KR20200072664A - Grinding tip manufacturing methods and electric nail grinder applied thereof - Google Patents

Abstract

The present invention relates to a grinding tip manufacturing method and an electric nail grinder to which the same is applied, wherein the method comprises the steps of: (S1) applying photoresist (6) onto a glass substrate (5); (S2) forming a pattern of the photoresist (6); (S3) etching the glass substrate (5) to form grinding protrusions (2); (S4) removing the photoresist (6); and (S5) bonding the glass substrate (5), having the grinding protrusions (2), on the surface of a rotating body. The electric nail grinder according to the present invention prevents accumulation of user′s fatigue in smoothing curves or the like naturally generated on the surface of the nail, is capable of regularly grinding the surface of the nail, does not require to preform a step by step grinding operation, accordingly does not require the exchanging of the rotating bodies for each grinding step, prevents irregular reflection of light with which the surface of the nail is irradiated after grinding, generates good gloss such that an additional grinding process is not required, does not bond the grinding agent on the rotating body with an adhesive to prevent separation of the grinding agent during use, and accordingly elongates an exchange period of the rotating body.

Description

Method for manufacturing abrasive body and electric nail polishing apparatus using the same (Grinding tip manufacturing methods and electric nail grinder applied thereof)

The present invention relates to a method for manufacturing an abrasive body and an electric nail polishing apparatus to which the same is applied, and more specifically, after forming an embossed or engraved abrasive protrusion on the surface of a glass substrate, rotating the abrasive body formed by adhering it to a rotating body The present invention relates to a method for manufacturing an abrasive body to be polished while light is constantly reflected on the surface of a nail, and an electric nail polishing apparatus using the same.

The nails or toenails of our body are keratone substances, which are a kind of protein. They continue to grow until the end of a person's life. When the nail grows, not only the length, but also the surface layer of the nail grows together. Since it has a different growth rate for each location on the surface of the nail, textures or bends are naturally formed on the surface of the nail. Therefore, it is necessary to remove the texture or curvature of the nail surface by trimming and arranging nails for cosmetic purposes.

The conventional nail polishing apparatus is formed in a flat shape, and thus the user has to directly reciprocate to polish the bend of the nail to emit light, thereby increasing the fatigue of the user and limiting the uniform polishing of the nail surface.

In addition, in the case of the electric grinding device to which the conventional rotating body is applied, the abrasive to be polished is attached to the surface or the rotating body formed with a protrusion on the surface is polished by changing to a polishing step according to the degree of roughness. The step-by-step work from rough polishing to fine polishing is a process of reducing the surface roughness, and although the roughness of the nail surface is reduced, the surface of the nail is randomly polished, so the nail surface remains a cloudy surface due to the diffuse reflection of light. Therefore, as a final step after the step-by-step polishing operation, fiber materials such as non-woven fabrics are rotated to generate light on the surface of the nail. Such a conventional device has a problem in that it is difficult to polish by replacing the rotating body during the polishing process, and there is a limit that the degree of gloss of the nail is not significantly high even after the final polishing.

In addition, in the conventional device, the abrasive body is formed in a form of adhering the abrasive, and the abrasive is eliminated when used multiple times, and there is a problem that the replacement cycle is frequent.

Registered Patent Publication No. 10-0519704

In order to solve the above problems, the object of the present invention is that the user's fatigue is not accumulated through the electric nail polishing apparatus having protrusions formed on a glass material having excellent flatness and hardness, and the nail surface can be uniformly polished.

In addition, another object of the present invention is that there is no hassle of replacing the rotating body in each polishing step, and light irradiated to the surface of the nail after polishing does not cause diffuse reflection, thereby generating light on the surface of the nail using a fiber material such as a nonwoven fabric. There is no need to process it.

In addition, another object of the present invention is to provide a method for manufacturing an abrasive body having a very long replacement cycle and a motorized nail polishing apparatus to which the abrasive is not removed by not attaching the abrasive to the rotating body using an adhesive. .

