KR20200126146A - Touch screen panel and method for manufacturing the same - Google Patents

Abstract

The present invention relates to a touch screen panel and a manufacturing method thereof. The touch screen panel comprises: a touch sensor having an electrode for touch sensing; and a cover glass disposed in an upper part of the touch sensor and provided with a half mirror layer on one side thereof. The present invention has an advantage of reducing a rainbow phenomenon by forming a half mirror layer (210) having desired transmittance and reflectance on one surface of the cover glass (200).

Description

Touch screen panel and manufacturing method thereof {TOUCH SCREEN PANEL AND METHOD FOR MANUFACTURING THE SAME}

The present invention relates to a touch screen panel and a method for manufacturing the same, and more particularly, to a touch screen panel for improving the rainbow phenomenon and a method for manufacturing the same.

As the types of electronic devices such as smartphones, pads, and navigation are diversified, various technologies have been proposed that can reduce the size of electronic devices while increasing the display screen area. And recently, multimedia devices equipped with a touch screen that can be easily input without a separate input tool are in the spotlight.

The touch screen can be classified into a resistive type, a capacitive type, an ultrasonic type, an infrared sensor type, an electromagnetic induction type, and the like according to an operation method. Such a touch screen is manufactured by attaching a touch screen panel (TSP) to the display. And the touch screen panel is manufactured by attaching a thin film type touch sensor to the cover glass.

When the touch screen is touched, a signal is transmitted to the touch sensor through the cover glass. The touch sensor receives the touch signal and sends it to the PC (software), and the PC converts the signal to digital and transmits it to the display, and the display receives the signal and displays the screen.

However, the touch screen has a problem in that a rainbow phenomenon occurs due to haze of sunlight incident under sunlight. The rainbow phenomenon means that when light is illuminated, a rainbow shape like a strip of oil appears. The rainbow phenomenon lowers visibility and gives users of electronic devices a feeling of fatigue.

An object of the present invention is to provide a touch screen panel in which a half mirror is applied to a cover glass and a method of manufacturing the same so as to improve the rainbow phenomenon and secure excellent visibility.

According to a feature of the present invention for achieving the object as described above, the present invention includes a touch sensor having an electrode for touch sensing, and a cover glass disposed on the touch sensor and having a half mirror layer on one surface thereof.

The electrode for touch sensing is implemented as a metal mesh, and the metal mesh may be a metal material arranged in a grid pattern or a cross pattern.

The half mirror layer may be formed by laminating a single metal thin film or in multiple layers.

The metal thin film may be at least one selected from Al and Ni.

The reflectivity of the half mirror layer may range from 12 to 25% in the visible light region.

The transmittance of the half mirror layer may range from 60 to 90% in the visible light region.

The thickness of the half mirror layer may be 100 to 200 angstroms (Å).

The steps of manufacturing a touch sensor having an electrode for touch sensing, preparing a cover glass, forming a half mirror layer on one surface of the cover glass, and attaching a cover glass having a half mirror layer formed thereon to the upper portion of the touch sensor. Include.

In the step of manufacturing a touch sensor including an electrode for touch sensing, the electrode for touch sensing is implemented as a metal mesh.

The step of forming the half mirror layer on one side of the cover glass is formed by applying a sputtering method and targeting a metal material to 100 to 200 angstroms (Å) on one side of the cover glass.

The metal material may be at least one selected from Al and Ni.

The present invention has an effect of reducing the reflectance of the cover glass by forming a half-mirror layer on the cover glass, thereby reducing a rainbow phenomenon against sunlight and thus improving visibility.

In addition, in the present invention, since the electrode is implemented as a metal mesh and is formed in a two-layer structure of Cu and CuOx, the conductivity is good, the metal reflection intensity can be reduced, and a fine pattern with a thin line width can be formed. Therefore, the present invention has an effect of increasing the transmittance and excellent visibility.

