KR20170128675A - A method of forming a multi-element alloy thin film composite - Google Patents

Abstract

The present invention relates to a method for forming a multi-element alloy composite thin film. More specifically, the present invention relates to a method for depositing a thin film on a surface of a tool by using coating equipment comprising an arc coating unit, a sputter coating unit, an HCD etching unit, and a vacuum pump, the method comprising: a tool inserting step in which the tool is disposed inside the coating equipment using a table cart; a coating equipment vacuum forming step of closing a door to seal the coating equipment and operating the vacuum pump to make the inside of the coating equipment become vacuum; a coating equipment gas removing step of applying heat to the inside of the coating equipment to remove a gas inside the coating equipment; a tool etching step of removing surface layer foreign substances of the tool which is injected into the coating equipment through plasma etching; a tool lower layer coating step of depositing a primary thin film on the surface of the tool by an arc discharge scheme using AlCrN; a tool interlayer coating step of depositing a secondary thin film on the tool, to which the primary thin film is deposited, by an arc discharge scheme using AlCrSiN; an tool upper layer coating step of depositing a third thin film on the tool, to which the secondary thin film is deposited, by an abnormal glow discharge scheme using CrZrN; and a vacuum cooling step of cooling the multilayer coated tool by vacuum-cooling the inside of the coating equipment.The present invention relates to a method for forming a multi-element alloy composite thin film. More specifically, the present invention relates to a method for depositing a thin film on a surface of a tool by using coating equipment comprising an arc coating unit, a sputter coating unit, an HCD etching unit, and a vacuum pump, the method comprising: a tool inserting step in which the tool is disposed inside the coating equipment using a table cart; a coating equipment vacuum forming step of closing a door to seal the coating equipment and operating the vacuum pump to make the inside of the coating equipment become vacuum; a coating equipment gas removing step of applying heat to the inside of the coating equipment to remove a gas inside the coating equipment; a tool etching step of removing surface layer foreign substances of the tool which is injected into the coating equipment through plasma etching; a tool lower layer coating step of depositing a primary thin film on the surface of the tool by an arc discharge scheme using AlCrN; a tool interlayer coating step of depositing a secondary thin film on the tool, to which the primary thin film is deposited, by an arc discharge scheme using AlCrSiN; an tool upper layer coating step of depositing a third thin film on the tool, to which the secondary thin film is deposited, by an abnormal glow discharge scheme using CrZrN; and a vacuum cooling step of cooling the multilayer coated tool by vacuum-cooling the inside of the coating equipment.

Description

[0001] The present invention relates to a multi-element alloy thin film composite,

More specifically, the present invention relates to a method for forming a multi-layered alloy composite thin film, and more particularly, to a method for forming a multi-layered alloy composite thin film, The speed can be delayed, the coating operation can be facilitated, and the productivity of the tool can be improved as well as the life of the tool can be improved. In addition, the shape of the thin film deposited on the tool is fixed by removing the residual stress, To thereby produce a multi-component alloy composite thin film forming method capable of processing a complicated structure into a desired shape.

In general, vacuum deposition plating is classified into physical vapor deposition plating and chemical vapor deposition plating, and physical vapor deposition plating can be classified again into evaporation plating, ion plating and lapping plating.

The ion plating is further divided into arc ion plating, HCD ion plating, and next pole ion plating, which are used for different purposes, and their advantages and disadvantages are also different.

In addition, the conventional vacuum vapor deposition plating apparatuses could only perform one plating in one chamber.

That is, since the arc ion plating apparatus and the HCD ion plating apparatus are composed of separate apparatuses, it is necessary to newly purchase the apparatuses necessary for plating different from the one that has already been done. As a result, the installation cost is excessive, There are problems that it is difficult to improve the coating effect owing to the inherent problems in the surface.

On the other hand, today, most cutting tools are coated with PVD or CVD coatings such as Ti (C, N), TiN, (Ti, Al) N, (Ti, Si) N, (Al, Cr) N or Al2O3.

And, PVD coatings are generally thinner than CVD coatings, which have a better ability to withstand compressive stresses, microparticle coatings, and load changes compared to CVD coatings, for example, .

However, most arc-deposited PVD coatings are problematic due to small spherical microparticles buried in the coating or on the surface of the coating, or metal macroparticles, also referred to as droplets.

In other words, when depositing the coating, the macromolecules can block the incoming flux of charged metal ions, creating voids in the coating in the immediate vicinity of the macromolecules, thereby reducing adhesion between the coating and macromolecules , The macromolecule can fall off either during the deposition process or immediately after processing or during processing.

