CN200996043Y - Shielding frame assembly - Google Patents
Shielding frame assembly Download PDFInfo
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- CN200996043Y CN200996043Y CNU2005900000241U CN200590000024U CN200996043Y CN 200996043 Y CN200996043 Y CN 200996043Y CN U2005900000241 U CNU2005900000241 U CN U2005900000241U CN 200590000024 U CN200590000024 U CN 200590000024U CN 200996043 Y CN200996043 Y CN 200996043Y
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- shielding frame
- frame component
- mask
- framework
- fenestra
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- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
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- 239000010409 thin film Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
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Abstract
The utility model provides shield frame components, consisting of a frame with a top surface and a multistep bottom surface, wherein the frame is used to limit the central aperture. The utility model is characterized in that the shield frame components consist at least a first mask panel, which is supported by the frame and covers at least some of the apertures.
Description
Technical field
Embodiment of the present utility model relates generally to be used for the shielding frame component of big area substrate.
Background technology
Along with to the large-area flat-plate indicating meter, increasing rapidly of the demand of TV and computer screen for example, the ability of handling big glass substrate becomes very important.The large-area flat-plate indicating meter generally includes formation thin film transistor (TFT) thereon.
Formation TFT generally includes by plasma reinforced chemical vapour deposition (PECVD) and deposit one or more layers film on indicating meter on large-area flat-plate indicating meter or substrate.For some reason, the deposition uniform thin film is proved to be challenging on the big area substrate.For example, be difficult to big area substrate even heating.In addition, the plasma situation at the big area substrate surface often changes.As the result of inhomogeneous heated substrate, the big area substrate is easy deformation also, for example twists or is arc.
Proposed shielding frame, it is compressed on the edge of the big area substrate on the substrate supports in the treatment chamber in treating processes, thereby prevents the distortion of substrate.Shielding frame also helps to prevent the undesirable material deposition at the edge and the back side of substrate.Yet even owing to use shielding frame, deposition uniformity still is a significant problem, therefore needs improved shielding frame.For example, owing to have a uneven substrate surface in contact, it makes the processing gas leakage between shielding frame and substrate, so shielding frame self may produce uneven treated state on substrate.Homogeneity question is very crucial to the big area substrate, because cause the out of use defective of substrate can mean the loss of devices up to a million (for example TFT) in the big area substrate, this is accompanied by the loss of a substrate.
Also need a kind of method that the big area substrate is divided into a plurality of members (such as a plurality of indicating meters).On the one hand, dividing the big area substrate can be used for providing a plurality of indicating meters from a substrate.On the other hand, the big area substrate being divided into a plurality of members also is included on the big panel a plurality of screen areas is provided.
The utility model content
The utility model generally provides a kind of method and apparatus that is used in a plurality of parts of substrate processing process mask big area substrate (as big panel).
In an embodiment of the present utility model, a kind of shielding frame component is provided, it comprises the framework with upper surface and staged lower surface, this framework limits the center fenestra; It is characterized in that: described shielding frame component comprises at least the first mask panel, and it is by described frame supported and cover the described fenestra of at least a portion.
In another embodiment of the present utility model, a kind of shielding frame component is provided, it comprises framework, it has and is formed on upper surface and is arranged on internal recess zone around the fenestra of center; It is characterized in that: described shielding frame component also comprises one or more side direction mask panels in the described internal recess zone that is connected to described framework; And the one or more horizontal mask panel that is connected to the described internal recess zone of described framework, described side direction and horizontal mask panel extend across described framework, to cover described center fenestra at least in part.
In another embodiment of the present utility model, a kind of shielding frame component is provided, it comprises framework; It is characterized in that: described shielding frame component also comprises the one or more ceramic mask panel that is connected to aluminium chassis, and described ceramic mask panel covers a part that is formed on the fenestra in the described framework.
In another embodiment of the present invention, a kind of shielding frame component is provided, it comprises: framework, it has upper surface, lower surface and outward flange, and described framework limits the center fenestra; Extend under described lower surface the external region of described framework; Inclined surface, it extends up to the described outward flange of described framework from described external region; And being formed on recessed zone in the described upper surface, itself and described center fenestra adjoin and around described center fenestra; It is characterized in that: described shielding frame component also comprises at least the first mask panel, and it is by described frame supported and cover the described fenestra of at least a portion.
According to the technical solution of the utility model, because the mask panel is set on the cover framework, so can prevent from the zone that is positioned at the substrate under the frame assembly, to handle for example thin film deposition.
