KR20220071474A - A Pattern Fabricating Device And A Pattern Fabricating Method using the same - Google Patents

Abstract

The present invention relates to a pattern manufacturing method comprising: a step of forming a first pattern layer including a plurality of first convex patterns and a plurality of concave patterns having a step lower than the first convex patterns on the upper part of a base member; a step of forming a second pattern layer including a liquid layer on each of the concave patterns by injecting a liquid into each of the concave patterns; a step of forming a resin layer on the upper part of the first convex pattern and the liquid layer; and a step of patterning the resin layer to form a third pattern layer including second convex patterns on the upper part of each of the first convex patterns. It is possible to provide a super water repellent or super oil repellent pattern manufacturing device that is easy to manufacture and can continuously maintain super water repellent properties and a manufacturing method of a pattern using the same.

Description

A pattern manufacturing apparatus and a pattern manufacturing method using the same {A Pattern Fabricating Device And A Pattern Fabricating Method using the same}

The present invention relates to a pattern manufacturing apparatus and a pattern manufacturing method using the same, and more particularly, to a super water-repellent or super oil-repellent pattern manufacturing apparatus that can be manufactured by a simple method, and a pattern manufacturing method using the same.

Superhydrophobic or superoleophobic coating is a field of surface modification technology, which physically and chemically modifies the surface so that the wetting angle when the liquid comes into contact with the solid surface is 150° It is a technique that makes it more than that.

For example, super water repellency can be observed frequently through lotus petals existing in nature. Water droplets condensing or rolling down on the lotus petals are caused by nano-scale microscopic projections on the surface of the lotus petals.

In the case of simulating the surface properties (super water-repellent properties) of these lotus petals, they can be variously applied in many industries, such as textiles, architecture, machinery, electronics, glass, and automobiles, and thus many studies are being conducted to achieve this.

In general, the conventional nanostructure for implementing a super water-repellent or super-oil repellent surface forms a plurality of nanostructures having a micro- or nano-level column (or pillar) structure on a substrate, or a micro-scale column on a substrate It is manufactured in a structure in which a primary structure having a structure is formed and a plurality of nanostructures having a nano-level column structure are again formed on the primary structure.

Since most of these conventional nanostructures have a column structure, they must be basically formed to have a high aspect ratio.

However, nanostructures having such a high aspect ratio initially exhibit superhydrophobic properties, but are tangled or lie sideways due to capillary force generated when water (or solution) in contact with the surface evaporates. There was a problem in that the superhydrophobic properties could not be continuously maintained.

Japanese Laid-Open Patent No. 2014-076610

An object of the present invention is to provide an apparatus for manufacturing a super water-repellent or super-oil repellent pattern that is easy to manufacture and can continuously maintain super water-repellent properties, and a method for manufacturing a pattern using the same.

Objects of the present invention are not limited to the objects mentioned above, and other objects not mentioned will be clearly understood by those skilled in the art from the following description.

In order to solve the above-mentioned problems, the present invention provides a base member supply unit for supplying a base member; A first including a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern on the base member supplied from the base member supply unit a roller unit for forming a pattern layer; a liquid injection unit positioned continuously with the roller unit and injecting a liquid into each of the concave patterns to form a second pattern layer including a liquid layer in each of the concave patterns; a resin layer forming part positioned continuously with the liquid injection part and configured to form a resin layer on the first convex part pattern and the liquid layer; and forming a third pattern layer disposed continuously with the resin layer forming part and including a second convex part pattern on the first convex part pattern by patterning the resin layer It provides a pattern manufacturing apparatus including a photolithography apparatus for

In addition, the present invention provides a pattern manufacturing apparatus further comprising a recovery unit for recovering the base member including the third pattern layer.

In addition, the present invention relates to the liquid, silicone oil, perfluorocarbon liquid, perfluorofluorinated vacuum oil, fluorinated colorant, ionic liquid, water immiscible fluorinated ionic liquid, silicone oil including PDMS, It provides a pattern manufacturing apparatus, characterized in that at least any one or more materials selected from the group consisting of fluorinated silicone oil.

In addition, in the present invention, in the pattern manufacturing method, the pattern manufacturing method includes a plurality of first convex portion patterns and a plurality of first convex portion patterns on an upper portion of the base member and a plurality of convex portion patterns having a step difference lower than that of the first convex portion patterns. forming a first pattern layer including a concave pattern; forming a second pattern layer including a liquid layer in each of the concave patterns by injecting a liquid into each of the concave patterns; forming a resin layer on the first convex portion pattern and the liquid layer; and patterning the resin layer to form a third pattern layer including a second convex portion pattern on each of the first convex portion patterns .

