KR20170099613A - Source material treatment unit and substrate processing apparatus having the same and method for substrate processing method using the same - Google Patents

Abstract

The present invention relates to a raw material processing unit for heating a raw material for substrate processing. The raw material processing unit includes a first raw material part having a first crucible for accommodating a raw material and heating the raw material in the first crucible, a second raw material part having a second crucible positioned at the rear end of the first crucible and heating the raw material in the second crucible, and a nozzle for allowing the raw material heated in the second crucible to pass through the first crucible to the substrate. Thus, according to the embodiments of the present invention, a raw material sublimated in each crucible can pass through an installed crucible to a substrate. The plurality of crucibles is sequentially and continuously heated according to the exhaustion of the raw material and the raw material is supplied to the substrate, thereby increasing a raw material replacement cycle compared with the conventional one, and improving the operating rate of a substrate processing apparatus.

Description

[0001] The present invention relates to a raw material processing unit, a substrate processing apparatus using the same, and a substrate processing method using the same.

The present invention relates to a raw material processing unit, a substrate processing apparatus including the raw material processing unit, and a substrate processing method using the same. More specifically, the present invention relates to a raw material processing unit capable of improving the operation rate of the apparatus, a substrate processing apparatus including the same, And a method of processing the same.

The organic material layer of the organic light emitting display device is generally formed by thermal evaporation in which an organic material material in a solid powder state is heated and sublimed.

A deposition apparatus for depositing an organic thin film by thermal evaporation includes a chamber, a substrate support for supporting the substrate, a raw material treatment unit including a crucible for heating and vaporizing the raw material, And a raw material spraying part for spraying the heated raw material from the raw material treating part to the substrate.

On the other hand, if the thin film deposition process is performed for a predetermined time or a predetermined number of times, the raw materials in the crucible are exhausted and the thin film deposition process can not be performed. Therefore, after stopping the operation of the apparatus, the crucible is supplemented with the raw material or is replaced with a crucible containing the raw material. However, since the thin film deposition process can not be performed during the replenishment of the raw material or the replacement of the crucible, the equipment utilization rate is lowered, which causes a decrease in the product production rate.

Further, when a problem occurs in the apparatus during the process, when the chamber is opened, the chamber may be exposed to the atmosphere or the vacuum in the chamber may be changed to a low vacuum, thereby damaging the raw material. In particular, in the case of organic substances weak to air, they are easily oxidized and damaged when the chamber is opened. Therefore, when only one crucible in the chamber is installed, all of the crucible raw materials must be disposed of, and the organic material having a high price is to be disposed of, so that much damage is generated.

Korean Patent Publication No. 10-2004-0037661

The present invention provides a raw material processing unit, a substrate processing apparatus including the raw material processing unit, and a substrate processing method using the raw material processing unit, which can improve facility operation rate due to a raw material for processing a substrate.

The present invention provides a raw material processing unit for improving the replacement period of a crucible in which a raw material for processing a substrate is replenished or a raw material is received, a substrate processing apparatus including the same, and a substrate processing method using the same.

The present invention provides a raw material processing unit for heating a substrate processing raw material, comprising: a first raw material portion having a first crucible in which the raw material is accommodated, the first raw material portion heating the first crucible raw material; A second raw material portion having a second crucible positioned at a rear end of the first crucible and heating the second crucible raw material; And a nozzle for allowing the raw material heated in the second crucible to pass through the first crucible to be directed to the substrate.

Wherein the first crucible and the second crucible are stacked successively in a direction in which the substrate is positioned.

Wherein the first raw material portion includes a first heater installed around the first crucible to heat the first crucible, wherein the first crucible is provided with a first opening in a direction toward the substrate,

The second raw material portion includes a second heater installed around the second crucible for heating the second crucible and a second cooling member provided around the second crucible for cooling the second crucible, The crucible is provided with a second opening in a direction toward the first crucible.

Wherein the nozzle is provided in the first crucible so as to communicate with the inner space of the second crucible and extends in a direction in which the first opening is located at a position corresponding to the second opening of the second crucible, .

The nozzle is provided in the second crucible so as to communicate with the inner space of the first crucible and extends from the second crucible corresponding to the second opening to a direction in which the first crucible is positioned, to be.

The nozzle is disposed between the first crucible and the second crucible so as to penetrate through the first and second openings and has both ends opened.

And a second supporting member connected to the second crucible so as to expose the second opening at a position where the second opening is provided, and on which the first crucible is seated and supported.

Wherein the first crucible of each of the plurality of first raw material portions is provided in a laminated manner in a direction in which the substrate is positioned from the second crucible and the nozzles of each of the plurality of first raw material portions And is arranged to communicate with each of the first crucibles.

And a first cooling member for cooling the first crucible is provided outside at least one first crucible positioned between the first crucible positioned closest to the substrate and the second crucible among the plurality of first raw material parts do.