Description of drawings
For detail knowledge makes above-mentioned feature of the present utility model,, the content of the present utility model of brief overview before is described in more detail with reference to some diagrammatic embodiment in the accompanying drawings.Yet it should be noted that accompanying drawing only illustrates exemplary embodiments of the present utility model, therefore can not limit scope of the present utility model, because the utility model can allow other equivalent embodiment.
Fig. 1 is the exploded view of the embodiment of shielding frame component of the present utility model.
Fig. 2 A is the sectional view in a zone of shielding frame component, and wherein shielding frame is connected with the mask panel.
Fig. 2 B is the sectional view in a zone of shielding frame component, and wherein shielding frame is connected with the mask panel and tightens together.
Fig. 3 is the plan view from above that is positioned at the embodiment of the shielding frame component on the substrate support member.
Fig. 4 is the sectional view along the line 4-4 of Fig. 3.
Fig. 4 A is the regional enlarged drawing that is positioned at the embodiment of the shielding frame on the substrate support member shown in Fig. 4.
Fig. 5 is the exploded view of another embodiment of the utility model shielding frame component.
Fig. 6 is the schematic cross sectional view of example process chamber that wherein is provided with the embodiment of the utility model shielding frame component.
Fig. 7 is the sectional view that is used for the mask panel is fixed to another embodiment of the fastening piece on the shielding frame.
For ease of understanding, in possible place, identical reference marker is used in reference to and is shown in components identical among each figure.Be anticipated that the element that uses in one embodiment can be advantageously used in other embodiment and not need further narration.
Embodiment
The utility model provides and has been used in the substrate processing process, the method and apparatus of a plurality of parts of mask big area substrate (such as big face glass and/or plastic front board).The shielding frame component that provides comprises the shielding frame with one or more mask panels.This shielding frame suits or is configured to hold one or more mask panels.Be positioned at a plurality of parts of the big area substrate below the shielding frame by mask, can on substrate, form a plurality of isolated treatment zones, thereby optionally material is deposited on the prospective region (promptly not masked zone) of substrate.
Fig. 1 is the exploded view of an embodiment of shielding frame component 10.Shielding frame component 10 comprises shielding frame 12 and at least one mask panel.In the embodiment shown in fig. 1, show mask panel 16,18 and 20.Substrate is contained in the shielding frame 12, and contacts with 20 lower surface with mask panel 16,18.
Form ladder between the internal recess zone 14 of shielding frame 12 and the external region 21 of shielding frame 12, thereby interior region 14 forms a shelf, it holds mask panel 16,18 and 20, makes them with respect to the basic copline orientation of the upper surface of the external region 21 of shielding frame.The interior region 14 of shielding frame can have stepped surfaces 39 along external margin, with support-side to the mask panel and along the horizontal mask panel of one surface.Stepped surfaces makes side direction mask panel be oriented in the groove with small angle, in case to guarantee that frame assembly is positioned on the substrate, contact with the substrate sealing.
In the embodiment shown in fig. 1, shielding frame component 10 comprises two side direction mask panels 16, and they are parallel or be roughly parallel to the major axis of shielding frame 12.Side direction mask panel covers the long edge of substrate.Side direction mask panel 16 has the hole 17 of passing its formation, and it makes fastening piece 28 pass it and is provided with, side direction mask panel 16 is fastened to the hole 13 that is formed in the shielding frame 12.Hole 17 can be extended, so that fastening piece 28 moves with hole 13 when panel is expanded.Side direction mask panel 16 can have slot area 24, and its size is set for the outburst area 19 of horizontal mask panel 18 ends and cooperated.Side direction mask panel 16 can have slot area 26, and its size is set the end 23 that holds horizontal mask panel 20 for.In one embodiment, hole 17 contiguous slot area 24 and 26 are provided with.
In the embodiment shown in fig. 1, provide two horizontal mask panels 18 of terminal to be used on the mask substrate two ends adjacent areas with side direction mask panel 16, and provide at least one central cross mask panel 20 to be used for the interior part of mask substrate.Zone on central cross mask panel 20 mask substrate between the horizontal mask panel 18 of two terminals.Can predict, can dispose mask panel 16,18 and 20, with other parts of mask substrate.
