KR20200106310A - Reactor of apparatus for processing substrate and apparatus for processing substrate comprising thereof - Google Patents

Abstract

A reactor of a substrate processing apparatus and a substrate processing apparatus including the same are disclosed. According to the present invention, a reactor of a substrate processing apparatus enables the production of a reactor for a substrate processing apparatus corresponding to a large-area substrate, can be manufactured in various forms to expand the scope of application, and can simplify the manufacturing and maintenance process.

Description

A reactor of a substrate processing apparatus and a substrate processing apparatus including the same {REACTOR OF APPARATUS FOR PROCESSING SUBSTRATE AND APPARATUS FOR PROCESSING SUBSTRATE COMPRISING THEREOF}

The present invention relates to a reactor of a substrate processing apparatus and a substrate processing apparatus including the same. More specifically, a substrate that enables the manufacture of a reactor for a substrate processing apparatus corresponding to a large-area large substrate, can be manufactured in various forms, expands the scope of application, and simplifies the manufacturing and maintenance process. It relates to a reactor of a processing apparatus and a substrate processing apparatus including the same.

Substrate processing apparatuses are used in the manufacture of flat panel displays, semiconductors, solar cells, etc., and are roughly classified into vapor deposition apparatus and annealing apparatus. Among them, an annealing apparatus is an apparatus that improves the properties of the deposited film after depositing a film on a substrate, and is a heat treatment apparatus that crystallizes or phase-changes the deposited film.

The conventional heat treatment apparatus has a substantially vertical or hexahedral shape, and is made of a quartz material. However, in view of the recent increase in the size of the substrate, it is not efficient in terms of difficulty and cost to increase the size of a heat treatment apparatus made of quartz. On the other hand, although a large heat treatment apparatus may be formed of a metal material, it is not good in terms of durability, and there is a problem of increasing manufacturing cost and time since a welding process must be performed to connect each component.

In addition, as the heat treatment apparatus becomes larger and manufactured in various forms, it is a matter to consider the sealing problem with the external environment.

The present invention has been conceived to solve the problems of the prior art as described above, and an object of the present invention is to provide a reactor of a substrate processing apparatus capable of processing a large-area large substrate, and a substrate processing apparatus including the same.

In addition, an object of the present invention is to provide a reactor of a substrate processing apparatus and a substrate processing apparatus including the same, which facilitates manufacturing a large-sized reactor and expands its application range by manufacturing in various forms.

In addition, it is an object of the present invention to provide a reactor of a substrate processing apparatus and a substrate processing apparatus including the same, capable of improving manufacturing efficiency and maintenance/maintenance convenience in various selection of materials.

The above object of the present invention is a reactor (reactor) of a substrate processing apparatus in which at least one substrate is processed, the lower portion of the reactor is open, the reactor side and the upper portion of the reactor have a closed shape including at least one heat insulating plate , The reactor side, a plurality of vertical frames; A plurality of horizontal frames connecting a pair of adjacent vertical frames; And a plurality of heat insulating plates whose edges are in contact with at least the outside of the vertical frame and the horizontal frame.

At least one upper frame having both ends connected to a horizontal frame or a vertical frame disposed at the top end of the reactor side; And it may include a plurality of insulation plates at least the edges contact outside the vertical frame, the horizontal frame and the upper frame.

The upper part of the reactor includes a plurality of upper frames, and the upper frame includes: at least one first upper frame disposed in a first direction; And at least one second upper frame disposed in a second direction perpendicular to the first direction.

The first upper frame may be connected to the upper end of the vertical frame, and the second upper frame may be connected to the upper end of the horizontal frame.

The reactor side may have a polygonal column shape.

On one surface constituting the side of the reactor, a plurality of vertical frames may be arranged at regular intervals along the horizontal direction, and a plurality of horizontal frames connecting a pair of adjacent vertical frames may be arranged at regular intervals along the vertical direction. .

The bracket is connected to the outside of the horizontal frame, and at least a part of the edge of the insulation plate may be seated in the seating groove of the bracket.

The bracket is further connected to the outside of the vertical frame, and at least a part of the edge of the insulation plate may be seated in the seating groove of the bracket.

An elastic means is disposed in the seating groove, and the elastic means can be fixed by pushing the edge of the heat insulating plate to one side of the seating groove.