At least one first crucible positioned between a first crucible positioned closest to the substrate and the second crucible among the plurality of first raw materials is located at a position where the first opening of at least one first crucible is provided And a first support member connected to expose the first opening and to which the other first crucible is seated.

A raw material processing unit according to the present invention includes: a crucible having an internal space in which a raw material is received and provided with an opening in a direction in which the substrate is placed, the raw material processing unit being located opposite to the substrate and heating the raw material for substrate processing; A heater for heating the crucible; And a nozzle extending from the bottom of the crucible in the crucible in a direction in which the opening is located and having open ends at both ends thereof.

And the raw material is contained in the periphery of the nozzle in the crucible.

A substrate processing method according to the present invention includes a step of sublimating a raw material in a plurality of crucibles provided so as to be stacked in one direction toward a substrate and supplying the sublimated raw material to the substrate, wherein one of the plurality of crucibles is heated and sublimated, When the raw material in the crucible is exhausted, the other crucible containing the raw material is heated.

Wherein the plurality of crucibles are heated in order of a crucible distant from a crucible closest to the substrate, and when another raw material in the crucible under heating is exhausted, the other crucibles arranged continuously are heated.

The raw material sublimated in the crucible other than the crucibles disposed closest to the substrate among the plurality of crucibles passes through at least one crucible disposed adjacent to the substrate and moves to the substrate as compared with the crucible being heated.

And heating the crucible of any one of the plurality of crucibles to cool the crucible in which the raw material is contained and which is not being supplied to the substrate.

A substrate processing apparatus according to the present invention includes: a chamber having an internal space for processing a substrate loaded therein; A substrate supporting unit installed in the chamber and supporting the substrate; a raw material processing unit for continuously heating the raw material, the plurality of crucibles being stacked, mutually communicated, and each containing the substrate processing raw material; And a raw material spraying part connected to the raw material treatment part and disposed inside the chamber so as to face the substrate supporting part and spraying the heated raw material toward the substrate.

And a nozzle which is provided so as to communicate the inner space between the plurality of crucibles with each other and in which the heated raw material is movable.

The plurality of crucibles include a first crucible and a second crucible provided at a rear end of the first crucible.

The raw material processing section includes a first raw material portion having the first crucible and a first heater disposed around the first crucible and heating the first crucible; A second crucible provided around the second crucible for heating the second crucible and a second cooling member provided around the second crucible for cooling the second crucible; And a raw material portion,

The first crucible is provided with a first opening in a direction toward the substrate, and the second crucible is provided with a second opening in a direction toward the first crucible.

Wherein the nozzle is provided in the first crucible so as to communicate with the inner space of the second crucible and extends in a direction in which the first opening is located at a position corresponding to the second opening of the second crucible, .

The nozzle is provided in the second crucible so as to communicate with the inner space of the first crucible and extends from the second crucible corresponding to the second opening to a direction in which the first crucible is positioned, to be.

The nozzle is disposed between the first crucible and the second crucible so as to penetrate through the first and second openings and has both ends opened.

Wherein a first crucible of each of the plurality of first raw material portions is continuously stacked in a direction in which the substrate is positioned from the second crucible,

And the nozzles of each of the plurality of first raw material portions are communicated with each other in the first crucible.

And a first cooling member for cooling the first crucible is provided outside at least one first crucible positioned between the first crucible positioned closest to the substrate and the second crucible among the plurality of first raw material parts do.

According to the embodiments of the present invention, a plurality of crucibles charged with a raw material are stacked and installed in each of the crucibles, and the crucibles can be moved to the substrate via the crucible in which the raw materials sublimated in each crucible are stacked. The plurality of crucibles are sequentially and continuously heated in accordance with the exhaustion of the raw material, and the raw material is supplied to the substrate, so that the raw material replacement period can be increased as compared with the conventional one, and thus the operating rate of the substrate processing apparatus can be improved.

In addition, since a plurality of crucibles are stacked, even if the chamber is opened, only the uppermost crucible is exposed, so that only the material in the uppermost crucible can be discarded, so that the damage can be reduced. There is an effect.

1 is a cross-sectional view illustrating a substrate processing apparatus including a raw material processing section according to a first embodiment of the present invention
2 is a view for explaining a raw material treatment section including a raw material treatment section according to the first embodiment of the present invention
3 is a view for explaining a raw material processing section according to the first embodiment of the present invention
4 is a view for explaining a raw material processing section according to a first modification of the embodiments of the present invention
5 is a view for explaining a raw material processing section according to a second modification of the embodiments of the present invention
6 is a view for explaining a raw material treatment section according to a second embodiment of the present invention

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be embodied in various different forms, and it is to be understood that these embodiments are merely illustrative of the principles of the invention and are not intended to limit the scope of the invention to those skilled in the art. It is provided to let you know completely.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a raw material processing unit and a substrate processing apparatus including the raw material processing unit. More specifically, the present invention relates to a raw material processing unit and a substrate processing apparatus including the raw material processing unit, which can reduce replacement efficiency of a facility due to raw materials by improving replacement cycles of a crucible for replenishing raw materials for processing substrates or accommodating raw materials .

