KR20180023666A - Method for preparing nail trimming instrument and nail trimming instrument prepared thereby - Google Patents

Abstract

The present invention provides a manufacturing method of a nail trimming device, which comprises the steps of: (a) forming a chrome coating layer on one side of a glass substrate; (b) coating a UV-curable ink on an upper surface of the chrome coating layer of the glass substrate to form an etching resist pattern layer, which has a pattern having a different size for each predetermined region, using a UV printing method; (c) irradiating the etching resist pattern layer with UV rays to form a cured etching resist pattern layer; (d) applying an etching solution onto the glass substrate on which the cured etching resist pattern layer has been formed, to etch the glass substrate and to produce a glass substrate which has a different concavo-convex pattern for each predetermined region; and (e) washing the glass substrate to remove the etching resist pattern layer. According to the manufacturing method of a nail trimming device of the present invention, by forming a fine concavo-convex pattern on the surface of the glass substrate through a simple process of coating and curing a UV-curable ink on the surface of a plate-shaped glass substrate and etching a surface not coated with the UV-curable ink, it is possible to manufacture a nail trimming device capable of evenly trimming an uneven surface on a fingernail by means of sharp edges of the concavo-convex shapes to easily achieve shine.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a nail trim tool and a nail trim tool manufactured thereby,

The present invention relates to a method for manufacturing a nail polish tool and a nail polish tool manufactured thereby.

A nail trimmer is a kind of beauty tool that polishes and polishes the surface of nails as well as cleans nails and polishes the surface of the nails. It is used to grind the end of nails repeatedly, A nail file having a structure in which a joint is formed, and a nail buffer having a structure including a polishing part and a gloss part on both sides of the flat plate-like body so as to rub repeatedly rubbing the surface of the nail, .

Conventionally, in order to manufacture such a nail polish tool, a polishing layer is formed by attaching stone powder or the like to the surface of the support layer, or a polishing layer having roughness is formed by applying an ultraviolet adhesive or the like to manufacture a nail polish tool .

For example, the prior art reference 1 relates to a nail polish and its manufacturing method, wherein an adhesive is applied to a plate (support layer) to adhere a cushioning material and a fabric, and stones, water, Discloses a technique for producing a nail polish by applying a mixture.

However, in the nail polish manufactured by the method disclosed in Document 1, it is difficult to form a uniform polishing layer by coating a stone powder on the surface of the support layer to produce a nail polish, There is a problem.

As another example, the prior art document 2 (10-0723456) relates to a method of manufacturing a nail beauty instrument and a product thereof, comprising: a step of coating chromium on a plate-shaped glass surface; Applying a UV adhesive (PR liquid) to a chromium-coated glass surface; Laminating a printed film so that a predetermined pattern is arranged on a glass surface coated with a UV adhesive (PR liquid); A step of irradiating a film laminated on the glass surface with ultraviolet rays to adhere only the remaining film portions to the glass except for the pattern; A corrosion step of washing the glass adhered to the film with a chemical to form a corrosion groove and a flat part so that only the glass part not adhered to the film is corroded; When the film is removed from the glass surface through the corrosion process, the glass is formed with the cutting edge between the corrosion groove and the flat surface by the chemical heat treatment strengthening process; And a method of manufacturing a nail beauty instrument by cutting a predetermined shape through a process of strengthening the strength.

However, the method disclosed in Document 2 has a problem that the manufacturing process is complicated and the manufacturing cost is increased because the UV adhesive is treated by the masking process and the polishing portion is formed through the process such as the substrate strengthening. Since the polishing section has the same pattern, scratches can be applied to the nails during polishing of the nails, and the nails are not smoothly polished during polishing.

Accordingly, there is a need for a method for manufacturing a nail polish tool that can easily handle and brighten nails so as to solve the above problems.

Korean Patent No. 10-0723456 (published on May 31, 2007) Korean Patent Publication No. 10-2004-0054928 (published on June 26, 2004) Korean Patent Laid-Open No. 10-2016-0027892 (Publication date: 2016.03.10) Korean Patent Laid-Open No. 10-2005-0114849 (published on December 24, 2005)

Disclosure of Invention Technical Problem [8] The present invention has been made to solve the above problems of the prior art, and it is an object of the present invention to provide a method of forming a pattern by coating an ultraviolet curable ink on an upper surface of a glass substrate using a UV printing method, etching the surface of the nail to form a polishing part of the concave-convex structure. The nail tip and the flat surface can be cut to give a shine at the same time as the polishing. .