This could result in a coating of inferior quality with pores, pores or, in extreme cases, holes down to the substrate, and the use of a cutting tool with such inferior quality coatings would result in cracking of the tool, There is a problem that chipping or breakage of the blade easily occurs.

Accordingly, the present applicant has developed and registered "PVD coating equipment for cutting tools and a coating method using the same" as in the registered patent publication No. 10-1556372.

"PVD coating equipment of cutting tool and coating method using same ", such as the registered patent publication No. 10-1556372,

However, in the above-mentioned conventional "PVD coating equipment of cutting tool and coating method using the same," the cutting tool is coated with a double coating using an arc coating part and a sputter coating part, there was.

In addition, since the cutting tool manufactured by the above method is not stable in abrasion resistance and adhesion resistance, there is a problem that abrasion due to early peeling and chipping occurs easily during cutting using a cutting tool, The cost was increased.

Accordingly, the Applicant has found that the coating can be efficiently performed to save time and cost due to the coating, and the thermal stress (thermal stress) resistance can be increased from a high temperature cutting chip, A method of forming a multi-layered alloy composite membrane having high hardness, high heat resistance, and high lubricity so as to delay the fatigue uniform propagation speed of frictional heat during machining has been developed.

An object of the present invention is to provide a method of depositing a first thin film on a surface of a tool having a surface layer foreign material removed by an arc discharge method using AlCrN and then forming a second thin film on a first thin film deposited by an arc discharge method using AlCrSiN By forming a tertiary thin film on a secondary thin film deposited by sputtering, which is an abnormal glow discharge using CrZrN, the hardness, heat resistance, abrasion resistance and lubricity of the thin film can be improved even with a high content of silicon component , Thereby providing a multi-layered alloy composite thin film forming method capable of delaying the rate of fatigue uniform propagation along with an increase in thermal stress resistance.

In addition, the present invention is characterized in that the thicknesses of the first, second and third thin film depositions formed in the tool lower layer coating step, the tool intermediate layer coating step and the air upper layer coating step are respectively 3: 1: 1, And the abrasion-resistant primary thin film can be easily deposited on the surface of the tool to a thick thickness. In addition, the silicon component contained in the secondary thin film enables the high temperature, which is instantaneously raised during processing, By thinning the third thin film, which has a lower coefficient of friction and lower friction coefficient than the first thin film, on the surface of the second thin film, it improves durability, lubrication and surface roughness and improves tool life. The present invention also provides a method of forming a multi-layered alloy composite thin film.

In addition, the present invention prevents the deformation of the tool, which is manufactured through additionally constituting the step of removing the residual stress formed in the respective thin film deposition, following the tool lower layer coating step, the tool intermediate layer coating step and the air upper layer coating step The present invention has been made in view of the above problems, and it is an object of the present invention to provide a multi-element alloy composite thin film forming method capable of easily processing a complicated structure into a desired shape.

According to an aspect of the present invention, there is provided a method of depositing a thin film on a surface of a tool by using a coating equipment comprising an arc coating portion, a sputter coating portion, an HCD etching portion, and a vacuum pump, Into the interior of the coating equipment; A coating equipment vacuum forming step of closing the door to seal the coating equipment and then operating the vacuum pump to vacuum the interior of the coating equipment; A coating equipment gas removing step of applying heat to the interior of the coating equipment to remove gas inside the coating equipment; A tool etching step of removing surface layer impurities of the tool which has been introduced into the coating equipment through plasma etching; A tool lower layer coating step of depositing a primary thin film on the surface of the tool by an arc discharge method using AlCrN; A tool intermediate layer coating step of depositing a secondary thin film on a primary thin film deposited tool by an arc discharge method using AlCrSiN; A tool upper layer coating step of depositing a third thin film on a second thin film deposited tool with an abnormal glow discharge method using CrZrN; And a vacuum cooling step of cooling the interior of the coating equipment by vacuum cooling to cool the multi-layer coated tool.

Using the multi-component alloy composite thin film forming method of the present invention, primary thin film deposition can be easily performed on the surface of a tool having surface layer foreign substances removed by an arc discharge method using AlCrN, and arc discharge using AlCrSiN Arc Discharge method, and a tertiary thin film deposition is performed on a tool deposited by a secondary thin film deposition using sputtering, which is an abnormal glow discharge using CrZrN. It is possible to improve the hardness, heat resistance, abrasion resistance and lubricity of the thin film even with a high content of silicon component, thereby increasing the thermal stress (thermal stress) resistance and delaying the fatigue uniform propagation speed There are advantages to be able to.