1 is a sectional view showing a substrate processing apparatus including a raw material processing section according to a first embodiment of the present invention. 2 is a view for explaining a raw material treatment section including a raw material treatment section according to the first embodiment of the present invention. 3 is a view for explaining a raw material treatment section according to the first embodiment of the present invention. 4 is a view for explaining a raw material processing unit according to a first modification of the embodiments of the present invention. 5 is a view for explaining a raw material processing unit according to a second modification of the embodiments of the present invention. 6 is a view for explaining a raw material processing unit according to a second embodiment of the present invention.

The substrate processing apparatus according to the first embodiment of the present invention is a substrate processing apparatus for processing a substrate by heating and sublimating a raw material.

Hereinafter, an apparatus for depositing a thin film on a substrate using a raw material will be described as an example of the substrate processing apparatus according to the first embodiment. However, the substrate processing apparatus is not limited thereto, and can be changed into various apparatuses other than the thin film deposition process.

In describing the first embodiment, an organic material for manufacturing an organic light emitting device will be described as a raw material for processing a substrate. However, the raw materials are not limited thereto, and various raw materials such as various materials heated for substrate processing, such as inorganic materials and metals, may be applied. Further, the present invention is not limited to a solid raw material, and it is also possible to apply a raw material in a liquid state or a gel state.

Hereinafter, a raw material processing unit and a substrate processing apparatus including the raw material processing unit according to the first embodiment of the present invention will be described with reference to FIGS. 1 to 3. FIG.

Referring to FIG. 1, a substrate processing apparatus according to a first embodiment of the present invention includes a chamber 10 having an internal space, a substrate support unit 20 installed inside the chamber 10 to support a substrate S to be processed ), And a raw material processing unit 3000 which is installed to face the substrate supporter 20 and heats the raw material for thin film deposition to sublimate the raw material.

According to the substrate processing apparatus according to the first embodiment, the substrate supporting unit 20 is placed on the upper part of the chamber 10 and the raw material processing unit 3000 is installed on the lower side of the substrate supporting part 20. However, the arrangement structure between the substrate supporter 20 and the raw material processing unit 3000 may be arranged so as to face each other. For example, the substrate supporting unit 20 may be disposed on the chamber 10 shown in FIG. 1 such that the raw material processing unit 3000 is positioned on the upper side of the substrate supporting unit 20 or the substrate supporting unit 20, The processing unit 3000 may be installed so as to be opposed to the left and right direction of the chamber 10. [

The substrate S is an object to be processed for manufacturing an organic light emitting device, may be glass, and the shape of the cross section may be a square. Of course, the substrate S is not limited to the above-described glass, but may be variously changed depending on a product to be manufactured, such as a wafer and a film. In addition, the shape of the substrate S is not limited to a rectangular shape, and various shapes can be applied according to a desired product shape.

The chamber 10 according to the first embodiment may have a rectangular tubular shape corresponding to the substrate S, in which the chamber 10 has a cylindrical shape having an inner space which is a substrate processing space. Of course, the shape of the chamber 10 can be changed into various shapes having an inner space capable of processing the substrate S.

The substrate supporting portion 20 has a shape corresponding to the substrate S and is positioned inside the chamber 10 so as to face the raw material processing unit 3000 and supports the substrate such that the processing surface faces the raw material processing unit 3000. Although not shown, a means for clamping the edge of the substrate S to support and fix the substrate S is provided on the substrate supporting portion 20, for example. Of course, the means for supporting the substrate S is not limited to the above-described clamp, and any means may be applied as long as it can support the processing surface of the substrate S toward the raw material processing unit 3000. For example, a plurality of holes are provided in the substrate supporting portion 20, and a vacuum pump is connected to the plurality of holes to support the substrate by the vacuum suction force by the pore pump, or the substrate supporting portion may be a sticky chuck, It can be chuck.

The raw material processing unit 3000 is means for heating the raw material to sublimate it and provide it to the substrate S. The raw material processing unit 3000 is connected to the raw material processing portion 3200 and the raw material processing portion 3200 for heating and sublimating the raw material and is disposed inside the chamber 10 so as to be opposed to the substrate supporting portion 20, And a raw material spraying part 3100 for spraying the raw material sublimated in the raw material spraying part 3200 toward the substrate S.