At least one support protrusion is formed at a corner of the heat insulating plate, and a lower portion of the support protrusion may be supported in a mounting groove of a bracket connected to the vertical frame.

The lower sides of both ends of the upper frame may be connected to the upper side of the vertical frame or the horizontal frame.

The upper portion of the reactor may have a planar shape, a dome shape, or a shape including a curvature in a vertical direction.

The material of the heat insulating plate may include at least one of quartz, ceramic, and glass.

In addition, the above object of the present invention is a substrate processing apparatus in which at least one substrate is processed, comprising: a reactor providing a chamber space in which the substrate is processed; A frame supporting the reactor; And a substrate loading and elevating means for moving the boat on which at least one substrate is loaded in an up-down direction, and the reactor includes a plurality of heat-insulating plates having a lower open and at least an edge contacting an outer side of the reactor and an upper outer side of the reactor. It can have a closed shape.

The reactor side includes a plurality of vertical frames; A plurality of horizontal frames connecting a pair of adjacent vertical frames; And a plurality of heat insulating plates disposed in an area partitioned by the vertical frame and the horizontal frame.

The upper part of the reactor may include at least one upper frame connected at both ends to a horizontal frame or a vertical frame disposed at an uppermost end of the side of the reactor; And a plurality of heat insulating plates disposed in an area partitioned by the vertical frame, the horizontal frame, and the upper frame.

A gas supply unit formed to communicate with the reactor and supplying a substrate processing gas to the inner space of the reactor; And a gas discharge unit configured to communicate with the reactor and discharging the substrate treatment gas in the inner space of the reactor.

When the boat is located at the top dead center of the elevating means, the chamber space of the reactor may be sealed.

When the substrate treatment gas is supplied to the chamber space of the reactor, the atmospheric pressure of the chamber space may be set higher than the outer space of the reactor.

The bracket is connected to the outside of the horizontal frame, and at least a part of the edge of the insulation plate may be seated in the seating groove of the bracket.

The bracket is further connected to the outside of the vertical frame, and at least a part of the edge of the insulation plate may be seated in the seating groove of the bracket.

An elastic means is disposed in the seating groove, and the elastic means can be fixed by pushing the edge of the heat insulating plate to one side of the seating groove.

At least one support protrusion is formed at a corner of the heat insulating plate, and a lower portion of the support protrusion may be supported in a mounting groove of a bracket connected to the vertical frame.

According to the present invention configured as described above, there is an effect of providing a reactor of a substrate processing apparatus capable of processing a large-area large substrate.

In addition, the present invention has the effect of facilitating the manufacture of a large-sized reactor, and expanding the application range by manufacturing in various forms.

In addition, according to the present invention, the selection of materials is diversified, and the efficiency of manufacture and convenience of maintenance/repair can be improved.

1 is a schematic diagram showing a reactor of a substrate processing apparatus according to an embodiment of the present invention.
Figure 2 is an enlarged schematic diagram showing a state in which the heat insulating plate is installed on the frame according to an embodiment of the present invention.
3 is an enlarged schematic diagram showing a state in which a heat insulating plate is installed on a frame according to another embodiment of the present invention.
4 is an enlarged schematic view showing a horizontal frame and a bracket connected to the vertical frame according to an embodiment of the present invention.
5 is a side cross-sectional view of AA′ of FIG. 4.

DETAILED DESCRIPTION OF THE INVENTION The detailed description of the present invention to be described later refers to the accompanying drawings, which illustrate specific embodiments in which the present invention may be practiced. These embodiments are described in detail sufficient to enable a person skilled in the art to practice the present invention. It is to be understood that the various embodiments of the present invention are different from each other, but need not be mutually exclusive. For example, specific shapes, structures, and characteristics described herein may be implemented in other embodiments without departing from the spirit and scope of the present invention in relation to one embodiment. In addition, it should be understood that the location or arrangement of individual components within each disclosed embodiment may be changed without departing from the spirit and scope of the present invention. Accordingly, the detailed description to be described below is not intended to be taken in a limiting sense, and the scope of the present invention, if properly described, is limited only by the appended claims, along with all scopes equivalent to those claimed by the claims. In the drawings, similar reference numerals refer to the same or similar functions over several aspects, and the length, area, thickness, and the like may be exaggerated and expressed for convenience.