In order to achieve the above object, a method of manufacturing an abrasive body according to an embodiment of the present invention,

Applying a photoresist 6 to the glass substrate 5 (S1);

Forming a pattern of the photoresist 6 (S2);

Etching the glass substrate 5 to form a polishing protrusion 2 (S3);

Removing the photoresist 6 (S4); And

Bonding the glass substrate 5 on which the abrasive projections 2 are formed to the surface of the rotating body (S5);

Characterized in that it comprises a.

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (S2), the photoresist 6 is characterized in that it is formed of a symmetrical structure pattern of a circular, square, hexagonal or octagonal.

In addition, in the method for manufacturing an abrasive body according to the present invention,

The (S3) step is characterized by etching the glass substrate 5 with a wet etchant solution containing hydrofluoric acid (HF).

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (S3), it is characterized in that the polishing projections 2 are formed in the pattern form of the photoresist 6.

In addition, in the method for manufacturing an abrasive body according to the present invention,

The diameter of the abrasive projections 2 is 50um to 500um, and the interval between the abrasive projections 2 is characterized in that 1 to 5 times the diameter.

In addition, in the method for manufacturing an abrasive body according to the present invention,

The polishing projection 2 is characterized in that it is formed in the embossed or intaglio on the glass substrate (5).

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (S4), it is characterized in that the photoresist 6 is removed by applying a photoresist stripper to the glass substrate 5 for 0.5 to 2 minutes.

In addition, a method of manufacturing an abrasive body according to another embodiment of the present invention,

Forming an intaglio pattern 7 by spraying an etchant on the glass substrate 5 (T1);

Forming a polishing projection (2') on the glass substrate (5) (T2); And

Bonding the glass substrate 5 to the surface of the rotating body (T3);

Characterized in that it comprises a.

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (T1), the etching solution is characterized in that the abrasive powder and a wet etchant solution are mixed.

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (T1), the intaglio pattern 7 is characterized in that it is formed in a symmetrical structure of a circle, square, hexagon or octagon.

In addition, in the method for manufacturing an abrasive body according to the present invention,

The intaglio pattern 7 has a diameter of 50 μm to 1000 μm, and an interval between the intaglio patterns 7 is 0.5 to 5 times the diameter.

In addition, in the method for manufacturing an abrasive body according to the present invention,

In the step (T2), the glass substrate 5 has a circular, square, hexagonal or octagonal symmetrical structure except for the pattern of the pattern, characterized in that the polishing projections 2'are formed.

In addition, the electric nail polishing apparatus to which the method for manufacturing abrasive bodies according to the present invention is applied,

Abrasive body 1; And

An electric motor 3 axially connected to the abrasive body 1;

Characterized in that it comprises a.

In addition, in the electric nail polishing apparatus according to the present invention,

The abrasive body (1) has a cylindrical shape, characterized in that the abrasive projections are formed on the front end surface or the peripheral surface.

In addition, in the electric nail polishing apparatus according to the present invention,

The abrasive body 1 is characterized in that it performs a rotational movement by the electric motor (3).

By using the electric nail polishing apparatus according to the present invention, there is an effect that the user's fatigue is not accumulated and the nail surface can be uniformly polished in order to flatten naturally generated bends or the like on the nail surface.

In addition, according to the present invention, there is no need to perform the polishing step by step, there is an effect that there is no need to replace the rotating body according to the polishing step.

In addition, according to the present invention, since the light irradiated on the surface of the nail after polishing does not cause diffuse reflection, and generates light well, an additional polishing process is not required.

In addition, according to the present invention, since the abrasive is not attached to the rotating body as an adhesive, there is no effect of the dropping of the abrasive in use, resulting in a long replacement cycle of the rotating body.

