KR20160100943A - Thermosetting resin composition, method for manufacturing reflective member for optical semiconductor device using same, and optical semiconductor device - Google Patents
Thermosetting resin composition, method for manufacturing reflective member for optical semiconductor device using same, and optical semiconductor device Download PDFInfo
- Publication number
- KR20160100943A KR20160100943A KR1020167015189A KR20167015189A KR20160100943A KR 20160100943 A KR20160100943 A KR 20160100943A KR 1020167015189 A KR1020167015189 A KR 1020167015189A KR 20167015189 A KR20167015189 A KR 20167015189A KR 20160100943 A KR20160100943 A KR 20160100943A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- thermosetting resin
- carboxylic acid
- terminal carboxylic
- optical semiconductor
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 60
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 51
- 230000003287 optical effect Effects 0.000 title claims abstract description 28
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title abstract description 15
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims abstract description 55
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 33
- 239000003822 epoxy resin Substances 0.000 claims abstract description 28
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 28
- 239000012463 white pigment Substances 0.000 claims abstract description 15
- 229920002601 oligoester Polymers 0.000 claims description 36
- 125000004432 carbon atom Chemical group C* 0.000 claims description 30
- -1 saturated aliphatic cyclic acid anhydride Chemical class 0.000 claims description 25
- 150000005846 sugar alcohols Polymers 0.000 claims description 18
- 150000008065 acid anhydrides Chemical class 0.000 claims description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 claims description 7
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 238000001721 transfer moulding Methods 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- WTNDADANUZETTI-UHFFFAOYSA-N cyclohexane-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C(C(O)=O)C1 WTNDADANUZETTI-UHFFFAOYSA-N 0.000 claims description 2
- 238000001579 optical reflectometry Methods 0.000 abstract description 10
- 238000012545 processing Methods 0.000 abstract description 9
- 238000002845 discoloration Methods 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 description 24
- 238000004132 cross linking Methods 0.000 description 20
- 239000000203 mixture Substances 0.000 description 19
- 125000000217 alkyl group Chemical group 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 12
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- 238000002156 mixing Methods 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 238000000465 moulding Methods 0.000 description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000004898 kneading Methods 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 8
- 150000001924 cycloalkanes Chemical group 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229920001542 oligosaccharide Polymers 0.000 description 5
- 150000002482 oligosaccharides Chemical class 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 3
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004954 Polyphthalamide Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 3
- 229920006375 polyphtalamide Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- OJRJDENLRJHEJO-UHFFFAOYSA-N 2,4-diethylpentane-1,5-diol Chemical compound CCC(CO)CC(CC)CO OJRJDENLRJHEJO-UHFFFAOYSA-N 0.000 description 2
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 2
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- QYFACSDTKGXDDM-UHFFFAOYSA-N OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 Chemical compound OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 QYFACSDTKGXDDM-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 150000001934 cyclohexanes Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- WJLUBOLDZCQZEV-UHFFFAOYSA-M hexadecyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[N+](C)(C)C WJLUBOLDZCQZEV-UHFFFAOYSA-M 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- VEPOHXYIFQMVHW-PVJVQHJQSA-N (2r,3r)-2,3-dihydroxybutanedioic acid;(2s,3s)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O.O1CCN(C)[C@@H](C)[C@@H]1C1=CC=CC=C1 VEPOHXYIFQMVHW-PVJVQHJQSA-N 0.000 description 1
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- MWIQWRCANQOMBX-UHFFFAOYSA-N 2,2-diethylpentanedioic acid Chemical compound CCC(CC)(C(O)=O)CCC(O)=O MWIQWRCANQOMBX-UHFFFAOYSA-N 0.000 description 1
- BTUDGPVTCYNYLK-UHFFFAOYSA-N 2,2-dimethylglutaric acid Chemical compound OC(=O)C(C)(C)CCC(O)=O BTUDGPVTCYNYLK-UHFFFAOYSA-N 0.000 description 1
- IXWOUPGDGMCKGT-UHFFFAOYSA-N 2,3-dihydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1O IXWOUPGDGMCKGT-UHFFFAOYSA-N 0.000 description 1
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- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
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- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- MRYQZMHVZZSQRT-UHFFFAOYSA-M tetramethylazanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)C MRYQZMHVZZSQRT-UHFFFAOYSA-M 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- OLNCQUXQEJCISO-UHFFFAOYSA-M trimethyl(propyl)azanium;hydroxide Chemical compound [OH-].CCC[N+](C)(C)C OLNCQUXQEJCISO-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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Abstract
제조시 및 가공시의 경화제 성분의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 경화물을 부여하는 열경화성 수지 조성물, 이것을 사용한 광반도체 장치용 반사부재의 제조 방법, 및 그 반사부재를 갖는 광반도체 장치를 제공한다. 열경화성 수지 조성물은 에폭시 수지, 경화제, 및 백색 안료로 이루어지는 열경화성 수지 조성물로서, 상기 경화제는 연화점이 50℃이상인 말단 카르복실산의 올리고에스테르이다.A thermosetting resin composition which suppresses the volatilization of the curing agent component during production and processing and suppresses discoloration due to heat and gives a cured product excellent in light reflectivity and reliability in a high temperature environment; And an optical semiconductor device having the reflective member. The thermosetting resin composition is a thermosetting resin composition comprising an epoxy resin, a curing agent, and a white pigment. The curing agent is an oligomer of a terminal carboxylic acid having a softening point of 50 ° C or higher.
Description
본 발명은 제조시 및 가공시의 경화제의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 경화물을 부여하는 열경화성 수지 조성물, 이것을 사용한 광반도체 장치용 반사부재의 제조 방법, 및 그 반사부재를 갖는 광반도체 장치에 관한 것이다.The present invention relates to a thermosetting resin composition which suppresses volatilization of a curing agent during production and processing, suppresses discoloration due to heat, gives a cured product excellent in light reflectivity and reliability under a high temperature environment, and a reflective member A manufacturing method thereof, and a photosemiconductor device having the reflection member.
LED(Light Emitting Didode, 발광 다이오드) 등의 광반도체 소자는 저소비전력, 장수명, 소형이라는 특징을 갖는 점에서 수많은 전자기기에 이용되고 있다. 종래는 휘도가 작은 전자기기 용도로 사용되고 있었지만, 최근에서는 기술의 향상에 따라 자동차용 해드램프나 조명 용도 등 높은 휘도가 요구되는 분야에서 사용되도록 되어 왔고, 그것에 따라 광반도체를 구성하는 반사부재에도 UV내성, 내열성이 요구되어져 왔다.BACKGROUND ART Optical semiconductor devices such as LEDs (Light Emitting Didodes, light emitting diodes) are used in many electronic devices because of their low power consumption, long life, and small size. In recent years, according to the improvement of technology, it has been used in fields requiring high brightness such as head lamps for automobiles and lighting applications, and accordingly, a reflective member constituting the optical semiconductor is also provided with a UV Resistance and heat resistance.
광반도체를 구성하는 반사부재의 재료로서 현재 폴리프탈아미드(PPA) 수지가 널리 사용되고 있다.BACKGROUND ART Polyphthalamide (PPA) resin is widely used as a material of a reflective member constituting an optical semiconductor.
그러나, 최근, 광반도체 장치의 고출력화에 의해, 정션 온도의 상승, 광강도의 증대, 또는 광의 단파장화가 진행되고, PPA수지를 사용한 반사부재에서는 열화가 심하고, 색의 불균일이나 박리, 기계적 강도의 저하 등이 일어나는 것이 문제가 되고 있다. 또한 땜납 접합시에 고온하에서 변색되어 반사부재로서 높은 반사율을 유지할 수 없는 것도 문제가 되고 있다. 이들 문제를 해결하기 위해서, 내광성 및 내열성이 우수한 열경화성 광반사용 수지 조성물의 개발이 요구되고 있다.In recent years, however, with the increase in the output of optical semiconductor devices, the junction temperature has increased, the light intensity has increased, or the light has been shortened in wavelength, and the reflection member using PPA resin has been severely deteriorated, There is a problem that a decrease or the like occurs. In addition, when the solder is bonded, it is discolored at a high temperature, and a high reflectance can not be maintained as a reflective member. In order to solve these problems, development of a thermosetting light-emitting resin composition excellent in light resistance and heat resistance has been demanded.
특허문헌 1에 내광성 및 내열성이 양호한 열경화성 광반사용 수지 조성물로서 에폭시 수지, 경화제 및 경화 촉진제를 구성 성분으로 하는 B스테이지형상의 열경화성 광반사용 수지 조성물이 개시되어 있다. 이 열경화성 광반사용 수지 조성물의 성형 방법으로서는 믹서에 의해 충분히 혼련한 후, 믹싱 롤, 압출기, 니더, 롤, 익스트루더 등에 의해 소정 조건으로 용융 혼련하고, 냉각, 분쇄를 행함으로써 열경화성 광반사용 수지 조성물을 조제하고, 이 조성물을 트랜스퍼 성형에 의해, 금형온도 170∼190℃, 성형압력 2∼8㎫, 성형시간 60∼120초의 조건으로 성형한 후, 금형을 떼고, 120∼180℃에서 1∼3시간의 애프터 큐어를 행한다고 기재되어 있다.Patent Document 1 discloses a B-stage thermosetting light-sensitive resin composition containing an epoxy resin, a curing agent and a curing accelerator as thermosetting light-curing resin compositions having good light resistance and heat resistance. As the molding method of the thermosetting light-sensitive resin composition, after kneading sufficiently by a mixer, the mixture is melt-kneaded under a predetermined condition by a mixing roll, an extruder, a kneader, a roll, an extruder, And this composition is molded by transfer molding under the conditions of a mold temperature of 170 to 190 DEG C, a molding pressure of 2 to 8 MPa, and a molding time of 60 to 120 seconds. Thereafter, the mold is removed, It is described that the after-cure of the time is performed.
이 경우, 경화제로서는 헥사히드로 무수 프탈산이 사용되고 있고, 그 밖에, 무수 프탈산, 무수 말레산, 무수 트리멜리트산, 무수 피로멜리트산, 테트라히드로 무수 프탈산, 무수 메틸나딕산, 무수 나딕산, 무수 글루타르산, 무수 디메틸글루타르산, 무수 디에틸글루타르산, 무수 숙신산, 메틸헥사히드로 무수 프탈산, 메틸테트라히드로 무수 프탈산 등의 산무수물을 사용할 수 있다고 기재되어 있지만, 본 발명자들의 검토에 의하면, 이 B스테이지형상 반도체 밀봉용 에폭시 수지 조성물은 용융 혼련에 의한 제조시 또는 트랜스퍼 성형에 의한 가공시에 온도가 가해짐으로써 산무수물계 경화제가 휘발되는 문제가 있다.In this case, as the hardening agent, hexahydrophthalic anhydride is used, and in addition, phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, tetrahydrophthalic anhydride, methylnadic anhydride, anhydrous nadic acid, It is described that acid anhydrides such as acid, anhydrous dimethylglutaric acid, anhydrous diethylglutaric acid, succinic anhydride, methylhexahydrophthalic anhydride, and methyltetrahydrophthalic anhydride can be used. The epoxy resin composition for stage-shaped semiconductor encapsulation has a problem that the acid anhydride-based curing agent is volatilized when the temperature is applied during production by melt-kneading or during processing by transfer molding.
또, 본 발명에 관련된 공지문헌으로서는 하기 특허문헌 1∼7을 들 수 있다.As well-known documents related to the present invention, there are the following Patent Documents 1 to 7.
본 발명은 상기 사정을 감안하여 이루어진 것으로, 제조시 및 가공시의 경화제의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 열경화성 수지 조성물, 이것을 사용한 광반도체 장치용 반사부재의 제조 방법, 및 그 반사부재를 갖는 광반도체 장치를 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a thermosetting resin composition which suppresses the volatilization of the curing agent during production and processing, suppresses discoloration due to heat and is excellent in light reflectivity and reliability under a high temperature environment, A method of manufacturing a reflective member, and an optical semiconductor device having the reflective member.
즉 본원 발명은 하기 (1)∼(10)에 관한 것이다.That is, the present invention relates to the following (1) to (10).
