KR20190139014A - pressure measurement unit and Apparatus for treating substrate with the unit - Google Patents

Abstract

The present invention relates to a pressure measuring apparatus, and more specifically, to an apparatus for measuring liquid pressure. A pressure measuring unit includes: a lower body formed with a flow path through which processing liquid flows; a pressure device measuring pressure of the processing liquid; and an upper body combined with the lower body and providing a space in which the pressure device is positioned, wherein the pressure device is fastened to one of the upper body and the lower body, is positioned to be spaced apart from the other one. The apparatus further includes a sealing member sealing a space between the pressure device and the other one. Pressure of the processing liquid is measured in the flow path area surrounded by the one, the sealing member and the pressure device. Therefore, the present invention can minimize damage applied to the pressure device from the body of the other one.

Description

Pressure measurement unit and Apparatus for treating substrate with the unit

The present invention relates to an apparatus for measuring pressure, and more particularly, to an apparatus for measuring the pressure of a liquid.

In order to manufacture a semiconductor device or a liquid crystal display, various processes such as photolithography, etching, ashing, ion implantation, and thin film deposition are performed on a substrate. In order to remove foreign substances and particles generated in each process, a cleaning process for cleaning the substrate is performed before or after each process.

As the cleaning process, various methods are used, such as discharging a chemical, discharging a processing liquid mixed with gas, or discharging a processing liquid provided with vibration to remove foreign substances and particles remaining on a substrate.

Among them, the method of discharging the treatment liquid using vibration may improve the cleaning power by controlling the treatment liquid in various sizes or increasing the flow rate of the treatment liquid. For this reason, the supply pressure of the treatment liquid is a basis for measuring the particle size and the flow rate of the treatment liquid, and a pressure gauge for measuring the pressure of the treatment liquid is essentially provided.

However, damage to the pressure gauge is caused by continued supply and stop of the treatment liquid, which may cause the pressure to be incorrectly measured or zeroed.

Korea Patent Publication 2002-0035392

An object of the present invention is to provide an apparatus capable of accurately measuring the pressure of a treatment liquid.

It is another object of the present invention to provide a device that can prevent the pressure gauge from being deformed due to damage to the pressure gauge.

Embodiments of the present invention relate to an apparatus for measuring pressure, and more particularly, to provide an apparatus for measuring the pressure of a liquid. The pressure measuring unit includes a lower body in which a flow path for processing liquid is formed, a pressure element for measuring the pressure of the processing liquid, and an upper body in combination with the lower body to provide a space in which the pressure element is located. The pressure element is fastened to either one of the upper body and the lower body and positioned to be spaced apart from the other, the apparatus further comprises a sealing member for sealing a space between the pressure element and the other one, the treatment The pressure of the liquid is measured in the flow path region surrounded by the one, the sealing member, and the pressure element.

The sealing member may support the pressure element under the pressure element in the interspace and may be provided with a material including elasticity. The upper body and the lower body are spaced apart from each other in a direction facing each other, the unit further comprises a fixing member for fixing a relative position between the upper body and the lower body, the fixing member is the flow path It may include a stopper ring having a contact surface in contact with the upper body and the lower body in an off position, and positioned between the upper body and the lower body such that the upper body and the lower body are spaced apart from each other. The stopper ring may be located higher than the flow path. The stopper ring may be provided of a material having a hardness less than that of the upper body or the lower body.

An insertion groove is formed at an outer side of the mounting space on the bottom of the upper body, and the lower body has a protrusion into which the insertion groove can be inserted, and an upper end of the protrusion may be positioned higher than the pressure element.