In addition, the present invention is characterized in that the thicknesses of the first, second and third thin film depositions formed in the tool lower layer coating step, the tool intermediate layer coating step and the air upper layer coating step are respectively 3: 1: 1, And the abrasion-resistant primary thin film can be easily deposited on the surface of the tool to a thick thickness. In addition, the silicon component contained in the secondary thin film enables the high temperature, which is instantaneously raised during processing, By thinning the third thin film, which has a lower coefficient of friction and lower friction coefficient than the first thin film, on the surface of the second thin film, it improves durability, lubrication and surface roughness and improves tool life. There are advantages to be able to.

In addition, the present invention provides a method for manufacturing a semiconductor device, which comprises the steps of separately removing the residual stress (residual stress) formed in each thin film deposition step after the tool lower layer coating step, the tool intermediate layer coating step and the air upper layer coating step It is possible to prevent the deformation of the tool, and it is a useful invention that can easily process a complicated structure into a desired shape.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flowchart showing a multi-element alloy composite thin film forming method of the present invention. FIG.
2 is a perspective view showing the coating equipment and table cart of the present invention.
3 is a schematic diagram showing the coating equipment of the present invention.
4 is a graph showing voltage-current characteristics of glow discharge and arc discharge.

Hereinafter, the structure of the present invention will be described.

1 to 4, the present invention can be applied to a tool 10 using a coating equipment 50 comprising an arc coating part 10, a sputter coating part 20, an HCD etching part 30 and a vacuum pump 40, (10) for placing a tool (9) inside a coating equipment (50) by using a table cart (60); A coating equipment vacuum forming step (S20) of closing the door (51) to seal the coating equipment (50) and then operating the vacuum pump (40) to evacuate the inside of the coating equipment (50); A coating equipment degassing step (S30) for applying heat to the inside of the coating equipment (50) to remove gas inside the coating equipment (50); A tool etching step (S40) for removing surface layer foreign substances of the tool (9) inserted into the coating equipment (50) through plasma etching; A tool lower layer coating step (S50) for depositing the primary thin film (1) on the surface of the tool by an arc discharge method using AlCrN; A tool intermediate layer coating step (S60) for depositing a secondary thin film (2) on a primary thin film (1) deposited tool by an arc discharge method using AlCrSiN; A tool upper layer coating step (S70) for depositing a tertiary thin film (3) on a secondary thin film (2) deposited by an Abnormal Glow Discharge (Sputtering) method using CrZrN; And a vacuum cooling step (S80) of cooling the inside of the coating equipment (50) by vacuum cooling to cool the multi-layer coated tool (9).

The coating apparatus 50 includes a chamber body 50a having an arc coating unit 10, a sputter coating unit 20, an HCD etching unit 30 and a vacuum pump 40. The chamber body 50a Closing door 51 for accommodating the tool 9 in the chamber body 50a in front of the chamber body 51 and the inside of the chamber body 51 The heater 55 of FIG.

Here, the arc coating portion 10 has a structure that forms a surface coating of the tool 9 rotating and revolving in a state where it is installed on the chamber body 50a as conventionally known, and is attached to the chamber body 50a An arc module plate 11 and an arc source 13 coupled to the arc module plate 11 to irradiate a light source toward the tool 9. The first and second thin films are deposited using an AlCr powder target And one AlCrSi powder alloy target.

In addition, the sputtering coating portion 20 is formed on the surface of the tool 9, which is rotated and revolved in a state where it is installed on the chamber body 50a as conventionally known, that is, A sputter module plate 21 to which a chamber body is coupled and a sputter source 23 coupled to the sputter module plate 21 to irradiate a light source toward the tool 1, The CrZr target is mounted.

The HCD etcher 30 is configured to remove foreign substances on the surface layer of the tool 9 so that the coating can be more easily formed on the tool 9 as conventionally known. (Not shown) is injected into the vacuum through the vapor pressure formed in the inside of the tool 9, thereby etching the surface of the tool 9.

In addition, the vacuum pump 40 is installed on the upper portion of the chamber body 50a to control the pressure inside the chamber body 50a during arc coating, sputter coating and HCD etching, as is known in the art.

In addition, the table cart 60 is a structure for charging and storing according to the easy movement of the tool 9 as conventionally known.

Hereinafter, the multi-element alloy composite thin film forming method of the present invention will be described in more detail.

First, the tool loading step S10 is a step of placing the tool 9 inside the chamber body 50a formed in the coating equipment 50 by using the table cart 60, (Not shown) and is disposed inside the chamber body 50a so that the tool 9 can rotate and revolve as the table assembly is driven .