In addition, the present invention, the pattern manufactured by the pattern manufacturing method, a plurality of ferrous (凸) portion pattern; a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern; second convex portion patterns positioned above each of the first convex portion patterns; and a liquid layer positioned on each of the concave pattern patterns, wherein a width of the second convex portion pattern is wider than a width of the first convex portion pattern. provide a way

In addition, in the present invention, after the step of patterning the resin layer to form a third pattern layer including a second convex portion pattern on top of each of the first convex portion patterns, each of the above It provides a pattern manufacturing method, characterized in that it further comprises the step of removing the liquid layer injected into the concave (凹) pattern.

In addition, the present invention, the pattern manufactured by the pattern manufacturing method, a plurality of ferrous (凸) portion pattern; a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern; and a second convex portion pattern positioned on an upper portion of each of the first convex portion patterns, wherein the width of the second convex portion pattern is equal to that of the first convex portion pattern It provides a pattern manufacturing method, characterized in that wider than the width of.

In addition, the present invention provides a first pattern including a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern on an upper portion of the base member. Forming the pattern layer may include: supplying the base member to the main roller of the roller unit; supplying a resin to the concave portion of the main roller; pre-curing the resin; and a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern by transferring the temporarily cured resin to the base member It provides a pattern manufacturing method, characterized in that the step of forming the first pattern layer.

In addition, the present invention injects a liquid into each of the concave pattern, forming a second pattern layer including a liquid layer in each of the concave pattern, the plurality of injecting a liquid on an upper portion of the first pattern layer including a first convex portion pattern and a plurality of concave portion patterns having a lower step than the first convex portion pattern; and removing the liquid applied to the upper surfaces of the plurality of first convex portion patterns.

In the present invention, a partial region of the resin layer is supported by the plurality of convex portion patterns, and is formed on the plurality of first convex portion patterns, and further, the resin layer Another partial region of is formed on the liquid layer by supporting the other partial region of the resin layer in a floating state on top of the liquid layer by the difference in density between the liquid layer and the resin layer It provides a pattern manufacturing method, characterized in that.

In addition, in the present invention, the step of patterning the resin layer to form a third pattern layer including a second convex portion pattern on each of the first convex portion patterns comprises: a transmissive region and an exposure step of irradiating light to the resin layer through a mask including a blocking region; and removing the area irradiated with light by the exposure step or removing the area not irradiated with light by the exposure step provides a pattern manufacturing method comprising the steps of:

In addition, the present invention provides a pattern manufacturing method, wherein the ferric portion pattern is a resin layer pattern in which the resin layer is patterned.

According to the present invention as described above, it is possible to provide an apparatus for manufacturing a super water-repellent or super-oil repellent pattern that can be manufactured by a simple method and a method for manufacturing a pattern using the same.

In the present invention, the lower part of the column pattern; And it occurs when water (or solution) in contact with the surface evaporates by forming a nanostructure through a pattern that is located on the upper part of the lower column part pattern and includes the upper part column part pattern that is wider than the width of the lower part column part pattern. By suppressing the capillary force (capillarity), it is possible to provide a super water-repellent or super-oil repellent pattern that can continuously maintain the super water-repellent property.

Manufacturing the pattern in the present invention includes forming a first pattern layer through a roller unit (S110), and thereafter, a liquid injection step (S120) that can be continuously performed; resin layer forming step (S130); Through the resin layer patterning step (S140), by manufacturing the pattern according to the present invention, by a simple process, the above-described super water-repellent or super oil-repellent pattern can be easily manufactured, and since this process corresponds to a continuous process, Super water-repellent or super-oil repellent patterns can be manufactured in large quantities.

1 is a schematic schematic diagram for explaining a pattern manufacturing apparatus according to the present invention, and FIG. 2 is a flowchart for explaining a pattern manufacturing method according to the present invention.
3 is a schematic view showing a roller unit according to the present invention.
4 is a schematic view for explaining an exposure process using a mask according to the present invention.

Advantages and features of the present invention and methods of achieving them will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in a variety of different forms, and only these embodiments allow the disclosure of the present invention to be complete, and common knowledge in the technical field to which the present invention belongs It is provided to fully inform the possessor of the scope of the invention, and the present invention is only defined by the scope of the claims.

With reference to the accompanying drawings will be described in detail for the implementation of the present invention. Irrespective of the drawings, like reference numbers refer to like elements, and "and/or" includes each and every combination of one or more of the recited items.

Although the first, second, etc. are used to describe various elements, these elements are not limited by these terms, of course. These terms are only used to distinguish one component from another. Accordingly, it goes without saying that the first component mentioned below may be the second component within the spirit of the present invention.

The terminology used herein is for the purpose of describing the embodiments and is not intended to limit the present invention. In this specification, the singular also includes the plural unless specifically stated otherwise in the phrase. As used herein, “comprises” and/or “comprising” does not exclude the presence or addition of one or more other components in addition to the stated components.

