KR20190021362A - 9-phenylacridine polymer sensitizer, its preparation method and use - Google Patents
9-phenylacridine polymer sensitizer, its preparation method and use Download PDFInfo
- Publication number
- KR20190021362A KR20190021362A KR1020197001977A KR20197001977A KR20190021362A KR 20190021362 A KR20190021362 A KR 20190021362A KR 1020197001977 A KR1020197001977 A KR 1020197001977A KR 20197001977 A KR20197001977 A KR 20197001977A KR 20190021362 A KR20190021362 A KR 20190021362A
- Authority
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- South Korea
- Prior art keywords
- integer
- group
- phenylacridine
- reaction
- oxygen
- Prior art date
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- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 229920000642 polymer Polymers 0.000 title claims abstract description 11
- 238000002360 preparation method Methods 0.000 title description 8
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 9
- 239000001301 oxygen Substances 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 8
- 239000001257 hydrogen Substances 0.000 claims abstract description 8
- LOTBYPQQWICYBB-UHFFFAOYSA-N methyl n-hexyl-n-[2-(hexylamino)ethyl]carbamate Chemical compound CCCCCCNCCN(C(=O)OC)CCCCCC LOTBYPQQWICYBB-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims abstract description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 6
- 239000011593 sulfur Substances 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 5
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 3
- 125000001424 substituent group Chemical group 0.000 claims abstract description 3
- 238000006243 chemical reaction Methods 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 26
- 239000002994 raw material Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000007858 starting material Substances 0.000 claims description 4
- 238000005809 transesterification reaction Methods 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 230000002165 photosensitisation Effects 0.000 abstract description 2
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 description 32
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 239000000543 intermediate Substances 0.000 description 24
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 238000011156 evaluation Methods 0.000 description 16
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 206010034972 Photosensitivity reaction Diseases 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 230000036211 photosensitivity Effects 0.000 description 11
- -1 acridine compound Chemical class 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 6
- 239000012634 fragment Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 150000001251 acridines Chemical class 0.000 description 4
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 4
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 4
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
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- 230000035484 reaction time Effects 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000011592 zinc chloride Substances 0.000 description 3
- 235000005074 zinc chloride Nutrition 0.000 description 3
- YATYDCQGPUOZGZ-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(O)COC(C)CO YATYDCQGPUOZGZ-UHFFFAOYSA-N 0.000 description 2
- PACJPUCUUCMMFP-UHFFFAOYSA-N 2-[2-[2-[2-(2-hydroxypropoxy)propoxy]propoxy]propoxy]propan-1-ol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(O)COC(C)COC(C)COC(C)COC(C)CO PACJPUCUUCMMFP-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 229940107698 malachite green Drugs 0.000 description 2
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- VEUUMBGHMNQHGO-UHFFFAOYSA-N ethyl chloroacetate Chemical compound CCOC(=O)CCl VEUUMBGHMNQHGO-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QABLOFMHHSOFRJ-UHFFFAOYSA-N methyl 2-chloroacetate Chemical compound COC(=O)CCl QABLOFMHHSOFRJ-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
- C08G65/33379—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing nitro group
- C08G65/33393—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing nitro group heterocyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D219/00—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D219/00—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
- C07D219/02—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with only hydrogen, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
- C08G65/33303—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group
- C08G65/33317—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group heterocyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Polyesters Or Polycarbonates (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
9-페닐아크리딘 고분자 감광제 및 이의 제조 방법과 용도가 개시된다. 9-페닐아크리딘 고분자 감광제는 식(I)로 표시되는 구조를 갖는 화합물 중 적어도 하나를 포함하고,
여기에서,
R1은 C1-C60 선형 또는 분지형 (m+n)-원자가 알킬기이고, 여기에서 -CH2-는 산소, 황 또는 1,4-페닐렌기로 선택적으로 치환될 수 있고; A는 각각 독립적으로 -[(CHR4)x-O]y-을 나타내며, 여기에서 R4는 각각 독립적으로 수소, 메틸기 또는 에틸기를 나타내고, x는 1-10의 정수이고, y는 1-20의 정수이며; R2는 선형 또는 분지형 알킬렌기를 나타내며, 여기에서 -CH2-는 산소, 황 또는 페닐렌기로 선택적으로 치환될 수 있고; R3은 수소 또는 치환기를 나타내고; m은 0-20의 정수를 나타내고, n은 1-20의 정수를 나타낸다. 광경화성 시스템에서 사용할 때, 감광제는 양호한 상용성(compatibility)과 양호한 감광성 개선 효과를 갖고, 이로부터 제조된 필름은 우수한 해상도와 접착성 및 높은 수용성을 갖는다.9-phenylacridine polymer sensitizing agent, a process for producing the same, and uses thereof. The 9-phenylacridine polymer sensitizer comprises at least one of the compounds having the structure represented by formula (I)
From here,
R 1 is a C 1 -C 60 linear or branched (m + n) -valent alkyl group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur or 1,4-phenylene group; A represents independently - [(CHR 4 ) x -O] y -, wherein each R 4 independently represents hydrogen, a methyl group or an ethyl group, x is an integer of 1-10, y is 1-20 Lt; / RTI > R 2 represents a linear or branched alkylene group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur or phenylene group; R 3 represents hydrogen or a substituent; m represents an integer of 0-20, and n represents an integer of 1-20. When used in a photocurable system, the photosensitizer has good compatibility and good photosensitizing effect, and the resulting film has excellent resolution, adhesion and high water solubility.
Description
본 발명은 유기 화학 분야에 속하며, 특히, 9-페닐아크리딘(9-phenylacridine) 고분자 감광제(macromolecular photosensitizer) 및 그 제조 방법뿐만 아니라 광경화(photocuring) 분야에서의 이러한 감광제의 용도에 관한 것이다.The present invention belongs to the field of organic chemistry and more particularly relates to 9-phenylacridine macromolecular photosensitizers and their use as well as their use in the field of photocuring.
아크리딘 화합물은 견고한 평면 구조와 매우 강한 형광을 갖는 거대고리형 컨쥬게이티드 시스템(macrocyclic conjugated system)으로, 이는 양호한 종류의 형광 시약이다. 이는 광중합 시스템(photopolymerization system)에서 광개시제(photoinitiator)로서 사용될 수 있거나, 또는 광개시제를 개시하여 광중합을 수행하기 위한 감광제(sensitizer)로서 또한 사용될 수 있다. 9-페닐아크리딘은 아크리딘 유도체이며, 바이페닐형 구조에 속한다. 이들은 자외선 및 X-선의 조사하에서 불포화 수지와 이의 단량체 물질로 주로 구성되는 광경화성 물질(광경화성 페인트, 잉크, 포토레지스트 등)의 가교 경화를 개시할 수 있다. 또한, 이들은 안정한 특성을 가지며, 불포화 수지와 이의 단량체 물질로 구성되는 광경화성 물질에서 양호한 감광성 특성을 갖는다. 따라서, 이들은 광경화 분야에서 널리 사용되고 있다.The acridine compound is a macrocyclic conjugated system with a strong planar structure and very strong fluorescence, which is a good class of fluorescent reagent. It can be used as a photoinitiator in a photopolymerization system, or it can also be used as a sensitizer to initiate a photoinitiator and perform photopolymerization. 9-Phenacridine is an acridine derivative, belonging to the biphenyl-type structure. They can initiate crosslinking curing of photo-curable materials (photocurable paint, ink, photoresist, etc.) composed mainly of unsaturated resin and its monomer material under irradiation of ultraviolet ray and X-ray. In addition, they have stable properties and have good photosensitivity in a photo-curable material composed of an unsaturated resin and its monomer material. Therefore, they are widely used in the field of photocuring.