In one embodiment, horizontal mask panel 18,20 can be basically parallel to the minor axis of shielding frame 12.In one embodiment, laterally mask panel 18,20 can be substantially and side direction mask panel 16 coplanes, and be basically perpendicular to side direction mask panel 16.Laterally mask panel 18,20 can have the hole 22 that is formed at wherein.Hole 22 makes fastening piece (such as fastening piece 28) pass it and is provided with, so that horizontal mask panel 18,20 is fastened to the hole 15 that is formed in the shielding frame 12.Hole 22 can be extended, to adapt to the expansion of mask panel.Hole 22 in the horizontal mask panel 18 of terminal can be arranged in the outburst area 19 of the end of the horizontal mask panel 18 of terminal.Hole 22 in the central cross mask panel 20 can be arranged in the end 23 of horizontal mask panel 20.
As shown in Figure 1, the overhang 19 of the horizontal mask panel 18 of terminal is coupled in the slot area 24 of side direction mask panel 16, and the end 23 of central cross mask panel 20 is coupled in the slot area 26 of side direction mask panel 16.Because mask panel 16,18 and 20 is interlockings, rather than is fastened on top each other, so the total thickness of the mask that provided of all mask panels is roughly in mask panel 16,18 and 20 one thickness.Though the diagram with fastening piece 28 mask panel 16,18 and 20 is connected to shielding frame 12, also replacedly with fastening piece with one or more being connected to each other in mask panel 16,18 and 20.
Fig. 2 A is the sectional view in a zone of shielding frame component 10, and wherein shielding frame 12 is connected via fastening piece 28 with side direction mask panel 16.In another embodiment, fastening piece 28 can be deformable and/or ductile.In one embodiment, fastening piece 28 can be made by metal (such as aluminium).In Fig. 2 A-B illustrated embodiment, fastening piece 28 comprises the blind hole 36 in the first end 39 that is formed on fastening piece 28.First end 39 has the right cylinder 34 that extends from the main body 29 of fastening piece 28.The diameter of right cylinder 34 is less than the diameter of main body 29.The main body 29 that packing ring 30 (such as the aluminium packing ring) is arranged on the right cylinder 34 and adjoins fastening piece 28.Right cylinder 34 and packing ring 30 are configured to be arranged at least in part the groove 32 that is formed on shielding frame 12 downsides.Packing ring 30 has internal surface 31, and it is towards angled away from the direction of fastening piece 28, makes restriceted envelope 35 between the internal surface 31 of fastening piece 28 and packing ring 30.
The second end 202 of fastening piece 28 has the head 204 that extends outwardly from main body 29.This head configuration becomes to prevent that fastening piece 28 from passing the hole 17 that is formed on the side direction mask panel 16.In one embodiment, head 204 is configured to it is coupled in the groove 205 in the upper surface 207 that is formed on side direction mask panel 16, makes the exposed surface 211 of head 204 basic with upper surface 207 coplanes or caved in to be lower than upper surface 207.
Can predict, packing ring 30 and fastening piece 28 can be fixed by interference, cooperation, reaming (broaching), staked (staking), flash distillation (braising), welding, riveted joint, bonding or other fastening means that is fit to.It is also envisioned that fastening piece 28 can be the fastening piece that is suitable for coupling framework and panel of screw, bolt, rivet or other types.For example as shown in Figure 7, fastening piece 28 can comprise male thread member 700 and box thread member 702, and it engages so that panel is fixed to framework.For reducing the essential height of member 700,702, one or more members 700,702 can comprise the drive unit (drive) 704 that reduces profile, and these holes are used for monkey wrench.
The expansion of the right cylinder 34 of fastening piece 28 prevents that the fastening piece upward displacement from surpassing the upper surface of mask panel 16.Another benefit with fastening piece 28 retaining washers 30 is that common fastening piece 28 can engage essential length weak point than conventional threads.Short fastening piece makes that in the substrate processing process amount of space between substrate and gas distribution plate that is provided by shielding frame component minimizes in the chamber.Yet replacedly or can be in combination, mask panel 16,18,20 and shielding frame 12 can be undertaken fastening by other mode.It is also envisioned that at least one of shielding frame 12 or mask panel 16,18,20 can be bonded on the fastening piece 28 by loose ground, and do not need fastening.
It is to allow to have between mask panel and shielding frame suitable gap, for example some thousandths of inch that use fastening piece 28 described here is used for the further benefit of fastening.The thermal expansion difference of (for example aluminium matter shielding frame and ceramic mask panel) between differing materials is made when high temperature in such gap permission substrate processing process shielding frame and mask panel.
