KR20160113905A - Antenna for Inductively Coupled Plasma And Insulating Support Apparatus - Google Patents

Abstract

The purpose of the present invention is to provide an antenna to generate an inductively combined plasma including a duplex type structure of an inner antenna and an outer antenna having different installation heights to form the large scaled equal plasma having a structural safety. According to an embodiment of the present invention, an insulating support apparatus to fix an antenna to generate an inductively combined plasma comprises: an external body unit including a first width part, a first length part, a second width part, and a second length part successively connected and having a square ring shape; an external antenna accommodation unit individually formed on an upper surface and a lower surface of the first length part and the second length part to accommodate the external antenna to generate the inductively combined plasma; an inner body unit extended from the first width part of the outer body unit to the length direction; and an inner antenna accommodation unit individually formed on the upper surface and the lower surface of the inner body unit to accommodate the internal antenna to generate the inductively combined plasma. The outer antenna accommodation unit supports the outer antennas which have different installation heights. The inner antenna accommodation unit supports the inner antenna having different installation heights.

Description

Technical Field [0001] The present invention relates to an antenna for generating an inductively coupled plasma,

The present invention relates to an antenna for generating an inductively coupled plasma and an insulator supporting apparatus for supporting the antenna.

Plasma generation is classified into inductively coupled plasma (ICP) and capacitively coupled plasma (CCP). The inductively coupled plasma and the capacitively coupled plasma are different from each other in principle of generating plasma, and each method has advantages and disadvantages and is selectively used as needed.

Inductively coupled plasma generates an induced electric field by applying current to the antenna. The induced electric field is transmitted through the dielectric to discharge the gas in the vacuum container. However, the antenna is provided with a high voltage of a sinusoidal wave, and the antenna generates a potential difference according to the position. This potential difference can produce a capacitively coupled plasma. The electric field can be divided into an induction field that generates an inductively coupled plasma and an electrostatic field that generates a capacitively coupled plasma.

On the other hand, an antenna for generating a large area inductively coupled plasma has a large inductance in a circuit. Further, in order to increase the plasma generation efficiency, the frequency of the RF power source is gradually increasing. Therefore, the reactance of the loop antenna increases with the driving frequency and the inductance. A large area loop antenna generates a high voltage between the power supply terminal and the ground terminal, and this high voltage produces a capacitive coupling plasma. Such a capacitively coupled plasma occurs intensively around the power supply terminal of the loop antenna, thereby deteriorating the uniform spatial distribution of the plasma.

In an inductively coupled plasma device, a loop antenna may have a multi-layered structure having different installation heights in order to suppress a capacitive coupling effect. However, a loop antenna having a multi-layer structure is structurally susceptible to deformation. Therefore, an insulator supporting portion capable of supporting the loop antenna of the multi-layer structure is required.

SUMMARY OF THE INVENTION An aspect of the present invention is to provide an antenna for generating an inductively coupled plasma with an inner antenna and an outer antenna of a multi-layer structure having different structural heights and different installation heights capable of forming a uniform plasma with a large area.

An object of the present invention is to provide an insulated support apparatus for supporting an antenna for generating an inductively coupled plasma having an inner antenna having a multilayer structure different in structural stability and an installation height and a structure for suppressing an impedance influence on an outer antenna will be.

An insulator supporting apparatus for fixing an antenna for generating an inductively coupled plasma according to an embodiment of the present invention includes a first width portion, a first length portion, a second width portion, and a second length portion continuously connected to each other, An outer body portion having a shape; An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma; An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion to receive the inner antenna forming the inductively coupled plasma, respectively. The outer antenna receiving portion supports the outer antenna having a different installation height, and the inner antenna receiving portion supports the inner antenna having a different installation height.

In one embodiment of the present invention, an outer antenna fixing block for fixing the outer antenna received in the outer antenna receiving portion; An inner antenna fixing block for fixing the inner antenna received in the inner antenna receiving portion; And fixing means for fixing the outer body portion to the upper edge of the vacuum container. The inner antenna and the outer antenna may be disposed on a dielectric window serving as a lid of the vacuum container.

An insulator supporting apparatus for fixing an antenna for generating an inductively coupled plasma according to an embodiment of the present invention includes a first width portion, a first length portion, a second width portion, and a second length portion continuously connected to each other, An outer body portion having a shape; An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma; An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion to receive the inner antenna forming the inductively coupled plasma, respectively. The radius of the outer antenna is larger than the radius of the inner antenna.

In one embodiment of the present invention, an outer antenna fixing block for fixing the outer antenna received in the outer antenna receiving portion; An inner antenna fixing block for fixing the inner antenna received in the inner antenna receiving portion; And fixing means for fixing the outer body portion to the upper edge of the vacuum container. The inner antenna and the outer antenna may be disposed on a dielectric window serving as a lid of the vacuum container.

In one embodiment of the present invention, the first width portion may include a cut portion. The inner body portion may be inserted and fixed to the cut portion.

An antenna for generating an inductively coupled plasma according to an embodiment of the present invention includes an inner antenna extending from a lower layer to an upper layer so that an installation height of the antenna is different; An outer antenna disposed at an outer periphery to surround the inner antenna and extending from the lower layer and the upper layer so that the installation height is different; And an insulator supporting the inner antenna and the outer antenna to the lower layer and the upper layer and disposed symmetrically.

In one embodiment of the present invention, the insulator support includes: an outer body portion including a first width portion, a first length portion, a second width portion, and a second length portion connected to each other and having a rectangular ring shape; An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma; An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion to receive the inner antenna forming the inductively coupled plasma, respectively.

In one embodiment of the present invention, the inner antenna is composed of two inner sub-antennas having the same structure, and each of the inner sub-antennas has a one-turn loop structure of a band shape having a constant width and a height smaller than the width , And they can be arranged symmetrically by rotating 180 degrees with each other. Each of said inner sub-antennas being disposed in an upper layer and being powered and having a constant curvature, a 90 degree power upper arc branch; An interlayer down contact plug connected to the 90 degree top arc branch and changing the placement plane; A 180 degree lower arc branch disposed in a lower layer and connected to the interlayer down contact plug and having a constant curvature; Connected to said 180 degree lower arc branch and altering the placement plane and interlayer up-contact plug; And a 90 degree grounded top arc branch connected to the interlayer upwards contact plug and having a constant curvature.