The apparatus for processing a substrate further includes a substrate support unit for supporting a substrate, a nozzle for supplying a processing liquid onto a substrate supported by the substrate support unit, a liquid supply line for supplying a processing liquid to the nozzle, and a processing liquid from the nozzle. And a pressure measuring unit installed in the liquid collecting line to recover the liquid discharge line and measuring a pressure of the processing liquid, wherein the pressure measuring unit includes a lower body in which a flow path through which the processing liquid flows is formed; And an upper body in combination with the lower body to provide a space in which the pressure element is located, wherein the pressure element is fastened to one of the upper body and the lower body, and to the other. Positioned spaced apart, the apparatus further comprises a sealing member for sealing a space between the pressure element and the other; The pressure of the treatment liquid is measured in the flow channel area surrounded by said any one of said sealing member, and the pressure element.

The sealing member may support the pressure element under the pressure element in the interspace and may be provided with a material including elasticity. The upper body and the lower body are spaced apart from each other in a direction facing each other, the unit further comprises a fixing member for fixing a relative position between the upper body and the lower body, the fixing member is the flow path It may include a stopper ring having a contact surface in contact with the upper body and the lower body in an off position, and positioned between the upper body and the lower body such that the upper body and the lower body are spaced apart from each other.

The stopper ring may be located higher than the flow path.

According to an embodiment of the present invention, the pressure element is positioned apart from the other of the upper body and the lower body by the sealing member, and the pressure element is supported by the sealing member. This can minimize damage to the pressure element from the other body.

In addition, according to an embodiment of the present invention, the stopper ring has a contact surface in contact with each body between the upper body and the lower body. This allows the relative position between the upper body and the lower body to be fixed even if damage is applied to the pressure measuring unit.

1 is a plan view showing a substrate processing apparatus according to an embodiment of the present invention.
2 is a cross-sectional view illustrating the substrate processing apparatus of FIG. 1.
3 is a cross-sectional view showing the liquid supply member of FIG.
4 is a bottom view of the nozzle member of FIG. 3.
5 is a cross-sectional view taken along the AA ′ direction of the nozzle member of FIG. 4.
6 is a cross-sectional view showing the pressure measuring unit of FIG. 3.

The embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be interpreted as being limited by the embodiments described below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape and the like of the components in the drawings are exaggerated to emphasize a more clear description.

Hereinafter, an example of the present invention will be described in detail with reference to FIGS. 1 to 6.

1 is a plan view schematically showing the substrate processing equipment of the present invention. Referring to FIG. 1, the substrate processing facility 1 includes an index module 10 and a process processing module 20. The index module 10 has a load port 120 and a transfer frame 140. The load port 120, the transfer frame 140, and the process module 20 are sequentially arranged in a row. Hereinafter, the direction in which the load port 120, the transfer frame 140, and the process module 20 are arranged is referred to as a first direction 12, and when viewed from the top, perpendicular to the first direction 12. The direction is called the second direction 14, and the direction perpendicular to the plane including the first direction 12 and the second direction 14 is called the third direction 16.

The carrier 18 in which the substrate W is accommodated is mounted in the load port 140. A plurality of load ports 120 are provided and they are arranged in a line along the second direction 14. The number of load ports 120 may increase or decrease depending on the process efficiency and footprint of the process module 20. The carrier 18 is formed with a plurality of slots (not shown) for accommodating the substrates W in a state in which the substrates W are disposed horizontally with respect to the ground. As the carrier 18, a front opening unified pod (FOUP) may be used.

The process module 20 has a buffer unit 220, a transfer chamber 240, and a process chamber 260. The transfer chamber 240 is arranged such that its longitudinal direction is parallel to the first direction 12. Process chambers 260 are disposed at both sides of the transfer chamber 240, respectively. At one side and the other side of the transfer chamber 240, the process chambers 260 are provided to be symmetrical with respect to the transfer chamber 240. One side of the transfer chamber 240 is provided with a plurality of process chambers 260. Some of the process chambers 260 are disposed along the length of the transfer chamber 240. In addition, some of the process chambers 260 are arranged to be stacked on each other. That is, the process chambers 260 may be arranged in an array of A X B on one side of the transfer chamber 240. Where A is the number of process chambers 260 provided in a line along the first direction 12, and B is the number of process chambers 260 provided in a line along the third direction 16. When four or six process chambers 260 are provided on one side of the transfer chamber 240, the process chambers 260 may be arranged in an array of 2 × 2 or 3 × 2. The number of process chambers 260 may increase or decrease. Unlike the above, the process chamber 260 may be provided only on one side of the transfer chamber 240. In addition, the process chamber 260 may be provided as a single layer on one side and both sides of the transfer chamber 240.

