KR20200026051A - Stage measuring jig, coating apparatus and stage measuring method - Google Patents

Abstract

The present invention provides a technique which efficiently measures an inclination of a floating stage. A floating state (3) gives floating power to a substrate (W) transported in a predetermined transport direction (D1) by a transport shuttle (5). Each upper surface (31S, 32S, 33S) of the floating stage (3) has a plurality of holes to discharge air. A stage measuring jig (8) has five stage measuring devices (81) arranged in a transport width direction (D2), and a cross-linking structure (83) as a connection unit to connect each stage measuring device (81) to the transport shuttle (5). Each stage measuring device (81) measures the vertical position of the upper surface (31S, 32S, 33S) of the floating stage (3). The transport shuttle (5) moves each stage measuring device (81) along with the cross-linking structure (83) in the transport direction (D1).

Description

Stage measuring jig, coating device and stage measuring method {STAGE MEASURING JIG, COATING APPARATUS AND STAGE MEASURING METHOD}

TECHNICAL FIELD This invention relates to a stage measuring jig, an application | coating apparatus, and a stage measuring method. Specifically, It is related with the technique of apply | coating the process liquid to the board | substrate to which conveyance force is provided and conveyed. Examples of the substrate to be processed include a semiconductor substrate, a liquid crystal display device and a substrate for a flat panel display (FPD) such as an organic EL (Electroluminescence) display device, an optical disk substrate, a magnetic disk substrate, and an optical magnetic disk. Substrates, photomask substrates, ceramic substrates, solar cell substrates, printed circuit boards, and the like.

In manufacturing processes, such as an electronic component, such as a semiconductor device and a liquid crystal display device, the coating apparatus which apply | coats a coating liquid to the surface of a board | substrate is used. In such a coating device, the substrate is extended in the width direction of the substrate with respect to the surface of the substrate (corresponding to the main surface of the substrate) while conveying the substrate while injecting air onto the back surface of the substrate to make the substrate float. The apparatus which discharges a coating liquid from a nozzle and apply | coats a coating liquid to a board | substrate is known (for example, patent document 1).

In the substrate processing apparatus of patent document 1, the said board | substrate is conveyed by hold | maintaining the circumferential edge part of a board | substrate, and traveling in a horizontal direction, floating a board | substrate in a horizontal attitude on a floating stage, and from the slit nozzle arrange | positioned above the board | substrate conveyance path | route. The coating liquid is discharged.

By the way, in order to convey a board | substrate precisely on a floating stage, it is calculated that the upper surface of a floating stage is horizontal. In order to level the upper surface of the floating stage, conventionally, leveling was performed using a dial gauge, a laser level, or the like. Specifically, in the floating stage, the inclination of the floating stage was measured by measuring the vertical position at different points in the conveying direction.

Japanese Laid-Open Patent Publication 2012-142583

However, in the conventional leveling work, since the worker needs to measure the vertical position of each point using a dial gauge, the work content is complicated. Moreover, when some vertical position is adjusted in order to optimize the inclination of a floating stage, the vertical position of the peripheral part is changed. For this reason, each time a part is adjusted, the vertical position of the surroundings may be measured again, and there existed a subject that work man-hours increased. For this reason, the technique of measuring the inclination of a floating stage efficiently was calculated | required.

Therefore, an object of the present invention is to provide a technique for efficiently measuring the inclination of the floating stage.

In order to solve the said subject, a 1st aspect is a plane which the floating stage which gives a floating force to the board | substrate conveyed by the conveyance shuttle by the conveyance direction already defined, and is in the vertical direction in which the some hole which blows out air was formed. A stage measuring jig for measuring the vertical position of the upper surface in a direction, comprising: at least one stage measuring instrument for measuring the vertical position of the upper surface of the floating stage, and the stage measuring instrument connected to the conveyance shuttle so as to be movable in the conveying direction It includes a connecting portion to make.

2nd aspect is a stage measuring jig of a 1st aspect, Comprising: The said connection part is extended in the conveyance width direction orthogonal to the said conveyance direction, The beam part which supports the said stage measuring device from the upper surface of the said upper surface, The said beam part A connector is detachably connected to the transport shuttle.

A 3rd aspect is a stage measuring jig of a 1st aspect or 2nd aspect, The vertical position of the target part which is a part of the said upper surface is adjustable by the adjustment mechanism provided in the floating stage, The said stage measuring device is the vertical of the said target part. It is formed in the position which can measure a position.

4th aspect is a stage measuring jig in any one of 1st aspect-3rd aspect, Comprising: The several said stage measuring machine is provided at intervals in the conveyance width direction orthogonal to the said conveyance direction.

A 5th aspect is a coating apparatus which apply | coats a process liquid to a board | substrate, The said conveyance shuttle conveys air from the conveyance shuttle which conveys a board | substrate already in the predetermined direction, and the some air hole formed in the upper surface of a perpendicular upper direction, and a conveyance direction The floating stage which gives a floating force to the board | substrate conveyed by this, the air supply part which supplies the said air, the at least 1 stage measuring device which measures the vertical position of the said upper surface, and the said stage measuring device so that it can move to the said conveyance direction The connection part connected to the said conveyance shuttle, the adjustment tool which adjusts the vertical position of the target part which is a part of the said upper surface, and the nozzle which discharges a process liquid toward the board | substrate conveyed to the said conveyance direction by the said conveyance shuttle are provided.

The 6th aspect is the plane of the floating stage which gives a floating force to the board | substrate conveyed in the conveyance direction previously determined by the conveyance shuttle, and the perpendicular | vertical position of the upper surface which is a perpendicular direction upward direction in which the some hole which blows out air was formed. A stage measuring method for measuring, comprising: (a) a step of connecting a stage measuring device to the conveyance shuttle via a connecting portion, (b) a step of moving the stage measuring device in the conveying direction by the power of the conveying shuttle, and (c In the said process (b), the process of measuring the vertical position of a part different from the said conveyance direction in the said upper surface by the said stage measuring device which moves to the said conveyance direction is included.

7th aspect is a stage measurement which measures the vertical position of the upper surface which is the plane which the floating stage which gives a floating force to the board | substrate conveyed in a predetermined conveyance direction, and is perpendicular direction upper direction in which the some hole which blows out air was formed. The jig includes at least one stage measuring unit for measuring the vertical position of the upper surface of the floating stage, and a moving unit for moving the stage measuring unit in the conveying direction.

According to the stage measuring jig of a 1st aspect, distribution of the vertical position in a conveyance direction can be measured efficiently by moving a stage measuring device to a conveyance direction. For this reason, the inclination of the upper surface of the floating stage can be measured efficiently.

According to the stage measuring jig of a 2nd aspect, the beam part can be isolate | separated from a conveyance shuttle as needed. This can suppress the beam portion from interfering with other elements.