According to an aspect of the present invention, there is provided a method of manufacturing a glass substrate, comprising the steps of: (a) forming a chromium coating layer on one surface of a glass substrate; (b) coating an upper surface of the chromium coating layer of the glass substrate with an ultraviolet curing ink by using an ultraviolet printing method, and forming an etching resist pattern layer having a pattern of different sizes for each of the predetermined sections; (c) irradiating the etching resist pattern layer with ultraviolet light to form a cured etching resist pattern layer; (d) applying an etching solution to the glass substrate on which the cured etching resist pattern layer is formed, and etching the glass substrate to produce a glass substrate having different concave-convex patterns for each of the predetermined sections; And (e) cleaning the glass substrate to remove the etching resist pattern layer.

The ultraviolet curing ink is characterized by containing an ultraviolet curing type polymer, an unsaturated compound and a photoinitiator.

The glass substrate of step (d) may have a first section formed with a rough concavo-convex pattern having an average diameter of 100 to 300 占 퐉, a rough concavo-convex pattern having an average diameter of 100 to 300 占 퐉, And a second section having a pattern formed thereon.

The step (d) further includes forming at least one member selected from the group consisting of letters, patterns, and patterns on the other surface of the glass substrate by using a silk printing method.

The present invention also provides a method of manufacturing a semiconductor device, comprising: a first compartment made by the above-described method and having a rough concavo-convex pattern with an average diameter of 100 to 300 mu m; And a second section formed with a rough uneven pattern having an average diameter of 100 to 300 mu m and a fine uneven pattern having an average diameter of 50 to 100 mu m.

According to the method of manufacturing a nail polish tool of the present invention, a simple process of coating a surface of a glass substrate having a plate shape by coating an ultraviolet curable ink and curing the surface of the glass substrate and etching the surface not coated with the ultraviolet curable ink, It is possible to manufacture a nail polish tool which can form a fine concave-convex pattern on the surface of the substrate and uniformly trim irregular surfaces of the nail by the sharp edges of the irregularities and easily realize the polishing.

In addition, the nail polish tool produced by the above-described method has a structure in which fine concavo-convex patterns are formed on the glass substrate between the coarse uneven pattern and the coarse uneven pattern and the coarse uneven pattern, The edge of the fine concave-convex pattern can serve as a soft fine cutting edge. Thus, it is possible to effectively perform the polishing of the nail at the same time as the polishing while preventing damage when the end of the nail and the flat surface are trimmed. Satisfaction can be maximized.

1 is a process diagram showing a method of manufacturing a nail polish tool according to the present invention.
2 is a conceptual view showing a pattern of an etching resist pattern layer formed in the method of manufacturing a nail polish tool according to the present invention.
FIG. 3 is a perspective view of a glass substrate on which protrusions and protrusions protruding outward according to an embodiment of the present invention are formed for each of the compartments.
FIG. 4 is a perspective view showing a glass substrate on which predetermined irregular patterns of interpolated shapes are formed for each of the sections according to an embodiment of the present invention.
5 is a microscope image of a first section (a) and a second section (b) of a glass substrate manufactured according to an embodiment of the present invention and photographing a concave-convex pattern formed thereon.
6 is an actual image of a nail polish manufactured according to an embodiment of the present invention.
7 is a real image of a silver halide including a nail polish manufactured in accordance with an embodiment of the present invention.

The present invention relates to a method of forming a uniform and fine concave-convex pattern of a different size on a surface of a plate-shaped glass substrate so that the irregular surface of the nail can be uniformly trimmed by the sharp edges of the irregularities, To a method of manufacturing a nail polish tool.

Hereinafter, the present invention will be described in detail.