Unless otherwise defined, all terms (including technical and scientific terms) used herein may be used with the meaning commonly understood by those of ordinary skill in the art to which the present invention belongs. In addition, terms defined in a commonly used dictionary are not to be interpreted ideally or excessively unless clearly defined in particular.

Spatially relative terms "below", "beneath", "lower", "above", "upper", etc. It can be used to easily describe the correlation between a component and other components. Spatially relative terms should be understood as terms including different directions of components during use or operation in addition to the directions shown in the drawings. For example, when a component shown in the drawing is turned over, a component described as “beneath” or “beneath” of another component may be placed “above” of the other component. can Accordingly, the exemplary term “below” may include both directions below and above. Components may also be oriented in other orientations, and thus spatially relative terms may be interpreted according to orientation.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a schematic schematic diagram for explaining a pattern manufacturing apparatus according to the present invention, and FIG. 2 is a flowchart for explaining a pattern manufacturing method according to the present invention.

First, referring to FIG. 1 , the pattern manufacturing apparatus 1 according to the present invention includes a base member supply unit 11 for supplying the base member 10; A plurality of first convex portion patterns 140 and a plurality of first convex portion patterns 140 having a step difference lower than those of the first convex portion patterns 140 are provided to the base member 10 supplied from the base member supply unit 11 . a roller unit 100 for forming the first pattern layer 160 including the concave pattern 150; Positioned continuously with the roller part 100, by injecting a liquid into each of the concave pattern 150, including a liquid layer 250 in each of the concave pattern 150 a liquid injection unit 200 for forming the second pattern layer 260; The resin layer forming part 300 for forming the resin layer 350 on the ferrous convex part pattern 140 and the liquid layer 250 and positioned continuously with the liquid injection part 200 . ; and a second convex part pattern 450 on each of the first convex part patterns 140 by patterning the resin layer and positioned continuously with the resin layer forming part 300 . and a photolithography apparatus 400 for forming the included third pattern layer 460 .

That is, the pattern manufacturing apparatus 1 according to the present invention includes, through the roller unit 100 , on the upper portion of the base member 10 , a plurality of first convex portion patterns 140 ; and a first pattern layer 160 including a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140, and further, the liquid injection portion ( 200), by injecting a liquid into each of the concave portion patterns 150, a plurality of first convex portion patterns 140; a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; And a second pattern layer 260 including a liquid layer 250 may be formed on each of the concave portion patterns 150 .

In addition, in the pattern manufacturing apparatus 1 according to the present invention, the entire upper surface of the first convex portion pattern 140 and the liquid layer 250 through the resin layer forming unit 300 . A resin layer 350 may be formed on the surface, and by patterning the resin layer through the photolithography apparatus 400 , a plurality of ferrous portion patterns 140 ; a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; and a third pattern layer 460 including a second convex portion pattern 450 on each of the first convex portion patterns 140 .

In this case, the ferric portion pattern 450 may be understood as a resin layer pattern in which the resin layer is patterned.

Meanwhile, as shown in FIG. 1 , the pattern manufacturing apparatus 1 according to the present invention recovers the base member 10 including the third pattern layer 460 formed through the photolithography apparatus 400 . It may further include a recovery unit 500 for

Hereinafter, a method for manufacturing a pattern through the apparatus for manufacturing a pattern according to the present invention will be described in more detail.

1 and 2 , the method of manufacturing a pattern according to the present invention includes: a plurality of first convex portion patterns 140 on an upper portion of a base member 10 ; and forming a first pattern layer 160 including a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ( S110 ).

The base member 110 may include latex, polyurethane, PDMS, PUA, PFPE, PE, spandex, Goredex, polychloroprene, styrene-butadiene rubber (SBR), acrylonitrile-butadiene rubber (NBR), butyl rubber, ethylene At least one of propylene rubber (EPR), thiochol, and silicone rubber may be used, but the material of the base member is not limited in the present invention.

In this case, the base member 110 may be supplied through the base member supply unit 11 as described above.

More specifically, the base member supply unit 11 may be formed in the form of a film supply roll, and the above-described base member is wound on the film supply roll, and by rotation of the film supply roll, a first The base member may be continuously supplied to the roller unit.

However, the method of supplying the base member 10 is not limited in the present invention.

On the other hand, the recovery unit 500 is for recovering the base member 10 including the third pattern layer 460 formed through the photolithography apparatus 400 , and the recovery unit 500 includes: It may be formed in the form of a film recovery roll, and the base member including the above-described third pattern layer is wound on the film recovery roll, and by rotation of the film recovery roll, the base member can be continuously recovered .