감광제로서의 아크리딘 화합물의 사용은 잘 알려져 있다. 예를 들어, 감광성 수지에 다른 아크리딘 화합물을 사용하는 것이 중국 특허출원 CN101525392A, CN102675203A 등에 개시되어 있다. 그러나 감광제로 사용할 때, 이들 기존의 아크리딘 화합물은 바람직하지 않은 용해성, 나쁜 감광성 개선 효과의 다소간의 단점을 갖는다. 9-페닐아크리딘은 기존의 아크리딘 감광제에 사용되는 가장 널리 사용되는 제품 중 하나이다. 마이크로분자 감광제로서, 이들은 종종 반응물로부터 분리되기 어렵고, 회수되기 어려우며, 사용 공정 중에 시스템과 혼화성(miscibility)이 좋지 않고, 쉽게 응집되고 분리되는 등과 같은 문제를 일으켜서, 반응 효율을 감소시키며 물질의 특성에 영향을 미친다. 특히, 9-페닐아크리딘은 매우 낮은 수용성을 가지며, 이는 광경화 분야, 특히 건조 필름 포토레지스트 분야에서 감광제로서 그것의 대중화 및 적용에 심각하게 영향을 미친다. 미노광 부분(unexposed part)은 전형적으로 건조 필름 현상(development) 중에 알칼리성 수용액으로 씻겨 없어지는 반면, 9-페닐아크리딘은 이들의 매우 낮은 수용성으로 인해 이 지점에서 회로 기판의 표면상에 침전되고 흡착될 것이다. 이 경우에, 건조 필름의 사용은 영향을 받을 뿐만 아니라, 제품의 정밀도가 떨어질 것이다. 따라서, 회로 기판 표면의 세정(cleaning) 절차가 추후 추가될 필요가 있으며, 이는 공정을 복잡하게 하고 비용을 크게 증가 시킨다.The use of acridine compounds as photosensitizers is well known. For example, the use of other acridine compounds in photosensitive resins is disclosed in Chinese patent applications CN101525392A, CN102675203A, and the like. However, when used as photosensitizers, these existing acridine compounds have some disadvantages of undesirable solubility, poor photosensitivity improvement. 9-Phenylacridine is one of the most widely used products for existing acridine sensitizers. As micromolecular photosensitizers, they are often difficult to separate from the reactants, are difficult to recover, are poorly miscible with the system during use, are easily agglomerated and separated, reduce the reaction efficiency, . In particular, 9-phenylacridine has very low water solubility, which seriously affects its popularization and application as photosensitizers in the field of photocuring, especially in the dry film photoresist sector. Unexposed parts are typically washed away in alkaline aqueous solution during dry film development whereas 9-phenylacridine is precipitated on the surface of the circuit board at this point due to their very low water solubility Lt; / RTI > In this case, the use of the dry film will not only be affected but also the accuracy of the product will deteriorate. Therefore, a cleaning procedure of the circuit board surface needs to be added later, which complicates the process and greatly increases the cost.
종래 기술의 결점에 관하여, 본 발명은 9-페닐아크리딘 고분자 감광제를 제공하는 것을 목적으로 한다. 종래의 감광제에 비해, 광경화 시스템에서 사용시, 본 발명의 감광제는 양호한 상용성(compatibility)과 양호한 감광성 개선 효과를 가지며, 이로부터 제조된 필름은 우수한 해상도(resolution)와 접착성 및 높은 수용성(물로 세척(washing)함으로써 제거되기 쉬움)을 갖는다.With respect to the drawbacks of the prior art, the present invention aims to provide a 9-phenylacridine polymeric photoresist. Compared to conventional photosensitizers, the photosensitizer of the present invention has good compatibility and good photosensitivity improvement effects when used in a photocurable system, and the films produced therefrom have excellent resolution, adhesion and high water solubility Which is easy to remove by washing).
구체적으로, 본 발명의 9-페닐아크리딘 고분자 감광제는 식(I)로 표시되는 구조를 갖는 화합물 중 적어도 하나를 포함한다:Specifically, the 9-phenylacridine polymer sensitizer of the present invention comprises at least one of the compounds having the structure represented by Formula (I): < EMI ID =
여기에서,From here,
R1은 C1-C60 선형 또는 분지형 (m+n)-원자가(valent) 알킬기를 나타내며, 여기에서 -CH2-는 산소, 황 또는 1,4-페닐렌기로 선택적으로 치환될 수 있고;R 1 represents a C 1 -C 60 linear or branched (m + n) valent alkyl group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur or 1,4-phenylene group ;
A는 각각 독립적으로 -[(CHR4)x-O]y-를 나타내며, 여기에서 R4는 각각 독립적으로 수소, 메틸기 또는 에틸기를 나타내고, x는 1-10의 정수이고, y는 1-20의 정수이고;Wherein A independently represents - [(CHR 4 ) x -O] y -, wherein each R 4 independently represents hydrogen, methyl or ethyl, x is an integer of 1-10, y is 1-20 Lt; / RTI >
R2는 C1-C20 선형 또는 분지형 알킬렌기를 나타내며, 여기에서 -CH2-는 산소, 황 또는 페닐렌기로 선택적으로 치환될 수 있고;R 2 represents a C 1 -C 20 linear or branched alkylene group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur or phenylene group;
R3은 수소 또는 치환기를 나타내고; 및R 3 represents hydrogen or a substituent; And
m은 0-20의 정수를 나타내고, n은 1-20의 정수를 나타낸다.m represents an integer of 0-20, and n represents an integer of 1-20.
바람직한 구현예로서, R1은 C1-C20 선형 또는 분지형 (m+n)-원자가 알킬기를 나타내고, 여기에서 -CH2-는 2개의 산소가 직접 연결되어 있지 않은 경우, 산소 또는 1,4-페닐렌기로 선택적으로 치환될 수 있다.In a preferred embodiment, R 1 represents a C 1 -C 20 linear or branched (m + n) -valent alkyl group, wherein -CH 2 -, when two oxygen atoms are not directly connected, And may be optionally substituted with a 4-phenylene group.
더 바람직하게는, 상기 기술된 식(I)로 표시된 구조에서, R1은 다음의 기로부터 선택된다:More preferably, in the structure represented by the above-described formula (I), R 1 is selected from the following groups:
, , , , , , , , , , , , , , , , . , , , , , , , , , , , , , , , , .
바람직한 구현예로서, A는 -[(CHR4)x-O]y-를 나타내고, 여기에서 R4는 각각 독립적으로 수소, 메틸기 또는 에틸기를 나타내며, x는 1-10의 정수이고, y는 1-20의 정수이다. -[(CHR4)x-O]y- 기의 말단 산소 원자는 R1에 연결된다.In a preferred embodiment, A represents - [(CHR 4 ) x -O] y -, wherein each R 4 independently represents hydrogen, methyl or ethyl, x is an integer of 1-10, Lt; / RTI > The terminal oxygen atom of the - [(CHR 4 ) x -O] y - group is connected to R 1 .
더 바람직하게는, A는 다음의 기로부터 선택된다:More preferably, A is selected from the following groups:
-[CH2O]y-, -[CH2CH2O]y-, -[CH2CH2CH2O]y-, -[CH2CH2CH2CH2O]y-, -[CH(CH3)-CH2O]y-, -[CH2-CH(CH3)-CH2O]y-, 여기에서 y는 1-20의 정수를 나타낸다. - [CH 2 O] y - , - [CH 2 CH 2 O] y -, - [CH 2 CH 2 CH 2 O] y -, - [CH 2 CH 2 CH 2 CH 2 O] y -, - [ CH (CH 3) -CH 2 O ] y -, - [CH 2 -CH (CH 3) -CH 2 O] y -, where y is an integer of 1-20.