In one embodiment of the present invention, the inner antenna is composed of two inner sub-antennas having the same structure, and each of the inner sub-antennas has a one-turn loop structure of a band shape having a constant width and a height smaller than the width , And they can be arranged symmetrically by rotating 180 degrees with each other. Each of the inner sub-antennas is disposed in an upper layer and is powered and has a constant curvature and has a 180 degree power upper arc branch; An interlayer downward contact plug connected to the 180 degree power upper arc branch and changing the placement plane; And a 180 degree grounded lower arc branch disposed in the lower layer and connected to the interlayer downward contact plug and having a constant curvature.

In one embodiment of the present invention, the outer antenna is composed of four outer sub-antennas having the same structure, and each of the outer sub-antennas has a band-shaped 1/2 turn loop having a constant width and a height smaller than the width And they can be symmetrically arranged by rotating 90 degrees with respect to each other. Each of the outer sub-antennas being disposed in an upper layer and being powered and having a constant curvature, a 90 degree power upper arc branch; An interlayer down contact plug connected to the 90 degree top arc branch and changing the placement plane; And a 90 degree grounded lower arc branch disposed in the lower layer and connected to the interlayer downward contact plug and having a constant curvature.

In one embodiment of the present invention, the outer antenna is composed of four outer sub-antennas having the same structure, and each of the outer sub-antennas has a band-shaped 1/2 turn loop having a constant width and a height smaller than the width And they can be symmetrically arranged by rotating 90 degrees with respect to each other. Each of the outer sub-antennas is disposed in an upper layer and is supplied with power and has a constant curvature, a 45-degree power upper arc branch; An interlayer downward contact plug connected to the 45 degree power upper arc branch and changing the placement plane; A 90 degree lower arc branch disposed in the lower layer and connected to the interlayer downward contact plug and having a constant curvature; Connected to said 90 degree lower arc branch and altering the placement plane and interlayer up-contact plug; And a 45 degree grounded upper arc branch connected to the interlayer upwards contact plug and having a constant curvature.

The insulator supporting apparatus according to an embodiment of the present invention stably supports inner and outer antennas having different installation heights, suppresses variations in the impedances of the inner and outer antennas, and the sub-antennas constituting the outer and inner antennas The same impedance can be provided.

The antenna according to an embodiment of the present invention includes inner and outer antennas having different installation heights in parallel and improves the structural stability and the uniform power distribution ability of the sub antennas through the insulator supporting the inner and outer antennas have.

1A is a conceptual diagram illustrating an antenna for generating an inductively coupled plasma.
1B is a cross-sectional view taken along the line A-A 'in FIG. 1A.
1C is a cross-sectional view taken along the line B-B 'in FIG. 1A.
FIG. 1D is a perspective view illustrating an insulated support portion of the antenna for generating an inductively coupled plasma of FIG. 1A. FIG.
2A is a conceptual diagram illustrating an antenna according to another embodiment of the present invention.
2B is a cross-sectional view taken along the line C-C 'in FIG. 2A.
2C is a cross-sectional view taken along the line D-D 'in FIG. 2A.
3A is a conceptual diagram illustrating a loop antenna of a plasma generating apparatus according to another embodiment of the present invention.
3B is a cross-sectional view taken along the line E-E 'in FIG. 3A.
3C is a cross-sectional view taken along the line F-F 'in FIG. 3A.

The loop antenna may have a single-layer structure or a multi-layer structure with a different installation height. The monolayer structure has the disadvantage of forming the capacitively coupled plasma by the high voltage at the power input terminal of the loop antenna and has merely a structural merit. The multi-layer structure has the disadvantage of being structurally complicated and disadvantageous in that the power input terminal of the loop antenna is disposed on the upper layer and the ground terminal is disposed on the lower layer, thereby reducing the influence of high voltage at the power input terminal.

Meanwhile, in order to form a spatial uniform inductively coupled plasma, the loop antenna can be divided into an inner loop antenna and an outer loop antenna. The inner loop antenna and the outer loop antenna may be electrically connected in parallel.

The inner loop antenna and the outer loop antenna may have a multi-layer structure. In this case, in order to form a large-area plasma, if the area of the loop antenna increases, the inductance of the loop antenna can be increased. In order to reduce the inductance of the loop antenna, the loop antenna is divided into a plurality of band-shaped sub-loop antennas, and the sub-loop antennas are electrically connected in parallel to form a loop antenna as a whole. In this case, the inductance of the loop antenna decreases in inverse proportion to the number of sub-loop antennas. In such a case, upon coupling of parts, shape deformation may occur, and the structural stability of the loop antenna may be further deteriorated. When the shape change occurs, the sub-loop antenna does not have the same impedance, and it is difficult to distribute the power equally.

According to an embodiment of the present invention, in order to improve the structural stability of an inner loop antenna having a different installation height and an outer loop antenna having a different installation height, an insulating support portion is proposed. The insulator supports the inner loop antenna and the outer loop antenna while maintaining a stable shape and provides the same impedance to the subloop antennas. In addition, the insulator support is designed to minimize the generation of parasitic capacitance.

Meanwhile, the inner loop antenna and the outer loop antenna are disposed on a dielectric window functioning as a cover of the vacuum container, and it is difficult to arrange a structure for supporting the inner loop antenna and the outer loop antenna. In addition, since the inner loop antenna and the outer antenna in a band-shaped multi-layer structure have a complicated structure, it is difficult to support the inner loop antenna and the outer antenna.

According to an embodiment of the present invention, the insulation supporting part may fix the loop antenna on the dielectric window on the dielectric window while exposing a part of the loop antenna to which power is supplied and a part connected to the ground.

Accordingly, the insulating support portion can stably support the loop antenna having a multi-layer structure divided into a plurality of parts, thereby producing an inductively coupled plasma having a uniform distribution.

The shape and structure of the loop antenna can be generally used by bending a copper pipe. However, when the loop antenna includes a plurality of sub-loop antennas in order to reduce the inductance of the loop antenna, the sub-loop antenna having a structure in which the copper pipe is bent has poor structural stability due to deformation, It has disadvantages. Therefore, the loop antenna can be manufactured in the form of a band having a constant width and a height lower than the width. In addition, the bending portion for changing the placement plane can be replaced through a column-shaped interlayer connection block (or interlayer contact plug). Such a loop antenna having a band structure improves the structural stability of the antenna and can reduce the deviation of each part by using a sub-loop antenna having the same structure. Thus, the sub-loop antennas can maintain the same electrical characteristics. Also, even when the loop antenna has a multi-layer structure, the loop antenna having a band structure can maintain the structural stability. Further, in the case of adopting the insulator support for supporting the loop antenna of the band structure, the structural stability can be further improved.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are being provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art. In the drawings, the components have been exaggerated for clarity. Like numbers refer to like elements throughout the specification. In the drawings, the symbol ⊙ denotes an electrical connection having a direction extending from the lower layer to the upper layer, and the symbol denotes an electrical connection having a direction extending from the upper layer to the lower layer.