The buffer unit 220 is disposed between the transfer frame 140 and the transfer chamber 240. The buffer unit 220 provides a space in which the substrate W stays before the substrate W is transferred between the transfer chamber 240 and the transfer frame 140. The buffer unit 220 is provided with a slot (not shown) in which the substrate W is placed. A plurality of slots (not shown) are provided to be spaced apart from each other along the third direction 16. The buffer unit 220 has a surface facing the transfer frame 140 and a surface facing the transfer chamber 240 are opened.

The transfer frame 140 transports the substrate W between the carrier 18 seated on the load port 120 and the buffer unit 220. The transfer frame 140 is provided with an index rail 142 and an index robot 144. The index rail 142 is provided in parallel with the second direction 14 in the longitudinal direction thereof. The index robot 144 is installed on the index rail 142 and linearly moves in the second direction 14 along the index rail 142. The index robot 144 has a base 144a, a body 144b, and an index arm 144c. The base 144a is installed to be movable along the index rail 142. Body 144b is coupled to base 144a. The body 144b is provided to be movable along the third direction 16 on the base 144a. In addition, the body 144b is provided to be rotatable on the base 144a. The index arm 144c is coupled to the body 144b and provided to move forward and backward with respect to the body 144b. The plurality of index arms 144c are provided to be individually driven. The index arms 144c are stacked to be spaced apart from each other along the third direction 16. Some of the index arms 144c are used when the substrate W is conveyed from the process module 20 to the carrier 18, and some of the index arms 144c are transferred from the carrier 18 to the process module 20. ) Can be used to return. This can prevent particles generated from the substrate W before the process treatment from being attached to the substrate W after the process treatment while the index robot 144 loads and unloads the substrate W.

The transfer chamber 240 carries the substrate W between the buffer unit 220 and the process chamber 260 and between the process chambers 260. The transfer chamber 240 is provided with a guide rail 242 and a main robot 244. The guide rail 242 is disposed such that its longitudinal direction is parallel to the first direction 12. The main robot 244 is installed on the guide rail 242 and is linearly moved along the first direction 12 on the guide rail 242. The main robot 244 has a base 244a, a body 244b, and a main arm 244c. The base 244a is installed to be movable along the guide rail 242. Body 244b is coupled to base 244a. The body 244b is provided to be movable along the third direction 16 on the base 244a. In addition, the body 244b is provided to be rotatable on the base 244a. The main arm 244c is coupled to the body 244b, which is provided to be capable of moving forward and backward with respect to the body 244b. A plurality of main arms 244c are provided to be individually driven. The main arms 244c are stacked to be spaced apart from each other along the third direction 16.

In the process chamber 260, a substrate processing apparatus 300 that performs a cleaning process on the substrate W is provided. The substrate processing apparatus 300 may have a different structure according to the type of cleaning process to be performed. Alternatively, the substrate processing apparatus 300 in each process chamber 260 may have the same structure. Optionally, the process chambers 260 are divided into a plurality of groups, so that the substrate processing apparatuses 300 in the process chamber 260 belonging to the same group are identical to each other, and the substrate processing apparatuses in the process chamber 260 belonging to different groups are different. The structures of the apparatus 300 may be provided differently from each other.

