KR20160124965A - Wafer Transferring Apparatus - Google Patents
Wafer Transferring Apparatus Download PDFInfo
- Publication number
- KR20160124965A KR20160124965A KR1020150055253A KR20150055253A KR20160124965A KR 20160124965 A KR20160124965 A KR 20160124965A KR 1020150055253 A KR1020150055253 A KR 1020150055253A KR 20150055253 A KR20150055253 A KR 20150055253A KR 20160124965 A KR20160124965 A KR 20160124965A
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- South Korea
- Prior art keywords
- wafer
- image
- wafers
- wafer carrier
- unit
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
Abstract
Description
BACKGROUND OF THE
Semiconductor devices can be constructed by depositing, heat treating, and patterning multiple layers of a layer on a wafer. In general, the deposition, diffusion and heat treatment processes of the layers can be carried out in a substrate processing apparatus such as a furnace. A general furnace is configured in a batch type, and a large number of wafers are processed at a time in a state in which a plurality of wafers are loaded on a kind of wafer boat called a front opening unified pod (FOUP). A plurality of wafers are temporarily transferred to a wafer boat such as a FOUP through a wafer transfer apparatus having a plurality of robot arms such as blades.
However, due to a long process, the position between the wafer transfer blades may be deformed or a part thereof may be broken, the guide slot of the FOUP provided in the substrate processing apparatus may be distorted, or the wafer may be wiped Problems such as warpage may occur.
At present, the wafer transfer is progressing without consideration of the state of the transferring apparatus, the state of the wafer, and the state of the FOUP, and thus the wafer is often damaged when the wafer is transferred. Further, since the wafer transfer device is required to stop the operation of the apparatus and to check and repair the cause of the error only after the wafer is broken, the manufacturing time and cost are increased.
An object of the present invention is to provide a wafer transfer apparatus for transferring wafers while monitoring the abnormality of the transfer apparatus, the abnormality of the substrate processing apparatus, and the abnormality of the wafers during wafer transfer.
A wafer transfer apparatus according to an embodiment of the present invention includes a transfer member for transferring a plurality of wafers between a wafer carrier and a wafer boat in a substrate processing apparatus, and a transfer member for transferring the transfer member, the plurality of wafers, The image of the inside of the boat is monitored in real time so as to stop the operation of the conveying member when an error occurs in at least one of the conveying member, the plurality of wafers, the wafer carrier, and the wafer boat, And a conveyance monitoring block configured to check the conveyance.
According to another aspect of the present invention, there is provided a wafer transfer apparatus including: a transfer member for transferring a plurality of wafers between a wafer carrier and a wafer boat in a substrate processing apparatus; An image pickup member positioned adjacent to the transfer member and configured to image the transfer member, the plurality of wafers, the inside of the wafer carrier, and the inside of the wafer boat; A wafer transfer controller configured to receive image data from the imaging member, compare the set normal data with the image data, and output an error control signal; An operation stop unit for temporarily stopping the conveying member in response to the error control signal; And a correction unit configured to correct a portion where an error has occurred in response to the error control signal.
The wafer transfer apparatus according to the present invention includes a high-speed transferable imaging member for monitoring a wafer carrier within a wafer transfer member and a processing apparatus, The abnormality of the wafer housed in the wafer carrier, the abnormality of the wafer housed in the wafer boat such as the FOUP in the substrate processing apparatus, the fluctuation of the position of the wafer carrier and the wafer boat, Changes, etc. are taken at the same time as the transfer process, and the cause of the error is accurately recognized and corrected. Further, in the case of a slight error, after the temporary stop, correction is performed by the correcting unit, so that the manufacturing time and cost can be greatly reduced.
1 is a block diagram of a wafer transfer apparatus according to an embodiment of the present invention.
2 is a perspective view showing a transfer member and an imaging member of a wafer transfer apparatus according to an embodiment of the present invention.
3 is a view showing a process of picking up intervals of blades by an image pickup member according to an embodiment of the present invention.