The raw material spraying section 3100 is means for uniformly spraying the raw material, which is heated by the raw material treating section 3200 and sublimated, toward the deposition surface of the substrate. The raw material spraying portion 3100 according to the first embodiment includes a spraying body 3110 having a shape corresponding to that of the substrate S, A plurality of ejection openings 3120, and a heater (hereinafter, referred to as an ejection heater 3130) for heating the ejection body. Here, the spray heater 3130 serves to reheat the raw material which has been heated in the raw material treatment section 3200 and transferred to the raw material spray section 3100.

The raw material processing unit 3200 is connected to the raw material spraying unit 3100 and includes a main body 3210 having an internal space and crucibles 3221a and 3221b installed to be stacked in a direction in which the substrate supporting unit 20 is located inside the main body 3210, 3231 and 3231 and the inner space between the crucibles 3221a and 3231 of the plurality of raw materials 3220a and 3230 and the plurality of raw material portions 3220a and 3230 for heating and sublimating the raw materials in the crucibles 3221a and 3231 A nozzle 3300 arranged so as to allow the heated raw material to move therethrough; a nozzle 3300 installed between the raw material spraying portion 3100 and the raw material portions 3220a and 3230 in the main body 3210, And a main body cooling member 3260 installed outside the main body 3210 for cooling or cooling the main body 3210. The main body cooling member 3260 includes a main body 3210,

The main body 3210 has an internal space such that a plurality of raw material portions 3220a and 3230 can be received therein. In the first embodiment, the main body 3210 is extended in the vertical direction, And a plurality of raw materials 3220a and 3230 are stacked in the vertical direction. A portion of the main body 3210 connected to the raw material spraying portion 3100 is connected to the raw material spraying portion 3100 so that the sublimated raw material can be moved to the raw material spraying portion 3100, An opening or a communication path is provided. It is preferable that the main heater 3250 is installed around the opening of the main body 3210 described above.

The raw material portions 3220a and 3230 are means for heating and sublimating the raw materials and are provided in a plurality of layers and stacked in one direction, for example, vertically inside the main body 3210.

The plurality of raw material portions 3220a and 3230 may include a rearmost raw material portion 3230 disposed farthest from the substrate supporting portion 20 or the raw material spraying portion 3100, And a raw material portion 3220a positioned between the support portion 20 and the raw material spray portion 3100. [ Here, another raw material portion 3220a is located on the path where the raw material that has been heated and sublimated in the most downstream-stage raw material portion 3230 moves to the raw material spraying portion 3100.

Hereinafter, among the plurality of raw material portions 3220a and 3230 stacked in the direction of the substrate supporting portion 20 or the raw material spraying portion 3100, the most distantly disposed spaced apart from the substrate supporting portion 20 or the raw material spraying portion 3100 The rear raw material portion 3230 is referred to as a second raw material portion 3230 and the raw material portion 3220a positioned between the raw material spraying portion 3100 and the rearmost raw material portion 3230 is referred to as a first raw material portion 3220a ).

The first raw material portion 3220a is installed between the raw material spraying portion 3100 and the second raw material portion 3230, that is, inside the main body 3210 and above the second raw material portion 3230. The first raw material portion 3220a includes a first crucible 3221a having an internal space in which the raw material M is received and a first heater 3222a for heating the first crucible 3221a.

The first crucible 3221a has an inner space and a first opening 3226a is provided in a direction in which the raw material spraying portion 3100 is located, that is, on the upper side.

The first heater 3222a applies heat to the first crucible 3221a to sublimate the raw material contained in the first crucible 3221a. The first heater 3222a according to the first embodiment may be means including a heating element which is installed inside the main body to surround the outside of the first crucible 3221a and which is resistance-heated by an applied electric signal. Of course, the first heater 3222a is not limited to the above-described resistance heating heating element, and various means capable of heating the first crucible 3221a can be applied so that the raw material can be sublimated.

The second raw material portion 3230 is farther from the raw material spraying portion than the first raw material portion 3220a and is installed at the rear end, and is stacked on the lower portion of the first raw material portion 3220a.

The second raw material portion 3230 has an internal space in which the raw material M is accommodated and includes a second crucible 3231 located under the first crucible 3221a and a second crucible 3231 located below the second crucible 3231, And a cooling member (hereinafter referred to as a second cooling member 3234) for cooling the heater 3232 and the second crucible 3231.

The second crucible 3231 has an inner space and a second opening 3236 is formed in a direction in which the nozzle 3300 is positioned so that the sublimated raw material can be discharged from the first crucible 3221a and moved to the nozzle 3300. [ . The first crucible 3221a is stacked on the second crucible 3231 so that the first crucible 3221a is seated. To this end, a supporting member (hereinafter referred to as a second supporting member) for supporting the second crucible 3231 is provided on the upper portion of the second crucible 3231. Here, the second support member 3235 is configured such that the second opening 3236 is exposed or open at the upper portion of the second crucible 3231. That is, the second support member 3235 extends in the width direction of the second crucible 3231 and has a hollow shape having an opening corresponding to or communicating with the second opening 3236, Respectively. A lower portion of the first crucible 3221a is seated on the upper portion of the second support member 3235. [ The second support member 3235 is preferably provided as a heat insulating material.