(1)에폭시 수지(A), 경화제(B), 및 백색 안료(C)로 이루어지는 열경화성 수지 조성물로서, 상기 경화제는 연화점이 50℃이상인 말단 카르복실산의 올리고에스테르인 열경화성 수지 조성물,(1) A thermosetting resin composition comprising an epoxy resin (A), a curing agent (B) and a white pigment (C), wherein the curing agent is an oligosester of a terminal carboxylic acid having a softening point of 50 ° C or higher,
(2)상기 말단 카르복실산의 올리고에스테르가 적어도 2개이상의 카르복실기를 갖고, 지방족 탄화수소기를 주골격으로 하는 열경화성 수지 조성물,(2) a thermosetting resin composition in which the oligomer of the terminal carboxylic acid has at least two or more carboxyl groups and has an aliphatic hydrocarbon group as a main skeleton,
(3)상기 백색 안료(C)가 2산화티타늄 분말인 (1) 또는 (2)에 기재된 열경화성 수지 조성물,(3) The thermosetting resin composition according to (1) or (2), wherein the white pigment (C) is a titanium dioxide powder,
(4)상기 열경화성 수지 조성물에 있어서, 열경화후의 파장 460∼800nm에 있어서의 광반사율이 80%이상인 (1)∼(3) 중 어느 한 항에 기재된 열경화성 수지 조성물,(4) The thermosetting resin composition according to any one of (1) to (3), wherein the thermosetting resin composition has a light reflectance of 80% or more at a wavelength of 460 to 800 nm after thermosetting,
(5)상기 백색 안료의 함유량이 열경화성 수지 조성물 전체에 대하여 5∼95중량%인 (1)∼(4) 중 어느 한 항에 기재된 열경화성 수지 조성물,(5) The thermosetting resin composition according to any one of (1) to (4), wherein the content of the white pigment is 5 to 95% by weight based on the total amount of the thermosetting resin composition,
(6) (1)에 기재된 말단 카르복실산의 올리고에스테르 말단 카르복실산의 올리고에스테르가 탄소수 6이상의 2∼6관능의 다가 알콜과 포화 지방족 환상 산무수물의 반응에 의해 얻어진 화합물인 전항 (1)∼(5) 중 어느 한 항에 기재된 열경화성 수지 조성물,(6) The oligoester of the terminal carboxylic acid as set forth in (1) above, wherein the oligoester of the terminal carboxylic acid is a compound obtained by the reaction of a polyhydric alcohol having 2 to 6 carbon atoms with a carbon number of 6 or more and a saturated aliphatic cyclic acid anhydride, To (5), a thermosetting resin composition according to any one of
(7)상기 포화 지방족 환상 산무수물이 헥사히드로 무수 프탈산, 메틸헥사히드로 무수 프탈산, 및 시클로헥산-1,2,4-트리카르복실산-1,2-무수물로 이루어지는 군에서 선택되는 적어도 1종의 산무수물의 반응에 의해 얻어진 화합물인 전항 (1)∼(6) 중 어느 한 항에 기재된 열경화성 수지 조성물,(7) The saturated aliphatic cyclic acid anhydride is at least one selected from the group consisting of hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and cyclohexane-1,2,4-tricarboxylic acid-1,2- A thermosetting resin composition according to any one of (1) to (6) above, which is a compound obtained by the reaction of an acid anhydride of
(8)광반도체 장치를 구성하는 광반사부재 형성용인 (1)∼(7) 중 어느 한 항에 기재된 열경화성 수지 조성물,(8) The thermosetting resin composition according to any one of (1) to (7), which is used for forming the light reflection member constituting the optical semiconductor device,
(9) (1)∼(8) 중 어느 한 항에 기재된 열경화성 수지 조성물을 경화시켜서 이루어지는 광반도체 장치용 반사부재이며, 광반도체 장치용 반사부재의 적어도 일부를 (1)∼(8) 중 어느 한 항에 기재된 광반사용 열경화성 수지 조성물을 트랜스퍼 성형에 의해 형성하는 광반도체 장치용 반사부재의 제조 방법.(9) A reflective member for an optical semiconductor device obtained by curing the thermosetting resin composition according to any one of (1) to (8), wherein at least a part of the reflective member for the optical semiconductor device is any one of (1) A method for manufacturing a reflective member for an optical semiconductor device, comprising: forming a light-reflecting resin composition according to claim 1 by transfer molding;
(10) (1)∼(8) 중 어느 한 항에 기재된 열경화성 수지 조성물을 경화시켜서 이루어지는 광반사부재와, 광반도체 소자를 갖는 광반도체 장치,(10) A light reflection member obtained by curing the thermosetting resin composition according to any one of (1) to (8), an optical semiconductor device having an optical semiconductor element,
에 관한 것이다..
(발명의 효과)(Effects of the Invention)
에폭시 수지(A), 특정 경화제(B), 및 백색 안료(C)를 함유하는 본 발명의 열경화성 수지 조성물은 제조시 및 가공시의 경화제의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 열경화성 수지 조성물로서 매우 유용하다.The thermosetting resin composition of the present invention containing the epoxy resin (A), the specific curing agent (B) and the white pigment (C) suppresses the volatilization of the curing agent during production and processing, suppresses discoloration due to heat, And is highly useful as a thermosetting resin composition excellent in reliability under a high temperature environment.
본 발명은 에폭시 수지(A), 경화제(B), 및 백색 안료(C)를 함유하는 것을 특징으로 한다.The present invention is characterized by containing an epoxy resin (A), a curing agent (B), and a white pigment (C).
본 발명에 있어서의 에폭시 수지(A)는 종래의 열경화성 광반사용 수지 조성물이나 에폭시 수지 성형재료로서 통상 배합되어 있는 것이면, 특별히 제한되지 않고 사용할 수 있다. 예를 들면 페놀노볼락형 에폭시 수지, 오르소크레졸노볼락형 에폭시 수지를 비롯한 페놀류와 알데히드류의 노볼락 수지를 에폭시화한 것, 비스페놀A, 비스페놀F, 비스페놀S, 알킬 치환 비스페놀 등의 디글리시딜에테르, 디아미노디페닐메탄, 이소시아누르산 등의 폴리아민과 에피클로로히드린의 반응에 의해 얻어지는 글리시딜아민형 에폭시 수지, 올레핀 결합을 과아세트산 등의 과산으로 산화해서 얻어지는 지환족 에폭시 수지, 실세스퀴옥산 화합물 등을 들 수 있고, 이들은 단독으로도 2종이상 병용해도 좋다. 이들 에폭시 수지 중, 착색이 적은 것이 바람직한 점에서 구체적으로는 비스페놀A형 에폭시 수지, 비스페놀F형 에폭시 수지, 비스페놀S형 에폭시 수지, 디글리시딜이소시아누레이트, 트리글리시딜이소시아누레이트, 실세스퀴옥산 화합물을 들 수 있다. The epoxy resin (A) in the present invention is not particularly limited and can be used as long as it is usually blended as a conventional thermosetting light-sensitive resin composition or an epoxy resin molding material. For example, phenol novolak type epoxy resins, orthocresol novolak type epoxy resins, epoxidized novolak resins of aldehydes, and diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, and alkyl-substituted bisphenols Glycidylamine type epoxy resins obtained by the reaction of epichlorohydrin with polyamines such as cidyl ether, diaminodiphenylmethane and isocyanuric acid, alicyclic epoxy resins obtained by oxidizing olefinic bonds with peracid such as peracetic acid, Resins, silsesquioxane compounds and the like, and these may be used alone or in combination of two or more. Specific examples of these epoxy resins include epoxy resins, such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, diglycidyl isocyanurate, triglycidyl isocyanurate, Silsesquioxane compounds.
여기에서, 본 발명에 있어서의 에폭시 수지로서는 투명성, 내변색성이 우수하다는 점에서 지환식 에폭시 수지, 트리글리시딜이소시아누레이트 골격을 갖는 에폭시 수지를 단독 또는 병용해서 사용하는 것이 바람직하다.Here, as the epoxy resin in the present invention, an epoxy resin having an alicyclic epoxy resin and triglycidylisocyanurate skeleton is preferably used alone or in combination, from the standpoint of excellent transparency and discoloration resistance.
또한, 트리글리시딜이소시아누레이트 골격을 갖는 에폭시 수지로서는 예를 들면 하기 식(A)Examples of the epoxy resin having a triglycidylisocyanurate skeleton include the following formula (A)
(식 중, 복수 존재하는 R4는 각각 독립적으로 직접 결합, 산소원자 또는 에스테르 결합을 가져도 좋은 탄소수 1∼6의 알킬기, 하기 식(B)(Wherein the plurality of R 4 s present each independently represent an alkyl group having 1 to 6 carbon atoms which may have a direct bond, an oxygen atom or an ester bond,
(R5는 직접 결합, 산소원자 또는 에스테르 결합을 가져도 좋은 탄소수 1∼6의 알킬렌기를 나타낸다.)를 나타낸다. 또한, R4에 있어서 적어도 1개는 식(B)를 나타낸다.)의 구조를 갖는 에폭시 수지를 적합하게 사용할 수 있다. 구체적으로는 TEPIC-S(닛산 가가쿠 고교사제) 등을 들 수 있다.(R 5 represents an alkylene group having 1 to 6 carbon atoms which may have a direct bond, an oxygen atom or an ester bond). And at least one of R < 4 > represents the formula (B)). Specific examples thereof include TEPIC-S (manufactured by Nissan Kagaku Kogyo Co., Ltd.) and the like.
또한 바람직한 지환식 에폭시 수지로서는 예를 들면 SEJ-01R(닛뽄 가야쿠제), 셀록사이드 2021(가부시키가이샤 다이셀사제), EHPE3150(가부시키가이샤 다이셀사제) 등을 들 수 있다. 화합물명으로서는 에폭시시클로헥실 골격을 갖는 것이면 특별히 한정되지 않지만, 2관능의 예로서는 2개의 에폭시시클로헥실 골격이 산소원자 또는 에스테르 결합을 가져도 좋은 탄소수 1∼10의 알킬렌기로 결합되어 있는 에폭시 수지를 들 수 있고, 단관능의 예로서는 에폭시시클로헥실 골격에 치환기로서 산소원자를 가져도 좋은 탄소수 1∼10의 알킬기 또는 수산기를 갖는 에폭시 수지를 들 수 있다. 구체적인 바람직한 것의 예로서는 3',4'-에폭시시클로헥실메틸, 3,4-에폭시시클로헥산카르복실레이트, 2,2-비스(히드록시메틸)-1-부탄올의 1,2-에폭시-4-(2-옥시라닐)시클로헥산 부가물 등을 들 수 있다.Examples of preferred alicyclic epoxy resins include SEJ-01R (manufactured by Nippon Kayaku), Celloxide 2021 (manufactured by Daicel Chemical Industries Ltd.) and EHPE 3150 (manufactured by Daicel Chemical Industries, Ltd.). The compound is not particularly limited as long as it has an epoxycyclohexyl skeleton. Examples of the bifunctional functional group include an epoxy resin having two epoxycyclohexyl skeletons bonded with an oxygen atom or an alkylene group having 1 to 10 carbon atoms, which may have an ester bond. Examples of the monofunctional epoxy resin include an epoxy resin having an alkyl group having 1 to 10 carbon atoms or a hydroxyl group, which may have an oxygen atom as a substituent on the epoxycyclohexyl skeleton. Specific examples of preferable examples include 1,2-epoxy-4- ((2-hydroxypropyl) -1-butenyl) -1,3-cyclohexanecarboxylate of 3 ', 4'-epoxycyclohexylmethyl, 3,4-epoxycyclohexanecarboxylate and 2,2- 2-oxiranyl) cyclohexane adduct and the like.
본 발명에 있어서의 경화제는 연화점이 50℃이상인 말단 카르복실산의 올리고에스테르이다.The curing agent in the present invention is an oligomer of a terminal carboxylic acid having a softening point of 50 DEG C or higher.