Since this is obvious in the art, a detailed description below will be omitted.

3 is a schematic view showing a roller unit according to the present invention.

Referring to FIG. 3 , the roller unit 100 according to the present invention is for forming a first pattern layer 160 on the base member 10 supplied from the base member supply unit 11 .

Meanwhile, in the present invention, for convenience of explanation, the roller unit 100 may be defined as an imprinting roller unit, that is, the first pattern layer 160 is imprinted through the roller unit 100 . It can be defined as being formed by

More specifically, the roller unit 100, the main roller 110; And it includes a pressure roller (111, 112, 113) having a lower step than the main roller (110).

The pressure rollers 111 , 112 , and 113 are disposed to face the main roller 110 , and move the lower surface of the base member 110 supplied from the base member supply unit 11 in the direction of the main roller 110 . As a component for pressing with , at this time, although the drawings show that the number of the pressing rollers 111, 112, and 113 is three, the number of the pressing rollers is not limited in the present invention.

At this time, the pressure roller (111, 112, 113), the first pressure roller 111 located below the one side of the main roller (110); a second pressing roller 112 disposed at a predetermined distance from the first pressing roller 111 and positioned below the other side of the main roller 110; and a third pressing roller 113 disposed at a predetermined distance from the second pressing roller 112 and positioned on the side of the main roller 110 .

In particular, in the case of the third pressing roller 113, it may be divided into a separation angle enlargement roller, and in the case of the separation angle enlargement roller, it is installed at a higher position than the second pressing roller 112, and the base member ( 10) can be controlled to bend very sharply.

On the other hand, the main roller 110, the iron (凸) portion 120 located on the surface of the main roller 110; and a concave portion 130 having a lower step than the convex portion 120 .

Continuingly, referring to FIG. 3 , the roller part 100 according to the present invention includes a resin supply part 12 for supplying the resin 20 to the main roller 110 , and more specifically, the resin The resin supplied through the supply unit 12 is positioned in the concave portion 130 of the main roller 110 .

At this time, the resin 20 is cured in the UV irradiation process, which is a process to be described later, and an acrylic resin such as polyester acrylic, urethane acrylic, epoxy acrylic, polyether acrylic, or an epoxy resin such as an epoxy resin. may be used, but the type of the resin is not limited in the present invention.

Continuingly, referring to FIG. 3 , the roller part 100 according to the present invention includes a temporary curing part 30 for temporarily curing the resin 20 supplied to the main roller 110 .

The temporary hardening part 30 includes the resin 20 supplied to the main roller 110 , and more specifically, the resin 20 supplied to the concave part 130 of the main roller 110 . ) for provisional curing, by irradiating UV to the resin 20, the resin 20 may be provisionally cured.

That is, the temporary curing part 30 may be installed between the first pressing roller 111 and the second pressing roller 112 , for example, and irradiating ultraviolet rays in the direction of the base member 10 . This is a component for temporarily curing the resin 20 filled in a pattern shape between the base member 10 and the main roller 110 .

Accordingly, the resin 20 is temporarily cured by the provisional curing unit 30 and hardened to the extent that its shape is not deformed. It is not deformed and is transferred to the base member 10 while maintaining its shape, thereby forming the first pattern layer 160 formed on the base member 10 .

That is, the resin 20 temporarily cured by the temporary curing unit 30 may be transferred to the base member 10 to form the first pattern layer 160 .

At this time, the provisional curing unit 30 is preferably composed of an LED that irradiates ultraviolet rays in the form of a line beam. , there is an advantage in that it is possible to irradiate ultraviolet rays while ensuring uniform illumination on all surfaces of the base member 10 .

According to the content of the present invention as described above, the steps of forming the first pattern layer 160 on the base member 10 are summarized as follows.

That is, the forming of the first pattern layer 160 on the base member 10 includes: supplying the base member 10 to the main roller 110 of the roller unit 100 ; supplying the resin 20 to the concave portion 130 of the main roller 110; provisionally curing the resin 20; and transferring the pre-cured resin 20 to the base member 10 to form a first pattern layer 160 .

In summary, the step of supplying the base member 10 to the main roller 110 of the roller unit 100 is, through the base member supply unit 11, to the main roller 110 of the roller unit. The base member can be continuously supplied.

In addition, the step of supplying the resin 20 to the concave portion 130 of the main roller 110 is, through the resin supply unit 12, the concave portion ( 130 ) may be supplied with the resin 20 , and in the step of temporarily curing the resin 20 , the resin 20 may be provisionally cured through the temporary curing unit 30 .

In addition, in the step of transferring the pre-cured resin 20 to the base member 10 to form the first pattern layer 160 , the pre-cured resin 20 is removed from the main roller 110 . It is not deformed even in the process of separation, and may be transferred to the base member 10 while maintaining its shape.