FIG. 4 is a view showing a process of picking up a blade gap and a gap between guide slots of a wafer boat by an imaging member according to an embodiment of the present invention.
5 is a view showing a process of picking up a gap between guide slots of a wafer carrier by an imaging member according to an embodiment of the present invention.
6 is a view showing a process of picking up a wafer state mounted on a wafer carrier or a wafer boat by an imaging member according to an embodiment of the present invention.
7 is an internal block diagram of a wafer transfer controller according to an embodiment of the present invention.
FIG. 8 is a view in which an image of a sensed blade is overlapped with a blade reference line in a steady state according to an embodiment of the present invention.
9 is a view showing reference lines indicating line widths of blades in a steady state according to an embodiment of the present invention.
FIG. 10 is a view in which the reference lines of FIG. 9 and the image of the upper surface of the sensed blade are overlapped according to an embodiment of the present invention.
11 is a view showing an outer reference line and a guide slot reference line of a wafer boat in a steady state according to an embodiment of the present invention.
Figure 12 is an overlapping image of the captured wafer boat with the baselines of Figure 11 according to one embodiment of the present invention.
13 is a view showing a reference line indicating the position of a normally received wafer according to an embodiment of the present invention.
FIG. 14 is a view in which the reference lines of FIG. 13 and an image of a picked-up wafer are overlapped according to an embodiment of the present invention.
15 is a flowchart illustrating a process of detecting a blade error according to an embodiment of the present invention.
16 is a flowchart illustrating a process of detecting wafer wafers according to an embodiment of the present invention.
17 is a flowchart illustrating a process of detecting errors in a wafer boat or a wafer carrier according to an embodiment of the present invention.
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and the manner of achieving them, will be apparent from and elucidated with reference to the embodiments described hereinafter in conjunction with the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. The dimensions and relative sizes of layers and regions in the figures may be exaggerated for clarity of illustration. Like reference numerals refer to like elements throughout the specification.
Referring to FIG. 1, the
The
The
At least one or more
The
The
4, the
5, at least one of the
6, the
The
The
The reference
For example, FIG. 8 is an overlapping view of an image of the sensed
9 shows the reference lines b1 and b2 indicating the line width s1 of the
9 and 10, when the width s1 of the
11 is a view showing an outer reference line c and a guide slot reference line d of the
13 shows the positional reference line e of the normally received wafer. Here, the wafer reference line e may be, for example, the wafers mounted on each of the upper portions of the
Fig. 14 is a view in which the image of the captured wafers w overlaps the reference line e in Fig. Through the overlap image, it is possible to detect a phenomenon of the wafer itself, for example, a phenomenon in which both ends of the wafer are warped.
The
Such error images are then transmitted to the manager, which can be used as a data for accurately determining which part of the error has occurred.
The
The
The
The
The wafer transfer apparatus having such a configuration can perform the following operations.
First, as shown in Fig. 15, an error of the conveying
If the
On the other hand, if there is an abnormality in the picked-up
The
Thereafter, it can be returned to the blade error check step again by the
Referring to Fig. 16, the
If it is determined from the
On the other hand, when the
When the wafer error is a wafer wipe, the operation of the
Next, as shown in Fig. 17, an abnormality of the wafer boat or the wafer carrier is checked by the imaging member 120 (S31). The abnormality of the
When the
On the other hand, when the
On the other hand, in the case of an insufficient error, the
On the other hand, in the case of a serious error, after the operation of the transferring
As described in detail above, the wafer transfer apparatus according to the present invention includes a high-speed transferable imaging member for monitoring the wafer transfer member and the wafer carrier in the processing apparatus. Such an imaging member may be an abnormality of the blade for transferring the wafer, The abnormality of the wafer placed in the wafer carrier, the abnormality of the wafer housed in the wafer carrier such as the wafer boat in the substrate processing apparatus, the variation of the position of the wafer carrier and the wafer boat, Position change, and the like are photographed simultaneously with the process so that the cause of the error is accurately recognized and corrected. Further, in the case of a slight error, the correction may be made to proceed after the temporary stop, so that the manufacturing time and cost can be greatly reduced. While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but variations and modifications may be made without departing from the scope of the present invention. Do.