1 is a perspective view showing an electric nail polishing apparatus according to an embodiment of the present invention.
Figure 2-a is a perspective view showing the abrasive body is formed with abrasive projections on the front surface and the peripheral surface according to an embodiment of the present invention.
Figure 2-b is a perspective view showing an abrasive body formed with abrasive projections on the front end surface according to an embodiment of the present invention.
Figure 2-c is a perspective view showing the abrasive body is formed abrasive projections on the circumferential surface according to an embodiment of the present invention.
Figure 3-a is a plan view showing that a rectangular pattern of photoresist is arranged on a glass substrate in the method for manufacturing an abrasive according to an embodiment of the present invention.
Figure 3-b is a plan view showing that a circular pattern of photoresist is arranged on a glass substrate in the method for manufacturing an abrasive according to an embodiment of the present invention.
Figure 4 is a cross-sectional view showing that the photoresist is arranged on the glass substrate in the method for manufacturing an abrasive according to an embodiment of the present invention.
Figure 5 is a cross-sectional view after etching with an etchant using a photoresist pattern formed on a glass substrate in the method of manufacturing an abrasive according to an embodiment of the present invention.
Figure 6 is a cross-sectional view showing the formed abrasive projections and glass substrate after removing the photoresist in the method for manufacturing abrasive body according to an embodiment of the present invention.
Figure 7-a is a perspective view showing an abrasive projection formed embossed on a glass substrate in the method for manufacturing an abrasive according to an embodiment of the present invention.
Figure 7-b is a perspective view showing an intaglio pattern formed by engraving on a glass substrate in the method for manufacturing an abrasive according to an embodiment of the present invention.

Hereinafter, a method for manufacturing an abrasive body according to an embodiment of the present invention and an electric nail polishing apparatus using the same will be described in detail with reference to the accompanying drawings. First, it should be noted that in adding reference numerals to components of each drawing, the same components have the same reference numerals as possible even though they are displayed on different drawings. In addition, in describing the present invention, when it is determined that detailed descriptions of related well-known configurations or functions may obscure the subject matter of the present invention, detailed descriptions thereof will be omitted.

Figure 1 is a perspective view showing an electric nail polishing apparatus according to an embodiment of the present invention, Figure 2-a is a perspective view showing an abrasive body formed with abrasive projections on the front and circumferential surfaces according to an embodiment of the present invention Figure, Figure 2-b is a perspective view showing an abrasive body having a polishing projection formed on the front end surface according to an embodiment of the present invention, Figure 2-c is a polishing projection is formed on the circumferential surface according to an embodiment of the present invention A perspective view showing the abrasive body, Figure 3-a is a plan view showing a rectangular pattern of photoresist arranged on a glass substrate in a method of manufacturing an abrasive body according to an embodiment of the present invention, Figure 3-b is the present invention In a plan view showing a circular pattern photoresist arranged on a glass substrate in a method for manufacturing an abrasive body according to an embodiment, FIG. 4 shows a photoresist on a glass substrate in a method for manufacturing an abrasive body according to an embodiment of the present invention. Figure 5 is a cross-sectional view showing the arrangement, Figure 5 is a cross-sectional view showing the etching after etching with an etchant using a photoresist pattern formed on a glass substrate in an abrasive manufacturing method according to an embodiment of the present invention, Figure 6 is the present invention A cross-sectional view showing a polishing substrate and a glass substrate formed after removing a photoresist in the abrasive manufacturing method according to an embodiment of the present invention, FIG. 7-a is embossed on a glass substrate in the abrasive manufacturing method according to an embodiment of the present invention. 7-b is a perspective view showing an intaglio pattern formed as an intaglio on a glass substrate in the method for manufacturing an abrasive body according to an embodiment of the present invention.

Method for manufacturing an abrasive according to an embodiment of the present invention, the step of applying a photoresist (6) to the glass substrate (5) (S1), forming a pattern of the photoresist (6) (S2), Etching the glass substrate (5) to form a polishing protrusion (2) (S3), removing the photoresist (6) (S4) and the polishing substrate (2) formed a glass substrate (5) of the rotating body It comprises a step (S5) for adhering to the surface.

