KR20200032284A - A Pattern And A Fabricating Method of the same - Google Patents

Abstract

The present invention relates to a method for manufacturing a pattern and the pattern manufactured by the same, wherein the method comprises following steps of: forming a first pattern layer on an upper part of a base member; and forming a second pattern layer on the upper part of the base member by pressing the upper end part of the first pattern layer. By a simple process, it is possible to easily manufacture a super water-repellent or super oil-repellent pattern, and since the process corresponds to a continuous process, the super water-repellent or super oil-repellent pattern can be manufactured in large quantities.

Description

Super water-repellent or super-oil-repellent pattern and its manufacturing method {A Pattern And A Fabricating Method of the same}

The present invention relates to a super water-repellent or super-oil-repellent pattern and a method for manufacturing the same, and more particularly, to a super-water-repellent or super-oil-repellent pattern and a method for manufacturing the same.

Superhydrophobic or superoleophobic coating is a field of surface modification technology that physically and chemically modifies the surface, resulting in a 150 ° wetting angle when the liquid contacts the solid surface. It is a technology that makes it ideal.

For example, the super-water repellent phenomenon can be commonly observed through the lotus leaf that exists in nature, and water droplets are formed on the lotus leaf or rolled off due to the nanoscale microscopic protrusions on the surface of the lotus leaf.

When simulating the surface characteristics (super water-repellent properties) of the lotus leaf, it can be applied in a variety of industries, such as textiles, architecture, machinery, electronics, glass, automobiles, and many studies are being conducted to achieve this.

In general, a nanostructure for realizing an existing super water-repellent or super-oil-repellent surface forms a plurality of nano-structures having a micro-class or nano-class column (or pillar) structure on a substrate, or a micro-class column on a substrate. It is manufactured in a structure that forms a primary structure having a structure and forms a plurality of nanostructures having a nano-level column structure on the primary structure.

Most of these conventional nanostructures have a column structure, and thus must be formed to have a high aspect ratio.

However, nanostructures having a high aspect ratio form initially exhibit superhydrophobic properties, but are entangled or lie sideways by capillarity generated when water (or solution) in contact with the surface evaporates. There was a problem that the water-repellent properties could not be maintained continuously.

Japanese Patent Publication No. 2014-076610

The object to be solved by the present invention is to provide a super water-repellent or super-oil-repellent pattern capable of continuously maintaining a super-water-repellent property and a method for manufacturing the same.

The objects of the present invention are not limited to the objects mentioned above, and other objects not mentioned will be clearly understood by those skilled in the art from the following description.

In order to solve the above-mentioned problems, the present invention is an iron part pattern; And a recess portion pattern having a lower step than the iron portion pattern, wherein the iron portion pattern includes: a lower column portion pattern; An upper column portion pattern positioned on an upper portion of the lower column portion pattern; And a partition portion pattern continuously positioned with the lower column portion pattern, wherein a width of the upper column portion pattern is wider than that of the lower column portion pattern.

In addition, according to the present invention, one continuous iron pattern is defined by the lower column pattern, the upper column pattern, and the partition pattern, and an area divided by the iron pattern The interior is provided with a pattern characterized in that the recessed part pattern is formed.

In addition, the present invention provides a pattern characterized in that the one continuous iron pattern is arranged in a polygonal shape.

In addition, the present invention comprises the steps of forming a first pattern layer on the base member; And forming a second pattern layer on the upper portion of the base member by pressing the upper end of the first pattern layer.

In addition, the present invention, forming a first pattern layer on the base member comprises: supplying a base member to the first main roller of the first roller unit; Forming a resin layer in the recess of the first main roller; Temporarily curing the resin layer; And transferring the pseudo-cured resin layer to the base member to form a first pattern layer.

In addition, in the present invention, the step of supplying the base member to the first main roller of the first roller part is to continuously supply the base member to the first main roller of the first roller part through the base member supply part, The step of forming the resin layer in the recessed portion of the first main roller is to form the resin layer in the recessed portion of the first main roller through the resin supply unit, and temporarily changing the resin layer. The step of converting provides a method for manufacturing a pattern that temporarily cures the resin layer through a temporary curing unit.

In addition, in the present invention, the step of forming the second pattern layer on the upper portion of the base member by pressing the upper end of the first pattern layer is performed by a support roller, while the lower surface of the base member is supported, the second Provided is a method of manufacturing a pattern in which the main roller presses the upper end of the first pattern layer to form the second pattern layer.

In addition, the present invention is a base member supply unit for supplying a base member; A first roller unit for forming a first pattern layer on the base member supplied from the base member supply unit; A second roller portion positioned adjacent to the first roller portion and forming a second pattern layer through the first pattern layer formed through the first roller portion; And a recovery part for recovering the base member including the second pattern layer formed through the second roller part, wherein the first roller part includes a first main roller, and the second roller part is a second main roller. It includes, and the second main roller is pressed to the upper end of the first pattern layer, to provide an apparatus for manufacturing a pattern in which the second pattern layer is formed.

