JP4275157B2 - Metallization method for plastic surfaces - Google Patents

Metallization method for plastic surfaces Download PDF

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JP4275157B2
JP4275157B2 JP2006204993A JP2006204993A JP4275157B2 JP 4275157 B2 JP4275157 B2 JP 4275157B2 JP 2006204993 A JP2006204993 A JP 2006204993A JP 2006204993 A JP2006204993 A JP 2006204993A JP 4275157 B2 JP4275157 B2 JP 4275157B2
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catalyst
plastic surface
metallizing
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plastic
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JP2008031513A (en
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保之 倉持
香織 中山
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JCU Corp
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Priority to CN2007800273670A priority patent/CN101490310B/en
Priority to PCT/JP2007/060332 priority patent/WO2008012984A1/en
Priority to KR1020097002064A priority patent/KR101365970B1/en
Priority to TW096126389A priority patent/TW200811311A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Description

本発明はプラスチック表面の金属化方法に関し、更に詳細には、被めっき製品をめっき作業中に保持する治具の表面にめっき析出させずに、プラスチック表面にのみ高い密着性を有するめっき皮膜を形成する方法に関する。   The present invention relates to a method for metallizing a plastic surface, and more specifically, a plating film having high adhesion is formed only on a plastic surface without depositing on the surface of a jig for holding a product to be plated during the plating operation. On how to do.

従来、アクリロニトリル・ブタジエン・スチレン(ABS)樹脂、ポリカーボネート/アクリロニトリル・ブタジエン・スチレン(PC/ABS)等のプラスチック表面にめっきにより金属化処理を施す場合は、プラスチック表面とめっき皮膜との密着性を高めるために、めっき処理前にプラスチック表面をクロム酸と硫酸の混合液により粗化するエッチング処理を行うことが知られている。   Conventionally, when metallization treatment is applied to plastic surfaces such as acrylonitrile butadiene styrene (ABS) resin and polycarbonate / acrylonitrile butadiene styrene (PC / ABS), the adhesion between the plastic surface and the plating film is improved. Therefore, it is known to perform an etching process for roughening the plastic surface with a mixed solution of chromic acid and sulfuric acid before the plating process.

しかし、上記エッチング処理では、有害な6価クロムを用いて60℃以上の高温で作業するために、作業環境が悪くなり、またその廃水処理にも注意が必要であるという問題があった。また、上記エッチング処理後に行うめっき工程で、PC/ABS等のめっきが析出しづらいプラスチック表面にめっきを行う場合や、ダイレクトプレーティングと呼ばれる吸着金属触媒上に直接めっきする場合は、触媒金属の吸着を増加させるためのコンディショニング処理を必要とすることがあるが、この処理を行うことにより治具の表面にもめっきが析出してしまうことがあった。そのため、コンディショニング処理から電気めっきへ移る際に治具を交換することが必要となり、作業性が非常に悪いという問題があった。   However, in the above etching process, there is a problem that the working environment is deteriorated because the work is performed at a high temperature of 60 ° C. or more using harmful hexavalent chromium, and the waste water treatment needs attention. In addition, when plating on the plastic surface where plating such as PC / ABS is difficult to deposit in the plating process performed after the etching process, or when directly plating on an adsorbing metal catalyst called direct plating, adsorption of the catalytic metal In some cases, a conditioning process for increasing the thickness of the jig may be required. However, the plating may be deposited on the surface of the jig. Therefore, it is necessary to replace the jig when moving from the conditioning process to electroplating, and there is a problem that workability is very poor.

これらの問題から、クロム酸と硫酸の混合液に代わるエッチング剤の提供が望まれており、例えば、これらエッチング剤に代えて過マンガン酸塩およびリン酸の混合液によりエッチング処理し、次いでイオン性の触媒液で処理等をし、その後にめっきを施すクロムフリーのめっきプロセスが報告されている(特許文献1)。   Because of these problems, it is desired to provide an etching agent in place of a mixed solution of chromic acid and sulfuric acid. For example, instead of these etching agents, etching treatment is performed with a mixed solution of permanganate and phosphoric acid, and then ionicity is provided. A chromium-free plating process has been reported in which a treatment or the like is performed with the above catalyst solution, followed by plating (Patent Document 1).

しかし、上記プロセスにおいてはイオン性の触媒液で処理をすることによりプラスチック表面への触媒金属の吸着量は増加するものの、治具のコーティング表面にも触媒金属が吸着してしまうため、その後のめっき工程によりプラスチック表面と共に治具の表面にもめっきが析出するという問題があった。また、このプロセスでは触媒金属を還元するための還元剤が自然分解するため実用性に乏しいという問題があった。
WO2005/094394号パンフレット
However, in the above process, the amount of catalyst metal adsorbed on the plastic surface is increased by treatment with an ionic catalyst solution, but the catalyst metal is also adsorbed on the coating surface of the jig. There was a problem that plating was deposited on the surface of the jig together with the plastic surface depending on the process. In addition, this process has a problem that the reducing agent for reducing the catalyst metal is naturally decomposed and thus is not practical.
WO2005 / 094394 pamphlet

従って、本発明の課題は、クロムフリーのプラスチック表面の金属化プロセスにおいて、プラスチック表面に十分に密着しためっきをすることができ、しかも、治具にめっき析出しない、実用性の高いプラスチック表面の金属化方法を提供することである。   Accordingly, an object of the present invention is to provide a metal having a highly practical plastic surface that can be plated with sufficient adhesion to the plastic surface in the metallization process of the chromium-free plastic surface and that does not deposit on the jig. Is to provide a method.

本発明者らは、上記課題を解決するために鋭意研究を行った結果、プラスチック表面を過マンガン酸塩等を含有するエッチング処理液で処理した後に、特定の化合物を含有する触媒付与増強液で処理することにより、その後の触媒付与処理で触媒金属をプラスチック表面に選択的に吸着させることができ、しかもその吸着量も増加することを見出した。更に、前記触媒付与処理に続けてめっき処理を行ってもプラスチック表面に十分に密着しためっきをすることができ、しかも、治具コーティング表面にめっきが析出しないことを見出し、本発明を完成させた。   As a result of intensive studies to solve the above problems, the present inventors have treated a plastic surface with an etching treatment solution containing a permanganate or the like, and then added a catalyst imparting enhancement solution containing a specific compound. By the treatment, it was found that the catalyst metal can be selectively adsorbed on the plastic surface in the subsequent catalyst application treatment, and the amount of adsorption is also increased. Furthermore, it was found that even if the plating treatment was performed following the catalyst application treatment, the plating could be sufficiently adhered to the plastic surface, and the plating was not deposited on the jig coating surface, and the present invention was completed. .

すなわち、本発明はプラスチックを、過マンガン酸塩および無機酸を含有するエッチング処理液で処理し、次いで、前記処理されたプラスチックを、その表面に露出した官能基に選択吸着性のある化合物を含有する触媒付与増強液で処理し、更に、前記触媒付与増強液で処理されたプラスチックに、触媒付与処理液にて触媒を付与し、その後、前記触媒を付与されたプラスチックに金属めっきを施すことを特徴とするプラスチック表面の金属化方法である。   That is, in the present invention, a plastic is treated with an etching treatment solution containing a permanganate and an inorganic acid, and then the treated plastic contains a compound having a selective adsorption property to a functional group exposed on the surface thereof. Treating with the catalyst imparting enhancing liquid, and further applying a catalyst to the plastic treated with the catalyst imparting enhancing liquid with the catalyst imparting treating liquid, and then performing metal plating on the plastic imparted with the catalyst. A method for metallizing a plastic surface.