Fig. 3 is the plan view from above that is positioned at the shielding frame component 10 on the substrate 40 that is arranged on the substrate support member among Fig. 1 with the assembling form.Substrate 40 is arranged in the edge 43 of the framework 12 that limits interior region 14.The minor face edge 41 of substrate 40 is covered by the horizontal mask panel 18 of terminal, and the lateral edge 42 of substrate 40 is covered by side direction mask panel 16.As shown in Figure 3, mask panel 16,18,20 is arranged in the recessed interior region 14 of shielding frame 12.The horizontal mask panel 18 of side direction mask panel 16 and terminal is positioned at the outside of recessed interior region 14, and center mask panel 20 is positioned at the inside of recessed interior region 14.In the embodiment shown in fig. 3, side direction mask panel horizontal mask panel 18 of 16 not overlapping terminals or center mask panel 20, and not overlapping, thereby be not positioned on the mask panel 18,20 or support the part of the part of mask panel 18,20 on the side direction mask panel 16 by horizontal mask panel 18 of terminal or center mask panel 20.Side direction mask panel does not overlap with horizontal mask interlock panels, because slot area 24 (Fig. 1) size of side direction mask panel 16 is set at the outburst area 19 of the end that holds horizontal mask panel 18, slot area 26 sizes of side direction mask panel 16 are set at the end 23 (Fig. 1) that holds horizontal mask panel 20.
Fig. 4 is the sectional view along the line 4-4 of Fig. 3.For details clear and the demonstration shielding frame component, under situation, Fig. 4 is shown with section 71.Shielding frame 12 is supported on the substrate supports assembly 50.The horizontal mask panel 18 of side direction mask panel 16 and terminal is fixed to shielding frame 12 by fastening piece 28.Substrate 40 is supported by the supporting zone 56 of substrate supports assembly 50.
Fig. 4 A is the enlarged view in a zone among Fig. 4.The horizontal mask panel 18 of side direction mask panel 16 and terminal is supported in the recessed interior region 14 of shielding frame.Though all recessed interior regions 14 all are lower than the external region 21 of shielding frame, but recessed interior region can angulation or ladder, make that the outside part 60 of recessed interior region 14 can be higher slightly than the interior part 64 of recessed interior region 14, for example high percentum inch.Can believe, outside part 60 higher risings will cause inwardly centroclinal towards substrate 40 of mask panel 16,18, thereby the internal edge of guaranteeing mask panel 16,18 touches substrate 40, and the part that is positioned under the mask panel 16,18 with effective mask substrate avoids deposition.
With reference to top explanation to mask panel 16,18,20 and framework 12, panel 516,518,520 is fixed to framework 512 by pin 18.Refer again to Fig. 1, fastening piece 28 is inserted in the respective aperture 13,15 of shielding frame 12 and assemble shielding frame component 10 by passing hole 17,22 in the mask panel.After all fastening pieces 28 were placed in the hole, pin was fastened, as top with reference to as described in Fig. 2 B.Mask panel 16,18 and the 20 common masks that form, this mask outer rim has and the similar rectangular shape of shielding frame 12 shapes, and wherein mask is outer with the neighboring of limit less than the neighboring of shielding frame 12 and processed substrate, makes that its edge is masked.The neighboring of mask is formed by side direction mask panel 16 and the horizontal mask panel 18 of terminal.This mask by central cross mask panel 20 separately makes to limit two fenestras between side direction mask panel 16 and lateral terminal mask panel 18.
In one embodiment, extend and around its lower surface 402 below that can be included in the lower surface 400 of framework 12, the external region 21 of shielding frame 12.Wall 406 externally extends between the lower surface 400 of the interior region of zone 21 lower surface 402 and framework 12.Wall 406 is configured to surround the also wall 408 of overlapping substrate supports assembly 50, and wall 408 is provided with shielding frame 12.
Fig. 5 is the exploded view of another embodiment of shielding frame component 500.Reference numeral among Fig. 1 is used for the identical part of presentation graphs 5.Though shielding frame component 10 comprises two horizontal mask panels 18 of terminal and a central cross mask panel 20 among Fig. 1, shielding frame component 500 comprises a framework 512, two the horizontal mask panels 518 of terminal and two central cross mask panels 520 among Fig. 5.Each side direction mask panel 516 of shielding frame component 500 comprises two slot area 26, and its size is set at the end 23 that holds central cross mask panel 520.
As can be seen, mask panel 516,518 and 520 can have the width of variation from Fig. 1 and Fig. 5.Mask panel 518,520 can have essentially identical width, and it is the same to be similar to shown in Figure 1 those, or the horizontal mask panel 518 of terminal can have different width with central cross mask panel 520, as shown in Figure 5.Can select the width of mask panel 516,518 and 520, so that the treatment zone of wishing area to be provided on substrate.