According to the stage measuring jig of a 3rd aspect, the vertical position of the target part which can be adjusted by a adjustment mechanism can be measured with a stage measuring device. Moreover, according to a measurement result, the inclination of the upper surface of a floating stage can be adjusted with favorable precision by adjusting the vertical position of a target part.

According to the stage measuring jig of a 4th aspect, distribution of the vertical position in each position different in a conveyance width direction can be measured at once by moving several stage measuring machines to a conveyance direction. For this reason, the inclination of the upper surface of the floating stage can be measured efficiently.

According to the coating device of 5th aspect, distribution of a vertical position can be measured efficiently by moving a stage measuring device to a conveyance direction by a conveyance shuttle. Based on this measurement result, the inclination of the upper surface of the floating stage can be efficiently corrected by adjusting the vertical position of the target portion of the upper surface with the adjusting tool.

According to the vertical position measuring method of the sixth aspect, distribution of the vertical position in the conveying direction can be efficiently measured by moving the stage measuring device in the conveying direction. For this reason, the inclination of the upper surface of the floating stage can be measured efficiently.

According to the stage measuring jig of a 7th aspect, distribution of the vertical position in a conveyance direction can be measured efficiently by moving a stage measuring device to a conveyance direction. For this reason, the inclination of the upper surface of the floating stage can be measured efficiently.

FIG. 1: is a side view which shows typically the whole structure of the coating device 1 which is an example of the substrate processing apparatus of embodiment.
2 is a schematic plan view of the coating device 1 according to the embodiment as viewed from above in the vertical direction.
3 is a schematic plan view of the coating device 1 except for the coating mechanism 6 of the embodiment.
4 is a schematic cross-sectional view of the coating device 1 at a position along the line AA shown in FIG. 2.
5 is a schematic plan view showing a part of the floating stage 3 of the embodiment.
6 is a schematic plan view showing the stage measuring jig 8 of the embodiment.
7 is a schematic front view showing the stage measuring jig 8 of the embodiment.
8 is a schematic plan view of the stage measuring jig 8 of the embodiment.
9 is a schematic block diagram showing the control unit 9 of the embodiment.
FIG. 10: is a figure which shows the process flow which measures and adjusts the vertical position of each upper surface 31S-33S of the floating stage 3. As shown in FIG.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described, referring an accompanying drawing. In addition, the component described in this embodiment is an illustration to the last, and is not the meaning which limits the scope of this invention only to them. In the drawings, the size and number of each part may be exaggerated or simplified as necessary for easy understanding.

Expressions representing relative or absolute positional relationships (eg, "parallel", "orthogonal", "central", "concentric", "coaxial", etc.), unless specifically stated otherwise, not only express the positional relationship strictly, In the range where the function of accuracy is obtained, the state displaced with respect to an angle or distance shall also be shown. Expressions indicating equal status (e.g., "identical", "equal", "homogeneous", "matching", etc., unless stated otherwise, are not only quantitatively strictly equivalent but also have tolerances or the same degree of functionality. It shall also show the state in which the difference obtained exists. An expression representing a shape (for example, a "square shape" or a "cylindrical shape", etc.), unless specifically stated otherwise, not only expresses the shape geometrically, but also provides an example in a range where an effect of the same degree is obtained. For example, the shape which has an unevenness | corrugation, a chamfer, etc. shall also be shown. Unless otherwise mentioned, "to phase" includes the case where two elements are apart from each other in addition to the case where two elements are in contact.

<1. First embodiment>

FIG. 1: is a side view which shows typically the whole structure of the coating device 1 which is an example of the substrate processing apparatus of embodiment. 2 is a schematic plan view of the coating device 1 according to the embodiment as viewed from above in the vertical direction. 3 is a schematic plan view of the coating device 1 except for the coating mechanism 6 of the embodiment. 4 is a schematic cross-sectional view of the coating device 1 at a position along the A-A line shown in FIG. 2. 5 is a schematic plan view showing a part of the floating stage 3 of the embodiment.

The coating device 1 causes the rectangular substrate W to have a horizontal posture (upper surface Wf (first main surface) and lower surface (second main surface) of the substrate W parallel to the horizontal surface (XY plane). It is a slit coater which conveys to the upper surface Wf of the said board | substrate W, and apply | coats a process liquid (coating liquid) while conveying to a posture. In each figure, in order to make clear the positional relationship of each part of the coating device 1, the direction parallel to the conveyance direction D1 in which the board | substrate W is conveyed is made into "X direction", and the input conveyor 100 is carried out. The direction toward the output conveyor 110 is set to "+ X direction", and the reverse direction is set to "-X direction". The horizontal direction orthogonal to the X direction is referred to as "Y direction", the direction toward the front of FIG. 1 is referred to as "-Y direction", and the reverse direction is referred to as "+ Y direction". The vertical direction orthogonal to the X direction and the Y direction is referred to as the Z direction, and when viewed from the floating stage 3, the upward direction toward the application mechanism 6 side is referred to as the "+ Z direction" and the reverse direction as the "-Z direction". .

The basic configuration and operating principle of the coating device 1 are partially common or similar to those described in Japanese Unexamined Patent Application Publication Nos. 2010-227850 and 2010-240550. Therefore, in this specification, among the structures of the coating device 1, about the structure similar to what was described in these well-known documents, or can be easily inferred based on technical common sense etc., it may abbreviate | omit suitably.

The coating device 1 in order along the conveyance direction D1 (+ X direction) in which the board | substrate W is conveyed, the input conveyor 100, the input transfer part 2, and the floating stage ( 3), the output transfer part 4 and the output conveyor 110 are provided. These are arrange | positioned so that they may mutually adjoin, and the conveyance path | route of the board | substrate W is formed by these. In addition, in the following description, when showing a positional relationship with respect to the conveyance direction D1 which is a conveyance direction of the board | substrate W, "upstream of a 1st direction" is simply referred to as "upstream side," The downstream side of D1) may be abbreviated as "downstream side". In this example, the -X side is the "upstream side" and the + X side is the "downstream side" as viewed from any reference position.

The input conveyor 100 is equipped with the roller conveyor 101 and the rotation drive mechanism 102 which rotationally drives the roller conveyor 101. As shown in FIG. By rotation of the roller conveyor 101, the board | substrate W is conveyed to the downstream side (+ X side) in a horizontal attitude | position.

The input transfer part 2 is equipped with the roller conveyor 21 and the rotation drive mechanism 22 which rotates the roller conveyor 21. As shown in FIG. As the roller conveyor 21 rotates, the substrate W is conveyed in the + X direction. Moreover, the vertical position of the board | substrate W changes by the roller conveyor 21 raising and lowering. By the operation of the input transfer part 2, the board | substrate W is transferred to the floating stage 3 from the input conveyor 100.