At this time, as described above, the first pattern layer 160 includes a first convex portion pattern 140 ; and a concave portion pattern 150 having a lower step than the first convex portion pattern 140 .

At this time, the first convex portion pattern 140 of the first pattern layer 160 is formed at a position corresponding to the concave portion 130 of the main roller 110 , and the second The concave portion pattern 150 of the first pattern layer 160 is formed at a position corresponding to the convex portion 120 of the main roller 110 .

That is, in the present invention, the shape of the first pattern layer 160 may be determined by the surface structure of the main roller 110 .

Meanwhile, in the present invention, the first convex portion pattern 140 may be defined as a lower portion column portion pattern to distinguish it from a second convex portion pattern 450 to be described later. The ferric portion pattern 450 may be defined as an upper column portion pattern. This will be described later.

In addition, since the concave portion pattern 150 may correspond to an empty space, it may be simply defined as a concave portion. Therefore, in this case, the first pattern layer 160 is convex portion pattern 140; and a concave portion 150 having a lower step than the first convex portion pattern 140 .

That is, in the present invention, the meaning of the concave pattern 150 is that a certain layer is formed in the concave pattern 150 region, or the concave pattern 150 is This is meant to include all cases where an empty space without a specific layer is formed in the area.

By the above method, the first pattern layer 160 according to the present invention can be formed. At this time, the method of forming the first pattern layer 160 is not limited in the present invention, and various patterns are manufactured. Through the method, the first pattern layer may be formed.

However, in the present invention, in order to manufacture the pattern according to the present invention through a continuous process, the first pattern layer is preferably manufactured through the roller unit.

Subsequently, referring to FIGS. 1 and 2 , the method for manufacturing a pattern according to the present invention injects a liquid into each of the concave pattern 150 , and each of the concave pattern ( and forming the second pattern layer 260 including the liquid layer 250 on 150 ( S120 ).

That is, in the method of manufacturing a pattern according to the present invention, liquid is injected into each of the concave pattern 150 , and on the base member 10 , the plurality of first convex pattern 140 . ); a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; and a second pattern layer 260 including a liquid layer 250 on each of the concave portion patterns 150 .

At this time, the liquid constituting the liquid layer 250 is silicone oil, perfluorocarbon liquid, perfluoroFluorinated vacuum oil (eg, Krytox 1506 or Fromblin 06/6) , fluorinated colorants (such as perfluoro-tripentylamine manufactured by 3M and marketed as FC-70), ionic liquids, fluorinated ionic liquids immiscible with water, silicone oils including PDMS, fluorinated silicone oils It may be at least any one or more materials selected from the group consisting of, however, the type of the liquid is not limited in the present invention.

In addition, to inject the liquid into each of the concave pattern 150, a known liquid injection method may be used, for example, the liquid injection device ( 210), and thus, the method of injecting the liquid into each of the concave portion patterns 150 in the present invention is not limited.

Meanwhile, in the present invention, the liquid layer 250 should be injected into the concave portion pattern 150 , and preferably not included on the upper surface of the first convex portion pattern 140 . This will be described later.

However, the liquid injected through the liquid injection device 210 may be applied to the upper surface of the first convex portion pattern 140 while being injected into the concave portion pattern 150 .

Therefore, in the method of manufacturing a pattern according to the present invention, after injecting the liquid into each of the concave pattern 150 , the liquid applied to the upper surface of the first convex pattern 140 is applied. It is preferable to include a step of removing it.

Accordingly, by injecting a liquid into each of the concave pattern 150 , the second pattern layer 260 including the liquid layer 250 is formed in each of the concave pattern 150 . The forming may include a plurality of first convex portion patterns 140 ; and injecting a liquid onto the first pattern layer 160 including a plurality of concave pattern 150 having a step difference lower than that of the first convex portion pattern 140 ; and removing the liquid applied to the upper surfaces of the plurality of first convex portion patterns 140 .

Subsequently, referring to FIGS. 1 and 2 , in the method of manufacturing a pattern according to the present invention, a resin layer 350 is formed on the first convex portion pattern 140 and the liquid layer 250 . and forming (S130).

That is, the resin layer 350 may be formed on the entire upper surface of the first convex portion pattern 140 and the liquid layer 250 through the resin layer forming unit 300 as described above. The resin layer forming unit may include, for example, a spin coating device 310, and the resin layer may be formed through the spin coating device 310. However, in the present invention, the resin layer is formed There is no limit on how to do it.

In this case, the resin layer 350 is a layer patterned by a photolithography process, which will be described later, and is an acrylic resin such as polyester acrylic, urethane acrylic, epoxy acrylic, polyether acrylic, or an epoxy resin such as an epoxy resin. may be used, but the type of the resin layer is not limited in the present invention.