In the present specification, the substrate may be understood to include a substrate, a semiconductor substrate, a solar cell substrate, and the like used in display devices such as LEDs and LCDs. In addition, in the present specification, the substrate treatment process may be understood as including a deposition process, a heat treatment process, and the like. However, in the following description, it is assumed as a heat treatment process.

Hereinafter, a reactor of a substrate processing apparatus according to embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The substrate processing apparatus may include a reactor 100 as a heat treatment apparatus, a frame (not shown), and a substrate loading and elevating means (not shown).

The reactor 100 may provide a chamber space in which at least one substrate is substantially heat-treated. The reactor 100 may have a lower portion open, and substrates loaded through the open lower portion may rise and be positioned in the chamber space.

The frame (not shown) supports the reactor 100 and the substrate loading and elevating means (not shown), and a manifold (not shown) is connected between the reactor 100 and the frame to perform sealing and the reactor 100 An inflow path or the like through which a substrate processing gas or the like is introduced into the interior may be provided.

A plurality of substrates are stacked on a boat (not shown) of the substrate loading and elevating means (not shown), and the elevating means can move the boat in the vertical direction. When the boat is positioned at the top dead center by the elevating means, the loaded substrates can be positioned in the chamber space of the reactor 100, and when the substrate processing process is completed, the boat can be moved to be positioned at the bottom dead center by the elevating means. When the boat is located at the top dead center by the lifting means, the boat and the manifold are in close contact, so that the chamber space of the reactor 100 may be sealed.

Meanwhile, a gas supply unit and a gas discharge unit (not shown) may be formed to communicate with the reactor 100. The gas supply unit may provide a path for receiving the substrate processing gas from an external gas supply means (not shown) and supplying the substrate processing gas to the inner space of the reactor 100. The gas discharge unit may provide a path for discharging the substrate treatment gas in the inner space of the reactor 100 to an external gas discharge means (not shown). By supplying the substrate processing gas, the air pressure of the chamber space of the reactor 100 in the closed state may be set higher than the outer space of the reactor 100. Since the chamber space of the reactor 100 becomes a positive pressure, it is possible to prevent contaminants and particles from entering the chamber space from the outside of the reactor 100.

Meanwhile, the substrate processing apparatus may further include a transfer robot (not shown) for transferring a substrate, a heater (not shown) that applies heat around the reactor 100, and the like.

1 is a schematic diagram showing a reactor 100 of a substrate processing apparatus 10 according to an embodiment of the present invention.

Referring to FIG. 1, the reactor 100 may have a shape in which the lower portion is open, and the reactor side portion 110 and the upper portion of the reactor 150 constitute a surface and may be in a closed shape. The reactor side 110 may have a polygonal column shape such as a triangular column, a square column, a hexagonal column, and the like, but in this specification, a rectangular column shape is assumed. In addition, the upper reactor 150 may have a planar shape, a dome shape, or a shape including a predetermined curvature in a vertical direction (at least a portion of which is bent on a flat plate), but the description will be made assuming a planar shape. It should be noted that the shape of the reactor side 110 and the top 150 is not necessarily limited to the exemplary form of the drawing.

The reactor side 110 and the reactor top 150 may include a plurality of frames 120, 130, 160, and 170. In addition, the reactor side 110 and the reactor top 150 may include at least one heat insulating plate 101. Thus, by combining the plurality of frames 120, 130, 160, and 170 and the heat insulating plate 101, the side of the reactor side 110 and the top side of the reactor 150 may be formed.

The heat insulating plate 101 serves to insulate the inside of the reactor 100 from the external environment, and each heat insulating plate 101 is preferably a flat plate shape, but may be a dome shape or a three-dimensional shape having a predetermined curvature. The heat insulating plate 101 may include a material having excellent heat resistance and rigidity at high temperatures, such as quartz, ceramic, and glass.

The reactor side 110 may include a plurality of vertical frames (120: 121, 122, 123, ...) and a plurality of horizontal frames (130: 131, 132, ...).

The vertical frame 120 may be extended in a vertical direction to correspond to the height of the reactor 100. The vertical frame 120 may include only vertical frames 121 and 122 disposed at the corners of the reactor side 110, and may further include a vertical frame 123 disposed on the surface of the reactor side 110. have. In FIG. 1, since the reactor side 110 is in the shape of a square column, four vertical frames 121 and 122 are included at the corners, and in order to secure a large space for processing a large-area substrate, one additionally on each side. , Further includes a total of four vertical frames 123. The number of vertical frames 120 may be changed according to the shape of the reactor side 110, the size of the reactor side 110, and the like.