The floating stage 3 includes three flat plate-like stages along the conveying direction D1. Specifically, the floating stage 3 includes an inlet floating stage 31, an application stage 32, and an outlet floating stage 33 in order along the conveying direction D1. The upper surface of each of these stages is on the same plane.

The inlet floating stage 31 and the outlet floating stage 33 each have upper surfaces 31S and 33S that are vertically upward planes (that is, planes in which the normal direction is the vertical direction). On each of the upper surfaces 31S and 33S, a plurality of jet ports 31h and 33h for blowing air (compressed air) supplied from the floating control mechanism 35 are formed in a matrix. The floating air is imparted to the board | substrate W by the compressed air blown out from each blowing port 31h, 33h, and the lower surface (second main surface) of the board | substrate W is the upper surface 31S of each stage 31, 33, In the state separated from 33S), the substrate W is supported in the horizontal position. The distance between the lower surface of the substrate W and the upper surfaces 31S and 33S of the stages 31 and 33 may be, for example, 10 to 500 µm (micrometer).

The application stage 32 has an upper surface 32S that is a plane in the vertical upward direction. The upper surface 32S is provided with a plurality of blowing holes 321h for blowing air (compressed air) and a plurality of suction ports 322h for sucking the atmosphere above the coating stage 32. In the upper surface 32S of the application stage 32, the jet port 321h and the suction port 322h are alternately formed along the X direction and the Y direction. The substrate W is provided with the floating force applied to the substrate W by the compressed air blown out from each jet port 321h, and the lower surface of the substrate W is separated from the upper surface 32S of the application stage 32. ) Is supported in a horizontal position.

The floating control mechanism 35 controls so that the blowing amount of the compressed air from each blowing port 321h and the suction amount of the atmosphere from each suction opening 322h are balanced. Thereby, the distance between the lower surface of the board | substrate W and the upper surface 32S of the application | coating stage 32 is precisely controlled. Therefore, the vertical position of the upper surface Wf of the substrate W passing above the coating stage 32 is controlled within a predetermined range. As the floating stage 3, the structure of the floating stage described in Unexamined-Japanese-Patent No. 2010-227850 may be employ | adopted.

The board | substrate W carried in to the floating stage 3 via the input transfer part 2 acquires the propulsion force to + X direction by rotation of the roller conveyor 21, and is conveyed on the inlet floating stage 31. . The conveyance of the board | substrate W in the floating stage 3 is performed by the conveyance shuttle 5.

The conveyance shuttle 5 is provided with the chuck 51 and the adsorption | running | working run control mechanism 52. As shown in FIG. The chuck 51 supports the substrate W from below by partially contacting the peripheral portion of the lower surface of the substrate W. The adsorption / run control mechanism 52 has a function of applying negative pressure to a suction pad formed at the support portion at the upper end of the chuck 51 and adsorbing and holding the substrate W on the chuck 51. Moreover, the adsorption | running | working run control mechanism 52 is equipped with the function which makes the chuck 51 reciprocately run linearly along an X direction.

In the state where the chuck 51 holds the substrate W, the lower surface of the substrate W is located on the + Z side than the upper surface of each stage 31, 32, 33 of the floating stage 3. The circumferential edge part is attracted and held by the chuck 51, and the board | substrate W maintains a horizontal position as a whole by the floating force provided from the floating stage 3. As shown in FIG.

The chuck 51 holds the substrate W carried in from the input transfer part 2 to the floating stage 3, and the chuck 51 moves in the + X direction in this state, whereby the substrate W moves to the inlet floating stage. It is conveyed from the upper side of the 31 above the exit floating stage 33 via the upper side of the application stage 32. The board | substrate W is turned over to the output transfer part 4 arrange | positioned at the + X side of the exit floating stage 33. As shown in FIG.

The output transfer part 4 is provided with the roller conveyor 41 and the rotation drive mechanism 42 which rotationally drives the said roller conveyor 41. As shown in FIG. As the roller conveyor 41 rotates, the driving force in the + X direction is applied to the substrate W, and the substrate W is conveyed in the conveying direction D1. By the operation of the output transfer portion 4, the substrate W is transferred to the output conveyor 110 from above the outlet floating stage 33.

The output conveyor 110 is equipped with the rotation drive mechanism 112 which rotates the roller conveyor 111. As shown in FIG. By rotation of the roller conveyor 111, the board | substrate W is conveyed to + X direction and carried out to the exterior of the coating device 1. The input conveyor 100 and the output conveyor 110 may be formed as part of the coating device 1, but may be separate from the coating device 1. For example, the input conveyor 100 may be a board | substrate carrying out mechanism of the other unit provided in the upstream of the coating device 1. Moreover, the output conveyor 110 may be the board | substrate accommodation mechanism of the other unit provided in the downstream of the coating device 1.

On the conveyance system path of the board | substrate W, the application | coating mechanism 6 which apply | coats a process liquid to the upper surface Wf of the board | substrate W is provided. The application mechanism 6 includes the nozzle unit 60 including the nozzle 61 for discharging the processing liquid, and the nozzles 61 each of the application position L11, the preliminary discharge position L13, and the cleaning position L14. A moving mechanism 63 for positioning at the position and a maintenance unit 65 for repairing the nozzle 61 are provided. In FIG. 1, the nozzle 61 in the preliminary discharge position L13 is shown by the solid line, and the nozzle 61 in the application | coating position L11 and the washing | cleaning position L14 is shown with the broken line, respectively.

The nozzle 61 is a member extending in the conveyance width direction D2 (Y direction) orthogonal to the conveyance direction D1. The lower end part of the nozzle 61 has the discharge port 611 extended in a conveyance width direction, and opened downward. The processing liquid is discharged from the discharge port 611.

The moving mechanism 63 moves the nozzle 61 in the X direction and the Z direction. The moving mechanism 63 positions the nozzle 61 at an application position L11 above the application stage 32. The process liquid is apply | coated to the board | substrate W by the nozzle 61 positioned in the application position L11 discharges a process liquid toward the upper surface Wf of the board | substrate W. As shown in FIG. The application position L11 is the position of the nozzle 61 at the time of performing application | coating.

The maintenance unit 65 includes a bat 651, a preliminary discharge roller 652, a nozzle cleaner 653, and a maintenance control mechanism 654. The bat 651 stores the cleaning liquid used for cleaning the nozzle 61. The maintenance control mechanism 654 controls the preliminary discharge roller 652 and the nozzle cleaner 653. As a structure of the maintenance unit 65, you may employ | adopt the same structure as the nozzle cleaning waiting unit of Unexamined-Japanese-Patent No. 2010-240550, for example.

