의 pH 및 표면전하(charge)를 조절하게 된다. In the pre-dip step (S2), the non-conductive plastic surface is treated with hydrochloric acid to resolve this instability, and the pH and surface charge of the surface are adjusted.

사전침적(Pre-dip) 단계(S2)에 따른 표면 pH 및 표면전하(charge) 조절에 의해, 귀금속 촉매의 안정성을 부여하며, 촉매입자의 흡착 효율을 상승시킬 수 있게 된다. By controlling the surface pH and surface charge according to the pre-dip step (S2), the stability of the noble metal catalyst is provided and the adsorption efficiency of the catalyst particles can be increased.

사전침적(Pre-dip)을 위해 처리되는 염산 농도는 비이온수 1리터당 200 내지 400g의 염산, 및 염화나트륨 또는 염화칼륨의 화합물을 포함하며, 처리조건은 상온에서 1 내지 5분일 수 있다.The concentration of hydrochloric acid treated for pre-dip includes 200 to 400 g of hydrochloric acid per liter of non-ionized water, and a compound of sodium chloride or potassium chloride, and the treatment conditions may be 1 to 5 minutes at room temperature.

사전침적(Pre-dip) 단계(S2) 이 후 비 전도성 플라스틱 표면을 귀금속 콜로이드를 함유하는 활성 용액 및 이온성(ionogenic) 귀금속 활성 용액 중 적어도 어느 하나를 사용하여 금속화하는 단계(S3)를 수행하게 된다. After the pre-dip step (S2), a step (S3) of metallizing the non-conductive plastic surface using at least one of an active solution containing a noble metal colloid and an ionic noble metal active solution (S3) is performed. Is done.

금속화 단계(S3)는, 비 전도성 플라스틱 표면에 주석(Sn)을 흡착시키는 제1금속화 단계(S3-1); 상기 제1단계 처리 후 팔라듐(Pd)을 흡착시키는 제2금속화단계(S3-2); 및 상기 비 전도성 플라스틱 표면에 흡착된 상기 주석(Sn)을 제거하고 팔라듐(Pd)을 금속화하는 제3금속화단계(S3-3)를 통해 수행된다. The metallization step (S3) may include a first metallization step (S3-1) of adsorbing tin (Sn) on the non-conductive plastic surface; A second metallization step (S3-2) of adsorbing palladium (Pd) after the first step treatment; And a third metallization step (S3-3) of removing the tin (Sn) adsorbed on the non-conductive plastic surface and metallizing palladium (Pd).

금속화 단계(S3)는 촉매화 처리 공정(촉매 활성화 공정)을 의미하며, 후속공정인 도금층의 형성을 원활하게 수행하기 위한 것으로, 이는 비 전도성 플라스틱 표면에 주석(Sn) 및 팔라듐(Pd)과 같은 귀금속을 흡착시키는 과정에 의해 수행된다.The metallization step (S3) refers to a catalytic treatment process (catalyst activation process), and is to smoothly perform the formation of a plating layer, which is a subsequent process. It is carried out by the process of adsorbing the same precious metal.

제1금속화 단계(S3-1)는 비 전도성 플라스틱 표면에 주석(Sn)을 흡착시키는 것으로, 염화주석(SnCl2), 염산(HCl) 및 황산(H2SO4)을 포함하는 수용액에서 30 내지 100℃에서, 10분 내지 60분 동안 수행될 수 있다. 예를 들어, 염화주석(SnCl2) 30 내지 60 g/L, 염산(HCl) 30 내지 60 ml/L 및 황산(H2SO4) 10 내지 40 ml/L을 혼합한 수용액을 준비하고, 50 내지 80℃에서, 35 내지 45분 동안 침지 처리한다.The first metallization step (S3-1) is to adsorb tin (Sn) on the surface of a non-conductive plastic, in an aqueous solution containing tin chloride (SnCl 2 ), hydrochloric acid (HCl), and sulfuric acid (H 2 SO 4 ). At to 100 ℃, it can be carried out for 10 minutes to 60 minutes. For example, a mixture of tin chloride (SnCl 2 ) 30 to 60 g/L, hydrochloric acid (HCl) 30 to 60 ml/L and sulfuric acid (H 2 SO 4 ) 10 to 40 ml/L was prepared, and 50 At -80°C, the immersion treatment is performed for 35 to 45 minutes.

