KR20170102087A - Deposition Chamber Resolving Blind Area - Google Patents

Deposition Chamber Resolving Blind Area Download PDF

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Publication number
KR20170102087A
KR20170102087A KR1020160023985A KR20160023985A KR20170102087A KR 20170102087 A KR20170102087 A KR 20170102087A KR 1020160023985 A KR1020160023985 A KR 1020160023985A KR 20160023985 A KR20160023985 A KR 20160023985A KR 20170102087 A KR20170102087 A KR 20170102087A
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KR
South Korea
Prior art keywords
deposition
coupled
deposition space
barrel
reflector
Prior art date
Application number
KR1020160023985A
Other languages
Korean (ko)
Inventor
강한묵
최지현
이해만
Original Assignee
주식회사 선익시스템
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Publication date
Application filed by 주식회사 선익시스템 filed Critical 주식회사 선익시스템
Priority to KR1020160023985A priority Critical patent/KR20170102087A/en
Publication of KR20170102087A publication Critical patent/KR20170102087A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

According to the present invention, a deposition chamber isolated from the outside can be formed so that a deposition process can be performed. According to the present invention, a deposition chamber isolated from the outside can be formed, A base portion for providing a base on which a used apparatus can be mounted; A side wall portion coupled to an upper side of the base portion to form the deposition space together with the base portion; A loop portion coupled to the upper side of the sidewall portion to form the deposition space together with the base portion and the sidewall portion; A door portion coupled to the side wall portion to form the deposition space together with the base portion, the side wall portion, and the loop portion, the deposition space being selectively opened or closed with respect to the outside; And a viewer unit coupled to the door unit and displaying a state of the inside of the deposition space so that an external operator can visually recognize the state of the inside of the deposition space, wherein the viewer unit is viewed from the base unit side, Since the light path can be adjusted or changed to visually recognize the state of the inside of the space, the state of the inside of the deposition chamber can be grasped visually without any restriction on the dead zone, thereby enhancing the efficiency of the management of the deposition chamber Is disclosed.

Description

[0002] Deposition Chamber Resolving Blind Area [0003]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a deposition chamber used for performing a deposition process on a substrate, and more particularly, to a deposition chamber capable of visually grasping a state of a deposition chamber without obstruction due to a dead zone during a deposition process.

In the manufacture of various semiconductor devices or display devices, the deposition chamber is an important manufacturing equipment that provides space for the deposition process. In addition, semiconductor devices and display devices are manufactured through a number of process steps, and a single process is performed for a relatively long time. Therefore, it is important to grasp the inside situation of the chamber during the deposition process in the deposition chamber from time to time to grasp the abnormality.

Therefore, a viewport is provided in the deposition chamber so that the inside of the deposition chamber can be visually confirmed. Among the techniques related to the deposition chamber provided with such a viewport are Korean Patent No. 10-1198205 entitled " Method and apparatus for reducing clouding effect in a viewport window in a reaction environment, hereinafter referred to as prior art 1) Korean Registered Utility Model No. 20-0385280 (name of design: an integrated type viewport with an opening and closing part, hereinafter referred to as prior art 2).

In the prior art 1, a technique for preventing the particles from approaching the window of the viewport in order to overcome the so-called clouding effect that the viewport is blurred by the evaporation material is disclosed. In the prior art 2, Thereby preventing the viewport from being blurred.

However, the prior art 1 and the prior art 2 have the following problems in the deposition chamber provided with the view port.

FIG. 1 is a front view schematically showing a front surface of a deposition chamber according to the prior art, and FIG. 2 is a side sectional view schematically showing a partial cross section of a deposition chamber according to the prior art.

As shown in FIGS. 1 and 2, the viewport 13 is provided on the door portion 11 of the conventional deposition chamber 10. Through this viewport 13, an operator or the like visually confirmed the internal state of the deposition chamber to check for the presence or absence of abnormality. However, as shown in FIG. 2, during the deposition process, the devices provided in the base portion inside the deposition chamber 10 are projected upward at various heights, so that the operator's eyes 15 are obscured by these devices, That is, the blind spot 20 was present.