구체적인 구조식으로서는 하기 식(1)Specific structural formulas include the following formula (1)
(식 중, 복수 존재하는 P는 함유량이 0∼6인 산소원자, 질소원자, 인원자의 헤테로원자를 포함해도 좋고, 탄소수 2∼20의 다가 알콜의 잔기를, R은 탄소수 2∼20의 지방족 탄화수소기를 나타낸다. 복수 존재하는 n, k는 독립적으로 존재하고, 평균 1∼6을 나타낸다. 또 n의 총계는 2이상 12미만이다.)의 구조를 갖고, 분자내에 에스테르 구조(바람직하게는 2개의 에스테르 구조)를 갖는 화합물이다. 또 말단에 복수의 카르복실기를 갖는 화합물이다.(Wherein the plurality of P's may contain an oxygen atom, a nitrogen atom, a hetero atom of a phosphorus atom having a content of 0 to 6, a residue of a polyhydric alcohol having 2 to 20 carbon atoms, and R denotes an aliphatic hydrocarbon having 2 to 20 carbon atoms N and k are independently present and represent an average of 1 to 6, and the total number of n is 2 or more and less than 12), and has an ester structure (preferably two esters Structure). And a plurality of carboxyl groups at the terminals.
그 중에서도, 상기 식(1)의 말단 카르복실산의 올리고에스테르가 탄소수 6이상의 2∼6관능의 다가 알콜과 포화 지방족 환상 산무수물의 에스테르화 반응에 의해 얻어진 화합물인 것이 바람직하다.Among them, it is preferable that the oligoester of the terminal carboxylic acid of the above formula (1) is a compound obtained by the esterification reaction of a polyhydric alcohol having 2 to 6 carbon atoms with a carbon number of 6 or more and a saturated aliphatic cyclic acid anhydride.
보다 구체적으로는 상기 식(1)에 기재된 말단 카르복실산의 올리고에스테르에 있어서, 연결기 R은 탄소수 4∼10의 시클로알칸 골격, 또는 노르보르난 골격이 바람직하고, 시클로알칸 골격에 있어서는 치환, 또는 무치환의 시클로헥산 구조, 특히 메틸기를 구비하는 메틸시클로헥산 구조가 그 경화물에 있어서의 광학특성으로부터 바람직하다. 또 노르보르난 골격으로서는 노르보르난, 메틸노르보르난 구조가 바람직하다. More specifically, in the oligosaccharide of the terminal carboxylic acid described in the above formula (1), the linking group R is preferably a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton, and in the cycloalkane skeleton, An unsubstituted cyclohexane structure, particularly a methylcyclohexane structure having a methyl group is preferable from the optical properties of the cured product. The norbornane skeleton is preferably a norbornane or methylnorbornane structure.
연결기 P는 탄소수 2∼10의 다가 알콜의 잔기(반응에 사용한 다가 알콜로부터 수산기를 제외한 잔기)이지만, 분기쇄상의 가교기, 또는 시클로알킬기가 바람직하고, 특히 P는 하기 (a) 또는 (b)로 정의되는 2가의 가교기인 것이 바람직하다.The linking group P is preferably a residue of a polyhydric alcohol having 2 to 10 carbon atoms (a residue excluding a hydroxyl group from a polyhydric alcohol used in the reaction), but a branched chain crosslinking group or a cycloalkyl group is preferable, Is preferably a divalent crosslinking group defined by the following formula
(a)탄소수 6∼20의 분기 구조를 갖는 쇄상 알킬쇄이며, 상기 쇄상 알킬쇄가 탄소수 3∼12의 직쇄의 주쇄와, 2∼4개의 측쇄를 갖고, 또한 그 측쇄 중 적어도 1개가 탄소수 2∼10인 가교기,(a) a straight chain alkyl chain having 6 to 20 carbon atoms, said straight chain alkyl chain having 3 to 12 carbon atoms and a straight chain main chain having 2 to 4 side chains, 10 bridges,
또는,or,
(b)시클로환 상에 메틸기를 가져도 좋은, 트리시클로데칸디메탄올 또는 펜타시클로펜타데칸디메탄올로부터 선택되는 적어도 1종의 가교 다환 디올로부터 2개의 수산기를 제거한 2가의 가교기, 단, P가 (b)인 경우, 바람직한 것은 연결기 R이 탄소수 4∼10의 시클로알칸 골격 또는 노르보르난 골격일 때에는 후술하는 식(2)에 있어서 치환기 R3이 수소원자 이외의 기를 나타낸다.(b) a divalent crosslinking group obtained by removing two hydroxyl groups from at least one crosslinked polycyclic diol selected from tricyclodecane dimethanol or pentacyclopentadecane dimethanol, which may have a methyl group on the cyclo ring, provided that P is (b), it is preferable that the substituent R 3 in the formula (2) to be described later represents a group other than a hydrogen atom when the linking group R is a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton.
또한, 상기 올리고에스테르의 연화점은 통상 50℃이상이지만, 60℃이상이 바람직하고, 80℃이상이 보다 바람직하다. 상한값에 특별히 제한은 없지만 통상 500℃이하이며, 300℃이하인 것이 바람직하고, 200℃이하인 것이 보다 바람직하다.The softening point of the oligoester is usually 50 DEG C or higher, but is preferably 60 DEG C or higher, more preferably 80 DEG C or higher. The upper limit is not particularly limited, but is usually 500 ° C or lower, preferably 300 ° C or lower, and more preferably 200 ° C or lower.
본 발명에 있어서의 상기 특히 바람직한 말단 카르복실산의 올리고에스테르는 탄소수 6이상의 2∼6관능의 다가 알콜과 포화 지방족 환상 산무수물을 부가반응 시킴으로써 얻을 수 있다.The above-mentioned particularly preferred oligoester of a terminal carboxylic acid in the present invention can be obtained by addition reaction between a polyhydric alcohol having 6 to 6 carbon atoms and a saturated aliphatic cyclic acid anhydride.
본 발명에 있어서의 말단 카르복실산의 올리고에스테르는 2종의 다가 카르복실산을 포함하는 조성물이어도 좋다. 말단 카르복실산의 올리고에스테르를 적어도 2종 포함하는 말단 카르복실산의 올리고에스테르 조성물을 얻는 방법으로서는 상기 방법으로 얻어진 단일의 말단 카르복실산의 올리고에스테르를 적어도 2종을 혼합하는 방법, 또는 상기 말단 카르복실산의 올리고에스테르를 합성할 때에, 상기 헥사히드로 무수 프탈산으로서 적어도 2종의 혼합물을 사용하거나, 상기 다가 알콜을 2종 사용해서 부가반응을 행하는 방법이 있다.The oligoester of the terminal carboxylic acid in the present invention may be a composition comprising two polyvalent carboxylic acids. As a method for obtaining an oligoester composition of a terminal carboxylic acid containing at least two oligoester of a terminal carboxylic acid, a method of mixing at least two oligoesters of a single terminal carboxylic acid obtained by the above method, In synthesizing an oligoester of a carboxylic acid, there is a method of using at least two kinds of mixtures as the hexahydrophthalic anhydride, or carrying out an addition reaction using two kinds of the polyhydric alcohols.
말단 카르복실산의 올리고에스테르의 합성에 사용하는 포화 지방족 환상 산무수물로서는 시클로헥산 구조를 갖고, 상기 시클로헥산환 상에 메틸기 치환 또는 카르복실기 치환을 갖거나, 또는 무치환이며, 시클로헥산환에 결합한 산무수물기를 분자내에 1개이상(바람직하게는 1개) 갖는 화합물을 들 수 있다.As the saturated aliphatic cyclic acid anhydride used in the synthesis of the oligoester of the terminal carboxylic acid, there may be mentioned an acid having a cyclohexane structure and having a methyl group substitution or a carboxyl group substitution on the cyclohexane ring or an unsubstituted cyclohexane ring, And a compound having at least one (preferably one) anhydride group in the molecule.
구체적으로는 헥사히드로 무수 프탈산, 메틸헥사히드로 무수 프탈산, 및 시클로헥산-1,2,4-트리카르복실산-1,2-무수물로 이루어지는 군에서 선택되는 적어도 1종의 산무수물을 들 수 있다.Specifically, there can be mentioned at least one acid anhydride selected from the group consisting of hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride .
본 발명에 있어서의 말단 카르복실산의 올리고에스테르의 합성에 사용하는 탄소수 6이상의 2∼6관능의 다가 알콜로서는 구체적으로는 상기 식(1) 중의 가교기 P의 말단에 수산기를 붙인 말단 카르복실산의 올리고에스테르를 들 수 있다.Specific examples of the polyhydric alcohols having 2 to 6 carbon atoms and having 6 or more carbon atoms used in the synthesis of the oligoester of the terminal carboxylic acid in the present invention include a terminal carboxylic acid having a hydroxyl group at the terminal of the crosslinking group P in the formula (1) ≪ / RTI >
상기 식(1)에 있어서, P로 나타내어지는 가교기는 바람직하게는 상기 (a) 또는 (b)로 정의되는 2가의 가교기이며, 이들에 대해서 이하에 구체적으로 설명한다.In the above formula (1), the crosslinking group represented by P is preferably a divalent crosslinking group defined by the above (a) or (b), and these will be specifically described below.
상기 (a)로 정의되는 2가의 가교기는 탄소수 6∼20의 분기 구조를 갖는 2가의 알콜(디올)부터 수산기를 제외한 2가의 쇄상 알킬쇄이며, 디올의 2개의 알콜성 수산기에 끼워진 알킬쇄를 주쇄로 하고, 상기 알킬쇄로부터 분기된 알킬쇄(측쇄라고 한다)를 갖는 구조이다. 상기 측쇄는 주쇄를 구성하는 어느 탄소원자로부터 분기되어 있어도 좋고, 예를 들면 알콜성 수산기가 결합하고 있던 탄소원자(주쇄의 말단 탄소원자)로부터 분기되어 있는 경우도 포함한다. 상기 구조를 갖는 가교기이면 어느 것이라도 좋고, 이러한 가교기의 구체예를 하기 식(a1)에 나타낸다.The divalent crosslinking group defined by the above (a) is a bivalent alcohol (diol) having a branching structure of 6 to 20 carbon atoms and a bivalent straight chain alkyl chain excluding the hydroxyl group, and the alkyl chain sandwiched by two alcoholic hydroxyl groups of the diol is the main chain , And an alkyl chain branched from the alkyl chain (referred to as a side chain). The side chain may be branched from any carbon atom constituting the main chain, and includes, for example, a case where it is branched from a carbon atom (terminal carbon atom of the main chain) bonded with an alcoholic hydroxyl group. Any crosslinking group having the above structure may be used. Specific examples of such a crosslinking group are shown in the following formula (a1).
상기 식 중, *표시에서 식(1)에 있어서의 P의 양측의 산소원자와 결합한다.In the above formula, an oxygen atom on both sides of P in the formula (1) is bonded to the * symbol.
상기 (a)로 정의되는 알킬렌 가교기는 주쇄 알킬렌기에 대하여 알킬 분기쇄(측쇄)를 갖는 구조이면 특별히 제한은 없지만, 주쇄의 탄소수가 3이상의 주쇄이며, 적어도 1개의 알킬 측쇄를 갖는 것이 바람직하고, 또 알킬 측쇄를 2개이상 갖는 것이 특히 바람직하다. 보다 바람직한 것으로서는 탄소수 3∼12의 직쇄의 주쇄와, 2∼4개의 측쇄를 갖고, 또한 그 측쇄 중 적어도 1개가 탄소수 2∼10인 가교기를 들 수 있다. 이 경우, 측쇄 중 적어도 2개가 탄소수 2∼10인 가교기는 더욱 바람직하다. 또한 2∼4개의 측쇄는 주쇄의 다른 탄소원자로부터 분기되어 있는 것이 바람직하다.The alkylene bridging group defined by the above (a) is not particularly limited as long as it has an alkyl branched chain (side chain) with respect to the main chain alkylene group, but it is preferably a main chain having 3 or more carbon atoms in the main chain and at least one alkyl side chain , And it is particularly preferable to have two or more alkyl side chains. More preferred examples thereof include a straight chain main chain having 3 to 12 carbon atoms and a crosslinking group having 2 to 4 side chains and at least one of the side chains having 2 to 10 carbon atoms. In this case, a crosslinking group in which at least two of the side chains have 2 to 10 carbon atoms is more preferable. And two to four side chains are preferably branched from other carbon atoms in the main chain.