제2금속화 단계(S3-2)는 비 전도성 플라스틱 표면에 팔라듐(Pd)를 흡착시키는 것으로, 염화팔라듐(PdCl2) 및 염산(HCl)을 포함하는 수용액에서 10 내지 35℃, pH 2 내지 5 및 5분 내지 30분 동안 수행될 수 있다. 예를 들어, 염화팔라듐(PdCl2) 1 내지 5 g/L 및 염산(HCl) 55 내지 95 ml/L를 혼합한 수용액을 15 내지 25℃ 및 pH 2.5 내지 4.5에서 10분 내지 20분간 침지 처리한다.The second metallization step (S3-2) is to adsorb palladium (Pd) on the non-conductive plastic surface, in an aqueous solution containing palladium chloride (PdCl 2 ) and hydrochloric acid (HCl) at 10 to 35°C, pH 2 to 5 And 5 to 30 minutes. For example, an aqueous solution of palladium chloride (PdCl 2 ) 1 to 5 g/L and hydrochloric acid (HCl) 55 to 95 ml/L is immersed at 15 to 25°C and pH 2.5 to 4.5 for 10 to 20 minutes. .

제3금속화 단계(S3-3)는 제2금속화 단계(S3-2)를 통한 금속성분의 흡착과정에 존재하게 되는 불순물인 주석(Sn)을 제거하고 팔라듐(Pd)을 금속화하여, 플라스틱 표면에 Pd0만 존재하도록 하여 이후 공정인 도금 처리 단계에서 금속촉매 역할을 하도록 수행하는 공정이다. 이때 주석(Sn) 제거를 위해 황산(H2SO4) 베이스의 용액에서 20 내지 35℃에서, 1 내지 10분 동안 처리한다.The third metallization step (S3-3) removes tin (Sn), which is an impurity present in the adsorption process of the metal component through the second metallization step (S3-2), and metallizes palladium (Pd), This is a process in which only Pd 0 is present on the plastic surface to act as a metal catalyst in the subsequent plating process step. At this time, in a sulfuric acid (H 2 SO 4 )-based solution to remove tin (Sn), it is treated at 20 to 35° C. for 1 to 10 minutes.

금속화 단계(S3) 이 후, 비 전도성 플라스틱 표면을 전도성 부여를 위한 도금 처리 단계(S4)를 수행한다. 도금 처리 단계(S4)는 무전해 도금공정에 의해 수행된다. After the metallization step (S3), a plating treatment step (S4) for imparting conductivity to the non-conductive plastic surface is performed. The plating treatment step S4 is performed by an electroless plating process.

무전해 도금공정은 비 전도성 플라스틱의 표면에 제1금속으로 이루어지는 제1도금층을 형성하는 단계(S4-1); 제1금속 도금층위에 제2금속으로 이루어지는 적어도 1층 이상의 제2도금층을 형성하는 단계(S4-2); 및 도금층이 형성된 비 전도성 플라스틱을 건조하는 단계(S4-3)에 의해 수행된다. The electroless plating process includes forming a first plating layer made of a first metal on a surface of a non-conductive plastic (S4-1); Forming at least one or more second plating layers made of a second metal on the first metal plating layer (S4-2); And drying the non-conductive plastic on which the plating layer is formed (S4-3).

제1도금층을 형성하는 단계(S4-1)에서 제1금속은 니켈 및/또는 구리이며, 니켈만 사용될 수도 있다.In the step of forming the first plating layer (S4-1), the first metal is nickel and/or copper, and only nickel may be used.