2 is a cross-sectional view illustrating the substrate processing apparatus of FIG. 1. Referring to FIG. 2, the substrate processing apparatus 300 includes a housing 320, a spin head 340, a lifting unit 360, and a liquid supply unit 380. The housing 320 has a space in which a substrate treatment process is performed, and an upper portion thereof is opened. The housing 320 has an inner recovery container 322 and an outer recovery container 326. Each recovery container 322, 326 recovers different treatment liquids from among treatment liquids used in the process. The inner recovery container 322 is provided in an annular ring shape surrounding the spin head 340, and the outer recovery container 326 is provided in an annular ring shape surrounding the inner recovery container 322. The inner space 322a of the inner recovery container 322 and the space 326a between the inner recovery container 322 and the outer recovery container 326 are respectively treated with the inner recovery container 322 and the external recovery container 326. It functions as an inlet for inflow. Each recovery container 322, 326 is connected with recovery lines 322b, 326b extending vertically in the bottom direction thereof. Each recovery line 322b and 326b discharges the treatment liquid introduced through the respective recovery bins 322 and 326. The discharged treatment liquid may be reused through an external treatment liquid regeneration system (not shown).

The spin head 340 supports the substrate W and rotates the substrate W during the process. The spin head 340 is provided to the substrate support unit 340 that supports and rotates the substrate W. As shown in FIG. The spin head 340 has a body 342, a support pin 344, a chuck pin 346, and a support shaft 348. Body 342 has a top surface that is provided generally circular when viewed from the top. A support shaft 348 rotatable by the motor 349 is fixedly coupled to the bottom of the body 342.

The support pin 344 is provided in plurality. The support pins 344 are spaced apart at predetermined intervals from the edge of the upper surface of the body 342 and protrude upward from the body 342. The support pins 344 are arranged to have an annular ring shape as a whole by combining with each other. The support pin 344 supports the rear edge of the substrate W so that the substrate W is spaced apart from the upper surface of the body 342 by a predetermined distance.

A plurality of chuck pins 346 are provided. The chuck pins 346 are disposed farther from the support pins 344 in the center of the body 342. The chuck pins 346 are provided to protrude upward from the body 342. The chuck pins 346 support the sides of the substrate W so that the substrate W does not deviate laterally from the home position when the spin head 340 is rotated. The chuck pins 346 are provided to enable linear movement between the standby position and the support position along the radial direction of the body 342. The standby position is a position far from the center of the body 342 relative to the support position. When the substrate W is loaded or unloaded to the spin head 340, the chuck pins 346 are positioned at the standby position, and when the process is performed on the substrate W, the chuck pins 346 are positioned at the support position. The chuck pins 346 are in contact with the side of the substrate W at the support position.

The lifting unit 360 linearly moves the housing 320 in the vertical direction. As the housing 320 moves up and down, the relative height of the housing 320 relative to the spin head 340 changes. The lifting unit 360 has a bracket 362, a moving shaft 364, and a driver 366. The bracket 362 is fixedly installed on the outer wall of the housing 320, and the movement shaft 364 which is moved in the vertical direction by the driver 366 is fixedly coupled to the bracket 362. The housing 320 is lowered so that the spin head 340 protrudes above the housing 320 when the substrate W is placed on the spin head 340 or is lifted from the spin head 340. In addition, when the process is in progress, the height of the housing 320 is adjusted to allow the processing liquid to flow into the predetermined recovery container 360 according to the type of processing liquid supplied to the substrate W. Optionally, the lifting unit 360 may move the spin head 340 in the vertical direction.

The liquid supply unit 380 supplies the liquid onto the substrate W supported by the spin head 340. The liquid supply unit 380 may be provided in plural to supply various kinds of liquids or to supply the same kinds of liquids in various ways. The liquid supply unit 380 includes a support shaft 386, an arm 382, a nozzle member 400, and a liquid supply member 500. The support shaft 386 is disposed on one side of the housing 320. The support shaft 386 has a rod shape whose longitudinal direction is provided in the vertical direction. The support shaft 386 is rotatable by the drive member 388. Optionally, the support shaft 386 can be linearly moved and lifted in the horizontal direction by the drive member 388. An arm 382 is fixedly coupled to the upper end of the support shaft 386. Arm 382 supports nozzle member 400. The nozzle member 400 is located at the end of the arm 382. The arm 382 and the nozzle member 400 are swinged by the rotation of the support shaft 386. The nozzle member 400 is swingably moved to a process position and a standby position. Here, the process position is a position where the nozzle member 400 faces the substrate W, and the standby position is defined as a position out of the process position.