보다 구체적인 화합물로서는 상기 식(a1)에 기재한 가교기에 있어서 *표시의 위치에 히드록실기가 결합한 화합물을 들 수 있다. More specific examples of the compound include a compound having a hydroxyl group bonded at the position marked with * in the crosslinking group described in the formula (a1).
원료로서 사용하는 다가 알콜 중에서는 적어도 2개의 측쇄를 갖고, 상기 측쇄 중에서 적어도 2개가 탄소수 2∼4의 측쇄인 다가 알콜이 바람직하다. Of polyhydric alcohols used as raw materials, polyhydric alcohols having at least two side chains and at least two of the side chains having a side chain of 2 to 4 carbon atoms are preferable.
이러한 골격 중에서 특히 바람직한 다가 알콜로서는 2,4-디에틸-1,5-펜탄디올, 2-에틸-2-부틸-1,3-프로판디올, 2-에틸-1,3-헥산디올 등을 들 수 있고, 특히 2,4-디에틸-1,5-펜탄디올이 바람직하다.Particularly preferred polyhydric alcohols among these skeletons are 2,4-diethyl-1,5-pentanediol, 2-ethyl-2-butyl-1,3-propanediol, 2- And 2,4-diethyl-1,5-pentanediol is particularly preferred.
상기 (b)로 정의되는 가교기로서는 하기 식(b1)로 나타내어지는 2가의 기를 들 수 있다.The crosslinking group defined by the above-mentioned (b) includes a bivalent group represented by the following formula (b1).
상기 (b)로 정의되는 가교기의 경우의 가교 다환 디올 잔기로서는 트리시클로데칸 구조, 펜타시클로펜타데칸 구조를 주골격으로 하는 디올 잔기이며, 하기 식(b2)으로 나타내어진다.The crosslinked polycyclic diol residue in the case of the crosslinking group defined in the above (b) is a diol residue having a tricyclodecane structure and a pentacyclopentadecane structure as main skeletons and is represented by the following formula (b2).
식 중, 복수 존재하는 R2는 각각 독립적으로 수소원자, 또는 메틸기를 나타낸다. 이들 중에서, R2가 모두 수소원자인 가교기가 바람직하다. In the formulas, plural R 2 s present each independently represent a hydrogen atom or a methyl group. Among them, a crosslinking group in which all of R 2 are hydrogen atoms is preferable.
구체적으로는 트리시클로데칸디메탄올, 메틸트리시클로데칸디메탄올, 펜타시클로펜타데칸디메탄올 등을 들 수 있다.Specific examples thereof include tricyclodecane dimethanol, methyltricyclodecane dimethanol and pentacyclopentadecane dimethanol.
산무수물과 다가 알콜의 반응으로서는 일반적으로 산이나 염기를 촉매로 하는 부가반응이지만, 본 발명에 있어서는 특히 무촉매에 의한 반응이 바람직하다.The reaction between the acid anhydride and the polyhydric alcohol is generally an addition reaction using an acid or a base as a catalyst, but in the present invention, a reaction without catalyst is particularly preferred.
촉매를 사용할 경우, 사용할 수 있는 촉매로서는 예를 들면 염산, 황산, 메탄술폰산, 트리플루오로메탄술폰산, 파라톨루엔술폰산, 질산, 트리플루오로아세트산, 트리클로로아세트산 등의 산성 화합물, 수산화나트륨, 수산화칼륨, 수산화칼슘, 수산화마그네슘 등의 금속 수산화물, 트리에틸아민, 트리프로필아민, 트리부틸아민 등의 아민 화합물, 피리딘, 디메틸아미노피리딘, 1,8-디아자비시클로[5.4.0]운데카-7-엔, 이미다졸, 트리아졸, 테트라졸 등의 복소환식 화합물, 테트라메틸암모늄히드록시드, 테트라에틸암모늄히드록시드, 테트라프로필암모늄히드록시드, 테트라부틸암모늄히드록시드, 트리메틸에틸암모늄히드록시드, 트리메틸프로필암모늄히드록시드, 트리메틸부틸암모늄히드록시드, 트리메틸세틸암모늄히드록시드, 트리옥틸메틸암모늄히드록시드, 테트라메틸암모늄클로리드, 테트라메틸암모늄브로미드, 테트라메틸암모늄요오드, 테트라메틸암모늄아세테이트, 트리옥틸메틸암모늄아세테이트 등의 4급 암모늄염 등을 들 수 있다. 이들의 촉매는 1종 또는 2종이상을 혼합해서 사용해도 된다. 이들 중에서, 트리에틸아민, 피리딘, 디메틸아미노피리딘이 바람직하다.When the catalyst is used, examples of the catalyst that can be used include acidic compounds such as hydrochloric acid, sulfuric acid, methanesulfonic acid, trifluoromethanesulfonic acid, para toluenesulfonic acid, nitric acid, trifluoroacetic acid and trichloroacetic acid, , Metal hydroxides such as calcium hydroxide and magnesium hydroxide, amine compounds such as triethylamine, tripropylamine and tributylamine, pyridine, dimethylaminopyridine, 1,8-diazabicyclo [5.4.0] undeca-7- , Heterocyclic compounds such as imidazole, triazole and tetrazole, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, trimethylethylammonium hydroxide, Trimethylpropylammonium hydroxide, trimethylbutylammonium hydroxide, trimethylcetylammonium hydroxide, trioctylmethylammonium hydroxide And quaternary ammonium salts such as tetramethylammonium chloride, tetramethylammonium chloride, tetramethylammonium bromide, tetramethylammonium iodide, tetramethylammonium acetate and trioctylmethylammonium acetate. These catalysts may be used alone or in combination of two or more. Of these, triethylamine, pyridine, and dimethylaminopyridine are preferable.
촉매의 사용량에는 특별히 제한은 없지만, 원료의 총중량 100중량부에 대하여 통상 0. 001∼5중량부를 필요에 따라 사용하는 것이 바람직하다.The amount of the catalyst to be used is not particularly limited, but it is preferable to use 0.001 to 5 parts by weight, if necessary, with respect to 100 parts by weight of the total weight of the raw materials.
본 반응에 있어서는 무용제에 의한 반응이 바람직하지만, 유기용제를 사용해도 상관없다. 유기용제의 사용량으로서는 반응 기질인 상기 산무수물과 상기 다가 알콜의 총량 1부에 대하여 중량비로 0.005∼1부이며, 바람직하게는 0.005∼0.7부, 보다 바람직하게는 0.005∼0.5부(즉 50중량%이하)이다. 유기용제의 사용량이 상기 반응 기질 1중량부에 대하여 중량비로 1부를 초과하는 경우, 반응의 진행이 극도로 느려지는 점에서 바람직하지 못하다. 사용할 수 있는 유기용제의 구체적인 예로서는 헥산, 시클로헥산, 헵탄 등의 알칸류, 톨루엔, 크실렌 등의 방향족 탄화수소 화합물, 메틸에틸케톤, 메틸이소부틸케톤, 시클로펜탄온, 아논 등의 케톤류, 디에틸에테르, 테트라히드로푸란, 디옥산 등의 에테르류, 아세트산 에틸, 아세트산 부틸, 포름산 메틸 등의 에스테르 화합물 등을 사용할 수 있다.In this reaction, a reaction with a solvent is preferred, but an organic solvent may be used. The amount of the organic solvent to be used is 0.005 to 1 part by weight, preferably 0.005 to 0.7 part by weight, more preferably 0.005 to 0.5 part (that is, 50% by weight) based on 1 part by weight of the total amount of the acid anhydride and the polyhydric alcohol, Or less). When the amount of the organic solvent used is more than 1 part by weight based on 1 part by weight of the reaction substrate, the progress of the reaction is extremely slow, which is not preferable. Specific examples of the organic solvent that can be used include alkanes such as hexane, cyclohexane and heptane, aromatic hydrocarbon compounds such as toluene and xylene, ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone and ananone, Ethers such as tetrahydrofuran and dioxane, ester compounds such as ethyl acetate, butyl acetate and methyl formate can be used.
본 반응은 20℃정도의 온도에서도 충분히 반응은 진행한다. 반응시간의 문제로부터 반응온도는 30∼200℃가 바람직하고, 보다 바람직하게는 40∼200℃, 특히 바람직하게는 40∼150℃이다. 특히 본 반응을 무용제로 행하는 경우에는 산무수물의 휘발이 있으므로 100℃이하에서의 반응이 바람직하고, 30∼100℃ 또는 40∼100℃에서의 반응이 특히 바람직하다.The reaction proceeds sufficiently at a temperature of about 20 ° C. From the problem of the reaction time, the reaction temperature is preferably 30 to 200 占 폚, more preferably 40 to 200 占 폚, particularly preferably 40 to 150 占 폚. Particularly, when the present reaction is carried out in the absence of a solvent, the reaction at 100 ° C or lower is preferable, and the reaction at 30-100 ° C or 40-100 ° C is particularly preferable because of the volatilization of the acid anhydride.
상기 산무수물과 상기 다가 알콜의 반응 비율은 이론적으로는 등몰에 의한 반응이 바람직하지만, 필요에 따라 변경가능하다. The reaction ratio between the acid anhydride and the polyhydric alcohol is theoretically equivalent to the reaction, but it can be changed as needed.
반응시킬 때의 구체적인 양자의 투입 비율로서는 그 관능기 당량으로 상기 산무수물기 1당량에 대해서 상기 다가 알콜을 그 수산기 당량으로 0.001∼2당량, 보다 바람직하게는 0.01∼1.5당량, 더욱 바람직하게는 0.1∼1.2당량이 되는 비율로 투입하는 것이 바람직하다.Specific examples of the charge ratio in the reaction include 0.001 to 2 equivalents, more preferably 0.01 to 1.5 equivalents, and still more preferably 0.1 to 2 equivalents, based on the hydroxyl group equivalent, of the polyhydric alcohol relative to 1 equivalent of the acid anhydride group in the functional group equivalent. It is preferable to add at a rate of 1.2 equivalents.
본 발명에 있어서는 얻어지는 말단 카르복실산의 올리고에스테르가 고형인 것이 바람직하고, 고형의 수지형상 말단 카르복실산의 올리고에스테르를 얻기 위해서는 이상적으로는 등몰당량이상의 다가 알콜을 사용하는 것이 바람직하지만, 필러를 첨가하기 때문에 유동성이 중요하게 되고, 이 유동성을 확보하기 위해서 그 점도 밸런스로부터 고형을 유지하는 범위(연화점 50℃이상)에서 다소의 밸런스를 무너뜨려도 상관없다.In the present invention, the oligoester of the terminal carboxylic acid to be obtained is preferably a solid. In order to obtain an oligoester of a solid resin-like terminal carboxylic acid, it is preferable to use a polyhydric alcohol having an equimolar equivalent or more. However, The fluidity becomes important because it is added, and in order to secure the fluidity, it is possible to break some balance in a range where the solidity is maintained from the viscosity balance (softening point is 50 ° C or more).
구체적으로는 산무수물 당량에 대해서 알콜성 수산기의 당량비에 있어서 0.85∼1.20몰당량이 바람직하고, 특히 0.90∼1.1.0몰당량이 바람직하다. Specifically, the equivalent ratio of the alcoholic hydroxyl group to the acid anhydride equivalent is preferably 0.85 to 1.20 molar equivalents, particularly 0.90 to 1.1.0 molar equivalents.
반응시간은 반응온도, 촉매량 등에도 의하지만, 공업 생산이라는 관점에서 장시간의 반응은 엄청난 에너지를 소비하게 되므로 바람직하지 못하다. 또 지나치게 짧은 반응시간은 그 반응이 급격한 것을 의미하고, 안전성의 면에서 바람직하지 않다. 바람직한 범위로서는 1∼48시간, 바람직하게는 1∼36시간, 보다 바람직하게는 1∼24시간, 더욱 바람직하게는 2∼10시간정도이다.The reaction time depends on the reaction temperature, the catalyst amount, and the like, but a long reaction time from the viewpoint of industrial production consumes enormous energy, which is not preferable. An excessively short reaction time means that the reaction is abrupt, and is not preferable from the viewpoint of safety. The preferred range is 1 to 48 hours, preferably 1 to 36 hours, more preferably 1 to 24 hours, and further preferably 2 to 10 hours.