本発明のプラスチック表面の金属化方法によれば、プラスチック表面に十分に密着しためっきをすることができ、しかも、治具にめっきが析出しない、実用性の高い方法である。また、本発明のプラスチック表面の金属化方法によれば、プラスチック表面への触媒金属の吸着量を増やすことができるので、従来の方法では触媒金属が吸着しにくいプラスチックにも同様にめっきすることができる。   According to the method for metallizing a plastic surface according to the present invention, it is possible to perform plating with sufficient adhesion to the plastic surface, and it is a highly practical method in which plating does not deposit on a jig. Also, according to the metallization method of the plastic surface of the present invention, the amount of catalyst metal adsorbed on the plastic surface can be increased, so that it is possible to plate plastic that is difficult to adsorb catalyst metal in the conventional method as well. it can.

従って、本発明のプラスチック表面の金属化方法は、クロムフリーのプラスチック表面の金属化プロセスとして優れた方法である。   Therefore, the method for metallizing a plastic surface according to the present invention is an excellent method for metallizing a chromium-free plastic surface.

本発明のプラスチック表面の金属化方法(以下、「本発明方法」という)において、金属化の対象となるプラスチックとしては特に制限されないが、例えば、アクリロニトリル・ブタジエン・スチレン(ABS)、ポリカーボネート/アクリロニトリル・ブタジエン・スチレン(PC/ABS)、アクリロニトリル・スチレン・アクリレート(ASA)、シリコン系複合ゴム−アクリロニトリル−スチレン(SAS)、ノリル、ポリプロピレン、ポリカーボネート(PC)、アクリロニトリル・スチレン、ポリアセテート、ポリスチレン、ポリアミド、芳香族ポリアミド、ポリエチレン、ポリエーテルケトン、ポリエチレンテフタレート、ポリブチレンテフタレート、ポリスルホン、ポリエーテルエーテルスルホン、ポリエーテルイミド、変性ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリアミド、ポリイミド、エポキシ樹脂、液晶ポリマー等や上記各ポリマーのコポリマー等が挙げられる。本発明方法においては、特にABSおよびPC/ABSの表面を金属化することが好ましい。   In the method for metallizing a plastic surface of the present invention (hereinafter referred to as “method of the present invention”), the plastic to be metallized is not particularly limited. For example, acrylonitrile butadiene styrene (ABS), polycarbonate / acrylonitrile Butadiene styrene (PC / ABS), acrylonitrile styrene acrylate (ASA), silicon-based composite rubber-acrylonitrile-styrene (SAS), noryl, polypropylene, polycarbonate (PC), acrylonitrile styrene, polyacetate, polystyrene, polyamide, Aromatic polyamide, polyethylene, polyether ketone, polyethylene terephthalate, polybutylene terephthalate, polysulfone, polyether ether sulfone, polyether imide, modified Polyphenylene ether, polyphenylene sulfide, polyamide, polyimide, epoxy resin, copolymer of a liquid crystal polymer or the like and the above polymers. In the method of the present invention, it is particularly preferable to metallize the surfaces of ABS and PC / ABS.

本発明方法においては、まず、上記プラスチック表面を過マンガン酸塩と無機酸とを含有するエッチング処理液により処理する。このエッチング処理液に含有される過マンガン酸塩としては特に制限されないが、例えば、過マンガン酸カリウム、過マンガン酸ナトリウム等の過マンガン酸の金属塩が利用できる。この過マンガン酸塩のエッチング処理液中の濃度は0.0005mol/L以上、好ましくは0.005〜0.5mol/Lである。一方、エッチング処理液に含有される無機酸としては特に制限されないが、例えば、リン酸、硫酸および硝酸からなる群から選ばれた無機酸の少なくとも1種が挙げられ、好ましくはリン酸である。これら無機酸のエッチング処理液中の濃度は2mol/L以上、好ましくは6〜12mol/Lである。上記エッチング処理液にてプラスチック表面を処理するには、液温を0〜50℃、好ましくは25〜40℃とし、それにプラスチックを1〜30分間、好ましくは5〜15分間浸漬して処理すればよい。このエッチング処理液による処理によりプラスチックの表面には官能基、具体的にはヒドロキシル基、カルボキシル基等の親水性の官能基が露出する。   In the method of the present invention, first, the plastic surface is treated with an etching treatment solution containing a permanganate and an inorganic acid. The permanganate contained in the etching treatment liquid is not particularly limited, and for example, metal salts of permanganate such as potassium permanganate and sodium permanganate can be used. The concentration of the permanganate in the etching treatment solution is 0.0005 mol / L or more, preferably 0.005 to 0.5 mol / L. On the other hand, the inorganic acid contained in the etching treatment solution is not particularly limited, and examples thereof include at least one inorganic acid selected from the group consisting of phosphoric acid, sulfuric acid, and nitric acid, and phosphoric acid is preferable. The concentration of these inorganic acids in the etching treatment solution is 2 mol / L or more, preferably 6 to 12 mol / L. In order to treat the plastic surface with the above etching treatment liquid, the liquid temperature is 0 to 50 ° C., preferably 25 to 40 ° C., and the plastic is immersed in the solution for 1 to 30 minutes, preferably 5 to 15 minutes. Good. By the treatment with the etching treatment solution, a functional group, specifically, a hydrophilic functional group such as a hydroxyl group or a carboxyl group is exposed on the surface of the plastic.