바람직한 구현예로서, R2는 C1-C8 선형 또는 분지형 알킬렌기를 나타내고, 여기에서 -CH2-는 2개의 산소가 직접 연결되어 있지 않은 경우, 산소 또는 1,4-페닐렌기로 선택적으로 치환될 수 있다.In a preferred embodiment, R 2 represents a C 1 -C 8 linear or branched alkylene group, wherein -CH 2 - is optionally substituted with oxygen or 1,4-phenylene if the two oxygen atoms are not directly connected . ≪ / RTI >
더 바람직하게는, R2는 다음의 기로부터 선택된다:More preferably, R < 2 > is selected from the following groups:
*CH2*, *CH2-CH2*, *CH2-CH2-CH2*, *CH(CH3)-CH2*, *CH2CH2CH2CH2*, *CH2-O-CH2*, *CH2-CH2-O-CH2*, *CH2-CH2-O-CH2-CH2*. * CH 2 *, * CH 2 -CH 2 *, * CH 2 -CH 2 -CH 2 *, * CH (CH 3) -CH 2 *, * CH 2 CH 2 CH 2 CH 2 *, * CH 2 - O-CH 2 *, * CH 2 -CH 2 -O-CH 2 *, * CH 2 -CH 2 -O-CH 2 -CH 2 *.
바람직하게는, R3은 H, CH3, NO2 또는 할로겐(예컨대, F, Cl 및 Br)으로부터 선택된다.Preferably, R 3 is selected from H, CH 3, NO 2 or halogen (e.g., F, Cl and Br).
바람직하게는, m은 0-7의 정수를 나타내고, n은 1-8의 정수를 나타내며, m과 n의 합은 2-8의 정수이다.Preferably, m represents an integer of 0-7, n represents an integer of 1-8, and the sum of m and n is an integer of 2-8.
따라서, 본 발명은 또한 상기 기술된 9-페닐아크리딘 고분자 감광제의 제조 방법에 관한 것으로, 다음의 단계를 포함한다:The present invention therefore also relates to a process for the preparation of the 9-phenylacridine polymeric sensitizer described above, which comprises the following steps:
(1) 촉매의 존재하에 원료 a와 원료 b 사이에 반응을 수행하여 중간체 a를 수득하는 단계;(1) carrying out a reaction between raw material a and raw material b in the presence of a catalyst to obtain an intermediate a;
(2) 산 결합제(acid binding agent)를 함유하는 용매에서 중간체 a와 원료 c 사이에 반응을 수행하여 중간체 b를 수득하는 단계;(2) performing a reaction between the intermediate a and the starting material c in a solvent containing an acid binding agent to obtain an intermediate b;
(3) 촉매의 존재하에 중간체 b와 원료 d 사이에 에스테르 교환 반응(transesterification reaction)을 수행하여 생성물을 수득하는 단계;(3) performing a transesterification reaction between the intermediate b and the starting material d in the presence of a catalyst to obtain a product;
여기에서, 반응식은 아래와 같이 도시된다:Here, the reaction formula is shown as follows:
여기에서, R5는 C1-C8 선형 또는 분지형 알킬기를 나타낸다.Wherein R 5 represents a C 1 -C 8 linear or branched alkyl group.
본 발명의 감광제는 기존의 화합물의 구조에 관하여 개선되고 최적화된다. 상기 기술된 반응식으로 도시된 바와 같이, 이의 제조 방법에 수반되는 합성은 유기 화학 분야에서 모두 통상적인 공정인, 아크리딘 구조, 에스테르화, 에스테르 교환의 구성(construction) 등에 관한 것이다. 합성 공정과 그 원리가 명백한 경우, 특정 공정 파라미터는 당업자에 의해 용이하게 결정될 것이다. 예를 들어, 중국 특허 CN101525392A에 기술된 내용이 참조될 수 있으며, 이는 본원에 그 전체가 참조로서 포함된다.The photosensitizers of the present invention are improved and optimized with respect to the structure of existing compounds. As shown in the above-described reaction schemes, the synthesis involved in the method of preparation relates to acridine structure, esterification, construction of ester exchange, and the like which are all common processes in the field of organic chemistry. Where synthetic processes and their principles are apparent, specific process parameters will be readily determined by those skilled in the art. For example, the contents described in Chinese patent CN101525392A can be referred to, which is incorporated herein by reference in its entirety.
바람직하게는, 단계 (1)에서, 촉매는 염화 아연과 85% 인산의 복합 촉매(composite catalyst)이다. 반응 온도는 원료의 상이한 종류에 따라 약간 변하며, 전형적으로 150 - 220℃이고, 반응 시간은 4 - 8시간이다.Preferably, in step (1), the catalyst is a composite catalyst of zinc chloride and 85% phosphoric acid. The reaction temperature varies slightly depending on the different kinds of raw materials, typically 150 - 220 캜, and the reaction time is 4 - 8 hours.
바람직하게는, 단계 (2)에서, 원료 c의 구조에서 R5는 C1-C4 선형 또는 분지형 알킬기, 특히 CH3, CH2CH3 및 CH2CH2CH3를 나타낸다. 사용되는 용매의 종류는 반응의 원료를 용해시킬 수 있고 반응에 부정적인 영향을 미치지 않는 한 특별히 한정되지 않으며, 예를 들어 아세톤, 아세토니트릴, 메탄올, 에탄올, N,N-디메틸포름아미드이다. 산 결합제는 탄산 나트륨, 수산화 나트륨, 탄산 칼륨, 메톡시화 나트륨, 피리딘, 트리에틸아민 등일 수 있다. 반응 온도는 40 - 100℃이고, 반응 시간은 전형적으로 4 - 18시간이다.Preferably, in step (2), R 5 in the structure of raw material c represents a C 1 -C 4 linear or branched alkyl group, especially CH 3 , CH 2 CH 3 and CH 2 CH 2 CH 3 . The type of the solvent to be used is not particularly limited as long as it can dissolve the raw material of the reaction and does not adversely affect the reaction. Examples thereof include acetone, acetonitrile, methanol, ethanol and N, N-dimethylformamide. The acid binding agent may be sodium carbonate, sodium hydroxide, potassium carbonate, sodium methoxide, pyridine, triethylamine, and the like. The reaction temperature is from 40 to 100 ° C., and the reaction time is typically from 4 to 18 hours.
바람직하게는, 단계 (3)에서, 에스테르 교환 반응은 용매에서 수행된다. 여기에서, 용매의 종류는 반응의 원료를 용해시킬 수 있고 반응에 부정적인 영향을 미치지 않는 한 특별히 한정되지 않으며, 예를 들어 톨루엔, 자일렌, 벤젠, 시클로헥산 등이다. 촉매는 수산화 나트륨, 수산화 리튬, 수산화 칼륨, 메톡시화 나트륨, 메틸설폰산, p-톨루엔설폰산, 황산 및 하이포아인산(hypophosphorous acid) 중 하나 또는 둘 이상의 조합일 수 있다. 촉매의 사용량은 바람직하게는 반응의 원료의 총 질량 중 5‰ - 15‰이다. 반응 온도는 전형적으로 70 - 130℃이다. 반응 시간은 전형적으로 1 - 8시간이다.Preferably, in step (3), the transesterification reaction is carried out in a solvent. Here, the type of the solvent is not particularly limited as long as it can dissolve the raw material of the reaction and does not adversely affect the reaction, and examples thereof include toluene, xylene, benzene, cyclohexane and the like. The catalyst may be one or a combination of one or more of sodium hydroxide, lithium hydroxide, potassium hydroxide, sodium methoxide, methylsulfonic acid, p-toluenesulfonic acid, sulfuric acid and hypophosphorous acid. The amount of the catalyst to be used is preferably 5 to 15% of the total mass of the raw materials for the reaction. The reaction temperature is typically 70-130 占 폚. The reaction time is typically 1 to 8 hours.
당업자에 의해 단계 (3)에서의 에스테르 교환 반응으로부터 알 수 있는 바와 같이, 중간체 b와 에스테르 교환 반응을 거칠 수 있는 m+n개의 히드록시기가 원료 d에 존재한다. m+n이 1보다 크고 중간체 b가 히드록시기에 관하여 충분하지 않으면, R1(AOH)m+n의 단일 분자와 반응하는 중간체 b의 수는 서로 일치하지 않게 된다. 따라서, 생성된 생성물은 단일 구조를 갖는 화합물이 아니고, 식(I)의 구조를 갖는 화합물의 혼합물이다. 이 혼합물은 상기 기술된 9-페닐아크리딘 고분자 감광제의 정의의 범위 내에 속한다.As can be seen from the transesterification reaction in step (3) by the person skilled in the art, there are m + n hydroxy groups which can undergo an ester exchange reaction with intermediate b in raw material d. If m + n is greater than 1 and intermediate b is not sufficient for the hydroxy group, the number of intermediates b that react with a single molecule of R 1 (AOH) m + n will not match each other. Thus, the resulting product is not a compound having a single structure, but a mixture of compounds having the structure of formula (I). This mixture falls within the definition of the 9-phenylacridine polymer sensitizer described above.
