KR101714406B1 - Plasma Processing Apparatus - Google Patents
Plasma Processing Apparatus Download PDFInfo
- Publication number
- KR101714406B1 KR101714406B1 KR1020150110137A KR20150110137A KR101714406B1 KR 101714406 B1 KR101714406 B1 KR 101714406B1 KR 1020150110137 A KR1020150110137 A KR 1020150110137A KR 20150110137 A KR20150110137 A KR 20150110137A KR 101714406 B1 KR101714406 B1 KR 101714406B1
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- Prior art keywords
- antenna
- power
- antennas
- disposed
- radius
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
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- H05H2001/463—
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- H05H2001/4667—
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
The present invention provides an inductively coupled plasma processing apparatus. The apparatus includes an inner antenna disposed on a dielectric top plate of a vacuum container and having a constant radius; A plurality of outer antennas electrically connected in parallel and disposed on the dielectric top plate of the vacuum container and disposed on an outer periphery of the inner antenna; A power distributor for distributing power to the inner antenna and the outer antennas, respectively; And an RF power source for providing power to the inner antenna and the outer antennas through the power divider. The power divider distributes power between the inner antenna and the outer antennas connected in parallel to each other. The outer antennas are disposed at regular intervals on a circumference having a predetermined radius on the central axis of the inner antenna. Each of the outer antennas has a multi-layered annular section shape.
Description
The present invention relates to an inductively coupled plasma processing apparatus, and more particularly, to a large area plasma source having an inner antenna and an outer antenna.
Korean Patent Laid-Open No. 10-2013-0043795 discloses a plasma processing apparatus having an inner antenna and an outer antenna. The outer antenna of this patent is a multi-layer structure, and it is difficult to control the plasma density at a local location.
Korean Patent Laid-Open Publication No. 10-2012-0040335 discloses a plasma processing apparatus having an inner antenna and an outer antenna. The outer antenna of this patent is composed of half-turn antennas superimposed on each other, and it is difficult to control the plasma density at a local position.
In order to increase the uniformity of the rotating direction (direction of the azimuth angle of the cylindrical coordinate system), the large area inductively coupled plasma uses a plurality of turns in a multi-layered structure. Nonetheless, such an inductively coupled plasma produces a locally non-uniform plasma due to the gas supply direction or the gas pumping direction of the exhaust. Therefore, an antenna structure for improving local plasma nonuniformity is required.
SUMMARY OF THE INVENTION It is an object of the present invention to provide an antenna structure for controlling local plasma nonuniformity in a large area plasma processing apparatus.
A plasma processing apparatus according to an embodiment of the present invention includes an inner antenna disposed on a dielectric top plate of a vacuum container and having a constant radius; A plurality of outer antennas electrically connected in parallel and disposed on the dielectric top plate of the vacuum container and disposed on an outer periphery of the inner antenna; A power distributor for distributing power to the inner antenna and the outer antennas, respectively; And an RF power source for providing power to the inner antenna and the outer antennas through the power divider. The power divider distributes power between the inner antenna and the outer antennas connected in parallel to each other. The outer antennas are disposed at regular intervals on a circumference having a predetermined radius on the central axis of the inner antenna. Each of the outer antennas has a multi-layered annular section shape.
In one embodiment of the present invention, each of the outer antennas comprises: an outer upper curved portion having a first radius of curvature; A first plug continuously connected to the outer upper curved portion and changing a placement plane to an upper face and a lower face; An inner lower curved portion continuously connected to the first plug and having a second radius of curvature smaller than the first radius of curvature; An outer lower curved portion continuously connected to the inner lower curved portion and having the first radius of curvature; A second plug continuously connected to the outer lower curved portion and changing a placement plane from an upper face to an upper face at a lower portion; And an inner upper curved portion continuously connected to the second plug and having the second radius of curvature.
In one embodiment of the present invention, the ends of the outer upper curved portion, the inner lower curved portion, the outer lower curved portion, and the inner upper curved portion may be bent radially to change the radius of curvature.