上記エッチング処理を行ったプラスチック表面は、次に、上記処理によりプラスチック表面に露出した官能基に選択吸着性のある化合物(以下、これを「選択吸着性化合物」という)を含有する触媒付与増強液にて処理する。この触媒付与増強液に含有される選択吸着性化合物としては、上記したような官能基に選択吸着性を有する化合物であれば特に制限されないが、例えば、窒素原子を含有する化合物、窒素原子を3個以上含有する化合物または分子量が100以上の化合物、好ましくは窒素原子を3個以上含有し、分子量が100以上の化合物が挙げられる。この選択吸着性化合物の具体的な例としては、エチレントリアミン、トリエチレンテトラミン等のエチレンジアミン系化合物(但し、エチレンジアミンを除く);エポミンSP−003、エポミンSP−012、エポミンSP−200(何れも日本触媒株式会社製)等のエチレンイミン系高分子化合物;PAA−03、PAA−D41−HCl(何れも日東紡績株式会社製)等のアリルアミン系高分子化合物;、PAS−92、PAS−M−1、PAS−880(何れも日東紡績株式会社製)等のジアリルアミン系高分子化合物;PVAM−0570−B(三菱化学株式会社製)等のビニルアミン系高分子化合物が挙げられる。これら選択吸着性化合物の中でも特にエチレンイミン系高分子化合物、アリルアミン系高分子化合物およびジアリルアミン系高分子化合物が好ましい。これら選択吸着性化合物の触媒付与増強液中の濃度は、10mg/L以上、好ましくは100〜1000mg/Lである。また、この触媒付与増強液は、そのpHを例えば水酸化ナトリウム、硫酸等により5〜12、好ましくは8〜10に調整することが好ましい。この触媒付与増強液にて上記プラスチック表面を処理するには、液温を0〜70℃、好ましくは25〜35℃とし、それにプラスチックを1〜20分間、好ましくは2〜3分間浸漬させ処理すればよい。   Next, the plastic surface subjected to the etching treatment contains a compound having a selective adsorption property to the functional group exposed on the plastic surface by the treatment (hereinafter referred to as “selective adsorption compound”). Process. The selective adsorptive compound contained in the catalyst imparting enhancement liquid is not particularly limited as long as it is a compound having selective adsorptivity to the functional group as described above. For example, a compound containing a nitrogen atom, Compounds having a molecular weight of 100 or more, preferably compounds having 3 or more nitrogen atoms and a molecular weight of 100 or more. Specific examples of the selective adsorptive compound include ethylenediamine-based compounds such as ethylenetriamine and triethylenetetramine (excluding ethylenediamine); Epomin SP-003, Epomin SP-012, and Epomin SP-200 (all of which are Japan) Ethyleneimine polymer compounds such as PAA-03 and PAA-D41-HCl (both manufactured by Nitto Boseki Co., Ltd.); PAS-92 and PAS-M-1 And dialsylamine polymer compounds such as PAS-880 (all manufactured by Nitto Boseki Co., Ltd.); vinylamine polymer compounds such as PVAM-0570-B (manufactured by Mitsubishi Chemical Corporation). Among these selective adsorptive compounds, ethyleneimine polymer compounds, allylamine polymer compounds, and diallylamine polymer compounds are particularly preferable. The concentration of these selective adsorptive compounds in the catalyst application enhancing liquid is 10 mg / L or more, preferably 100 to 1000 mg / L. Moreover, it is preferable to adjust the pH of this catalyst provision enhancing liquid to 5 to 12, preferably 8 to 10, for example, with sodium hydroxide, sulfuric acid or the like. In order to treat the plastic surface with this catalyst application enhancing liquid, the liquid temperature is set to 0 to 70 ° C., preferably 25 to 35 ° C., and the plastic is immersed in the solution for 1 to 20 minutes, preferably 2 to 3 minutes. That's fine.

上記触媒付与増強処理を行ったプラスチック表面は、次に触媒付与処理液にて触媒を付与する。この触媒付与処理液は、一般にめっき工程の触媒付与に用いられるものであれば特に制限されないが、貴金属を含むものが好ましく、パラジウムを含むものがより好ましく、特にパラジウム/すず混合コロイド触媒溶液が好ましい。これら触媒をプラスチック表面に付与するには、触媒付与処理液の液温を10〜60℃、好ましくは20〜50℃とし、それにプラスチックを1〜20分間、好ましくは2〜5分間浸漬させ処理すればよい。   Next, the plastic surface subjected to the catalyst application enhancing treatment is applied with a catalyst in a catalyst application treatment liquid. The catalyst application treatment liquid is not particularly limited as long as it is generally used for catalyst application in the plating step, but preferably contains a noble metal, more preferably contains palladium, and particularly preferably a palladium / tin mixed colloid catalyst solution. . In order to apply these catalysts to the plastic surface, the temperature of the catalyst application treatment solution is 10 to 60 ° C., preferably 20 to 50 ° C., and the plastic is immersed in the solution for 1 to 20 minutes, preferably 2 to 5 minutes. That's fine.

このようにして触媒が付与されたプラスチック表面は、次に、無電解金属めっきや電気金属めっき(ダイレクトプレーティング)等の金属めっきにより、プラスチック表面の金属化を行う。   The plastic surface thus provided with the catalyst is then metallized by metal plating such as electroless metal plating or electrometal plating (direct plating).

プラスチック表面の金属化に無電解金属めっきを用いる場合には、触媒付与処理液にて触媒を付与した後に、更に、塩酸または硫酸を含有する活性化処理液で処理を行ってもよい。この活性化処理液中の塩酸または硫酸の濃度は、0.5mol/L以上、好ましくは1〜4mol/Lである。これら活性化処理液にてプラスチック表面を処理するには、活性化処理液の液温を0〜60℃、好ましくは30〜45℃とし、それにプラスチックを1〜20分間、好ましくは2〜5分間浸漬させ処理すればよい。   When electroless metal plating is used for metallization of the plastic surface, the catalyst may be applied with a catalyst application treatment solution and then further treated with an activation treatment solution containing hydrochloric acid or sulfuric acid. The concentration of hydrochloric acid or sulfuric acid in this activation treatment liquid is 0.5 mol / L or more, preferably 1 to 4 mol / L. In order to treat the plastic surface with these activation treatment liquids, the liquid temperature of the activation treatment liquid is set to 0 to 60 ° C., preferably 30 to 45 ° C., and the plastic is added to the plastic for 1 to 20 minutes, preferably 2 to 5 minutes. What is necessary is just to immerse and process.

上記のようにして触媒の付与、活性化処理されたプラスチックは、次に、無電解金属めっき処理を行う。無電解金属めっき処理は、公知の無電解ニッケルめっき液、無電解銅めっき液、無電解コバルトめっき液等の無電解金属めっきを用いて常法に従って行うことができる。具体的に、無電解ニッケルめっき液でプラスチック表面にめっき処理を行う場合には、pH8〜10で30〜50℃の液温の無電解ニッケルめっき液にプラスチックを5〜15分間浸漬させ処理すればよい。   The plastic subjected to the catalyst application and activation treatment as described above is then subjected to an electroless metal plating treatment. The electroless metal plating treatment can be performed according to a conventional method using electroless metal plating such as a known electroless nickel plating solution, electroless copper plating solution, and electroless cobalt plating solution. Specifically, when a plastic surface is plated with an electroless nickel plating solution, the plastic is immersed in an electroless nickel plating solution having a pH of 8 to 10 and a temperature of 30 to 50 ° C. for 5 to 15 minutes. Good.

また、プラスチック表面の金属化に電気金属めっき(ダイレクトプレーティング)を用いる場合には、触媒付与処理液にて触媒を付与した後に、更に、銅イオンを含有するpH7以上、好ましくはpH12以上の活性化処理液で処理を行ってもよい。この活性化処理液に含有される銅イオンの由来は特に制限されず、例えば、硫酸銅が挙げられる。活性化処理液にてプラスチック表面を処理するには、活性化処理液の液温を0〜60℃、好ましくは30〜50℃とし、それにプラスチックを1〜20分間、好ましくは2〜50分間浸漬させ処理すればよい。   In addition, when electrometal plating (direct plating) is used for metallization of the plastic surface, after applying the catalyst with the catalyst applying treatment liquid, the activity further containing copper ions is pH 7 or more, preferably pH 12 or more. The treatment may be performed with a chemical treatment solution. The origin of the copper ions contained in this activation treatment liquid is not particularly limited, and examples thereof include copper sulfate. In order to treat the plastic surface with the activation treatment liquid, the liquid temperature of the activation treatment liquid is 0 to 60 ° C., preferably 30 to 50 ° C., and the plastic is immersed in it for 1 to 20 minutes, preferably 2 to 50 minutes. Process.

