KR20200094548A - Organic Light emitting device and method for the same - Google Patents

Abstract

An organic light emitting device according to an embodiment of the present invention includes: an optical unit including a first electrode, an organic light emitting layer, and a second electrode which are sequentially formed on a substrate having light transmittance; and an encapsulation film formed on the second electrode. The encapsulation film includes: a first inorganic film formed on the second electrode; and a nano lens formed on the first inorganic film and having the same or larger refractive index as the first inorganic layer. Accordingly, according to the organic light emitting device according to the exemplary embodiment of the present invention, by forming the first inorganic film having the high refractive index on a capping layer, it is possible to induce light in the capping layer to be extracted in the direction of the first inorganic film. Accordingly, light extraction efficiency of the organic light emitting device is improved.

Description

Organic light-emitting device and its manufacturing method{Organic Light emitting device and method for the same}

The present invention relates to an organic light emitting device, and more particularly, to an organic light emitting device capable of improving light extraction efficiency and a method for manufacturing the same.

An organic light emitting device (OLED), which is one of the display devices, has a structure in which an organic material layer including a light emitting layer made of an organic light emitting material is formed between at least one pair of transparent or semitransparent electrodes. That is, the organic light emitting device includes a light-transmitting substrate, an anode formed on the substrate, an organic material layer formed on the anode and generating light, and a cathode formed on the organic material layer. Here, at least one of the positive electrode and the negative electrode is provided to have light transmission so that light can be emitted.

In such an organic light emitting device, when a voltage is applied between a pair of electrodes (anode and cathode), electrons are injected from the cathode to the organic material layer, and holes are injected from the anode to recombine them in the organic material layer. Then, the organic light-emitting material is excited by the energy generated at this time to generate light. The light generated in the organic layer is extracted in at least one of the lower side where the anode is located and the upper side where the cathode is located.

On the other hand, in the organic light emitting device of the upper emission type, a part of the light generated in the organic material layer is absorbed by the cathode due to the surface plasmon effect and cannot be emitted to the outside, and oxygen and moisture are emitted from the outside of the organic light emitting device to the inside. Although an encapsulation layer is provided to prevent penetration, there is a problem that light cannot be emitted to the outside.

Korea Patent Publication 10-2011-0137087

The present invention provides an organic light emitting device capable of improving light extraction efficiency and a method for manufacturing the same.

The present invention provides an organic light emitting device capable of preventing moisture and oxygen input and a method for manufacturing the same.

An organic light emitting device according to an embodiment of the present invention includes an optical unit including a first electrode, an organic light emitting layer and a second electrode sequentially formed on a substrate having light transmissivity; And a sealing film formed on the second electrode, wherein the sealing film comprises: a first inorganic film formed on the second electrode; And a nano lens formed on the first inorganic layer and having a refractive index equal to or greater than that of the first inorganic layer.

The refractive index of the nano-lens is preferably 1.6 to 2.2.

The refractive index of the first inorganic film is preferably 1.6 to 2.0.

The first inorganic film is formed by adjusting the content ratio (at%) of the low-refractive inorganic and high-refractive inorganic materials to the entire first inorganic film.

The nano-lens has a convex shape in the opposite direction to the first inorganic film, and the nano-lens is provided in plural and is formed on the first inorganic film.

It is preferable that the nano-lens has a hemispherical shape.

The width of the nano-lens is preferably 100nm to 1000nm.

The encapsulation film is formed on the nano-lens, and includes an organic film having a refractive index of 1.3 to 1.5.

The encapsulation film is formed on the organic film, and includes a second inorganic film having a refractive index of 1.4 to 2.2.

The second electrode is formed to have light transmittance, and the light generated by the organic emission layer is an upper emission type that is emitted in the direction of the second electrode,

Each of the first electrode and the second electrode is formed to have light transmittance, so that light generated in the organic light emitting layer is a double-sided light emission type emitted in the direction of the first and second electrodes.

A method of manufacturing an organic light emitting device according to an embodiment of the present invention includes the steps of sequentially forming a first electrode, an organic light emitting layer, and a second electrode on a substrate; And forming an encapsulation film on the second electrode, wherein the forming of the encapsulation film includes: forming a first inorganic film on the second electrode; And forming a nano-lens on the first inorganic film that is equal to or larger than the refractive index of the first inorganic film.

In forming the nano-lens, the refractive index is formed to be 1.6 to 2.2, and in forming the first inorganic film, the refractive index of the first inorganic film is 1.6 to 2.0, so that the low with respect to the entire first inorganic film It is formed by adjusting the content ratio (at%) of the refractive mineral and the high-refractive mineral.

In forming the nano-lens, it is formed in a convex shape in the opposite direction to the first inorganic film, and the nano-lens is provided in plural to be formed on the first inorganic film.

And adjusting the surface energy of the first inorganic film to be lower than that of the nano-lens.

And forming an organic layer having a refractive index of 1.3 to 1.5 on the nano lens.

According to the organic light emitting device according to the embodiment of the present invention, by forming an encapsulation film on the optical section, and forming the encapsulation film as a first inorganic film having a high refractive index, induce light to be extracted in the direction of the first inorganic film in the optical section Can. Accordingly, the light extraction efficiency of the organic light emitting device is improved.

Further, by forming a nano lens on the first inorganic film of the encapsulation film, light extraction efficiency can be improved. That is, by scattering light incident on the first inorganic film of the encapsulation film through the nano-lens, it is possible to improve the light extraction efficiency by reducing the amount of light exiting in the lateral direction and increasing the amount of light extracted upward.

In addition, as the encapsulation film is formed so that the inorganic film and the organic film of the encapsulation film are alternately stacked, moisture and oxygen penetration can be suppressed or prevented. Thus, the life of the organic light emitting device is improved.

1 is a block diagram conceptually showing an organic light emitting device according to an embodiment of the present invention.
2 is a conceptual diagram for explaining a nano lens according to an embodiment of the present invention
3 to 6 are block diagrams sequentially showing a method of manufacturing an organic light emitting device according to an embodiment of the present invention

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various different forms, and only these embodiments allow the disclosure of the present invention to be complete, and the scope of the invention to those skilled in the art. It is provided to inform you completely.

The present invention relates to an organic light emitting device capable of improving light extraction efficiency. More specifically, the present invention relates to an organic light emitting device capable of increasing an amount of light extracted or emitted to the outside by improving an encapsulation film positioned in a direction in which light is extracted. In addition, an organic light emitting device capable of suppressing or preventing moisture and oxygen penetration is provided.