The moving mechanism 63 positions the nozzle 61 at the preliminary ejection position L13 where the ejection opening 611 faces the surface above the preliminary ejection roller 652. The nozzle 61 discharges the processing liquid from the discharge port 611 to the surface of the preliminary discharge roller 652 at the preliminary discharge position L13 (preliminary discharge processing). The nozzle 61 is positioned at the preliminary ejection position L13 before positioning at the application position L11 described above, and performs the preliminary ejection process. Thereby, discharge of the process liquid to the board | substrate W is stabilized from an initial stage. When the maintenance control mechanism 654 rotates the preliminary discharge roller 652, the processing liquid discharged from the nozzle 61 is mixed with the cleaning liquid stored in the bat 651 and recovered.

The moving mechanism 63 positions the nozzle 61 at the cleaning position L14 whose front end portion (including the discharge port 611 and the region in the vicinity thereof) faces the nozzle cleaner 653 upward. In the state where the nozzle 61 is in the cleaning position L14, the nozzle cleaner 653 moves in the width direction (Y direction) of the nozzle 61 while discharging the cleaning liquid, thereby adhering to the tip portion of the nozzle 61. The liquid is washed off.

Although the coating mechanism 6 of this embodiment is equipped with only one nozzle 61, you may be equipped with the some nozzle 61. As shown in FIG. In this case, each nozzle 61 may be formed at intervals along the conveyance direction D1. Moreover, you may apply a different process liquid to the board | substrate W by supplying a different process liquid with respect to each nozzle 61. FIG. In addition, you may form the moving mechanism 63 and the maintenance unit 65 corresponding to each nozzle 61, respectively. Moreover, each nozzle 61 may use the single maintenance unit 65 in common.

As shown in FIG. 4, the nozzle unit 60 supports the beam member 631 extending in the Y direction from above the floating stage 3, and supporting both end portions of the beam member 631. It has a crosslinked structure including two pillar members 632 and 633. The pillar members 632 and 633 are formed upward from the base 10. The lifting mechanism 634 is attached to the pillar member 632, and the lifting mechanism 635 is attached to the pillar member 633, respectively. The lifting mechanisms 634 and 635 include a ball screw mechanism, for example. The lifting mechanisms 634 and 635 support the beam member 631. The + Y side end of the beam member 631 is attached to the lifting mechanism 634, and the -Y side end of the beam member 631 is attached to the lifting mechanism 635. The lifting mechanisms 634 and 635 cooperate with the control command from the control unit 9, and the beam member 631 is moved in the vertical direction (Z direction) with the horizontal posture.

The nozzle 61 of the posture which made the discharge port 611 the downward direction is attached to the center lower part of the beam member 631. By operating the lifting mechanisms 634 and 635, the movement in the vertical direction (Z direction) of the nozzle 61 is realized.

The pillar members 632 and 633 are configured to be movable on the base 10. Two travel guides 81L and 81R extending in the X direction are formed at the + Y side end and the -Y side end on the upper surface of the base 10. The pillar member 632 is engaged with the travel guide 81L on the + Y side via the slider 636 attached to the lower portion thereof, and the pillar member 633 is interposed with the slider 637 attached to the lower portion thereof. It is engaged with the traveling guide 81R on the Y side. The sliders 636 and 637 can move freely in the X direction along the travel guides 81L and 81R.

The pillar members 632 and 633 move in the X direction by the operation of the linear motors 82L and 82R. The linear motors 82L and 82R include a magnet module as a stator and a coil module as a mover. The magnet module is formed in the base 10 and extends in the X direction. The coil module is attached to each lower part of the pillar members 632 and 633. The mover of the linear motors 82L and 82R operates in accordance with the control command from the control unit 9, so that the entire nozzle unit 60 moves along the X direction. Thereby, the movement of the nozzle 61 to the X direction (conveying direction D1) is implement | achieved. The X direction positions of the pillar members 632 and 633 are detected by the linear scales 83L and 83R formed near the sliders 636 and 637.

In this way, the nozzle 61 moves in the Z direction by the operation of the lifting mechanisms 634, 635, and moves in the X direction by the operation of the linear motors 82L and 82R. That is, by the control unit 9 controlling the lifting mechanisms 634 and 635 and the linear motors 82L and 82R, positioning of the nozzle 61 to each stop position L11-L14 is implement | achieved. Therefore, the lifting mechanisms 634 and 635 and the linear motors 82L and 82R function as the moving mechanism 63 (refer FIG. 1).

The bat 651 is supported by the beam member 661 extending in the Y direction. Of both ends of the beam member 661, one end is supported by the pillar member 662, and the other end is supported by the pillar member 663. The pillar members 662 and 663 are attached to both ends of the Y direction of the plate 664 extending in the Y direction, respectively.

Below the both ends of the plate 664, two travel guides 84L and 84R are respectively extended in the X direction. Two travel guides 84L and 84R are formed on the upper surface of the base 10. The slider 666 is formed in the + Y side edge part of the both ends of the Y direction of the lower surface of the plate 664, and the slider 667 is formed in the -Y side edge part. The sliders 666 and 667 are engaged with the travel guides 84L and 84R and can move freely in the X direction.

The linear motor 85 is formed below the plate 664. The linear motor 85 includes a magnet module that is a stator and a coil module that is a mover. The magnet module is formed in the base 10 and extends in the X direction. The coil module is formed below the maintenance unit 65 (here, the plate 664).

The linear motor 85 operates according to the control command from the control unit 9, so that the entire maintenance unit 65 moves in the X direction. The X-direction position of the maintenance unit 65 is detected by the linear scale 86 formed in the vicinity of the sliders 666 and 667.

As shown in FIG. 4, the chuck 51 includes two chuck members 51L and 51R. The chuck members 51L and 51R have shapes symmetrical with respect to the XZ plane, and are disposed apart in the Y direction.

The chuck member 51L disposed on the + Y side is supported by the travel guide 87L formed on the base 10 and extending in the X direction. The chuck member 51L includes two horizontal plate portions formed by different positions in the X direction, and a base portion 512 including a connecting portion for connecting these plate portions (see FIG. 2). The sliders 511 are formed one by one under the two plate portions of the base portion 512. The slider 511 is engaged with the travel guide 87L, whereby the chuck member 51L can travel in the X direction along the travel guide 87L.

On each of the upper portions of the two plate portions of the base portion 512, one support portion 513 is formed. The support part 513 is extended upward and has an adsorption pad (not shown) in the upper end part. When the base portion 512 moves in the X direction along the travel guide 87L, two support portions 513 move integrally with this in the X direction. In addition, the two plate portions of the base portion 512 are separated from each other, and by moving these plate portions while maintaining a constant distance in the X direction, the structure may function as an integral base portion in appearance. If this distance is set in accordance with the length of the substrate, it becomes possible to correspond to substrates of various lengths.