In addition, the present invention, the first roller unit, the pressure roller is disposed facing the first main roller; A resin supply unit for forming a resin layer on the first main roller; And a temporary hardening unit for temporarily hardening the resin layer, and the second roller unit further provides a pattern manufacturing apparatus further comprising a support roller disposed facing the second main roller.

In addition, the present invention, the first main roller, iron (凸) located on the surface of the first main roller; And a concave portion having a step lower than that of the iron portion, wherein the concave portion includes a column region concave portion defining a column region; And a partition region yaw portion which is continuously positioned with the column region yaw portion to separate the iron portion into an island shape and defines a partition region, wherein the column region yaw portion is formed. And one concave concave portion is defined by the concave region and the concave region, and the iron portion is separated into an island shape inside the region divided by the concave portion. It provides a pattern manufacturing apparatus characterized in that.

In addition, the present invention provides a pattern manufacturing apparatus characterized in that the one continuous recess is arranged in a polygonal shape.

According to the present invention as described above, by the simple process, the above-described super water-repellent or super-oil-repellent pattern can be easily produced, and since such a process corresponds to a continuous process, the super-water-repellent or super-oil-repellent pattern is produced in large quantities can do.

In addition, in the present invention, the lower column portion pattern; Water (or solution) in contact with the surface is evaporated by forming a nanostructure through a second pattern layer positioned on the lower column portion pattern and including a upper column portion pattern wider than the width of the lower column portion pattern. By suppressing the capillarity generated at the time, it is possible to provide a super-water-repellent or super-oil-repellent pattern capable of continuously maintaining the superhydrophobic properties.

In addition, in the present invention, the superhydrophobic property is also suppressed by capillarity generated when water (or solution) in contact with the surface evaporates even through the partition pattern continuously positioned with the lower column pattern. It can provide a super water-repellent or super-oil-repellent pattern that can be maintained continuously.

1A is a schematic schematic view for explaining an apparatus for manufacturing a pattern according to the present invention, and FIG. 1B is a flowchart for explaining a method for manufacturing a pattern according to the present invention.
2A is a schematic diagram showing a first roller portion according to the present invention.
2B is a schematic view showing a second roller portion according to the present invention.
3A is a schematic schematic diagram showing the shape of the surface of the first main roller according to the first example of the present invention, and FIG. 3B is a schematic diagram showing the shape of the surface of the first main roller according to the second example of the invention It is a schematic diagram of phosphorus.
4A and 4B are schematic schematic views showing the shape of the first pattern layer according to the first example of the present invention, and FIGS. 4C and 4D show the shape of the first pattern layer according to the second example of the present invention It is a schematic schematic diagram.
5A and 5B are schematic schematic views showing the shape of the second pattern layer according to the first example of the present invention, and FIGS. 5C and 5D show the shape of the second pattern layer according to the second example of the present invention It is a schematic schematic diagram.

Advantages and features of the present invention, and methods for achieving them will be clarified with reference to embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various different forms, and only the present embodiments allow the disclosure of the present invention to be complete, and the ordinary knowledge in the technical field to which the present invention pertains. It is provided to fully inform the holder of the scope of the invention, and the invention is only defined by the scope of the claims.

Hereinafter, specific contents for carrying out the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals refer to the same components regardless of the drawings, and "and / or" includes each and every combination of one or more of the mentioned items.

Although the first, second, etc. are used to describe various components, it goes without saying that these components are not limited by these terms. These terms are only used to distinguish one component from another component. Therefore, it goes without saying that the first component mentioned below may be the second component within the technical spirit of the present invention.

The terminology used herein is for describing the embodiments and is not intended to limit the present invention. In this specification, the singular form also includes the plural form unless otherwise specified in the phrase. As used herein, “comprises” and / or “comprising” does not exclude the presence or addition of one or more other components other than the components mentioned.

Unless otherwise defined, all terms (including technical and scientific terms) used in the present specification may be used as meanings commonly understood by those skilled in the art to which the present invention pertains. In addition, terms defined in the commonly used dictionary are not ideally or excessively interpreted unless specifically defined.

The spatially relative terms “below”, “beneath”, “lower”, “above”, “upper”, etc., are as shown in the figure. It can be used to easily describe a correlation between a component and other components. The spatially relative terms should be understood as terms including different directions of components in use or operation in addition to the directions shown in the drawings. For example, when a component shown in the drawing is turned over, a component described as "below" or "beneath" of another component will be placed "above" another component. You can. Thus, the exemplary term “below” can include both the directions below and above. Components can also be oriented in different directions, and thus spatially relative terms can be interpreted according to orientation.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1A is a schematic schematic view for explaining an apparatus for manufacturing a pattern according to the present invention, and FIG. 1B is a flowchart for explaining a method for manufacturing a pattern according to the present invention.