(A) forming a chromium coating layer on one side of a glass substrate; (b) coating an upper surface of the chromium coating layer of the glass substrate with an ultraviolet curing ink by using an ultraviolet printing method, and forming an etching resist pattern layer having a pattern of different sizes for each of the predetermined sections; (c) irradiating the etching resist pattern layer with ultraviolet light to form a cured etching resist pattern layer; (d) applying an etching solution to the glass substrate on which the cured etching resist pattern layer is formed, and etching the glass substrate to produce a glass substrate having different concave-convex patterns for each of the predetermined sections; And (e) cleaning the glass substrate to remove the etching resist pattern layer (FIG. 1).

The step (a) is a step of forming a chromium coating layer on one side of the glass substrate. In this step, the chromium coating layer is formed to improve the adhesion of the glass substrate so that the etching resist pattern layer to be coated in the step Can be configured.

In this step, in order to form a chromium coating layer, the glass substrate may be washed to remove impurities remaining on the glass substrate, and then the chromium coating layer may be formed. The chromium coating layer may be formed by a conventional method such as ion sputtering or screen printing A hard chromium plating solution can be formed by coating one surface of the glass substrate.

In the step (b), an ultraviolet curing ink is coated on the upper surface of the chromium coating layer using an ultraviolet printing method to form an etching resist pattern layer having a different size pattern for each compartment.

In this step, an etching resist pattern layer having a pattern of different sizes is formed in each of the predetermined sections as described above, so that a portion of the glass substrate where the etching resist pattern layer is not formed is etched in a later- The formed glass substrate can be produced. For this, in this step, the glass substrate is divided into a plurality of compartments, and the ultraviolet curable ink may be coated on each of the predetermined compartments in different patterns. At this time, the etching resist pattern layer may be formed to have various shapes such as a circle, a square, and a pentagon.

For example, in this step, as shown in Fig. 2, the glass substrate may be divided into a first section and a second section, and an etching resist pattern layer having various patterns may be formed for each section (Fig. 2 (a) (D)). Preferably, an etch resist pattern layer having an average diameter of 100 to 300 mu m is formed in the first section, and an etch resist pattern layer having an average diameter of 100 to 300 mu m and an etchant having an average diameter of 50 to 100 mu m A resist pattern layer can be formed. Thus, by etching the glass substrate in a step to be described later, a rough polishing surface having a large uneven pattern is formed in the first section, and a soft polishing surface having a large uneven pattern and a fine uneven pattern is formed in the second section, The nail polished by the rough polished surface can be finely polished by the soft polished surface to prevent damage to the nail due to excessive cutting performance and to manufacture a nail polish tool capable of forming an easy polish.

The ultraviolet curable ink is prepared by mixing a composition containing an ultraviolet curable polymer, an unsaturated compound and a photoinitiator, which is cured by a photoinitiator upon irradiation with ultraviolet light, into a solvent. The ultraviolet curable ink is applied onto the upper surface To form an etching resist pattern layer. In particular, the etching resist pattern layer can be formed using an ultraviolet printing apparatus having a resolution of 1080 dpi or more.

The ultraviolet curable polymer may be cured by ultraviolet rays, and then a polymer which can be easily removed after etching the glass substrate in a step to be described later may be used. The ultraviolet curable polymer may be an ethoxy or propoxy multifunctional (meth) acrylic resin , Ethoxy or propoxy urethane (meth) acrylic resins, and the like.

The unsaturated compound may be a polyhydric alcohol such as ethylene glycol and an acrylic unsaturated compound or a urethane acrylic unsaturated compound, and examples thereof include ethylene glycol di (meth) acrylate and tri (meth) acrylate.

Examples of the photoinitiator include aromatic carbonyl compounds such as benzophenone, benzoin methyl ether, benzoin isopropyl ether, and anthraquinone.

Examples of the solvent include alcohols such as methanol and ethanol, and organic solvents such as methyl isobutyl ketone, cyclohexanone, methylcellosolve, and tetrahydrofuran.

The ultraviolet curable ink comprises 100 parts by weight of the ultraviolet curing type polymer, 10 to 100 parts by weight of the unsaturated compound and 1 to 10 parts by weight of the photoinitiator based on the ultraviolet curable polymer so as to have sufficient adhesiveness to the surface of the glass substrate And 100 to 200 parts by weight of the solvent.