The chuck member 51L moves in the X direction by the linear motor 88L. The linear motor 88L includes a magnet module that is a stator and a coil module that is a mover. The magnet module is formed in the base 10 and extends in the X direction. The coil module is formed below the chuck member 51L. The linear motor 88L operates in accordance with the control command from the control unit 9, so that the chuck member 51L moves along the X direction. The X-direction position of the chuck member 51L is detected by the linear scale 89L formed in the vicinity of the travel guide 87L.

The chuck member 51R formed on the -Y side has a base portion 512 and two support portions 513, 513, similarly to the chuck member 51L. The shape of the chuck member 51R is symmetrical with the chuck member 51L with respect to the XZ plane. One slider 511 is formed in the lower part of the two plate parts of the base part 512 of 51C of chuck members. The slider 511 is engaged with the travel guide 87R, whereby the chuck member 51R can travel in the X direction along the travel guide 87R.

The chuck member 51R is movable in the X direction by the linear motor 88R. The linear motor 88R includes a magnet module as a stator formed in the base 10 while extending in the X direction, and a coil module as a mover formed below the chuck member 51R. The linear motor 88R operates in accordance with the control command from the control unit 9, so that the chuck member 51R moves in the X direction. The X-direction position of the chuck member 51R is detected by the linear scale 89R formed in the vicinity of the travel guide 87R.

The control unit 9 performs these position control so that the chuck members 51L and 51R may always be the same position in the X direction. As a result, the pair of chuck members 51L and 51R are visually moved as the integral chuck 51. Compared with the case of mechanically coupling the chuck members 51L and 51R, interference between the chuck 51 and the floating stage 3 can be easily avoided.

As shown in FIG. 3, four support parts 513 are each arrange | positioned corresponding to the four corners of the board | substrate W hold | maintained. That is, the two support parts 513 of the chuck member 51L hold the upstream end part and the downstream end part in the conveyance direction D1 as the + Y side peripheral edge part of the board | substrate W, respectively. Two support parts 513 and 513 of the chuck member 51R hold the upstream end part and the downstream end part in the conveyance direction D1 as the -Y side peripheral edge part of the board | substrate W, respectively. A negative pressure is supplied to the adsorption pad of each support part 513 as needed, and four corners of the board | substrate W are adsorbed-held from below by the chuck 51.

The substrate W is conveyed by moving the chuck 51 in the X direction while holding the substrate W. As shown in FIG. Thus, the mechanism (not shown) for supplying negative pressure to each support part 513 of the linear motors 88L and 88R functions as the adsorption / travel control mechanism 52 shown in FIG. 1.

As shown in FIG. 1 and FIG. 4, the chuck 51 holds the substrate W while falling upward from the upper surfaces of the inlet floating stage 31, the application stage 32, and the outlet floating stage 33. The chuck 51 carries the substrate W while holding the lower surface of the substrate W. As shown in FIG. The chuck 51 holds only a portion of the circumferential edge portion outside the Y direction from the center portion of the substrate W that faces each stage 31, 32, 33. For this reason, the center part of the board | substrate W was extended below the circumferential edge part. The floating stage 3 controls the vertical position of the board | substrate W by giving a floating force to the center part of the board | substrate W of this state, and hold | maintains the board | substrate W in a horizontal attitude | position.

The coating device 1 includes a plurality of substrate measuring machines 70 (here two). Each board | substrate measuring device 70 measures the vertical position of the upper surface Wf of the board | substrate W by which the floating force is given by the floating stage 3. In detail, the board | substrate measuring device 70 measures the vertical position of the upper surface Wf by measuring the distance from the reference position of the perpendicular direction already determined to the vertical position of the upper surface Wf. As each board | substrate measuring device 70, you may employ | adopt the reflection type sensor which non-contactsly measures the vertical position of the upper surface Wf using light, an ultrasonic wave, etc ..

The height of the upper surface Wf may be calculated from the height (vertical position) of the upper surface of the application stage 32 from the vertical position of the upper surface Wf measured by the substrate measuring device 70. Moreover, you may calculate the floating amount (distance from the upper surface of the application stage 32 to the lower surface of the floating substrate W) of the board | substrate W from the height of this upper surface Wf and the thickness of the board | substrate W. FIG.

Each substrate measuring device 70 is connected to the nozzle 61 by a connector 72. One of both ends of the connector 72 has a structure which can be attached to the side surface of the upstream of the nozzle 61, and the other end has a structure which can be attached to the board | substrate measuring device 70. As shown in FIG. Each board | substrate measuring device 70 is arrange | positioned at the upstream (-X side) rather than the nozzle 61 by being supported by the connection tool 72.

Since each board | substrate measuring device 70 is connected to the nozzle 61 by the connector 72, it moves following the nozzle 61 and moves. That is, when the nozzle 61 moves in the horizontal direction or the vertical direction by the moving mechanism 63, each substrate measuring device 70 also follows this and moves in the same direction.

Each board | substrate measuring device 70 is arrange | positioned at the predetermined measurement position above the application | coating stage 32 by the moving mechanism 63. FIG. With each board | substrate measuring device 70 arrange | positioned at a measurement position, each board | substrate measuring device 70 measures the vertical position of the upper surface Wf of the board | substrate W. As shown in FIG.

As shown in FIG. 4, two substrate measuring devices 70 are formed at intervals shorter than the width (length in the width direction) of the substrate W in the conveying width direction D2. By providing these two board | substrate measuring machines 70, it is possible to measure the vertical position of two points which differ in the width direction in the board | substrate W. As shown in FIG. In addition, the board | substrate measuring device 70 is not limited to two pieces, One or three or more may be formed.

<Stage measuring jig (8)>

6 is a schematic plan view showing the stage measuring jig 8 of the embodiment. 7 is a schematic front view showing the stage measuring jig 8 of the embodiment. 8 is a schematic plan view of the stage measuring jig 8 of the embodiment. The stage measuring jig 8 is an apparatus which measures the vertical position of each upper surface 31S-33S of the floating stage 3 (stages 31-33). Here, the stage measuring jig 8 is used for the purpose of planarizing each upper surface 31S-33S.

The stage measuring jig 8 is equipped with the connection part which connects five stage measuring devices 81 and each stage measuring device 81 to the conveyance shuttle 5. In this embodiment, the connection part is comprised by the bridge | crosslinking structure 83 and the connector 841,843.

Each stage measuring device 81 measures the vertical position of the upper surface of the floating stage 3. As each stage measuring device 81, you may employ | adopt the reflection type sensor which non-contactsly measures the vertical position of upper surface 31S-33S using light, an ultrasonic wave, etc ..