First, in step (S1), the photoresist 6 is applied to the glass substrate 5.

Here, since the glass substrate 5 must be able to be adhered to a cylindrical rotating body later, a thin thickness is suitable, and among them, it is preferable to use a glass substrate 5 having a thickness of 0.005 to 0.3 mm.

The photoresist 6 is a resin that causes chemical changes when irradiated with light, and utilizes a property that causes a change in dissolution and solidification in response to light from an ultraviolet region to a visible region wavelength. Typically, the photoresist 6 is generally classified into two types: a photosensitive resin in which the polymer remains insoluble only in the portion where light is exposed, and a photosensitive resin in which the resist remains, so that the polymer is solubilized only in the portion where the light is exposed, and the photosensitive property in which the resist disappears The resin is referred to as a positive photoresist.

Here, examples of the negative photoresist include aromatic bisazide, ester of methacrylic acid, ester of cinnamon, and the like, and examples of the positive photoresist include polymethyl methacrylate, naphthoxynondiazide, and polybten-1-sulfone.

If the photoresist 6 is applied to the glass substrate 5 through the step (S1), in order to form a pattern on the photoresist 6 in the step (S2), a mask having a desired pattern is formed on the photoresist. Position, and performs an exposure process for irradiating light.

Here, it is preferable to use ultraviolet light (UV) having high energy, and it is preferable to irradiate for about 7-8 seconds. The photoresist 6 exposed to ultraviolet rays forms a pattern on the photoresist 6 through a developing process of removing a portion in which ultraviolet rays are cleaved through a developer or removing a portion that is not covered by a mask and receiving ultraviolet rays.

At this time, the photoresist 6, which is covered by the mask and removes the portion not receiving ultraviolet rays, is referred to as a negative photoresist, and the photoresist 6, in which the ultraviolet rays are removed, is forged photoresist. Use selectively.

The pattern of the photoresist 6 is preferably formed of a symmetrical structure pattern of a circular, square, hexagonal or octagonal shape, but is not limited thereto, and it is of course possible to use any pattern having a symmetrical structure.

In step (S3), the glass substrate 5 is etched to form the polishing protrusion 2, and the photoresist 6 is provided to etch the glass substrate 5 in a pattern shape of the photoresist 6 The wet etchant solution is sprayed onto the top surface of the glass substrate (5).

By the sprayed wet etchant solution, the glass substrate 5 of the part not covered with the photoresist 6 is etched, and the glass substrate 5 is polished with the same pattern form as the pattern formed in the photoresist 6 The projection 2 is formed.

Here, it is of course possible to determine the height of the polishing projection 2 by controlling the time to spray the wet etchant solution.

Further, the wet etchant solution for etching the glass substrate 5 includes, but is not limited to, hydrofluoric acid (HF).

The polishing protrusion 2 formed through etching is formed in an embossed or intaglio shape, and the object to be polished is polished by using the edge portion of the polishing protrusion 2.

Here, the diameter of the grinding projections 2 is 50um to 500um, and the interval between the grinding projections 2 is preferably 1 to 5 times the diameter.

For example, the polishing protrusions 2 formed in a pattern structure in which the top and bottom and left and right are symmetrical are disposed parallel to each other at the corners of the edges of the polishing protrusions 2, so that the curves of the nail surface are polished with condensation in a certain direction. Since the abrasive projections 2 formed through the pattern having an angle are not arranged in parallel between the edges of the abrasive projections 2, there is a limit in that the curvature of the nail surface is polished in a certain direction, so that it is polished to a uniform nail surface. It is impossible.

Step (S4) is to remove the photoresist 6, and after removing the photoresist 6 on the glass substrate 5 to remove the photoresist 6 present on the glass substrate 5 after etching approximately 0.5 to The photoresist 6 is removed by applying for about 2 minutes.