제1금속 도금층은 50ml/L EN800NB-M(영진플라켐, 한국), 50ml/L EN8000NB-N(영진플라켐, 한국) 및 50ml/L EN8000NB-B(영진플라켐, 한국) 로 이루어진 도금액으로 60 내지 90℃에서 1분 내지 20분 동안 무전해 도금시켜 형성할 수 있다. 제1금속 도금층은 하지금속층으로서 기능하게 된다. The first metal plating layer is a plating solution consisting of 50ml/L EN800NB-M (Youngjin Plachem, Korea), 50ml/L EN8000NB-N (Youngjin Plachem, Korea) and 50ml/L EN8000NB-B (Youngjin Plachem, Korea). It can be formed by electroless plating at 60 to 90° C. for 1 to 20 minutes. The first metal plating layer functions as a base metal layer.

제2금속 도금층을 형성하는 단계(S4-2)에서 제2금속 도금층은 제1금속 도금층의 상부에 형성된다. 제2금속은 니켈, 구리, 아연 및 크롬으로 이루어진 군에서 선택되는 적어도 어느 하나이며, 구체적으로는 니켈이 사용될 수 있다.In the step of forming the second metal plating layer (S4-2), the second metal plating layer is formed on the first metal plating layer. The second metal is at least one selected from the group consisting of nickel, copper, zinc, and chromium, and specifically, nickel may be used.

제2금속 도금층은 최종적으로 얻게 되는 플라스틱의 표면조도를 조절하기 위한 공정이다. 바람직하게는 무전해 금속도금 공정을 이용하여 적어도 2층 이상의 도금층을 형성하는 것이 좋다. The second metal plating layer is a process for controlling the surface roughness of the finally obtained plastic. Preferably, at least two or more plating layers are formed by using an electroless metal plating process.

예를 들어, 제2 도금층은 60ml/L ENCHEM M-2001-A(윈스타코리아, 한국)과 150ml/L ENCHEM M-2001-B(윈스타코리아, 한국)로 이루어진 도금액을 60 내지 90℃에서, 1분 내지 20분 동안 무전해 도금시켜 형성할 수 있다.For example, the second plating layer is a plating solution consisting of 60ml/L ENCHEM M-2001-A (Winstar Korea, Korea) and 150ml/L ENCHEM M-2001-B (Winstar Korea, Korea) at 60 to 90°C. , It can be formed by electroless plating for 1 minute to 20 minutes.

플라스틱을 건조하는 단계(S4-3)는 도금층이 형성된 비 전도성 플라스틱을 80 내지 90℃에서, 30 내지 60분간 열풍에 의해 건조에 의해 수행된다. Drying the plastic (S4-3) is performed by drying the non-conductive plastic on which the plating layer is formed by hot air at 80 to 90°C for 30 to 60 minutes.

플라스틱 표면의 금속화에 전기 금속 도금(다이렉트 플레이팅)을 이용하는 다른 실시예의 경우에는, 촉매 부여 처리액으로 촉매를 부여한 후에, 동이온을 함유하는 pH 7이상, 바람직하게는 pH 12이상의 활성화 처리액으로 처리한다. In the case of another embodiment in which electroplating (direct plating) is used for metallization of the plastic surface, after applying the catalyst with the catalyst-imparting treatment liquid, the activation treatment liquid containing copper ions having a pH of 7 or more, preferably pH 12 or more. Treated with

동이온을 함유하는 처리액은 황산동일 수 있다. 활성화 처리액으로 플라스틱 표면을 처리하기 위해서, 활성화 처리액의 온도를 0 내지 60℃, 바람직하게는 30 내지 50℃로 하고, 플라스틱을 1 내지 20분간 바람직하게는 2 내지 5분간 침지시켜 처리한다.The treatment liquid containing copper ions may be copper sulfate. In order to treat the plastic surface with the activation treatment liquid, the temperature of the activation treatment liquid is set to 0 to 60°C, preferably 30 to 50°C, and the plastic is immersed for 1 to 20 minutes, preferably 2 to 5 minutes.