First, referring to FIG. 1A, an apparatus 1 for manufacturing a pattern according to the present invention includes a base member supply unit 11 for supplying a base member 10; A first roller unit 100 for forming a first pattern layer 160 on the base member 10 supplied from the base member supply unit 11; A second roller portion positioned adjacent to the first roller portion 100 and forming a second pattern layer 190 through the first pattern layer 160 formed through the first roller portion 100. (200); And a recovery part 40 for recovering the base member 10 including the second pattern layer 190 formed through the second roller part 200.

Hereinafter, a method of manufacturing a pattern through an apparatus for manufacturing a pattern according to the present invention will be described in more detail.

1A and 1B, a method of manufacturing a pattern according to the present invention includes forming a first pattern layer 160 on the base member 10 (S110).

The base member 110 includes latex, polyurethane, PDMS, PUA, PFPE, PE, spandex, goredex, polychloroprene, styrene-butadiene rubber (SBR), acrylonitrile-butadiene rubber (NBR), butyl rubber, ethylene It is possible to use at least one material of flopylene rubber (EPR), thiocol, or silicone rubber, but the material of the base member is not limited in the present invention.

At this time, the base member 110 may be supplied through the base member supply unit 11 as described above.

More specifically, the base member supply part 11 may be formed in the form of a film supply roll, and the above-described base member is wound on the film supply roll, and by the rotation of the film supply roll, the first described below The base member can be continuously supplied to the roller portion.

However, the method of supplying the base member 110 in the present invention is not limited.

On the other hand, the recovery unit 40 is for recovering the base member 10 including the second pattern layer 190 formed through the second roller unit 200, the recovery unit 40, It can be formed in the form of a film supply roll, the base member including the above-described second pattern layer is wound on the film supply roll, and the base member can be continuously recovered by rotation of the film supply roll. .

Since this is obvious in the art, a detailed description will be omitted below.

2A is a schematic diagram showing a first roller portion according to the present invention.

Referring to FIG. 2A, according to the present invention, the first roller unit 100 is for forming the first pattern layer 160 on the base member 10 supplied from the base member supply unit 11. .

On the other hand, in the present invention, for convenience of description, the first roller unit 100 may be defined as an imprinting roller unit, that is, the first pattern layer 160 may include the first roller unit 100. It can be defined as being formed by an imprinting process.

More specifically, the first roller part 100 includes: a first main roller 110; And press rollers 111, 112, and 113 having lower steps than the first main roller 110.

The pressure rollers 111, 112, and 113 are disposed to face the first main roller 110, and the first main roller (a) is formed on a lower surface of the base member 110 supplied from the base member supply unit 11. As a component for pressing in the direction of 110, at this time, the drawing shows that the pressing rollers 111, 112, and 113 are three, but the number of the pressing rollers is not limited in the present invention.

At this time, the pressing roller (111, 112, 113), the first pressing roller 111 is located on one side of the first main roller (110); A second pressing roller 112 disposed at a predetermined distance from the first pressing roller 111 and positioned below the other side of the first main roller 110; And a third pressing roller 113 disposed at a predetermined distance from the second pressing roller 112 and positioned at a side of the first main roller 110.

Particularly, in the case of the third pressing roller 113, the separation angle expansion roller may be divided into, and in the case of the separation angle expansion roller, the base member is installed at a higher position than the second pressing roller 112, 10) can be controlled to bend very rapidly.

On the other hand, the first main roller 110, the first main roller 110, iron (凸) located on the surface (凸) 120; And a yaw portion 130 having a step lower than that of the iron portion 120.

The surface structure of the first main roller 110 will be described later.

Subsequently, referring to FIG. 2A, the first roller unit 100 according to the present invention includes a resin supply unit 12 for forming the resin layer 20 on the first main roller 110, and more Specifically, the resin supplied through the resin supply unit 12 may form a resin layer 20 on the yaw portion 130 of the first main roller 110.

At this time, the resin layer 20 is a UV irradiation process, which is a process to be described later, and corresponds to a resin in which curing occurs. The same epoxy-based resin may be used, but the type of the resin layer is not limited in the present invention.

Subsequently, referring to FIG. 2A, the first roller unit 100 according to the present invention includes a temporary hardening unit 30 for temporarily hardening the resin layer 20 formed on the first main roller 110. do.

The temporary hardening unit 30 is formed on the resin layer 20 formed on the first main roller 110, more specifically, on the yaw portion 130 of the first main roller 110. To temporarily harden the resin layer 20, the resin layer 20 may be temporarily hardened by irradiating UV to the resin layer 20.