The horizontal frame 130 may be extended in a horizontal direction to connect a pair of adjacent vertical frames 120. In the example of FIG. 1, the horizontal frame 131 may be disposed between a pair of adjacent vertical frames 121 and 123, and the horizontal frame 132 may be disposed between a pair of adjacent vertical frames 122 and 123. have. Both ends of the horizontal frame 130 may be connected to a pair of adjacent vertical frames 120 by fastening or bonding.

After the vertical frame 120 and the horizontal frame 130 are connected, the surface of the reactor side 110 may be configured as the heat insulating plate 101 is disposed in the remaining empty space of the reactor side 110. In other words, the heat insulating plate 101 is disposed in an area (empty area) partitioned by the vertical frame 120 and the horizontal frame 130 to constitute a closed surface. In another aspect, the left and right sides of one heat insulating plate 101 may contact the two vertical frames 120, and the upper and lower sides may contact the two horizontal frames 130. In FIG. 1, each side constituting the reactor side 110 includes three vertical frames 120 and eight horizontal frames 130, and these divide six spaces, each of which is divided into six spaces. The heat insulating plate 101 is shown in a contact arrangement.

On one surface constituting the reactor side 110, a plurality of vertical frames 120 (121, 122, 123) are preferably arranged at regular intervals along the horizontal direction. In addition, it is preferable that the plurality of horizontal frames 130 (131, 132) connecting the pair of adjacent vertical frames 120 are arranged at regular intervals along the vertical direction. Thus, it is possible to configure the reactor side portion 110 as the heat insulating plate 101 of the same type, there is an advantage that the assembly of the reactor 100 becomes simple.

The present invention is characterized in that the heat insulating plate 101 is in contact with the outside of the vertical frame 120 and the horizontal frame 130. The heat insulating plate 101 may not be sandwiched between an area (empty area) partitioned by the vertical frame 120 and the horizontal frame 130, but may be in close contact with the outside of the vertical frame 120 and the horizontal frame 130. In order to insert the heat insulating plate 101 between the vertical frame 120 and the horizontal frame 130, the assembly sequence of the vertical frame 120 and the horizontal frame 130, the vertical frame 120 and the horizontal frame 130, the insulating plate Since a separate groove for stably supporting 101 must be considered, a problem arises that the configuration becomes complicated.

However, in the present invention, after connecting the vertical frame 120 and the horizontal frame 130 by a known method, or while performing the connection, the heat insulating plate 101 is attached to the vertical frame 120 and the horizontal frame 130 in the outer direction. Can be installed to contact Therefore, it is possible to configure the reactor 100 in a simple process, and even in the process of maintaining the reactor 100, there is no need to disassemble the frames 120, 130, 160, 170, and only each insulation plate 101 from the outside It has the advantage of being simple because it can be removed or replaced. A specific installation form of the heat insulating plate 101 will be described later.

Meanwhile, in the present invention, since the reactor 100 can be formed by combining the plurality of vertical frames 120 and the horizontal frames 130, it can be manufactured in various forms, and there is no limitation in terms of size. Thus, there is an advantage of being able to easily manufacture the reactor 100 capable of processing a large-area large substrate.

The upper portion of the reactor 150 may include one insulating plate 101 or may include a plurality of insulating plates 101. The frame constituting the rim of the upper portion of the reactor 150 may correspond to the horizontal frames 130 positioned at the top of the reactor side portion 110. The size and shape of the heat insulating plate 101 disposed on the reactor side 110 and the reactor upper 150 may be the same, but may be formed differently.

When the reactor top 150 includes only one heat insulating plate 101, horizontal frames 130 positioned at the top of the reactor side 110 may support the edge of the heat insulating plate 101.

When the reactor top 150 includes a plurality of heat insulating plates 101, the reactor top 150 has at least one upper frame 160, 170 so that the area in which the plurality of heat insulating plates 101 are disposed can be partitioned. It may include.