본 발명의 9-페닐아크리딘 고분자 감광제는 우수한 수용성을 가지며, 광경화 시스템에서 감광제로서 사용하기에 특히 적합하다. 이것은 양호한 감광성 개선 효과를 가지며, 이로부터 제조된 필름은 우수한 해상도와 접착성을 갖는다. 따라서, 본 발명은 또한 광경화성 조성물에서의 9-페닐아크리딘 고분자 감광제의 용도에 관한 것이다. 광경화성 조성물에 사용된 광개시제는 바람직하게는 광산 발생제(photo acid generator), 광염기 발생제 및 라디칼 광개시제로부터 선택된다.The 9-phenylacridine polymer photoresist of the present invention has excellent water solubility and is particularly suitable for use as a photosensitizer in a photocurable system. This has a good photosensitizing effect, and the film produced therefrom has excellent resolution and adhesion. Thus, the present invention also relates to the use of a 9-phenylacridine polymeric photoresist in a photocurable composition. The photoinitiator used in the photo-curable composition is preferably selected from photo acid generators, photoinitiators and radical photoinitiators.
본 발명의 유리한 효과는 다음을 더 포함한다:Advantageous effects of the present invention further include:
1. 고분자 사슬에서의 에너지 전달 및 분자간 반응은 고분자 감광제가 더욱 용이하게 높은 감광성 활성을 갖게 한다;1. Energy transfer and intermolecular reaction in the polymer chain make the polymer sensitizer more easily have a high photosensitivity;
2. 상이한 반응성을 갖는 생성물은 비활성 기와의 공중합, 감광성 기 사이의 거리의 조절 및 설계, 또는 광활성 기와 주쇄(main chain) 사이의 거리를 변경함으로써 수득된다;2. Products with different reactivities are obtained by copolymerization with inert groups, control and design of the distance between the photosensitive groups, or by changing the distance between the photoactive group and the main chain;
3. 감광성 기의 이동은 감광성 기의 중합에 의해 제한되고, 이에 의해 코팅 층의 황변(yellowing)과 에이징(aging)을 방지한다;3. The movement of the photosensitive group is limited by the polymerization of the photosensitive group, thereby preventing yellowing and aging of the coating layer;
4. 대부분의 광분해 단편(photolysis fragment)은 여전히 중합 매트릭스에 연결되어 있기 때문에, 시스템의 냄새와 독성은 감소될 수 있다.4. Since most of the photolysis fragments are still linked to the polymerization matrix, the odor and toxicity of the system can be reduced.
이후, 본 발명은 특정 실시예와 함께 아래에서 상세하게 추가 예시될 것이지만, 본 발명의 범위가 이에 제한되는 것으로 이해되어서는 안 된다.Hereinafter, the present invention will be further illustrated in detail below with reference to specific embodiments, but the scope of the present invention should not be construed as being limited thereto.
제조예Manufacturing example
실시예Example 1 One
(1) 중간체 1a의 제조(1) Preparation of intermediate 1a
165.6 g(1.2 mol)의 p-히드록시벤조산, 169.0 g(1.0 mol)의 디페닐아민, 244.8 g(1.8 mol)의 염화 아연 및 115.3 g(1.0 mol)의 85% 인산을 1000 ml의 4-구 플라스크에 첨가하고, 교반하면서 온도를 200 - 210℃로 증가시키고, 반응을 6시간 동안 수행하였다. 그 다음에, 온도를 130 - 140℃로 감소시키고, 400 g의 30% 황산을 적하하고, 2시간 동안 교반하면서 온도를 80℃로 유지하고, 80℃에서 물 300g을 0.5시간 동안 교반하면서 첨가하고, 하층의 물을 정치(standing)하여 분리하고, 300 g의 물을 추가로 첨가하여 상기 작업을 반복하였다. 300 g의 암모니아수를 최종적으로 반응 플라스크에 첨가하여 오렌지색 고체를 대량으로 침전시켰다. 반응 플라스크 내의 물질을 실온에서 흡인 여과하고, 메탄올로 헹구고 건조시켜, 중간체 1a인 257.4 g의 고체를 98%의 순도로 수득하였다.A solution of 165.6 g (1.2 mol) of p-hydroxybenzoic acid, 169.0 g (1.0 mol) of diphenylamine, 244.8 g (1.8 mol) of zinc chloride and 115.3 g Was added to a globular flask, the temperature was increased to 200-210 DEG C with stirring and the reaction was carried out for 6 hours. The temperature was then reduced to 130-140 DEG C, 400 g of 30% sulfuric acid was added dropwise, the temperature was maintained at 80 DEG C with stirring for 2 hours and 300 g of water at 80 DEG C was added with stirring for 0.5 hour , The water in the lower layer was separated by standing, and the operation was repeated by addition of 300 g of water. 300 g of ammonia water was finally added to the reaction flask to precipitate a large amount of orange solids. The material in the reaction flask was suction filtered at room temperature, rinsed with methanol and dried to give 257.4 g of the intermediate 1a as a 98% pure.
중간체 1a의 구조를 LCMS로 확인하였다.The structure of intermediate 1a was confirmed by LCMS.
질량 분석(Mass spectrometric analysis)을 기기에 부착된 소프트웨어로 수행하여 272와 273에서 분자 단편 피크를 얻었으며, 생성물의 분자량은 271로, 이는 T+1 및 T+2와 일치하였다.Mass spectrometric analysis was performed with software attached to the instrument to obtain molecular fragment peaks at 272 and 273, and the molecular weight of the product was 271, consistent with T + 1 and T + 2.
(2) 중간체 1b의 제조(2) Preparation of intermediate 1b
27.1 g(0.1 mol)의 중간체 1a, 16.6 g(0.12 mol)의 탄산 칼륨 및 167 g의 아세토니트릴을 500 mL의 4-구 플라스크에 첨가한 다음, 80℃에서 환류 하에 가열하였다. 12.0 g(0.11 mol)의 클로로아세트산 메틸을 약 1시간 내에 적하하였다. 적하 완료 후, 반응을 8시간 동안 계속하였다. 반응 완료 후, 반응되지 않은 탄산 칼륨을 뜨거운 동안 여과에 의해 제거하고, 대부분의 용매를 감압에서 증발시켜 고체를 침전시켰다. 반응 플라스크 내의 물질을 흡인 여과하고, 메탄올로 헹구고 건조시켜, 중간체 1b인 32.5 g의 옅은 황색 고체를 98%의 순도로 수득하였다.27.1 g (0.1 mol) of Intermediate 1a, 16.6 g (0.12 mol) of potassium carbonate and 167 g of acetonitrile were added to a 500 mL four-necked flask and then heated at 80 DEG C under reflux. 12.0 g (0.11 mol) of methyl chloroacetate was added dropwise in about 1 hour. After completion of the dropwise addition, the reaction was continued for 8 hours. After completion of the reaction, unreacted potassium carbonate was removed by filtration by hot filtration and most of the solvent was evaporated under reduced pressure to precipitate the solid. The material in the reaction flask was suction filtered, rinsed with methanol and dried to give 32.5 g of a light yellow solid of intermediate 1b in 98% purity.
중간체 1b의 구조를 LCMS와 1H-NMR로 확인하였다.The structure of intermediate 1b was confirmed by LCMS and 1 H-NMR.
질량 분석을 기기에 부착된 소프트웨어로 수행하여 344와 345에서 분자 단편 피크를 얻었으며, 생성물의 분자량은 343으로, 이는 T+1 및 T+2와 일치하였다.Mass spectrometry was performed with software attached to the instrument to obtain molecular fragment peaks at 344 and 345, and the molecular weight of the product was 343, consistent with T + 1 and T + 2.