That is, the temporary hardening unit 30 may be installed, for example, between the first pressing roller 111 and the second pressing roller 112, and irradiate ultraviolet rays in the direction of the base member 10. By doing so, it is a component for temporarily curing the resin layer 20 filled in a pattern shape between the base member 10 and the first main roller 110.

Therefore, the resin layer 20 is temporarily hardened by the temporary hardening part 30 so that its shape is not deformed, and the resin layer 20 thus hardened is in the first main roller 110. It is not deformed even in the process of separation, and is transferred to the base member 10 while maintaining its shape, so that the first pattern layer 160 formed on the base member 10 may be configured.

That is, the resin layer 20 temporarily hardened by the temporary hardening unit 30 may be transferred to the base member 10 to form the first pattern layer 160.

At this time, the temporary curing unit 30, it is preferable to configure the LED to irradiate ultraviolet rays in a line beam (line beam) form, if the temporary curing unit 30 is composed of LED, the straightness of the irradiated light is enhanced , It has the advantage of being able to irradiate ultraviolet rays while securing uniform illuminance on all surfaces of the base member 10.

According to the contents of the present invention as described above, the steps of forming the first pattern layer 160 on the base member 10 are summarized as follows.

That is, forming the first pattern layer 160 on the base member 10 includes: supplying the base member 10 to the first main roller 110 of the first roller unit 100; Forming a resin layer 20 on the yaw portion 130 of the first main roller 110; Temporarily curing the resin layer 20; And transferring the temporary resin layer 20 to the base member 10 to form a first pattern layer 160.

At this time, the step of supplying the base member 10 to the first main roller 110 of the first roller unit 100, through the base member supply unit 11, the first main roller of the first roller unit ( The base member may be continuously supplied to 110).

In addition, the step of forming the resin layer 20 in the yaw portion 130 of the first main roller 110, through the resin supply unit 12, the yaw of the first main roller 110 (I) The resin layer 20 may be formed on the portion 130, and the step of temporarily curing the resin layer 20 may include the resin layer 20 through the temporary curing portion 30. Can be temporarily hardened.

In addition, in the step of forming the first pattern layer 160 by transferring the temporary resin layer 20 to the base member 10, the temporary resin layer 20 is the first main roller. It is not deformed in the process of being separated from 110, and can be transferred to the base member 10 while maintaining its shape.

Subsequently, referring to FIG. 1A, the first pattern layer 160 may include an iron portion pattern 140; And a recessed portion pattern 150 having a step lower than that of the iron portion pattern 140.

At this time, the iron portion pattern 140 of the first pattern layer 160 is formed at a position corresponding to the yaw portion 130 of the first main roller 110, and the agent The yaw portion pattern 150 of the 1 pattern layer 160 is formed at a position corresponding to the iron portion 120 of the first main roller 110.

That is, in the present invention, the shape of the first pattern layer 160 is determined by the surface structure of the first main roller 110.

Therefore, hereinafter, the shape of the first pattern layer 160 determined by the surface structure of the first main roller 110 and the surface structure of the first main roller 110 will be described in more detail. .

3A is a schematic schematic diagram showing the shape of the surface of the first main roller according to the first example of the present invention, and FIG. 3B is a schematic diagram showing the shape of the surface of the first main roller according to the second example of the invention It is a schematic diagram of phosphorus.

First, referring to FIG. 3A, the first main roller 110 according to the first example of the present invention includes: an iron part 120 positioned on a surface of the first main roller 110; And a yaw portion 130 having a step lower than that of the iron portion 120.

At this time, the yaw (130), the column (or pillars) defining the column (or pillar) area yaw (131); It is located continuously with the column region yaw portion 131, and separates the iron portion 120 into an island shape, and includes a division region yaw portion 132 defining a division region. do.

That is, one continuous yaw portion 130 is defined by the column region yaw portion 131 and the partition region yaw portion 132, and the iron portion The 120 is separated and located in the form of an island inside the region partitioned by the yaw portion 130.

In addition, in the present invention, that the column region recess 131 defines a column region is a column portion pattern among the iron portion patterns 140 of the first pattern layer 160 to be described later. It can be understood as a region for forming a, and, in addition, that the partition region recessed portion 132 defines a partition region, the iron portion pattern of the first pattern layer 160 to be described later. It can be understood as a region for forming a partition pattern among the 140.

More specifically, referring to FIG. 3A, the column region yaw portion 131 includes: a first column region yaw portion 131a; A second column region recess (131b) positioned adjacent to the first column region recess (131a); A third column region yaw portion 131c positioned adjacent to the second column region yaw portion 131b; And a fourth column region yaw portion 131d positioned adjacent to the third column region yaw portion 131c.

At this time, as shown in the figure, the first column region yaw portion 131a to the fourth column region yaw portion 131d may be arranged in a rectangular shape.