Both ends of the upper frames 160 and 170 may be connected to the horizontal frame 130 and/or the vertical frame 120 disposed at the uppermost end of the reactor side 110. The upper frame 160 may have both ends connected to the uppermost end of the vertical frame 120. In addition, the upper frame 170 may be connected on the upper side of the horizontal frame 130 disposed at the top end of the reactor side 110, both ends.

The upper frames 160 and 170 include at least one first upper frame 160 disposed in a first direction and at least one second upper frame 170 disposed in a second direction perpendicular to the first direction: 171, 172 ) Can be included. The first upper frame 160 may be connected to an upper end of the vertical frame 120, and the second upper frame 170 may be connected to an upper end of the horizontal frame 130.

More specifically, as an example of FIG. 1, both ends of the first upper frame 160 are connected to the uppermost end of the vertical frame 123, and one end of the second upper frame 170: 171, 172 is the first upper end. It is connected to the frame 160, and the other end may be connected to the horizontal frame 130. Lower sides of both ends of the upper frames 160 and 170 may be connected to the upper side of the vertical frame 120 and the horizontal frame 130. In other words, the upper frames 160 and 170 may span the vertical frame 120 and the horizontal frame 130, or may be firmly coupled. In FIG. 1, the surface constituting the upper portion 150 of the reactor includes one first upper frame 160 and four second upper frames 170, and these divide six spaces, and six heat insulating plates 101 ) Is shown.

When arranging the heat insulating plate 101 in an area partitioned by the upper frames 160 and 170, a receiving groove (not shown) may be formed in the upper frames 160 and 170 so that the position of the heat insulating plate 101 is not shifted. . The receiving groove may be formed to be stepped so that some or all of the edges of the heat insulating plate 101 may be accommodated. Meanwhile, accommodation grooves (not shown) may be formed in the vertical frame 120 and the horizontal frame 130 at the top of the reactor side 110 so as to correspond to the receiving grooves of the upper frames 160 and 170. After arranging the heat insulating plate 101 in the area partitioned by the upper frames 160 and 170, a known fastening method can be used to further close the heat insulating plate 101, and a sealing member (not shown) for sealing is further added. It can also be intervened.

As above, there is a simple advantage because it is possible to configure the upper surface of the reactor 150 by inserting the heat insulating plate 101 in the receiving groove in the upper portion of the reactor 150. In addition, since the heat insulating plate 101 is accommodated in the receiving groove at the upper part of the reactor 150, lifting the heat insulating plate 101 secures an access path from the upper part of the reactor 150 to the interior space of the chamber, and the substrate processing apparatus 10 Alternatively, there is an advantage that the maintenance of the reactor 100 becomes simple.

2 is an enlarged schematic view showing a state in which the heat insulating plate 101 is installed on the frames 120 and 130 according to an embodiment of the present invention. 3 is an enlarged schematic diagram showing a state in which a heat insulating plate is installed on the frames 120 and 130 according to another embodiment of the present invention. 4 is an enlarged schematic diagram illustrating brackets 140 and 145 connected to the horizontal frame 130 and the vertical frame 120 according to an embodiment of the present invention. 5 is a side cross-sectional view of part A-A' of FIG. 4.

2 to 5, the bracket 140 may be connected to the outside of the horizontal frame 130. One or a plurality of brackets 140 may be connected to the outside of the horizontal frame 130 by fastening or bonding.

The bracket 140 may provide a seating groove 141 (see FIG. 5). The bracket 140 is formed such that the side cross-sectional shape is bent in an approximately'└' shape, and an empty space may act as a seating groove 141. A portion of the edge of the heat insulating plate 101 may be seated in the space of the seating groove 141.

For example, the bracket 140 of the horizontal frame 130 corresponding to the lower edge of the heat insulating plate 101 is connected so that the shape of the side cross-sectional shape is approximately'└' to support the load of the lower edge of the heat insulating plate 101 At the same time, the heat insulating plate 101 may be supported so that it does not deviate in the outward direction. In addition, the bracket 140 of the horizontal frame 130 corresponding to the upper edge of the heat insulating plate 101 is connected so that the shape of the side cross-sectional shape is approximately'┐', so that the upper edge of the heat insulating plate 101 does not deviate outward. I can support it.

In addition, the bracket 140 may be integrally formed with two symmetrical shapes. In other words, the bracket 140 is formed such that the side cross-sectional shape is bent in an approximately'├' shape, and two portions of the upper and lower empty spaces may serve as the seating grooves 141.