However, the resin layer 350 is preferably made of the same resin as the resin constituting the first convex portion pattern 140 .

On the other hand, as described above, in the present invention, the liquid layer 250 should be injected into the concave portion pattern 150 , and not included in the upper surface of the ferrous portion pattern 140 . It is preferable not to

This is to improve the adhesion between the resin layer 350 and the first convex portion pattern 140 , and the liquid layer 250 is formed on the upper surface of the first convex portion pattern 140 . When present, the adhesive force between the resin layer 350 and the first convex portion pattern 140 is reduced, and the resin layer 350 is peeled off from the first convex portion pattern 140 . can be

Therefore, in order to improve the adhesive force between the resin layer 350 and the first convex portion pattern 140 , the liquid layer 250 is formed on the upper surface of the first convex portion pattern 140 . Preferably not included.

Meanwhile, in the present invention, a portion of the resin layer 350 is formed on top of the plurality of first convex portion patterns 140 , and another portion of the resin layer 350 is formed on the upper portion of the liquid layer 250 . will be formed

That is, a partial region of the resin layer 350 is supported by the plurality of first convex portion patterns 140 to be formed on the plurality of first convex portion patterns 140 . can,

In addition, in another partial region of the resin layer 350 , another partial region of the resin layer 350 is on top of the liquid layer 250 due to the difference in density between the liquid layer 250 and the resin layer. By being supported in a floating state, it may be formed on the liquid layer 250 .

Therefore, in the present invention, the resin layer 350 is formed on the entire upper surface of the first convex portion pattern 140 and the liquid layer 250 by using the difference in density between the liquid layer and the resin layer. ) can be formed.

Subsequently, referring to FIGS. 1 and 2 , in the method of manufacturing a pattern according to the present invention, the resin layer 350 is patterned to be formed on the upper portion of each of the first convex portion patterns 140 . and forming a third pattern layer 460 including the ferric portion pattern 450 ( S140 ).

That is, in the present invention, by patterning the resin layer 350 through the photolithography apparatus unit 400 of FIG. 1 described above, a plurality of first convex portion patterns 140 ; a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; and a third pattern layer 460 including a second convex portion pattern 450 on each of the first convex portion patterns 140 .

More specifically, the patterning may be performed through the photolithography apparatus 400 using a photolithography method that generally includes coating, exposure, and development.

At this time, the photoresist film (hereinafter, the PR film) used in the photolithography method has high resolution and high sensitivity, and depending on the polarity, a negative type PR film (Negative Tone Working PR) and a positive type PR film (positive tone working PR) can be divided into

In addition, the negative PR film is a general term for a PR film in which the exposed portion remains as a pattern after exposure, and is composed based on resin, PAG (Photo Acid Generator) and a crosslinking agent, and the positive PR film is the exposed portion by a developer. It refers to a resist with a property to be removed and is composed of a resist, a photosensitizer, and a dissolution inhibitor.

4 is a schematic diagram for explaining an exposure process using a mask according to the present invention.

Referring to FIG. 4 , in general, a mask 410 as in FIG. 4 is used to distinguish the exposed portion, and the mask includes a transmission region 410a and a blocking region 410b, By irradiating light such as UV through the transmission region, a region to which light is irradiated to the photoresist (hereinafter, PR) may be defined.

Since such a photolithography method corresponds to a general matter, a detailed description thereof will be omitted below.

That is, in the present invention, by patterning the resin layer through such a photolithography method, the second convex portion pattern 450 is included on each of the first convex portion patterns 140 . A third pattern layer 460 may be formed, and the resin layer may be understood as a photoresist film used in the photolithography method.

Accordingly, by patterning the resin layer 350 , the third pattern layer 460 including the ferric part pattern 450 on the first convex part pattern 140 , respectively. The forming may include: an exposure step of irradiating light to the resin layer through a mask including a transmission region and a blocking region; It may be defined as including a developing step of removing a region irradiated with light by the exposure step or removing a region not irradiated with light by the exposure step.

On the other hand, in the present invention, the resin layer is preferably a negative PR film.

As described above, the negative PR film corresponds to a PR film in which the exposed portion remains as a pattern after exposure. In contrast to the present invention, when the resin layer is a negative PR film, the exposed portion of the resin layer is a pattern remaining, the second convex portion pattern 450 is formed.

At this time, the second convex portion pattern 450 remains on the first convex portion pattern 140 , and by the exposure process, the second convex portion pattern ( 450) and the ferrous portion pattern 140 may have improved adhesion, therefore, in the present invention, the resin layer is preferably a negative PR film.

