KR20200018009A - Method for Manufacturing Touch Panel of Metal-mesh Structure - Google Patents

Abstract

The present invention relates to a method for manufacturing a touch panel of a metal-mesh structure. The method for manufacturing a touch panel of a metal-mesh structure provides a touch panel capable of minimizing the occurrence of moire patterns, reducing haze and improving transmittance to secure excellent optical characteristics by forming a metal mesh pattern (ultrafine metal mesh pattern) by using only one film in forming a metal mesh through a photolithography process, and enabling precise alignment. The method for manufacturing a touch panel of a metal-mesh structure comprises the steps of: forming a first metal layer; forming a second metal layer; patterning the first metal layer; and patterning the second metal layer.

Description

Method for manufacturing touch panel of metal mesh structure {Method for Manufacturing Touch Panel of Metal-mesh Structure}

The present invention relates to a touch panel and a display device including the same, and more particularly, to a touch panel having a metal mesh structure and a display device including the same.

Among touch panel-applied displays, various methods of manufacturing a touch panel capable of replacing indium tin oxide (ITO) in medium and large applications of 10 inches or more have been attempted. Among them, the most successful method is a metal mesh manufacturing method.

Metal mesh formation methods include gravure offset printing, nano-imprint, ag nanowire, and photolithography using liquid photoresist (PR). Since the structure, the moiré pattern in which the wave pattern is visually recognized may occur due to the interference of the line width of the pattern, the shape of each line pattern, and the lattice structure of the display pixel.

For example, conventionally, a metal mesh is formed on two sheets of film, and then, each film is laminated to produce a touch panel, thereby causing a problem in that the moire pattern becomes severe according to the alignment state. In addition, considering that the distance between each line pattern in the metal mesh structure is 200 ~ 300 ㎛ there was a limit to achieve a certain level of alignment of less than 100 ㎛ as a limitation of equipment specifications.

In order to solve this problem, the most basic thing is to precisely align the mesh pattern constituting the touch panel.

In order to achieve the above technical problem, the present invention, by forming the metal mesh pattern (ultrafine metal mesh pattern) using only one film in forming the metal mesh using a photolithography process, by generating a moiré pattern by enabling precise alignment It is an object of the present invention to provide a touch panel capable of minimizing and securing excellent optical characteristics such as reducing haze and improving transmittance.

In order to achieve the above technical problem, a method of manufacturing a touch panel of the present invention includes: forming a first metal layer on a first surface of a target substrate; Forming a second metal layer on a second surface opposite the first surface; Patterning the first metal layer to form a first pattern including a first sensing electrode pattern; And patterning the second metal layer to form a second pattern including a second sensing electrode pattern at a predetermined position relative to the first pattern, wherein the sheet of opaque metal is formed on the target substrate. A metal mesh for a translucent touch screen is formed by forming the first pattern and the second pattern based on an exposure process, and the first pattern is based on an exposure process using an alignment mark formed on the target substrate. It is characterized in that the alignment of the second pattern relative to the.

In the patterning of the first metal layer, the second metal layer may be attached to the fixing substrate using a transparent adhesive film, and then the first pattern may be formed based on the exposure process of the first metal layer.

In the patterning of the second metal layer, a protective film is attached on the first surface on which the first sensing electrode pattern is formed, and the target substrate on which the protective film is attached is separated from the transparent adhesive film of the fixing substrate. After re-attaching the protective film on the transparent adhesive film, the second pattern may be formed based on the exposure process of the second metal layer.

By using the alignment mark, an alignment error between the first pattern and the second pattern may be 10 μm or less.

In the step of forming the second metal layer, in the step of depositing a metal layer so as not to deposit the metal layer in the area of the alignment mark size or more of the second surface corresponding to the alignment mark, and patterning the second metal layer, Patterning may be performed using the alignment marks formed or exposed by patterning the first metal layer.