100: wafer transfer device 110: transfer member
120: imaging member 130: wafer transfer controller
140: warning part 150:
160:
Claims (20)
The wafer carrier, the wafer carrier, the wafer carrier, the inside of the wafer carrier, and the wafer boat in real time to detect an error in at least one of the transferring member, the plurality of wafers, the wafer carrier, And a transfer monitoring block configured to check the error occurrence portion in a state in which the operation of the transfer member is stopped.
Wherein,
A blade having a body portion and a plurality of branches extending from the body portion; And
And a fixing member configured to bind the body portion of the stacked blades.
Wherein the transport monitoring block comprises:
An image pickup member positioned adjacent to the transfer member and configured to image the transfer member, the plurality of wafers, the inside of the wafer carrier, and the inside of the wafer boat;
A wafer transfer controller configured to receive image data from the imaging member, compare the set normal data with the image data, and output an error control signal; And
And an operation stop unit for temporarily stopping the conveying member in response to the error control signal.
Wherein a plurality of image pickup members are provided,
Wherein the selected one of the imaging members is positioned to image the inter-branch spacing of the stacked blades, the spacing between guide slots in the wafer carrier, and the spacing between guide slots in the wafer boat.
Wherein a plurality of image pickup members are provided,
Wherein the selected one of the imaging members is positioned to photograph the side of the wafer mounted in the wafer carrier or the wafer boat to take a picture of whether or not wafers of the wafer are generated.
Wherein a plurality of image pickup members are provided,
Wherein one of said imaging members is positioned to image an upper surface of said blade to detect twist and tilt of said blade.
And the image pick-up member is positioned above the fixing member of the conveying member.
Wherein a plurality of image pickup members are provided,
Wherein some of the imaging members are positioned in correspondence with the branches of the blade, and have a wide angle at which the entire stacked branches can be photographed,
And the other of the imaging members is provided at a position where the entire top surface of the blade can be photographed.
The wafer transfer controller includes:
An image storage unit for receiving the image data from the image pickup member and storing the received image data;
An image comparison unit comparing the image data provided from the image storage unit with the set normal data; And
And a determination unit for determining an error from the comparison result of the image comparison unit.
Wherein the image storage unit further comprises an additional storage unit for storing the set data.
Wherein the additional storage comprises a reference line for indicating the position and spacing of the blade in the steady state, a reference line for indicating the distance between the guide slot and the position of the wafer carrier, a reference line for indicating the distance between the guide slot and the position of the wafer boat, A wafer carrier, and a reference line indicative of the position of the wafers mounted on the wafer boat.
Wherein the image comparing unit overlaps the image photographed from the image pick-up member with a reference line corresponding to the image and outputs the comparison result.
An alarm unit driven in response to the error control signal and configured to inform the manager of errors in the transfer member, the wafer, the wafer carrier, or the wafer boat; And
And a correction unit configured to correct a portion where an abnormality has occurred in response to the error control signal.
Wherein the correcting unit causes the wafers to elapse for a predetermined time in a state in which the wafers are generated on the wafers and the operation of the carrying member is stopped when an error control signal for the wafer abnormality is generated, To restart the operation of the wafer transfer apparatus.
An image pickup member positioned adjacent to the transfer member and configured to image the transfer member, the plurality of wafers, the inside of the wafer carrier, and the inside of the wafer boat;
A wafer transfer controller configured to receive image data from the imaging member, compare the set normal data with the image data, and output an error control signal;
An operation stop unit for temporarily stopping the conveying member in response to the error control signal; And
And a correction unit configured to correct a portion where an abnormality has occurred in response to the error control signal.