Here, in the method of applying the photoresist stripper to the glass substrate 5, the portion to be etched of the glass substrate 5 is immersed in the photoresist stripper or the photoresist stripper is sprayed onto the glass substrate 5. Can. Of course, it can be applied using various other methods.

Step (S5) is to attach the glass substrate 5 on which the abrasive projection 2 is formed to the surface of the rotating body, and through the steps (S1) to (S4), the glass substrate 5 on which the abrasive projection 2 is formed is attached. It is cut according to the shape and size of the surface of the rotating body, and the cut glass substrate 5 is adhered to the rotating body.

Here, the adhesive contains an adhesive solvent that prevents the glass substrate 5 from falling off the rotating body.

In addition, the rotating body is most preferably a cylinder, but is not limited to this, and can be manufactured in various shapes such as a polygonal column or a spherical shape.

Method of manufacturing an abrasive according to another embodiment of the present invention,

The step (T1) of forming an intaglio pattern (7) by spraying an etchant on the glass substrate (5), the step (T2) of forming the polishing projections (2') on the glass substrate (5) and the glass substrate (5) It may be configured to include; step (T3) for adhering to the entire surface. This is a method that does not use the photoresist 6.

Step (T1) is to form an intaglio pattern 7 by spraying an etchant on the glass substrate 5, and mixing the abrasive powder and a wet etchant solution to prepare an etchant, and then etching the etchant on the glass substrate 5 ) To form a pattern with a certain shape on the glass substrate (5) at an intaglio.

The engraved pattern 7 is preferably formed of a symmetrical structure pattern of a circular, square, hexagonal or octagonal shape, but is not limited thereto, and it is of course possible to use any pattern having a symmetrical structure.

Here, in order to spray the etchant in a pattern to be formed on the glass substrate 5, a mask having a pattern formed on the upper surface of the glass substrate 5 is provided, so that the masked portion is not etched, and the pattern portion of the mask It is possible to use a method of etching only, but it is not limited thereto, and various methods can be used to form the pattern.

Here, the intaglio pattern (7) formed in the intaglio on the glass substrate (5), it is possible to control the depth of the intaglio pattern (7) by controlling the time to spray the etchant.

The diameter of the intaglio pattern 7 is 50um to 1000um, and the interval between the intaglio patterns 7 is formed to be 0.5 to 5 times the diameter.

At this time, it is preferable to use a material capable of polishing a glass substrate, such as aluminum oxide powder.

In addition, the wet etchant solution may include hydrofluoric acid (HF) to etch the glass substrate.

Step (T2) is to form the polishing protrusions 2'on the glass substrate 5, except for the circular, square, hexagonal or octagonal symmetrical structure patterns formed on the glass substrates 5, the polishing protrusions 2' ).

The abrasive projections 2'formed by the intaglio pattern 7 having a structure in which the top and bottom and left and right are symmetrical are arranged parallel to each other at the corners of the abrasive projections 2', so that the surface of the nails is condensed in a certain direction. Although it is polished, the polishing protrusions 2'formed through the pattern having an odd number of angles are not arranged in parallel between the edges of the edges of the polishing protrusions 2', so there is a limit in that the curvature of the nail surface is polished in a certain direction. It is impossible to polish to a uniform nail surface.

In the step (T3), through the steps of (T1) and (T2), the glass substrate 5 on which the abrasive projections 2'are formed is cut to suit the shape and size of the surface of the rotating body, and the cut glass substrate 5 Is adhered to the rotating body.

Here, the adhesive contains an adhesive solvent that prevents the glass substrate 5 from falling off the rotating body.

In addition, the rotating body is most preferably a cylinder, but is not limited to this, and can be manufactured in various shapes such as a polygonal column or a spherical shape.

The abrasive body 1 manufactured through the above steps (S1) to (S5) or (T1) to (T3) is a polishing tool and can be used in various fields.

An electric nail polishing apparatus can be constructed by using the abrasive body 1 and the electric motor 3 axially connected to the abrasive body 1 manufactured by the above method. The abrasive body and the electric motor are connected to each other through a rod 4, and the rod 4 transmits rotation by the electric motor 3 to the abrasive body 1.