본 발명에 따르면 비 전도성 플라스틱의 습식 표면처리에 따라 균일한 금속피막층을 형성하여 전도성 부여 및 밀착성이 향상 될 수 있는 습식표면처리 방법이 제공된다. 따라서 본 발명에 의해 얻어지는 플라스틱은 전자, 전기 통신부품, 음향 영상 부품, 자동차 부품 및 기계 부품 등에서 표면에 금속표면이 요구될 때 사용될 수 있다.According to the present invention, there is provided a wet surface treatment method capable of providing conductivity and improving adhesion by forming a uniform metal film layer according to the wet surface treatment of a non-conductive plastic. Therefore, the plastic obtained by the present invention can be used when a metal surface is required on the surface of electronic, telecommunication parts, sound image parts, automobile parts and mechanical parts.

이하, 실시예를 들어 본 발명을 보다 상세히 설명한다. 단, 하기 실시예는 본 발명의 이해를 돕기 위해 예시하는 것일 뿐, 본 발명의 권리범위가 하기 실시예에 의해 한정되는 것은 아니다. Hereinafter, the present invention will be described in more detail with reference to examples. However, the following examples are merely illustrative to aid understanding of the present invention, and the scope of the present invention is not limited by the following examples.

실시예 1 Example 1

폴리프로필렌(PP)(Japan Polychem, Inc. 제)의 표면 개질을 위해 표면 처리하였다. 표면 처리는 순차적으로 황산(H2SO4) 500 ml/L, 물(H2O) 500 ml/L 및 계면활성제 1~2 g/L를 혼합한 수용액을 준비하고, 70℃에서, 20분 동안 산욕(Acid bath) 처리 하였다. 이 후 수산화나트륨(NaOH) 35 g/L, 탄산나트륨(Na2CO3) 30 g/L, 인산3나트륨(Na3FO4) 30 g/L 및 계면활성제 5 g/L를 혼합한 용액을 준비하고, 70℃에서, 20분 동안 알칼리 욕(Alkali bath) 처리하였다. 산욕(Acid bath) 및 알칼리 욕(Alkali bath) 처리 후 전력 50와트/L, 50℃에서, 10분 동안 초음파를 이용한 세정을 수행하였다. 위와 같은 세정 단계에 의해 플라스틱 표면에 묻은 오염물(이물질)을 제거하였다. The surface was treated for surface modification of polypropylene (PP) (manufactured by Japan Polychem, Inc.). Surface treatment was sequentially prepared an aqueous solution in which sulfuric acid (H 2 SO 4 ) 500 ml/L, water (H 2 O) 500 ml/L, and surfactant 1 to 2 g/L were mixed, and at 70° C., 20 minutes During the acid bath (Acid bath) treatment. After this, a solution of 35 g/L of sodium hydroxide (NaOH), 30 g/L of sodium carbonate (Na 2 CO 3 ), 30 g/L of trisodium phosphate (Na 3 FO 4 ) and 5 g/L of a surfactant was prepared. And, at 70° C., an alkali bath was treated for 20 minutes. After treatment with an acid bath and an alkali bath, washing was performed using ultrasonic waves at 50 watts/L and 50° C. for 10 minutes. Contaminants (foreign substances) on the plastic surface were removed by the above cleaning step.

다음으로 크롬산(CrO3) 38 g/L, 물(H2O) 550 ml/L 및 황산(H2SO4) 450 ml/L를 혼합한 수용액을 준비하고, 온도 76℃, 시간 30분 동안 에칭 처리 하였다. 에칭 처리된 플라스틱 표면을 팽윤(Swelling)처리 또는 플라스틱 표면을 조면화(Anchoring)시켜 플라스틱 표면의 거칠기를 조절하여 표면 처리 단계를 마무리 하였다. 폴리프로필렌(PP)의 습식 표면처리(에칭 처리)에 따른 표면조직을 전자현미경으로 관찰하고, 이를 도 2에 나타내었다.Next, a mixture of chromic acid (CrO 3 ) 38 g/L, water (H 2 O) 550 ml/L and sulfuric acid (H 2 SO 4 ) 450 ml/L was prepared, and the temperature was 76° C. for 30 minutes. Etched. The surface treatment step was completed by controlling the roughness of the plastic surface by swelling the etched plastic surface or anchoring the plastic surface. The surface structure according to the wet surface treatment (etching treatment) of polypropylene (PP) was observed with an electron microscope, and it is shown in FIG. 2.