Meanwhile, the bracket 145 may be further connected to the outside of the vertical frame 120. One or a plurality of brackets 145 may be connected to the outside of the vertical frame 120 by fastening or bonding.

Like the bracket 140, the bracket 145 may provide a seating groove 146 (see FIG. 4). The bracket 145 is formed such that the side cross-sectional shape is bent in an approximately'└' shape, and an empty space may act as a seating groove 146. A portion of the edge of the heat insulating plate 101 may be seated in the space of the seating groove 146.

For example, the bracket 145 of the vertical frame 120 corresponding to the left and right corners of the heat insulating plate 101 is connected so that the side cross-sectional shape is approximately'└', that is, the bracket 145 and the seating groove 146 It is connected so that the formation direction of the heat insulating plate 101 is in the vertical direction, so that the left and right edges of the heat insulating plate 101 may be supported so as not to deviate outward (see FIG. 2).

As another example, the bracket 145 of the vertical frame 120 corresponding to the left and right corners of the heat insulating plate 101 is connected so that the side cross-sectional shape is approximately'└', that is, the formation direction of the seating groove 146 is horizontal. It is connected so as to be in the direction, some of the left and right corners of the heat insulating plate 101 (or, the support protrusion 102 of the heat insulating plate 101; 3] and at the same time, the left and right edges of the heat insulating plate 101 may be supported so as not to deviate outward.

In a state in which the frames 120 and 130 are configured, the heat insulation plate 101 is mounted and supported in the mounting grooves 141 and 146 of the brackets 140 and 145 while connecting the brackets 140 and 145. The corners of may be brought into contact with the frames 120 and 130. Alternatively, in a state in which the frames 120 and 130 are configured, after connecting the brackets 140 and 145 to the outside of the frames 120 and 130, the heat insulating plate 101 is attached to the mounting groove 141 of the brackets 140 and 145. As it is seated and supported on 146, the edges of the heat insulating plate 101 may be brought into contact with the frames 120 and 130. Accordingly, there is an advantage that the manufacturing process is simplified. In addition, since the insulating plate 101 can be removed even if only some of the brackets 140 and 145 are separated, there is an advantage of simplifying the maintenance process of the reactor 100.

After manufacturing the reactor side 110, the upper frames 160 and 170 may be connected on the vertical frame 120 and the horizontal frame 130 at the top of the reactor side 110. In addition, by arranging the heat insulating plate 101 in the area partitioned by the upper frames 160 and 170, the manufacturing of the upper reactor 150 may be completed.

Meanwhile, the brackets 140 and 145 are connected to the upper frames 160 and 170 as well as the vertical frame 120 and the horizontal frame 130, and the edge of the insulating plate 101 is seated in the mounting grooves 141 and 146. According to the reactor top 150 may be configured.

On the other hand, if the size of the heat insulating plate 101 and the seating grooves (141, 146) do not fit perfectly, the heat insulating plate 101 may flow in the seating grooves (141, 146), it is not good in terms of sealing. In addition, if the heat insulating plate 101 and the seating grooves 141 and 146 are too tight, stress is concentrated on the heat insulating plate 101 even by a slight shaking of the reactor 100, so that the heat insulating plate 101 can be easily damaged.

Accordingly, as shown in FIGS. 4 and 5, elastic means 143 and 148 may be further disposed in the seating grooves 141 and 146. The elastic means 143 and 148 may use a known elastic means such as a spring without limitation. The elastic means 143 and 148 may be fixed by pushing the heat insulating plate 101 toward one side of the seating grooves 141 and 146, that is, the outer surface of the vertical frame 120 and the horizontal frame 130 (F). The elastic means 143 and 148 may be arranged in an appropriate number in consideration of the size of the brackets 140 and 145, the elastic force of the elastic means 143 and 148, and the degree of sealing.

On the other hand, the elastic plate 149 may be further connected to the elastic means 148 so that the pushing force (F) can act on a larger area of the heat insulating plate 101. The elastic means 148 pushes the elastic plate 149, and the elastic plate 149 pushes the heat insulation plate 101 to a large area (F) so that it can be brought into close contact with the outer surfaces of the vertical frame 120 and the horizontal frame 130. have.