In one embodiment of the present invention, the antenna may further include an external antenna variable capacitor connected between the at least one external antenna and the ground. The outer antenna variable capacitors can uniformly control non-uniform plasma locally.
In one embodiment of the present invention, the apparatus may further include a current measuring unit for sensing a current flowing through the outer antenna to which the outer antenna variable capacitor is connected.
In one embodiment of the present invention, the annular section shape may include an arcuate portion and a straight portion. The power input terminal and the output terminal of the outer antenna may be disposed at the linear portion in the shape of the annular section.
In one embodiment of the present invention, one end includes a vertical support which vertically extends in a plane in which the outer antenna is disposed and the outer antenna is fixed; And a conductive fixing plate fixed and grounded at the other end of the vertical supporting portion. The conductive fixing plate includes a through hole at the center, and the power distributing portion is disposed to extend through the through hole, and can be radially branched.
In one embodiment of the present invention, the antenna may further include a permanent magnet disposed vertically spaced apart from the outer antenna. The permanent magnets are respectively disposed corresponding to the outer antenna, and the shape of the permanent magnet may be a shape of the outer antenna or the outer antenna.
In one embodiment of the present invention, the power divider may include an inner power divider for distributing power to the inner antenna and an outer power divider for distributing power to the outer antenna. The inner power distribution portion may include a cylindrical inner power distribution body portion and an inner power distribution branch portion that radially branches from the inner power distribution body portion. The outer power distribution portion may include a cylindrical outer power distribution body portion and an outer power distribution branch portion that radially branches from the outer power distribution body portion. The outer power distribution body may be coaxial to enclose the inner power distribution body.
In one embodiment of the present invention, the power divider includes: a power distribution variable capacitor connected in series with the inner antenna to control a current flowing in the inner antenna and the outer antenna; And a fixed inductor connected in series to the outer antennas connected in parallel.
In one embodiment of the present invention, the outer antennas may be disposed in quadrants, respectively.
In one embodiment of the present invention, the inner antenna may include a first inner antenna and a second inner antenna having the same structure. The first inner antenna and the second inner antenna may have the same shape and are arranged symmetrically with respect to each other to provide an overlapping multi-layer structure. The first inner antenna comprising: a first 45 degree top branch disposed at an upper surface of the antenna with a 45 degree arc; A first plug continuously connected to the first 45 degree upper branch and changing a placement plane from a top surface to a bottom surface; A 180 degree lower branch that is continuously connected to the first plug and has a 180 degree arc and is disposed on a lower surface of the antenna; A second plug continuously connected to the 180 degree lower branch and changing a placement plane from a lower face to a upper face; And a second 45 degree top branch connected to the second plug and disposed on the top surface of the antenna with the 45 degree arc.
In one embodiment of the invention, the inner antenna comprises an inner curved portion having a third radius of curvature and an outer curved portion having a fourth radius of curvature larger than the third radius of curvature to provide an outline of the annular section, Section. The inner antennas may include first through fourth inner antennas of the same shape. The first to fourth inner antennas may form a closed loop without overlapping each other.
According to an embodiment of the present invention, a local plasma density distribution can be controlled by disposing the outer antennas so that they are not overlapped spatially and connecting a variable capacitor to at least one outer antenna. Thus, a spatially uniform plasma density distribution can be provided.
1 is a conceptual diagram illustrating an inductively coupled plasma apparatus according to an embodiment of the present invention.
2 is a circuit diagram showing an electrical connection of the inductively coupled plasma apparatus of FIG.
3 is a perspective view illustrating the inductively coupled plasma apparatus of FIG.
4 is a perspective view illustrating the inductively coupled plasma apparatus of FIG.
5 is a cross-sectional view taken along line AA 'of FIG.
6 is a cross-sectional view taken along the line B-B 'in FIG.
7 is a circuit diagram illustrating a plasma processing apparatus according to another embodiment of the present invention.
8 is a conceptual diagram illustrating a plasma processing apparatus according to another embodiment of the present invention.
9 is a circuit diagram illustrating the plasma processing apparatus of Fig.