도 2에 나타난 바와 같이, 에칭 처리 후 표면조직 관찰 결과 섬유조직과 같은 그물 형태로 균일하게 표면조면화가 형성되었다. As shown in FIG. 2, as a result of observing the surface texture after the etching treatment, the surface roughening was uniformly formed in a net shape such as a fiber structure.

표면 처리 이후 세정, 에칭 및 거칠기가 조절된 플라스틱 표면을 염산으로 처리하여, 표면 pH 및 표면전하를 조절하는 사전침적(Pre-dip)을 수행하였다. 사전침적(Pre-dip)을 위해 비이온수 1리터당 300g의 염산, 및 염화나트륨 또는 염화칼륨의 화합물을 처리하였으며, 처리조건은 상온에서 3분동안 수행되었다. After the surface treatment, the surface of the plastic in which the cleaning, etching, and roughness were adjusted was treated with hydrochloric acid to perform pre-dip to control the surface pH and surface charge. For pre-dip, 300 g of hydrochloric acid per 1 liter of non-ionized water and a compound of sodium chloride or potassium chloride were treated, and the treatment conditions were performed at room temperature for 3 minutes.

사전침적(Pre-dip)된 플라스틱 플라스틱의 표면을 금속화하기 위해, 염화주석(SnCl2) 40 g/L, 염산(HCl) 40 ml/L, 황산(H2SO4) 20 ml/L 및 물(H2O) 900 ml/L를 혼합한 수용액을 준비하고, 70℃에서, 40분 동안 침지 처리하는 제1금속화 단계를 수행하였다. To metallize the surface of pre-dip plastic plastic, tin chloride (SnCl 2 ) 40 g/L, hydrochloric acid (HCl) 40 ml/L, sulfuric acid (H 2 SO 4 ) 20 ml/L and An aqueous solution in which 900 ml/L of water (H 2 O) was mixed was prepared, and a first metallization step of immersion treatment was performed at 70° C. for 40 minutes.

제1금속화 단계 이후, 염화팔라듐(PdCl2) 3 g/L, 염산(HCl) 75 ml/L 및 물(H2O) 922 ml/L를 혼합한 수용액을 준비하고, 온도 20℃, pH 3.5 및 15분간 침지 처리하는 제2금속화 단계를 수행하였다. After the first metallization step, a mixture of palladium chloride (PdCl 2 ) 3 g/L, hydrochloric acid (HCl) 75 ml/L and water (H 2 O) 922 ml/L was prepared, and a temperature of 20° C., pH A second metallization step of 3.5 and 15 minutes immersion was performed.

제2금속화 단계 수행 이후, 금속성분의 흡착과정에 존재하게 되는 불순물인 주석(Sn)을 제거하기 위해 황산(H2SO4) 베이스의 용액에서 30℃에서, 5분분 동안 처리하였다.(제3금속화 단계)After the second metallization step was performed, in order to remove tin (Sn), which is an impurity present in the adsorption process of the metal component, in a sulfuric acid (H 2 SO 4 )-based solution at 30°C for 5 minutes. 3 metallization steps)

위와 같은 단계에 의해 금속화까지 완료된 플라스틱의 표면에 50ml/L EN800NB-M(영진플라켐, 한국), 50ml/L EN8000NB-N(영진플라켐, 한국) 및 50ml/L EN8000NB-B(영진플라켐, 한국)로 이루어진 도금액을 80℃에서, 10분 동안 무전해 도금공정을 수행하여 니켈하지도금층을 형성하였다. 후속공정으로 니켈하지도금층 상부에 60ml/L ENCHEM M-2001-A(윈스타코리아, 한국)과 150ml/L ENCHEM M-2001-B(윈스타코리아, 한국)로 이루어진 도금액을 80℃에서, 10분 동안 무전해 도금공정을 수행하여 2차 니켈 도금층을 형성하였다. 85℃에서, 40분간 열풍 건조하였다.50ml/L EN800NB-M (Youngjin Plachem, Korea), 50ml/L EN8000NB-N (Youngjin Plachem, Korea) and 50ml/L EN8000NB-B (Youngjin Pla-Chem, Korea) on the surface of the plastic that has been metallized by the above steps. Chem, Korea) was subjected to an electroless plating process at 80° C. for 10 minutes to form a nickel base plated layer. As a follow-up process, a plating solution consisting of 60ml/L ENCHEM M-2001-A (Winstar Korea, Korea) and 150ml/L ENCHEM M-2001-B (Winstar Korea, Korea) was applied at 80℃ to 10 A secondary nickel plating layer was formed by performing an electroless plating process for minutes. It dried with hot air at 85 degreeC for 40 minutes.