In addition, the partition area yaw portion 132 is a first compartment region yaw connecting the first column region yaw portion 131a and the second column region yaw portion 131b. (Iii) unit 132; A second division region yaw portion 132b connecting the second column region yaw portion 131b and the third column region yaw portion 131c; A third division region yaw portion 132c connecting the third column region yaw portion 131c and the fourth column region yaw portion 131d; And a fourth division region yaw portion 132d connecting the fourth column region yaw portion 131d and the first column region yaw portion 131a.

At this time, as shown in the drawing, the first compartment region recessed portion 132a to the fourth compartment region recessed portion 132d may be arranged in a rectangular shape.

Accordingly, one continuous yaw portion 130 is defined by the column region yaw portion 131 and the partition region yaw portion 132, and the iron portion 120 is separated and located in the form of an island inside the region partitioned by the yaw portion 130, wherein the one continuous yaw portion 130 forms a square shape Since it is arranged, as shown in the drawing, the iron part 120 may also be arranged in a rectangular shape.

On the other hand, in FIG. 3A, although the one continuous yaw portion 130 is arranged in a square shape, unlike this, the one continuous yaw portion 130 is a triangle , May be arranged in the form of a polygon such as a pentagon or hexagon.

That is, FIG. 3B relates to the first main roller 110 ′ according to the second example of the present invention. As shown in FIG. 3B, one continuous yaw portion (not shown in the drawing) is a hexagon It can be arranged in the form of, therefore, it can be seen that the iron (凸) 120 'is also arranged in a hexagonal form.

Accordingly, the present invention does not limit the shape of the one continuous yaw portion and the iron portion separated into an island shape.

4A and 4B are schematic schematic views showing the shape of the first pattern layer according to the first example of the present invention, and FIGS. 4C and 4D show the shape of the first pattern layer according to the second example of the present invention It is a schematic schematic diagram.

First, referring to FIGS. 4A and 4B, as described above, in the first pattern layer 160 according to the first example of the present invention, the first pattern layer 160 has an iron portion pattern ( 140); And a recessed portion pattern 150 having a step lower than that of the iron portion pattern 140.

At this time, the iron portion pattern 140 of the first pattern layer 160 is formed at a position corresponding to the yaw portion 130 of the first main roller 110, and the agent The yaw portion pattern 150 of the 1 pattern layer 160 is formed at a position corresponding to the iron portion 120 of the first main roller 110.

In addition, the iron part pattern 140 may include a column part pattern 141; And a partition pattern 142 positioned continuously with the column pattern 141.

The column portion pattern 141 may include a first column portion pattern 141a; A second column portion pattern 141b positioned adjacent to the first column portion pattern 141a; A third column portion pattern 141c positioned adjacent to the second column portion pattern 141b; And a fourth column portion pattern 141d positioned adjacent to the third column portion pattern 141c.

At this time, as shown in the figure, the first column portion pattern 141a to the fourth column portion pattern 141d may be arranged in a rectangular shape.

In addition, the partition pattern 142 may include: a first partition pattern 142a connecting the first column pattern 141a and the second column pattern 141b; A second compartment pattern 142b connecting the second column pattern 141b and the third column pattern 141c; A third compartment pattern 142c connecting the third column pattern 141c and the fourth column pattern 141d; And a fourth compartment pattern 142d connecting the fourth column pattern 141d and the first column pattern 141a.

At this time, as shown in the drawing, the first compartment pattern 142a to the fourth compartment pattern 142d may be arranged in a rectangular shape.

Accordingly, one continuous iron pattern 140 is defined by the column pattern 141 and the partition pattern 142, and is divided by the iron pattern 140. The recessed portion pattern 150 is formed inside the region to be formed.

However, since the recessed portion pattern 150 may correspond to an empty space, it can be simply defined as a recessed portion, and thus, in this case, the first pattern layer 160 may be formed of iron ( I) part pattern 140; And it may be defined as including a concave portion (150) having a lower step than the iron (凸) pattern 140.

That is, in the present invention, the meaning of the yaw portion pattern 150 means that a certain layer is formed in the yaw portion pattern 150 region, or the yaw portion pattern 150 It is meant to include all cases where an empty space in which a certain layer does not exist in the area is formed.

Meanwhile, as described above, the iron portion pattern 140 of the first pattern layer 160 is located at a position corresponding to the yaw portion 130 of the first main roller 110. Is formed.

Accordingly, one continuous iron pattern 140 defined by the column pattern 141 and the partition pattern 142 may include the yaw of the first main roller 110. It is formed in a form corresponding to the part 130, and the one continuous iron part pattern 140 may be arranged in a rectangular shape.

At this time, in FIGS. 4A and 4B, although the one continuous iron portion pattern 140 is arranged in a rectangular shape, unlike this, the one continuous iron portion pattern ( 140) may be arranged in the form of a polygon, such as a triangle, pentagon or hexagon.