For example, a shadow mask may be installed in the metal deposition equipment to prevent the deposition of the metal layer in the region corresponding to the alignment mark. Alternatively, a masking tape may be attached to the region corresponding to the alignment mark and then deposited by metal deposition equipment so that there is no deposition of the metal layer in the region corresponding to the alignment mark.

Furthermore. And prior to patterning the second metal layer, removing the second metal layer on an area equal to or larger than the alignment mark of the second surface corresponding to the alignment mark based on an exposure process, wherein the second metal layer is removed. In the patterning of the second metal layer, patterning may be performed using the alignment mark formed or exposed by patterning the first metal layer.

Furthermore, the alignment mark is formed in advance on the first surface or the second surface of the target substrate before the first metal layer and the second metal layer are formed, and patterning the first metal layer. In the step of patterning the second metal layer, patterning may be performed using the alignment mark.

Each of the first pattern and the second pattern for the metal mesh may include a wiring pattern connected to each corresponding sensing electrode pattern in addition to the corresponding sensing electrode pattern, for wiring to a circuit.

Formation of the first metal layer and the second metal layer may include physical vapor deposition (PVD) including thermal evaporation deposition, sputtering deposition, or ion-beam assisted deposition. Vapor Deposition) may be performed.

The target substrate may be made of any one material of polyethylene terephthalate (PET), polyethylene naphthalate (PEN) or polyimide (PI).

The target substrate may be a substrate having heat resistance at 150 ° C. or lower, and the target substrate may have a transmittance of 90% or more and a diffusion transmittance of incident light of 1 or less, and the thickness of the target substrate may be 23 to 100 μm. Can be.

The pitch of the first sensing electrode pattern and the second sensing electrode pattern may be 100 to 400 μm, and the maximum line width of the first sensing electrode pattern and the second sensing electrode pattern constituting the mesh pattern may be 5 μm or less.

The sheet resistance of the first metal layer and the second metal layer may be 0.3 ~ 0.01 Ω / sq.

The first metal layer and the second metal layer may be formed in a two-layer structure in which a metal layer and a metal oxide layer are sequentially stacked.

The metal layer and the metal oxide layer may include a copper layer and a copper oxide layer.

The thickness of the metal layer may be 1000 to 10,000 kPa, and the thickness of the metal oxide layer may be 100 to 1000 kPa. The diffuse reflectance of the metal oxide layer may be 10% or less.

According to the present invention, a touch panel having a metal mesh structure is manufactured based only on a photolithography process using only a single insulating film, so that alignment between upper and lower metal patterns is excellent, resulting in minimizing moire patterns and haze. It is possible to secure excellent optical characteristics such as reduction of haze and improvement of transmittance, and it can be applied to various applications such as tablet, NOTE PC, PC monitor, AIO (All in One), mobile terminal, etc. to perform excellent touch screen function. Can be.

That is, in the conventional metal mesh method, a touch panel having a metal mesh structure was manufactured by forming a metal pattern using two films, and then laminating two films on which the pattern was formed. Due to the shrinkage ratio of the film and the limitation of the resolution of the alignment of the equipment in the lamination process, it was difficult to realize precise alignment between the patterns to overcome the moire pattern of the metal mesh. According to the present invention, since only one film is used, a lamination process between separate upper and lower substrates is excluded, and only a photolithography process is performed, thereby minimizing moire fringes, reducing haze, and improving transmittance. It can be secured.

1 is a flowchart illustrating a method of manufacturing a touch panel according to an embodiment of the present invention.
2 is a cross-sectional view of the substrate to be processed at each step corresponding to the flowchart of FIG. 1.
3 is a view for explaining the utilization of the alignment mark according to an embodiment of the present invention.
4 is a view for explaining pattern alignment in a substrate to be processed using alignment marks according to an exemplary embodiment of the present invention.
5 is a view for explaining alignment of sensing electrode patterns in a substrate to be processed according to an exemplary embodiment of the present invention.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

1 is a flowchart illustrating a method of manufacturing a touch panel according to an embodiment of the present invention. Hereinafter, referring to FIG. 2, which shows a cross-sectional view of the substrate to be processed 10 at each step of the flowchart of FIG. 1.