1H-NMR(CDCl3, 500MHz): 3.6721(3H, s), 4.9034(2H, s), 6.7254-6.8351(2H, d), 7.2812-7.3708(2H, d), 7.3424-7.4765(2H, d), 7.5432-7.6278(4H, d), 7.9234-8.0509(2H, d). 1 H-NMR (CDCl 3, 500MHz): 3.6721 (3H, s), 4.9034 (2H, s), 6.7254-6.8351 (2H, d), 7.2812-7.3708 (2H, d), 7.3424-7.4765 (2H, d ), 7.5432-7.6278 (4H, d), 7.9234-8.0509 (2H, d).
(3) 생성물 1의 제조(3) Production of the product 1
154.3 g(0.45 mol)의 중간체 1b, 166.2 g(0.3 mol)의 원료 1d, 1.3 g의 수산화 리튬 및 540 g의 톨루엔을 1000 mL의 4-구 플라스크에 첨가하고, 내부 온도를 90 - 100℃로 조절하여 교반하면서 가열하였다. 반응에서 생성된 메탄올을 가열하여 증발시키고, 메탄올이 더 이상 증발되지 않을 때까지 톨루엔을 적절하게 보충하였다. 뜨거운 동안 여과를 수행하고, 생성된 여과액을 잔류 톨루엔이 5000 ppm 미만이 될 때까지 감압 증류시켜, 생성물 1인 304.4 g의 옅은 황색 점성 물질을 수득하였다.To a 1000 mL four-necked flask were added 154.3 g (0.45 mol) of intermediate 1b, 166.2 g (0.3 mol) of raw material 1d, 1.3 g of lithium hydroxide and 540 g of toluene, And heated with stirring. Methanol produced in the reaction was heated to evaporate, and toluene was appropriately replenished until the methanol was no longer evaporated. Filtration was carried out while hot, and the resulting filtrate was distilled under reduced pressure until the residual toluene content was less than 5000 ppm to obtain 304.4 g of a pale yellow viscous product of Product 1.
동일하거나 또는 유사한 활성을 갖는 3개의 히드록시기가 원료 1d에 존재하였으며, 생성물 1은 원료 1d의 단일 분자의 상이한 반응 범위로 인해 생성물 1-1, 1-2 및 1-3을 포함해야 한다는 것은 쉽게 이해될 것이다.It is easy to understand that three hydroxy groups with the same or similar activity were present in raw material 1d and that product 1 contained products 1-1, 1-2 and 1-3 due to the different reaction ranges of a single molecule of raw material 1d Will be.
실시예Example 2 2
(1) 중간체 2a의 제조(1) Preparation of intermediate 2a
219.6 g(1.2 mol)의 4-히드록시-3-니트로벤조산, 169.0 g(1.0 mol)의 디페닐아민, 244.8 g(1.8 mol)의 염화 아연 및 115.3 g(1.0 mol)의 85% 인산을 1000 ml의 4-구 플라스크에 첨가하고, 교반하면서 온도를 200 - 210℃로 증가시키고, 반응을 6시간 동안 수행하였다. 반응이 될 때까지 액상 추적(Liquid phase tracking)을 수행하였다. 온도를 130 - 140℃로 감소시키고, 400 g의 30% 황산을 적하하고, 2시간 동안 교반하면서 온도를 80℃로 유지하고, 80℃에서 물 300g을 0.5시간 동안 교반하면서 첨가하고, 하층의 물을 정치하여 분리하고, 300 g의 물을 추가로 첨가하여 상기 작업을 반복하였다. 300 g의 암모니아수를 최종적으로 반응 플라스크에 첨가하여 오렌지색 고체를 대량으로 침전시켰다. 반응 플라스크 내의 재료를 흡인 여과하고, 메탄올로 헹구고 건조시켜, 중간체 2a인 300.2 g의 고체를 98%의 순도 및 95%의 수율로 수득하였다.169.0 g (1.0 mol) of diphenylamine, 244.8 g (1.8 mol) of zinc chloride and 115.3 g (1.0 mol) of 85% phosphoric acid were added to 1000 mL four-necked flask, the temperature was increased to 200-210 DEG C with stirring, and the reaction was carried out for 6 hours. Liquid phase tracking was performed until the reaction was complete. The temperature was reduced to 130-140 캜, 400 g of 30% sulfuric acid was added dropwise, the temperature was maintained at 80 캜 while stirring for 2 hours, 300 g of water was added at 80 캜 with stirring for 0.5 hours, The mixture was allowed to stand and separated, and 300 g of water was further added thereto to repeat the above operation. 300 g of ammonia water was finally added to the reaction flask to precipitate a large amount of orange solids. The material in the reaction flask was suction filtered, rinsed with methanol and dried to give 300.2 g of the intermediate 2a, a 98% purity and 95% yield.
중간체 2a의 구조를 LCMS로 확인하였다.The structure of intermediate 2a was confirmed by LCMS.
질량 분석을 기기에 부착된 소프트웨어로 수행하여 317과 318에서 분자 단편 피크를 얻었으며, 생성물의 분자량은 316으로, 이는 T+1 및 T+2와 일치하였다.Mass spectrometry was performed with software attached to the instrument to obtain molecular fragment peaks at 317 and 318, and the molecular weight of the product was 316, consistent with T + 1 and T + 2.
(2) 중간체 2b의 제조(2) Preparation of intermediate 2b
31.6 g(0.1 mol)의 중간체 2a, 16.6 g(0.12 mol)의 탄산 칼륨 및 156 g의 아세토니트릴을 500 mL의 4-구 플라스크에 첨가한 다음, 80℃에서 환류 하에 가열하였다. 13.4 g(0.11 mol)의 클로로아세트산 에틸을 약 1시간 내에 적하하였다. 적하 완료 후, 반응을 8시간 동안 계속하였다. 반응 완료 후, 반응되지 않은 탄산 칼륨을 뜨거운 동안 여과에 의해 제거하고, 대부분의 용매를 감압에서 증발시켜 고체를 침전시키고, 이 고체를 흡인 여과하고, 메탄올로 헹구고 건조시켜, 중간체 2b인 36.8 g의 옅은 황색 고체를 98%의 순도 및 91.5의 수율로 수득하였다.31.6 g (0.1 mol) of intermediate 2a, 16.6 g (0.12 mol) of potassium carbonate and 156 g of acetonitrile were added to a 500 mL four-necked flask and heated at 80 DEG C under reflux. 13.4 g (0.11 mol) of ethyl chloroacetate was added dropwise in about 1 hour. After completion of the dropwise addition, the reaction was continued for 8 hours. After completion of the reaction, the unreacted potassium carbonate was removed by filtration by hot filtration and most of the solvent was evaporated under reduced pressure to precipitate a solid. The solid was suction filtered, rinsed with methanol and dried to obtain 36.8 g of intermediate 2b A pale yellow solid was obtained with a purity of 98% and a yield of 91.5.
중간체 2b의 구조를 LCMS로 확인하였다.The structure of intermediate 2b was confirmed by LCMS.
질량 분석을 기기에 부착된 소프트웨어로 수행하여 403과 404에서 분자 단편 피크를 얻었으며, 생성물의 분자량은 402로, 이는 T+1 및 T+2와 일치하였다.Mass spectrometry was performed with software attached to the instrument to obtain molecular fragment peaks at 403 and 404, and the molecular weight of the product was 402, which was consistent with T + 1 and T + 2.
중간체 2b의 구조는 1H-NMR에 의해 확인하였다.The structure of intermediate 2b was confirmed by 1 H-NMR.
1H-NMR(CDCl3, 500MHz): 3.6721-3.7232(3H, t), 4.9034-4.9985(2H, q), 7.0942(2H, s), 7.3424-7.4765(2H, d), 7.5432-7.6278(2H, q), 7.6082-7.6191(2H, d), 7.7634-7.7705(2H, d), 7.9234-8.0509(2H, d), 8.3233(1H, s). 1 H-NMR (CDCl 3 , 500 MHz): 3.6721-3.7232 (3H, t), 4.9034-4.9985 (2H, q), 7.0942 (2H, s), 7.3424-7.4765 , q), 7.6082-7.6191 (2H, d), 7.7634-7.7705 (2H, d), 7.9234-8.0509 (2H, d), 8.3233 (1H, s).