The second heater 3232 applies heat to the second crucible 3231 to sublimate the raw material contained in the second crucible 3231. The second heater 3232 according to the first embodiment is installed so as to surround the outside of the second crucible 3231 inside the main body and is disposed above the second cooling member 3234. [ The second heater 3232 may be a means including a heating element which is resistively heated by an applied electric signal. Of course, the second heater 3232 is not limited to the above-described resistance heating heating element, and various means capable of heating the second crucible 3231 to enable sublimation of the raw material can be applied.

When the first crucible 3221a is heated, the second cooling member 3234 is heated by the heat of the second crucible 3231 in a state where the raw material is contained in the second crucible 3231, The second crucible 3231 is cooled so as to prevent the raw material from being heated or sublimated. That is, when the second crucible 3231 is a rest period in which the raw material is contained in the second crucible 3231 and does not participate in the deposition process, the second crucible 3231 is cooled to prevent heating or sublimation of the raw material . The second cooling member 3234 according to the first embodiment is installed so as to surround the outside of the second crucible 3231 and is a means for circulating the refrigerant.

On the other hand, a first crucible 3221a is provided between the second raw material portion 3230 and the raw material spraying portion 3100. The raw material heated from the second raw material portion 3230 passes through the first crucible 3221a, It is necessary to move to the jetting section 3100. The first crucible 3221a is provided with a nozzle 3300 capable of moving the raw material so that the raw material sublimated in the second raw material portion 3230 can be directed to the raw material spraying portion 3100 through the first crucible 3221a, .

The nozzle 3300 is a kind of traveling passage having an inner space capable of moving the raw material. The nozzle 3300 according to the first embodiment has the first crucible 3221a corresponding to the upper side of the second raw material portion 3230 And is formed to communicate with the inner space of the first crucible 3221a. In other words, the nozzle 3300 is a part of the first crucible 3221a corresponding to the opening (the second opening 3236) of the second raw material crucible (hereinafter, referred to as the second crucible 3231) And is formed to communicate with the inside of the first crucible 3221a and the second opening 3236 of the second crucible 3231 so as to pass through a part of the lower part. The nozzle 3300 according to the first embodiment is formed in a tube shape extending from the lower portion of the first crucible 3221a, i.e., the bottom portion thereof, into the interior of the first crucible 3221a and opened at both ends. The raw material is accommodated around the nozzle 3300 in the first crucible 3221a. Here, it is preferable that the nozzle 3300 is provided so as to be positioned at the center of the width or the radial direction of the first crucible 3221a.

The nozzle 3300 is not limited to the one provided in the first crucible as described above, but may be modified into various arrangements in which the first crucible and the second crucible are communicated.

For example, the nozzle 3300 may be provided in the second crucible 3231 as in the first modification shown in FIG. More specifically, the padding member 3300 according to the first modification is provided in the second crucible 3231 so as to communicate with the inner space of the first crucible 3221a, 2 crucible 3231 in the direction in which the first crucible 322a is located, and both ends thereof are opened. Here, it is preferable that the nozzle is connected to the hollow second support member 3235 and extends in the direction in which the first crucible 3222a is located. An opening 3227 is formed in the lower or bottom of the first crucible 3222a to enable insertion of the nozzle 3300. When the first crucible 3222a and the second crucible 3231 are stacked, The nozzle 3300 provided in the first crucible 3231 penetrates the opening 3227 of the first crucible.

5, one end of the nozzle 3300 passes through the second opening portion 3236 and the other end passes through the opening 3227 provided at the lower portion of the first crucible 3222a, As shown in FIG.

In the above description, the two crucibles 3221a and 3231 are stacked, that is, the crucible is stacked in two stages. However, the present invention is not limited to this, and two or more crucibles 3221a and 3231 may be provided and stacked. That is, the raw material processing portion 3200 may be configured to include at least two first raw material portions having nozzles, and a second raw material portion positioned at the rearmost end without nozzles.

As a more specific example, the raw material processing portion 3200 may have a three-stage structure in which three crucibles 3221a, 3222b, and 3231 are stacked, as in the second embodiment shown in FIG. In other words, the raw material processing portion 3200 according to the second embodiment includes two first raw material portions 3220a and 3220b each having nozzles 3300a and 3300b, And a second raw material portion 3230. Each of the two first raw materials 3220a and 3220b includes the first crucibles 3221a and 3221b, the nozzles 3300a and 3300b, the first heaters 3222a and 3222b, and the second raw material 3230 ) Also includes a second crucible 3231, a second heater 3232, and a second cooling member 3234. According to the second embodiment, the two first crucibles 3221a and 3221b are stacked vertically on the lower side of the raw material spraying section 3100, and the second crucible 3231 is stacked on the downstream end.