In addition, referring to FIG. 1 , in the present invention, the width of the second convex portion pattern 450 is wider than the width of the first convex portion pattern 140 , and through this , as shown in FIG. 1 , the pattern according to the present invention may be configured as a T-shaped pattern in cross section.

More specifically, as described above, in the present invention, the first convex portion pattern 140 is defined as a lower portion column portion pattern to distinguish it from the second convex portion pattern 450 . The ferric part pattern 450 may be defined as an upper column part pattern, and in the present invention, the width of the upper part column part pattern is wider than the width of the lower part column part pattern. can be defined.

Accordingly, the pattern according to the present invention includes a plurality of first convex portion patterns 140 ; a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; and a second convex portion pattern 450 positioned above each of the first convex portion patterns 140 , wherein the width of the second convex portion pattern 450 is It may be defined as being wider than the width of the first convex portion pattern 140 .

Unlike this, the pattern according to the present invention includes a plurality of convex portion patterns including a lower portion column portion pattern and an upper portion column portion pattern positioned above each lower portion column portion pattern; and a plurality of concave portion patterns having a step difference lower than that of the convex portion pattern, wherein a width of the upper column pattern is wider than a width of the lower column pattern.

At this time, in the present invention, configuring the width of the second convex portion pattern 450 to be wider than the width of the first convex portion pattern 140 includes the above-described transmission region and blocking region of the mask. By adjusting , the width of the second convex portion pattern 450 and the width of the first convex portion pattern 140 may be adjusted.

On the other hand, in the present invention, by configuring the width of the second convex portion pattern 450 to be wider than the width of the first convex portion pattern 140 , the super water repellency or super water repellency of the pattern according to the present invention Oil repellency can be improved.

As described above, since most of these conventional nanostructures have a column structure, they have to be basically formed to have a high aspect ratio.

As such, the nanostructures having a high aspect ratio initially exhibit superhydrophobic properties, but are tangled with each other or lie sideways due to capillary force generated when water (or solution) in contact with the surface evaporates, and the superhydrophobicity There was a problem that the characteristics could not be continuously maintained.

However, in the present invention, the lower part of the column pattern; And it occurs when water (or solution) in contact with the surface evaporates by forming a nanostructure through a pattern that is located on the upper part of the lower column part pattern and includes the upper part column part pattern that is wider than the width of the lower part column part pattern. By suppressing the capillary force (capillarity), it is possible to provide a super water-repellent or super-oil repellent pattern that can continuously maintain the super water-repellent property.

On the other hand, in the method of manufacturing a pattern according to the present invention, in step S140 , the resin layer 350 is patterned, and the resin layer pattern 450 is included on the upper portion of each of the convex portion patterns 140 . After forming the third pattern layer 460 , the method may further include removing the liquid layer 250 injected into each of the concave pattern 150 .

The step of removing the liquid layer 250 injected into each of the concave portion patterns 150 may be removed by cleaning the liquid layer 250 , however, in the present invention, each of the It is also possible not to remove the liquid layer 250 injected into the concave pattern 150 .

In this case, the pattern according to the present invention includes a plurality of first convex portion patterns 140 ; a plurality of concave portion patterns 150 having a step difference lower than that of the first convex portion pattern 140 ; a second convex portion pattern 450 positioned above each of the first convex portion patterns 140 ; and a liquid layer 250 positioned on each of the concave portion patterns 150 , wherein the width of the second convex portion pattern 450 is equal to that of the first convex portion pattern ( 140) can be defined as being wider than the width.

Unlike this, the pattern according to the present invention includes a plurality of convex portion patterns including a lower portion column portion pattern and an upper portion column portion pattern positioned above each lower portion column portion pattern; a plurality of concave portion patterns having a step difference lower than that of the convex portion pattern; and a liquid layer positioned on each of the concave portion patterns, wherein a width of the upper column pattern is wider than a width of the lower column pattern.

That is, in the present invention, the liquid layer located in the concave portion pattern may remain, for the following reasons.

In the case of a pattern exhibiting general super water repellency or super oil repellency characteristics, it can be easily contaminated by a contamination source, and it is difficult to cope with the freezing phenomenon.

For example, it may be easily contaminated with organic liquids or complex liquids, and ice formation occurs easily at sub-zero temperatures.

However, in the present invention, by including the liquid layer located in the concave pattern, it is possible to implement the antifouling and anti-icing function capable of coping with contamination and freezing.

In addition, in the present invention, it is possible to implement a self-cleaning function and optical properties through the liquid layer.

Specifically, in the present invention, through the liquid layer, a self-cleaning function can be implemented to remove contaminants or to self-decompose and disappear buried contaminants, and also, through the liquid layer, transmittance and reflectance are controlled to achieve optical characteristics can be implemented.