In the present invention, a metal mesh structure of a method of laminating using two substrates or films as in the prior art is not used, and an opaque metal material is used on one substrate or film 10 to be treated on the first surface based on an exposure process. A transmissive touch screen is formed by forming a first pattern (eg, Rx sensing electrode pattern and wiring pattern on the corresponding surface) and a second pattern (eg, Tx sensing electrode pattern and corresponding wiring pattern on the opposite side). Implement a metal mesh for

Metal mesh in the touch panel uses opaque metal electrodes such as copper, silver, and nickel in Rx / Tx sensing electrode patterns instead of ITO (Indium Tin Oxide), which is a conventional transparent electrode material. In addition, it means an ultra-fine metal mesh pattern that can secure transparency and resistance, etc., and is widely applied to medium-large and translucent touch screens. Metal mesh formation methods include manufacturing methods such as Gravure offset printing, Nano-imprint, Ag Nano Wire, Photolithography using liquid photoresist (PR), and in the present invention, a metal mesh structure is based on an exposure process. In addition, by forming a metal mesh pattern (ultra fine metal mesh pattern) using only one substrate or film 10 to be processed and enabling precise alignment, it is possible to minimize moiré pattern, reduce haze, and transmittance. It is possible to secure excellent optical characteristics such as improvement.

1 and 2, in the method of manufacturing a touch panel according to an embodiment of the present invention, a first pattern (eg, an Rx sensing electrode pattern and a corresponding wiring pattern on both surfaces of a substrate 10 to be processed) may be used. Etc.) and a second pattern (eg, a Tx sensing electrode pattern and a wiring pattern on a corresponding surface), steps S10 to S70 are included. Reference is made to cross-sectional views (a) to (g) of FIG. 2 for description of each step S10 to S70 of FIG. 1.

Hereinafter, the Tx sensing electrode is a transmission electrode or a transmission line that receives and transmits a driving signal through a wiring pattern of a corresponding surface, and the Rx sensing electrode is a receiving electrode or a reception line which receives a detection signal with a wiring pattern of a corresponding surface. When one of the Tx sensing electrode pattern and the Rx sensing electrode pattern is a horizontal pattern, the other is a vertical pattern. The Tx sensing electrode pattern and the Rx sensing electrode pattern are connected to a wiring pattern having low resistance conductivity formed of an opaque metal on the corresponding layer / surface at the bezel part, and the wiring pattern is connected to an external circuit or a processor so that the driving signal is transferred to the touch panel. And sense signals from the touch panel to an external circuit or processor. The touch panel of the present invention is preferably applied to a touch screen that senses a touch of a finger, an electrostatic pen, etc. in a capacitive manner, but is not limited thereto. In some cases, the touch panel includes a Tx sensing electrode pattern and an Rx sensing electrode pattern. In the case of implementing a touch screen such as a film, an ultrasonic wave, or an optical method, the present invention can be applied through a simple design change.

First, the first metal layer 11 is formed on the first surface of the target substrate 10 to be processed, and the second metal layer 12 is formed on the second surface opposite to the first surface (S10 of FIG. 1 and FIG. 2). (A)). The target substrate 10 may be in the form of a film made of a resin material such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polyimide (PI). In some cases, a transparent substrate or film such as glass or quartz may be used as the target substrate 10. In particular, the target substrate 10 has heat resistance at 150 ° C. or lower, transmittance of 90% or more, and diffusion transmittance of incident light is preferably 1 or less, and the thickness thereof may be 23 to 100 μm.