(3) 생성물 2의 제조(3) Production of product 2
180.4 g(0.45 mol)의 중간체 2b, 79.8 g(0.3 mol)의 원료 2d, 1.3 g의 수산화 리튬 및 540 g의 톨루엔을 1000 mL의 4-구 플라스크에 첨가하고, 온도를 90 - 100℃로 조절하여 교반하면서 가열하였다. 반응에서 생성된 메탄올을 가열하여 증발시키고, 메탄올이 더 이상 증발되지 않을 때까지 톨루엔을 적절하게 보충하였다. 뜨거운 동안 여과를 수행하고, 생성된 여과액을 잔류 톨루엔이 5000 ppm 미만이 될 때까지 감압 증류시켜, 생성물 2인 221 g의 옅은 황색 점성 물질을 92.4%의 수율로 수득하였다.A solution of 180.4 g (0.45 mol) of intermediate 2b, 79.8 g (0.3 mol) of raw material 2d, 1.3 g of lithium hydroxide and 540 g of toluene was added to a 1000 mL four-necked flask and the temperature was adjusted to 90-100 And heated with stirring. Methanol produced in the reaction was heated to evaporate, and toluene was appropriately replenished until the methanol was no longer evaporated. Filtration was carried out while hot, and the resulting filtrate was distilled under reduced pressure until the residual toluene content was less than 5000 ppm to obtain 221 g of a pale yellow viscous substance of product 2 in a yield of 92.4%.
실시예Example 3 - 9 3 - 9
실시예 1 또는 2의 방법을 참조로 다음 구조를 갖는 생성물 3-9를 합성하였다.Referring to the method of Example 1 or 2, the product 3-9 having the following structure was synthesized.
생성물 3:Product 3:
생성물 4:Product 4:
생성물 5:Product 5:
생성물 6:Product 6:
생성물 7:Product 7:
생성물 8:Product 8:
생성물 9:Product 9:
특성의 평가Evaluation of characteristics
예시적인 광경화성 조성물을 제형화(formulating)함으로써, 본 발명의 감광제의 도포 특성을 평가하였다.The application characteristics of the photosensitizer of the present invention were evaluated by formulating an exemplary photocurable composition.
1. 특성을 평가하기 위한 물체의 제조1. Manufacture of objects for characterization
< 감광성 수지 적층체의 제조 >≪ Preparation of photosensitive resin laminate >
표 1에 나타난 조성을 갖는 감광성 수지 조성물과 프로필렌 글리콜 모노에틸 에테르 아세테이트를 충분히 교반 및 혼합하고, 바 코팅(bar coating)을 사용하여 지지체로서 19 ㎛의 두께를 갖는 폴리에틸렌 테레프탈레이트 박막의 표면 위에 균일하게 코팅한 다음, 95℃의 건조기에서 4분 동안 건조시켜 40 ㎛의 두께를 갖는 감광성 수지층을 형성하였다. 그 다음에, 폴리에틸렌 테레프탈레이트 박막이 적층되지 않은 감광성 수지층의 표면 위에 보호층으로서 23 ㎛의 두께를 갖는 폴리에틸렌 박막을 부착시켜 감광성 수지 적층체를 얻었다.The photosensitive resin composition having the composition shown in Table 1 and propylene glycol monoethyl ether acetate were thoroughly stirred and mixed, and uniformly coated on the surface of a polyethylene terephthalate thin film having a thickness of 19 mu m as a support using bar coating And then dried in a dryer at 95 캜 for 4 minutes to form a photosensitive resin layer having a thickness of 40 탆. Then, a polyethylene thin film having a thickness of 23 mu m was adhered as a protective layer on the surface of the photosensitive resin layer on which the polyethylene terephthalate thin film was not laminated to obtain a photosensitive resin laminate.
< 기판 표면의 평탄화(leveling) >≪ Leveling of Substrate Surface >
감광성 및 해상도를 평가하는 데 사용하기 위한 기판으로서, 분무식 워싱 밀(spray washing mill)을 이용하여 0.20 MPa의 분무 압력(spray pressure)으로 처리한 구리 피복 적층체(copper clad laminate)를 사용을 위해 제조하였다.As a substrate for use in evaluating photosensitivity and resolution, the use of a copper clad laminate treated with a spray washing mill at a spray pressure of 0.20 MPa .
< 적층 (lamination) ><Lamination>
표면을 평탄화시키는 동안, 감광성 수지 적층체의 폴리에틸렌 박막이 박리되었다. 105℃의 롤러 온도에서 핫 롤러 라미네이터(hot roller laminator)에 의해 60℃로 예열된 구리 피복 적층체 위에 적층체를 적층하였고, 여기에서 가스 압력은 0.35 MPa이고 적층 속도는 1.5 m/분이었다.While the surface was planarized, the polyethylene thin film of the photosensitive resin laminate peeled off. The laminate was laminated on a copper clad laminate preheated to 60 占 폚 by a hot roller laminator at a roller temperature of 105 占 폚, wherein the gas pressure was 0.35 MPa and the laminating speed was 1.5 m / min.
< 노광(exposure) ><Exposure>
h-선 유형의 직접 드로잉 노광 장치(h-ray type direct drawing exposure apparatus; Digital Light Processing)를 사용함으로써, 아래 기술된 감광성의 평가에 따라 단계적 노광 장치의 단계 수가 8인 노광 량(exposure amount)으로 노광을 수행하였다.By using an h-ray type direct drawing exposure apparatus (Digital Light Processing), an exposure amount of 8 steps in the step-by-step exposure apparatus is obtained according to the photosensitivity evaluation described below. Exposure was performed.
< 현상(development) ><Development>
폴리에틸렌 테레프탈레이트 박막을 박리한 후, 수산화 테트라메틸암모늄의 2.38 질량% 수용액을 사용하여 23℃에서 2분 동안 현상을 수행하여 감광성 수지층의 비노광 부분을 용해시키고 제거하였다. 그 다음에, 초순수(ultra-pure water)로 1분 동안 세척을 수행하였다. 이때, 비노광 부분에서 감광성 수지층을 완전히 용해시키는 데 필요한 최소량의 시간이 최소 현상 시간으로 간주되었다.After the polyethylene terephthalate thin film was peeled off, development was carried out at 23 DEG C for 2 minutes using a 2.38 mass% aqueous solution of tetramethylammonium hydroxide to dissolve and remove unexposed portions of the photosensitive resin layer. Then, cleaning was performed with ultra-pure water for 1 minute. At this time, the minimum amount of time required to completely dissolve the photosensitive resin layer in the non-exposed portion was regarded as the minimum developing time.
1Example
One
2Example
2
3Example
3
4Example
4
5Example
5
1Comparative Example
One
2Comparative Example
2
3Comparative Example
3
4Comparative Example
4
감광성
수지
조성물
(중량부)
Photosensitive
Suzy
Composition
(Parts by weight)
주: 표 1에서 기호(designation)로 표시된 성분의 명칭/조성을 표 2에 나타내었다.Note: The name / composition of the components indicated by designation in Table 1 is shown in Table 2.
2. 특성을 평가하기 위한 방법2. Methods for evaluating characteristics
(1) 상용성 시험(Compatibility Test)(1) Compatibility Test
표 1에 나타난 조성을 갖는 감광성 수지 조성물을 충분히 교반 및 혼합하고, 바 코팅을 이용하여 지지체로서 19 ㎛의 두께를 갖는 폴리에틸렌 테레프탈레이트 박막의 표면 위에 균일하게 코팅하고, 95℃의 건조기에서 4분 동안 건조시켜 감광성 수지층을 형성하였다. 이후, 코팅된 표면을 시각적으로 검사하고 다음과 같이 평가하였다.The photosensitive resin composition having the composition shown in Table 1 was thoroughly stirred and mixed and uniformly coated on the surface of a polyethylene terephthalate thin film having a thickness of 19 mu m as a support using a bar coating and dried in a dryer at 95 DEG C for 4 minutes Thereby forming a photosensitive resin layer. Thereafter, the coated surface was visually inspected and evaluated as follows.