Conventional inductively coupled plasma is designed in a multi-layer structure in which a plurality of antennas connected in parallel are provided in order to provide plasma uniformity in azimuthal direction in a cylindrical coordinate system. However, the antenna of such a structure can not locally control the RF power, so that it is difficult to control the local plasma density.
The plasma apparatus according to an embodiment of the present invention may spatially separate a plurality of outer antennas from each other so as not to overlap with each other, and the RF power provided to one or a plurality of outer antennas of the outer antennas may be controlled. Thus, the plasma density distribution can be locally controlled. Thus, local plasma non-uniformity or process non-uniformity due to the pumping direction or gas flow direction of the exhaust portion and the like can be improved.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are being provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art. In the drawings, the components have been exaggerated for clarity. Like numbers refer to like elements throughout the specification.
1 is a conceptual diagram illustrating an inductively coupled plasma apparatus according to an embodiment of the present invention.
2 is a circuit diagram showing an electrical connection of the inductively coupled plasma apparatus of FIG.
3 is a perspective view illustrating the inductively coupled plasma apparatus of FIG.
4 is a perspective view illustrating the inductively coupled plasma apparatus of FIG.
5 is a cross-sectional view taken along line A-A 'in FIG.
6 is a cross-sectional view taken along the line B-B 'in FIG.
1 to 6, an inductively coupled
The
The
The pumping
The
The
The
Specifically, the input terminal of the
The
When the
The
The
The inner
Each of the
Each of the
The external
In the portion where the outer
The ends of the outer upper
The
As the radius of the
The power supply portion and the ground portion of the
The
The outer
In order to control the external
One end of the
The vertical supporting
The
The
The
The permanent
According to a modified embodiment of the present invention, the number of the outer antennas may be changed to three, five, six, or the like.
7 is a circuit diagram illustrating a plasma processing apparatus according to another embodiment of the present invention.
Referring to FIG. 7, the inductively coupled
The outer
8 is a conceptual diagram illustrating a plasma processing apparatus according to another embodiment of the present invention.
9 is a circuit diagram illustrating the plasma processing apparatus of Fig.
8 and 9, the inductively coupled
The
The
The
Specifically, the input terminal of the
The
The
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, And all of the various forms of embodiments that can be practiced without departing from the technical spirit.
110: inner antenna
120: outer antenna
140: Power distributor
184: Power supply
Claims (14)
A plurality of outer antennas electrically connected in parallel and disposed on the dielectric top plate of the vacuum container and disposed on an outer periphery of the inner antenna;
A power distributor for distributing power to the inner antenna and the outer antennas, respectively; And
And an RF power source for providing power to the inner antenna and the outer antennas through the power divider,
Wherein the power distributing unit distributes power between the inner antenna and the outer antennas connected in parallel to each other,
The outer antennas are arranged such that the outer antennas are not superimposed on the circumference of the constant radius on the central axis of the inner antenna at regular intervals Disposed,
Each of the outer antennas has a multi-layered annular section shape,
Each of the outer antennas comprises:
An outer upper curved portion having a first radius of curvature;
A first plug continuously connected to the outer upper curved portion and changing a placement plane to an upper face and a lower face;
An inner lower curved portion continuously connected to the first plug and having a second radius of curvature smaller than the first radius of curvature;
An outer lower curved portion continuously connected to the inner lower curved portion and having the first radius of curvature;
A second plug continuously connected to the outer lower curved portion and changing a placement plane from an upper face to an upper face at a lower portion; And
And an inner upper curved portion continuously connected to the second plug and having the second radius of curvature,
Further comprising an outer antenna variable capacitor connected between at least one of the outer antenna and ground,
The outer antenna variable capacitor uniformly controls a locally non-uniform plasma,
Further comprising a current measuring unit for sensing a current flowing through the outer antenna connected to the outer antenna variable capacitor,
The ends of the outer upper curved portion, the inner lower curved portion, the outer lower curved portion, and the inner upper curved portion are bent radially to change the radius of curvature,
Wherein the annular section shape includes an arcuate portion and a straight portion,
A power input end and an output end of the outer antenna are disposed in the linear portion in the shape of an annular section,
A vertical support having one end fixed to the outer antenna and extending vertically in a plane in which the outer antenna is disposed; And
And a conductive fixing plate fixed to the other end of the vertical supporting portion and grounded,
Wherein the conductive fixing plate includes a through hole at the center thereof,
Wherein the power distributing portion is disposed to extend through the through hole, is radially branched,
Wherein the power distributor comprises:
A power distribution variable capacitor connected in series with the inner antenna to control a current flowing through the inner antenna and the outer antenna; And
Further comprising a fixed inductor connected in series to the outer antennas connected in parallel,
The outer antennas are respectively disposed in quadrants,
Wherein the power divider includes an inner power divider for distributing power to the inner antenna and an outer power divider for distributing power to the outer antenna,
Wherein the inner power distribution portion includes a cylindrical inner power distribution body portion and an inner power distribution branch portion that radially branches from the inner power distribution body portion,
Wherein the outer power distribution portion includes a cylindrical outer power distribution body portion and an outer power distribution branch portion that radially branches from the outer power distribution body portion,
Wherein the outer power distribution body is coaxial to wrap the inner power distribution body.