The nozzle member 400 supplies the processing liquid onto the substrate W. The nozzle member 400 discharges the processing liquid by an inkjet method. 3 is a bottom view illustrating the nozzle member of FIG. 2, and FIG. 4 is a cross-sectional view of the nozzle member of FIG. 3 taken along the line AA ′. 3 and 4, the nozzle member 400 includes a body 405 and a vibrator 450.

The body 405 includes an upper plate 430 and a lower plate 410. The top plate 430 is provided to have a cylindrical shape. An inflow passage 432 and a recovery passage 434 that are independent of each other are formed in the upper plate 430. Here, the inflow passage 432 functions as an inlet through which the treatment liquid flows in, and the recovery passage 434 serves as an outlet through which the treatment liquid is recovered. The lower plate 410 is fixedly coupled to the bottom of the upper plate 430. The lower plate 410 is provided to have a circular plate shape having a groove 412 formed thereon. The lower plate 410 may have the same diameter as the upper plate 430. The groove 412 formed in the lower plate 410 is provided in the discharge passage 412 in combination with the upper plate 430. The discharge passage 412 is provided to communicate with each of the inflow passage 432 and the recovery passage 434. A plurality of discharge holes 420 communicating with the discharge passage 412 are formed on the bottom of the lower plate 410. The discharge holes 420 are provided to face downward. Accordingly, the processing liquid is discharged through the discharge hole 420 through the inflow flow path 432 and the discharge flow path 412 or recovered through the recovery flow path through the inflow flow path 432 and the discharge flow path 412. For example, the body may be provided with a material including at least one of plastic, ceramic, and quartz. The treatment liquid may be variously applied, such as carbonated water, oxygen water, ozone water, and pure water.

The vibrator 450 provides vibration to the processing liquid. The vibration provided from the vibrator 450 may control the particle size and flow rate of the treatment liquid. The vibrator 450 is located inside the top plate 430. The vibrator 450 is provided in a disk shape. When viewed from the top, the vibrator 450 may have a size overlapping with the plurality of discharge holes 420. The vibrator 450 is electrically connected to a power source located outside. The vibrator 450 provides vibration to the processing liquid flowing in the discharge passage 412. The processing liquid provided with vibration is discharged through the discharge hole 420. According to an example, the vibrator 450 may be a piezoelectric element 450.

The liquid supply member 500 supplies the processing liquid to the inflow passage 612 or recovers the processing liquid through the recovery passage 612. The liquid supply member 500 also measures the discharge pressure of the processing liquid. 5 is a cross-sectional view showing the liquid supply member of FIG. Referring to FIG. 5, the liquid supply member 500 includes a liquid supply line 510, a liquid recovery line 540, and a pressure measuring unit 600. The liquid supply line 510 is a line for supplying a processing liquid to the nozzle member 400 and is connected to the inflow passage 612. The pump 520 and the filter 530 are installed in the liquid supply line 510. The pump 520 pressurizes the liquid supply line 510 so that the treatment liquid is supplied to the nozzle member 400, and the filter 530 filters the impurities included in the treatment liquid. The liquid recovery line 540 is a line for recovering the processing liquid from the nozzle member 400 and is connected to the recovery flow path 612. The liquid return line 540 is provided with a pressure measuring unit 600 and a recovery valve 550. The pressure measuring unit 600 measures the discharge pressure of the processing liquid discharged from the nozzle member 400. For example, when the discharge pressure of the processing liquid is measured, the liquid recovery line 540 may be closed by the recovery valve 550.