上記のように触媒の付与、活性化処理されたプラスチックは、次に、硫酸銅浴等の汎用の電気銅めっき浴に浸漬し、通常の条件、例えば、1〜5A/dmで2〜10分間処理すればよい。 The plastic subjected to the application of the catalyst and the activation treatment as described above is then immersed in a general-purpose electrolytic copper plating bath such as a copper sulfate bath, and 2-10 in normal conditions, for example, 1-5 A / dm 2 . What is necessary is just to process for one minute.

また、上記のようにしてプラスチック表面に無電解めっきや電気金属めっき等の金属めっきを施し、金属化したプラスチック表面には、更に、目的に応じて各種電気銅めっきや電気ニッケルめっきを施すことも可能である。   In addition, metal plating such as electroless plating or electrometal plating may be performed on the plastic surface as described above, and various types of copper electroplating or nickel electroplating may be further applied to the metalized plastic surface according to the purpose. Is possible.

以下に実施例及び比較例を示し、本発明をより具体的に説明する。但し、本発明はこれらの記載により何ら限定されるものではない。   Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. However, the present invention is not limited by these descriptions.

参 考 例 1
プラスチック表面の表面改質処理:
試料として50×100×3mmのABS樹脂(UMGABS株式会社製)を用い、これを0.01mol/Lの過マンガン酸カリウムおよび7.5mol/Lのリン酸を含有する35℃のエッチング処理液に10分間浸漬した。また、比較として上記試料を3.5mol/Lの無水クロム酸および3.6mol/Lの硫酸を含有する65℃のエッチング処理液に10分間浸漬した。浸漬後の各ABS樹脂の表面をフーリエ変換赤外分光光度計(FT/IR6100FV型(日本分光株式会社製))を用い、1回反射ATR法により分析した。その結果を図1に示した。
Reference example 1
Surface modification treatment of plastic surface:
A 50 × 100 × 3 mm ABS resin (manufactured by UMGABS) was used as a sample, and this was used as an etching treatment solution at 35 ° C. containing 0.01 mol / L potassium permanganate and 7.5 mol / L phosphoric acid. Soaked for 10 minutes. For comparison, the sample was immersed in an etching treatment solution at 65 ° C. containing 3.5 mol / L chromic anhydride and 3.6 mol / L sulfuric acid for 10 minutes. The surface of each ABS resin after immersion was analyzed by a single reflection ATR method using a Fourier transform infrared spectrophotometer (FT / IR6100FV type (manufactured by JASCO Corporation)). The results are shown in FIG.

過マンガン酸を含有するエッチング処理液で処理したABS樹脂の表面には3340cm−1付近にヒドロキシル基やカルボキシル基由来のピークが認められた。一方、エッチング処理していないABS樹脂の表面にはヒドロキシル基やカルボキシル基由来のピークは認められなかった。また、クロム酸を含有するエッチング処理液で処理したABS樹脂の表面にはヒドロキシル基やカルボキシル基由来のピークはほとんど認められなかった。 On the surface of the ABS resin treated with an etching treatment solution containing permanganic acid, peaks derived from hydroxyl groups and carboxyl groups were observed in the vicinity of 3340 cm −1 . On the other hand, no peaks derived from hydroxyl groups or carboxyl groups were observed on the surface of the ABS resin that was not etched. Moreover, almost no peaks derived from hydroxyl groups or carboxyl groups were observed on the surface of the ABS resin treated with the etching treatment solution containing chromic acid.

実 施 例 1
無電解めっき皮膜の作製:
試料として50×100×3mmのABS樹脂(UMGABS株式会社製)を用い、これを0.01mol/lの過マンガン酸カリウムおよび7.5mol/lのリン酸を含有する35℃のエッチング処理液に10分間浸漬した。次に、これを200mg/lのPAA−03(ポリアリルアミン:日東紡績株式会社製)を水酸化ナトリウムにてpHを10に調整した30℃の触媒付与増強液に2分間浸漬した。更に、これを1.2mol/lの塩酸に室温で1分間浸漬した後、10ml/lのCT−580(荏原ユージライト株式会社製)および2.5mol/lの塩酸を含有する35℃のパラジウム/すず混合コロイド触媒溶液に4分間浸漬し、ABS樹脂上に触媒を付与した。次に、これを1.2mol/lの塩酸からなる35℃の活性化処理液に4分間浸漬し、触媒を活性化させた。その後に、pH8.8、35℃の無電解ニッケルめっき液ENILEX NI−5(荏原ユージライト株式会社製)に10分間浸漬し、ABS樹脂上に膜厚が0.5μmとなるように無電解ニッケルめっきを施した。その後、150g/lのV−345(荏原ユージライト株式会社製)を含有する酸活性溶液に室温で1分間浸漬した。次に、これを0.75mol/lの硫酸ニッケル、0.4mol/lの塩化ニッケルおよび0.55mol/lのホウ酸を含む45℃のワット浴に2V/dmで3分間浸漬した。更に、これを10ml/lのPDC(荏原ユージライト株式会社製)および0.5mol/lの硫酸を含有する室温の銅置換溶液に1分間浸漬し、銅置換をした。次に、これを0.9mol/lの硫酸銅、0.55mol/lの硫酸および0.0017mol/lの塩素を含有する25℃の硫酸銅めっき液EP−30(荏原ユージライト株式会社製)に3A/dmで40分間浸漬し、膜厚が20μmとなるようにABS樹脂上に電気銅めっきを施した。その後、これを70℃で1時間アニールをした。
Example 1
Production of electroless plating film:
A 50 × 100 × 3 mm ABS resin (manufactured by UMGABS) was used as a sample, and this was used as an etching treatment solution at 35 ° C. containing 0.01 mol / l potassium permanganate and 7.5 mol / l phosphoric acid. Soaked for 10 minutes. Next, 200 mg / l PAA-03 (polyallylamine: manufactured by Nitto Boseki Co., Ltd.) was immersed in a catalyst application enhancing liquid at 30 ° C. adjusted to pH 10 with sodium hydroxide for 2 minutes. Further, after being immersed in 1.2 mol / l hydrochloric acid at room temperature for 1 minute, 35 ° C. palladium containing 10 ml / l CT-580 (manufactured by Ebara Eugleite Co., Ltd.) and 2.5 mol / l hydrochloric acid. / Soaking in tin mixed colloidal catalyst solution for 4 minutes, the catalyst was applied on the ABS resin. Next, this was immersed in an activation treatment liquid at 35 ° C. composed of 1.2 mol / l hydrochloric acid for 4 minutes to activate the catalyst. Thereafter, it is immersed in an electroless nickel plating solution ENILEX NI-5 (manufactured by Ebara Eugilite Co., Ltd.) at pH 8.8 and 35 ° C. for 10 minutes, and electroless nickel is formed on the ABS resin so that the film thickness becomes 0.5 μm. Plating was applied. Then, it was immersed for 1 minute at room temperature in the acid active solution containing 150-g / l V-345 (made by Ebara Eugene Corporation). Next, it was immersed in a 45 ° C. watt bath containing 0.75 mol / l nickel sulfate, 0.4 mol / l nickel chloride and 0.55 mol / l boric acid at 2 V / dm 2 for 3 minutes. Further, this was dipped in a room temperature copper replacement solution containing 10 ml / l PDC (manufactured by Ebara Eugilite Co., Ltd.) and 0.5 mol / l sulfuric acid for 1 minute to replace the copper. Next, this was treated with a copper sulfate plating solution EP-30 containing 25 mol / l copper sulfate, 0.55 mol / l sulfuric acid and 0.0019 mol / l chlorine at 25 ° C. (manufactured by Ebara Eugene Corporation). Was immersed in 3 A / dm 2 for 40 minutes, and electrolytic copper plating was performed on the ABS resin so that the film thickness was 20 μm. Thereafter, this was annealed at 70 ° C. for 1 hour.