Formation of the first metal layer 11 and the second metal layer 12 may include physical vapor deposition including thermal evaporation deposition, sputtering deposition, or ion-beam assisted deposition. (PVD, Physical Vapor Deposition) can be performed.

The sheet resistance of the first metal layer 11 and the second metal layer 12 may be 0.3 to 0.01 dl / sq. In addition, the first metal layer 11 and the second metal layer 12 may be formed in a two-layer structure in which a metal layer (eg, a copper layer) and a metal oxide layer (eg, a copper oxide layer) are sequentially stacked. Here, although the copper layer and the copper oxide layer are described as an example of the metal layer and the metal oxide layer, other metal layers such as Mg, Co, Ti and the oxide film may be used as necessary. Here, the thickness of the metal layer in the two-layer structure may be 1000 ~ 10000 kPa, the thickness of the metal oxide film layer may be 100 ~ 1000 kPa. The diffuse reflectance of the metal oxide film layer is preferably 10% or less.

Next, as a preliminary preparation for patterning the first metal layer 11, the second metal layer of the target substrate 10 on the fixing substrate 20 using a transparent adhesive film 21 such as OCA (Optically Clear Adhesive). 12) is attached (S20 of FIG. 1, (b) of FIG. 2). The fixing substrate 20 is a support part / support for the progress of the process operation of the target substrate 10, and may be made of a suitable material for supporting the target substrate 10, such as glass, quartz, metal, and resin.

Next, the first metal layer 11 is patterned to form the first pattern 11a including the first sensing electrode (eg, Rx sensing electrode) pattern (S30 of FIG. 1 and FIG. 2C). . The patterning is performed based on an exposure process, that is, through a process of applying a PR (Photoresist) and photosensitive to leave only necessary parts and removing the remaining parts. In addition to the first sensing electrode (eg, Rx sensing electrode) pattern, the first pattern 11a may include a wiring pattern connected to the corresponding sensing electrode pattern as described above and for wiring to a circuit or a processor.

Next, as a preliminary preparation for patterning the second metal layer 12, the protective film 30 is attached on the first surface on which the first sensing electrode pattern is formed (S40 of FIG. 1, FIG. 2 (d)). . In addition, after separating the target substrate 10 with the protective film 30 from the transparent adhesive film 21 of the fixing substrate 20, the protective film on the transparent adhesive film 21 of the fixing substrate 20 The surface on the (30) side is reattached (S50 in Fig. 1, (e) in Fig. 2).

Next, the second metal layer 12 is formed to form the second pattern 12a including the second sensing electrode (eg, Tx sensing electrode) pattern at a predetermined position relative to the first pattern 11a. Patterning is performed (S60 in FIG. 1, (f) in FIG. 2). Here too, patterning is performed based on an exposure process, that is, through the process of applying and photosensitive photoresist (PR), leaving only the necessary parts and removing the remaining parts. In addition to the second sensing electrode (eg, Tx sensing electrode) pattern, the second pattern 12a may include a wiring pattern connected to the corresponding sensing electrode pattern as described above and for wiring to a circuit or a processor.

The first sensing electrode (eg, Rx sensing electrode) pattern and the second sensing electrode (eg, Tx sensing electrode) pattern are patterns in which a pattern having a predetermined shape is repeated horizontally or vertically, and the pitch of the pattern is 100 to 400. May be μm. In order to form a metal mesh pattern as an ultrafine metal mesh pattern, the maximum line width of the first sensing electrode (eg, Rx sensing electrode) pattern and the second sensing electrode (eg, Tx sensing electrode) pattern is preferably 5 μm or less.