6 is a cross-sectional view showing the pressure measuring unit of FIG. 5. Referring to FIG. 6, the pressure measuring unit 600 includes a lower body 610, an upper body 620, a pressure element 630, a first sealing member 640, a second sealing member 650, and a fixing member. 660.

The lower body 610 is formed with a flow path 612 through which the processing liquid flows. The flow path 612 is connected to the liquid recovery line 540 and is formed to penetrate from one end to the other end of the lower body 610. The lower body 610 has a protrusion 614 protruding upward on an upper surface, and the protrusion 614 is provided to be inserted into the upper body 620. The protrusion 614 is located higher than the pressure element 630 than the flow path 612. This makes it possible to prevent the processing liquid from leaking outside of the pressure measuring unit 600 even when a gap is generated in the flow path 612.

The upper body 620 is located above the lower body 610. The upper body 620 is combined with the lower body 610 to provide a mounting space in which the pressure element 630 is located. The mounting space is formed by the combination of the upper body 620 and the bottom center area and the top center area of the bottom body 610. The flow path 612 is formed to pass through the upper center area of the lower body 610. An insertion groove 622 into which the protrusion 614 may be inserted is formed at the bottom of the upper body 620. When viewed from the top, the insertion groove 622 is located outside the mounting space. According to the present embodiment, the upper body 620 and the lower body 610 are positioned to be spaced apart from each other.

The pressure element 630 is positioned to be exposed to the flow path 612 in the mounting space. The pressure element 630 is fastened to the bottom center area of the upper body 620. The pressure element 630 measures the pressure of the flow path 612 to measure the pressure of the processing liquid. According to the present embodiment, the pressure element 630 is positioned to be spaced apart from the lower body 610.

The first sealing member 640 primarily prevents the processing liquid from flowing out of the flow path 612. In addition, the first sealing member 640 protects the pressure element 630 from the lower body 610. The first sealing member 640 positions the pressure element 630 spaced apart from the lower body 610 and distributes the vibration or shock generated from the lower body 610. For example, the vibration or impact of the lower body 610 may be generated by the pressure of the treatment liquid by the vibrator 450, the pressure of the treatment liquid may be provided at atmospheric pressure or 700 kilopascals (kPa).

The first sealing member 640 is positioned to support the pressure element 630 on the upper surface of the lower body 610 to separate the pressure element 630 from the lower body 610 and to have an annular ring shape. . Accordingly, the pressure element 630 measures the pressure in the region of the flow path 612 surrounded by the pressure element 630, the first sealing member 640, and the lower body 610. For example, the first sealing member 640 is provided to have an elastic material. According to an example, the pressure element 630 may be provided of a material having a lower hardness than the lower body 610. The pressure element 630 may be provided with a PTFE material, and the lower body 610 may be provided with a PEEK material.

The pressure element 630 is positioned to be spaced apart from the lower body 610 by the first sealing member 640, and the first sealing member 640 is provided of a material including elasticity. As a result, the shock or vibration generated from the lower body 610 may be minimized from being transmitted to the pressure element 630, and the pressure element 630 may be prevented from being damaged or deformed due to the shock and vibration.

The second sealing member 650 secondly prevents the processing liquid from flowing out of the flow path 612. The second sealing member 650 seals a gap between the upper body 620 and the lower body 610 in the insertion groove 622.

The fixing member 660 fixes the relative position between the upper body 620 and the lower body 610. The fixing member 660 includes a bolt 662 and a stopper ring 664. The bolt 662 primarily fixes the upper body 620 and the lower body 610. The bolt 662 is positioned to penetrate from the lower body 610 to the upper body 620. The bolt 662 is positioned to pass through the protrusion 614 to penetrate the bottom surface of the insertion groove 622.