That is, FIGS. 4C and 4D are related to the first pattern layer 160 'according to the second example of the present invention, and as shown in FIGS. 4C and 4D, the one continuous iron pattern (Not shown in the drawing) may be arranged in the form of a hexagon, and thus, the recessed pattern 150 'located inside the region partitioned by the iron pattern may also be hexagonal. It can be seen that they are arranged in a shape.

Accordingly, the present invention does not limit the shape of the one continuous iron pattern and the shape of the recess pattern located inside the region partitioned by the iron pattern. .

By the above method, the first pattern layer 160 according to the present invention can be formed.

Subsequently, referring to FIGS. 1A and 1B, a method of manufacturing a pattern according to the present invention, by pressing an upper end of the first pattern layer 160, a second pattern layer on the top of the base member 110 It includes the step of forming (190) (S120).

2B is a schematic view showing a second roller portion according to the present invention.

Referring to FIG. 2B, according to the present invention, the second roller part 200 is for forming the second pattern layer 190 by pressing the upper end of the first pattern layer 160.

More specifically, the second roller unit 200 includes a second main roller 210; And a supporting roller 220 disposed to face the second main roller 210.

The support roller 220 is disposed facing the second main roller 210, and when the first pattern layer 160 is pressed by the second main roller 210, the base member 110 It is a component that supports the lower surface.

That is, the second main roller 210 presses the upper end of the first pattern layer 160 while the lower surface of the base member 110 is supported by the support roller 220, so that the first The 2 pattern layer 190 is formed.

Meanwhile, as illustrated in FIG. 2B, the second main roller 210 according to the present invention may include a plurality of nanopatterns 210a positioned on the surface of the second main roller 210. This will be described later, but the present invention does not limit the presence or absence of the plurality of nanopatterns 210a.

At this time, as described above, since the first pattern layer 160 is in a temporarily hardened state, it is possible to press the upper end of the first pattern layer 160 to form the second pattern layer 190. Do.

Meanwhile, although not illustrated in the drawing, the second roller unit 200 may further include a main curing unit (not shown) for main curing of the second pattern layer 190.

That is, after forming the second pattern layer 190 by pressing the first pattern layer 160 in a state that has been temporarily hardened by the second main roller 210, the main curing unit (not shown) is , By curing the second pattern layer 160, the second pattern layer can be completely cured.

At this time, the main curing unit may be configured as an ultraviolet irradiation device capable of irradiating ultraviolet light having the property of supplying energy capable of completely curing the second pattern layer, provided that the present invention comprises the main curing unit It is not limiting.

Subsequently, referring to FIG. 1A, the second pattern layer 190 may include an iron portion pattern 170; And a recessed portion pattern 180 having a step lower than that of the iron portion pattern 170.

Hereinafter, the shape of the second pattern layer 190 will be described in more detail.

5A and 5B are schematic schematic views showing the shape of the second pattern layer according to the first example of the present invention, and FIGS. 5C and 5D show the shape of the second pattern layer according to the second example of the present invention It is a schematic schematic diagram.

First, referring to FIGS. 5A and 5B, the second pattern layer 190 according to the first example of the present invention includes an iron portion pattern 170; And a recessed portion pattern 180 having a step lower than that of the iron portion pattern 170.

In addition, the iron (凸) pattern 170, the lower column portion pattern 171; An upper column portion pattern 172 positioned on an upper portion of the lower column portion pattern 171; And a partition portion pattern 173 continuously positioned with the lower column portion pattern 171.

At this time, in the present invention, the width of the upper column portion pattern 172 is characterized in that wider than the width of the lower column portion pattern 171.

More specifically, in the case of the second pattern layer 190, the upper portion of the first pattern layer 160 is formed by pressing, and in particular, the upper column portion pattern 172 includes the first pattern layer 160 ) Is formed by pressing the upper end of the column portion pattern 141, in the present invention, the width of the upper column portion pattern 172 is wider than the width of the lower column portion pattern 171.

That is, in the present invention, the lower column portion pattern 171 of the second pattern layer 190 is formed to be the same as the width of the column portion pattern 141 of the first pattern layer 160, and the upper column The width of the upper column portion pattern 172 is the lower column portion pattern because the upper portion of the column pattern 141 of the first pattern layer 172 is pressed and widened. It becomes wider than the width of (171).

At this time, the width of the upper column portion pattern 172 may be determined according to the amount by which the second main roller 210 presses the upper portion of the first pattern layer 160. In the present invention, the upper column The range of the width of the sub-pattern 172 is not limited.

In addition, the thickness of the upper column portion pattern 172 may be determined according to the amount by which the second main roller 210 presses the upper portion of the first pattern layer 160. In the present invention, the upper column The thickness range of the sub-pattern 172 is not limited.

Meanwhile, as illustrated in FIG. 2B described above, the second main roller 210 according to the present invention may include a plurality of nanopatterns 210a located on the surface of the second main roller 210. have.