Hereinafter, an organic light emitting device according to an embodiment of the present invention will be described with reference to the drawings.

1 is a block diagram conceptually showing an organic light emitting device according to an embodiment of the present invention. 2 is a conceptual diagram for explaining a nano lens according to an embodiment of the present invention.

Referring to FIG. 1, an organic light emitting device according to an embodiment of the present invention is formed on a substrate 100, a substrate 100, and is formed on the optical unit 200 and the optical unit 200 that generate or generate light. It is formed on the capping layer 300 and the capping layer 300, and includes an encapsulation film 400 including an inorganic film 410 and a nano lens 420.

The substrate 100 has light-transmitting properties and may be a flexible film or glass. Among them, flexible films include polyethylene terephthalide (PET), polyethylene naphthalate (PEN), polyethylene (PE), polyethersulfone (PES), polycarbonate (PC), polyarylate (PAR) and polyimide ( PI).

The optical unit 200 includes a first electrode 210 formed on the substrate 100, an organic emission layer 220 formed on the first electrode 210, and a second electrode 230 formed on the organic emission layer 220. It includes.

The optical unit 200 according to the embodiment may be of a top emission type that extracts light in the direction of the second electrode 230 as a cathode.

The first electrode 210 is an electrode serving as an anode that provides holes to the organic emission layer 220. The first electrode 210 may be provided to have reflective characteristics such that light generated by the organic emission layer 220 is reflected and directed to the direction in which the second electrode 230 is positioned. To this end, the first electrode 210 may be made of metal to have a predetermined reflectance. More specifically, the first electrode 210 uses Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, LiF, Ba, Ca, and compounds thereof having a small work function, It may be formed to form a single layer or a composite layer. In addition, the thickness of the first electrode 210 may be 10 nm to 300 nm.

In addition, the first electrode 210 is not limited to the above-described example, and a transparent conductive oxide (TCO) and any one of the metals described above are stacked to form a multilayer structure in which a transparent conductive oxide layer and a metal layer are stacked. It may be provided. At this time, the transparent conductive oxide (TCO) used as the material of the first electrode 210 is ITO (Indium-Tin-Oxide), IZO (Indium Zinc Oxide), AZO (ZnO:Al), GZO (ZnO:Ga), BZO Either (ZnO:B) or SnO2 (SnO2:F) can be used.

In the organic emission layer 220, holes and electrons are combined to generate light, and may be formed in multiple layers to obtain high emission luminance or efficiency. The organic light emitting layer 220 may include, for example, a hole injection layer (HIL) 221 sequentially stacked on the first electrode 210, a hole transport layer (HTL) 222, and an emission layer. layer: EML (223), an electron transport layer (electron transport layer; ETL) 224, may include an electron injection layer (electron injection layer; EIL) 225.

The hole injection layer 221 is a layer that assists injection of holes into the hole transport layer 222 and is formed on the first electrode 210. The hole injection layer 221 is made of, for example, any one of copper phthalocynine (CuPc) and MTDATA (4,4',4"-Tris(N-3-methylphenyl-N-phenyl-amino)-triphenylamine). In addition, the thickness of the hole injection layer 221 may be, for example, 20 nm to 200 nm.

Of course, the material of the hole injection layer 221 is not limited to the above-described examples, and various organic materials used as the hole injection layer 221 in the art or organic materials that assist hole injection into the hole transport layer 222 may be used. Can.

The hole transport layer 222 is formed on the hole injection layer 221 to facilitate hole transport to the light emitting layer 223. The hole transport layer 222 is a carbazole derivative such as N-phenylcarbazole or polyvinylcarbazole, NPB(N , N ′ -Di(1-naphthyl)-N , N ′ -diphenyl-(1,1′- biphenyl)-4,4′'-diamine), TPD(N,N'-Bis-(3-methylphenyl)-N,N'-bis-(phenyl)-benzidine) and NPD(N,N'-dinaphthyl- N,N'-diphenyl benzidine). In addition, the thickness of the hole transport layer 222 may be, for example, 10 to 100 nm.

Of course, the material of the hole transport layer 222 is not limited to the above-described examples, and organic materials that help transport holes to the light emitting layer 223 or various organic materials used as the hole transport layer 222 in the art may be used.

The emission layer 223 is formed on the hole transport layer 222, and may have a thickness of 10 nm to 100 nm, for example. The light emitting layer 223 may use a phosphorescent material or a fluorescent material.

When the light emitting layer 223 is a fluorescent light emitting layer, the light emitting layer 223 includes Alq3 (Tris-(8-hydroxyquinoline)aluminum), distyrylarylene (DSA), distyrylarylene derivative, distyrylbenzene; DSB), distyrylbenzene derivatives, DPVBi (4,4'-bis(2,2'-diphenyl vinyl) -1,1'-biphenyl), DPVBi derivatives, spiro-DPVBi and spiro-6P (spiro-sexyphenyl) ) May include one material selected from the group consisting of. Furthermore, the light emitting layer 223 may further include a single dopant material selected from the group consisting of a styrylamine-based, perylene-based, and distyrylbiphenyl (DSBP)-based.

In addition, when the light-emitting layer 223 is a phosphorescent light-emitting layer, the light-emitting layer 223 may include one material selected from the group consisting of arylamine-based, carbazole-based, and spiro-based host materials. Preferably, the host material is CBP(4,4′-Bis( N -carbazolyl)-1,1′-biphenyl), CBP derivative, mCP(N,N -dicarbazolyl-3,5-benzene) mCP derivative and spiro It is a substance selected from the group consisting of derivatives. In addition to this, the light emitting layer 223 may include a phosphorescent organic metal complex having one central metal selected from the group consisting of Ir, Pt, Tb, and Eu as a dopant material. Moreover, the phosphorescent organic metal complex may be one selected from the group consisting of PQIr, PQIr (acac), PQ2Ir (acac), PIQIr (acac) and PtOEP.

The electron transport layer 224 is formed on the light emitting layer 223, and serves to facilitate electron transport to the light emitting layer 223. The material forming the electron transport layer 224 is not particularly limited, and PBD(2-(4-biphenyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole), TAZ(3-phenyl Materials such as -4-(1-naphthyl)-5-phenyl-1,2,4-triazole) can be used. In addition, the thickness of the electron transport layer 224 may be 10 to 40 nm.

The material of the electron transport layer 224 is not limited to the above-described example, and an organic material that helps transport electrons to the light emitting layer 223 or various organic material used as the electron transport layer 224 in the art may be used.