최종적으로 폴리프로필렌(PP)의 습식 표면처리에 따른 접합력(밀착성)을 확인하기 위해, KS-D 0254(2001) 및 KS-M ISO 2409(2013)의 평가 방법에 따라 시험하고 그 결과를 확인하였다. 이를 도 3에 나타내었다.Finally, in order to confirm the bonding strength (adhesion) according to the wet surface treatment of polypropylene (PP), it was tested according to the evaluation methods of KS-D 0254 (2001) and KS-M ISO 2409 (2013), and the results were confirmed. . This is shown in FIG. 3.

도 3에 나타난 바와 같이, 경화된 강재 긁기 기구를 통한 도금의 밀착성 시험(KS-D 0254) 및 박리시험에 따른 도금 박리 평가(KS-M ISO 2409) 결과에서 모두 양호한 접합력(밀착성)을 나타내었다.As shown in Fig. 3, both showed good bonding strength (adhesion) in the results of the adhesion test (KS-D 0254) of the plating through the hardened steel scraper and the evaluation of plating peeling according to the peel test (KS-M ISO 2409). .

실시예 2 Example 2

실시예 1과 동일한 방법으로 폴리프로필렌(PP)을 습식 표면처리 하였다. 다만, 다른 조건은 동일하게 처리하고 에칭 처리 단계에서 에칭 용액의 처리 시간을 달리 설정하여 수행하였다. 구체적으로, 에칭 단계에서 크롬산(CrO3) 38 g/L, 물(H2O) 550 ml/L 및 황산(H2SO4) 450 ml/L를 혼합한 수용액을 준비하고, 온도 76℃, 시간 5분 동안 에칭 처리 하였다.Polypropylene (PP) was subjected to wet surface treatment in the same manner as in Example 1. However, the other conditions were the same, and in the etching treatment step, the treatment time of the etching solution was set differently. Specifically, a mixture of chromic acid (CrO 3 ) 38 g/L, water (H 2 O) 550 ml/L and sulfuric acid (H 2 SO 4 ) 450 ml/L was prepared in the etching step, and a temperature of 76° C., It was etched for 5 minutes.

실시예 2에 따른 폴리프로필렌(PP)의 습식 표면처리(에칭 처리)에 따른 표면조직을 전자현미경으로 관찰한 것을 도 4에 나타내었고, 실시예 2에 따른 폴리프로필렌(PP)의 습식 표면처리에 따른 접합력(밀착성) 평가결과를 도 5에 나타내었다.4 shows that the surface texture of the polypropylene (PP) according to the wet surface treatment (etching treatment) according to Example 2 was observed with an electron microscope, and the wet surface treatment of the polypropylene (PP) according to Example 2 The result of evaluation of bonding strength (adhesion) is shown in FIG. 5.

도 4 및 도 5에 나타난 바와 같이, 에칭 처리 후 표면조직 관찰 결과 섬유조직과 같은 그물 형태로 균일하게 표면조면화가 형성되었으며, 경화된 강재 긁기 기구를 통한 도금의 밀착성 시험(KS-D 0254) 및 박리시험에 따른 도금 박리 평가(KS-M ISO 2409) 결과에서 모두 양호한 접합력(밀착성)을 나타내었다. 4 and 5, as a result of observing the surface texture after the etching treatment, the surface roughening was uniformly formed in a net shape such as a fiber structure, and an adhesion test of plating through a hardened steel scraping mechanism (KS-D 0254) and In the results of plating peeling evaluation (KS-M ISO 2409) according to the peel test, all showed good bonding strength (adhesion).