It is difficult to accurately grasp the state or condition of the inside of the chamber due to such blind spots, so that it is difficult to take proper management measures when necessary.

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems of the prior art, and to solve the above-mentioned problems in the prior art, in order to grasp the situation inside the deposition chamber during the deposition process, To provide a deposition chamber.

According to another aspect of the present invention, there is provided a deposition apparatus including: a deposition chamber that is isolated from the outside so that a deposition process can be performed; A base portion provided; A side wall portion coupled to the upper side of the base portion to form the deposition space together with the base portion; A roof portion coupled to the upper side of the sidewall portion to form the deposition space together with the base portion and the sidewall portion; A door portion coupled to the side wall portion to form the deposition space together with the base portion, the side wall portion, and the loop portion, the deposition space being selectively opened or closed with respect to the outside; And a viewer unit coupled to the door unit and displaying a state of the inside of the deposition space so that an external operator can visually recognize the state of the inside of the deposition space, wherein the viewer unit is viewed from the base unit side, It may be a feature that the light path can be adjusted or switched so as to visually recognize the state inside the space.

Here, the door portion may be hinged to the side wall portion so that the deposition space may be selectively opened or closed with respect to the outside.

The viewer may include a reflector for adjusting or changing the light path; A window for transmitting light traveling from the reflector side; And a barrel coupled to the reflector at one end, coupled to the window at the other end, and supporting the reflector and the window.

Further, the viewer unit may be movably coupled to the door unit, and the viewer unit may move forward or backward toward the deposition space with reference to the door unit.

The viewer further includes a bellows coupled to the barrel to surround the outer circumferential surface of the other end of the barrel to assist in adjusting the position of the reflector and the reflection direction of the reflector in the deposition space May be included as another feature.

Further, the viewer section may further include a rack and pinion gear for controlling the forward movement or the backward movement of the barrel.

Further, the viewer unit may further include an LED light for assisting visually recognizing a state inside the deposition space.

Further, the lens barrel of the viewer unit can rotate around the central longitudinal axis of the barrel.

Since the deposition chamber according to the present invention is viewed from the top down view of the upper surface of the base portion, which is grasped through the reflector of the viewer portion, the dead zone is eliminated. Therefore, since there is no visible part due to blind spots, the deposition efficiency and the management efficiency of the deposition chamber are improved.

1 is a front view schematically showing a deposition chamber according to the prior art.
2 is a side cross-sectional view schematically showing a side cross-section of a deposition chamber according to the prior art.
3 is a perspective view schematically showing a deposition chamber according to an embodiment of the present invention.
4 is a side cross-sectional view schematically showing a partial cross-section of a deposition chamber according to an embodiment of the present invention.
5 is a cross-sectional perspective view schematically illustrating a viewer of a deposition chamber according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 3 is a perspective view schematically showing a deposition chamber according to an embodiment of the present invention, FIG. 4 is a side sectional view schematically showing a partial cross-section of a deposition chamber according to an embodiment of the present invention, and FIG. FIG. 3 is a cross-sectional perspective view schematically illustrating a viewer portion of a deposition chamber according to an example.

3 to 5, a deposition chamber according to an embodiment of the present invention includes a base portion, a sidewall portion, a loop portion, a door portion, and a viewer portion.

The base portion 130 can form a deposition space isolated from the outside, and provides a base on which various devices using the deposition process can be mounted. For example, as shown in FIG. 4, the base portion 130 supports the side wall portion 120 by engaging with a side wall portion 120 described later as a bottom (ground) of the deposition chamber 100. And supports various devices mounted on the base portion 130 of the deposition chamber 100.

The side wall portion 120 is coupled to the upper side of the base portion 130 to form a deposition space together with the base portion 130. It is preferable that the side wall portions 120 are vertically coupled to the base portion 130.