◇: 코팅된 표면이 균일하였다.◇: Coated surface was uniform.
◆: 코팅된 표면 위에 불용성 물질이 침전되었다.◆: Insoluble material deposited on the coated surface.
(2) 감광성의 평가(2) Evaluation of photosensitivity
밝기가 투명한 것부터 검정까지 21 단계로 변하는, 스토퍼(Stouffer)에 의해 생성된 21-단계의 단계적 노광 장치를 사용하여 적층 후 기판을 15분 동안 노광시켜 그 감광성을 평가하였다. 노광 후, 최소 현상 시간의 2배의 시간 동안 현상을 수행하고, 레지스트 필름(resist film)이 완전하게 남아있는 단계적 노광 장치의 단계 수가 8인 노광량에 따라 평가를 다음과 같이 수행하였다.The substrate was exposed to light for 15 minutes using a 21-stage step-by-step exposure apparatus produced by a Stouffer, whose brightness varied from transparent to black to 21, and its photosensitivity was evaluated. After the exposure, development was carried out for twice the minimum development time, and the evaluation was carried out according to the exposure amount of 8 in the stepwise exposure apparatus in which the resist film remained completely, as follows.
○: 노광량은 20 mJ/cm2 이하였다.?: The exposure dose was 20 mJ / cm 2 or less.
◎: 노광량은 20 mJ/cm2 - 50 mJ/cm2였다(종점 값은 제외되었음).?: Exposure dose was 20 mJ / cm 2 - 50 mJ / cm 2 (end point value excluded).
●: 노광량은 50 mJ/cm2 이상이었다.●: The exposure dose was 50 mJ / cm 2 or more.
(3) 해상도의 평가(3) Evaluation of resolution
노광 부분 대 비노광 부분의 폭 비(width ratio)가 1:1인 라인 패턴 마스크로 적층 후 기판을 15분 동안 노광시켰다. 그 다음에, 최소 현상 시간의 2배의 시간 동안 현상을 수행하고, 경화된 레지스트 라인이 정상적으로 형성되는 최소 마스크 라인 폭을 해상도 값으로 사용하였다. 평가를 다음과 같이 수행하였다.The substrate was exposed for 15 minutes after lamination with a line pattern mask having a width ratio of 1: 1 of the exposed portion to the unexposed portion. Next, development was performed for twice the minimum development time, and the minimum mask line width at which the cured resist line was normally formed was used as the resolution value. Evaluation was performed as follows.
○: 해상도 값은 30 ㎛ 이하였다.?: The resolution value was 30 占 퐉 or less.
◎: 해상도 값은 30 ㎛ - 50 ㎛였다(종점 값은 제외되었음).⊚: The resolution value was 30 탆 - 50 탆 (the end point value was excluded).
●: 해상도 값은 50 ㎛ 이상이었다.●: The resolution value was 50 μm or more.
(4) 접착성의 평가(4) Evaluation of adhesiveness
노광 부분 대 비노광 부분의 폭비가 1:100인 라인 패턴 마스크로 적층 후 기판을 15분 동안 노광시켰다. 그 다음에, 최소 현상 시간의 2배인 시간 동안 현상을 수행하고, 경화된 레지스트 라인이 정상적으로 형성되는 최소 마스크 라인 폭을 접착성 값으로 사용하였다. 평가는 다음과 같이 수행하였다.The substrate was exposed for 15 minutes after lamination with a line pattern mask having a width ratio of the exposed portion to the unexposed portion of 1: 100. Then, developing was performed for a time that was twice the minimum developing time, and the minimum mask line width at which the cured resist line was normally formed was used as the adhesion value. The evaluation was carried out as follows.
○: 접착성 값은 30 ㎛ 이하였다.?: Adhesion value was 30 占 퐉 or less.
◎: 접착성 값은 30 ㎛ - 50 ㎛였다(종점 값은 제외되었음).?: Adhesion value was 30 占 퐉 to 50 占 퐉 (the end point value was excluded).
●: 접착성 값은 50 ㎛ 이상이었다.●: Adhesion value was 50 μm or more.
(5) 수용성의 평가(5) Evaluation of water solubility
폴리에틸렌 테레프탈레이트 박막을 박리한 후, 수산화 테트라메틸암모늄의 2.38 질량% 수용액을 사용하여 23℃에서 2분 동안 현상을 수행하여 감광성 수지층의 비노광 부분을 용해시키고 제거하였다. 그 다음에, 초순수로 1분 동안 세척을 수행하였다. 평가를 다음과 같이 수행하였다.After the polyethylene terephthalate thin film was peeled off, development was carried out at 23 DEG C for 2 minutes using a 2.38 mass% aqueous solution of tetramethylammonium hydroxide to dissolve and remove unexposed portions of the photosensitive resin layer. Then, cleaning was performed for one minute with ultra pure water. Evaluation was performed as follows.
◇: 완전히 용해되고, 고체는 남아있지 않았다.◇: completely dissolved, no solid remained.
◆: 코팅된 표면 위에 고체가 침전되었다.◆: Solids settled on the coated surface.
3. 특성의 평가 결과3. Evaluation results of characteristics
특성의 평가 결과를 표 3에 열거하였다.The evaluation results of the characteristics are listed in Table 3.
1Example
One
2Example
2
3Example
3
4Example
4
5Example
5
1Comparative Example
One
2Comparative Example
2
3Comparative Example
3
4Comparative Example
4
등급mJ / cm 2 /
Rating
주: *1 - 레지스트 라인은 형성될 수 없고, 완전히 경화되지 않았으며 해상도와 접착성의 평가에 사용될 수 없었다.Note: * 1 - The resist line could not be formed, was not fully cured and could not be used for evaluation of resolution and adhesion.
표 3의 평가 결과로부터 알 수 있는 바와 같이, 다른 성분이 동일한 경우에, 9-페닐아크리딘계 감광제를 사용하는 본 발명의 조성물(구현예 1 - 5)은 매우 양호한 상용성, 높은 감광성, 매우 양호한 해상도와 접착성 및 양호한 수용성을 가지며, 기존의 감광제를 사용하는 비교예 1-2보다 현저히 우수하였다. 비교예 3에 관하여, TPS 광산 발생제만이 함유되는 경우, 조성물의 상용성, 감광성, 해상도, 접착성 및 수용성은 9-페닐아크리딘 감광제를 사용하는 본 발명의 조성물(구현예 1 - 5)의 것들보다 훨씬 더 낮았다. 비교예 4는 조성물이 TPS 및 감광제의 부재시 전혀 경화될 수 없었음을 보여준다.As can be seen from the evaluation results in Table 3, the compositions of the present invention (Examples 1 to 5) using 9-phenylacridine-based photosensitizers exhibit very good compatibility, high photosensitivity, It has good resolution, adhesion and good water solubility and is remarkably superior to Comparative Example 1-2 using a conventional photosensitive agent. With respect to Comparative Example 3, compatibility, photosensitivity, resolution, adhesiveness and water solubility of the composition when only the TPS photoacid generator was contained were measured using a composition of the present invention using the 9-phenylacridine sensitizer ) Were much lower than those of. Comparative Example 4 shows that the composition could not be cured at all in the absence of TPS and photosensitizer.
4. 추가 특성화4. Additional Characterization
표 4에 나타낸 바와 같은 제형을 갖는 감광성 수지 조성물을 제형화하였다.A photosensitive resin composition having a formulation as shown in Table 4 was formulated.
6Example
6
7Example
7
8Example
8
9Example
9
10Example
10
11Example
11
12Example
12
13Example
13
14Example
14
감광성
수지
조성물
(중량부)
Photosensitive
Suzy
Composition
(Parts by weight)
주: 표 4의 기호로 표시된 성분의 명칭/조성을 표 5에 나타내었다.Note: The names / composition of the components indicated by symbols in Table 4 are shown in Table 5.