1A is a conceptual diagram illustrating an antenna for generating an inductively coupled plasma.

1B is a cross-sectional view taken along the line A-A 'in FIG. 1A.

1C is a cross-sectional view taken along the line B-B 'in FIG. 1A.

FIG. 1D is a perspective view illustrating an insulated support portion of the antenna for generating an inductively coupled plasma of FIG. 1A. FIG.

1A to 1D, an antenna 500 for generating an inductively coupled plasma includes an inner antenna 342 extending in a lower layer and an upper layer so as to have different installation heights; An outer antenna 552 disposed at an outer periphery to surround the inner antenna and extending from the lower layer and the upper layer so that the installation height is different; And an insulator support 180 that is symmetrically disposed to fix the inner antenna and the outer antenna to the lower layer and the upper layer.

The vacuum vessel may be a rectangular parallelepiped chamber or a cylindrical chamber. The reaction space in the vacuum container may be cylindrical. The vacuum container may be formed of a conductive material such as aluminum. The upper surface of the vacuum vessel is open, and the open upper surface can be sealed with a dielectric window 174 in the form of a disk.

The dielectric window 174 may be quartz, ceramic, or alumina. The induction field transmitted through the dielectric window 174 may form an inductively coupled plasma in the reaction space.

A substrate and a substrate holder for supporting the substrate may be disposed in the reaction space provided by the vacuum container. The substrate may be a single crystal silicon substrate, an SOI substrate, or a glass substrate. The vacuum container can process the substrate using an inductively coupled plasma. The substrate processing may be an etching or deposition process depending on the process gas.

The substrate holder may be connected to a bias RF power source that forms an auxiliary plasma according to the process. The bias RF power source may form a capacitive coupled plasma on the substrate and apply an RF bias to the substrate. The bias RF power source may be electrically connected to the substrate holder through an RF bias impedance matching network. The bias RF power source may include a plurality of bias RF power sources. For example, the bias RF power source may include a low frequency bias RF power source and a high frequency bias RF power source. The driving frequency of the low frequency bias RF power source may range from a few MHz and the driving frequency of the high frequency bias RF power source may be several tens of MHz.

The RF power source 110 supplies RF power to the inner antenna 342 and the outer antenna 552 to form an inductively coupled plasma below the dielectric window 174. [ The power of the RF power source 110 may be divided into a first power supplied to the inner antenna 342 and a second power supplied to the outer antenna 552 through the antenna power distributor 130. [

The impedance matching network 120 may be disposed between the RF power source 110 and the antenna power divider 130. The impedance matching network 120 may minimize the reflected power of the RF power source 110 and maximize the power of the RF power source to a load.

The antenna power divider 130 can distribute power to the inner antenna 342 having a small diameter and the outer antenna 552 having a large diameter. For example, the antenna power divider 130 can control the impedance of the inner antenna circuit and / or the impedance of the outer antenna circuit using a variable reactive element. Accordingly, the current supplied to the inner antenna 342 and the current supplied to the outer antenna 552 can be varied. Time-varying currents can form an induced electric field.

When the currents flowing through the inner antenna and the outer antenna are respectively set to the antenna power dividing unit 130, the antenna power dividing unit 130 may be replaced with a fixed active element instead of a variable reactive element. The antenna power divider 130 may include a variable capacitor connected in series with the inner antenna and / or a variable capacitor connected in series with the outer antenna.

The first power supplied to the inner antenna 342 may be distributed to the plurality of inner sub-antennas 342a and 342b again. Also, the second power supplied to the outer antenna 552 may be distributed to the plurality of outer sub-antennas 552a to 552d.

The sub-antenna power divider 160 distributes the first power to a plurality of inner sub-antennas 342a and 342b, and distributes the second power to a plurality of outer sub-antennas 552a to 552d . The sub-antenna power distributor 160 may have a symmetric structure for uniform distribution of the first power and uniform distribution of the second power.

The sub-antenna power divider 160 includes an inner sub-antenna power divider 160a for distributing power to the inner sub-antennas of the inner antenna, and an outer sub-antenna power divider 160b for distributing power to the outer sub- And a distribution unit 160b.

The inner sub antenna power divider 160a includes an inner power supply line 162 receiving the divided first power; Inner power horizontal branches (348a, 348b) that diverge radially symmetrically at the inner power supply line (162); And inner power vertical branches 349 connecting one end of the inner power horizontal branch 348a, 348b and one end of the inner sub-antenna 342a, 342b to each other. The inner power supply line 162 is in the shape of a bar, the inner power horizontal branches 348a and 348b are in a band shape, and the inner power vertical branches 349 may be rod-shaped.

The inner power supply line 162 may extend in the direction of the central axis from the origin of the cylindrical coordinate system. And the origin of the cylindrical coordinate system can be disposed on the central axis of the vacuum container. The inner power horizontal branches 348a and 348b extend radially at the ends of the inner power supply line 162 and the inner power vertical branches 349 are connected to the inner power horizontal branches 348a and 348b, (In the direction of the center axis of the cylindrical coordinate system) at the end of the cylinder. Accordingly, the inner sub-antenna power divider 160a may provide the same impedance to the sub inner antennas 342a and 342b.

The outer sub antenna power divider 160b includes an outer power supply line 164 receiving the divided second power; Outer power horizontal branches 558a-558d that diverge radially symmetrically at the end of the outer power supply line 164; And outer power vertical branches 559 connecting one end of the outer power horizontal branches 558a to 558d and one end of the outer sub-antennas 552a to 552d to each other. The outer power supply line 164 may be in the shape of a pipe to enclose the inner supply line 162. The outer power horizontal branches 558a-558d may be band-shaped and the outer power vertical branches 559 may be rod-shaped.