1 is an exploded perspective view showing a touch screen panel according to an embodiment of the present invention.
2 is a block diagram showing a touch screen panel according to an embodiment of the present invention.
3 is a block diagram showing a touch screen panel according to another embodiment of the present invention.
4 is a view showing a process of forming an electrode of a touch sensor in a touch screen panel according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIG. 1, the touch screen panel is disposed on the display 10 and disposed on the touch sensor 100 and the touch sensor 100 having electrodes for touch sensing, and a half mirror layer ( 210) includes a cover glass 200 is provided.

The electrode for touch sensing 120 may be implemented with a metal mesh 120a. The metal mesh 120a may be a metal material arranged in a grid pattern or a cross pattern. The electrode 120 to which the metal mesh 120a is applied is useful for flexible displays because it has good conductivity, good transmittance, and bendable because it uses metal. In addition, the electrode 120 to which the metal mesh 120a is applied is lower in price than ITO, so it is competitive in price and has excellent touch sensitivity. Since the metal mesh 120a implementing the electrode 120 has a thin line width, a large amount of light passes through it, so that the transmittance is increased and power consumption is reduced accordingly.

The touch sensor 100 may be implemented with an ITO electrode on the transparent substrate 110. However, in the touch sensor 100, it is more excellent in terms of touch sensitivity and transmittance to implement the electrode 120 by forming the metal mesh 120a on the transparent substrate 110.

The touch sensor 100 is formed by overlapping two electrodes 121 and 122 intersecting. The two electrodes that intersect include a plurality of first electrodes 121 and a plurality of second electrodes 122. The touch sensor 100 senses the touch position using x,y coordinates of a portion where the first electrode 121 and the second electrode 122 intersect.

1 and 2, the first electrodes 121 are arranged in one direction on the first transparent substrate 110. The second electrodes 122 are arranged in two directions crossing one direction on the second transparent substrate 112. When the first transparent substrate 111 on which the first electrode 121 is formed is overlapped with the second transparent substrate 112 on which the second electrode 122 is formed, the first electrode 121 and the second electrode 122 cross each other. It becomes a touch sensor 100 having a lattice structure. The first and second directions may mean the x-axis and y-axis directions.

The first electrode 121 may function as an Rx electrode (reception electrode), and the second electrode 122 may function as a Tx electrode (transmission electrode). The first electrode 121 and the second electrode 122 may be implemented as a metal mesh. The metal mesh may have a line width of 3 μm or less, and preferably a line width of 2.6 μm or less.

The touch screen panel 20 is manufactured by laminating the touch sensor 100 with a cover glass 200 and an adhesive film 140 and is attached to the upper portion of the display 10. The adhesive films 130 and 140 may use an optically transparent adhesive film (OCA) 140.

The cover glass 200 may be attached to the upper portion of the touch sensor 100 via an adhesive film 140. The cover glass 200 may be formed of a tempered glass material. Tempered glass is resistant to impacts and scratches and has high light transmittance, so you can see a brighter and cleaner screen.

In order to reduce the rainbow phenomenon, the cover glass 200 forms a half mirror layer 210 on one surface. When the touch screen panel is exposed to sunlight, the rainbow phenomenon occurs due to reflection by metal forming electrodes, scattering of light due to refraction of the surface of the cover glass, and reflectance of the cover glass.

For the above reasons, a half mirror layer 210 is formed on one surface of the cover glass 200 to reduce a rainbow phenomenon due to sunlight.

It is effective to set the reflectance of the half mirror layer 210 in the range of 12 to 25% in the visible light region and the transmittance in the range of 60 to 90% in the visible light region.

The transmittance and reflectance range reduce the reflectance of the cover glass in sunlight to prevent a rainbow phenomenon. Visibility can be secured when the transmittance is 60% or more in the visible light region, and the rainbow phenomenon is prevented by lowering the reflectance.

The half mirror layer 210 can freely design reflectance and transmittance by appropriately selecting a material and thickness.