比 較 例 1
無電解めっき皮膜の作製(1):
実施例1の工程において、触媒付与増強液に2分間浸漬する処理を行わない以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。
Comparative Example 1
Preparation of electroless plating film (1):
In the process of Example 1, electroless nickel plating was performed on the ABS resin in the same manner except that the treatment for immersing in the catalyst application enhancing liquid for 2 minutes was not performed.

比 較 例 2
無電解めっき皮膜の作製(2):
試料として50×100×3mmのABS樹脂(UMGABS株式会社製)を用い、これを0.01mol/lの過マンガン酸カリウムおよび7.5mol/lのリン酸を含有する35℃のエッチング処理液に10分間浸漬した。次に、これを0.0024mol/lの塩化パラジウムを含む50℃の触媒溶液に4分間浸漬し、ABS樹脂上に触媒を付与した。次に、PC−66H(荏原ユージライト株式会社製)を10ml/l含む35℃の活性化処理液に4分間浸漬し、触媒を活性化させた。その後、実施例1の無電解ニッケルめっき以降と同様の処理を施した。
Comparative Example 2
Preparation of electroless plating film (2):
A 50 × 100 × 3 mm ABS resin (manufactured by UMGABS) was used as a sample, and this was used as an etching treatment solution at 35 ° C. containing 0.01 mol / l potassium permanganate and 7.5 mol / l phosphoric acid. Soaked for 10 minutes. Next, this was immersed in a catalyst solution at 50 ° C. containing 0.0024 mol / l palladium chloride for 4 minutes to give the catalyst onto the ABS resin. Next, the catalyst was activated by immersing in an activation treatment solution at 35 ° C. containing 10 ml / l of PC-66H (manufactured by Sugawara Eugleite Co., Ltd.) for 4 minutes. Thereafter, the same treatment as in Example 1 after electroless nickel plating was performed.

比 較 例 3
無電解めっき皮膜の作製(3):
比較例の工程において、0.0024mol/lの塩化パラジウムを含む50℃の触媒溶液の代わりに0.0019mol/lの2−アミノピリジンと0.00094mol/lの硫酸パラジウム含む50℃の触媒溶液に4分間浸漬する以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。
Comparative Example 3
Preparation of electroless plating film (3):
In the process of Comparative Example 2 , a 50 ° C. catalyst solution containing 0.0019 mol / l 2-aminopyridine and 0.00094 mol / l palladium sulfate instead of the 50 ° C. catalyst solution containing 0.0024 mol / l palladium chloride. Electroless nickel plating was performed on the ABS resin in the same manner except that it was immersed in 4 minutes.

試 験 例 1
上記実施例1および比較例1〜3で得られた無電解ニッケルめっき皮膜のABS樹脂における析出性、治具被覆への析出を目視にて評価した。また、ABS樹脂上のパラジウム吸着量および密着強度を以下のようにして測定した。これらの結果を表1に示した。
Test example 1
The deposition property in the ABS resin of the electroless nickel plating film obtained in Example 1 and Comparative Examples 1 to 3 and the deposition on the jig coating were visually evaluated. Moreover, the palladium adsorption amount and adhesion strength on the ABS resin were measured as follows. These results are shown in Table 1.

<測定方法>
パラジウム触媒の吸着量:
ABS樹脂表面に吸着しているパラジウムイオンを還元処理後に王水でパラジウムを
溶解し、その溶液の吸光度を高周波プラズマ発光分析装置ICPS−7510(株式会
社島津製作所製)を用いて測定することによりパラジウムの吸着量を測定した。
密着強度測定:
JIS H8630付属書6に従って、ABS樹脂表面に約20μmの電気銅めっき
皮膜を形成した後、70℃で1時間アニールさせ、その後に引っ張り強度試験機AGS
−H500N(株式会社島津製作所製)で密着強度を測定した。
<Measurement method>
Adsorption amount of palladium catalyst:
By reducing palladium ion adsorbed on the surface of the ABS resin, dissolving palladium with aqua regia and measuring the absorbance of the solution using a high-frequency plasma emission analyzer ICPS-7510 (manufactured by Shimadzu Corporation) The amount of palladium adsorbed was measured.
Adhesion strength measurement:
In accordance with JIS H8630 Annex 6, after forming an electrolytic copper plating film of about 20 μm on the surface of ABS resin, it is annealed at 70 ° C. for 1 hour, and then tensile strength tester AGS
-Adhesion strength was measured with H500N (manufactured by Shimadzu Corporation).

Figure 0004275157
Figure 0004275157

実施例1ではパラジウム触媒の吸着量は増加し、無電解めっき皮膜の析出性および密着強度は良好であった。しかも、この工程では治具被覆にめっきが析出しなかった。一方、比較例1では治具にめっきの析出はないもののABS樹脂へのパラジウムの吸着量が少なく、めっきの未析出部分が発生した。また、比較例2および比較例3ではABS樹脂へ十分なパラジウムの吸着量が得られたものの、治具被覆にめっきが析出した。   In Example 1, the adsorption amount of the palladium catalyst was increased, and the depositability and adhesion strength of the electroless plating film were good. Moreover, no plating was deposited on the jig coating in this step. On the other hand, in Comparative Example 1, although the plating was not deposited on the jig, the amount of palladium adsorbed on the ABS resin was small, and an undeposited portion of the plating was generated. In Comparative Example 2 and Comparative Example 3, a sufficient amount of palladium adsorbed on the ABS resin was obtained, but plating was deposited on the jig coating.