Though the embodiment of shown here and described shielding frame component has two side direction mask panels, two horizontal mask panels of terminal and one or two central cross mask panel, but can predict, shielding frame component can comprise the mask panel of other quantity, that is: two or more side direction mask panels and one or more central cross mask panel.For example, comprise three side direction mask panels, a central cross mask panel and two horizontal mask panels of terminal, four treatment zones can be provided on substrate by use.Can arrange the mask panel, with the non-polygonal a plurality of zones on the mask substrate.One or more masks can comprise the fenestra 530 shown in the diplopia among a Fig. 5.Fenestra 530 allows to deposit on substrate by this fenestra.
In another embodiment, comprise by use and the shielding frame component of the mask that monoblock mask rather than a plurality of mask panel are formed on substrate, to provide a plurality of treatment zones.For example, can use the monoblock mask that has by mask panel among Fig. 1 or Fig. 5 16,18 and 20 mask shapes that form.The monoblock mask can form a slice, or is fused together by multi-disc and to form.The monoblock mask can be made by pottery.
An example of the substrate processing chambers that comprises shielding frame component described herein is described with reference to Fig. 6.Fig. 6 is the schematic cross sectional view of an embodiment of plasma reinforced chemical vapour deposition chamber 200, and this plasma strengthens CVD (Chemical Vapor Deposition) chamber 200 and can obtain from an AKT of branch of the Applied Materials of the Santa Clara of California.Chamber 200 generally comprises the chamber body 202 that is coupled to gas source 204.Chamber body 202 has wall 206 and bottom 208, and it partly defines handles space (volume) 212.Handle space 212 usually by the visit of the port (not shown) in the wall 206, this port is convenient to motion that substrate 240 is moved into or shifts out chamber body 202.Wall 206 and bottom 208 made with the material of handling compatibility by the aluminium of monoblock or other usually.Wall 206 supporting cover assemblies 210, wherein cap assemblies 210 comprises pumping pumping chamber 214, and this pumping pumping chamber 214 will handle space 212 is coupled to an exhaust port (comprising multiple pumping element, not shown).
Temperature control substrate supports assembly 238 is set at the center of chamber body 202.Supporting component 238 is support substrates 240 in treating processes.In one embodiment, substrate supports assembly 238 comprises aluminium main body 224, these aluminium main body 224 at least one embedded well heaters 232 of encapsulation.The well heater 232 (for example resistance element) that is arranged in the supporting component 238 is coupled to power supply 274, and controllably supporting component 238 and position glass substrate 240 thereon is heated to preset temperature.Usually, in CVD handled, well heater 232 maintained a uniform temperature between about 150 degrees centigrade to about at least 460 degrees centigrade with substrate 240, and this depends on the depositing treatment parameter that is used to be deposited material.
Usually, supporting component 238 has downside 226 and upside 234.Upside 234 support substrates 240.Downside 226 has the pole 242 of being coupled to it.Pole 242 is coupled to the lifting system (not shown) with supporting component 238, and lifting system is at the treatment zone (as shown) that raises and be convenient to substrate transport to treatment chamber 202 with from mobile supporting component 238 between the lower position of treatment chamber 202 transmission.In addition, pole 242 provides the pipeline that is used for electronics or thermocouple lead between other elements of supporting component 238 and system 200.
Coupling corrugated tube 246 between the bottom 208 of supporting component 238 (or pole 242) and treatment chamber 202.Corrugated tube 246 provides vacuum-sealing between processing space 212 and treatment chamber 202 outside atmospheres, be easy to vertical shifting supporting component 238 simultaneously.
Supporting component 238 is ground connection usually, make by power supply 222 to the gas distribution plate assembly 218 between cap assemblies 210 and the substrate supports assembly 238 (be arranged in the chamber cap assemblies or near other electrodes) the RF power that provides can excite the gas that exists in the processing space 212 of 218 of supporting component 238 and distribution plate assemblies.From general selected must the matching of RF power of power supply 222, to drive chemical vapor deposition process with substrate dimension.
Supporting component 238 has a plurality of holes 228 of passing its layout, and it holds a plurality of lifting pins 250.Promoting pin 250 is made of pottery or anodizing (anodized) aluminium usually.Promoting pin 250 can activate with respect to supporting component 238 by optional riser 254, with outstanding from stayed surface 230, thus to place substrate with respect to supporting component 238 isolating modes.