When the plurality of first crucibles 3221a and 3221b are stacked as in the second embodiment, the first crucibles 3221a and the second crucibles 3231 located closest to the raw material spraying section 3100, A supporting member (hereinafter referred to as a first supporting member 3225b) capable of receiving and supporting another first crucible 3221a is provided on an upper portion of the first crucible 3221b positioned between the first crucible 3221b and the first crucible 3221b. The first support member 3225b extends in the width direction of the first crucible 3221b and has a hollow shape having an opening corresponding to or communicating with the first opening 3226a, Respectively. The other first crucible, that is, the lower portion of the uppermost first crucible 3221a, is seated on the upper portion of the first support member 3225b. It is preferable that the first support member 3225b is provided as a heat insulating material.

When the first crucible 3221a is located between the first crucible 3221a positioned closest to the raw material spray portion and the second crucible 3231 located at the rearmost stage as in the second embodiment, A cooling member (hereinafter referred to as a first cooling member 3224b) is provided outside the crucible 3221a. The first cooling member 3224b prevents heating and sublimation of the raw material when the first crucible 3221b is in a resting state in which the raw material is accommodated.

The raw material processing unit according to the second embodiment has described the case where the nozzle is provided in the first crucible (the first embodiment in Fig. 3).

However, the present invention is not limited to this, and the crucible having three or more stages can be applied by applying the first crucible 3221a provided with the nozzle 3300 as in the first modification shown in Fig. For example, although not shown, two first crucibles 3221a are provided on the upper side of the second crucibles 3231 provided with the nozzles 3300, wherein the first crucibles 3221a are located between the uppermost first crucible and the second crucible A nozzle may be further provided in the first opening of the first crucible.

In addition, as in the second modification shown in FIG. 5, the crucible having three or more stages can be applied by applying the first crucible provided with the nozzle 3300. FIG.

The capacity or volume of each of the plurality of crucibles of the present invention described above may be equal to or different from the capacity of one conventional crucible. The sum of the capacities or the volumes of the plurality of crucibles of the present invention may be equal to or different from the capacity of one conventional crucible.

As described above, according to the embodiments of the present invention, a plurality of crucibles are stacked, and each crucible can be moved to a substrate via an installed furnace in which raw materials sublimated in each crucible are stacked. In addition, since a plurality of crucibles are sequentially and continuously heated in accordance with the exhaustion of the raw materials during the process, and the thin film is deposited on the substrate, the raw material replacement period can be increased as compared with the conventional one, and thus the operating rate of the substrate processing apparatus can be improved .

Even if the sum of the capacities or the volumes of the plurality of crucibles of the present invention is the same as that of one crucible of the related art, there is an effect of reducing the amount of material damage or the amount of material to be discarded. For example, if a problem occurs in the apparatus during the process, and the chamber is opened, the chamber may be exposed to the atmosphere or the vacuum in the chamber may be changed to a low vacuum, thereby damaging the raw material. In particular, in the case of organic substances weak to air, they are easily oxidized and damaged when the chamber is opened. Therefore, when only one crucible in the chamber is installed, all of the crucible raw materials must be disposed of, and the organic material having a high price is to be disposed of, so that much damage is generated.

However, in the case of the present invention, since a plurality of crucibles are stacked, even if the chamber is opened, only the uppermost crucible is exposed, so that only the uppermost crucible raw material can be discarded, so that the damage can be reduced.

Hereinafter, the operation of the substrate processing apparatus according to the first embodiment of the present invention and the thin film forming method therefor will be described with reference to FIGS. 1 to 3. FIG. As a more specific example, a method of depositing an organic thin film on a substrate for producing an organic light emitting device will be described. The raw material M for forming the organic thin film may be a hole transport layer for forming an organic light emitting device, a hole injection layer, an emission layer, an electron transport layer, And may be a material for depositing a thin film of any one of an electron injection layer and a hole blocking layer.

First, an organic material source is charged into each of the first crucible 3221a and the second crucible 3231, and this is inserted into the main body 3210. At this time, in loading the raw material into the first crucible, the raw material is charged at a lower height than the nozzle 3300. The first crucible 3221a and the second crucible 3221b are positioned so that the second crucible 3231 is positioned in the lower portion of the main body 3210 and the first crucible 3221a is seated on the second support member 3235 of the second crucible 3231 And the second crucible 3231 are stacked. In addition, the substrate S is charged into the chamber 10 and supported on the substrate supporting portion 20.

When the charging of the raw material M and the substrate S is completed, any one of the plurality of crucibles 3221a and 3231 is heated to sublimate the raw material to deposit the thin film on the substrate S. At this time, when the crucible is heated to deposit the thin film on the substrate S, the crucible 3231 is heated in the order of the crucibles 3231 farthest from the crucibles 3221a disposed closest to the raw material spray portion 3100, When all of the raw materials in the crucible are sublimated and exhausted, the crucibles in the next order are heated.