実 施 例 2
ABS樹脂上へのダイレクトプレーティング:
試料として50×100×3mmのABS樹脂(UMGABS株式会社製)を用い、これを0.01mol/lの過マンガン酸カリウムおよび7.5mol/lのリン酸を含有する35℃のエッチング処理液に10分間浸漬した。次に、これを200mg/lのPAA−03(ポリアミルアミン:日東紡績株式会社製)を水酸化ナトリウムにてpHを10に調整した30℃の触媒付与増強液に2分間浸漬した後、更に、これを1.2mol/lの塩酸に室温で1分間浸漬した。次に、これを25ml/lのD−POPACT(荏原ユージライト株式会社製)、1.2mol/lの塩酸および1.7mol/lの塩化ナトリウムを含有する35℃のアクチベーターに4分間浸漬した。次に、100ml/lのD−POPMEA(荏原ユージライト株式会社製)および100ml/lのD−POPMEB(荏原ユージライト株式会社製)を含有する45℃のメタライザーに3分間浸漬した。最後に、硫酸銅0.9mol/l、0.55mol/lの硫酸および0.017mol/lの塩酸を含有する25℃のEP−30(硫酸銅めっき液:荏原ユージライト株式会社製)に10分間浸漬し、通電初期をソフトスタート(最初の30秒を0.5V、次の30秒を1.0Vで行い、最終的に1.5Vとした)にして、ABS樹脂上にダイレクトプレーティングを施した。
Example 2
Direct plating on ABS resin:
A 50 × 100 × 3 mm ABS resin (manufactured by UMGABS) was used as a sample, and this was used as an etching treatment solution at 35 ° C. containing 0.01 mol / l potassium permanganate and 7.5 mol / l phosphoric acid. Soaked for 10 minutes. Next, after immersing 200 mg / l of PAA-03 (polyamylamine: manufactured by Nitto Boseki Co., Ltd.) for 2 minutes in a catalyst application enhancing liquid at 30 ° C. adjusted to pH 10 with sodium hydroxide, This was immersed in 1.2 mol / l hydrochloric acid for 1 minute at room temperature. Next, this was immersed for 4 minutes in an activator at 35 ° C. containing 25 ml / l D-POPACT (manufactured by Sugawara Eugilite), 1.2 mol / l hydrochloric acid and 1.7 mol / l sodium chloride. . Next, it was immersed for 3 minutes in a 45 ° C. metallizer containing 100 ml / l D-POPMEA (manufactured by Sakakibara Eugelite Co., Ltd.) and 100 ml / l D-POPMEB (manufactured by Sakakibara Eugelite Co., Ltd.). Finally, it is 10 to 25 ° C. EP-30 (copper sulfate plating solution: manufactured by Sugawara Eugleite Co., Ltd.) containing 0.9 mol / l copper sulfate, 0.55 mol / l sulfuric acid and 0.017 mol / l hydrochloric acid. Immerse for a minute and set the initial energization to a soft start (the first 30 seconds at 0.5 V, the next 30 seconds at 1.0 V, and finally 1.5 V), and direct plating on the ABS resin. gave.

ABS樹脂上にダイレクトプレーティングを行った結果、通電5分間で、治具被覆にめっきが析出することもなく、試料全体にめっきが付回ることができた。また、試験例1と同様にして測定されためっき皮膜の密着強度は0.8kgf/cmであった。   As a result of direct plating on the ABS resin, plating was able to be applied to the entire sample without energizing the plating on the jig coating within 5 minutes of energization. Further, the adhesion strength of the plating film measured in the same manner as in Test Example 1 was 0.8 kgf / cm.

実 施 例 3
各種樹脂上への無電解めっき皮膜の作製:
試料として各種樹脂(ABS、PC/ABS(PCを65%含有)、ASA、SAS、PC(UMGABS株式会社製)、ノリル(General Electric製)、ポリプロピレン(日本ポリケム株式会社製))を用いる以外は、実施例1と同様にして各樹脂上に無電解ニッケルめっきを施した。
Example 3
Preparation of electroless plating film on various resins:
Except for using various resins (ABS, PC / ABS (containing 65% PC), ASA, SAS, PC (manufactured by UMGABS), Noryl (manufactured by General Electric), polypropylene (manufactured by Nippon Polychem)) as samples. In the same manner as in Example 1, electroless nickel plating was applied on each resin.

比 較 例 4
各種樹脂上への無電解めっき皮膜の作製:
試料として各種樹脂(ABS、PC/ABS(PCを65%含有)、ASA、SAS、PC(UMGABS株式会社製)、ノリル(General Electric製)、ポリプロピレン(日本ポリケム株式会社製))を用い、これを3.5mol/lの無水クロム酸および3.6mol/lの硫酸を含む65℃のエッチング溶液に10分間浸漬した。次に、これを0.5mol/lの塩酸および10ml/lのエニレックスRD(荏原ユージライト株式会社製)を含む25℃の還元液に2分間浸漬した。更に、それを実施例1の1.2mol/lの塩酸浸漬(プレディップ)以降と同様の処理を施した。
Comparative Example 4
Preparation of electroless plating film on various resins:
Various resins (ABS, PC / ABS (containing 65% PC), ASA, SAS, PC (manufactured by UMGABS), Noryl (manufactured by General Electric), polypropylene (manufactured by Nippon Polychem)) were used as samples. Was immersed in an etching solution at 65 ° C. containing 3.5 mol / l chromic anhydride and 3.6 mol / l sulfuric acid for 10 minutes. Next, this was immersed in a reducing solution at 25 ° C. containing 0.5 mol / l hydrochloric acid and 10 ml / l Enirex RD (manufactured by Sugawara Eugleite Co., Ltd.) for 2 minutes. Further, it was subjected to the same treatment as in Example 1 after 1.2 mol / l hydrochloric acid immersion (pre-dip).

試 験 例 2
上記実施例3および比較例4で得られた無電解めっき皮膜の各種樹脂における析出性、治具被覆への析出を目視にて評価した。また、各種樹脂上に得られた無電解めっき皮膜の密着強度を試験例1と同様にして測定した。これらの結果を表2に示した。
Test example 2
The depositability in various resins of the electroless plating film obtained in Example 3 and Comparative Example 4 and the deposition on the jig coating were evaluated visually. Further, the adhesion strength of the electroless plating film obtained on various resins was measured in the same manner as in Test Example 1. These results are shown in Table 2.

Figure 0004275157
Figure 0004275157

実施例3で得られた無電解めっき皮膜は、いずれの樹脂上においても完全に付き回り、比較例4(クロム酸エッチングプロセス)と同等以上の密着強度を得ることができた。また、実施例3ではいずれの樹脂に無電解めっきを行った場合であっても治具被覆へめっきが析出することはなかった。一方、比較例4(クロム酸エッチングプロセス)は、ノリル、ポリプロピレン樹脂において未析出部分が発生し、PC樹脂においてはまったくめっきが析出しなかった。   The electroless plating film obtained in Example 3 was completely attached on any resin, and an adhesion strength equal to or higher than that of Comparative Example 4 (chromic acid etching process) could be obtained. Further, in Example 3, no plating was deposited on the jig coating even when any of the resins was subjected to electroless plating. On the other hand, in Comparative Example 4 (chromic acid etching process), an undeposited portion was generated in noryl and polypropylene resins, and no plating was deposited in the PC resin.

実 施 例 4
触媒付与増強液の効果:
実施例1の工程において、触媒付与増強液の有効成分をPAA−03(ポリアリルアミン:日東紡績株式会社製)から以下の表4に記載のものまたはアデカホープ、アデカトール、アデカブルロニック(いずれも旭電化工業株式会社製)、エナジーコール(ライオン株式会社製)にかえる以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。得られた無電解ニッケル皮膜のABS樹脂における析出性、治具被覆への析出を試験例1と同様にして評価した。また、ABS樹脂上のパラジウム吸着量を試験例1と同様にして測定した。これらの結果を表3に示した。
Example 4
Effect of catalyst application enhancing liquid:
In the process of Example 1, the active ingredient of the catalyst imparting enhancing liquid is PAA-03 (polyallylamine: manufactured by Nitto Boseki Co., Ltd.) as shown in Table 4 below, or Adeka Hope, Adekator, Adeka Bururonic (all Asahi Denka) The electroless nickel plating was performed on the ABS resin in the same manner except that it was changed to Industrial Co., Ltd. and Energy Coal (Lion Co., Ltd.). The depositability of the obtained electroless nickel coating on the ABS resin and the deposition on the jig coating were evaluated in the same manner as in Test Example 1. Further, the amount of palladium adsorbed on the ABS resin was measured in the same manner as in Test Example 1. These results are shown in Table 3.