The electron injection layer 225 is formed on the electron transport layer 224, so that electrons provided from the second electrode 230 can be easily injected into the electron transport layer 224. The electron injection layer 225 may use materials such as LiF, NaCl, CsF, Li ₂ O, BaO, and Liq. In addition, the thickness of the electron injection layer 225 may be 0.1 to 30 nm.

In the above, it has been described that the organic emission layer 220 includes the hole injection layer 221, the hole transport layer 222, the emission layer 223, the electron transport layer 224, and the electron injection layer 224.

However, the organic light emitting layer 220 is not limited to the above-described configuration, and at least one of the layers may be omitted.

In addition, the organic emission layer 220 includes a hole blocking layer formed between the emission layer 223 and the electron transport layer 224 and an electron blocking layer formed between the hole transport layer 222 and the emission layer 223. blocking layer).

The second electrode 230 is an electrode that serves as a cathode that provides electrons to the electron injection layer 225. The second electrode 230 is provided to have light transmittance so that light generated in the organic emission layer 220 is extracted or emitted to the outside. The second electrode 230 may be manufactured using, for example, Mg and Ag, and may be formed to a thickness of 1 nm to 30 nm in order to have light transmittance.

On the other hand, at least a part of the light generated by the optical unit 200 is absorbed by the second electrode 230 due to the surface plasmon effect, and thus, light loss that is not emitted or extracted outside the second electrode 230 may occur. This is called surface plasmon polaritone loss.

To reduce surface plasmon polaritone loss, a high-refractive, light-transmitting or transparent capping layer is formed on the second electrode 230.

The capping layer 300 is a layer having a higher refractive index than air, the refractive index is 1.6 to 2.0 higher than that of air, the thickness is 10nm to 500nm, and is formed to have light transmission.

The capping layer 300 according to the embodiment is a single layer consisting of a capping layer formed of an organic material (hereinafter, an organic capping layer) or a capping layer formed of an inorganic material (hereinafter, an inorganic capping layer), or an organic capping layer and an inorganic capping layer It may be a laminated multilayer.

When the capping layer 300 is formed as a multilayer, it may be formed on the second electrode 230 in the order of an organic capping layer/inorganic capping layer or an inorganic capping layer/organic capping layer. In addition, when forming a capping layer with a multilayer, it is not limited to two layers as mentioned above, but a multilayer of three or more layers can also be formed.

In forming the capping layer with an organic material, the refractive index is 1.6 to 2.0, and a material that can be deposited by a thermal evaporation method at a low temperature without a plasma process is used.

When the capping layer 300 is formed in this way, the use of an organic material capable of thermal evaporation at a low temperature without a plasma process is used to prevent the lower electrode, the second electrode 230, from being damaged by plasma. to be.

In an embodiment, in forming the organic capping layer, NPB(N , N ′ -Di(1-naphthyl)-N , N ′ -diphenyl-(1,1′-biphenyl)-4,4′'-diamine), TCTA(Tris(4-carbazoyl-9-ylphenyl)amine), TAPC(1,1-Bis[4-[N,N'-Di(ptolyl)Amino]Phenyl]Cyclohexane), CBP(4,4′-Bis It is formed by depositing at least one of ( N- carbazolyl)-1,1′-biphenyl) and Alq3 (Tris-(8-hydroxyquinoline) aluminum) by thermal evaporation.

In addition, in forming the inorganic capping layer, at least one of IZO (Indium Zinc Oxide), ITO (Indium Tin Oxide), AZO (ZnO:Al), ATO (Antimony Tin Oxide), and FTO (Fluorine doped Tin Oxide) is sputtered. It is formed by depositing by any one of (sputtering), atomic layer deposition (ALD), and chemical vapor deposition (CVD).

The capping layer 300 suppresses or prevents light loss (ie, surface plasmon polaritone loss) that is generated by the organic light emitting layer 220 and absorbed by the second electrode 230 and thus cannot be extracted to the outside. The amount of light extracted outside the electrode 230 is increased. In addition, the capping layer 300 protects the second electrode 230 and the organic emission layer 220 thereunder, and has an effect of improving the planarization characteristics of the film.

Meanwhile, as described above, in order to allow light to be extracted out of the second electrode 230, a capping layer 300 is formed on the second electrode 230. However, the difference in refractive index between the capping layer 300 and the outside air thereof is large, and light extracted from the second electrode 230 and incident on the capping layer 300 is totally reflected within the capping layer 300, that is, waveguided. There is a problem that cannot be extracted to the outside. This is a factor to reduce the light extraction efficiency of the organic light emitting device.

In addition, since the optical unit 200, more specifically, the organic light emitting layer 220 is vulnerable to moisture and oxygen, it is necessary to prevent their penetration. However, the capping layer 300 alone is limited in preventing moisture and oxygen from penetrating.

Thus, in the embodiment, while encapsulating the light on the capping layer 300, an encapsulation film 400 capable of preventing penetration of moisture and oxygen is formed. More specifically, by forming a sealing film 400 including a plurality of nano-lenses 420 on the capping layer 300 and a first inorganic film 410 having a high refractive index, light extraction efficiency is improved. And, by forming the encapsulation film 400 in a structure in which the inorganic film and the organic film are alternately stacked, moisture or oxygen penetration is suppressed or prevented.

The encapsulation film 400 according to an embodiment is formed on the first inorganic film 410 and the first inorganic film 410 formed on the capping layer 300, as shown in FIG. It includes a plurality of nano lenses 420 arranged in the extending direction of the film 410. In addition, the encapsulation film 400 includes an organic film 430 formed on the plurality of nano lenses 420 and a second inorganic film 440 formed on the organic film 430.

The first inorganic film 410 is formed on the capping layer 300, has light transmittance, and more specifically has a refractive index similar to that of the capping layer 300 formed on the bottom, more specifically, has a refractive index of 1.6 to 2.0, and a thickness of 20 nm to 60 nm. It is formed of. In addition, the moisture permeability of the first inorganic film 410 is 1*10 ^-4 g/m ² /day or less.

In forming the first inorganic film 410, in an embodiment, the refractive index is relatively low, and a material having a refractive index of 1.6 or less (hereinafter, a low-refractive inorganic material) and a low-refractive-inorganic material are relatively high, and 1.6 It is formed to include a material having a refractive index of more than 2.0 or less (hereinafter, a high refractive inorganic material). In other words, the first inorganic film 410 may be formed such that a low refractive inorganic material and a high refractive inorganic material are mixed.