The half mirror layer 210 may be a metal mirror layer in which one or multiple metal thin films are stacked. The metal thin film may be made of at least one selected from among Al and Ni. In addition to Al and Ni, the metal thin film may be made of at least one selected from Au, Ag, Cu, Pt, Pd, Se, Te, Rh, Ir, Ge, Os, Ru, Cr, and W. Preferably, the metal thin film is made of at least one selected from Al and Ni. When forming a metal thin film of Al and Ni, a semi-transparent half mirror layer 210 can be formed without exhibiting the inherent properties of the metal. The translucent half mirror layer 210 lowers the reflectance of the cover glass 200 in sunlight.

In addition, the half mirror layer 210 is formed to have a thickness of 100 to 200 angstroms (Å), since the metal does not exhibit its natural properties and must be translucent.

Although not shown, after forming a hard coating layer on one surface of the cover glass 200, the half mirror layer 210 may be formed by coating a metal thin film such as Al or Ni. The hard coating layer may be formed by applying or depositing acrylic polyurethane on one surface of the cover glass. The hard coating layer () increases the adhesion of the half mirror layer 210 to the cover glass 200.

The half mirror layer 210 may be formed by alternately stacking an Ai metal thin film and an Ni metal thin film.

As shown in FIG. 3, a refractive index layer 220 may be further formed on the half mirror layer 210. The refractive index layer 220 can be destroyed by reflecting a part of sunlight before the visible light enters the half mirror layer by stacking a high refractive index layer and a low refractive index layer in order in multiple layers and designing the refractive index or thickness of each layer. . The refractive index layer 220 may be formed by alternately stacking a low refractive index layer containing SiO ₂ as a main component and a low refractive index layer containing TiO ₂ as a main component.

On the other hand, the manufacturing method of the touch screen panel includes manufacturing a touch sensor having an electrode for touch sensing, preparing a cover glass, forming a half mirror layer on one surface of the cover glass, and a cover glass having a half mirror layer formed thereon. And attaching to the upper portion of the touch sensor.

In the step of manufacturing a touch sensor including an electrode for touch sensing, the electrode for touch sensing may be implemented as a metal mesh.

1 to 3, in the manufacturing of the touch sensor, a first electrode 121 implemented as a metal mesh is formed on the first transparent substrate 110, and a metal mesh is formed on the second transparent substrate 110. The second electrode 122 is implemented as and intersecting the first electrode 121 is formed.

As shown in FIG. 4, the first electrode 121 and the second electrode 122 are each formed of at least one selected from Cu, CuOx, and Cu-CuOx. For example, the electrode 120 may be formed in a two-layer structure of a Cu layer (b) and a CuO layer (c). The two-layer structure is to increase the adhesion between the electrode 120 and the transparent substrate 110 and to form a fine and uniform line width. Since the Cu layer has a reflectance of about 50% and the CuO layer has a reflectance of about 15%, forming a CuO layer on top of the Cu layer can ensure conductivity while lowering the reflectance. Lowering the metal reflectance can reduce the rainbow phenomenon.

A hard coating layer (a) may be formed between the transparent substrate 110 and the electrode 120. The hard coating layer (a) may be formed by coating a hard coating solution on the transparent substrate 110.

The hard coating layer (a) prevents contamination of the transparent substrate 110 and makes the transparent substrate 110 with high hardness so that scratches are difficult to occur. In addition, the hard coating layer (a) allows the electrode 120 to be well adhered to the surface of the transparent substrate 110, has less light interference pattern, and improves visibility. The hard coating layer (a) may be formed of acrylic polyurethane. In addition to this, the hard coating layer may be formed of a polyester-based resin, a polyurethane-based resin, or the like. The hard coating layer (a) exhibits high adhesion even without roughening the surface of the transparent substrate 110.

As shown in (a) of Figure 4, the process of forming the electrode 120 on each transparent substrate 110 is to form a hard coating layer (a) on the transparent substrate 110, and the hard coating layer (a) The electrode layers (b,c) are formed on the electrode layers (b,c) and a photoresist layer (d) is stacked on the electrode layers (b,c).