In addition, supporting component 238 supports shielding frame component 270.Shielding frame component 270 comprises shielding frame 248 and comprises the mask panel of mask panel 253.Shielding frame component 270 covers one or more parts of substrate 240 in treating processes, make the prospective region that only exposes substrate be used for receiving deposition material thereon.Can be as above-mentioned structure shielding frame component 270.When substrate 240 was positioned on the supporting component 238 that is in lower non-processing position, shielding frame component 270 was supported by chamber main body 202.When glass substrate 240 risings entered the processing position, shielding frame component 270 promoted from the chamber main body, made the supported assembly 238 of shielding frame component support and cover a plurality of parts of substrate 240.
Cap assemblies 210 provides the coboundary for handling space 212.Cap assemblies 210 can be disassembled or open to safeguard treatment chamber 202 usually.In one embodiment, cap assemblies 210 is made by aluminium (Al).Cap assemblies 210 comprises external pump pumping system (not shown) coupled pumping pumping chamber 214.Pumping pumping chamber 214 is used for transporting equably from the gas of handling space 212 and handles byproduct, and is transported to outside the treatment chamber 202.
Gas distribution plate assembly 218 is coupled to the inboard 220 of cap assemblies 210.Usually, gas distribution plate assembly 218 is configured to basic consistent with the profile of glass substrate 240, is rectangle for large-area flat-plate panel substrate for example.Gas distribution plate assembly 218 comprises porous zone 216, and by porous zone 216, other gas that handling gas and gas source 204 provides is sent to handles space 212.The porous zone 216 of gas distribution plate assembly 218 is configured to provide to treatment chamber 202 by the gas of gas distribution plate assembly 218 with uniformly distributing.
Gas distribution plate assembly 218 generally includes the diffuser plate 258 that hangs from boatswain chair 260.Replacedly, diffuser plate 258 and boatswain chair 260 can comprise single integrated member.Form a plurality of gas passages 262 by diffuser plate 258, with the predetermined distribution that allows the gas by gas distribution plate assembly 218 and enter and handle space 212.Therefore boatswain chair 260 defines pumping chamber 264 betwixt with the isolating relation of internal surface 220 maintenances of diffuser plate 258 with cap assemblies 210.Pumping chamber 264 allows to flow through the gas of cap assemblies 210 equably along distributing on the width of diffuser plate 258, and making provides uniform gas above porous zone, center 216, and gas uniformly distributing ground gas coming through passage 262.
Can predict, shielding frame component described herein can be used on the substrate processing chambers that other plasma reinforced chemical vapour deposition chambers or other comprise other chamber that is used for handling large-area glass panel substrate.
Carried out brief description in treatment chamber, shielding frame component being engaged with substrate herein.Shielding frame component promotes from its support (with reference to description shown in Figure 6) by the substrate supports assembly.The contact plug 52 of substrate supports assembly (Fig. 4 A) is contained in the groove 54 (Fig. 4 A) of shielding frame 12, guaranteeing aiming at of shielding frame and substrate supports, and therefore with the substrate alignment of supporting thereon.The periphery of substrate is less than the center fenestra 11 of shielding frame 12.Therefore, substrate is raised by the fenestra 11 of shielding frame 12, and conductively-closed framework 12 centers on, as shown in Figure 3.The mask panel is set to the prospective region that covers substrate, to handle for example thin film deposition on the zone that prevents the substrate under frame assembly on the throne.
Though noted earlier all is at embodiment of the present utility model, under the situation that does not break away from base region of the present utility model, other and further embodiment of the present utility model can be proposed, scope of the present utility model is limited by following claim.
Claims (27)
1. shielding frame component comprises:
Framework with upper surface and staged lower surface, this framework limits the center fenestra;
It is characterized in that: described shielding frame component comprises at least the first mask panel, and it is by described frame supported and cover the described fenestra of at least a portion.
2. according to the shielding frame component of claim 1, it is characterized in that the described first mask panel is separated into two open areas with described fenestra.
3. according to the shielding frame component of claim 1, it is characterized in that the first mask panel is set between a plurality of mask panels that extend internally from described framework towards described fenestra two.
4. according to the shielding frame component of claim 1, it is characterized in that, further comprise:
The second mask panel, it is by described frame supported and cover the described fenestra of at least a portion, and the wherein said first and second mask panels are divided at least three open areas with described fenestra.