In the case where the first crucible 3221a and the second crucible 3231 are stacked as in the first embodiment shown in FIGS. 1 to 3, first, the first heater 3222a is used to form the first The crucible 3221a is heated to sublimate the raw material of the first crucible 3221a. At this time, the raw material sublimated in the first crucible 3221a is moved to the raw material spraying section 3100 through the first opening 3226a and is sprayed toward the substrate S, and an organic thin film is deposited on the substrate S by this.

While the first crucible 3221a is heated in this way, the second cooling member 3234 provided outside the second crucible 3231 is operated to heat the inside of the second crucible 3231 by heating of the first crucible 3221a Thereby preventing the raw material from being heated or sublimated.

Thereafter, when the raw material in the first crucible 3221a is exhausted, the operation of the first heater 3222a is terminated, and the second crucible 3231 is heated by operating the second heater 3232. [ The raw material in the second crucible 3231 is heated and sublimated and the sublimated raw material is passed through the second opening 3236 of the second crucible 3231 along the nozzle 3300 provided in the first crucible 3221a, And is then injected into the crucible 3221a through the raw material spraying section 3100 toward the substrate S. [

Although the structure in which two crucibles 3221a are laminated has been described above, it is also possible to heat the crucibles by the same method in the case of a structure in which two or more crucibles are stacked as in the second embodiment shown in FIG. Lt; / RTI >

That is, the first crucible 3221a positioned nearest to the top of the raw material spraying section 3100 among the two first crucibles 3221a and 3221b is heated to deposit the thin film. At this time, while heating the uppermost first crucible 3221a, the other first crucible 3221b and the second crucible 3221b, which are continuously disposed below the first and second cooling members 3224b and 3234, (3231).

When the raw material in the uppermost first crucible 3221a is exhausted, the first crucible 3221b located between the uppermost crucible 3221a and the second crucible 3234 is heated, Is moved to the raw material spraying portion 3100 through the nozzle 3300 provided in the first crucible 3221a of the first crucible 3221a and is sprayed toward the substrate S. The second crucible 3231 is cooled by the second cooling member 3234 while the uppermost crucible 3221a is heated in this manner.

Thereafter, when the raw material in the first crucible 3221a located between the uppermost crucible 3221a and the upper crucible 3231 is exhausted, the second crucible 3231 is heated. The raw material heated in the second crucible 3231 moves through the nozzles 3300a and 3300b of the two first crucibles 3221b and 3221a continuously installed on the upper crucible 3231 and is moved to the raw material spraying section 3100, S) and deposited.

In the above description, heating is performed in the order of the crucibles 3231 located farthest from the crucibles 3221a disposed closest to the raw material spray portion 3100. However, the present invention is not limited to this, and a plurality of crucibles may be heated in any order.

As described above, according to the first embodiment of the present invention, a plurality of crucibles in which raw materials are loaded are stacked, and each of the crucibles can be moved to a substrate via an installed furnace in which raw materials sublimated in each crucible are stacked . The plurality of crucibles are successively and continuously heated in accordance with the exhaustion of the raw material to deposit the thin film on the substrate, so that the material replacement period can be increased as compared with the conventional one, and the operating rate of the substrate processing apparatus can be improved accordingly.

3000: raw material processing unit 3100:
3200: raw material processing section 3220a, 3220b: first raw material section
3230: second raw material parts 3221a, 3221b: first crucible
3231: second crucible 3222a, 3222b: first heater
3232: second heater 3300: nozzle
3224b, 3234: cooling member

Claims (25)