Further comprising a permanent magnet disposed vertically spaced apart from the outer antenna,
The permanent magnets are respectively disposed corresponding to the outer antenna,
Wherein the shape of the permanent magnet is a shape of the outer antenna or the outer antenna.
Wherein the power distributor comprises:
A power distribution variable capacitor connected in series with the inner antenna to control a current flowing through the inner antenna and the outer antenna; And
Further comprising a fixed inductor connected in series to the outer antennas connected in parallel.
The inner antenna includes a first inner antenna and a second inner antenna having the same structure,
Wherein the first inner antenna and the second inner antenna are of the same shape and arranged symmetrically with respect to each other to provide a superposed multilayer structure,
Wherein the first inner antenna comprises:
A first 45 degree upper branch disposed at an upper surface of the antenna with a 45 degree arc;
A first plug continuously connected to the first 45 degree upper branch and changing a placement plane from a top surface to a bottom surface;
A 180 degree lower branch that is continuously connected to the first plug and has a 180 degree arc and is disposed on a lower surface of the antenna;
A second plug continuously connected to the 180 degree lower branch and changing a placement plane from a lower face to a upper face; And
And a second 45 degree upper branch connected to the second plug and disposed on the upper surface of the antenna with the 45 degree arc.
The inner antenna comprising an inner curved portion having a third radius of curvature and an outer curved portion having a fourth radius of curvature larger than the third radius of curvature to provide an outline of an annular section,
Wherein the inner antennas include first to fourth inner antennas of the same shape,
Wherein the first to fourth inner antennas form a closed loop without overlapping each other.
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KR1020150110137A KR101714406B1 (en) | 2015-08-04 | 2015-08-04 | Plasma Processing Apparatus |
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KR1020150110137A KR101714406B1 (en) | 2015-08-04 | 2015-08-04 | Plasma Processing Apparatus |
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KR1020160147559A Division KR102175238B1 (en) | 2016-11-07 | 2016-11-07 | Plasma Processing Apparatus |
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KR101714406B1 true KR101714406B1 (en) | 2017-03-23 |
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KR101979597B1 (en) * | 2017-09-21 | 2019-05-20 | 세메스 주식회사 | Apparatus and method for treating substrate |
WO2021242506A1 (en) * | 2020-05-27 | 2021-12-02 | Lam Research Corporation | Distributed plasma source array |
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JP2004531856A (en) * | 2001-04-13 | 2004-10-14 | アプライド マテリアルズ インコーポレイテッド | Inductively coupled plasma source with controllable power distribution |
KR100532365B1 (en) * | 2003-04-10 | 2005-11-30 | 주식회사 아이피에스 | Inductively-coupled plasma source producing uniform plasma by using multi-coils |
CN103959920B (en) * | 2011-09-16 | 2016-12-07 | 细美事有限公司 | Antenna structure and plasma generating equipment |
KR101265237B1 (en) * | 2011-10-21 | 2013-05-16 | 주성엔지니어링(주) | Plasma processing apparatus |
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