반응 종료후, 촉매를 사용한 경우에는 각각 중화, 수세, 흡착 등에 의해 촉매의 제거를 행하고, 용제를 증류제거함으로써 목적으로 하는 말단 카르복실산의 올리고에스테르가 얻어진다. 한편, 무촉매로 반응을 행한 경우에는 필요에 따라 용제를 증류제거함으로써 목적으로 하는 말단 카르복실산의 올리고에스테르가 얻어진다. 또한 용제를 사용한 경우에는 용제를 제거함으로써 목적으로 하는 말단 카르복실산의 올리고에스테르가 얻어진다. 또한 무용제, 무촉매의 경우에는 그대로 인출함으로써 제품으로 할 수 있다. After the completion of the reaction, when the catalyst is used, the catalyst is removed by neutralization, washing with water, adsorption, etc., and the solvent is distilled off to obtain the objective oligoester of the terminal carboxylic acid. On the other hand, when the reaction is carried out in the absence of a catalyst, the desired oligoester of a terminal carboxylic acid is obtained by distilling off the solvent if necessary. When a solvent is used, the desired oligosaccharide of the terminal carboxylic acid is obtained by removing the solvent. In the case of solvent-free or non-catalyst, the product can be obtained by drawing it as it is.
가장 바람직한 제조 방법으로서는 상기 산무수물, 상기 다가 알콜을 무촉매의 조건하에서 40∼150℃에서 반응시키고, 용제를 제거한 후 인출한다는 방법이다.As a most preferred production method, the acid anhydride and the polyhydric alcohol are reacted at 40 to 150 캜 under the condition of no catalyst, and the solvent is removed and then withdrawn.
이렇게 해서 얻어지는 상기 말단 카르복실산의 올리고에스테르 또는 상기 말단 카르복실산의 올리고에스테르를 포함하는 조성물은 통상, 무색∼담황색의 고형의 수지형상을 나타낸다(경우에 따라서는 결정화한다). 상기 말단 카르복실산의 올리고에스테르의 연화점은 50∼190℃인 것이 바람직하고, 55∼150℃인 것이 보다 바람직하고, 60∼120℃인 것이 특히 바람직하다. 이러한 연화점을 갖는 말단 카르복실산의 올리고에스테르를 액상으로 하지 않고 직접 열경화성 수지 조성물중에 혼합함으로써 매우 높은 반사율 유지율을 갖게 되어 내열시험에 가했을 때에도 반사율이 저하되기 어려운 반사부재를 제공하는 것이 가능해진다.The composition containing the oligoester of the terminal carboxylic acid or the oligosester of the terminal carboxylic acid obtained as described above usually exhibits a colorless to pale yellow solid resin shape (it is crystallized in some cases). The oleic ester of the terminal carboxylic acid preferably has a softening point of 50 to 190 캜, more preferably 55 to 150 캜, and particularly preferably 60 to 120 캜. It is possible to provide a reflecting member which has a very high reflectance retention rate and is hardly deteriorated in reflectance even when it is subjected to the heat resistance test by mixing the oligoester of the terminal carboxylic acid having such softening point directly into the thermosetting resin composition without making it into a liquid phase.
통상, 가교기가 (a)로 정의되는 측쇄를 갖는 알킬렌기인 경우, 무색∼담황색의 고형의 수지형상을 나타낸다.Usually, when the crosslinking group is an alkylene group having a side chain defined by (a), it exhibits a colorless to light yellow solid resin form.
본 발명에 있어서는 말단 카르복실산의 올리고에스테르를 포함하는 열경화성 수지 조성물을 사용하는 최적의 방법이 트랜스퍼에 의한 성형인 점에서 말단 카르복실산의 올리고에스테르는 고형의 수지형상이다.In the present invention, the oligoester of the terminal carboxylic acid is in the form of a solid resin in that the optimal method of using the thermosetting resin composition containing the terminal carboxylic acid oligosters is molding by transfer.
가교기가 (b)로 정의되는 가교기의 경우, 지방족 탄화수소기가 탄소수 4∼10의 시클로알칸 골격 또는 노르보르난 골격일 때, 지환식의 치환기 전체가 수소원자의 말단 카르복실산의 올리고에스테르는 경화시의 착색이 보여지며, 특히 엄격한 광학용도로는 적합하지 않다. 지방족 탄화수소기가 탄소수 4∼10인 시클로알칸 골격 또는 노르보르난 골격일 때, 치환기가 메틸기 또는 카르복실기인 화합물에서는 그러한 착색은 적고, 그 광학특성이 향상된다.In the case of the crosslinking group defined as the crosslinking group (b), when the aliphatic hydrocarbon group is a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton, the oligosters of the terminal carboxylic acid in which the alicyclic substituents as a whole are hydrogen atoms, The coloration of the film is visible and is not particularly suitable for strict optical applications. When the aliphatic hydrocarbon group is a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton, the compound having a substituent group of methyl group or carboxyl group is less colored and its optical characteristics are improved.
상기 (a)로 정의되는 가교기의 화합물에 있어서도 지방족 탄화수소기가 탄소수 4∼10인 시클로알칸 골격 또는 노르보르난 골격일 때, 치환기가 메틸기 또는 카르복실기의 화합물의 경우의 쪽이 광학특성이 향상되어 바람직하다.Also in the compound of the crosslinking group defined in the above (a), when the aliphatic hydrocarbon group is a cycloalkane skeleton or a norbornane skeleton having 4 to 10 carbon atoms, the substituent is a methyl group or a carboxyl group, Do.
즉, 본 발명의 말단 카르복실산의 올리고에스테르 조성물로서 탄소수 4∼10의 시클로알칸 골격 또는 노르보르난 골격일 때, 치환기는 바람직하게는 메틸기 또는 카르복실기, 또는 양자를 갖는 식(1)의 말단 카르복실산의 올리고에스테르를 포함하는 조성물이 바람직하다. 상기 말단 카르복실산의 올리고에스테르를 2종이상 포함하는 말단 카르복실산의 올리고에스테르 조성물의 경우, 적어도 해당 치환기가 수소원자가 아닌 식(1)의 말단 카르복실산의 올리고에스테르(상기 치환기가 상기 알킬기, 바람직하게는 메틸기, 또는 카르복실기의 말단 카르복실산의 올리고에스테르)를 말단 카르복실산의 올리고에스테르의 총량에 대해서 50몰%이상 포함하는 조성물이 바람직하다. 보다 바람직하게는 해당 치환기가 수소원자가 아닌 식(1)의 말단 카르복실산의 올리고에스테르를 70몰%이상, 가장 바람직하게는 90몰%이상 포함하는 말단 카르복실산의 올리고에스테르 조성물이 바람직하다. 잔부는 R이 수소원자인 식(1)의 말단 카르복실산의 올리고에스테르이다.That is, when the oligosaccharide composition of the terminal carboxylic acid of the present invention is a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton, the substituent is preferably a methyl group or a carboxyl group, or a terminal carboxy group of the formula (1) Compositions comprising oligoesters of a carboxylic acid are preferred. In the case of the oligoester composition of the terminal carboxylic acid containing at least two oligoester of the terminal carboxylic acid, the oligosester of the terminal carboxylic acid of the formula (1) in which at least the substituent is not a hydrogen atom , Preferably a methyl group, or an oligoester of a terminal carboxylic acid of a carboxyl group) relative to the total amount of the oligoesters of the terminal carboxylic acid is preferably 50 mol% or more. More preferably an oligoester composition of a terminal carboxylic acid containing at least 70 mol%, and most preferably at least 90 mol%, of an oligoester of a terminal carboxylic acid of the formula (1) in which the substituent is not a hydrogen atom. And the remainder is an oligosaccharide of the terminal carboxylic acid of formula (1) wherein R is a hydrogen atom.
본 발명에 있어서 바람직한 말단 카르복실산의 올리고에스테르로서는 하기 식(2)로 나타내어지는 말단 카르복실산의 올리고에스테르가 사용된다.As the oligoester of the terminal carboxylic acid preferred in the present invention, an oligoester of a terminal carboxylic acid represented by the following formula (2) is used.
(상기 식 중, P는 상기와 같은 의미를 나타내고, R3은 수소원자, 탄소수 1∼3의 알킬기 또는 카르복실기를 나타낸다.)(Wherein P has the same meaning as defined above, and R 3 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a carboxyl group.)
여기에서, 상기 식(2)에 있어서는 상기에 기재된 바와 같은 이유에 의해, R3이 탄소수 1∼3의 알킬기 또는 카르복실기를 적합하게 사용할 수 있다.In the formula (2), an alkyl group or a carboxyl group having 1 to 3 carbon atoms can be suitably used for the reasons described above.
본 발명의 경화성 수지 조성물에 있어서, 말단 카르복실산의 올리고에스테르는 다른 경화제와 병용해도 상관없다. 병용할 경우, 말단 카르복실산의 올리고에스테르의 전체 경화제중에 차지하는 비율은 20중량%이상이 바람직하고, 특히 30중량%이상이 바람직하다.In the curable resin composition of the present invention, the oligoester of the terminal carboxylic acid may be used in combination with another curing agent. When used in combination, the proportion of the oligomer of the terminal carboxylic acid in the total curing agent is preferably 20% by weight or more, more preferably 30% by weight or more.
말단 카르복실산의 올리고에스테르에 병용할 수 있는 경화제로서는 예를 들면 아민계 화합물, 불포화 환구조를 갖는 산무수물계 화합물, 오르가노실록산 골격을 갖는 산무수물, 아미드계 화합물, 페놀계 화합물, 카르복실산계 화합물 등을 들 수 있다. 사용할 수 있는 경화제의 구체예로서는 디아미노디페닐메탄, 디에틸렌트리아민, 트리에틸렌테트라민, 디아미노디페닐술폰, 이소포론디아민, 디시안디아미드, 리놀렌산의 2량체와 에틸렌디아민으로부터 합성되는 폴리아미드 수지, 무수 프탈산, 무수 트리멜리트산, 무수 피로멜리트산, 무수 말레산, 테트라히드로 무수 프탈산, 메틸테트라히드로 무수 프탈산, 무수 메틸나딕산, 무수 나딕산, 헥사히드로 무수 프탈산, 메틸헥사히드로 무수 프탈산, 부탄테트라카르복실산 무수물, 비시클로[2,2,1]헵탄-2,3-디카르복실산 무수물, 메틸비시클로[2,2,1]헵탄-2,3-디카르복실산 무수물, 시클로헥산-1,3,4-트리카르복실산-3,4-무수물, 비스페놀A, 비스페놀F, 비스페놀S, 플루오렌비스페놀, 테르펜디페놀, 4,4'-비페놀, 2,2'-비페놀, 3,3',5,5'-테트라메틸-[1,1'-비페닐]-4,4'-디올, 하이드로퀴논, 레조르신, 나프탈렌디올, 트리스-(4-히드록시페닐)메탄, 1,1,2,2-테트라키스(4-히드록시페닐)에탄, 페놀류(페놀, 알킬 치환 페놀, 나프톨, 알킬 치환 나프톨, 디히드록시벤젠, 디히드록시나프탈렌 등)과 포름알데히드, 아세트알데히드, 벤즈알데히드, p-히드록시벤즈알데히드, o-히드록시벤즈알데히드, p-히드록시아세토페논, o-히드록시아세토페논, 디시클로펜타디엔, 푸르푸랄, 4,4'-비스(클로로메틸)-1,1'-비페닐, 4,4'-비스(메톡시메틸)-1,1'-비페닐, 1,4'-비스(클로로메틸)벤젠, 1,4'-비스(메톡시메틸)벤젠 등의 중축합물 및 이들의 변성물, 테트라브로모비스페놀A 등의 할로겐화 비스페놀류, 이미다졸, 트리플루오로보란-아민 착체, 구아니딘 유도체, 테르펜과 페놀류의 축합물 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 이들은 단독으로 사용해도 좋고, 2종이상을 사용해도 좋다.Examples of the curing agent that can be used in combination with the oligoester of the terminal carboxylic acid include an amine compound, an acid anhydride compound having an unsaturated ring structure, an acid anhydride having an organosiloxane skeleton, an amide compound, a phenol compound, Acid-based compounds and the like. Specific examples of the curing agent that can be used include a polyamide resin synthesized from diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, linolenic acid dimer and ethylene diamine , Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, anhydrous nadic acid, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butane Tetracarboxylic acid anhydride, bicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, methylbicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, cyclo Hexane-1,3,4-tricarboxylic acid-3,4-anhydride, bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, terpendiphenol, 4,4'-biphenol, 2,2'- Phenol, 3,3 ', 5,5'-tetramethyl- [1,1'-biphenyl] -4,4'-diol, (4-hydroxyphenyl) ethane, phenols (phenol, alkyl-substituted phenol, naphthol, alkyl (meth) acrylate, Dihydroxybenzaldehyde, p-hydroxyacetophenone, o-hydroxyacetophenone, dicyclohexylcarbodiimide, dicyclohexylcarbodiimide, dicyclohexylcarbodiimide, Bis (chloromethyl) -1,1'-biphenyl, 4,4'-bis (methoxymethyl) -1,1'-biphenyl, 1,4 ' - polycondensates of bis (chloromethyl) benzene and 1,4'-bis (methoxymethyl) benzene and their modifications, halogenated bisphenols such as tetrabromobisphenol A, imidazoles, trifluoroborane-amine Condensates of guanidine derivatives, terpenes and phenols, and the like, but are not limited thereto. These may be used alone, or two or more of them may be used.