Second, in the coating equipment vacuum forming step S20, while the tool 9 is disposed inside the chamber body 50a of the coating equipment 50 as described above, the door 51 is closed to remove the chamber body 50a (50a) through the operation of the vacuum pump (40) after the inside of the chamber (50) is closed by evacuation using the vacuum pump (40) Vacuum the inside of the body 50a.

Third, the coating equipment degassing step S30 is a step of activating the heater 66 built in the coating equipment 50 and removing the remaining gas in the coating equipment 50 by applying heat thereto , Heat generated by the heater (55), and exhaust through the vacuum pump (40), the gas is smoothly discharged and the gas inside the coating equipment (50) is removed.

Fourth, the tool etching step (S40), as well known, allows the light source of the HCD source to dissolve the diffuser plate, and the particles of the diffuser plate dissolved through the vapor pressure formed inside the coating equipment 50 are injected into the vacuum The surface layer of the tool 9 is removed by the action of plasma etching.

Before the etching of the tool 9 as described above is performed, the tool 9 disposed inside the coating equipment 50 is moved to the driving of the table assembly so that the etching of the tool 9 can be smoothened The rotation and revolution of the tool 9 should be performed first, and the rotation and revolution of the tool 9 should be continuously performed until the coating process is completed.

Fifth, the tool lower layer coating step S50 is a step of depositing the primary thin film 1 on the surface of the tool 9 by an arc discharge method using AlCrN, The adhesion with the tool 9 is good, the deposition is robust, and the abrasion resistance is excellent.

Further, in the present invention, the thickness of the total layer of the multi-coated coating on the tool 9 is about 10 micrometers (m). At this time, the first thin film 1 deposited in the under-tool coating step S50 Since it is easy to perform the deposition compared with the performance, it is preferable that the thickness is made as thick as about 6 mu m.

When the first thin film 1 is deposited through the tool lower layer coating step S50 described above, the hardness of the first thin film 1 deposited is lower than the hardness of the first thin film 1, Is formed with a hardness of 3000 to 3500 Hv and forms a fine columnar structure among crystal structures.

After the first thin film 1 is deposited on the tool 9 through the tool lower layer coating step S50, the inside of the chamber body 50a of the coating equipment 50 is pressurized at a pressure of 5 to 50 mTorr, And the residual stress generated during the deposition of the first thin film 1 is removed by evacuating for 1 to 10 minutes while maintaining the temperature at 500 DEG C. In order to prevent deformation of the tool 9 made into a complicated shape (S51)

Sixth, the intermediate layer coating step (S60) is a step for achieving high hardness, abrasion resistance and high heat resistance. In the arc-discharge method using AlCrSiN, a first thin film (1) The second thin film 2 has a dense nanostructure in an amorphous state due to the Si component contained in the second thin film 2 in a high content, It is possible to prevent thermal cracks from developing even if a high temperature occurs.

Thus, even in the use of the continuous tool 9, the thin films 1, 2 and 3 deposited through the present invention are prevented from causing minute cracks due to thermal shock, thereby increasing the service life of the tool 9 .

Since the second thin film 2 deposited in the tool side coating step S60 has a structure for thermal crack propagation, it may be formed only to a thickness of about 2 mu m, and may have a dense nanostructure on an amorphous phase It is formed relatively low at a hardness of about 2500 to 3000 Hv.

After the second thin film 2 is deposited on the tool 9 on which the first thin film 1 is deposited through the middle layer coating step S60 as described above, the step of removing the residual stress S61 is performed It is preferable to remove the residual stress generated during the deposition of the second thin film 2 by performing the same conditions as described above.

Seventh, the tool upper layer coating step (S70) is performed to achieve an improvement in tool life. The tool upper layer coating step (S70) is a step of performing an Abnormal Glow Discharge using CrZrN, that is, a sputtering method, And the tertiary thin film 3 is deposited on the surface of the substrate 1 to enhance durability, lubricity and surface roughness.

The reason why the third thin film 3 is deposited by a sputtering method is that the Zr is difficult to be blown by the arc discharge method. At this time, since the CrZr characteristic has a remarkably low coefficient of friction, It is preferable to deposit the third thin film 3 to a thickness of about 2 탆.

Therefore, when the deposition thickness of the first, second and third thin films (1, 2, 3) is formed to be 6 탆, 2 탆 and 2 탆, that is, 3: 1: 1 as described above, Not only the good primary thin film 1 can be easily deposited on the surface of the tool 9 with a great thickness but also the silicon component contained in the secondary thin film 2 can heat (3) superior in abrasion resistance to the primary thin film (1) is deposited on the surface of the secondary thin film (2) to a thin thickness The durability, the lubricity and the surface roughness are increased, so that the tool life is improved.