Figure 0004275157
Figure 0004275157
Figure 0004275157
Figure 0004275157

Figure 0004275157
Figure 0004275157

触媒付与増強液の有効成分としてエチレンジアミン系化合物、エチレンイミン系高分子化合物、アリルアミン系高分子化合物、ジアリルアミン系高分子化合物、ビニルアミン系高分子化合物を使用すると、どれもパラジウム吸着量が増加していて治具析出することなく良好なめっき析出性を得られた。それに対して、1分子内に窒素原子が2個以下の化合物であるモノエタノールアミン、エチレンジアミン、グリシン、タウリン、アミノエタンチオール等の化合物はパラジウム吸着量の増加は見られなかった。また、アニオン系界面活性剤であるアデカホープ、エナジーコールでも特にパラジウム吸着量増加の効果は見られなかった。また、ノニオン系界面活性剤であるアデカトール、アデカブルロニックではパラジウム吸着量は増加せず、更に治具被覆への析出まで引き起こしてしまった。   When an ethylenediamine compound, an ethyleneimine polymer compound, an allylamine polymer compound, a diallylamine polymer compound, or a vinylamine polymer compound is used as an active ingredient of the catalyst imparting enhancement liquid, the amount of palladium adsorption increases. Good plating depositability was obtained without depositing the jig. In contrast, compounds such as monoethanolamine, ethylenediamine, glycine, taurine, and aminoethanethiol, which are compounds having 2 or less nitrogen atoms in one molecule, did not show an increase in palladium adsorption. In addition, the effect of increasing the amount of adsorbed palladium was not observed even with anionic surfactants such as Adeka Hope and Energy Coal. In addition, the adsorbing amount of palladium did not increase with nonionic surfactants, such as adekatol and adekabururonic, and further caused deposition to the jig coating.

実 施 例 5
エッチング処理液中の無機酸の効果:
実施例1の工程において、エッチング処理液の組成を以下の表5に記載のものにかえる以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。得られた無電解ニッケル皮膜のABS樹脂における析出性を試験例1と同様にして評価した。これらの結果を表5に示した。また、得られた無電解ニッケルめっき皮膜の密着強度を以下のテープ剥離試験にて行った。
Example 5
Effect of inorganic acid in etching solution:
In the process of Example 1, electroless nickel plating was performed on the ABS resin in the same manner except that the composition of the etching treatment liquid was changed to that shown in Table 5 below. The depositability of the obtained electroless nickel coating on the ABS resin was evaluated in the same manner as in Test Example 1. These results are shown in Table 5. Moreover, the adhesive strength of the obtained electroless nickel plating film | membrane was done in the following tape peeling tests.

<測定方法>
無電解ニッケルめっき後の試料表面にセロハンテープ(CT24:ニチバン株式会社製)を指の腹で密着させた後、テープを90°上方に剥離した。セロハンテープを剥離後、目視によりめっき皮膜がテープと一緒に剥離していないか確認した。
<Measurement method>
A cellophane tape (CT24: manufactured by Nichiban Co., Ltd.) was brought into close contact with the surface of the sample after electroless nickel plating, and the tape was peeled upward 90 °. After peeling the cellophane tape, it was confirmed by visual observation that the plating film was not peeled off together with the tape.

Figure 0004275157
Figure 0004275157

過マンガン酸カリウムと無機酸の混合溶液ではどれもめっき析出性は良好で密着強度も高くテープ剥離試験をクリアした。一方、過マンガン酸カリウム、リン酸それぞれ単一組成の液ではプラスチック表面が殆ど改質されていないため、その後の無電解ニッケルめっきで未析出部分が発生した。また、めっきさされた部分の密着強度も低くテープで簡単に剥がれてしまった。   All the mixed solutions of potassium permanganate and inorganic acid had good plating depositability and high adhesion strength, which cleared the tape peeling test. On the other hand, since the plastic surface was hardly modified in the liquids having a single composition of potassium permanganate and phosphoric acid, undeposited portions were generated in the subsequent electroless nickel plating. Moreover, the adhesion strength of the plated part was low and it was easily peeled off with tape.

実 施 例 6
触媒付与増強液を含有する水溶液のpHの効果:
実施例1の工程において、触媒付与増強液のpHを水酸化ナトリウムと硫酸を用いて以下の表6に記載の値に調整する以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。得られた無電解ニッケル皮膜のABS樹脂における析出性および治具被覆への析出を試験例1と同様にして評価した。また、ABS樹脂上のパラジウム吸着量を試験例1と同様にして測定した。これらの結果も併せて表6に示した。
Example 6
Effect of pH of aqueous solution containing catalyst application enhancing liquid:
In the process of Example 1, electroless nickel plating was performed on the ABS resin in the same manner except that the pH of the catalyst application enhancing solution was adjusted to the values shown in Table 6 below using sodium hydroxide and sulfuric acid. The depositability of the obtained electroless nickel coating on the ABS resin and the deposition on the jig coating were evaluated in the same manner as in Test Example 1. Further, the amount of palladium adsorbed on the ABS resin was measured in the same manner as in Test Example 1. These results are also shown in Table 6.

Figure 0004275157
Figure 0004275157

触媒付与増強液のpHが5.0〜12.0で治具へめっきが析出することなくパラジウム吸着量増加の効果が見られた。   When the pH of the catalyst application enhancing liquid was 5.0 to 12.0, the effect of increasing the amount of palladium adsorbed was observed without plating being deposited on the jig.

実 施 例 7
触媒付与増強液の濃度による効果:
実施例1の工程において、触媒付与増強液中の有効成分であるポリアリルアミン(PAA−03:日東紡績株式会社製)の濃度を表7に記載の値に調整する以外は全て同様にABS樹脂上に無電解ニッケルめっきを施した。得られた無電解ニッケル皮膜のABS樹脂における治具被覆への析出を試験例1と同様にして評価した。また、ABS樹脂上のパラジウム吸着量を試験例1と同様にして測定した。これらの結果も併せて表7に示した。
Example 7
Effect of concentration of catalyst application enhancing liquid:
In the process of Example 1, except that the concentration of polyallylamine (PAA-03: manufactured by Nitto Boseki Co., Ltd.), which is an active ingredient in the catalyst application enhancing liquid, is adjusted to the values shown in Table 7, all on the ABS resin. Was subjected to electroless nickel plating. Precipitation of the obtained electroless nickel coating on the jig coating in the ABS resin was evaluated in the same manner as in Test Example 1. Further, the amount of palladium adsorbed on the ABS resin was measured in the same manner as in Test Example 1. These results are also shown in Table 7.

Figure 0004275157
Figure 0004275157

ポリアリルアミンの濃度に関係なく、治具被覆への析出を抑制し、パラジウム吸着量を増加させる効果が見られた。   Regardless of the polyallylamine concentration, the effect of suppressing the precipitation on the jig coating and increasing the amount of palladium adsorbed was observed.