또한 에폭시 수지(A)와 경화제(B)의 배합비는 에폭시 수지(A)중의 에폭시기 1당량에 대해서 해당 에폭시기와 반응가능한 말단 카르복실산의 올리고에스테르인 경화제(B)를 포함하는 전체 경화제중의 활성기(산무수물기나 수산기)가 0.5∼1.5당량(카르복실산을 1관능, 산무수물을 1관능이라고 생각한다)이 바람직하고, 특히 바람직하게는 0.5∼1.2당량이다. 에폭시기 1당량에 대해서 0.5당량에 미치지 못할 경우, 또는 1.5당량을 초과하는 경우, 어느 것이나 경화가 불완전하게 되어 양호한 경화물성이 얻어지지 않을 우려가 있다.The mixing ratio of the epoxy resin (A) and the curing agent (B) is preferably such that the ratio of the epoxy group (A) to the curing agent (B) in the total curing agent containing the curing agent (B), which is an oligosaccharide of a terminal carboxylic acid capable of reacting with the epoxy group (Acid anhydride group or hydroxyl group) is preferably 0.5 to 1.5 equivalents (carboxylic acid is one functional group, and acid anhydride is considered to be one functional group), particularly preferably 0.5 to 1.2 equivalents. When the amount is less than 0.5 equivalents or more than 1.5 equivalents based on 1 equivalent of the epoxy group, the curing becomes incomplete in either case, and there is a possibility that good curing properties may not be obtained.
본 발명에 있어서의 백색 안료는 특별히 한정되지 않지만, 예를 들면 알루미나, 산화마그네슘, 산화안티몬, 산화티타늄, 산화지르코늄, 산화아연, 염기성 탄산아연, 카올린, 탄산칼슘 등을 사용할 수 있다. 또, 백색 안료는 중공입자이어도 좋다. 또한 백색 안료에 대해서 규소 화합물, 알루미늄 화합물, 유기물 등으로 적당하게 표면처리를 해도 좋다. 이들은 단독으로도 2종이상을 병용해도 상관없다. 또한 상기 백색 안료의 평균 입경은 0.01∼50㎛의 범위에 있는 것이 바람직하다. 0.01㎛미만이면 입자가 응집되기 쉬워 분산성이 나빠지는 경향이 있고, 50㎛를 초과하면 경화물의 반사 특성이 충분히 얻어지지 못한 경향이 있다. 상기 평균 입경은 예를 들면 레이저 회절 산란식 입도 분포계를 이용하여 측정할 수 있다. 본 발명에 있어서는 산화티타늄, 특히 2산화티타늄의 분말을 사용하는 것이 바람직하다. 백색도, 광반사성, 및 은폐력이 높고, 분산성 안정성이 우수하고, 입수가 용이하기 때문이다. 산화티타늄의 결정형은 특별히 한정되지 않고, 루틸형이어도 좋고, 아나타제형이어도 좋고, 양자가 혼재되어 있어도 좋지만, 아나타제형은 광촉매기능을 갖기 때문에 수지를 열화시킬 우려가 있으므로 본 발명에 있어서는 루틸형이 바람직하다.The white pigment in the present invention is not particularly limited. For example, alumina, magnesium oxide, antimony oxide, titanium oxide, zirconium oxide, zinc oxide, basic zinc carbonate, kaolin and calcium carbonate can be used. The white pigment may be hollow particles. The surface of the white pigment may be suitably treated with a silicon compound, an aluminum compound, an organic material, or the like. These may be used alone or in combination of two or more. The average particle diameter of the white pigment is preferably in the range of 0.01 to 50 mu m. When the thickness is less than 0.01 탆, the particles tend to agglomerate and the dispersibility tends to deteriorate. When the thickness exceeds 50 탆, the cured product tends not to be sufficiently obtained. The average particle size can be measured using, for example, a laser diffraction scattering particle size distribution meter. In the present invention, it is preferable to use a powder of titanium oxide, especially titanium dioxide. This is because it has high whiteness, light reflectivity, and hiding power, excellent dispersibility stability, and easy access. The crystal form of the titanium oxide is not particularly limited and may be a rutile type, an anatase type or a mixture of both. However, since the anatase type has a photocatalytic function, there is a possibility of deteriorating the resin, Do.
또한 백색 안료의 함유량은 수지 조성물 전체에 대해서 10중량%∼85중량%의 범위인 것이 바람직하다. 합계 함유량이 10중량%미만이면 경화물의 광반사 특성이 충분히 얻어지지 못하는 경향이 있고, 85중량%를 초과하면 수지 조성물의 성형성이 나빠져 기판의 제작이 곤란하게 되는 경향이 있다.The content of the white pigment is preferably in the range of 10 wt% to 85 wt% with respect to the whole resin composition. When the total content is less than 10% by weight, the light reflection property of the cured product tends to be insufficient. When the content exceeds 85% by weight, the moldability of the resin composition is deteriorated and the production of the substrate tends to be difficult.
본 발명의 경화성 수지 조성물에는 필요에 따라 경화 촉진제를 첨가할 수 있다. 경화 촉진제로서는 2-메틸이미다졸, 2-페닐이미다졸, 2-운데실이미다졸, 2-헵타데실이미다졸, 2-페닐-4-메틸이미다졸, 1-벤질-2-페닐이미다졸, 1-벤질-2-메틸이미다졸, 1-시아노에틸-2-메틸이미다졸, 1-시아노에틸-2-페닐이미다졸, 1-시아노에틸-2-운데실이미다졸, 2,4-디아미노-6(2'-메틸이미다졸(1'))에틸-s-트리아진, 2,4-디아미노-6(2'-운데실이미다졸(1'))에틸-s-트리아진, 2,4-디아미노-6(2'-에틸,4-메틸이미다졸(1'))에틸-s-트리아진, 2,4-디아미노-6(2'-메틸이미다졸(1'))에틸-s-트리아진·이소시아누르산 부가물, 2-메틸이미다졸이소시아누르산의 2:3부가물, 2-페닐이미다졸이소시아누르산 부가물, 2-페닐-3,5-디히드록시메틸이미다졸, 2-페닐-4-히드록시메틸-5-메틸이미다졸, 1-시아노에틸-2-페닐-3,5-디시아노에톡시메틸이미다졸의 각종 이미다졸류, 및 이들 이미다졸류와 프탈산, 이소프탈산, 테레프탈산, 트리멜리트산, 피로멜리트산, 나프탈렌디카르복실산, 말레산, 옥살산 등의 말단 카르복실산의 올리고에스테르의 염류, 디시안디아미드 등의 아미드류, 1,8-디아자-비시클로(5.4.0)운데센-7 등의 디아자 화합물 및 이들의 테트라페닐볼레이트, 페놀노볼락 등의 염류, 상기 말단 카르복실산의 올리고에스테르류, 또는 포스핀산류의 염류, 테트라부틸암모늄브로마이드, 세틸트리메틸암모늄브로마이드, 트리옥틸메틸암모늄브로마이드, 헥사데실트리메틸암모늄히드록시드 등의 4급 암모늄염(바람직하게는 C1∼C20 알킬암모늄염, 트리페닐포스핀, 트리(톨루일)포스핀, 테트라페닐포스포늄브로마이드, 테트라페닐포스포늄테트라페닐볼레이트 등의 포스핀류나 포스포늄 화합물, 2,4,6-트리스아미노메틸페놀 등의 페놀류, 아민어덕트, 옥틸산 주석, 옥탄산 아연, 스테아린산 아연, 나프텐산 구리, 나프텐산 코발트 등의 금속 화합물 등, 및 이들 경화 촉진제를 마이크로캡슐로 한 마이크로캡슐형 경화 촉진제 등을 들 수 있다. 이들 경화 촉진제의 어느 것을 사용할지는 예를 들면 투명성, 경화 속도, 작업조건이라는 얻어지는 투명 수지 조성물에 요구되는 특성에 따라 적당하게 선택된다. 본 발명에 있어서 바람직한 것으로서는 포스포늄 화합물(보다 바람직하게는 4급 포스포늄) 또는 스테아린산 아연을 들 수 있다. A curing accelerator may be added to the curable resin composition of the present invention if necessary. Examples of the curing accelerator include 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenyl- Phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl- (2'-methylimidazole (1 ')) ethyl-s-triazine, 2,4-diamino-6 (2'-undecylimidazole Sol (1 ')) ethyl-s-triazine, 2,4-diamino-6 (2'-ethyl, 4-methylimidazole (2'-methylimidazole (1 ')) ethyl-s-triazine isocyanuric acid adduct, a 2: 3 adduct of 2-methylimidazole isocyanuric acid, 2-phenyl Imidazole isocyanuric acid adduct, 2-phenyl-3,5-dihydroxymethylimidazole, 2-phenyl-4-hydroxymethyl-5-methylimidazole, 1-cyanoethyl- - phenyl-3,5-dicyanoethoxymethylimidazole, and imidazoles and imidazoles thereof. Salts of oligo esters of terminal carboxylic acids such as acetic acid, isophthalic acid, terephthalic acid, trimellitic acid, pyromellitic acid, naphthalene dicarboxylic acid, maleic acid and oxalic acid, amides such as dicyandiamide, (5.4.0) undecene-7, and salts thereof such as tetraphenylborate and phenol novolac, oligoesters of the above-mentioned terminal carboxylic acids, salts of phosphinic acids, Tetrabutylammonium bromide, cetyltrimethylammonium bromide, trioctylmethylammonium bromide, and hexadecyltrimethylammonium hydroxide (preferably C1 to C20 alkylammonium salts, triphenylphosphine, tri (toluyl) phosphine , Tetraphenylphosphonium bromide, tetraphenylphosphonium tetraphenylborate and the like, phenols such as 2,4,6-trisaminomethylphenol and the like, amines , Metal compounds such as tin octylate, zinc octanoate, zinc stearate, copper naphthenate and cobalt naphthenate, and microcapsulated curing accelerators obtained by microcapsulating these curing accelerators. Is appropriately selected depending on the properties required for the obtained transparent resin composition, for example, transparency, curing rate, and working conditions. Preferable examples of the present invention include a phosphonium compound (more preferably, quaternary phosphonium) or zinc stearate.
경화 촉진제는 에폭시 수지 100중량부에 대하여 통상 0.001∼15중량부, 바람직하게는 0.01∼5중량부의 범위에서 사용된다.The curing accelerator is used in an amount of usually 0.001 to 15 parts by weight, preferably 0.01 to 5 parts by weight, based on 100 parts by weight of the epoxy resin.