Wherein a plurality of imaging members are provided,
Wherein one of the imaging members is positioned to image the inter-branch spacing of the stacked blades, the spacing between guide slots in the wafer carrier, and the spacing between guide slots in the wafer boat,
And the other of the imaging members is positioned to photograph the side of the wafer mounted in the wafer carrier or the wafer boat for taking a picture of whether or not wafers have been generated on the wafer,
And another one of the imaging members is positioned to photograph an upper surface of the blade.
The wafer transfer controller includes:
An image storage unit for receiving the image data from the image pickup member and storing the received image data;
An image comparison unit comparing the image data provided from the image storage unit with the set normal data; And
And a determination unit for determining an error from the comparison result of the image comparison unit.
Wherein the additional storage comprises a reference line for indicating the position and spacing of the blade in the steady state, a reference line for indicating the distance between the guide slot and the position of the wafer carrier, a reference line for indicating the distance between the guide slot and the position of the wafer boat, A wafer carrier, and a further storage configured to store a reference line indicative of a position of the wafer mounted on the wafer carrier and the wafer boat,
Further comprising a warning unit driven in response to the error control signal and configured to inform the manager of an error in the transfer member, the wafer, the wafer carrier, or the wafer boat.
Wherein the correcting unit causes the wafers to elapse for a predetermined time in a state in which the wafers are generated on the wafers and the operation of the carrying member is stopped when an error control signal for the wafer abnormality is generated, To restart the operation of the wafer transfer apparatus.
Priority Applications (1)
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KR1020150055253A KR20160124965A (en) | 2015-04-20 | 2015-04-20 | Wafer Transferring Apparatus |
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KR1020150055253A KR20160124965A (en) | 2015-04-20 | 2015-04-20 | Wafer Transferring Apparatus |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108878329A (en) * | 2018-07-19 | 2018-11-23 | 深圳市捷佳伟创新能源装备股份有限公司 | For detecting the detection device, silicon wafer processing system and detection method of position of silicon wafer |
CN113764321A (en) * | 2021-08-10 | 2021-12-07 | 天津爱旭太阳能科技有限公司 | Quartz boat loading and unloading device, processing system and control method |
US20220044947A1 (en) * | 2020-08-05 | 2022-02-10 | Winbond Electronics Corp. | Transportation monitoring method and system thereof |
WO2023210561A1 (en) * | 2022-04-27 | 2023-11-02 | 川崎重工業株式会社 | Semiconductor manufacturing device system |
WO2023210560A1 (en) * | 2022-04-27 | 2023-11-02 | 川崎重工業株式会社 | Semiconductor manufacturing device system |
CN117352441A (en) * | 2023-12-06 | 2024-01-05 | 华芯(武汉)智能装备有限公司 | Wafer scanning device and scanning method thereof |
-
2015
- 2015-04-20 KR KR1020150055253A patent/KR20160124965A/en unknown
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108878329A (en) * | 2018-07-19 | 2018-11-23 | 深圳市捷佳伟创新能源装备股份有限公司 | For detecting the detection device, silicon wafer processing system and detection method of position of silicon wafer |
US20220044947A1 (en) * | 2020-08-05 | 2022-02-10 | Winbond Electronics Corp. | Transportation monitoring method and system thereof |
CN113764321A (en) * | 2021-08-10 | 2021-12-07 | 天津爱旭太阳能科技有限公司 | Quartz boat loading and unloading device, processing system and control method |
WO2023210561A1 (en) * | 2022-04-27 | 2023-11-02 | 川崎重工業株式会社 | Semiconductor manufacturing device system |
WO2023210560A1 (en) * | 2022-04-27 | 2023-11-02 | 川崎重工業株式会社 | Semiconductor manufacturing device system |
CN117352441A (en) * | 2023-12-06 | 2024-01-05 | 华芯(武汉)智能装备有限公司 | Wafer scanning device and scanning method thereof |
CN117352441B (en) * | 2023-12-06 | 2024-02-09 | 华芯(武汉)智能装备有限公司 | Wafer scanning device and scanning method thereof |
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