앞에서 설명되고, 도면에 도시된 본 발명의 실시예는, 본 발명의 기술적 사상을 한정하는 것으로 해석되어서는 안 된다. 본 발명의 보호범위는 청구범위에 기재된 사항에 의하여만 제한되고, 본 발명의 기술 분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상을 다양한 형태로 개량 변경하는 것이 가능하다. 따라서 이러한 개량 및 변경은 통상의 지식을 가진 자에게 자명한 것인 한 본 발명의 보호 범위에 속하게 될 것이다.Embodiments of the present invention described above and shown in the drawings should not be construed as limiting the technical idea of the present invention. The protection scope of the present invention is limited only by the matters described in the claims, and those of ordinary skill in the technical field of the present invention can improve and change the technical idea of the present invention in various forms. Therefore, such improvements and changes will fall within the scope of protection of the present invention as long as it is apparent to those of ordinary skill in the art.

Claims (10)

비 전도성 플라스틱의 습식 표면처리 방법에 있어서,
상기 비 전도성 플라스틱을 표면개질 처리하는 단계;
상기 표면개질 처리된 비 전도성 플라스틱 표면을 염산으로 처리하여, 표면 pH 및 표면전하를 조절하는 사전침적(Pre-dip) 단계;
상기 사전침적(Pre-dip)된 비 전도성 플라스틱의 표면에 귀금속 콜로이드를 함유하는 활성 용액 및 이온성(ionogenic) 귀금속 활성 용액 중 적어도 어느 하나를 사용하여 금속화하는 단계; 및
상기 금속화된 비 전도성 플라스틱의 표면에 전도성 부여를 위해 도금 처리하는 단계를 포함하는 비 전도성 플라스틱의 습식 표면처리 방법.
In the wet surface treatment method of non-conductive plastic,
Surface-modifying the non-conductive plastic;
Pre-dip step of treating the surface-modified non-conductive plastic surface with hydrochloric acid to control surface pH and surface charge;
Metallization using at least one of an active solution containing a noble metal colloid and an ionic noble metal active solution on the surface of the pre-dip non-conductive plastic; And
A wet surface treatment method of a non-conductive plastic comprising the step of plating to impart conductivity to the surface of the metallized non-conductive plastic.
제1항에서,
상기 표면개질 처리 단계는,
상기 비 전도성 플라스틱의 표면의 오염물질을 제거하는 세정 단계;
상기 세정 단계 이 후 에칭 용액으로 에칭 처리하는 에칭 처리 단계; 및
상기 에칭 처리된 비 전도성 플라스틱의 표면 거칠기를 조절하는 표면 거칠기 조절 단계를 포함하는 비 전도성 플라스틱의 습식 표면처리 방법.
In claim 1,
The surface modification treatment step,
A cleaning step of removing contaminants from the surface of the non-conductive plastic;
An etching treatment step of etching with an etching solution after the cleaning step; And
A wet surface treatment method of a non-conductive plastic comprising the step of controlling a surface roughness of the etched non-conductive plastic.
제2항에서,
상기 세정 단계는,
상기 비 전도성 플라스틱을 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 순차적으로 처리하는 단계; 및 상기 산욕(Acid bath) 처리는 황산과 계면활성제(Surfactant)를 포함하는 용액에서 수행되며, 상기 알칼리 욕(Alkali bath) 처리는 수산화나트륨, 탄산나트륨, 인산3나트륨 및 계면활성제를 포함하는 용액에서 수행된다.
상기 산욕(Acid bath) 및 알칼리 욕(Alkali bath)에서 처리 후, 초음파를 가하는 단계를 포함하는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In paragraph 2,
The cleaning step,
Sequentially treating the non-conductive plastic in an acid bath and an alkali bath; And the acid bath treatment is performed in a solution containing sulfuric acid and a surfactant, and the alkali bath treatment is performed in a solution containing sodium hydroxide, sodium carbonate, trisodium phosphate, and a surfactant. do.