On the other hand, manufacturing the pattern in the present invention includes forming the first pattern layer 160 through the roller part 100 (S110), and thereafter, a liquid injection step (S120) that can be continuously performed; resin layer forming step (S130); Through the resin layer patterning step (S140), by manufacturing the pattern according to the present invention, the above-described super water-repellent or super oil-repellent pattern can be easily manufactured by a simple process, and since this process corresponds to a continuous process, Super water-repellent or super-oil repellent patterns can be manufactured in large quantities.

Although embodiments of the present invention have been described with reference to the above and the accompanying drawings, those of ordinary skill in the art to which the present invention pertains can practice the present invention in other specific forms without changing its technical spirit or essential features. You can understand that there is Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

Claims (12)

a base member supply unit for supplying the base member;
A first including a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern on the base member supplied from the base member supply unit a roller unit for forming a pattern layer;
a liquid injection unit positioned continuously with the roller unit and injecting a liquid into each of the concave patterns to form a second pattern layer including a liquid layer in each of the concave patterns;
a resin layer forming part positioned continuously with the liquid injection part and configured to form a resin layer on the first convex part pattern and the liquid layer; and
Positioned continuously with the resin layer forming part and patterning the resin layer to form a third pattern layer including a second convex part pattern on each of the first convex part patterns A pattern manufacturing apparatus including a photolithography apparatus unit. The method of claim 1,
The pattern manufacturing apparatus further comprising a recovery unit for recovering the base member including the third pattern layer. The method of claim 1,
The liquid includes silicone oil, perfluorocarbon liquid, perfluorofluorinated vacuum oil, fluorinated colorant, ionic liquid, water immiscible fluorinated ionic liquid, silicone oil including PDMS, fluorinated silicone oil Pattern manufacturing apparatus, characterized in that at least any one or more materials selected from the group. In the pattern manufacturing method,
The pattern manufacturing method,
Forming a first pattern layer including a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern on an upper portion of the base member ;
forming a second pattern layer including a liquid layer in each of the concave patterns by injecting a liquid into each of the concave patterns;
forming a resin layer on the first convex portion pattern and the liquid layer; and
and patterning the resin layer to form a third pattern layer including a second convex portion pattern on each of the first convex portion patterns. 5. The method of claim 4,
The pattern manufactured by the pattern manufacturing method is,
a plurality of first convex portion patterns; a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern; second convex portion patterns positioned above each of the first convex portion patterns; and a liquid layer positioned on each of the concave pattern patterns, wherein a width of the second convex portion pattern is wider than a width of the first convex portion pattern. Way. 5. The method of claim 4,
After the step of patterning the resin layer to form a third pattern layer including a second convex portion pattern on each of the first convex portion patterns,
Pattern manufacturing method, characterized in that it further comprises the step of removing the liquid layer injected into each of the concave pattern. 7. The method of claim 6,
The pattern manufactured by the pattern manufacturing method is,
a plurality of first convex portion patterns; a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern; and a second convex portion pattern positioned on an upper portion of each of the first convex portion patterns, wherein the width of the second convex portion pattern is equal to that of the first convex portion pattern A pattern manufacturing method, characterized in that it is wider than the width of 5. The method of claim 4,
forming a first pattern layer including a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern on an upper portion of the base member; step is,
supplying the base member to the main roller of the roller part; supplying a resin to the concave portion of the main roller; pre-curing the resin; and a plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion patterns by transferring the temporarily cured resin to the base member A pattern manufacturing method, characterized in that the step of forming the first pattern layer. 5. The method of claim 4,
Forming a second pattern layer including a liquid layer in each of the concave patterns by injecting a liquid into each of the concave patterns,
injecting a liquid on an upper portion of the first pattern layer including the plurality of first convex portion patterns and a plurality of concave portion patterns having a step difference lower than that of the first convex portion pattern; and removing the liquid applied to the upper surfaces of the plurality of first convex portion patterns. 5. The method of claim 4,
A partial region of the resin layer is supported by the plurality of first convex portion patterns, and is formed on the plurality of first convex portion patterns, and another partial region of the resin layer is , characterized in that by the difference in density between the liquid layer and the resin layer, the other partial region of the resin layer is supported in a floating state on the upper part of the liquid layer, whereby it is formed on the upper part of the liquid layer. Pattern manufacturing method. 5. The method of claim 4,
The step of patterning the resin layer to form a third pattern layer including a second convex portion pattern on each of the first convex portion patterns may include:
an exposure step of irradiating light to the resin layer through a mask including a transmission region and a blocking region; and a developing step of removing a region irradiated with light by the exposure step or removing a region not irradiated with light by the exposure step. 8. The method according to claim 5 or 7,
The ferric part pattern is a pattern manufacturing method, characterized in that the resin layer patterned with the resin layer pattern.

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