The ultraviolet curable ink may be coated on the upper surface of the glass substrate to form an etching resist pattern layer, and after curing, may contain a hydrophobic material to prevent permeation of an etchant supplied in a later step, And may further contain an anti-drying agent so as to maintain a constant viscosity.

In the step (c), a cured etching resist pattern layer may be formed by irradiating the etching resist pattern layer with ultraviolet light. The etching resist pattern layer may be formed by positioning a glass substrate under an ultraviolet lamp capable of irradiating ultraviolet light, .

In the step (d), an etching solution is applied to the glass substrate on which the cured etching resist pattern layer is formed, and a portion of the glass substrate exposed to the outside is etched without forming an etching resist pattern layer, Thereby forming a glass substrate formed of the concave-convex structure.

In this step, the glass substrate on which the cured etching resist pattern layer is formed may be immersed in a strong acid solution or may be spray-coated to etch the surface of the glass substrate where the pattern layer is not formed. When the glass substrate is etched as described above, a concavo-convex pattern of a negative angle or a relief pattern may be formed to form a concave-convex pattern protruding outward or an interpolated pattern. Preferably, the concavo- Can be formed.

In this step, a strong acid solution mixed with hydrogen peroxide, fluoride salt, sulfuric acid, organic acid, or the like can be used for the etching, and the strong acid solution is coated on the glass substrate, The surface of the glass substrate can be etched. Preferably, the strong acid solution may be a hydrofluoric acid solution. The etching of the surface of the glass substrate using the hydrofluoric acid solution may be performed by firstly etching the surface of the glass substrate using a fluoric acid solution having a purity of about 50% It is possible to form a pattern layer on the surface of the glass substrate by performing a secondary etching treatment for finely correcting the surface of the glass substrate by using a solution.

According to one embodiment of the present invention, the glass substrate has a first section formed with a large concavo-convex pattern protruding from the upper surface, a second section formed with a concavo-convex pattern between the large concavo-convex pattern and the large concavo-convex pattern, It is possible to form a glass substrate having a pattern and to simultaneously form a fine irregular pattern between a large irregular pattern and a large irregular pattern on the surface of the glass substrate as described above, The second section is provided with a rough fine cutting edge of a large concave-convex pattern and a soft fine cutting edge of a fine concave-convex pattern, so that when the end of the nail and the flat surface are trimmed, Gloss can be realized.

In this step, a design such as a letter, a pattern, or a pattern may be formed on the other surface of the glass substrate, and a letter, a pattern or a pattern may be formed on the other surface of the glass substrate by using a silk printing method.

In the step (e), the step of removing the etching resist pattern layer by washing the glass substrate may remove the etching resist pattern layer, thereby manufacturing a nail polish tool having various concavo-convex structures on its surface .

In this step, in order to remove the cured etching resist pattern layer, the glass substrate is immersed or spray coated in an alkali solution such as sodium hydroxide or treetylamine, and the cured etching resist pattern layer is peeled off to form a nail trim tool can do.

According to the method of manufacturing a nail polish tool of the present invention as described above, a simple process of coating a surface of a plate-shaped glass substrate with an ultraviolet curable ink to cure and etching a surface to which no ultraviolet curable ink is applied, The irregular surface of the nail can be uniformly trimmed by the sharp edges of the irregularities and a nail polish tool which can easily realize the luster can be manufactured.

In particular, the nail polish tool may include a first compartment formed with a pattern of coarse concave-convex structures having an average diameter of 100 to 300 mu m in size; And a second section having a rough concavo-convex structure having an average diameter of 100 to 300 mu m and a fine concavo-convex structure having an average diameter of 50 to 100 mu m formed thereon, as a polishing part.

Accordingly, the nail polish tool includes a glass substrate having a first section formed with a large concavo-convex pattern and a second section formed with a large concavo-convex pattern and a concave-convex pattern continuously formed, And the second compartment serves as a soft micro-cutting edge, so that it is possible to maximize the satisfaction of the user because the nail polish can be effectively implemented at the same time while the damage is prevented while the tip and the flat surface of the nail are protected have.

3, the surface of the glass substrate 100 is etched to form a large uneven pattern 110 protruding outward from the first section A of the glass substrate, and the second section B A large uneven pattern 110 'and a fine uneven pattern 120 protruding outward can be formed.