After the first metal layer 11 and the second metal layer 12 are patterned in this manner, the first pattern 11a and the second metal layer 12 are attached onto the protective film 30 on the transparent adhesive film 21 of the fixing substrate 20. The target substrate 10 having the second pattern 12a is separated and completed (S70 in FIG. 1 and (g) in FIG. 2). As described above, the target substrate 10 having the first pattern 11a and the second pattern 12a includes a liquid crystal display device (LCD), a plasma display panel (PDP), and an organic light emitting display. Coupled between display panels, such as organic light emitting display devices (OLEDs) and electrophoretic display devices (EPDs), and certain protective covers such as glass, and connected to external processing circuits or processors to provide touch screen functionality Will be able to perform

On the other hand, by such patterning of the first metal layer 11 (S30 of FIG. 1, FIG. 2C) and patterning of the second metal layer 12 (S60 of FIG. 1, FIG. 2F), The alignment error (error is ZERO target) between the first pattern 11a and the second pattern 12a may be 10 μm or less.

To this end, a predetermined mark by the corresponding metal layer formed on the edge of the target substrate 10 at the time of patterning the first metal layer 11 (S30 of FIG. 1 and FIG. 2C) is formed on the second metal layer. It can be used as the alignment mark 115 for alignment at the time of patterning (S60 of FIG. 1, FIG. 2 (f)) of (12).

In addition, the alignment mark 115 may be previously formed on the target substrate 10 before forming the metal layers 11 and 12 and used for alignment. For example, when patterning the first metal layer 11 (S30 in FIG. 1, FIG. 2C) and patterning the second metal layer 12 (S60 in FIG. 1, FIG. 2F). The exposure mask used in the exposure process by using the alignment mark 115 previously formed on the first surface or the second surface of the target substrate 10 before the metal layers 11 and 12 are formed as shown in FIG. 3. By performing alignment (alignment), a pattern may be formed at a desired position.

As shown in FIG. 3, a plurality of touch panel patterns (first patterns and second patterns) are formed on the target substrate 10 at predetermined intervals, and after the final process is performed, each patterning part is cut one by one to produce a touch screen module. Can be used.

The use of such an alignment mark 115 will be described in more detail. The alignment mark 115 may be a mark formed of the corresponding metal layer at the time of patterning the first metal layer 11 (S30 of FIG. 1 and FIG. 2C), and before forming the metal layers 11 and 12. It may be a mark previously formed on any one surface of the substrate 10.

For example, the alignment mark 115 may be formed at the time of patterning the first metal layer 11 (S30 of FIG. 1 and FIG. 2C), and the alignment mark 115 may be a target substrate. In the case where the film is previously formed on one surface (eg, the first surface) of (10), the first metal layer 11 may be exposed at the time of patterning (S30 of FIG. 1 and FIG. 2C). However, when the alignment mark 115 formed in advance is used even when the first metal layer 11 is patterned (S30 in FIG. 1 and FIG. 2C), a shadow mask and a masking tape are used in a manner similar to the following. Alternatively, the alignment mark 115 may be exposed by using an exposure process or the like.

Accordingly, in order to use the alignment mark 115 formed or exposed by the patterning of the first metal layer 11 (S30 of FIG. 1 and FIG. 2C), the first substrate of the target substrate 10 may be used. The area corresponding to the alignment mark 115, that is, the size corresponding to the alignment mark 115 at the time of forming the second metal layer 12 on two surfaces (S10 of FIG. 1 and FIG. 2A). It is preferable to deposit the metal layer in the region 125 so that the metal layer is not deposited.

As shown in FIG. 4, a portion without deposition of a metal layer is present on the second surface of the target substrate 10 in the region 125 corresponding to the alignment mark 115 or larger, so that the opposite surface of the target substrate 10 exists. The alignment mark 115 may be visible on the second surface, and may be patterned using the alignment mark 115 at the time of patterning the second metal layer 12 (S60 of FIG. 1 and FIG. 2F). When the second metal layer 12 is formed on the second surface of the target substrate 10 (S10 in FIG. 1 and FIG. 2A), the metal layer may be formed in the region 125 corresponding to the alignment mark 115. In order to deposit the metal layer so that there is no deposition, a shadow mask 150 is installed in a metal deposition apparatus, that is, a predetermined PVD deposition apparatus, as shown in FIG. 5 to cover the region 125 to deposit the metal layer from the metal target. This can be done. In addition, the masking tape may be attached to the region 125 during the formation of the second metal layer 12 (S10 of FIG. 1 and FIG. 2A), and then deposition may be performed in the metal deposition apparatus.