In this case, that is, when the surface of the second main roller 210 includes a plurality of nano-patterns 210a, as shown in FIG. 1A, the upper column portion pattern 172 is the upper column portion A plurality of nanopatterns 172a formed on the top surface of the pattern 172 may be included.

In the present invention, through the plurality of nano-patterns (172a) formed on the upper surface of the upper column portion pattern 172, it is possible to maximize the characteristics of super water repellency or super oil repellency.

However, the present invention does not limit the presence or absence of the plurality of nano patterns 172a.

Meanwhile, when the second main roller 210 presses the upper end of the first pattern layer 160, the upper end of the partition pattern 142 of the first pattern layer 160 may also be pressed, In this case, the upper end of the partition pattern 173 may be wider than the lower end of the partition pattern 173.

In addition, in the above, it has been defined that the partition pattern 173 is continuously positioned with the lower column portion pattern 171, but at the same time, the partition pattern 173 and the upper column portion pattern 172 It can be located continuously.

5A and 5B, the lower column portion pattern 171 may include a first lower column portion pattern 171a; A second lower column portion pattern 171b positioned adjacent to the first lower column portion pattern 171a; A third lower column portion pattern 171c positioned adjacent to the second lower column portion pattern 171b; And a fourth lower column portion pattern 171d positioned adjacent to the third lower column portion pattern 171c.

At this time, as shown in the figure, the first lower column portion pattern 171a to the fourth lower column portion pattern 171d may be arranged in a rectangular shape.

Also, the upper column portion pattern 172 may include a first upper column portion pattern 172a; A second upper column portion pattern 172b positioned adjacent to the first upper column portion pattern 172a; A third upper column portion 172c positioned adjacent to the second upper column portion pattern 172b; And a fourth upper column portion pattern 172d positioned adjacent to the third upper column portion pattern 172c.

At this time, as shown in the figure, the first upper column portion pattern 172a to the fourth upper column portion pattern 172d may be arranged in a rectangular shape.

In addition, the partition pattern 173 may include: a first compartment pattern 173a connecting the first lower column portion pattern 171a and the second lower column portion pattern 171b; A second compartment pattern 173b connecting the second lower column portion pattern 171b and the third lower column portion pattern 171c; A third compartment pattern 173c connecting the third lower column column pattern 171c and the fourth lower column column pattern 171d; And a fourth compartment pattern 173d connecting the fourth lower column portion pattern 171d and the first lower column portion pattern 171a.

At this time, as shown in the figure, the first compartment pattern 173a to the fourth compartment pattern 173d may be arranged in a rectangular shape.

Accordingly, one continuous iron pattern 170 is defined by the lower column pattern 171, the upper column pattern 172, and the partition pattern 173, and the iron ( Iii) The yaw portion pattern 180 is formed inside the region partitioned by the portion pattern 170.

However, since the recessed portion pattern 180 may correspond to an empty space, it can be simply defined as a recessed portion, and thus, in this case, the second pattern layer 190 may include iron ( Iii) part pattern 170; And a recess 180 having a step lower than that of the iron pattern 170.

That is, in the present invention, the meaning of the yaw portion pattern 180 means that a certain layer is formed in the yaw portion pattern 180 region, or the yaw portion pattern 180 It is meant to include all cases where an empty space in which a certain layer does not exist in the area is formed.

Meanwhile, as described above, since the iron portion pattern 170 of the second pattern layer 190 is formed by pressing the upper portion of the first pattern layer 160, the lower column portion pattern ( 171), one continuous iron pattern 170 defined by the upper column pattern 172 and the partition pattern 173 corresponds to the shape of the first pattern layer 160 It is formed in the form, therefore, the one continuous iron (凸) pattern 170 may be arranged in a rectangular shape.

At this time, in FIGS. 5A and 5B, although the one continuous iron portion pattern 170 is arranged in a rectangular shape, unlike this, the one continuous iron portion pattern ( 170) may be arranged in the form of a polygon, such as a triangle, pentagon or hexagon.

That is, FIGS. 5C and 5D are related to the second pattern layer 190 'according to the second example of the present invention, and as shown in FIGS. 5C and 5D, the single continuous iron pattern (Not shown in the drawing) may be arranged in the form of a hexagon, and thus, the recessed portion pattern 190 'located inside the region partitioned by the iron pattern may also be hexagonal. It can be seen that they are arranged in a shape.

Accordingly, the present invention does not limit the shape of the one continuous iron pattern and the shape of the recess pattern located inside the region partitioned by the iron pattern. .

By the above method, the second pattern layer 190 according to the present invention can be formed.

As described above, most of the conventional nanostructures have a column structure, and thus must be formed to have a high aspect ratio.