Here, the low refractive inorganic material may be any one of Al ₂ O ₃ and SiO ₂ , and the high refractive inorganic material may be any one of ZnO, TiO ₂ , ZrO ₂ , ln ₂ O ₃ and SiN _x . According to the low-refractive inorganic material and the high-refractive inorganic material, the first inorganic film includes Al ₂ O ₃ and ZnO, Al ₂ O ₃ and TiO ₂ , Al ₂ O ₃ and TiN, or Al ₂ O ₃ And ZrO ₂ , Al ₂ O ₃ and In ₂ O ₃ , SiO ₂ and SiNx, SiO ₂ and TiO ₂ , SiO ₂ and TiN, SiO ₂ and ZrO ₂ It may include, or it may be formed to include SiO ₂ and In ₂ O ₃ .

If the first inorganic film 410 is described in other words, any one of Al ₂ O ₃ and SiO ₂ as a low-refractive inorganic material, and ZnO, TiO ₂ , ZrO ₂ , ln ₂ O ₃ and SiN _x as a high-refractive inorganic material It is formed to contain one.

The first inorganic layer 410 may be formed by vapor deposition using any one of chemical vapor deposition (CVD) and atomic layer deposition (ALD).

In forming the first inorganic film 410 by the chemical vapor deposition (CVD) method and atomic layer deposition (ALD), precursors (hereinafter referred to as low-refractive precursors) and high-refractive inorganic materials that form low-refractive inorganic materials are formed. It can be formed using a precursor (hereinafter, a high refractive precursor), a low refractive precursor, and a precursor (hereinafter, a reactive precursor) which is a raw material that reacts with the high refractive precursor.

At this time, a low-refractive precursor for forming Al ₂ O ₃ , that is, an Al precursor may use trimethyl aluminum (TMA), a low-refractive precursor for forming SiO ₂ , SiN _x , that is, the Si precursor is SiCl ₄ , SiHCl ₃ , Si ₂ Cl ₆ , SiH ₂ Cl ₂ , Si ₃ Cl ₈ or Si ₃ H ₈ .

And, a high-refractive precursor for forming TiO _2, that is, the Ti precursor may use any one of tetrakis dimethylamido titanium (TDMAT) and tetrakis diethylamido titanium (TDEAT), and the high-refractive precursor for forming ZnO, that is, the Zn precursor is DEZ ( diethyl zinc), and a high-refractive precursor for forming ZrO ₂ , that is, a Zr precursor, may be any one of Cp-Zr (Cyclopentadienyl Tris(dimethylamino) Zirconium) and ZM ₄ 0. In addition, a high-refractive precursor for forming In ₂ O _3, that is, In precursor, TMIn (trimethylindium), TEI (triethylindium), or the like may be used.

In addition, a reaction precursor for forming Al ₂ O ₃ , SiO ₂ , ZnO, TiO ₂ , ZrO ₂ , In ₂ O ₃ , that is, an oxygen precursor uses at least one of H ₂ O, O ₃ , and O ₂ , The nitrogen precursor for forming SiN _x may be a material composed of NH ₃ , N ₂ H ₄ , N ₂ and any mixtures thereof.

In the embodiment, as described above, the first inorganic film 410 is formed to have a refractive index of 1.6 to 2.0, which is the content ratio (at %) of the low-refractive inorganic and high-refractive inorganic materials in the entire first inorganic film 410. (atom %))).

More specifically, when the first inorganic film is formed to include Al ₂ O ₃ and ZnO, the high-refractive inorganic ZnO is 20 at% to 80 at% (atom%) with respect to the entire first inorganic film, and the remaining balance is low. It is formed so that the refractive inorganic material is Al ₂ O ₃ (that is, Al ₂ O ₃ is 20 at% to 80 at%).

And the other examples, Al ₂ O In the case of forming the first inorganic film 410 to include the ₃ and TiO _2, a first on the entire inorganic film 410 is a high refractive index inorganic material is TiO ₂ 20 at% to 90 at%, The remaining residue is formed to be Al ₂ O ₃ (low refractive mineral) (ie, Al ₂ O ₃ is 10 at% to 80 at%).

And, in the case of forming the first inorganic film to contain Al ₂ O ₃ and ZrO _2, a first inorganic film entirely on the high refractive index inorganic material is ZrO ₂ is 30 at% to 90 at% (atom%) to, the remaining balance of the low It is formed so that the refractive inorganic material is Al ₂ O ₃ (that is, Al ₂ O ₃ is 10 at% to 70 at%).

As another example, the first arms in the case of forming a film, the high refractive index inorganic material ln ₂ O ₃ is 20 at% to 80 at% (atom%) for the entire first inorganic film to contain Al ₂ O _3, and ln ₂ O ₃ , And the remainder is formed to be Al ₂ O _{3 which} is a low-refractive inorganic substance (that is, Al ₂ O ₃ is 20 at% to 80 at%).

In addition, when the first inorganic film 410 includes SiO ₂ and SiN _x , in the entire first inorganic film 410, SiN _{x as a} high refractive inorganic material is 30 at% to 90 at%, SiO ₂ (low refractive index Inorganic material) is formed to be 10 at% to 70 at%, and when the first inorganic film 410 includes SiO ₂ and TiO ₂ , in the entire first inorganic film 410, TiO ₂ as a high refractive inorganic material is 30 at% to 90 at%, SiO ₂ (low-refractive inorganic material) is formed to be 10 at% to 70 at%, and when the first inorganic film 410 includes SiO ₂ and ZrO ₂ , the first inorganic film (410) In the whole, ZrO _{2 which} is a high refractive inorganic material is formed to be 30 at% to 90 at%, and SiO ₂ (low refractive inorganic material) is 10 at% to 70 at%.

In addition, when the first inorganic film 410 includes SiO ₂ and ln ₂ O ₃ , in the entire first inorganic film 410, ln ₂ O _{3 as a} high refractive inorganic material is 30 at% to 90 at%, SiO ₂ (low refractive mineral) is formed to be 10 at% to 70 at%.

Thus, by adjusting the ratio of the content of the high-refractive inorganic material and the content of the low-refractive inorganic material (at% (atom%)) in the first inorganic film 410 as described above, the refractive index of the first inorganic film 410 is 1.6 to It can be adjusted to 2.0.