The outer power supply line 164 may extend in the direction of the central axis from the origin of the cylindrical coordinate system. The outer power horizontal branches 558a-558d extend radially at the ends of the outer power supply line 164 and the outer power vertical branches 559 are connected to the outer power horizontal branches 558a-558d. (In the direction of the center axis of the cylindrical coordinate system) at the end of the cylinder. The outer power supply line 164 may have a cylindrical shape and may surround the inner power supply line 162. Accordingly, the outer sub-antenna power divider 160b may provide the same impedance to the sub-outer antennas 552a to 552d.

The inner sub-antennas 342a and 342b and the outer sub-antennas 552a to 552d extend while rotating counterclockwise.

The inner antenna 342 may have a multi-layer structure and two inner sub-antennas 342a and 342b having the same structure. Each of the inner sub-antennas has a loop-like one-turn loop structure having a constant width and a height smaller than the width, and may be symmetrically arranged by rotating 180 degrees with respect to each other. Each of the inner sub-antennas 342a and 342b is disposed in the upper layer 12 and is powered and has a 90 degree power upper arc branch 342aa, 342ba with a constant curvature; Interlayer downward contact plugs 342ab, 342bb connected to the 90 degree top arc branches 342aa, 342ba and changing the placement plane; A 180 degree lower arc branch 342ac, 342bc disposed in the lower layer 10 and connected to the interlayer downward contact plugs 342ab, 342bb and having a constant curvature; An inter-layer up-contact plug 342ad, 342bd connected to and changing the 180-degree lower arc branch 342ac, 342bc; And a 90 degree grounded upper arc branch 342ae, 342be disposed in the upper layer 12 and connected to the interlayer upwards contact plug 342ad, 342bd and having a constant curvature. Accordingly, the inner antenna 342 may provide a loop of two turns. The inner antenna 342 may have a multi-layer structure in the form of a band.

One end of the inner sub-antennas 342a and 342b may include an inner sub-antenna power connection part 341a whose radius increases in a rotational direction (azimuth direction, counterclockwise direction) in a cylindrical coordinate system in the upper layer 12. [ The other end of the inner sub-antennas 342a and 342b may include an inner sub-antenna ground connection part 341b whose radius increases in a rotation direction (azimuth direction) in a cylindrical coordinate system in the lower layer 10. [

The inner sub-antennas 342a and 342b may include a connection portion for changing the radius at a portion where the arrangement plane is changed. Specifically, the 90 degree power upper arc branch 342aa, 342ba may include a connection portion for increasing the radius of curvature in the upper layer 12 around the interlayer down-contact plugs 342ab, 342bb. The 180 degree lower arc branch 342ac, 342bc may also include a connection portion for reducing the radius at the lower layer 10 around the interlayer downward contact plugs 342ab, 342bb. In addition, the 180 degree lower arc branch 342ac, 342bc may include a connection portion for reducing the radius in the lower layer around the interlayer up-contact plugs 342ad, 342bd. In addition, the 90 degree ground upper arc branch 342ae, 342be may include a connection portion for increasing the radius in the upper layer around the interlayer up-contact plugs 342ad, 342bd.

The inner sub-antenna power connection 341a may be connected to the inner power vertical branch 349 and the inner sub-antenna ground connection 341b may be connected to the inner ground rod 346. The inner sub-antenna power connection 341a may provide that the inner antenna forms a generally circular loop. The inner sub-antenna ground connection 341b may connect the inner antenna 342 to the inner ground rod 346 while maintaining the inner antenna 342 as circular as possible.

The inner ground rod 346 may connect the 90 degree ground upper arc branch 342ae, 342be disposed in the upper layer to ground. The ground may be the body of the vacuum container. Alternatively, the ground may be a shielding material of a conductive material disposed on the upper portion of the vacuum container and arranged to surround the inner antenna and the outer antenna. The inner ground bar 346 may extend perpendicular to the plane of placement of the inner sub-antennas 342a and 342b. Accordingly, the inner ground rod 346 can be electrically connected to the top plate 178 of the shielded chamber.

The outer antenna 552 may have a multi-layer structure in the form of a band. The outer sub-antenna 552 may be composed of four outer sub-antennas 552a to 552d having the same structure. Each of the outer sub-antennas 552a to 552d may have a band-shaped half-circular structure having a constant width and a height smaller than the width. Each of the outer sub-antennas 552a to 552d may be arranged symmetrically with respect to each other by rotating 90 degrees with respect to each other. Accordingly, the outer antenna 552 may provide a loop of two turns.

Each of the outer sub-antennas 552a-552d is disposed in the upper layer 12 and is powered and has a 45 degree power upper arc branch 552aa, 552ba, 552ca, 552da with a constant curvature; Interlayer downward contact plugs 552ab, 552bb, 552cb, 552db connected to the 45 degree power upper arc branch and changing the placement plane; A 90 degree lower arc branch 552ac, 552bc, 552cc, 552dc disposed in the lower layer 10 and connected to the interlayer downward contact plug and having a constant curvature; Connected to the 90 degree lower arc branch and changing the placement plane and interlayer up-contact plugs 552ad, 552bd, 552cd, 552dd; And 45-degree grounded upper arc branches 552ae, 552be, 552ce, and 552de disposed in the upper layer 12 and connected to the interlayer up-contact plugs and having a constant curvature.

One end of the outer sub-antennas 552a to 552d may include an outer sub-antenna power connection part 551a whose radius increases in a rotation direction (counterclockwise direction) in a cylindrical coordinate system. The other end of the outer sub-antenna may include an outer sub-antenna ground connection part 551b whose radius increases in the direction of rotation in a cylindrical coordinate system.

The outer sub antenna power connection 551a may be connected to the outer power vertical branches 558a to 558d and the outer sub antenna ground connection 551b may be connected to the outer ground bar 556. [ The outer sub-antenna power connection 551a may provide that the outer antenna 552 forms an overall circular loop. The outer sub-antenna ground connection 551b may connect the outer antenna 552 to the outer ground bar 556 while maintaining the outer antenna as circular as possible.

The outer ground bar 556 is columnar and can be connected to ground. The ground may be the body of the vacuum container. Alternatively, the ground may be a shielding material of a conductive material disposed on the upper portion of the vacuum container and arranged to surround the inner antenna and the outer antenna. The outer ground bar 556 may extend perpendicularly to the plane of placement of the outer sub-antenna. Accordingly, the outer ground bar may be electrically connected to the upper plate 178 of the shielded room.

The placement plane of the outer power horizontal branches 558a-558d may be higher than the placement plane of the inner power horizontal branches 348a, 348b. The outer power horizontal branches 558a-558d may be sufficiently spaced from the inner power horizontal branches 348a, 348b to minimize the generation of parasitic capacitors. In addition, the inner power horizontal branches 348a, 348b may be disposed between the neighboring outer power horizontal branches 558a-558d.