本発明のプラスチック表面の金属化方法は、プラスチック表面に十分に密着しためっきをすることができ、しかも、治具にめっきが析出しない、実用性の高い方法である。また、本発明方法によれば、プラスチック表面への触媒金属の吸着量を増やすことができるので、従来の方法では触媒金属が吸着しにくいプラスチックにも同様にめっきすることができる。   The method for metallizing a plastic surface according to the present invention is a highly practical method that can perform plating with sufficient adhesion to the plastic surface and that does not deposit on the jig. In addition, according to the method of the present invention, the amount of catalyst metal adsorbed on the plastic surface can be increased, and therefore, it is possible to similarly plate plastic that is difficult to adsorb catalyst metal by the conventional method.

従って、本発明方法は、クロムフリーのプラスチック表面の金属化プロセスとして利用できるものである。   Therefore, the method of the present invention can be used as a metallization process for a chromium-free plastic surface.

図1はABS樹脂表面の表面をフーリエ変換赤外分光光度計で測定した結果である(1:エッチング処理無しのABS樹脂表面、2:クロム酸を含有するエッチング処理液で処理後のABS樹脂表面、3:過マンガン酸を含有するエッチング処理液で処理後のABS樹脂表面)。FIG. 1 shows the result of measuring the surface of an ABS resin with a Fourier transform infrared spectrophotometer (1: ABS resin surface without etching treatment, 2: ABS resin surface after treatment with an etching treatment solution containing chromic acid) 3: ABS resin surface after treatment with an etching treatment solution containing permanganic acid).

Claims (17)

プラスチックを、過マンガン酸塩および無機酸を含有するエッチング処理液で処理し、次いで、前記処理されたプラスチックを、その表面に露出した官能基に選択吸着性り、窒素原子を3個以上含有し、分子量が100以上の化合物を含有する触媒付与増強液で処理し、更に、前記触媒付与増強液で処理されたプラスチックに、触媒付与処理液にて触媒を付与し、その後、前記触媒を付与されたプラスチックに金属めっきを施すことを特徴とするプラスチック表面の金属化方法。 Plastic, treated with etching solution containing permanganate and inorganic acids, then said treated plastic, Ri selective adsorptive functional groups exposed on the surface Oh, three or more nitrogen atoms And a catalyst imparting enhancing liquid containing a compound having a molecular weight of 100 or more , and further, a catalyst is imparted to the plastic treated with the catalyst imparting enhancing liquid with the catalyst imparting treating liquid, and then the catalyst is added. A method for metallizing a plastic surface, comprising applying metal plating to the applied plastic. エッチング処理液に含有される無機酸が、リン酸、硫酸および硝酸からなる群から選ばれた無機酸の少なくとも1種である請求項1に記載のプラスチック表面の金属化方法。   The method for metallizing a plastic surface according to claim 1, wherein the inorganic acid contained in the etching treatment solution is at least one inorganic acid selected from the group consisting of phosphoric acid, sulfuric acid and nitric acid. エッチング処理を、0℃〜50℃のエッチング処理液を用いて行う請求項1または2に記載のプラスチック表面の金属化方法。   The method for metallizing a plastic surface according to claim 1 or 2, wherein the etching treatment is performed using an etching treatment solution at 0 ° C to 50 ° C. エッチング処理液中の過マンガン酸塩の濃度が、0.0005mol/L以上である請求項1〜3のいずれかに記載のプラスチック表面の金属化方法。   The method for metallizing a plastic surface according to any one of claims 1 to 3, wherein the concentration of permanganate in the etching solution is 0.0005 mol / L or more. エッチング処理液中の無機酸の濃度が、2mol/L以上である請求項1〜4のいずれかに記載のプラスチック表面の金属化方法。   The method for metallizing a plastic surface according to any one of claims 1 to 4, wherein the concentration of the inorganic acid in the etching solution is 2 mol / L or more. 触媒付与増強液に含有される、プラスチック表面に露出した官能基に選択吸着性り、窒素原子を3個以上含有し、分子量が100以上の化合物が、エチレンジアミン系化合物、エチレンイミン系高分子化合物、アリルアミン系高分子化合物、ジアリルアミン系高分子化合物またはビニルアミン系高分子化合物である請求項1〜5の何れかに記載のプラスチック表面の金属化方法。 Is contained in the catalyst imparting amplifier solution, Ri selective adsorptive functional groups exposed on the plastic surface is Oh, the nitrogen atom contains three or more compounds having a molecular weight of 100 or higher, ethylene diamine based compounds, ethyleneimine polymers The method for metallizing a plastic surface according to any one of claims 1 to 5, which is a compound, an allylamine polymer compound, a diallylamine polymer compound or a vinylamine polymer compound . 触媒付与増強液中の、プラスチック表面に露出した官能基に選択吸着性のある化合物の濃度が10mg/L以上である請求項1〜のいずれかに記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to any one of claims 1 to 6 , wherein the concentration of the compound having selective adsorptivity to the functional group exposed on the plastic surface in the catalyst application enhancing liquid is 10 mg / L or more. 触媒付与増強液のpHが、5〜12である請求項1〜のいずれかに記載のプラスチック表面の金属化方法。 The method of metallizing a plastic surface according to any one of claims 1 to 7 , wherein the pH of the catalyst application enhancing liquid is 5 to 12. 金属めっきが、無電解めっきである請求項1〜のいずれかに記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to any one of claims 1 to 8 , wherein the metal plating is electroless plating. 触媒付与処理液が、貴金属を含むものである請求項に記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to claim 9 , wherein the catalyst application treatment liquid contains a noble metal. 触媒付与処理液が、パラジウムを含む溶液である請求項または10に記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to claim 9 or 10 , wherein the catalyst application treatment liquid is a solution containing palladium. 触媒付与処理液が、パラジウム/すず混合コロイド触媒溶液である請求項11のいずれかに記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to any one of claims 9 to 11 , wherein the catalyst application treatment liquid is a palladium / tin mixed colloid catalyst solution. 触媒付与処理液にて触媒を付与した後に、塩酸または硫酸を含有する活性化処理液にて処理する工程を含む請求項1〜12のいずれかに記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to any one of claims 1 to 12 , further comprising a step of treating with an activation treatment liquid containing hydrochloric acid or sulfuric acid after applying the catalyst with the catalyst application treatment liquid. 活性化処理液中の塩酸または硫酸の濃度が、0.5mol/L以上である請求項13に記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to claim 13 , wherein the concentration of hydrochloric acid or sulfuric acid in the activation treatment liquid is 0.5 mol / L or more. 金属めっきが電気めっきである請求項1〜のいずれかに記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to any one of claims 1 to 8 , wherein the metal plating is electroplating. 触媒付与処理液が、パラジウム/すず混合コロイド触媒溶液である請求項15に記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to claim 15 , wherein the catalyst application treatment solution is a palladium / tin mixed colloid catalyst solution. 触媒付与処理液にて触媒を付与した後に、更に、銅イオンを含有するpH7以上の活性化処理液で処理する請求項16に記載のプラスチック表面の金属化方法。 The method for metallizing a plastic surface according to claim 16 , further comprising treating with an activation treatment liquid containing copper ions and having a pH of 7 or higher after the catalyst is imparted with the catalyst provision treatment liquid.
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