On the other hand, in forming the first inorganic film 410, when each of the high-refractive inorganic materials is less than the above-mentioned lower limit value, the refractive index of the first inorganic film 410 is lower than 1.6, and thus there is a problem that light extraction efficiency is lowered. In addition, in forming the first inorganic film 410, when each of the high-refractive inorganic materials exceeds the above-described upper limit value, the acid resistance is low, so that the effect of inhibiting the moisture and oxygen penetration of the first inorganic film 410 is lowered. There is. More specifically, the moisture permeability of the first inorganic film 410 may exceed 1*10 ^-4 g/m ² /day.

Accordingly, in the embodiment, in forming the first inorganic film 410 to include the low-refractive inorganic material and the high-refractive inorganic material, by adjusting the respective content ratios as described above according to the combination of the low-refractive inorganic material and the high-refractive inorganic material, The refractive index is adjusted to 1.6 to 2.0.

The ratio of the content of the high-refractive inorganic material and the low-refractive inorganic material in the first inorganic film 410 can be controlled by adjusting process conditions for forming the first inorganic film.

For example, when the first inorganic film 410 is formed by an atomic layer deposition (ALD) method, a low refractive index precursor, a high refractive index precursor, a reaction precursor and a purge gas are injected into the chamber of the atomic layer deposition apparatus.

At this time, by adjusting the injection amount, injection time, injection frequency (or repetition number), precursor injection pressure, and atmosphere in the chamber of the low-refractive precursor and high-refractive precursor into the atomic layer deposition (ALD) device, high-refractive inorganic and low-refractive inorganic materials A first inorganic film 410 having a controlled content ratio may be formed. And through this, the first inorganic layer 410 may be formed to have a refractive index of 1.6 to 2.0.

On the other hand, when the refractive index of the first inorganic film 410 is less than 1.6, the refractive index is lower than that of the lower layer capping layer 300, so that light is reflected at the interface between the capping layer 300 and the first inorganic film 410, and light There is a problem that the extraction efficiency is lowered. That is, the light incident on the capping layer 300 is reflected at the interface with the first inorganic film 410, is not extracted in the direction of the first inorganic film 410, is trapped in the capping layer 300, or the capping layer There is a problem of exiting in the lateral direction of 300, and thus the light extraction efficiency in the upward direction is lowered.

The refractive index of the first inorganic film 410 is limited to 2.0 or less because it is difficult to form the refractive index to exceed 2.0 using an inorganic material.

The first inorganic film 410 is formed to a thickness of 20nm to 60nm. On the other hand, if the thickness of the first inorganic film 410 is lower than 20 nm, the moisture permeability of the first inorganic film may exceed 1*10 ^-4 g/m ² /day, and the organic light emitting device may be absorbed by moisture penetration. The life span may be reduced.

In addition, since the moisture permeability of the first inorganic film 410 is less than or equal to 1*10 ^-4 g/m ² /day, the thickness of the first inorganic film 410 does not need to exceed 60 nm. It is preferable that the thickness of the inorganic film 410 is 60 nm or less.

A nano lens 420 to be described later is formed on the first inorganic film 410, and the surface energy of the first inorganic film 410 is higher than that of the material for forming the nano lens 420 or the nano lens 420. It is desirable that the energy is adjusted to be low. This has a different height in the width direction of the first inorganic film 410 on the upper surface of the first inorganic film 410, the convex shape of the nano-lens 420 is formed, the nano-lens 420 This is to form a plurality.

In other words, for light scattering, the nano lens 420 is preferably in a convex shape such as a hemispherical shape in an upward direction, that is, a direction in which the organic layer 430 is positioned, and for this purpose, the surface of the first inorganic layer 410 The energy needs to be lower than the surface energy of the nano lens 420.

Meanwhile, the nano-lens 420 is formed using an organic material, and the surface energy of the inorganic material is higher than that of the organic material.

However, when the surface energy of the first inorganic film 410 is higher than that of the organic material to form the nano lens 420, when the organic material is deposited or coated on the first inorganic film 410, it is convex in the upward direction or is 1 An organic material may not be deposited or formed in a shape having a different height in the width direction of the inorganic layer 410. That is, the organic material is continuously deposited or formed over the entire upper surface of the first inorganic layer 410, so that the nano lens 420 may not be formed.

Therefore, after forming the first inorganic film 410, when the surface energy of the first inorganic film 410 is higher than the organic material for forming the nano lens 420 that is subsequently formed, the nano lens 420 is formed. Before, a pre-treatment to lower the surface energy of the first inorganic film 410 is performed.

For example, by forming a self-assembled monolayer (SAM) on the upper surface of the first inorganic layer 410, the energy of the upper surface of the first inorganic layer 410 where the nano lens 420 is to be formed is the nano lens. It is adjusted to be lower than (420).

The first inorganic film 410 is preferably adjusted to 10mJ/m ² to 200mJ/m ² so that its surface energy is smaller than the surface energy of the lens 420 formed of an organic material.

As described above, by forming the first inorganic film 410 having a high refractive index similar to that of the capping layer 300 on the capping layer 300, the light incident on the capping layer 300 is above the capping layer 300. Can increase the amount released. That is, by forming the first inorganic film 410 having a refractive index of 1.6 to 2.0 on the capping layer 300, the light incident on the capping layer 300 is reflected at the interface with the first inorganic film 410 By suppressing or preventing it, it can be extracted in the upper side of the capping layer 300, that is, in the direction of the first inorganic film 410, thereby improving the light extraction efficiency.

The plurality of nano lenses 420 are formed on the first inorganic film 410, have light transmission properties, and are formed to be arranged in the extending direction of the first inorganic film 410. Each of the plurality of nano lenses 420 may have a flat bottom surface in contact with the first inorganic film 410, and may have a convex shape in an opposite direction to the upper side, that is, the first inorganic film 410. As a more specific example, each of the plurality of nano lenses 420 may have a hemisphere shape.

The nano-lens 420 is formed using an organic material, and the refractive index of the nano-lens 410 may be equal to or greater than that of the first inorganic film 410, and the refractive index of the nano-lens 420 is preferably 1.6 to 2.2. .

To form the nano lens 420 using an organic material, a plurality of nano lenses in a convex shape in the opposite direction (ie, an upward direction) to the first inorganic film 410 on the upper surface of the first inorganic film 410 It is to form 420.

That is, when formed of an inorganic material, such as the first inorganic film 410, the physical properties are similar, it is not possible to form a convex nano-lens 420 on the first inorganic film 410 in the upward direction, or An inorganic material is formed on the entire upper surface of the first inorganic layer 410 to have a uniform thickness, and thus a nano lens having a convex shape in an upward direction cannot be formed.