The insulating support 180 includes an outer body portion 182, an outer antenna receiving portion 183, an inner body portion 185, and an inner antenna receiving portion 186. The outer body portion 182 includes a first width portion 182a, a first length portion 182b, a second width portion 182c, and a second length portion 182d that are continuously connected to each other, .

The outer antenna receiving portion 183 is formed on the upper surface and the lower surface of the first length portion 182b and the second length portion 182d respectively to receive the outer antenna 552 forming the inductively coupled plasma . The inner body portion 185 extends in the longitudinal direction at the first width portion 182a of the outer body portion 180. [

The inner antenna receiving portion 186 is formed on the upper and lower surfaces of the inner body portion 185 to receive the inner antenna 342 forming the inductively coupled plasma, respectively. The outer antenna receiving portion 186 supports the outer antenna 552 having a different installation height. The inner antenna receiving portion 186 supports the inner antenna 342 having a different installation height.

The insulative support 180 may be a workable insulator such as engineering plastics. For example, the insulating support 180 may be made of polyether ether ketone (PEEK). The insulator 180 may be fixed while aligning the inner antenna 342 and the outer antenna 552 in the form of a strip having a different installation height. The insulation support 180 may be formed in a radial direction between the inner antenna 342 and the outer antenna 552 while keeping the interlayer spacing of the inner antenna 342 and the interlayer spacing of the outer antenna 552 constant. The interval can be kept constant. Therefore, the shape of the internal antenna 342 and the external antenna 552, which are formed of a plurality of band-shaped parts, can be minimized when assembling the insulating support 180. Accordingly, the inner sub-antennas maintain the same impedance, and the outer sub-antennas can maintain the same impedance. The insulating support 180 may include fixing means 188 disposed on a dielectric window that serves as a lid of the vacuum vessel, and may be coupled to the insulating support and secured to the upper surface of the vacuum vessel. The fixing means 188 may be coupled to the outer body portion 182 and secured to the upper surface of the vacuum container.

In addition, the insulating support 180 can minimize the parasitic capacitance. The four insulating supports 180 may be symmetrically arranged in a cross shape in the x and y axis directions in the xy plane of the rectangular coordinate system. Each of the insulative supports 180 may be aligned with the power input of the outer sub-antenna 552.

The outer body portion 182 may have the shape of a square ring having a rectangular cross-section through hole 182f at the center thereof. The longitudinal direction of the outer body portion 182 may be substantially in the direction of the central axis toward the origin of the cylindrical coordinate system. The width direction of the outer body portion 182 may be substantially a rotation (azimuth) direction of the cylindrical coordinate system. The outer body portion 182 and the inner body portion 185 can finely adjust the alignment positions of the inner antenna and the outer antenna, and can disassemble and combine with each other. The insulating bolt can be inserted and fixed in the width direction at the side of the outer body portion, the inner body portion 185 inserted into the cut portion 182e of the outer body portion 182. [

The outer sub antenna power connection portion 551a and the outer sub antenna ground connection portion 551b may be disposed in the through hole 182f of the outer body portion 182. [ Accordingly, the through hole 182f can provide a space where the outer ground bar 556 and the outer power vertical branch 559 can be disposed. The outer antenna receiving portion 183 may be formed on the first and second length portions of the outer body portion, respectively. The outer antenna receiving portion 183 may have a groove shape formed to have the same curvature as the outer antenna. The outer antenna receiving portion 183 may have a jaw so that the outer antenna fixing block 184 can be coupled. The depth of the outer antenna receiving portion 183 may be substantially the same as the thickness of the outer antenna. When the outer antenna fixing block 184 and the outer antenna 552 are coupled to the outer antenna receiving portion 183, the upper surface of the outer body portion coincides with the upper surface of the outer antenna fixing block and the outer antenna .

The inner body part 185 may have a rectangular column shape and one end of the inner body part may be inserted and fixed to the cut part 182e of the outer body part. The inner body portion 185 may extend in the longitudinal direction. The inner body part 185 can be fixed while maintaining the interlayer spacing of the inner antenna. The inner antenna receiving portion 186 extends in the width direction, and may be formed on the upper surface and the lower surface, respectively. The inner antenna receiving portion may have a groove shape having the same curvature as the inner antenna. The inner antenna receiving part 185 may have a jaw so that the inner antenna fixing block 187 can be inserted. The inner antenna fixing block may fix the inner antenna inserted in the inner antenna receiving portion.

The outer antenna fixing block 184 can fix the outer antenna housed in the outer antenna receiving portion. The outer antenna fixing block may be formed of an insulator and may have a band shape. The outer antenna fixing block may be fixedly coupled to the outer antenna receiving portion by insulating bolts.

The inner antenna fixing block 187 can fix the inner antenna received in the inner antenna receiving portion. The inner antenna fixing block may be formed of an insulator and may have a band shape. The inner antenna fixing block may be fixedly coupled to the inner antenna receiving portion by insulating bolts.

The securing means 188 may fix the outer body portion to the upper edge of the vacuum container. The inner antenna and the outer antenna may be disposed on a dielectric window serving as a lid of the vacuum container. The fixing means 188 may extend in the width direction. The cross section of the securing means may include a depression for stability of engagement and a depression of the securing means may engage a depressed area of the second width.

2A is a conceptual diagram illustrating an antenna according to another embodiment of the present invention.

2B is a cross-sectional view taken along the line C-C 'in FIG. 2A.

2C is a cross-sectional view taken along the line D-D 'in FIG. 2A.

A description overlapping with that described in Fig. 1 will be omitted.

Referring to FIGS. 2A to 2C, the antenna 300 for generating inductively coupled plasma has an inner antenna 342 extending from the lower layer to the upper layer so as to have different installation heights; An outer antenna (352) disposed at an outer periphery to surround the inner antenna and extending from the lower layer and the upper layer so that the installation height is different; And an insulator support 180 that is symmetrically disposed to fix the inner antenna and the outer antenna to the lower layer and the upper layer.

The inner antenna 342 forms a circular loop and may have a belt-like multi-layer structure. The outer antenna 352 forms a circular loop and may have a multi-layer structure in the form of a band.