본 발명의 경화성 수지 조성물에는 성형성을 조제하기 위해서 필요에 따라 무기 충전제를 첨가할 수 있다. 또, 무기 충전제는 백색 안료와 동일한 것을 사용해도 좋다. 무기 충전제로서는 결정 실리카, 용융 실리카, 산화안티몬, 산화티타늄, 산화마그네슘, 산화지르코늄, 수산화알루미늄, 수산화마그네슘, 알루미나 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 이들은 단독으로 사용해도 좋고, 2종이상을 사용해도 좋다.An inorganic filler may be added to the curable resin composition of the present invention as necessary in order to prepare the moldability. The inorganic filler may be the same as the white pigment. Examples of the inorganic filler include, but are not limited to, crystalline silica, fused silica, antimony oxide, titanium oxide, magnesium oxide, zirconium oxide, aluminum hydroxide, magnesium hydroxide and alumina. These may be used alone, or two or more of them may be used.
무기충전제의 배합량은 백색 안료와의 합계량이 (A)성분 및 (B)성분의 합계량 100중량부에 대해서 1∼1000중량부인 것이 바람직하고, 1∼800중량부인 것이 보다 바람직하다.The blending amount of the inorganic filler is preferably 1 to 1000 parts by weight, more preferably 1 to 800 parts by weight based on 100 parts by weight of the total amount of the component (A) and the component (B).
또한, 본 발명의 경화성 수지 조성물에는 실란커플링제, 스테아린산, 팔미트산, 스테아린산 아연, 스테아린산 알루미늄, 스테아린산 칼슘 등의 내부 이형제, 카르복실산 아연(2-에틸헥산산 아연, 스테아린산 아연, 베헨산 아연, 미스티린산 아연)이나 인산 에스테르아연(옥틸인산 아연, 스테아릴인산 아연 등) 등의 아연 화합물(금속비누), 계면활성제, 힌다드아민 등의 광안정제, 산화방지제, 커플링제 등의 각종 배합제, 각종 열경화성 수지를 첨가할 수 있다.In addition, the curable resin composition of the present invention may contain an internal release agent such as a silane coupling agent, stearic acid, palmitic acid, zinc stearate, aluminum stearate and calcium stearate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate Zinc stearate, zinc stearate, zinc stearate, zinc stearate, zinc stearate, zinc stearate, etc.), zinc stearate (zinc stearate, zinc stearate, etc.) , And various thermosetting resins may be added.
또한 본 발명의 경화성 수지 조성물에는 상기 성분(A)∼(C)에 추가해서 필요에 따라 공지의 이온 보충제 등의 첨가제를 첨가해도 좋다.In addition to the components (A) to (C), additives such as known ionic supplements may be added to the curable resin composition of the present invention, if necessary.
또한 열경화후의 파장 460∼800nm에 있어서의 광반사율이 80%이상, 보다 바람직하게는 광반사율이 85%이상인 것이 요구된다. 상기 광반사율이 80% 미만이면, 광반도체 장치의 휘도 향상에 충분히 기여할 수 없는 경향이 있다.Further, it is required that the light reflectance at a wavelength of 460 to 800 nm after thermosetting is 80% or more, more preferably 85% or more. If the optical reflectance is less than 80%, the optical semiconductor device tends not to contribute sufficiently to the improvement of the brightness.
본 발명의 열경화성 수지 조성물은 상기한 각종 성분을 균일하게 분산 혼합함으로써 얻어진다. 그 방법에 대해서는 특별히 한정되지 않지만, 각종 성분을 믹서 등에 의해 충분히 균일하게 교반, 혼합한 후, 믹싱 롤, 압출기, 니더, 롤, 익스트루더 등에 의해 혼련 또는 용융 혼련하고, 냉각, 분쇄하는 방법을 들 수 있다. 혼련 또는 용융 혼련의 조건은 성분의 종류나 배합량에 따라 결정하면 좋고, 특별히 한정되지 않지만, 20∼100℃의 범위에서 5∼40분간 혼련하는 것이 보다 바람직하다. 혼련 온도가 20℃ 미만이면, 각 성분의 분산성이 저하되어 충분히 혼련시키는 것이 곤란하며, 100℃보다 고온이면 수지 조성물의 가교반응이 진행되어 수지 조성물이 경화되어 버릴 우려가 있다.The thermosetting resin composition of the present invention is obtained by uniformly dispersing and mixing the above-mentioned various components. Although the method is not particularly limited, a method of sufficiently mixing and mixing various components uniformly with a mixer or the like and then kneading or melt-kneading the mixture with a mixing roll, an extruder, a kneader, a roll or an extruder, . The conditions for kneading or melt-kneading may be determined depending on the kind and amount of the components, and are not particularly limited, and it is more preferable to knead for 5 to 40 minutes in the range of 20 to 100 占 폚. If the kneading temperature is less than 20 ° C, the dispersibility of each component is lowered, and it is difficult to sufficiently knead the resin composition. If the kneading temperature is higher than 100 ° C, the crosslinking reaction of the resin composition proceeds and the resin composition may be cured.
본 발명의 열경화성 수지 조성물은 가열 성형전, 0∼30℃의 실온에 있어서 가압(태블릿) 성형 가능한 것이 바람직하다. 가압 성형은 예를 들면 0.01∼10㎫, 1∼5초정도의 조건하에서 행하는 방법을 들 수 있다. 또한 가압(태블릿) 성형시에 사용하는 금형은 특별히 한정되지 않지만, 예를 들면 세라믹스계 재료나 불소계 수지재료 등으로 이루어지는 절굿공이형(상금형)과 절구형(하금형)으로 구성되는 것을 사용하는 것이 바람직하다.The thermosetting resin composition of the present invention is preferably capable of being pressed (tablet) at room temperature of 0 to 30 占 폚 before heat molding. The press molding may be carried out under the conditions of, for example, 0.01 to 10 MPa and 1 to 5 seconds. The mold used for pressurizing (tablet) molding is not particularly limited. For example, a mold made of a ceramic material or a fluorine-based resin material and composed of a round-bottomed mold (upper mold) and a mold half mold .
본 발명의 열경화성 수지 조성물은 높은 유리전이온도 및 높은 투과율을 필요로 하는 광반도체 밀봉재료, 광반도체용 반사재 등의 용도에 있어서 유용하다.The thermosetting resin composition of the present invention is useful in applications such as optical semiconductor sealing materials and reflective materials for optical semiconductors which require high glass transition temperature and high transmittance.
광반사용으로서 사용할 경우에 있어서, 제조 방법은 특별히 한정되지 않지만, 예를 들면 본 발명의 열경화성 수지 조성물을 트랜스퍼 성형에 의해 제조하는 것이 바람직하다. 본 발명의 열경화성 수지 조성물을 금형에 주입하고, 예를 들면 금형온도 150∼190℃, 성형압력 2∼20㎫의 조건하에서 60∼800초간 경화시킨 후에 금형으로부터 인출하고, 애프터 큐어 온도 150℃∼180℃에서 1∼3시간에 걸쳐 열경화시킨다.In the case of using as a light-use medium, the production method is not particularly limited, but it is preferable to produce the thermosetting resin composition of the present invention by transfer molding, for example. The thermosetting resin composition of the present invention is poured into a mold and is cured for 60 to 800 seconds under the conditions of, for example, a mold temperature of 150 to 190 DEG C and a molding pressure of 2 to 20 MPa, Lt; 0 > C for 1 to 3 hours.
(반도체 장치)(Semiconductor device)
본 발명의 반도체 장치는 대표적인 구조에 대해서 구체예를 예시하면, 국제 공개 제2012/124147호에 기재된 대로, 기판 상에 원통형상의 중공부를 갖는 광반사 방지부재를 배치하고, 원통형상의 중공부의 내부공간에 있어서 기판 상에 광반도체 소자를 배치한다. 그리고, 광반도체 소자의 일단부와 기판을 와이어로 연결해서 상기 중공부에 밀봉수지가 봉입된 구성을 갖고 있다.A semiconductor device according to the present invention includes a light reflection preventing member having a cylindrical hollow portion on a substrate, as described in International Publication No. 2012/124147, and a light reflection preventing member having a cylindrical hollow portion is disposed in the inner space of the cylindrical hollow portion And the optical semiconductor element is disposed on the substrate. Further, the sealing resin is sealed in the hollow portion by connecting one end of the optical semiconductor element and the substrate with a wire.
실시예Example
이하, 본 발명을 실시예에 의해 상세하게 설명하지만, 본 발명은 이하의 기재에 한정되는 것은 아니다. 또 합성예에 있어서 겔 퍼미에이션 크로마토그래피(이하, 「GPC」라고 한다)의 측정에 있어서는 이하와 같다. 컬럼은 Shodex SYSTEM-21 컬럼(KF-803L, KF-802.5(×2개), KF-802), 연결 용리액은 테트라히드로푸란, 유속은 1ml/min. 컬럼 온도는 40℃, 또 검출은 RI(Reflective index)로 행하고, 검량선은 Shodex제 표준 폴리스티렌을 사용했다. 또 관능기 당량은 GPC로부터 산출한 비율로부터 산출하고, 카르복실산, 산무수물을 각각 1당량으로 해서 값을 구했다. 또한, 연화점은 연화점 측정 장치 METTLER FP90(메트라 토레도 가부시키가이샤 제품)을 사용하고, 2℃/min의 승온속도로 측정했다.Hereinafter, the present invention will be described in detail by way of examples, but the present invention is not limited to the following description. The measurement of the gel permeation chromatography (hereinafter referred to as " GPC ") in the synthesis examples is as follows. The column was a Shodex SYSTEM-21 column (KF-803L, KF-802.5 (× 2), KF-802), the eluent was tetrahydrofuran and the flow rate was 1 ml / min. Column temperature was 40 占 폚 and detection was carried out using RI (Reflective index). Standard curve of polystyrene standard was Shodex. The functional group equivalent was calculated from the ratio calculated from GPC, and the value was determined by making one equivalent of each of carboxylic acid and acid anhydride. The softening point was measured at a heating rate of 2 DEG C / min using a softening point measuring device METTLER FP90 (manufactured by Metra Toredo K.K.).
합성예 1(말단 카르복실산의 올리고에스테르 B-1)Synthesis Example 1 (Oligoester B-1 of a terminal carboxylic acid)
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 질소 퍼지를 실시하면서 트리시클로데칸디메탄올 98.1부, 메틸헥사히드로프탈산 무수물과 헥사히드로프탈산 무수물의 혼합물(신니폰 리카(주)제, 리카시드 MHT 비율 7:3) 117.6부, 시클로헥산-1,2,4-트리카르복실산-1,2-무수물(미츠비시 가스 가가쿠제 H-TMAn) 59.4부, MEK 275.2부를 첨가하고, 60℃에서 1시간 반응후 80℃에서 5시간 가열 교반을 행하고, 경화제를 얻었다. 얻어진 경화제는 하기 식으로 나타내어지며, 무색, 고형이었다. 또한 관능기당량은 225.2g/eq.였다. 연화점은 105.6℃였다.In a flask equipped with a stirrer, a reflux condenser and a stirrer, 98.1 parts of tricyclodecane dimethanol was added while a nitrogen purge was carried out, a mixture of methylhexahydrophthalic anhydride and hexahydrophthalic anhydride (manufactured by Shinnippon Pharmaceutical Co., Ltd., Ricasid MHT 59.4 parts of cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride (H-TMAn manufactured by Mitsubishi Gas Chemical Company) and 275.2 parts of MEK were added, and the mixture was stirred at 60 ° C for 1 hour After the reaction, the mixture was heated and stirred at 80 DEG C for 5 hours to obtain a curing agent. The obtained curing agent was represented by the following formula, and it was colorless and solid. The functional group equivalent was 225.2 g / eq. The softening point was 105.6 ° C.
경화제의 TG-DTATG-DTA of hardener
각 경화제에 대해서 하기 시험 방법에 의해 경화물의 휘발성을 평가했다. 결과를 표 1에 나타낸다. TG/DTA의 측정 방법을 기재한다.The volatility of the cured product was evaluated for each curing agent by the following test method. The results are shown in Table 1. The measurement method of TG / DTA is described.