The electric nail polishing apparatus configured as described above can adjust the rotational speed of the electric motor 3 to easily polish the bend of the nail surface, and for this purpose, a rotational speed control controller may be separately provided in the electric motor 3. .

In addition, the abrasive body 1 used in the electric nail polishing apparatus may be formed in a cylindrical shape, and the polishing projections may be selected from shear or circumferential surfaces or shear and circumferential surfaces depending on the application, as shown in FIG. It can be formed by selection.

1: Polishing body 2: Polishing projection
2′: Polishing projection 3: Electric motor
4: Rod 5: Glass substrate
6: Photoresist 7: Engraved pattern

Claims (15)

In the method of manufacturing the abrasive body of the electric nail polishing apparatus,
Applying a photoresist 6 to the glass substrate 5 (S1);
Forming a pattern of the photoresist 6 (S2);
Etching the glass substrate 5 to form a polishing protrusion 2 (S3);
Removing the photoresist 6 (S4); And
Bonding the glass substrate 5 on which the abrasive projections 2 are formed to the surface of the rotating body (S5);
A method of manufacturing an abrasive body comprising a.
According to claim 1,
In the step (S2), the photoresist 6 is a circular, square, hexagonal or octagonal symmetrical structure pattern, characterized in that formed in a pattern.
According to claim 1,
The (S3) step is a method of manufacturing an abrasive body, characterized in that the glass substrate 5 is etched with a wet etchant solution containing hydrofluoric acid (HF).
According to claim 1,
In the step (S3), a method of manufacturing an abrasive body, characterized in that the abrasive projections 2 are formed in the pattern form of the photoresist 6.
The method of claim 4,
The diameter of the abrasive projections (2) is 50um to 500um, the interval between the abrasive projections (2) is a method of manufacturing abrasive bodies, characterized in that 1 to 5 times the diameter.
According to claim 1,
The abrasive projection (2) is a method of manufacturing an abrasive body, characterized in that formed on the glass substrate (5) by embossing or intaglio.
According to claim 1,
In the step (S4), a method of manufacturing an abrasive body characterized in that the photoresist 6 is removed by applying a photoresist stripper to the glass substrate 5 for 0.5 to 2 minutes.
In the method of manufacturing the abrasive body of the electric nail polishing apparatus,
Forming an intaglio pattern 7 by spraying an etchant on the glass substrate 5 (T1);
Forming a polishing projection (2') on the glass substrate (5) (T2); And
Bonding the glass substrate 5 to the surface of the rotating body (T3);
A method of manufacturing an abrasive body comprising a.
The method of claim 8,
In the step (T1), the etching solution is a method of manufacturing an abrasive body, characterized in that abrasive powder and a wet etchant solution are mixed.
The method of claim 8,
In the step (T1), the intaglio pattern 7 is a circular, square, hexagonal or octagonal symmetrical structure, characterized in that formed in a symmetrical structure.
The method of claim 10,
The diameter of the intaglio pattern (7) is 50um to 1000um, the interval between the intaglio pattern (7) is 0.5 ~ 5 times the diameter of the abrasive manufacturing method characterized in that.
The method of claim 8,
In the step (T2), a method of manufacturing an abrasive body, characterized in that abrasive projections 2'are formed on the glass substrate 5 except for a pattern having a symmetrical structure of a circular, square, hexagonal or octagonal shape.
The abrasive body 1 produced by the method of any one of claims 1 to 12; And
An electric motor 3 axially connected to the abrasive body 1;
Electric nail polish device, characterized in that comprises a.
The method of claim 13,
The abrasive body (1) has a cylindrical shape, an electric nail polishing apparatus characterized in that the grinding projections are formed on the front surface or the circumferential surface.
The method of claim 13,
The abrasive body (1) is an electric nail polishing apparatus, characterized in that to perform a rotational movement by the electric motor (3).

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