In an embodiment, NPB(N , N ′ -Di(1-naphthyl)-N , N ′ -diphenyl-(1,1′-biphenyl)-4,4′'-diamine), Alq3(Tris-(8-hydroxyquinoline )aluminum) and TCTA(Tris(4-carbazoyl-9-ylphenyl)amine), CBP(4,4′-Bis( N -carbazolyl)-1,1′-biphenyl). 420, and the refractive index is 1.6 to 2.2. Further, the materials may be formed by any one of a physical vapor deposition (PVD) method and a thermal evaporation method.

At this time, due to the difference in surface energy between the surface energy of the first inorganic film 410 and the organic material forming the nano-lens 420, the organic material spontaneously aggregates on the first inorganic film 410 to form an island. do. In addition, in order to minimize the total surface energy, the nano lens 420 may be formed in a hemisphere shape.

That is, the organic material for forming the nano-lens 420 is not deposited to have a uniform thickness over the entire upper surface of the first inorganic film 410, but is deposited in an island form, for example , Hemispherical plurality of nano-lenses 420 may be listed. In other words, the plurality of nano lenses 420 convex in the upward direction are formed to be in the form listed on the upper surface of the first inorganic film 410.

The plurality of nano lenses 420 scatters light to improve light extraction efficiency that is extracted to the outside. That is, light incident on the first inorganic film 410 through the capping layer 300 is scattered by the plurality of nano lenses 420 formed on the first inorganic film 410. Accordingly, light may be trapped in the capping layer 300 or the first inorganic layer 410, or total reflection may reduce the amount of light and improve the amount of light extracted to the outside.

In the nano lens 420, when the extending direction of the upper surface of the first inorganic film 410 is referred to as a width direction, the width W of each of the plurality of nano lenses 420 is preferably 100 nm to 1000 nm (FIG. 2). Here, the width W of the nano lens 420 may be more specifically, a length in one direction of the lower surface of the nano lens 420 in contact with the upper surface of the first inorganic layer 410. In addition, the width W of the nano lens 420 may be the longest length among the lengths of the first inorganic layer 410 in the extending direction. In addition, when the nano-lens 420 has a hemisphere shape, the width of the nano-lens 420 may be referred to as a diameter.

When the width (W) of the nano-lens is less than 100 nm, the effect of enhancing light extraction is insufficient, whereas when the width (W) of the nano-lens exceeds 1000 nm, it is difficult to apply to dozens of micro-sized organic light emitting device pixels, and red (Red) , It is difficult to improve uniform light extraction of green and blue pixels.

In addition, each of the plurality of nano lenses 420 has a ratio of the height H to the width W (hereinafter, the aspect ratio (H/W)) of 1/4 to 2/3.

Here, the height (H) of the nano-lens 420 may be the longest of the lengths in the vertical direction, which is, for example, as shown in Figure 2, the vertical direction from the center of the width direction of the nano-lens 420 It can be length.

On the other hand, when the aspect ratio (H/W) of the nano lens 420 is less than 1/4, the effect of improving light extraction is insufficient. Conversely, when the aspect ratio (H/W) exceeds 2/3, the contact area between the lower surface of the nano lens 420 and the first inorganic film 410 is narrow, so that the nano lens 420 has the first inorganic film 410 ) Is difficult to stick on, and the width (W) is too narrow compared to the height (H) of the nano lens (420), which interferes with light extraction, so that the effect of improving light extraction may be deteriorated.

The plurality of nano lenses 420 may be formed to be distributed over the entire upper surface of the first inorganic layer 410. In this case, each of the plurality of nano lenses 420 may be formed to be spaced apart from each other, and may be formed to be spaced apart at equal intervals or irregular intervals. Of course, the present invention is not limited thereto, and two or more nano lenses 420 may be formed to be continuously or interconnected.

In addition, the nano-lens 420 may have the same refractive index as the first inorganic layer 410 or may be large. For example, when the refractive index of the nano lens 420 is larger than that of the first inorganic film 410, it is effective that the difference in refractive index with the first inorganic film 410 is 0.1 or less. This is controllable by adjusting the ratio of the low-refractive precursor and the high-refractive precursor material, and the low-refractive-inorganic and high-refractive-inorganic materials when forming the first inorganic film 410 according to the organic material forming the nano lens 420. In addition, the present invention is not limited thereto, and according to the refractive index of the first inorganic film 410 formed on the capping layer 300, the first inorganic film 410 and the nano lens according to the organic material for forming the nano lens 420 It may be formed so that the difference in refractive index from (420) is 0.1 or less.

In the above, it has been described that the first inorganic film 410 is pre-treated with the surface of the first inorganic film 410 before the nano lens 420 is formed, so that the surface energy is lower than that of the nano lens 420.

However, the present invention is not limited thereto, and the surface energy is increased by crystallizing an organic material for forming the nano-lens 420 to form the nano-lens 420, so that the first inorganic film 410 has a surface energy compared to the nano-lens 420. It can be made low.

The organic layer 430 is formed on the plurality of nano lenses 420 and has light transmission properties. In this case, when a plurality of nano lenses 420 are formed to be spaced apart from each other on the first inorganic layer 410, the organic layer 430 is a region between the nano lenses spaced apart from each other, the upper surface of the first inorganic layer 410 and the nano lens 420 is formed on the top.

The organic layer 430 is formed using an organic material having a lower refractive index than the nano-lens 420, and more specifically, an organic material having a refractive index of 1.3 to 1.5. The formation of the organic layer 430 such that the refractive index is lower than that of the nano lens 420 is to improve light extraction by light scattering of the nano lens 420.

The organic layer 430 may be formed using, for example, a fluorinated organic material, and may be formed by any one of physical vapor deposition (PVD) and thermal evaporation.

As described above, the width W of the nano lens 420 is 100 nm to 1000 nm, and the aspect ratio is 1/4 to 2/3, so the maximum height H of the nano lens 420 is about 667 nm. At this time, since the organic layer 430 must sufficiently cover the nano-lens 420, the thickness of the organic layer 430 is preferably 1 μm or more.

On the other hand, the thicker the thickness of the organic layer 430, the longer the water and oxygen penetration paths, which is advantageous for lowering the water and oxygen permeability. However, if the thickness of the organic film 430 is greater than 10 μm, the light absorption rate to the organic film 430 increases. Accordingly, it is preferable to form the organic film 430 with a thickness of 1 μm to 10 μm.

The second inorganic layer 440 is formed on the organic layer 430 and has light transmission properties. In addition, it is preferable that the second inorganic film 440 has a refractive index of 1.4 to 2.0.