에스아이아이 나노테크놀로지 가부시키가이샤제 열중량 분석 장치(TG/DTA7200)를 사용하고, 공기중, 승온속도 10℃/분으로 150℃, 180℃, 200℃의 각 온도에서의 감량(%)을 측정했다.(%) At each temperature of 150 DEG C, 180 DEG C, and 200 DEG C in the air at a temperature raising rate of 10 DEG C / minute by using a thermogravimetric analyzer (TG / DTA7200) manufactured by SII ANA NanoTechnology Co., Respectively.
합성예 1에서 얻어진 말단 카르복실산의 올리고에스테르(B-1)와 헥사히드로 무수 프탈산(신니폰 리카(주)제, 리카시드HH)을 비교하면, 말단 카르복실산의 올리고에스테르는 200℃이하에서의 휘발량이 거의 없고, 리카시드HH와 비교하면 명확하게 저휘발성인 것을 알 수 있다. 이 결과로부터 본 발명의 말단 카르복실산의 올리고에스테르를 경화제로서 사용함으로써 제조시 및 가공시에 경화제가 휘발하는 문제를 해결할 수 있다고 생각된다.The oligosters of the terminal carboxylic acid (B-1) obtained in Synthesis Example 1 and the hexahydrophthalic anhydride phthalic acid (Ricaside HH made by Shin-Nippon Rikagaku Co., Ltd.) It is apparent that the amount of volatilization is low and that it is clearly low in volatility as compared with ricaside HH. From these results, it is considered that the use of the oligoester of the terminal carboxylic acid of the present invention as a curing agent can solve the problem that the curing agent volatilizes during production and processing.
<열경화성 광반사용 수지 조성물의 조제(실시예 1, 비교예 1)>≪ Preparation of thermosetting light-sensitive resin composition (Example 1, Comparative Example 1)
표 2에 나타낸 배합표에 따라서 각 성분을 배합하고, 믹서에 의해 충분히 혼련한 후, 믹싱 롤에 의해 소정 조건으로 용융 혼련하고, 냉각, 분쇄를 행하고, 실시예 1 및 비교예 1의 열경화성 광반사용 수지 조성물을 조제했다. 또, 표 중의 각성분의 배합량의 단위는 중량부이며, 공란은 해당 성분을 사용하지 않는 것을 나타낸다.Each component was compounded in accordance with the formulation table shown in Table 2, and sufficiently kneaded by a mixer. Then, the mixture was melt-kneaded under a predetermined condition by a mixing roll and cooled and pulverized to obtain a thermosetting light- A composition was prepared. In addition, the unit of the blending amount of each component in the table is parts by weight, and the blank indicates that the component is not used.
<열경화성 광반사용 수지 조성물의 평가>≪ Evaluation of thermosetting light-releasable resin composition >
각 실시예 및 각 비교예의 수지 조성물에 대해서 하기 시험 방법에 의해 경화물의 광반사성을 평가했다. 결과를 표 2(72시간후), 표 3(144시간후)에 나타낸다.The light reflectivities of the cured products were evaluated for the resin compositions of each of the examples and comparative examples by the following test methods. The results are shown in Table 2 (after 72 hours) and in Table 3 (after 144 hours).
<광반사성 시험><Light Reflectivity Test>
각 실시예 및 각 비교예의 수지 조성물을 성형온도 150℃, 성형압력 10.4㎫, 큐어시간 300초의 조건으로 트랜스퍼 성형한 후, 150℃에서 3시간 포스트 큐어함으로써, 두께 1.0mm의 테스트 피스를 제작했다. 이어서, 적분 구형 분광 광도계 UV-3600형(가부시키가이샤 시마즈 세이사쿠쇼제)으로 파장 460nm에 있어서의 광반사율을 측정하고, 하기의 평가기준에 의해 각 테스트 피스의 광반사성을 평가했다.The resin compositions of each of the examples and comparative examples were transfer-molded under the conditions of a molding temperature of 150 캜, a molding pressure of 10.4 MPa and a cure time of 300 seconds, and then post-curing at 150 캜 for 3 hours to prepare test pieces having a thickness of 1.0 mm. Subsequently, the light reflectance at a wavelength of 460 nm was measured with an integral spherical spectrophotometer UV-3600 (manufactured by Shimadzu Corporation), and the light reflectivity of each test piece was evaluated according to the following evaluation criteria.
이상의 결과로부터, 본 발명의 열경화성 수지 조성물은 제조시 및 가공시의 경화제 성분의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 경화물을 부여하는 것을 알 수 있다.From the above results, it can be seen that the thermosetting resin composition of the present invention suppresses the volatilization of the curing agent component during production and processing, suppresses discoloration due to heat, and gives a cured product excellent in light reflectivity and reliability under a high temperature environment .
본 발명을 특정 형태를 참조해서 상세하게 설명했지만, 본 발명의 정신과 범위를 벗어나지 않고 여러가지 변경 및 수정이 가능한 것은 당업자에게 있어서 명확하다.While the invention has been described in detail with reference to specific embodiments thereof, it is evident to those skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope of the invention.
또, 본원은 2013년 12월 18일자로 출원된 일본국 특허출원(2013-260903)에 의거하고 있으며, 그 전체가 인용에 의해 원용된다. 또한 여기에 인용되는 모든 참조는 전체적으로 도입된다.The present application is based on Japanese Patent Application (2013-260903) filed on December 18, 2013, which is incorporated by reference in its entirety. Also, all references cited herein are incorporated in their entirety.
(산업상의 이용 가능성)(Industrial availability)
본 발명의 열경화성 수지 조성물은 제조시 및 가공시의 경화제 성분의 휘발을 억제하고, 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 경화물을 부여하는 점에서 광반사용 열경화성 수지 조성물로서 유용하다. 가공시의 경화제 성분의 휘발을 억제하는 것은 작업환경의 개선, 경화물의 안정된 성능의 발현에 있어서 중요하다. 또한 열에 의한 변색을 억제하고, 광반사성 및 고온환경하에서의 신뢰성이 우수한 경화물을 얻을 수 있는 것은 고출력화하는 광반도체의 반사부재 등으로서 유용하다.The thermosetting resin composition of the present invention is an optically transparent thermosetting resin composition in that it suppresses volatilization of the curing agent component during production and processing, suppresses discoloration due to heat, and gives a cured product excellent in light reflectivity and reliability under a high temperature environment useful. Suppressing the volatilization of the curing agent component at the time of processing is important in improving the working environment and in manifesting the stable performance of the cured product. In addition, it is useful as a reflective member of an optical semiconductor for suppressing discoloration due to heat and obtaining a cured product excellent in light reflectivity and high temperature environment under high-temperature conditions.
Claims (10)
상기 말단 카르복실산의 올리고에스테르 말단 카르복실산의 올리고에스테르가 적어도 2개이상의 카르복실기를 갖고, 지방족 탄화수소기를 주골격으로 하는 열경화성 수지 조성물.The method according to claim 1,
Wherein the oligoester of the terminal carboxylic acid of the terminal carboxylic acid has at least two or more carboxyl groups and the aliphatic hydrocarbon group is the main skeleton.
상기 백색 안료가 2산화티타늄 분말인 열경화성 수지 조성물.3. The method according to claim 1 or 2,
Wherein the white pigment is a titanium dioxide powder.
상기 열경화성 수지 조성물에 있어서, 열경화후의 파장 460∼800nm에 있어서의 광반사율이 80%이상인 열경화성 수지 조성물.4. The method according to any one of claims 1 to 3,
Wherein the thermosetting resin composition has a light reflectance of 80% or more at a wavelength of 460 to 800 nm after thermosetting.
상기 백색 안료의 함유량이 열경화성 수지 조성물 전체에 대하여 5∼95중량%인 열경화성 수지 조성물.5. The method according to any one of claims 1 to 4,
Wherein the content of the white pigment is 5 to 95% by weight based on the total amount of the thermosetting resin composition.
제 1 항에 기재된 말단 카르복실산의 올리고에스테르 말단 카르복실산의 올리고에스테르가 탄소수 6이상의 2∼6관능의 다가 알콜과 포화 지방족 환상 산무수물의 반응에 의해 얻어진 화합물인 열경화성 수지 조성물.6. The method according to any one of claims 1 to 5,
The thermosetting resin composition according to claim 1, wherein the oligoester of the terminal carboxylic acid of the terminal carboxylic acid according to claim 1 is a compound obtained by reacting a polyfunctional polyhydric alcohol having 6 or more carbon atoms and a saturated aliphatic cyclic acid anhydride.
상기 포화 지방족 환상 산무수물이 헥사히드로 무수 프탈산, 메틸헥사히드로 무수 프탈산, 및 시클로헥산-1,2,4-트리카르복실산-1,2-무수물로 이루어지는 군에서 선택되는 적어도 1종의 산무수물과의 반응에 의해 얻어진 화합물인 열경화성 수지 조성물.7. The method according to any one of claims 1 to 6,
Wherein the saturated aliphatic cyclic acid anhydride is at least one acid anhydride selected from the group consisting of hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and cyclohexane-1,2,4-tricarboxylic acid-1,2- Wherein the thermosetting resin composition is a thermosetting resin composition.
광반도체 장치를 구성하는 광반사부재 형성용인 열경화성 수지 조성물.8. The method according to any one of claims 1 to 7,
A thermosetting resin composition for forming a light reflection member constituting an optical semiconductor device.
Applications Claiming Priority (3)
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JP2013260903 | 2013-12-18 | ||
JPJP-P-2013-260903 | 2013-12-18 | ||
PCT/JP2014/083458 WO2015093543A1 (en) | 2013-12-18 | 2014-12-17 | Thermosetting resin composition, method for manufacturing reflective member for optical semiconductor device using same, and optical semiconductor device |
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KR20160100943A true KR20160100943A (en) | 2016-08-24 |
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KR (1) | KR20160100943A (en) |
CN (1) | CN105849149A (en) |
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WO (1) | WO2015093543A1 (en) |
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US10859190B2 (en) | 2016-05-16 | 2020-12-08 | Victaulic Company | Sprung coupling |
TWI808973B (en) * | 2017-06-28 | 2023-07-21 | 日商迪愛生股份有限公司 | Active ester compound and curable composition |
US11781683B2 (en) | 2019-11-15 | 2023-10-10 | Victaulic Company | Shrouded coupling |
CN116082793B (en) * | 2022-12-28 | 2024-06-07 | 东莞联茂电子科技有限公司 | Epoxy resin composition for yellowing-resistant white copper-clad plate, prepreg and substrate |
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JP5179839B2 (en) * | 2007-11-08 | 2013-04-10 | 株式会社ダイセル | Epoxy resin composition and cured product thereof |
JP5713898B2 (en) * | 2009-06-22 | 2015-05-07 | 日本化薬株式会社 | Polyvalent carboxylic acid, composition thereof, curable resin composition, cured product, and method for producing polyvalent carboxylic acid |
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2014
- 2014-12-17 WO PCT/JP2014/083458 patent/WO2015093543A1/en active Application Filing
- 2014-12-17 CN CN201480070280.1A patent/CN105849149A/en active Pending
- 2014-12-17 KR KR1020167015189A patent/KR20160100943A/en not_active Application Discontinuation
- 2014-12-17 JP JP2015553589A patent/JP6147362B2/en not_active Expired - Fee Related
- 2014-12-18 TW TW103144427A patent/TW201538612A/en unknown
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JP2013138221A (en) | 2006-02-03 | 2013-07-11 | Hitachi Chemical Co Ltd | Method of manufacturing package substrate for mounting optical semiconductor element and method of manufacturing optical semiconductor device using the same |
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JP2013065899A (en) | 2008-08-18 | 2013-04-11 | Hitachi Chemical Co Ltd | Method of manufacturing package substrate for mounting optical semiconductor element and method of manufacturing optical semiconductor device using the package substrate |
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CN105849149A (en) | 2016-08-10 |
TW201538612A (en) | 2015-10-16 |
JP6147362B2 (en) | 2017-06-14 |
WO2015093543A1 (en) | 2015-06-25 |
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