The RF power source 110 may supply RF power to the inner antenna 342 and the outer antenna 352 to form an inductively coupled plasma below the dielectric window 174. The power of the RF power source 110 may be divided into a first power supplied to the inner antenna 342 and a second power supplied to the outer antenna 352 through the antenna power distribution unit 130. [

The antenna power divider 130 can distribute power to the inner antenna 342 having a small diameter and the outer antenna 352 having a large diameter. For example, the antenna power divider 130 can control the impedance of the inner antenna circuit and / or the impedance of the outer antenna circuit using a variable reactive element. Accordingly, the current supplied to the inner antenna 342 and the current supplied to the outer antenna 352 can be varied.

The first power supplied to the inner antenna 342 may be distributed to the plurality of inner sub-antennas 342a and 342b again. Also, the second power supplied to the outer antenna 352 may be distributed to the plurality of outer sub-antennas 352a to 352d again.

The sub-antenna power divider 160 distributes the first power to a plurality of inner sub-antennas 342a and 342b, and distributes the second power to the plurality of outer sub-antennas 352a to 352d in an equal . The sub-antenna power distributor 160 may have a symmetric structure for uniform distribution of the first power and uniform distribution of the second power.

The outer sub antenna power divider 160b includes an outer power supply line 164 receiving the divided second power; Outer power horizontal branches 358a-358d that diverge radially symmetrically at the end of the outer power supply line 164; And outer power vertical branches 359 connecting one end of the outer power horizontal branches 358a to 358d and one end of the outer sub-antennas 352a to 352d to each other. The outer power supply line 164 may be in the shape of a pipe to enclose the inner supply line 162. The outer power horizontal branches 358a-358d may be strip-shaped and the outer power vertical branches 359 may be rod-shaped.

The outer power supply line 164 may extend in the direction of the central axis from the origin of the cylindrical coordinate system. The outer power horizontal branches 358a-358d extend radially at the ends of the outer power supply line 164 and the outer power vertical branches 359 are connected to the outer power horizontal branches 358a- (In the direction of the center axis of the cylindrical coordinate system) at the end of the cylinder. The outer power supply line 164 may have a cylindrical shape and may surround the inner power supply line 162. Accordingly, the outer sub-antenna power divider 160b may provide the same impedance to the sub-outer antennas 352a to 352d.

The outer antenna 352 may have a multi-layer structure in the form of a band. The outer sub-antenna 352 may be composed of four outer sub-antennas 352a to 352d having the same structure. Each of the outer sub-antennas 352a to 352d may have a band-shaped half-circular structure having a constant width and a height smaller than the width. Each of the outer sub-antennas 352a to 352d may be symmetrically disposed by being rotated 90 degrees with respect to each other. Accordingly, the outer antenna 352 may provide a loop of two turns.

The outer antenna may be composed of four outer sub-antennas having the same structure. Each of the outer sub-antennas has a loop structure having a certain width and a height smaller than the width of a half turn, and may be symmetrically arranged by rotating 90 degrees with respect to each other.

Each of the outer sub-antennas 352a-352d is disposed in the upper layer and is powered and has a 90 degree power upper arc branch 352aa, 352ba, 352ca, 352da with a constant curvature; Interlayer downward contact plugs 352ab, 352bb, 352cb, 352db connected to the 90 degree top arc branch and changing the placement plane; And a 90 degree grounded lower arc branch 352ac, 352bc, 352cc, 352dc disposed in the lower layer and connected to the interlayer downward contact plug and having a constant curvature.

One end of each of the outer sub-antennas 352a to 352d may include an outer sub-antenna power connection portion 351a whose radius increases in a rotational direction (counterclockwise direction) in a cylindrical coordinate system. The other end of the outer sub-antenna may include an outer sub-antenna ground connection part 351b whose radius of the spiral increases in the direction of rotation in a cylindrical coordinate system.

The outer sub-antenna power connection 351a may be connected to the outer power vertical branches 358a-358d and the outer sub-antenna ground connection 351b may be connected to the outer ground bar 356. [ The outer sub-antenna power connection portion 351a may provide that the outer antenna 352 forms a circular loop as a whole. The outer sub-antenna ground connection portion 351b may connect the outer antenna 352 to the outer ground bar 356 while maintaining the outer antenna at the maximum circular shape.

The outer ground bar 356 may connect the 90-degree ground lower arc branch 352ac disposed in the lower layer to the ground. The ground may be the body of the vacuum container. Alternatively, the ground may be a shielding material of a conductive material disposed on the upper surface of the vacuum container and disposed to surround the inner antenna and the outer antenna. The outer ground bar 356 may extend perpendicularly to the plane of placement of the outer sub-antenna. Accordingly, the inner ground bar may be electrically connected to the upper plate 178 of the shielded room.

The placement plane of the outer power horizontal branches 358a-358d may be higher than the placement plane of the inner power horizontal branches 348a 348b. The outer power horizontal branches 358a-358d may be sufficiently spaced from the inner power horizontal branches 348a, 348b to minimize the generation of parasitic capacitors. In addition, the inner power horizontal branches 348a, 348b may be disposed between the neighboring outer power horizontal branches 358a-358d.

The insulating support 180 includes an outer body portion 182, an outer antenna receiving portion 183, an inner body portion 185, and an inner antenna receiving portion 186. The outer body portion 182 includes a first width portion 182a, a first length portion 182b, a second width portion 182c, and a second length portion 182d that are continuously connected to each other, .

The outer antenna receiving portion 183 is formed on the upper surface and the lower surface of the first length portion 182b and the second length portion 182d respectively to receive the outer antenna 552 forming the inductively coupled plasma . The inner body portion 185 extends in the longitudinal direction at the first width portion 182a of the outer body portion 180. [

The inner antenna receiving portion 186 is formed on the upper and lower surfaces of the inner body portion 185 to receive the inner antenna 342 forming the inductively coupled plasma, respectively. The outer antenna receiving portion 186 supports the outer antenna 552 having a different installation height. The inner antenna receiving portion 186 supports the inner antenna 342 having a different installation height.

3A is a conceptual diagram illustrating a loop antenna of a plasma generating apparatus according to another embodiment of the present invention.

3B is a cross-sectional view taken along the line E-E 'in FIG. 3A.

3C is a sectional view taken along the line F-F 'in FIG. 3A.

A description overlapping with those described in Figs. 1 and 2 will be omitted.

Referring to FIGS. 3A to 3C,

The antenna 400 for generating an inductively coupled plasma has an inner antenna 442 extending from the lower layer to the upper layer so as to have a different installation height; An outer antenna (352) disposed at an outer periphery to surround the inner antenna and extending from the lower layer and the upper layer so that the installation height is different; And an insulator support 180 that is symmetrically disposed to fix the inner antenna and the outer antenna to the lower layer and the upper layer.