Next, a mask e in which a pattern hole p is formed on the photoresist layer d is formed, and exposed, developed, and etched to leave a portion corresponding to the pattern hole p, and the remaining portions are removed. Next, the photoresist layer (d) remaining on the electrode layers (b,c) is etched.

In the process of forming the hard coating layer (a) on the transparent substrate 110, the transparent substrate 110 may use a PET film. The hard coating layer (a) may be formed by applying or depositing acrylic polyurethane on the transparent substrate 110. The hard coating layer (a) may be formed in a thickness range of 5 μm to 15 μm.

In the process of forming the electrode layers (b,c) on the hard coating layer (a), the electrode layers (b,c) include a Cu layer (b) and a CuO layer (c) stacked on top of the Cu layer (b). I can. A Cu layer (b) may be formed on the hard coating layer (a) by a sputtering method, and a CuO layer (c) may be formed on the Cu layer (b) by a sputtering method. The Cu layer (b) becomes a seed layer. The Cu layer (b) may be formed to a thickness of 200 to 400 μm, and the CuO layer may be formed to a thickness of 5 μm. Since the Cu layer has a reflectance of about 50% and the CuO layer has a reflectance of about 15%, forming a CuO layer on top of the Cu layer can ensure conductivity while lowering the reflectance. When the electrode layer is formed by the sputtering method, it is easier to form the electrode layers (b,c) into a thin film.

The sputtering method is performed in a roll to roll sputter (roll to roll), and by applying an ion beam treatment (Iin Beam treatment), it has a function to modify the surface and strengthen the adhesion of the electrode.

In the process of laminating the photoresist layer (d) on the electrode layers (b,c), the photoresist layer (d) may use a photosensitive polymer. The photosensitive polymer undergoes a curing reaction to ultraviolet rays.

The step of laminating the photoresist layer (d) on the electrode layers (b,c) may use a method of coating in a roll to roll system. For example, a photoresist layer (d) may be formed by electrospinning a liquid photoresist on the electrode layers (b,c) of the transparent substrate 110 in a continuous process in a roll-to-roll system. Electrospinning forms a uniform photoresist layer (d). In the roll-to-roll continuous process, photoresist can be continuously coated with a thickness of 1 to 2 μm. The photoresist layer (d) may be formed to a thickness of 3.5 μm.

In the step of disposing the mask e in which the pattern hole p is formed on the photoresist layer d, the pattern hole p is for forming a metal mesh. The pattern hole (p) is a hole previously designed to form a metal mesh. The pattern hole p corresponds to the metal mesh. The width of the pattern holes p may be 3 μm or less, preferably 2.6 μm or less, and the spacing between the pattern holes may be 11 μm or less.

In the step of exposing, developing, and etching to leave a portion corresponding to the pattern hole p and remove the remaining portion, an image of the electrode 120 formed of a metal mesh is realized.

As shown in (b) of FIG. 4, a mask (e) having pattern holes (p) for forming the electrode 120 is disposed on the photoresist layer (d), and ultraviolet rays (UV) are applied using an exposure machine. When irradiated, the photoresist layer (d) undergoes a curing reaction in the UV-rayed portion.

The development is to dissolve and remove the uncured portion of the photoresist layer (d) with a developer and leave the elapsed portion of the photoresist layer (d) to form an image of the electrode 120 on the transparent substrate 110.

Etching is to remove the electrode layers (b, c) in the portion corresponding to the portion from which the photoresist layer (d) has been removed. The etchant may be ferric chloride (FeCl ₂ ), copper chloride (CuCl ₂ ), or the like. As shown in (c) of FIG. 4, when exposure, development, and etching are performed, the portion corresponding to the pattern hole p remains and the remaining portions are removed.

Next, the photoresist layer (d) remaining on the electrode layer is etched to expose a two-layer electrode made of a Cu layer and CuO to the transparent substrate 110.

In the above-described method, the first electrode 121 implemented as a metal mesh 120a and arranged in one direction is formed on the first transparent substrate 111, and the metal mesh 120a is formed on the second transparent substrate 112. After forming the second electrode 122 that is implemented in and is arranged in two directions crossing one direction, the first transparent material 111 and the second electrode 122 cross each other so that the first electrode 121 and the second electrode 122 cross each other. The touch sensor 100 may be manufactured by overlapping the transparent substrate 112.