As above, since the elastic means 143 and 148 push and fix the heat insulating plate 101 to one side, it may contribute to completely sealing the gap between the heat insulating plate 101 and the frames 120 and 130. In addition, since the elastic means 143 and 148 provide a predetermined elastic force, there is an advantage in that it is possible to prevent stress from being concentrated on the heat insulating plate 101 even with a slight shaking of the reactor 100. And, even when the reactor 100 is disassembled, there is an advantage that it becomes very easy to remove the heat insulating plate 101 from the frames just by removing the elastic means 143 and 148.

Referring again to FIG. 2, according to an embodiment, a state in which the insulating plate 101 in a square shape is in close contact with the outer surfaces of the vertical frame 120 and the horizontal frame 130 is shown. Three brackets 145 are connected to the outside of the vertical frame 120 to support the left and right edges of the heat insulating plate 101, and three brackets 140 are connected to the outside of the horizontal frame 130 to the upper and lower sides of the heat insulating plate 101. Can support corners.

Elastic means (143, 148) are disposed in the mounting grooves (141, 146) of each bracket (140, 145), it is possible to perform sealing by pushing the insulating plate 101 toward the frame (120, 130).

On the other hand, as the bracket 140 is formed in an approximately'├' shape so as to have a seating groove 141 in two portions of the upper and lower empty spaces, two insulating plates positioned at the upper and lower portions of the bracket 140 (101) can also be supported at the same time.

Referring back to FIG. 3, according to an embodiment, a state in which the insulating plate 101 in a square shape is in close contact with the outer surfaces of the vertical frame 120 and the horizontal frame 130 is shown. At this time, at least one support protrusion 102 may be formed at a corner (eg, a left or right corner) of the heat insulating plate 101. As the three brackets 145 are connected to the outside of the vertical frame 120, and the support protrusion 102 of the insulation plate 101 is supported by the mounting groove 146 of the bracket 145, the left and right corners of the insulation plate 101 Can be supported. In addition, three brackets 140 may be connected to the outside of the horizontal frame 130 to support upper and lower corners of the heat insulating plate 101.

Elastic means (143, 148) are disposed in the mounting grooves (141, 146) of each bracket (140, 145), it is possible to perform sealing by pushing the insulating plate 101 toward the frame (120, 130). An elastic plate 149 is further connected to the elastic means 148 of the bracket 145, so that the two insulating plates 101 on both sides can be pushed and fixed with one bracket 145.

As described above, according to the present invention, the reactor 100 can be manufactured in various shapes and sizes, and a reactor 100 capable of processing a large-area large substrate can be easily manufactured. Accordingly, selection of materials that can be used for the reactor 100 is varied, and there is an effect of improving the efficiency of manufacturing. In addition, separate from the manufacturing process of the frames 120, 130, 160, 170, the insulating plate 101 can be manufactured by closely connecting the insulation plate 101 from the outside using the brackets 140, 145, and even during maintenance/repair, the frame 120, Since only the insulating plate 101 can be replaced without disassembling the 130, 160, 170), there is an effect of simplifying the manufacturing and maintenance/repair process.

Although the present invention has been shown and described with reference to a preferred embodiment as described above, it is not limited to the above embodiment, and within the scope not departing from the spirit of the present invention, various It can be transformed and changed. Such modifications and variations should be viewed as falling within the scope of the present invention and the appended claims.

100: reactor
101: insulation plate
110: reactor side
120: vertical frame
130: horizontal frame
140, 145: bracket
141, 146: seating groove
143, 148: elastic means
149: elastic plate
150: reactor top
160, 170: upper frame

Claims (23)