The outer antenna 352 includes a plurality of outer sub-antennas 352a to 352d which are disposed outside the inner antenna 442 to surround the inner antenna 442 and have the same structure and are symmetrically supplied with power from the outer power supply line 164 . The inner antenna 442 and the outer antenna 352 form loops each having a constant radius. One end of the inner sub-antennas 442a and 442b is electrically connected to the inner power supply line 162 and the other end of the inner sub-antennas 442a and 442b is electrically connected to the inner ground rod 446. [ The inner antenna 442 and the outer antenna 352 form an inductively coupled plasma in a vacuum container disposed on a lower surface thereof.

The inner antenna 442 may have a multi-layer structure in the form of a band, and the outer antenna 352 may have a multi-layer structure in the form of a band.

The RF power source 110 may supply RF power to the inner antenna 442 and the outer antenna 352 to form inductively coupled plasma below the dielectric window 174. [ The power of the RF power source 110 may be divided into a first power supplied to the inner antenna 442 and a second power supplied to the outer antenna 352 through the antenna power distributor 130. [

The antenna power distribution unit 130 can distribute power to the inner antenna 442 having a small diameter and the outer antenna 352 having a large directivity. For example, the antenna power divider 130 can control the impedance of the inner antenna circuit and / or the impedance of the outer antenna circuit using a variable reactive element. Accordingly, the current supplied to the inner antenna 442 and the current supplied to the outer antenna 352 can be varied.

The first power supplied to the inner antenna 442 may be distributed to the plurality of inner sub-antennas 442a and 442b again. Also, the second power supplied to the outer antenna 352 may be distributed to the plurality of outer sub-antennas 352a to 352d again.

The sub-antenna power divider 160 distributes the first power to a plurality of inner sub-antennas 442a and 442b, and distributes the second power to a plurality of outer sub-antennas 352a to 352d . The sub-antenna power distributor 160 may have a symmetric structure for uniform distribution of the first power and uniform distribution of the second power.

The sub-antenna power divider 160 includes an inner sub-antenna power divider 160a for distributing power to the inner sub-antennas of the inner antenna, and an outer sub-antenna power divider 160b for distributing power to the outer sub- And a distribution unit 160b.

The inner sub antenna power divider 160a includes an inner power supply line 162 receiving the divided first power; Inner power horizontal branches 448a, 448b that diverge radially symmetrically at the inner power supply line 162; And inner power vertical branches 449 connecting one end of the inner power horizontal branch 448a, 448b and one end of the inner sub-antenna 442a, 442b to each other. The inner power supply line 162 is a bar shape, the inner power horizontal branches 448a and 448b are band-shaped, and the inner power vertical branches 449 may be rod-shaped.

The inner power supply line 162 may extend in the direction of the central axis from the origin of the cylindrical coordinate system. And the origin of the cylindrical coordinate system can be disposed on the central axis of the vacuum container. The inner power horizontal branches 448a and 448b extend radially at the ends of the inner power supply line 162 and the inner power vertical branches 449 are connected to the inner power horizontal branches 448a and 448b, (In the direction of the center axis of the cylindrical coordinate system) at the end of the cylinder. Accordingly, the inner sub-antenna power divider 160a may provide the same impedance to the sub inner antennas 442a and 442b.

The inner sub-antennas 442a and 442b and the outer sub-antennas 352a to 352d extend while rotating counterclockwise.

The inner antenna 442 may be composed of two inner sub-antennas 442a and 442b having the same structure. Each of the inner sub-antennas has a loop-like one-turn loop structure having a constant width and a height smaller than the width, and may be symmetrically arranged by rotating 180 degrees with respect to each other.

Each of the inner sub-antennas 442a and 442b is disposed in the upper layer and is powered and has a 180 degree power upper arc branch 442aa, 442ba with a constant curvature; Interlayer downward contact plugs 442ab, 442bb connected to the 180 degree power upper arc branch and changing the placement plane; And a 180 degree grounded lower arc branch 442ac, 442bc disposed on the lower layer and connected to the interlayer downward contact plug and having a constant curvature.

One end of each of the inner sub-antennas 442a and 442b may include an inner sub-antenna power connection part 441a in which the radius of the helical shape increases in the rotation direction (azimuth direction, counterclockwise direction) in a cylindrical coordinate system in the upper layer. The other end of the inner sub-antennas 442a and 442b may include an inner sub-antenna ground connection portion 441b whose radius increases in a rotation direction (azimuth direction) in a cylindrical coordinate system in a lower layer.

The inner sub-antennas 442a and 442b may include a connection portion for changing the radius at a portion where the arrangement plane is changed. Specifically, the 180 degree power upper arc branch 442aa, 442ba may include a connection portion for increasing the radius of curvature in the upper layer around the interlayer downward contact plugs 442ab, 442bb.

In addition, the 180 degree ground lower arc branch 442ac, 442bc may include a connection portion for reducing the radius of curvature in the lower layer around the interlayer downward contact plugs 442ab, 442bb.

The inner sub antenna power connection 441a may be connected to the inner power vertical branch 449 and the inner sub antenna ground connection 441b may be connected to the inner ground bar 446. [ The inner sub-antenna power connection 441a may provide that the inner antenna forms an overall circular loop. The inner sub-antenna ground connection 441b may connect the inner antenna 442 to the inner ground ring 446 while keeping the inner antenna 442 as circular as possible.

The inner ground bar 446 may couple the inner antenna 442 to ground. The ground may be the body of the vacuum container. Alternatively, the ground may be a shielding material of a conductive material disposed on the upper surface of the vacuum container and arranged to surround the inner antenna and the outer antenna. The inner ground bar 446 may extend perpendicular to the plane of placement of the inner sub-antennas 442a and 442b. Accordingly, the inner ground bar 446 can be electrically connected to the upper plate of the shielded room.

The placement plane of the outer power horizontal branches 358a-358d may be higher than the placement plane of the inner power horizontal branches 448a, 448b. The outer power horizontal branches 358a through 358d may be sufficiently spaced from the inner power horizontal branches 448a and 448b to minimize the generation of parasitic capacitors. In addition, the inner power horizontal branches 448a, 448b may be disposed between the neighboring outer power horizontal branches 358a-358d.