The bridge | crosslinking structure 83 is arrange | positioned above the floating stage 3, and extends in the perpendicular direction from each of the beam part 831 extended in the conveyance width direction D2, and the + Y side edge part and the -Y side edge part of the beam part 831. Two support portions 832 and 833 extending downward. The beam part 831 extends in the conveyance width direction D2 longer than the floating stage 3, and each support part 832, 833 is arrange | positioned in the both sides of the conveyance width direction D2 of the floating stage 3, respectively. do.

Each stage measuring device 81 is attached to one side surface 831S in the conveying direction D1 of the beam unit 831. Each stage measuring device 81 is formed within the range inside of both ends of the conveyance width direction D2 of the floating stage 3, and is formed at predetermined intervals in the conveyance width direction D2.

The lower end part of the support part 832 is separably fixed to the upper surface of the base part 512 of the chuck member 51R which the conveyance shuttle 5 is equipped with by the connector 841. The lower end part of the support part 833 is separably fixed to the upper surface of the base part 512 of the chuck member 51L with which the conveyance shuttle 5 is equipped by the connector 843. The connector 841, 843 may be configured to include fastening means such as bolts, for example. The support portions 832 and 833 are fixed to the respective base portions 512, so that the beam portion 831 is between the two support portions 513 and 513 arranged in the conveying direction D1 of each of the chuck members 51R and 51L. Is placed in the position of.

In the state where the support parts 832 and 833 are fixed to each base part 512, when the conveyance shuttle 5 moves the chuck members 51R and 51L in the conveyance direction D1, the bridge | crosslinking structure 83 will be carried out. Moves in the conveying direction D1. Thereby, each stage measuring device 81 attached to the bridge | crosslinking structure 83 moves to the conveyance direction D1.

The connector 841, 843 is comprised so that attachment of the holding | maintenance part 832, 833 to each position which biases each of the upstream and downstream of each base part 512 is possible. The crosslinked structure 83 is fixed to the position near the upstream side (see FIG. 6) and the position near the downstream side (see FIG. 8) with respect to the transport shuttle 5.

The support part 832 is comprised so that fixation is possible not only to the base part 512 of 51R of chuck members, but also to the base part 512 of 51L of chuck members by the coupling tool 841. Moreover, the support part 833 is comprised so that fixation is possible not only to the base part 512 of 51L of chuck members but also to the base part 512 of 51R of chuck members by the coupling tool 843. When each of the support parts 832 and 833 is fixed to each base part 512 of the chuck members 51R and 51L, the side surface 831S of the beam part 831 faces the upstream side (-X side) ( 6), when fixed to the respective base portions 512 of the chuck members 51L and 51R, the side surface 831S of the beam portion 831 faces the downstream side (−X side) (see FIG. 8).

In the example shown in FIG. 6, the crosslinked structure 83 is fixed to a position near the upstream side with respect to the transport shuttle 5. In addition, in the example shown in FIG. 6, the side surface 831S (side surface with which each stage measuring device 81 is attached) of the beam part 831 is facing upstream.

When the conveyance shuttle 5 moves the whole range which can be moved in this state, the range of the conveyance direction D1 which each stage measuring device 81 can measure a vertical position is near the upstream of the floating stage 3. It is set as the 1st measuring range RA1. The first measurement range RA1 is a part of the upstream side of the entire surface of each of the upper surfaces 31S and 32S of the inlet floating stage 31 and the application stage 32 and the upper surface 33S of the outlet floating stage 33. To cover.

As shown in FIG. 6, each stage measuring device 81 is arrange | positioned upstream of the beam part 831, and the upstream end part (specifically, in the inlet floating stage 31) of the upper surface of the floating stage 3 is shown. With respect to the upstream end portion, the measurement of the vertical position becomes easy.

As shown in FIG. 8, the bridge | crosslinking structure 83 is attached to the conveyance shuttle 5 in the attitude | position which made the side surface with which each stage measuring device 81 in the beam part 831 mounted toward the conveyance direction upstream side. have. In the example shown in FIG. 8, the crosslinked structure 83 is fixed to the position near the downstream side with respect to the conveyance shuttle 5. Moreover, in the example shown in FIG. 8, the side surface 831S of the beam part 831 is facing downstream. In this state, when the conveyance shuttle 5 moves the whole range which can be moved, the range of the conveyance direction D1 which can be measured by each stage measuring device 81 is made near the downstream of the floating stage 3, It becomes 2 measurement range (RA2). The second measurement range RA2 is a part of the downstream side of the entire surface of each of the upper surfaces 32S and 33S of the application stage 32 and the outlet floating stage 33 and the upper surface 31S of the inlet floating stage 31. To cover.

The first and second measurement ranges RA1 and RA2 include regions that overlap in the conveyance direction D1. For this reason, the inclination of all the upper surfaces 31S-33S of the floating stage 3 can be measured by measuring a vertical position with respect to both 1st and 2nd measurement range RA1, RA2. In addition, about the overlapping area | region of 1st and 2nd measurement range RA1 and RA2, it is not essential to measure twice, and it only needs to measure once.

As shown in FIG. 8, each stage measuring device 81 is arrange | positioned downstream of the beam part 831, and the downstream end part (specifically, in the exit floating stage 33) of the upper surface of the floating stage 3 is shown. With respect to the downstream end of the upper surface 33S), the vertical position can be easily measured.

As shown in FIG. 7, the coating device 1 forms an adjustment mechanism 13 for adjusting the vertical position of the upper surfaces (upper surfaces 31S, 32S, 33S) of the floating stage 3. The adjustment mechanism 13 includes a plurality of leveling bolts 131 for supporting the respective upper surfaces 31S to 33S, and a support plate 133 for supporting each leveling bolt 131. Each leveling bolt 131 supports each stage 31 to 33 of the floating stage 3 from below. Each leveling bolt 131 is formed at predetermined intervals in the X direction and the Y direction. Here, five rows (lines) composed of the leveling bolts 131 formed at intervals in the conveying direction D1 are formed at intervals in the conveying width direction D2.

Each stage 31 to 33 of the floating stage 3 is supported at a plurality of points by the respective leveling bolts 131. Each leveling bolt 131 is moved up and down in the vertical direction by being rotated. That is, by adjusting the vertical position of one leveling bolt 131, the vertical position of any part (target part) of the stages 31-33 which the said leveling bolt 131 supports is changed. By adjusting the vertical position of each leveling bolt 131, leveling of each upper surface 31S-33S of each stage 31-33 is attained.

As shown in FIGS. 6-8, each stage measuring device 81 is formed in the position corresponding to the row (line) of the leveling bolt 131 arranged in the conveyance direction D1. That is, each stage measuring device 81 is formed in the position which can measure the vertical position of the target part whose vertical position is adjusted by each leveling bolt 131 of each upper surface 31S-33S.