5. according to the shielding frame component of claim 1, it is characterized in that the described first mask panel is ceramic, described framework is an aluminium.
6. according to the shielding frame component of claim 2, it is characterized in that described open area shape is a Polygons.
7. according to the shielding frame component of claim 1, it is characterized in that described framework further comprises:
Recessed zone, it is formed in the described framework and around described fenestra, described first mask is coupled to the female zone.
8. according to the shielding frame component of claim 1, it is characterized in that, further comprise:
The fastening piece of described framework and described first mask is coupled.
9. shielding frame component according to Claim 8 is characterized in that, further comprises:
Be arranged on the packing ring on the described fastening piece, it is fixed on described framework and described first mask between the head and described packing ring of described fastening piece, and wherein said fastening piece is fixed to described packing ring by at least a in staked, enlarging, sandblast or the interference fit.
10. shielding frame component comprises:
Framework, it has and is formed on upper surface and is arranged on internal recess zone around the fenestra of center;
It is characterized in that: described shielding frame component also comprises one or more side direction mask panels in the described internal recess zone that is connected to described framework; And
Be connected to the one or more horizontal mask panel in the described internal recess zone of described framework, described side direction and horizontal mask panel extend across described framework, to cover described center fenestra at least in part.
11. the shielding frame component according to claim 10 is characterized in that, described one or more side direction mask panels enter described fenestra with respect to the described upper surface of described framework is downward-sloping.
12. the shielding frame component according to claim 10 is characterized in that, described internal recess zone comprises the stepped surfaces that is provided with along its outside part, and wherein said one or more side direction mask panels are supported on the described stepped surfaces.
13. the shielding frame component according to claim 10 is characterized in that, described one or more horizontal mask panels are made by stupalith.
14. the shielding frame component according to claim 13 is characterized in that, described framework is made of aluminum.
15. the shielding frame component according to claim 10 is characterized in that, described one or more side direction mask panels are connected to described framework by the deformable fastening piece.
16. a shielding frame component comprises:
Framework;
It is characterized in that: described shielding frame component also comprises the one or more ceramic mask panel that is connected to aluminium chassis, and described ceramic mask panel covers a part that is formed on the fenestra in the described framework.
17. the shielding frame component according to claim 16 is characterized in that, described ceramic mask panel limits isolated opening in the fenestra that described framework forms.
18. the shielding frame component according to claim 16 is characterized in that, described one or more ceramic mask panels are fastened to described framework in the mode that allows to relatively move therebetween.
19. the shielding frame component according to claim 16 is characterized in that, the basic upper surface copline with described framework of the upper surface of described one or more ceramic mask panels.
20. the shielding frame component according to claim 17 is characterized in that, the shape of the described open area of the described fenestra of being determined by described one or more mask panels is a Polygons.
21. a shielding frame component comprises:
Framework, it has upper surface, lower surface and outward flange, and described framework limits the center fenestra;
Extend under described lower surface the external region of described framework;
Inclined surface, it extends up to the described outward flange of described framework from described external region; And
Be formed on the recessed zone in the described upper surface, itself and described center fenestra adjoin and around described center fenestra;
It is characterized in that: described shielding frame component also comprises at least the first mask panel, and it is by described frame supported and cover the described fenestra of at least a portion.
22. the shielding frame component according to claim 21 is characterized in that, described framework and described mask panel are made by identical materials.
23. the shielding frame component according to claim 21 is characterized in that, described framework and described mask panel are made from a variety of materials.
24. the shielding frame component according to claim 21 is characterized in that, further comprises:
With the mutual second vertical orientated mask panel of the described first mask panel.
25. the shielding frame component according to claim 21 is characterized in that, the described first mask panel is separated into two zones with described fenestra.
26. the shielding frame component according to claim 21 is characterized in that, the described first mask panel is fastened to described framework in the mode that allows to relatively move therebetween.