After the third thin film 3 is deposited on the tool 9 on which the second thin film 2 is deposited through the upper coating layer coating step S70 as described above, the step of removing residual stress S71 is performed It is preferable to remove the residual stress formed during deposition of the third thin film 3 by performing the same conditions as described above.

Eighth, the vacuum cooling step (S80) is a step of continuously removing only the vacuum using the vacuum pump (40) in the state of stopping the operation of the heater (55) used for gas removal and etching and each thin film deposition, 9, the temperature of the tool 9 which has been raised to 300 to 500 ° C is cooled to room temperature by vacuum cooling for 2 to 3 hours. After the step S80, thin film deposition is performed using the table cart 60, The work is completed by discharging the completed tool 9 to the outside of the coating equipment 50.

The table below shows the state of the thin film section, the surface shape and the roughness of the tool manufactured through the multi-element alloy composite thin film forming method of the present invention.

Thin Film Section / FE-SEM Thin film surface / FE-SEM Surface Analysis, Illumination / AFM


Analysis photo

Analysis 3rd Floor Great RA: 0.106 m

As can be seen from the cross-sectional structure of the upper thin film, the first thin film 1 of AlCrN as the lower layer can confirm the fine columnar structure, and the second thin film 2 of the intermediate layer of AlCrSiN is the amorphous fine nanostructure The third thin film (3) of CrZrN, which is relatively brightly observed, is confirmed to be a typical pillar structure, and the cross-section, surface shape and roughness of the thin film analyzed by FE-SEM and AFM are excellent .

As described above, the multi-component alloy composite thin film forming method of the present invention can improve the hardness, heat resistance, abrasion resistance, and lubricity of a thin film even with a high content of silicon component, thereby improving the thermal stress resistance, Not only the speed can be delayed but also the coating operation is facilitated to improve the productivity and the life of the tool as well as to improve the life of the tool and to stabilize the shape of the thin film deposited on the tool by removing the residual stress, So that a complicated structure can be easily processed into a desired shape.

1, 2, 3: 1st, 2nd and 3rd thin films 9: Tools
10: arc coating part 11: arc module plate 13: arc source
20: sputtering coating part 21: sputtering module plate 23: sputtering source
30: etching part 40: vacuum pump 50: coating equipment 50a: chamber body 51: door 55: heater 60: table cart

Claims (3)

A method for depositing a thin film on a surface of a tool using a coating equipment (50) comprising an arc coating part (10), a sputter coating part (20), an HCD etching part (30) and a vacuum pump (40)
A tool loading step (S10) for placing the tool (9) inside the coating equipment (50) using the table cart (60);
A coating equipment vacuum forming step (S20) of closing the door (51) to seal the coating equipment (50) and then operating the vacuum pump (40) to evacuate the inside of the coating equipment (50);
A coating equipment degassing step (S30) for applying heat to the inside of the coating equipment (50) to remove gas inside the coating equipment (50);
A tool etching step (S40) for removing surface layer foreign substances of the tool (9) inserted into the coating equipment (50) through plasma etching;
A tool lower layer coating step (S50) for depositing the primary thin film (1) on the surface of the tool by an arc discharge method using AlCrN;
A tool intermediate layer coating step (S60) for depositing a secondary thin film (2) on a primary thin film (1) deposited tool by an arc discharge method using AlCrSiN;
A tool upper layer coating step (S70) for depositing a tertiary thin film (3) on a secondary thin film (2) deposited by an Abnormal Glow Discharge (Sputtering) method using CrZrN;
And a vacuum cooling step (S80) of cooling the inside of the coating equipment (50) by vacuum cooling to cool the multi-layer coated tool (9). The method according to claim 1,
The deposition of the first and third thin films 1 and 3 in the tool lower layer coating step S50 and the tool upper layer coating step S70 is formed to have a hardness of 3000 to 3500 Hv and a crystal structure,
The secondary thin film 2 deposition in the tool intermediate layer coating step S60 is formed to have a hardness of 2500 to 3000 Hv and an amorphous phase nanostructure,
Wherein the ratio of the deposition thickness of the first, second, and third thin films (1, 2, 3) is 3: 1: 1. 3. The method according to claim 1 or 2,
After the tool lower layer coating step S50, the tool intermediate layer coating step S60 and the tool lower layer coating step S70,
The inside of the coating equipment 50 is maintained at a pressure of 5 to 50 mTorr and at a temperature of 300 to 500 ° C for 1 to 10 minutes to remove the residual stress formed during the deposition of the thin films 1, (S51, S61, S63) for removing residual stress from the surface of the multi-layered alloy composite thin film.

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