By measuring the vertical position of each target part corresponding to each leveling bolt 131 with each stage measuring device 81, the shift | offset | difference of the vertical position of each target part can be measured. In this case, since the vertical position of each target part can be adjusted so that it may become a predetermined vertical position, leveling of each upper surface 31S-33S of the floating stage 3 can be performed with good precision.

In this embodiment, although the connection part which connects each stage measuring device 81 to the conveyance shuttle 5 is comprised by the door-shaped bridge | crosslinking structure 83, this is not essential. For example, the beam part 831 may be supported by the cantilever shape by omitting one of the support parts 832 and 833 of the both ends of the beam part 831. In this case, each stage measuring device 81 can be moved by the power of any one of the two chuck members 51R and 51L.

9 is a schematic block diagram showing the control unit 9 of the embodiment. The coating device 1 includes a control unit 9 for controlling the operation of each part. The hardware configuration of the control unit 9 may be the same as a general computer. The control unit 9 displays a CPU 91 for performing various arithmetic processing, a ROM which is a memory for read output for storing basic programs, a freely readable memory 92 for storing various kinds of information, and various kinds of information. And a display unit 93 including a display.

The memory 92 includes, in addition to the main memory (RAM), a fixed disk for storing control applications (programs), data, and the like. The control unit 9 reads out an interface unit responsible for exchanging information with a user or an external device, and information (program) stored in a portable storage medium (optical media, magnetic media, semiconductor memory, etc.). You may be provided with the apparatus.

By operating according to the program, the CPU 91 operates the transfer shuttle 5 to move the stage measuring jig 8 in the conveying direction D1, and the five stages provided in the stage measuring jig 8. The vertical position of the floating stage 3 is measured by the measuring device 81. CPU 91 aggregates the measurement result which each stage measuring device 81 outputs, and stores | stores in memory 92. The measurement result of the vertical position of the floating stage 3 may be displayed on the display unit 93 as appropriate.

<Action explanation>

FIG. 10: is a figure which shows the process flow which measures and adjusts the vertical position of each upper surface 31S-33S of the floating stage 3. As shown in FIG. The processing flow described below is an example and is not limited thereto.

First, as shown to FIG. 6 and FIG. 7, the stage measuring jig 8 is attached to the conveyance shuttle 5 (step S10). In detail, the support parts 832 and 833 are fixed to the upper surface of each base part 512 of the chuck members 51R and 51L. Thereby, each stage measuring device 81 is connected to the conveyance shuttle 5 via the bridge | crosslinking structure 83 which is a connection part.

Then, the control unit 9 controls the conveyance shuttle 5 and each stage measuring device 81, and measures the vertical position of the upper surface 31S-33S of the floating stage 3 (step S11). By this process, as shown in FIG. 6, distribution of the vertical position in the 1st measurement range RA1 of an upstream side in the floating stage 3 is acquired. The control unit 9 may display the measurement result (distribution of the vertical position) on the display unit 93 as appropriate.

Based on the measurement result obtained in step S11, the operator determines whether or not to adjust the inclination (step S12). In addition, the control unit 9 may determine whether the inclination adjustment is necessary based on the measurement result of the vertical position and the predetermined determination criteria. When adjustment of the inclination is necessary, the control unit 9 may display the effect. When the inclination adjustment is necessary (YES in step S12), the operator adjusts the vertical position in accordance with the measurement result of the vertical position (step S13). Specifically, the shift of the vertical position is appropriately adjusted by operating the leveling bolt 131 corresponding to the point where adjustment is necessary. Thereby, leveling of each upper surface 31S-33S of the floating stage 3 is performed. In addition, the measurement and adjustment of the vertical position of the part which is not contained in 1st measurement range RA1 among the upper surface 33S of exit floating stage 33 are performed in step S18 mentioned later.

When the adjustment of the inclination is completed or when the adjustment of the inclination is unnecessary (NO in step S12), the operator decides whether to re-measure the vertical position of the upper surfaces 31S to 33S of the floating stage 3. It judges (step S14). If it is determined that re-measurement is necessary (YES in step S14), each process of steps S11 to S13 is executed again. In addition, instead of executing step S14, for example, steps S11 to S13 may be repeatedly executed for a predetermined number of times.

When re-measurement is not performed (NO in step S14), the mounting position of the stage measuring jig 8 is changed (step S15). In detail, as described in FIG. 8, the stage measuring jig 8 is mounted at a position near the downstream side of the transfer shuttle 5. Moreover, the support part 832 is attached to the base part 512 of 51L of chuck members, and the support part 833 is attached to the base part 512 of 51R of chuck members. Thereby, since the side surface 831S of the beam part 831 is directed downstream, each stage measuring device 81 is arrange | positioned downstream from the beam part 831.

Then, the control unit 9 controls the conveyance shuttle 5 and each stage measuring device 81, and measures the vertical position of the upper surfaces 31S-33S of the floating stage 3 (step S16). By this process, as shown in FIG. 8, distribution of the vertical position in the 2nd measurement range RA2 of the downstream side of the floating stage 3 is acquired. The control unit 9 may display the measurement result (distribution of the vertical position) on the display unit 93 as appropriate.

Based on the measurement result obtained in step S16, the operator determines whether or not to adjust the inclination (step S17). The control unit 9 may determine whether the inclination adjustment is necessary based on the measurement result of the vertical position and the predetermined determination criteria. When adjustment of the inclination is necessary, the control unit 9 may display the effect. When the inclination adjustment is necessary (YES in step S17), the operator adjusts the vertical position in accordance with the measurement result of the vertical position (step S18). Specifically, the shift of the vertical position is appropriately adjusted by operating the leveling bolt 131 corresponding to the point where adjustment is necessary. Thereby, leveling of each upper surface 31S-33S of the floating stage 3 is performed. In addition, the measurement and adjustment of the vertical position of the part which is not contained in 2nd measuring range RA2 among the upper surface 33S of exit floating stage 33 are performed in the previous step S13.

When the adjustment of the inclination is completed, or when the adjustment of the inclination is unnecessary (NO in step S17), the operator is allowed to set the upper surface 31S to 33S of the floating stage 3 (however, the second measurement range RA2). It is judged whether or not to remeasure the vertical position of (in) (step S19). If re-measurement is required (YES in step S18), each process of steps S16 to S18 is executed again. Instead of executing step S19, for example, steps S16 to S18 may be repeatedly executed for a predetermined number of times.

By the above-mentioned each process, the measurement and adjustment process of each vertical surface 31S-33S vertical position of the floating stage 3 is completed. The inclination of each upper surface 31S-33S is correct | amended by carrying out planarization of each upper surface 31S-33S by this series of processes.

