KR20170113112A - 탱크, 및 약액 조제 장치 - Google Patents

탱크, 및 약액 조제 장치 Download PDF

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Publication number
KR20170113112A
KR20170113112A KR1020170031754A KR20170031754A KR20170113112A KR 20170113112 A KR20170113112 A KR 20170113112A KR 1020170031754 A KR1020170031754 A KR 1020170031754A KR 20170031754 A KR20170031754 A KR 20170031754A KR 20170113112 A KR20170113112 A KR 20170113112A
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KR
South Korea
Prior art keywords
tank
storage tank
preparation
chemical liquid
chemical
Prior art date
Application number
KR1020170031754A
Other languages
English (en)
Korean (ko)
Inventor
도시모토 나카가와
Original Assignee
가부시키가이샤 히라마리카겐큐죠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히라마리카겐큐죠 filed Critical 가부시키가이샤 히라마리카겐큐죠
Publication of KR20170113112A publication Critical patent/KR20170113112A/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/50—Mixing receptacles
    • B01F35/52—Receptacles with two or more compartments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Accessories For Mixers (AREA)
  • Alcoholic Beverages (AREA)
  • Distillation Of Fermentation Liquor, Processing Of Alcohols, Vinegar And Beer (AREA)
KR1020170031754A 2016-03-25 2017-03-14 탱크, 및 약액 조제 장치 KR20170113112A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016061536A JP2017170393A (ja) 2016-03-25 2016-03-25 タンク、及び薬液調製装置
JPJP-P-2016-061536 2016-03-25

Publications (1)

Publication Number Publication Date
KR20170113112A true KR20170113112A (ko) 2017-10-12

Family

ID=59934469

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170031754A KR20170113112A (ko) 2016-03-25 2017-03-14 탱크, 및 약액 조제 장치

Country Status (4)

Country Link
JP (1) JP2017170393A (ja)
KR (1) KR20170113112A (ja)
CN (2) CN107224929A (ja)
TW (2) TW201738930A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017170393A (ja) * 2016-03-25 2017-09-28 株式会社平間理化研究所 タンク、及び薬液調製装置
CN114797607B (zh) * 2022-03-18 2024-05-10 中国建筑第八工程局有限公司 便携式干湿同装的粉料罐及其施工方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52101764A (en) * 1976-02-24 1977-08-26 Riyouwa Eakon Kk Twooliquid mixer of quantity type
JPS6215194Y2 (ja) * 1981-05-19 1987-04-17
JPS5939169B2 (ja) * 1982-06-21 1984-09-21 富士物産株式会社 増粘剤の溶解方法及びその装置
JPH0340788Y2 (ja) * 1984-12-11 1991-08-27
JPH1081393A (ja) * 1996-07-15 1998-03-31 Morimatsu Sogo Kenkyusho:Kk タンク
JPH11256865A (ja) * 1998-03-06 1999-09-21 Nippon Steel Corp 既設タンクの周りにドーナツ状タンクを設置した二重タンク構造
JP2901584B1 (ja) * 1998-03-17 1999-06-07 株式会社森松総合研究所 タンク
JP3610044B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 現像液製造装置及び現像液製造方法
JP3610045B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 精製現像液製造装置及び精製現像液製造方法
TWI298423B (en) * 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
US6513964B1 (en) * 2001-08-04 2003-02-04 Dylon Industries, Inc. Mass balance proportioner
JP4451581B2 (ja) * 2001-09-28 2010-04-14 株式会社日本触媒 重合防止剤の作成供給装置および作成供給方法
EP2127734A1 (en) * 2008-05-28 2009-12-02 Nestec S.A. Mixing assembly comprising a mixing chamber and an overflow chamber and process for mixing
CN201526806U (zh) * 2009-11-13 2010-07-14 北京物资学院 一种连续供液装置
JP2011105375A (ja) * 2009-11-20 2011-06-02 Aura Tec:Kk 循環タンク及び液注入混合装置
CN203777977U (zh) * 2014-04-18 2014-08-20 福建明方堂生物科技有限公司 一种用于医药加工的配液罐
JP2017148766A (ja) * 2016-02-26 2017-08-31 住友重機械エンバイロメント株式会社 混合撹拌装置
JP2017170393A (ja) * 2016-03-25 2017-09-28 株式会社平間理化研究所 タンク、及び薬液調製装置

Also Published As

Publication number Publication date
TWM551750U (zh) 2017-11-11
CN207085819U (zh) 2018-03-13
JP2017170393A (ja) 2017-09-28
TW201738930A (zh) 2017-11-01
CN107224929A (zh) 2017-10-03

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E902 Notification of reason for refusal
E601 Decision to refuse application