27. the shielding frame component according to claim 26 is characterized in that, the described first mask panel is made by pottery.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58846204P | 2004-07-16 | 2004-07-16 | |
| US60/588,462 | 2004-07-16 | ||
| US11/182,328 | 2005-07-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN200996043Y true CN200996043Y (en) | 2007-12-26 |
Family
ID=38994473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2005900000241U Expired - Lifetime CN200996043Y (en) | 2004-07-16 | 2005-07-15 | Shielding frame assembly |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN200996043Y (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102315313A (en) * | 2010-07-01 | 2012-01-11 | 世界中心科技股份有限公司 | Shadow frame and making method thereof |
| CN102337496A (en) * | 2010-07-22 | 2012-02-01 | 深圳森丰真空镀膜有限公司 | Intermediate color coating method |
| CN102918180A (en) * | 2010-05-21 | 2013-02-06 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
| CN103132016A (en) * | 2013-02-22 | 2013-06-05 | 京东方科技集团股份有限公司 | Membrane edge adjusting device |
| CN103993260A (en) * | 2013-02-20 | 2014-08-20 | 旭晖应用材料股份有限公司 | Combined mask |
| CN104111582A (en) * | 2013-04-22 | 2014-10-22 | 信越化学工业株式会社 | Dust-proof film module and photomask with the dust-proof film module |
| CN105274471A (en) * | 2014-07-24 | 2016-01-27 | 三星显示有限公司 | Mask frame assembly, manufacturing method thereof and manufacturing method of organic light-emitting display device |
| CN105401123A (en) * | 2014-09-16 | 2016-03-16 | 三星显示有限公司 | Mask frame assembly and manufacturing method thereof |
| CN105951041A (en) * | 2016-05-25 | 2016-09-21 | 唐军 | Manufacturing method of large-size mask plate frame |
| CN108239765A (en) * | 2016-12-23 | 2018-07-03 | Tes股份有限公司 | Shield assembly |
| CN109119321A (en) * | 2017-06-22 | 2019-01-01 | 东京毅力科创株式会社 | Plasma processing apparatus |
| CN109338335A (en) * | 2018-10-16 | 2019-02-15 | 深圳市华星光电技术有限公司 | A kind of shadow mount structure for chemical gaseous phase deposition |
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- 2005-07-15 CN CNU2005900000241U patent/CN200996043Y/en not_active Expired - Lifetime
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102918180A (en) * | 2010-05-21 | 2013-02-06 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
| CN102918180B (en) * | 2010-05-21 | 2014-12-17 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
| CN102315313A (en) * | 2010-07-01 | 2012-01-11 | 世界中心科技股份有限公司 | Shadow frame and making method thereof |
| CN102337496A (en) * | 2010-07-22 | 2012-02-01 | 深圳森丰真空镀膜有限公司 | Intermediate color coating method |
| CN103993260A (en) * | 2013-02-20 | 2014-08-20 | 旭晖应用材料股份有限公司 | Combined mask |
| CN103993260B (en) * | 2013-02-20 | 2017-10-27 | 旭晖应用材料股份有限公司 | Combined type shade |
| CN103132016A (en) * | 2013-02-22 | 2013-06-05 | 京东方科技集团股份有限公司 | Membrane edge adjusting device |
| CN104111582B (en) * | 2013-04-22 | 2018-06-05 | 信越化学工业株式会社 | Dustproof film component and the photomask for installing the dustproof film component |
| CN104111582A (en) * | 2013-04-22 | 2014-10-22 | 信越化学工业株式会社 | Dust-proof film module and photomask with the dust-proof film module |
| CN105274471A (en) * | 2014-07-24 | 2016-01-27 | 三星显示有限公司 | Mask frame assembly, manufacturing method thereof and manufacturing method of organic light-emitting display device |
| CN105274471B (en) * | 2014-07-24 | 2019-08-13 | 三星显示有限公司 | The manufacturing method of mask frame and manufacturing method and organic light-emitting display device |
| CN105401123A (en) * | 2014-09-16 | 2016-03-16 | 三星显示有限公司 | Mask frame assembly and manufacturing method thereof |
| CN105401123B (en) * | 2014-09-16 | 2020-03-03 | 三星显示有限公司 | Mask frame assembly and method of manufacturing the same |
| CN105951041A (en) * | 2016-05-25 | 2016-09-21 | 唐军 | Manufacturing method of large-size mask plate frame |
| CN108239765A (en) * | 2016-12-23 | 2018-07-03 | Tes股份有限公司 | Shield assembly |
| CN108239765B (en) * | 2016-12-23 | 2020-04-28 | Tes股份有限公司 | Shielding assembly |
| CN109119321A (en) * | 2017-06-22 | 2019-01-01 | 东京毅力科创株式会社 | Plasma processing apparatus |
| CN109119321B (en) * | 2017-06-22 | 2020-07-07 | 东京毅力科创株式会社 | Plasma processing apparatus |
| CN109338335A (en) * | 2018-10-16 | 2019-02-15 | 深圳市华星光电技术有限公司 | A kind of shadow mount structure for chemical gaseous phase deposition |
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