Furthermore, even if the shadow mask 150 or the masking tape is not used as described above, the second area corresponding to the area 125 or more larger than the alignment mark size of the second surface corresponding to the alignment mark 115 based on the exposure process. After removing the metal layer 12 so that the alignment mark 115 is visible, the second metal layer 12 may be patterned (S60 of FIG. 1 and FIG. 2F). Such a method may be applied to the case where the second metal layer 12 is deposited on the entire opposite surface of the target substrate 10 on which the alignment mark 115 is present, or at least in an area of the opposite surface corresponding to the alignment mark 115. When the second metal layer 12 is deposited, a predetermined exposure mask may be added to etch the region 125 corresponding to the alignment mark 115 based on the exposure process.

The patterning of the first metal layer 11 (S30 of FIG. 1, FIG. 2C) and the patterning of the second metal layer 12 (S60 of FIG. 1, FIG. 2 of FIG. 2) using the alignment mark 115 as described above. f)), the alignment error (error is ZERO target) between the first pattern 11a and the second pattern 12a is preferably 10 µm or less. For example, when the alignment error between the first pattern 11a and the second pattern 12a is ZERO (zero), as shown in FIG. 6, a pattern (eg, an Rx sensing electrode) on one surface of the target substrate 10 is shown. The channel shapes 510 included in the pattern) and the channel shapes 520 included in the pattern (eg, the Tx sensing electrode pattern) on the opposite side of the target substrate 10 should be patterned at a predetermined position. do. In order to reduce moiré, starburst and the like, it is preferable to pattern the same channel shapes 520 on the opposite side in the center between the channel shapes 510 on one surface. 6 illustrates the shape of an exemplary pattern, and the shape of the Rx / Tx sensing electrode pattern may be formed in various forms such as two lines passing through one channel shape.

As described above, according to the present invention, a touch panel having a metal mesh structure is manufactured based only on a photolithography process using only a single insulating film, so that alignment between upper and lower metal patterns is excellent, and as a result, a moire pattern is obtained. And excellent optical characteristics such as reducing haze and improving transmittance, and applied to various applications such as tablet, NOTE PC, PC monitor, AIO (All in One), mobile terminal, etc. Can perform screen functions.

That is, in the conventional metal mesh method, a touch panel having a metal mesh structure was manufactured by forming a metal pattern using two films, and then laminating two films on which the pattern was formed. Due to the shrinkage ratio of the film and the limitation of the resolution of the alignment of the equipment in the lamination process, it was difficult to realize precise alignment between the patterns to overcome the moire pattern of the metal mesh. According to the present invention, since only one film is used, a lamination process between separate upper and lower substrates is excluded, and only a photolithography process is performed, thereby minimizing moire fringes, reducing haze, and improving transmittance. It can be secured.

Although the preferred embodiment of the present invention has been described above, the technical idea of the present invention is not limited to the above-described preferred embodiment, and may be variously implemented in a range without departing from the technical idea of the present invention specified in the claims. have.

