KR20200064931A - 적외선 카메라의 교정 방법 및 적외선 카메라의 교정 시스템 - Google Patents
적외선 카메라의 교정 방법 및 적외선 카메라의 교정 시스템 Download PDFInfo
- Publication number
- KR20200064931A KR20200064931A KR1020190154236A KR20190154236A KR20200064931A KR 20200064931 A KR20200064931 A KR 20200064931A KR 1020190154236 A KR1020190154236 A KR 1020190154236A KR 20190154236 A KR20190154236 A KR 20190154236A KR 20200064931 A KR20200064931 A KR 20200064931A
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- South Korea
- Prior art keywords
- temperature
- region
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- substrate
- interpolation curve
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 120
- 239000000758 substrate Substances 0.000 claims abstract description 102
- 230000008569 process Effects 0.000 claims abstract description 101
- 238000005259 measurement Methods 0.000 claims abstract description 74
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- 238000012937 correction Methods 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 33
- 239000010703 silicon Substances 0.000 claims description 9
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- 238000006243 chemical reaction Methods 0.000 description 34
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- 238000010586 diagram Methods 0.000 description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
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- KNMAVSAGTYIFJF-UHFFFAOYSA-N 1-[2-[(2-hydroxy-3-phenoxypropyl)amino]ethylamino]-3-phenoxypropan-2-ol;dihydrochloride Chemical compound Cl.Cl.C=1C=CC=CC=1OCC(O)CNCCNCC(O)COC1=CC=CC=C1 KNMAVSAGTYIFJF-UHFFFAOYSA-N 0.000 description 2
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/064—Ambient temperature sensor; Housing temperature sensor; Constructional details thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/80—Calibration
-
- G01J2005/0048—
-
- G01J2005/068—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Radiation Pyrometers (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018222968 | 2018-11-29 | ||
| JPJP-P-2018-222968 | 2018-11-29 | ||
| JP2019196695A JP2020095020A (ja) | 2018-11-29 | 2019-10-29 | 赤外線カメラの校正方法および赤外線カメラの校正システム |
| JPJP-P-2019-196695 | 2019-10-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20200064931A true KR20200064931A (ko) | 2020-06-08 |
Family
ID=71085682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020190154236A KR20200064931A (ko) | 2018-11-29 | 2019-11-27 | 적외선 카메라의 교정 방법 및 적외선 카메라의 교정 시스템 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2020095020A (zh) |
| KR (1) | KR20200064931A (zh) |
| TW (1) | TWI835926B (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022201409A1 (ja) * | 2021-03-25 | 2022-09-29 | 株式会社日立ハイテク | プラズマ処理装置およびプラズマ処理方法 |
| CN117969769B (zh) * | 2024-03-29 | 2024-05-31 | 山东昆仲信息科技有限公司 | 基于传感技术的大气污染物含量监测方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017228230A (ja) | 2016-06-24 | 2017-12-28 | 東京エレクトロン株式会社 | 基板処理システムおよび温度制御方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6168311B1 (en) * | 1998-10-13 | 2001-01-02 | Checkpoint Technologies Llc | System and method for optically determining the temperature of a test object |
| JP2001268440A (ja) * | 2000-03-23 | 2001-09-28 | Toshiba Corp | 赤外線撮像装置 |
| JP6153749B2 (ja) * | 2013-03-22 | 2017-06-28 | 株式会社Ｓｃｒｅｅｎホールディングス | 温度測定装置、温度測定方法および熱処理装置 |
| JP2016121914A (ja) * | 2014-12-24 | 2016-07-07 | 東京エレクトロン株式会社 | 温度測定機構、熱処理装置 |
| JP6777428B2 (ja) * | 2016-06-02 | 2020-10-28 | アズビル株式会社 | 温度測定装置 |
| JP2018032721A (ja) * | 2016-08-24 | 2018-03-01 | 東京エレクトロン株式会社 | プラズマ処理装置のメンテナンス方法 |
| US11402273B2 (en) * | 2020-03-27 | 2022-08-02 | Ecb Consulting Llc | Systems and approaches for improving accuracy of temperature measurements using thermal imaging |
-
2019
- 2019-10-29 JP JP2019196695A patent/JP2020095020A/ja active Pending
- 2019-11-19 TW TW108141879A patent/TWI835926B/zh active
- 2019-11-27 KR KR1020190154236A patent/KR20200064931A/ko not_active Application Discontinuation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017228230A (ja) | 2016-06-24 | 2017-12-28 | 東京エレクトロン株式会社 | 基板処理システムおよび温度制御方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI835926B (zh) | 2024-03-21 |
| TW202108992A (zh) | 2021-03-01 |
| JP2020095020A (ja) | 2020-06-18 |
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| A201 | Request for examination | ||
| E902 | Notification of reason for refusal |