The step of forming the half mirror layer on one surface of the cover glass is formed by applying a sputtering method and targeting a metal material on one surface of the cover glass 200 at 100 to 200 angstroms. When a metal material is targeted at 100 to 200 angstroms, the metal's natural properties do not come out and a semi-transparent half mirror layer 210 is formed.

For example, if a metal material and a cover glass to be coated with a metal material are fixed in a vacuum chamber, argon gas is injected into the vacuum chamber, and then the metal material is targeted at 100 to 200 angstroms, the metal material is formed in a thin film on the cover glass. The semi-transparent half-mirror layer is formed uniformly and deposited. As the metal material, at least one selected from Al and Ni is used. By applying the sputtering method, the half mirror layer 210 having a high adhesion to the cover glass 200 and having a uniform thin film shape can be formed.

During sputtering, a dense and uniform thin film can be formed, the optical performance is good, and the half mirror layer 210 having high adhesion to the cover glass can be formed.

The half mirror layer 210 may be formed by depositing on the cover glass 200, but may be formed by patterning if necessary.

As described above, by forming the half mirror layer 210 having a desired transmittance and reflectance on one surface of the cover glass 200, it is possible to reduce the rainbow phenomenon. In addition, by further forming a refractive index layer 220 on the half mirror layer 210, the transmittance may be increased and the reflectance may be reduced to improve visibility.

The present invention has been disclosed in the drawings and the specification, the best embodiments. Here, specific terms have been used, but these are only used for the purpose of describing the present invention, and are not used to limit the meaning or the scope of the present invention described in the claims. Therefore, the present invention will be understood by those of ordinary skill in the art that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true technical scope of the present invention should be determined by the technical idea of the appended claims.

10: display 20: touch screen panel
100: touch sensor 110: transparent material
111: first transparent substrate 112: second transparent substrate
120: electrode 120a: mesh pattern
121: first electrode 122: second electrode
130, 140: adhesive film 200: cover glass
210: half mirror layer 220: refractive index layer
a: hard coating layer b: Cu layer
c: CuO layer d: photoresist layer
e: mask p: pattern hole

Claims (11)

A touch sensor having an electrode for touch sensing; And
Includes; a cover glass disposed on the touch sensor and provided with a half mirror layer on one side
Touch screen panel. The method of claim 1,
The electrode for touch sensing is implemented with a metal mesh,
The metal mesh is a touch screen panel, characterized in that the metal material is arranged in a grid pattern or a cross pattern. The method of claim 1,
The half mirror layer is a metal mirror layer in which a metal thin film is stacked in one layer or in multiple layers. The method of claim 3,
The metal thin film is a touch screen panel of at least one selected from Al and Ni. The method of claim 1,
A touch screen panel having a reflectance of the half mirror layer in a range of 12 to 25% in a visible light region. The method of claim 1,
A touch screen panel having a transmittance of the half mirror layer in a range of 60 to 90% in a visible light region. The method of claim 1,
The half-mirror layer has a thickness of 100 to 200 angstroms (Å). Manufacturing a touch sensor having an electrode for touch sensing;
Preparing a cover glass, and forming a half mirror layer on one surface of the cover glass; And
Attaching a cover glass on which the half mirror layer is formed on the touch sensor;
Touch screen panel manufacturing method comprising a. The method of claim 8,
In the step of manufacturing a touch sensor having the electrode for touch sensing,
The touch sensing electrode is a method of manufacturing a touch screen panel implemented with a metal mesh. The method of claim 8,
Forming a half mirror layer on one surface of the cover glass
Apply sputtering method,
A method of manufacturing a touch screen panel formed by targeting a metal material to 100 to 200 angstroms (Å) on one surface of the cover glass. The method of claim 10,
The metal material is a touch screen panel manufacturing method of at least one selected from Al and Ni.

Images