<Effect>

According to the stage measuring jig 8, each stage measuring device 81 is connected to the conveyance shuttle 5 formed in order to convey the board | substrate W in the coating device 1, and the stage measuring device 81 is conveyed in the conveyance direction ( Move to D1). For this reason, the distribution of the vertical position in the conveyance direction D1 of the floating stage 3 can be measured efficiently. Therefore, the inclination of each upper surface 31S-33S of the floating stage 3 can be measured efficiently.

Since the conveyance shuttle 5 which conveys the board | substrate W is a linear motion mechanism, each stage measuring device 81 can be moved with favorable precision in a conveyance direction D1. Therefore, the inclination of each upper surface 31S-33S of the floating stage 3 can be measured with good precision by connecting each stage measuring device 81 to the conveyance shuttle 5.

Each stage measuring device 81 is disposed at intervals in the conveying width direction D2. For this reason, distribution of the vertical position in each position different in the conveyance width direction D2 can be measured at once by moving each stage measuring device 81 in the conveyance direction D1. For this reason, the inclination of each upper surface 31S-33S of the floating stage 3 can be measured efficiently.

The crosslinked structure 83 is separable from each stage measuring device 81. For this reason, after adjustment of the inclination of the upper surface 31S-33S of the floating stage 3 is completed, the stage measuring jig 8 can be isolate | separated from the conveyance shuttle 5. Thereby, it can suppress that the stage measuring jig 8 interferes with the other element of the coating device 1. For example, the maintenance unit 65 of the application | coating mechanism 6 is arrange | positioned at the vertical position comparatively close to the floating stage 3. By removing the stage measuring jig 8, when the conveyance shuttle 5 conveys the substrate W for the coating process, it is possible to suppress the beam portion 831 from interfering with the maintenance unit 65.

<2. Modification>

As mentioned above, although embodiment was described, this invention is not limited to the above thing, A various deformation | transformation is possible.

For example, you may provide the movement mechanism which moves each stage measuring device 81 to the conveyance width direction D2 in the side surface 831S of the beam part 831 in the bridge | crosslinking structure 83. FIG. In this case, only the single stage measuring device 81 may be formed in the crosslinked structure 83. In this case, the vertical position distribution of each upper surface 31S-33S of the floating stage 3 can be measured by moving the stage measuring device 81 in a horizontal plane by the conveyance shuttle 5 and a moving mechanism. In addition, the two or more stage measuring devices 81 are attached to one connecting member to be integrated with each other, and the horizontal moving part moves the connecting members in the conveying width direction D2, thereby moving the stage measuring devices 81 to the conveying width. You may move integrally in the direction D2.

Moreover, in the said embodiment, each stage measuring device 81 is connected to the conveyance shuttle 5 used for conveyance of the board | substrate W. As shown in FIG. However, you may form the moving part which moves the stage measuring jig 8 to a conveyance direction D1 apart from the conveyance shuttle 5. As the moving part, for example, the nut member on the slider side is screwed in addition to the same configuration as that of the linear motor mechanism (the driving guides 87L and 87R and the linear motors 88L and 88R) included in the transfer shuttle 5. The motorized slider mechanism etc. which drive a screw shaft by rotation of a servo motor can be employ | adopted.

Although this invention was demonstrated in detail, the said description is an illustration in all the aspects, Comprising: This invention is not limited to it. It is construed that numerous modifications not illustrated are contemplated without departing from the scope of this invention. Each configuration described in the above embodiments and each modification can be combined or omitted as long as they do not contradict each other.

1: coating device
13: adjusting mechanism
131: leveling bolt
133: support plate
3: injury stage
31: entrance injury stage
32: application stage
321h: outlet
322h: suction port
33: exit injury stage
31S, 32S, 33S: Top
31h, 33h: Outlet
35: injury control mechanism
5: bounce shuttle
6: coating device
8: stage measuring jig
81: stage meter
83: crosslinked structure
831: beam portion
831S: Side
832, 833: holding part
841, 843: End Connection
D1: conveying direction
D2: conveying width direction
W: Substrate

Claims (7)

Stage measurement jig which measures the vertical position of the upper surface which is the plane which the floating stage which gives a floating force to the board | substrate conveyed by the conveyance shuttle already by the conveyance shuttle, and which is a vertical direction upward direction in which the some hole which ejects air is formed. as,
At least one stage measuring device for measuring a vertical position of the upper surface of the floating stage,
And a connecting portion for connecting the stage measuring device to the conveying shuttle so as to be movable in the conveying direction. The method of claim 1,
The connecting portion,
A beam portion extending in a conveying width direction perpendicular to the conveying direction and supporting the stage measuring device above the upper surface;
And a connector for detachably connecting the beam unit with respect to the transport shuttle. The method according to claim 1 or 2,
The vertical position of the target part which is a part of the said upper surface is adjustable by the adjustment mechanism provided in the floating stage,
The stage measuring jig, wherein the stage measuring device is formed at a position capable of measuring the vertical position of the target portion. The method according to claim 1 or 2,
The stage measuring jig | tool with which the said several stage measuring machine is formed at intervals in the conveyance width direction orthogonal to the said conveyance direction. An application device for applying a processing liquid to a substrate,
A conveyance shuttle for conveying the substrate in a predetermined direction;
A floating stage which imparts floating force to the substrate conveyed in the conveying direction by ejecting air from a plurality of holes formed in the upper surface in the vertical upward direction,
An air supply unit for supplying the air;
At least one stage measuring device for measuring a vertical position of the upper surface,
A connecting portion for connecting the stage measuring device to the transport shuttle so as to be movable in the transport direction;
An adjusting tool for adjusting the vertical position of the target portion that is part of the upper surface;
And a nozzle for discharging the processing liquid toward the substrate conveyed in the conveying direction by the conveying shuttle. Stage measuring method of measuring the vertical position of the upper surface which is the plane which the floating stage which gives a floating force to the board | substrate conveyed by the conveyance shuttle already in the predetermined conveyance direction, and which is a vertical direction upward direction in which the some hole which blows out air is formed. As
(a) connecting the stage measuring device to the conveyance shuttle via a connecting portion;
(b) moving the stage measuring device in the conveying direction by the power of the conveying shuttle;
(c) In the said process (b), the stage measuring method including the process of measuring the vertical position of a part different from the said conveyance direction in the said upper surface by the said stage measuring device which moves to the said conveyance direction. As a stage measurement jig which measures the vertical position of the upper surface which is the plane which the floating stage which gives a floating force to the board | substrate conveyed in a predetermined conveyance direction, and which is a vertical direction upward direction in which the some hole which blows out air is formed,
At least one stage measuring device for measuring a vertical position of the upper surface of the floating stage,
A stage measuring jig including a moving unit for moving the stage measuring unit in the conveying direction.

Images