The stopper ring 664 secondaryly fixes the upper body 620 and the lower body 610. The stopper ring 664 is positioned between the upper body 620 and the lower body 610 in a position outside the flow path 612. The stopper ring 664 is located outside of the protrusion 614. The stopper ring 664 has a contact surface in contact with each of the upper body 620 and the lower body 610. The top surface of the stopper ring 664 is provided as one surface in contact with the upper body 620, and the bottom surface of the stopper ring 664 is provided as the other surface in contact with the lower body 610. Accordingly, a problem in which the upper body 620 and the lower body 610 are twisted in the vertical axis in the vertical direction can be prevented. The stopper ring 664 is positioned higher than the pressure element 630. Accordingly, even if a gap is generated in the flow path 612, it is possible to prevent the processing liquid from leaking outside of the pressure measuring unit 600. For example, the stopper ring 664 may be provided of a material having a smaller hardness than the upper body 620 or the lower body 610. That is, the stopper ring 664 may be provided of a material having a smaller deformation than the upper body 620 or the lower body 610.

600: pressure measuring unit 610: lower body
620: upper body 630: pressure element
640: first sealing member 650: second sealing member
660: fixed member

Claims (10)

In a device for measuring pressure,
A lower body through which a flow path for processing liquid is formed;
A pressure element for measuring the pressure of the processing liquid;
An upper body in combination with the lower body to provide a space in which the pressure element is located;
The pressure element is fastened to either one of the upper body and the lower body and positioned spaced apart from the other,
The apparatus further comprises a sealing member for sealing a space between the pressure element and the other,
And the pressure of the processing liquid is measured in the passage region surrounded by the one, the sealing member, and the pressure element. The method of claim 1,
And the sealing member supports the pressure element under the pressure element in the interspace and is provided with a material including elasticity. The method of claim 2,
The upper body and the lower body are positioned to be spaced apart from each other in a direction facing each other,
The unit,
Further comprising a fixing member for fixing the relative position between the upper body and the lower body,
The fixing member,
And a stopper ring having a contact surface contacting the upper body and the lower body at a position outside the flow path, and positioned between the upper body and the lower body such that the upper body and the lower body are spaced apart from each other. Pressure measuring unit. The method of claim 3,
And the stopper ring is positioned higher than the flow path. The method of claim 4, wherein
The stopper ring is a pressure measuring unit provided with a material having a hardness less than the upper body or the lower body. The method according to any one of claims 3 to 5,
Insertion grooves are formed on the bottom of the upper body on the outside of the mounting space,
The lower body has a protrusion that can be inserted into the insertion groove,
An upper end of the protrusion is located higher than the pressure element. In the apparatus for processing a substrate,
A substrate support unit for supporting a substrate;
A nozzle for supplying a processing liquid onto a substrate supported by the substrate supporting unit;
A liquid supply line for supplying a processing liquid to the nozzle;
A liquid recovery line for recovering a processing liquid from the nozzle;
Is installed in the liquid discharge line, including a pressure measuring unit for measuring the pressure of the processing liquid,
The pressure measuring unit,
A lower body through which a flow path for processing liquid is formed;
A pressure element for measuring the pressure of the processing liquid;
An upper body in combination with the lower body to provide a space in which the pressure element is located;
The pressure element is fastened to either one of the upper body and the lower body, and is positioned spaced apart from the other
The apparatus further comprises a sealing member for sealing a space between the pressure element and the other,
The pressure of the said processing liquid is measured in the said flow path area | region enclosed by the said any one, the said sealing member, and the said pressure element. The method of claim 7, wherein
And the sealing member supports the pressure element under the pressure element in the interspace and is provided with a material including elasticity. The method according to claim 7 or 8,
The upper body and the lower body are positioned to be spaced apart from each other in a direction facing each other,
The unit,
Further comprising a fixing member for fixing the relative position between the upper body and the lower body,
The fixing member,
And a stopper ring having a contact surface contacting the upper body and the lower body at a position outside the flow path, and positioned between the upper body and the lower body such that the upper body and the lower body are spaced apart from each other. Substrate processing apparatus. The method of claim 9,
And the stopper ring is positioned higher than the flow path.

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