The roof portion 110 is coupled to the upper side of the side wall portion 120 so as to form an evaporated space which is sealed from the outside together with the base portion 130 and the side wall portion 120. The upper surface of the base part 130 is coupled to the upper surface of the base part 130 so as to be parallel to the upper surface of the base part 130,

The door part 140 forms a deposition space together with the base part 130, the side wall part 120 and the loop part 110 so that the deposition space can be selectively opened or closed with respect to the outside. (Not shown). As a more specific example, the door portion 140 is preferably hinged to the side wall portion 120 so that the deposition space provided inside the deposition chamber 100 can be selectively opened or closed with respect to the outside.

The door portion 140 hinged to the side wall portion 120 can be selectively opened or closed as needed during the internal management of the deposition chamber 100.

The viewer unit 200 is coupled to the door unit 140 so as to be movable. More specifically, it is preferable to be coupled so as to move forward or backward to the deposition space side with reference to the door part 140.

The viewer 200 displays the state of the inside of the deposition space so that an external operator can visually recognize the state. The viewer 200 may be viewed from the base 130 side to adjust or change the light path so that the state of the inside of the deposition space can be visually recognized.

The viewer unit 200 may move forward or backward to the deposition space side of the deposition chamber 100 with reference to the door unit 140. [ The viewer 200 can move forward or backward to the deposition space side in the deposition chamber 100, thereby confirming the state of the various parts in the deposition chamber 100, particularly, the upper surface portion of the base part 130.

The viewer 200 may include a reflector 210, a window 230, and a barrel 220. It is also desirable to further include the bellows 240, and furthermore, to further include a rack and pinion gear (not shown). It is also desirable to further include an LED light (not shown).

The reflector 210 is provided for adjusting or changing the path of the light and is coupled to one end of the lens barrel 220 and is fixedly supported by the lens barrel 220. The path of the light is adjusted or changed by reflecting the state of the upper surface of the base unit 130 by the reflector 210. The state of the upper surface of the base unit 130 can be grasped from the outside through the reflected light .

Therefore, since the upper surface of the base 130 seen through the reflector 210 is viewed from above, the blind spot is eliminated, and the blind spot is obscured by the blind spot.

The window 230 transmits light whose light path is adjusted or converted from the reflector 210 side. The window 230 is coupled to the other end of the barrel 220 and is fixedly supported on the barrel 220. In addition, it also serves to prevent foreign substances or the like from entering the inside of the lens barrel 220.

Also, the window 230 serves to prevent the external gas from being drawn into the deposition chamber 100 through the barrel 220 when the inside of the deposition chamber 100 is in a vacuum state, thereby releasing the vacuum state.

The barrel 220 is coupled to the reflector 210 at one end. And is coupled to the window 230 at the other side, and supports the reflector 210 and the window 230. The reflector 210 and the window 230 are fixed to the barrel 220 by coupling the reflector 210 and the window 230 to the barrel 220. Therefore, the position and orientation of the reflecting mirror 210 can be adjusted by adjusting the position of the lens barrel 220. That is, the position and the reflection direction of the reflector 210 can be adjusted through the movement of the barrel 220.

To this end, the barrel 220 is movably coupled to the door portion 140. That is, one end of the barrel 220 is coupled to be moved to the inside of the deposition space. It is also preferable that the barrel 220 is coupled to be rotatable (at a predetermined angle) about the longitudinal center axis A of the barrel 220. Here, it is preferable that the rotation about the longitudinal central axis A of the lens barrel 220 can be rotated at various angles.

Since the direction and position in which the reflector 210 is directed can be adjusted by operating the lens barrel 220 as described above, various portions of the upper surface of the base 130 can be seen as looking down. Therefore, the difficulty of grasping due to the blind spot is solved.

The rack and pinion gear (not shown) is moved in a forward movement of the lens barrel 220, that is, one end of the lens barrel 220 to which the reflector 210 is coupled is positioned inside the deposition space in the deposition chamber 100 It is preferable that the control means is controlled. The backward movement of the lens barrel 220 can also be controlled using a rack-and-pinion gear.

The bellows 240 is coupled to the barrel 220 in a form surrounding the outer peripheral surface of the other end of the barrel 220. The position of the reflecting mirror 210 in the deposition space and the reflecting direction of the reflecting mirror 210 are assisted to be adjusted. As shown in the figure, when the other end of the barrel 220 moves forward or backward due to the corrugated shape of the bellows 240, the bellows may extend or contract in the longitudinal direction to assist the movement of the barrel 220 .