The second inorganic film 440 may be formed using at least one of a low refractive precursor and a high refractive precursor forming the first inorganic film 410, and may be formed in the same manner as the first inorganic film 410. . That is, the second inorganic film may be formed to include at least one of Al ₂ O ₃ and SiO ₂ , which are low-refractive inorganic materials, and ZnO, TiO ₂ , ZrO ₂ , ln ₂ O _3, and SiNx, which are high-refractive inorganic materials.

In addition, the second inorganic film 440 is preferably formed as a multilayer so that the inorganic film and the organic film are alternately stacked, and more preferably, three or more layers are stacked, such as'inorganic film/organic film/inorganic film'. At this time, the organic film may be formed of an organic material forming a nano lens or the same material as the organic film formed on the nano lens. And, the second inorganic film 440 is preferably formed to a thickness of 20nm to 60nm.

In addition, when the inorganic film and the organic film are alternately stacked to form the second inorganic film 440 in a multilayer, the outermost layer is formed to be an inorganic film.

In the above, it has been described that the encapsulation film 400 is formed of four layers'the first inorganic film 410 / the nano lens 420 / the organic film 430 / the second inorganic film 440'.

However, the present invention is not limited thereto, and the first inorganic film 410 / nano lens 420 / organic film 430 / second inorganic film 440 is formed on the capping layer 300, and then the organic film And an inorganic film may be alternately formed to form an encapsulation film 400 of 5 or more layers. At this time, even in the encapsulation film 400 of 5 or more layers, the outermost layer, that is, the uppermost layer is formed to be an inorganic film.

In the above, the organic light emitting device of the upper emission type in which the first electrode 210 has a reflective characteristic and the second electrode 230 is formed to have light transmittance to emit light in an upward direction has been described.

However, the present invention is not limited thereto, and the encapsulation film 400 according to an embodiment is formed so that each of the first electrode 210 and the second electrode 230 has light transmittance, and emits light in both directions ( 400).

Hereinafter, a method of manufacturing an organic light emitting device according to an embodiment of the present invention will be described with reference to FIGS. 1, 3, and 6. In this case, an organic light emitting device of the upper emission type, in which the first electrode 210 has reflective properties and the second electrode 230 is formed to have light transmittance, and emits light in an upward direction, will be described as an example.

In addition, the content overlapping with the above-mentioned content will be omitted or briefly described.

3 to 6 are block diagrams sequentially showing a method of manufacturing an organic light emitting device according to an embodiment of the present invention.

First, a substrate 1 is provided, and an optical unit 200 is formed on the substrate 100 as shown in FIG. 3.

The substrate 100 is, for example, polyethylene terephthalide (PET), polyethylene naphthalate (PEN), polyethylene (PE), polyethersulfone (PES), polycarbonate (PC), polyarylate (PAR) and polyimide (PI) ).

When the substrate 100 is provided, the first electrode 210 is formed on the substrate 100. The first electrode 210 may be formed of a multilayer structure in which a transparent conductive oxide layer and a metal layer are stacked to have reflective properties, and may be formed using a physical vapor deposition (PVD) method using sputtering. In this case, the transparent conductive oxide layer may be, for example, ITO (Indium-Tin-Oxide), and the metal layer may be, for example, Ag.

Thereafter, the organic emission layer 220 is formed on the first electrode 210. That is, a hole injection layer (HIL) 221, a hole transport layer (HTL) 222, a light emitting layer (EML) 223, an electron transport layer (ETL) 224, and an electron injection layer on the first electrode 210 ( EIL) 225 is sequentially stacked to form the organic light emitting layer 220. At this time, each of the hole injection layer (HIL) 221, the hole transport layer (HTL) 222, the light emitting layer (EML) 223, the electron transport layer (ETL) 224, and the electron injection layer (EIL) 225, respectively It can be formed using a vapor deposition method (thermal evaporation).

Next, the second electrode 230 is formed on the electron injection layer (EIL) 225. In this case, the light generated in the organic emission layer 220 is provided to have light transmission so that it can be extracted or emitted through the second electrode 230. To this end, the second electrode 230 may be manufactured using Mg and Ag, and is preferably formed to a thickness of 1 to 30 nm.

In this way, when the optical unit 200 is formed, a capping layer 300 having a refractive index of 1.6 to 2.0 is formed on the second electrode 230 and is formed to have a thickness of 10 nm to 500 nm.

In an embodiment, the capping layer 300 is formed of a single layer of either an organic capping layer or an inorganic capping layer, or a multi-layer in which an organic capping layer and an inorganic capping layer are stacked.

Thereafter, an inorganic film and an organic film are alternately stacked on the capping layer 300 to form an encapsulation film 400 including a plurality of nano lenses 420.

To this end, first, as shown in Figure 4, to form a first inorganic film 410 having a refractive index of 1.6 to 2.0 on the capping layer 300, it is formed to a thickness of 20nm to 60nm.

In an embodiment, a low-refractive-inorganic material and a high-refractive-inorganic material containing a low-refractive-inorganic material and a high-refractive-inorganic material using a low-refractive precursor, a high-refractive precursor, and a reactive precursor by any one of chemical vapor deposition (CVD) and atomic layer deposition (ALD) The first inorganic film 410 in which the inorganic material is mixed is formed.

At this time, by adjusting the content ratio (at% (atom %)) of the low-refractive inorganic material and the high-refractive inorganic material in the entire first inorganic film 410, the first inorganic film 410 having a refractive index of 1.6 to 2.0 is formed. do.

In this case, the first inorganic film 410 is formed of a combination of any one of Al ₂ O ₃ and SiO ₂ , which is a low-refractive inorganic material, and ZnO, TiO ₂ , ZrO ₂ , ln ₂ O _3, and SiNx, a high-refractive inorganic material. do. That is, Al ₂ O ₃ /ZnO, Al ₂ O ₃ /TiO ₂ , Al ₂ O ₃ /TiN, Al ₂ O ₃ /ZrO ₂ , Al ₂ O ₃ /In ₂ O ₃ , SiO ₂ /SiNx, SiO ₂ / The first inorganic film 410 may be formed by any one combination of TiO ₂ , SiO ₂ /TiN, SiO ₂ /ZrO ₂ , and SiO ₂ /In ₂ O ₃ .

After the first inorganic film 410 is formed, a pre-treatment for lowering the surface energy of the first inorganic film 410 may be performed. For example, it is possible to perform a pre-treatment to form a self-assembled monolayer (SAM) on the upper surface of the first inorganic film 410, and the surface energy is preferably 10 mJ/m ² to 200 mJ/m ² .