However, nanostructures having a high aspect ratio form initially exhibit superhydrophobic properties, but are entangled or lie sideways by capillarity generated when water (or solution) in contact with the surface evaporates. There was a problem that the water-repellent properties could not be maintained continuously.

However, in the present invention, the lower column portion pattern 171; By forming the nano-structure through the second pattern layer 190, which is located above the lower column portion pattern 171 and includes an upper column portion pattern 172 wider than the width of the lower column portion pattern 171, By suppressing capillarity generated when water (or solution) in contact with the surface evaporates, it is possible to provide a super-water-repellent or super-oil-repellent pattern capable of continuously maintaining the superhydrophobic properties.

In addition, in the present invention, the capillary force (capillarity) generated when water (or solution) in contact with the surface is evaporated is suppressed through the partition pattern 173 continuously positioned with the lower column pattern 171. By doing so, it is possible to provide a super water-repellent or super-oil-repellent pattern capable of continuously maintaining the super-water repellent properties.

On the other hand, manufacturing the pattern in the present invention, forming a first pattern layer 160 through the first roller unit 100, the second roller unit located adjacent to the first roller unit 100 ( 200, the first pattern layer 160 may be pressed to form the second pattern layer 190.

That is, in the present invention, by the simple process, the above-described super water-repellent or super-oil-repellent pattern can be easily produced, and since such a process corresponds to a continuous process, a super-water-repellent or super-oil-repellent pattern can be produced in large quantities. .

Although the embodiments of the present invention have been described with reference to the above and the accompanying drawings, those of ordinary skill in the art to which the present invention pertains can implement the present invention in other specific forms without changing its technical spirit or essential features. You will understand that there is. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

Claims (11)

Iron pattern; And
It includes a recessed portion pattern having a lower step than the iron portion pattern,
The iron part pattern may include a lower part column part pattern; An upper column portion pattern positioned on an upper portion of the lower column portion pattern; And a partition pattern positioned continuously with the lower column pattern.
The width of the upper column portion pattern is characterized in that the width is wider than the width of the lower column portion pattern. According to claim 1,
One continuous iron part pattern is defined by the lower column part pattern, the upper column part pattern, and the partition part pattern, and the yaw is formed inside the region partitioned by the iron part pattern. (Iii) A pattern characterized in that a pattern is formed. According to claim 2,
The one continuous iron (凸) pattern is characterized in that arranged in a polygonal shape. Forming a first pattern layer on the base member; And
And forming a second pattern layer on the upper portion of the base member by pressing the upper end of the first pattern layer. The method of claim 4,
The step of forming a first pattern layer on the base member,
Supplying the base member to the first main roller of the first roller unit; Forming a resin layer in the recess of the first main roller; Temporarily curing the resin layer; And transferring the temporary resin layer to the base member to form a first pattern layer. The method of claim 5,
The step of supplying the base member to the first main roller of the first roller part is to continuously supply the base member to the first main roller of the first roller part through the base member supply part,
The step of forming the resin layer in the recessed portion of the first main roller is to form the resin layer in the recessed portion of the first main roller through the resin supply unit,
The step of temporarily curing the resin layer is a method of manufacturing a pattern that is temporarily curing the resin layer through a temporary curing unit. The method of claim 4,
The step of forming a second pattern layer on the upper portion of the base member by pressing the upper end of the first pattern layer,
A method of manufacturing a pattern, in which a second main roller presses the upper end of the first pattern layer while the lower surface of the base member is supported by a support roller to form the second pattern layer. A base member supply unit for supplying a base member;
A first roller unit for forming a first pattern layer on the base member supplied from the base member supply unit;
A second roller portion positioned adjacent to the first roller portion and forming a second pattern layer through the first pattern layer formed through the first roller portion; And
And a recovery part for recovering the base member including the second pattern layer formed through the second roller part,
The first roller portion includes a first main roller, and the second roller portion includes a second main roller,
The second main roller presses the upper end of the first pattern layer, so that the second pattern layer is formed. The method of claim 8,
The first roller portion, the pressure roller is disposed facing the first main roller; A resin supply unit for forming a resin layer on the first main roller; And a temporary hardening part for temporarily hardening the resin layer,
The second roller unit, the pattern manufacturing apparatus further comprises a support roller disposed facing the second main roller. The method of claim 8,
The first main roller may include an iron portion positioned on the first main roller surface; And a recess having a lower step than the iron part,
The yaw portion may include a column region yaw portion defining a column region; And a partition region recess that is continuously positioned with the column region recess and separates the iron portion into an island shape and defines a partition region.
One continuous yaw portion is defined by the column region yaw portion and the partition region yaw portion, and the iron portion of the region divided by the yaw portion An apparatus for manufacturing a pattern, characterized in that it is separated and located in the form of an island therein. The method of claim 10,
The one continuous yaw (凹) is a pattern manufacturing apparatus characterized in that arranged in the form of a polygon.

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