Since the LED light (not shown) may be difficult to confirm through the reflector 210 when the inside of the evaporation space is dark, it is provided to assist the visual recognition through the reflector 210 by illuminating the inside of the evaporation space .

Accordingly, the interior of the deposition chamber 100 is illuminated when necessary, such as when the deposition space inside the deposition chamber 100 is dark. The LED light may be provided on one side of the barrel 220 or on the inner side of the sidewall 120.

As described above, since the deposition chamber according to the present invention can visually grasp the state of the inside of the chamber through the viewer, it is possible to solve the problem that the deposition chamber is difficult to grasp by the blind spot. Therefore, it is possible to accurately grasp the internal state of the chamber during the deposition process, thereby improving the efficiency of the deposition process and the management of the deposition chamber.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It is to be understood that the scope of the present invention is to be construed as being limited only by the embodiments, and the scope of the present invention should be understood as the following claims and their equivalents.

100: deposition chamber 110: loop part
120: side wall portion 130: base portion
140: door unit 200: viewer unit
210: reflector 220: lens barrel
230: Window A: The longitudinal center axis of the lens barrel

Claims (8)

A base portion that can form an evaporation space isolated from the outside so that a deposition process can be performed, and provides a base on which an apparatus used in the deposition process can be mounted;
A side wall portion coupled to the upper side of the base portion to form the deposition space together with the base portion;
A roof portion coupled to the upper side of the sidewall portion to form the deposition space together with the base portion and the sidewall portion;
A door portion coupled to the side wall portion to form the deposition space together with the base portion, the side wall portion, and the loop portion, the deposition space being selectively opened or closed with respect to the outside; And
And a viewer unit coupled to the door unit and displaying a state of the inside of the deposition space so that an external operator can visually recognize the state,
The viewer unit,
And the light path can be adjusted or changed so as to visually recognize a state inside the deposition space, as viewed from the base portion side.
The method according to claim 1,
Wherein the door portion is hinged to the side wall portion such that the deposition space can be selectively opened or closed with respect to the outside.
The method according to claim 1,
The viewer unit,
A reflector for adjusting or changing the light path;
A window for transmitting light traveling from the reflector side;
And a barrel coupled to the reflector at one end and coupled with the window at the other end to support the reflector and the window.
The method of claim 3,
Wherein the viewer unit is movably coupled to the door unit,
Wherein the viewer unit is capable of moving forward or backward to the deposition space side with reference to the door unit.
5. The method of claim 4,
The viewer unit,
And a bellows coupled to the barrel so as to surround the outer circumferential surface of the other end of the barrel and to assist in adjusting the position of the reflector and the reflection direction of the reflector in the deposition space. chamber.
6. The method of claim 5,
The viewer unit,
Further comprising a rack and pinion gear for controlling the forward or backward movement of the barrel.
5. The method of claim 4,
The viewer unit,
And an LED light for assisting the visually recognizing of the state inside the deposition space.
5. The method of claim 4,
Wherein the barrel of the viewer section includes:
And is rotatable about a longitudinal central axis of the barrel.
KR1020160023985A 2016-02-29 2016-02-29 Deposition Chamber Resolving Blind Area KR20170102087A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020160023985A KR20170102087A (en) 2016-02-29 2016-02-29 Deposition Chamber Resolving Blind Area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160023985A KR20170102087A (en) 2016-02-29 2016-02-29 Deposition Chamber Resolving Blind Area

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KR20170102087A true KR20170102087A (en) 2017-09-07

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KR1020160023985A KR20170102087A (en) 2016-02-29 2016-02-29 Deposition Chamber Resolving Blind Area

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114592178A (en) * 2021-07-14 2022-06-07 苏州佑伦真空设备科技有限公司 Window without dead angle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114592178A (en) * 2021-07-14 2022-06-07 苏州佑伦真空设备科技有限公司 Window without dead angle
CN114592178B (en) * 2021-07-14 2023-09-15 苏州佑伦真空设备科技有限公司 Window without dead angle

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