Next, as illustrated in FIG. 5, a plurality of nano lenses 420 are formed on the first inorganic layer 410. To this end, organic substances having a refractive index of 1.6 to 2.2, for example, NPB(N , N ′ -Di(1-naphthyl)-N , N ′ -diphenyl-(1,1′-biphenyl)-4,4′'-diamine) , Alq3(Tris-(8-hydroxyquinoline)aluminum) and TCTA(Tris(4-carbazoyl-9-ylphenyl)amine), CBP(4,4′-Bis( N -carbazolyl)-1,1′-biphenyl) Any one is deposited on the first inorganic film 410 by any one of a physical vapor deposition (PVD) method and a thermal evaporation method.

At this time, due to the difference in surface energy between the surface energy of the first inorganic film 410 and the organic material forming the nano lens 420, the organic material is spontaneously agglomerated on the first inorganic film 410, and to minimize the total surface energy In order, it is formed in a hemisphere shape. Accordingly, a plurality of nano lenses 420 having a convex shape, that is, a hemisphere, are formed on the first inorganic layer 410 in an upward direction, and the plurality of nano lenses 420 are formed on the upper surface of the first inorganic layer 410. Are placed in line.

Then, the width (W) of the nano lens 420 is 100 nm to 1000 nm, and the aspect ratio (H/W)) is formed to be 1/4 to 2/3.

Thereafter, as illustrated in FIG. 6, an organic film 430 having a refractive index of 1.3 to 1.5 and having a thickness of 1 μm to 10 μm is formed on the first inorganic film 410 and the nano lens 420. The organic layer 430 may be formed by depositing a fluorinated organic material by any one of a physical vapor deposition (PVD) method and a thermal evaporation method.

Next, a second inorganic film 440 having a refractive index of 1.4 to 2.0 and having a thickness of 20 nm to 60 nm is formed on the organic film 430 as shown in FIG. 1.

At this time, the second inorganic film 440 is preferably formed as a multilayer so that the inorganic film and the organic film are alternately stacked, and more preferably, three or more layers are stacked, such as'inorganic film/organic film/inorganic film'.

As described above, in the embodiment of the present invention, by forming the first inorganic film 410 having a refractive index of 1.6 to 2.0 on the capping layer 300, the light incident on the capping layer 300 is the capping layer 300 It is reflected from the interface between the first inorganic film 410 and the upper side, that is, the first inorganic film 410 is not extracted in the direction, it can be suppressed or prevented from being lost in the lateral direction of the capping layer 300. That is, the light in the capping layer 300 is extracted in the direction of the first inorganic film 410 by the high refractive index of the first inorganic film 410. Therefore, the amount of light extracted in the upward direction of the organic light emitting device is improved. That is, the light extraction efficiency is improved.

In addition, by forming a plurality of nano lenses 420 on the first inorganic film 410, it is possible to improve light extraction efficiency. That is, by scattering the light incident on the first inorganic film 410 through the nano-lens 420, the amount of light exiting in the lateral direction is reduced, and the amount of light extracted toward the image side is increased, thereby improving light extraction efficiency. .

In addition, as the encapsulation film 400 is formed so that the inorganic film and the organic film are alternately stacked, moisture and oxygen penetration can be suppressed or prevented. Thus, the life of the organic light emitting device is improved.

100: substrate 200: optical unit
220: organic light emitting layer 400: sealing film

Claims (15)

An optical unit including a first electrode, an organic emission layer, and a second electrode sequentially formed on a substrate having light transmittance; And
An encapsulation film formed on the second electrode;
Including,
The sealing film,
A first inorganic film formed on the second electrode; And
A nano lens formed on the first inorganic film and having a refractive index equal to or greater than that of the first inorganic film;
Organic light emitting device comprising a. The method according to claim 1,
The refractive index of the nano-lens is an organic light emitting device of 1.6 to 2.2. The method according to claim 2,
The organic light emitting device having a refractive index of the first inorganic film is 1.6 to 2.0. The method according to claim 3,
The first inorganic film is an organic light emitting device formed by adjusting the content ratio (at%) of the low-refractive inorganic material and the high-refractive inorganic material to the entire first inorganic film. The method according to claim 2,
The nano-lens is convex in the opposite direction to the first inorganic film,
The nano-lens is provided in plural, an organic light-emitting device formed on the first inorganic film. The method according to claim 5,
The nano-lens is an organic light emitting device having a hemispherical shape. The method according to claim 1,
The width of the nano-lens is 100nm to 1000nm organic light emitting device. The method according to claim 2,
The encapsulation film is formed on the nano-lens, an organic light emitting device including an organic film having a refractive index of 1.3 to 1.5. The method according to claim 8,
The encapsulation film is formed on the organic film, the organic light emitting device including a second inorganic film having a refractive index of 1.4 to 2.2. The method according to any one of claims 1 to 9,
The second electrode is formed to have light transmittance, and the light generated by the organic emission layer is an upper emission type that is emitted in the direction of the second electrode,
Each of the first electrode and the second electrode is formed to have light transmittance, so that the light generated in the organic light emitting layer is a double-sided light emitting type that is emitted in the direction of the first and second electrodes. Sequentially forming a first electrode, an organic emission layer, and a second electrode on the substrate; And
Forming an encapsulation film on the second electrode;
Including,
The process of forming the encapsulation film,
Forming a first inorganic film on the second electrode; And
Forming a nano-lens on the first inorganic film equal to or larger than the refractive index of the first inorganic film;
Method of manufacturing an organic light emitting device comprising a. The method according to claim 11,
In forming the nano-lens, the refractive index is formed to be 1.6 to 2.2,
In forming the first inorganic film, the organic material formed by adjusting the content ratio (at%) of the low-refractive inorganic and high-refractive inorganic materials to the entire first inorganic film so that the refractive index of the first inorganic film is 1.6 to 2.0 Method for manufacturing a light emitting device. The method according to claim 12,
In forming the nano-lens, it is formed in a convex shape in the opposite direction to the first inorganic film,
A method of manufacturing an organic light emitting device in which a plurality of the nano lenses are provided to be arranged on the first inorganic layer. The method according to claim 11,
And adjusting the surface energy of the first inorganic layer to be lower than the surface energy of the nano-lens. The method according to claim 13,
Method of manufacturing an organic light emitting device comprising the step of forming an organic film having a refractive index of 1.3 to 1.5 on the nano-lens.

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