After treatment in the acid bath and the alkali bath, the method of treating a non-conductive plastic with an ultrasonic wave.
제2항에서,
상기 에칭 처리 단계는, 크롬산과 황산을 포함하는 용액을 사용하며,
상기 표면 거칠기 조절 단계는, 에칭 처리 후 팽윤(Swelling)처리 또는 플라스틱 표면을 조면화(Anchoring)시키는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In paragraph 2,
In the etching treatment step, a solution containing chromic acid and sulfuric acid is used,
The surface roughness adjusting step is a wet surface treatment method of a non-conductive plastic, characterized in that after etching treatment, swelling treatment or anchoring of the plastic surface.
제1항에서,
상기 사전침적(Pre-dip)단계는 10 ~ 50℃에서, 1 ~ 10분 동안 수행되는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In claim 1,
The pre-dip step is a wet surface treatment method of a non-conductive plastic, characterized in that performed for 1 to 10 minutes at 10 ~ 50 ℃.
제1항에서,
상기 금속화 단계는,
상기 비 전도성 플라스틱 표면에 주석(Sn)을 흡착시키는 제1금속화 단계;
상기 제1단계 처리 후 팔라듐(Pd)을 흡착시키는 제2금속화단계; 및
상기 비 전도성 플라스틱 표면에 흡착된 상기 주석(Sn)을 제거하고 팔라듐(Pd)을 금속화하는 제3금속화단계를 포함하는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In claim 1,
The metallization step,
A first metallization step of adsorbing tin (Sn) on the non-conductive plastic surface;
A second metallization step of adsorbing palladium (Pd) after the first step treatment; And
And a third metallization step of removing the tin (Sn) adsorbed on the surface of the non-conductive plastic and metallizing palladium (Pd).
제1항에서,
상기 도금 처리 단계는,
무전해 도금공정에 의해 수행되는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In claim 1,
The plating treatment step,
A wet surface treatment method of a non-conductive plastic, characterized in that carried out by an electroless plating process.
제7항에서,
상기 무전해 도금공정은,
상기 비 전도성 플라스틱의 표면에 제1금속으로 이루어지는 제1도금층을 형성하는 단계;
상기 제1금속 도금층위에 제2금속으로 이루어지는 적어도 1층 이상의 제2도금층을 형성하는 단계; 및
도금층이 형성된 비 전도성 플라스틱을 건조하는 단계를 포함하는 비 전도성 플라스틱의 습식 표면처리 방법.
In clause 7,
The electroless plating process,
Forming a first plating layer made of a first metal on the surface of the non-conductive plastic;
Forming at least one or more second plating layers made of a second metal on the first metal plating layer; And
A wet surface treatment method of a non-conductive plastic comprising the step of drying the non-conductive plastic on which the plating layer is formed.
제8항에서,
상기 제1금속 및 제2금속은 각각,
니켈, 구리, 아연 및 크롬으로 이루어진 군에서 선택되는 적어도 하나를 포함하는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In clause 8,
The first metal and the second metal are each,
Non-conductive plastic wet surface treatment method comprising at least one selected from the group consisting of nickel, copper, zinc and chromium.
제1항에서,
상기 비 전도성 플라스틱은,
폴리에틸렌테레프탈레이트(PET), 폴리우레탄(PU), 폴리에틸렌(PE), 폴리카보네이트(PC), 폴리염화비닐(PVC), 폴리스티렌(PS), 폴리메틸메타크릴레이트(PMMA) 및 폴리프로필렌(PP) 중 적어도 어느 하나를 포함하는 것을 특징으로 하는 비 전도성 플라스틱의 습식 표면처리 방법.
In claim 1,
The non-conductive plastic,
Polyethylene terephthalate (PET), polyurethane (PU), polyethylene (PE), polycarbonate (PC), polyvinyl chloride (PVC), polystyrene (PS), polymethyl methacrylate (PMMA) and polypropylene (PP) Non-conductive plastic wet surface treatment method comprising at least one of.
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