The insulating support 180 includes an outer body portion 182, an outer antenna receiving portion 183, an inner body portion 185, and an inner antenna receiving portion 186. The outer body portion 182 includes a first width portion 182a, a first length portion 182b, a second width portion 182c, and a second length portion 182d that are continuously connected to each other, .

The outer antenna receiving portion 183 is formed on the upper surface and the lower surface of the first length portion 182b and the second length portion 182d respectively to receive the outer antenna 552 forming the inductively coupled plasma . The inner body portion 185 extends in the longitudinal direction at the first width portion 182a of the outer body portion 180. [

The inner antenna receiving portion 186 is formed on the upper and lower surfaces of the inner body portion 185 to receive the inner antenna 342 forming the inductively coupled plasma, respectively. The outer antenna receiving portion 186 supports the outer antenna 552 having a different installation height. The inner antenna receiving portion 186 supports the inner antenna 342 having a different installation height.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, And all of the various forms of embodiments that can be practiced without departing from the technical spirit.

10: Lower layer
12: Upper layer
180: Insulation support
342: inner antenna
552: outer antenna

Claims (11)

An outer body portion including a first width portion, a first length portion, a second width portion, and a second length portion connected in series to each other and having a rectangular ring shape;
An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma;
An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And
And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion respectively for receiving the inner antenna forming the inductively coupled plasma,
Wherein the outer antenna receiving portion supports the outer antenna having a different installation height,
Wherein the inner antenna receiving part supports the inner antenna having a different installation height. The method according to claim 1,
An outer antenna fixing block for fixing the outer antenna received in the outer antenna receiving portion;
An inner antenna fixing block for fixing the inner antenna received in the inner antenna receiving portion; And
Further comprising fixing means for fixing the outer body portion to the upper edge of the vacuum container,
Wherein the inner antenna and the outer antenna are disposed on a dielectric window serving as a cover of the vacuum container. An outer body portion including a first width portion, a first length portion, a second width portion, and a second length portion connected in series to each other and having a rectangular ring shape;
An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma;
An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And
And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion respectively for receiving the inner antenna forming the inductively coupled plasma,
Wherein a radius of the outer antenna is larger than a radius of the inner antenna. The method of claim 3,
An outer antenna fixing block for fixing the outer antenna received in the outer antenna receiving portion;
An inner antenna fixing block for fixing the inner antenna received in the inner antenna receiving portion; And
Further comprising fixing means for fixing the outer body portion to the upper edge of the vacuum container,
Wherein the inner antenna and the outer antenna are disposed on a dielectric window serving as a cover of the vacuum container. 5. The method according to any one of claims 1 to 4,
Wherein the first width portion includes a cut portion,
Wherein the inner body is inserted and fixed to the cut portion. ≪ RTI ID = 0.0 > 18. < / RTI > An inner antenna extending from the lower layer and the upper layer so that the installation height is different;
An outer antenna disposed at an outer periphery to surround the inner antenna and extending from the lower layer and the upper layer so that the installation height is different; And
And an insulator supporting portion that is symmetrically disposed with the inner antenna and the outer antenna fixed to the lower layer and the upper layer. The method according to claim 6,
Wherein the insulating support comprises:
An outer body portion including a first width portion, a first length portion, a second width portion, and a second length portion connected in series to each other and having a rectangular ring shape;
An outer antenna receiving portion formed on upper and lower surfaces of the first length portion and the second length portion, respectively, for receiving an outer antenna forming an inductively coupled plasma;
An inner body portion extending in the longitudinal direction at the first width portion of the outer body portion; And
And an inner antenna receiving portion formed on the upper and lower surfaces of the inner body portion to receive the inner antenna forming the inductively coupled plasma, respectively. 8. The method of claim 7,
The inner antenna is composed of two inner sub-antennas of the same structure,
Each of the inner sub-antennas has a one-turn loop structure of a band shape having a constant width and a height smaller than the width, and is arranged symmetrically by rotating 180 degrees with each other,
Each of the inner sub-antennas includes:
A 90 degree power upper arc branch placed in the upper layer and powered and having a constant curvature;
An interlayer down contact plug connected to the 90 degree top arc branch and changing the placement plane;
A 180 degree lower arc branch disposed in a lower layer and connected to the interlayer down contact plug and having a constant curvature;
Connected to said 180 degree lower arc branch and altering the placement plane and interlayer up-contact plug; And
And a 90 degree grounded upper arc branch connected to the interlayer upward contact plug and having a constant curvature. 8. The method of claim 7,
The inner antenna is composed of two inner sub-antennas of the same structure,
Each of the inner sub-antennas has a one-turn loop structure of a band shape having a constant width and a height smaller than the width, and is arranged symmetrically by rotating 180 degrees with each other,
Each of the inner sub-antennas includes:
A 180 degree power upper arc branch positioned in the upper layer and powered and having a constant curvature;
An interlayer downward contact plug connected to the 180 degree power upper arc branch and changing the placement plane; And
And a 180 degree grounded lower arc branch disposed on a lower layer and connected to the interlayer downward contact plug and having a constant curvature. 8. The method of claim 7,
The outer antenna is composed of four outer sub-antennas having the same structure,
Each of the outer sub-antennas has a loop structure of a band-shaped ½ turn having a constant width and a height smaller than the width, and is arranged symmetrically by rotating 90 degrees with each other,
Each of the outer sub-antennas includes:
A 90 degree power upper arc branch placed in the upper layer and powered and having a constant curvature;
An interlayer down contact plug connected to the 90 degree top arc branch and changing the placement plane; And
And a 90 degree grounded lower arc branch disposed at a lower layer and connected to the interlayer downward contact plug and having a constant curvature. 8. The method of claim 7,
The outer antenna is composed of four outer sub-antennas having the same structure,
Each of the outer sub-antennas has a loop structure of a band-shaped ½ turn having a constant width and a height smaller than the width, and is arranged symmetrically by rotating 90 degrees with each other,
Each of the outer sub-antennas includes:
A 45 degree power upper arc branch positioned in the upper layer and powered and having a constant curvature;
An interlayer downward contact plug connected to the 45 degree power upper arc branch and changing the placement plane;
A 90 degree lower arc branch disposed in the lower layer and connected to the interlayer downward contact plug and having a constant curvature;
Connected to said 90 degree lower arc branch and altering the placement plane and interlayer up-contact plug; And
And a 45-degree grounded upper arc branch connected to the interlayer upward contact plug and having a constant curvature.

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