As another example, as shown in Fig. 4, the surface of the glass substrate 100 is etched to form a large concave-convex pattern 130 of an interpolated shape in the first section A 'of the glass substrate, A large concavo-convex pattern 130 'and a fine concavo-convex pattern 140 of an interpolated form can be formed on the surface B'.

More specifically, an ultraviolet curable ink prepared by mixing 100 parts by weight of ethoxy bisphenol-A-dimethacrylate, 50 parts by weight of Ebecryl 3701, and 5 parts by weight of benzophenone with 150 parts by weight of ethanol was screen- A concavo-convex structure having an average diameter of 100 to 300 mu m is formed in the first section of the glass substrate, and a concavo-convex structure having an average diameter of 100 to 300 mu m and an uneven concave structure having an average diameter of 50 to 100 mu m An etching resist pattern layer can be formed so as to form a glass substrate having a round uneven pattern of a two-stage structure.

In addition, a cured etching resist pattern layer can be formed by irradiating a glass substrate on which an etching resist pattern layer is formed as described above with ultraviolet light of 1 J for 10 minutes.

The glass substrate on which the cured etching resist pattern layer was formed was spray-coated with a 50% purity solution of HFO 3 as described above. The surface of the glass substrate was etched for 10 minutes. The etched glass substrate was immersed in the sodium hydroxide solution (1M) The cured etching resist pattern layer was removed by a brushing method and washed with deionized water to form a concavo-convex structure having an average diameter of 184 mu m in the first compartment and a concave-convex structure having an average diameter of 167 mu m and an average diameter of 80 mu m A nail polish tool having a second compartment having a fine concavo-convex structure of a size can be manufactured.

According to an embodiment of the present invention, a pattern of uniform and minute concave-convex structures of different sizes is formed on the surface of a glass substrate to form a coarse polished surface as shown in Fig. 5 (a) and a rough polished surface as shown in Fig. 5 It is possible to manufacture a glass substrate, that is, a nail polish tool (see FIG. 5), in which a smooth polishing surface such as a bar is formed and the irregular surface of the nail can be uniformly trimmed by the sharp edges of the irregularities.

Also, according to one embodiment of the present invention, the nail polish manufactured by the above-described method may be in the shape of a glass substrate as shown in FIG. Further, as shown in Fig. 7, a glass substrate can be fixedly formed on a mold formed in a silver halide shape and can be manufactured into a commercially available form.

Claims (5)

(a) forming a chromium coating layer on one surface of a glass substrate;
(b) coating an upper surface of the chromium coating layer of the glass substrate with an ultraviolet curing ink by using an ultraviolet printing method, and forming an etching resist pattern layer having a pattern of different sizes for each of the predetermined sections;
(c) irradiating the etching resist pattern layer with ultraviolet light to form a cured etching resist pattern layer;
(d) applying an etching solution to the glass substrate on which the cured etching resist pattern layer is formed, and etching the glass substrate to produce a glass substrate having different concave-convex patterns for each of the predetermined sections; And
(e) cleaning the glass substrate to remove the etch resist pattern layer. The method according to claim 1,
Wherein the ultraviolet curing ink comprises an ultraviolet curing type polymer, an unsaturated compound, and a photoinitiator. The method according to claim 1,
The glass substrate of the step (d) has a rough first concavo-convex pattern having a rough concavo-convex pattern with an average diameter of 100 to 300 mu m, a rough concavo-convex pattern having an average diameter of 100 to 300 mu m and a fine concavo-convex pattern having an average diameter of 50 to 100 mu m And a second compartment formed in the second compartment. The method according to claim 1,
(D) further comprises the step of forming at least one selected from the group consisting of letters, patterns and designs on the other side of the glass substrate using a silk printing method. Way. A method for manufacturing a semiconductor device, comprising: a first compartment made by the method according to any one of claims 1 to 4 and having a rough concavo-convex pattern with an average diameter of 100 to 300 mu m; And
And a second section formed with a rough uneven pattern having an average diameter of 100 to 300 mu m and a fine uneven pattern having an average diameter of 50 to 100 mu m.

Images