Target substrate 10
First metal layer 11
First pattern 11a
Second metal layer 12
Second pattern 12a
Transparent Adhesive Film (21)
Protective film (30)
Align Mark (115)
Shadow Mask (150)

Claims (20)

Forming a first metal layer on a first surface of the target substrate;
Forming a second metal layer on a second surface opposite to the first surface;
Patterning the first metal layer to form a first pattern including a first sensing electrode pattern; And
Patterning the second metal layer to form a second pattern including a second sensing electrode pattern at a predetermined position relative to the first pattern;
By using the opaque metal material on the sheet of the target substrate to form the first pattern and the second pattern based on the exposure process to implement a metal mesh for a translucent touch screen,
And an alignment of the second pattern relative to the first pattern based on an exposure process using an alignment mark formed on the target substrate. The method of claim 1,
In the step of patterning the first metal layer,
And attaching the second metal layer to the fixing substrate using a transparent adhesive film, and then forming the first pattern based on the exposure process of the first metal layer. The method of claim 1,
In the step of patterning the second metal layer,
Attaching a protective film on the first surface on which the first sensing electrode pattern is formed;
After separating the target substrate to which the protective film is attached from the transparent adhesive film of the fixing substrate, after re-attaching the protective film on the transparent adhesive film based on the exposure process for the second metal layer 2 Manufacturing method of a touch panel which forms a pattern. The method of claim 1,
The alignment error between the first pattern and the second pattern by the use of the alignment mark is 10 ㎛ or less. The method of claim 1,
In the step of forming the second metal layer, the metal layer is deposited so that there is no deposition of the metal layer in the area of the alignment mark size or more of the second surface corresponding to the alignment mark,
In the step of patterning the second metal layer, a method of manufacturing a touch panel using the alignment mark formed or exposed by the patterning of the first metal layer. The method of claim 5,
Method of manufacturing a touch panel to install a shadow mask in the metal deposition equipment to prevent the deposition of a metal layer in the region corresponding to the alignment mark. The method of claim 5,
And attaching a masking tape to the region corresponding to the alignment mark and depositing the same with a metal deposition apparatus so that there is no deposition of a metal layer in the region corresponding to the alignment mark. The method of claim 1,
Before the patterning of the second metal layer, further comprising removing the second metal layer for an area equal to or larger than the alignment mark of the second surface corresponding to the alignment mark based on an exposure process;
In the step of patterning the second metal layer, a method of manufacturing a touch panel using the alignment mark formed or exposed by the patterning of the first metal layer. The method of claim 1,
The alignment mark is formed in advance on the first surface or the second surface of the target substrate before the first metal layer and the second metal layer are formed.
And patterning the first metal layer using the alignment mark in the patterning of the first metal layer and the patterning of the second metal layer. The method of claim 1,
The first pattern and the second pattern for the metal mesh may each include a wiring pattern connected to each corresponding sensing electrode pattern, in addition to the corresponding sensing electrode pattern, for wiring to a circuit. . The method of claim 1,
The said target substrate is a manufacturing method of the touch panel which has heat resistance at 150 degrees C or less. The method of claim 1,
The target substrate has a transmittance of 90% or more and a diffusion transmittance of incident light of 1 or less. The method of claim 1,
The thickness of the said target substrate is a manufacturing method of the touchscreen of 23-100 micrometers. The method of claim 1,
The pitch of the first sensing electrode pattern and the second sensing electrode pattern is 100 ~ 400㎛ manufacturing method of the touch panel. The method of claim 1,
The method of manufacturing a touch panel having a maximum line width of 5 μm or less between the first sensing electrode pattern and the second sensing electrode pattern forming a mesh pattern. The method of claim 1,
The sheet resistance of the first metal layer and the second metal layer is 0.3 ~ 0.01 Ω / sq. The method of claim 1,
The first metal layer and the second metal layer,
The manufacturing method of the touch panel formed in the 2-layered structure which laminated | stacked the metal layer and the metal oxide film layer sequentially. The method of claim 17,
The metal layer and the metal oxide layer is a touch panel manufacturing method comprising a copper layer and a copper oxide layer. The method of claim 17,
The thickness of the metal layer is 1000 ~ 10000 Pa, The thickness of the metal oxide film layer is 100 ~ 1000 Pa The manufacturing method of the touch panel. The method of claim 17,
The diffusion reflectance of the metal oxide layer is 10% or less manufacturing method of the touch panel.

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