As a reactor (reactor) of a substrate processing apparatus in which at least one substrate is processed,
The reactor has a shape in which the lower part is open, the side of the reactor and the upper part of the reactor are closed including at least one insulating plate,
The reactor side,
A plurality of vertical frames;
A plurality of horizontal frames connecting a pair of adjacent vertical frames; And
A plurality of insulation plates with at least edges in contact with the outside of the vertical frame and the horizontal frame
Containing, the reactor of the substrate processing apparatus. The method of claim 1,
The upper part of the reactor,
At least one upper frame having both ends connected to a horizontal frame or a vertical frame disposed at the top end of the reactor side; And
A plurality of insulation plates with at least edges contacting the outside of the vertical frame, the horizontal frame and the upper frame
Containing, the reactor of the substrate processing apparatus. The method of claim 2,
The upper part of the reactor includes a plurality of upper frames, and the upper frame,
At least one first upper frame disposed in a first direction; And
At least one second upper frame disposed in a second direction perpendicular to the first direction
Containing, the reactor of the substrate processing apparatus. The method of claim 3,
The first upper frame is connected to the top of the vertical frame,
The second upper frame is connected to the upper end of the horizontal frame, the reactor of the substrate processing apparatus. The method of claim 1,
The reactor side portion has a polygonal column shape, the reactor of the substrate processing apparatus. The method of claim 1,
On one surface constituting the side of the reactor, a plurality of vertical frames are arranged at regular intervals along the horizontal direction,
A plurality of horizontal frames connecting a pair of adjacent vertical frames are disposed at regular intervals along a vertical direction, a reactor of a substrate processing apparatus. The method of claim 1,
The bracket is connected to the outside of the horizontal frame,
A reactor of a substrate processing apparatus, in which at least a part of the edge of the insulation plate is seated in the seating groove of the bracket. The method of claim 7,
The bracket is further connected to the outside of the vertical frame,
A reactor of a substrate processing apparatus, in which at least a part of the edge of the insulation plate is seated in the seating groove of the bracket. The method according to claim 7 or 8,
An elastic means is disposed in the seating groove, and the elastic means pushes and fixes the edge of the heat insulating plate to one side of the seating groove. The method of claim 8,
At least one support protrusion is formed at the edge of the insulation plate,
The reactor of the substrate processing apparatus, wherein the lower portion of the support protrusion is supported in the mounting groove of the bracket connected to the vertical frame. The method of claim 2,
Reactor of a substrate processing apparatus in which both ends of the upper frame are connected to the upper side of the vertical frame or the horizontal frame The method of claim 1,
The upper portion of the reactor is a planar shape, a dome shape, or a shape including a curvature in a vertical direction. The method of claim 1,
The material of the insulating plate is a reactor of a substrate processing apparatus including at least one of quartz, ceramic, and glass A substrate processing apparatus in which at least one substrate is processed,
A reactor that provides a chamber space in which a substrate is processed;
A frame supporting the reactor; And
Substrate loading and elevating means for moving the boat on which at least one substrate is loaded in the vertical direction
Including,
The reactor has a closed shape including a plurality of heat insulating plates in which a lower portion is open and at least an edge is in contact with an outer side of the reactor and an upper outer side of the reactor. The method of claim 14,
The reactor side,
A plurality of vertical frames;
A plurality of horizontal frames connecting a pair of adjacent vertical frames; And
A plurality of insulation plates disposed within the area divided by the vertical frame and the horizontal frame
Containing, a substrate processing apparatus. The method of claim 15,
The upper part of the reactor,
At least one upper frame having both ends connected to a horizontal frame or a vertical frame disposed at the top end of the reactor side; And
A plurality of insulation plates arranged in the area divided by the vertical frame, the horizontal frame and the upper frame
Containing, a substrate processing apparatus. The method of claim 14,
A gas supply unit formed to communicate with the reactor and supplying a substrate processing gas to the inner space of the reactor; And
A gas discharge unit that is formed to communicate with the reactor and discharges the substrate processing gas in the inner space of the reactor.
Further comprising a substrate processing apparatus. The method of claim 14,
When the boat is located at the top dead center of the lifting means, the chamber space of the reactor is sealed. The method of claim 18,
When the substrate processing gas is supplied to the chamber space of the reactor, the atmospheric pressure of the chamber space is set higher than the outer space of the reactor. The method of claim 14,
The bracket is connected to the outside of the horizontal frame,
At least a portion of the edge of the insulation plate is seated in the mounting groove of the bracket, substrate processing apparatus. The method of claim 20,
The bracket is further connected to the outside of the vertical frame,
At least a portion of the edge of the insulation plate is seated in the mounting groove of the bracket, substrate processing apparatus. The method of claim 20 or 21,
An elastic means is disposed in the seating groove, and the elastic means pushes and fixes an edge of the heat insulating plate to one side of the seating groove. The method of claim 21,
At least one support protrusion is formed at the edge of the insulation plate,
The substrate processing apparatus, wherein the lower portion of the support protrusion is supported in the mounting groove of the bracket connected to the vertical frame.

Images