평가 방법을 참조하여 감광성을 평가하였다. 평가 결과를 표 6에 열거하였다.The photosensitivity was evaluated with reference to the evaluation method. The evaluation results are listed in Table 6.
6Example
6
7Example
7
8Example
8
9Example
9
10Example
10
11Example
11
12Example
12
13Example
13
14Example
14
등급mJ / cm 2 /
Rating
주: *1 - 충분히 경화되지 않음.Note: * 1 - Not fully cured.
본 발명의 감광제는 단독으로 사용했을 때 양호한 감광성 효과를 보이지 않았으며, 조성물을 완전히 경화시킬 수 없다는 것이 실험에 의해 밝혀졌다. 라디칼 광개시제, 광 염기 발생제 등과 같은 광개시제와 함께 사용되는 경우, 감광제는 광개시제가 단독으로 사용된 경우에 비하여 총량이 변하지 않은 경우 더 높은 감도를 나타내었다.It has been found experimentally that the photoresist of the present invention did not exhibit a good photosensitive effect when used alone, and that the composition can not be fully cured. When used in conjunction with photoinitiators such as radical photoinitiators, photoinitiators, etc., the photosensitizer exhibited a higher sensitivity when the total amount was not changed compared to when the photoinitiator was used alone.
요약하면, 본 발명의 감광제는 광경화성 분야에서 매우 우수한 도포 성능을 나타내며, 넓은 적용 가능성을 갖는다. 또한, 본 발명의 감광제는 상술한 제형에 의해 나타난 바와 같은 적용 분야에 제한되지 않는다. 광경화성 페인트, 잉크, 포토레지스트 등의 모든 시스템은 이들이 본 발명의 감광제를 사용하는 한, 이 특허에 의해 보호되는 범위 내에 속한다.In summary, the photosensitizer of the present invention exhibits excellent coating performance in the field of photocuring and has wide applicability. Further, the photosensitizer of the present invention is not limited to the application field as shown by the above-mentioned formulations. All systems such as photocurable paints, inks, photoresists, etc. fall within the scope protected by this patent as long as they use the photosensitizer of the present invention.
Claims (10)
식(I)로 표시되는 구조를 갖는 화합물 중 적어도 하나를 포함하고:
여기에서,
R1은 C1-C60 선형 또는 분지형 (m+n)-원자가(valent) 알킬기를 나타내며, 여기에서 -CH2-는 산소, 황, 또는 1,4-페닐렌기로 선택적으로 치환될 수 있고;
A는 각각 독립적으로 -[(CHR4)x-O]y-를 나타내고, 여기에서 R4는 각각 독립적으로 수소, 메틸기 또는 에틸기를 나타내고, x는 1-10의 정수이고, y는 1-20의 정수이고;
R2는 C1-C20 선형 또는 분지형 알킬렌기를 나타내며, 여기에서 -CH2-는 산소, 황 또는 페닐렌기로 선택적으로 치환될 수 있고;
R3은 수소 또는 치환기를 나타내고; 및
m은 0-20의 정수를 나타내고, n은 1-20의 정수를 나타내는 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.As a 9-phenylacridine polymer sensitizer,
A composition comprising at least one compound having a structure represented by formula (I)
From here,
R 1 represents a C 1 -C 60 linear or branched (m + n) -valent alkyl group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur, or 1,4-phenylene group Have;
A represents independently - [(CHR 4 ) x -O] y -, wherein each R 4 independently represents hydrogen, a methyl group or an ethyl group, x is an integer of 1-10, y is 1-20 Lt; / RTI >
R 2 represents a C 1 -C 20 linear or branched alkylene group, wherein -CH 2 - may be optionally substituted with an oxygen, sulfur or phenylene group;
R 3 represents hydrogen or a substituent; And
m is an integer of 0 to 20, and n is an integer of 1-20.
R1은 C1-C20 선형 또는 분지형 (m+n)-원자가 알킬기를 나타내고, 여기에서 -CH2-는 2개의 산소가 직접 연결되어 있지 않은 경우, 산소 또는 1,4-페닐렌기로 선택적으로 치환될 수 있는 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1,
R 1 represents a C 1 -C 20 linear or branched (m + n) -valent alkyl group, wherein -CH 2 - is an oxygen or 1,4-phenylene group when two oxygen atoms are not directly connected Lt; RTI ID = 0.0 > 9-phenylacridine < / RTI > polymeric sensitizer.
A는 -[(CHR4)x-O]y-를 나타내고, 여기에서 R4는 각각 독립적으로 수소, 메틸기 또는 에틸기를 나타내며, x는 1-10의 정수이고, y는 1-20의 정수인 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1,
A represents - [(CHR 4 ) x -O] y -, wherein each R 4 independently represents hydrogen, a methyl group or an ethyl group, x is an integer of 1-10 and y is an integer of 1-20 9-phenylacridine polymeric photoresist.
-[(CHR4)x-O]y- 기의 말단 산소 원자는 R1에 연결되는 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1 or 3,
- [(CHR 4) x -O ] y - group terminal oxygen atoms, 9-phenyl acridine polymeric photosensitive agent, characterized in that coupled to the R 1.
R2는 C1-C8 선형 또는 분지형 알킬렌기를 나타내고, 여기에서 -CH2-는 2개의 산소가 직접 연결되어 있지 않은 경우, 산소 또는 1,4-페닐렌기로 선택적으로 치환될 수 있는 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1,
R 2 represents a C 1 -C 8 linear or branched alkylene group, wherein -CH 2 -, when two oxygen atoms are not directly connected, may be optionally substituted with oxygen or a 1,4-phenylene group ≪ / RTI > 9-phenylacridine polymeric photoresist.
R3은 H, CH3, NO2 또는 할로겐으로부터 선택되는 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1,
R 3 is selected from H, CH 3 , NO 2 or halogen.
m은 0-7의 정수를 나타내고, n은 1-8의 정수를 나타내며, m과 n의 합은 2-8의 정수인 것을 특징으로 하는, 9-페닐아크리딘 고분자 감광제.The method according to claim 1,
m is an integer of 0 to 7, n is an integer of 1 to 8, and the sum of m and n is an integer of 2 to 8. 9. The 9-phenylacridine polymer sensitizer according to claim 1,
(1) 촉매의 존재하에 원료 a와 원료 b 사이에 반응을 수행하여 중간체 a를 수득하는 단계;
(2) 산 결합제(acid binding agent)를 함유하는 용매에서 중간체 a와 원료 c 사이에 반응을 수행하여 중간체 b를 수득하는 단계;
(3) 촉매의 존재하에 중간체 b와 원료 d 사이에 에스테르 교환 반응(transesterification reaction)을 수행하여 생성물을 수득하는 단계를
포함하고,
반응식은 아래와 같이 도시되며:
여기에서, R5는 C1-C8 선형 또는 분지형 알킬기를 나타내는, 9-페닐아크리딘 고분자 감광제를 제조하는 방법.9. A method for producing a 9-phenyl acridine polymer sensitizer according to any one of claims 1 to 7,
(1) carrying out a reaction between raw material a and raw material b in the presence of a catalyst to obtain an intermediate a;
(2) performing a reaction between the intermediate a and the starting material c in a solvent containing an acid binding agent to obtain an intermediate b;
(3) carrying out a transesterification reaction between the intermediate b and the starting material d in the presence of a catalyst to obtain a product
Including,
The reaction scheme is illustrated as follows:
Here, R 5 is a process for producing a C 1 -C 8 linear or branched alkyl group represents a, 9-phenyl acridine polymeric photosensitizer.
광경화성 조성물에 사용되는 광개시제는 광산 발생제, 광 염기 발생제, 및 라디칼 광개시제로부터 선택되는 것을 특징으로 하는, 용도.10. The method of claim 9,
Wherein the photoinitiator used in the photo-curable composition is selected from photoacid generators, photoinitiators, and radical photoinitiators.
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