A raw material processing unit for heating a raw material for substrate processing,
A first raw material portion having a first crucible in which the raw material is accommodated, the first raw material portion heating the raw material in the first crucible;
A second raw material portion having a second crucible positioned at a rear end of the first crucible and heating the second crucible raw material;
A nozzle through which the raw material heated in the second crucible passes through the first crucible and can be directed to the substrate;
And a processing unit for processing the raw material. The method according to claim 1,
Wherein the first crucible and the second crucible are stacked successively in a direction in which the substrate is positioned. The method of claim 2,
The first raw material portion includes a first heater installed around the first crucible to heat the first crucible,
Wherein the first crucible is provided with a first opening in a direction toward the substrate,
The second raw material portion includes a second heater installed around the second crucible for heating the second crucible and a second cooling member provided around the second crucible to cool the second crucible,
And the second crucible is provided with a second opening in a direction toward the first crucible. The method of claim 3,
Wherein the nozzle is provided in the first crucible so as to communicate with the inner space of the second crucible and extends in a direction in which the first opening is located at a position corresponding to the second opening of the second crucible, Raw material processing unit. The method of claim 3,
The nozzle is provided in the second crucible so as to communicate with the inner space of the first crucible,
The first crucible extending in a direction in which the first crucible is positioned from the second crucible corresponding to the second opening, and both ends thereof being open. The method of claim 3,
Wherein the nozzle is disposed so as to pass through the first opening and the second opening, the both ends of the nozzle being open at both ends, the first and second crucibles being disposed between the first and second crucibles. The method according to any one of claims 3 to 6,
And a second support member connected to the second crucible so as to expose the second opening at a position where the second opening is provided, the first crucible being seated on and supported by the second crucible. The method of claim 7,
Wherein a first crucible of each of the plurality of first raw material portions is continuously stacked in a direction in which the substrate is positioned from the second crucible,
And the nozzles of each of the plurality of first raw material portions are communicated with each other in the first crucible. The method of claim 8,
And a first cooling member for cooling the first crucible is provided outside at least one first crucible positioned between the first crucible positioned closest to the substrate and the second crucible among the plurality of first raw material parts The raw material processing unit The method of claim 8,
At least one first crucible positioned between the first crucible and the second crucible positioned closest to the substrate among the plurality of first raw materials,
And a first supporting member which is connected to expose the first opening at a position where the first opening of at least one first crucible is provided so that another first crucible is seated. 1. A raw material processing unit for heating a raw material for substrate processing, the raw material processing unit being located opposite to a substrate,
A crucible having an internal space in which a raw material is accommodated and provided with an opening in a direction in which the substrate is placed;
A heater for heating the crucible; And
A nozzle extending from the bottom of the crucible in the crucible in the direction in which the opening is located and having openings at both ends;
And a processing unit for processing the raw material. The method of claim 11,
Wherein the raw material is contained in the periphery of the nozzle in the crucible. And a step of sublimating a raw material in a plurality of crucibles provided so as to be stacked in one direction toward the substrate and supplying the sublimated raw material to the substrate,
Wherein one of the plurality of crucibles is heated and sublimated,
And the other crucible containing the raw material is heated when the raw material in the crucible under heating is exhausted. 14. The method of claim 13,
Wherein the plurality of crucibles are heated in order of a crucible distant from a crucible closest to the substrate,
And the other crucibles arranged continuously are heated when the raw material in the crucible under heating is exhausted. 15. The method of claim 14,
Wherein a raw material sublimated in a crucible other than a crucible disposed closest to the substrate among the plurality of crucibles passes through at least one crucible disposed adjacent to the crucible to be heated, Way. The method of claim 11,
And heating the crucible of any one of the plurality of crucibles to cool the crucible in which the raw material is contained and not supplied to the substrate. A chamber having an inner space for processing a substrate loaded therein;
A substrate support disposed inside the chamber and supporting the substrate;
A raw material treatment section for continuously heating the raw material, the plurality of crucibles being stacked in series, mutually communicated and each containing the substrate processing raw material; And
A raw material spraying part connected to the raw material treatment part and disposed so as to face the substrate supporting part inside the chamber and spraying a raw material heated toward the substrate;
And the substrate processing apparatus. 18. The method of claim 17,
And a nozzle capable of moving the heated raw material is provided so as to communicate with an inner space between the plurality of crucibles. 19. The method of claim 18,
Wherein the plurality of crucibles include a first crucible and a second crucible provided at a rear end of the first crucible. The method of claim 19,
The raw-
A first raw material portion having the first crucible and a first heater installed around the first crucible and heating the first crucible;
A second crucible provided around the second crucible for heating the second crucible and a second cooling member provided around the second crucible for cooling the second crucible; Raw material portion;
Lt; / RTI >
Wherein the first crucible is provided with a first opening in a direction toward the substrate,
And the second crucible is provided with a second opening in a direction toward the first crucible. The method of claim 20,
Wherein the nozzle is provided in the first crucible so as to communicate with the inner space of the second crucible and extends in a direction in which the first opening is located at a position corresponding to the second opening of the second crucible, Substrate processing apparatus. The method of claim 20,
The nozzle is provided in the second crucible so as to communicate with the inner space of the first crucible,
Wherein the first crucible is extended from a second crucible corresponding to the second opening in a direction in which the first crucible is positioned, and both ends thereof are opened. The method of claim 20,
Wherein the nozzle is disposed between the first crucible and the second crucible so as to penetrate through the first and second openings, and both ends of the nozzle are open. The method according to any one of claims 20 to 23,
Wherein a first crucible of each of the plurality of first raw material portions is continuously stacked in a direction in which the substrate is positioned from the second crucible,
Wherein the nozzles of each of the plurality of first raw material portions are communicated in the respective first crucibles. 27. The method of claim 24,
And a first cooling member for cooling the first crucible is provided outside at least one first crucible positioned between the first crucible positioned closest to the substrate and the second crucible among the plurality of first raw material parts .

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