KR20160099852A - Slit nozzle for slit coater and system for supplying chemical solution usting the same - Google Patents

Slit nozzle for slit coater and system for supplying chemical solution usting the same Download PDF

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Publication number
KR20160099852A
KR20160099852A KR1020150022047A KR20150022047A KR20160099852A KR 20160099852 A KR20160099852 A KR 20160099852A KR 1020150022047 A KR1020150022047 A KR 1020150022047A KR 20150022047 A KR20150022047 A KR 20150022047A KR 20160099852 A KR20160099852 A KR 20160099852A
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South Korea
Prior art keywords
nozzle
chemical solution
slit
storage container
lip
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KR1020150022047A
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Korean (ko)
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KR101692525B1 (en
Inventor
이상일
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주식회사 엔씨에스
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)

Abstract

A slit nozzle for a slit coater and a chemical solution supply system using the slit nozzle are disclosed. The slit nozzle for a slit coater according to the present invention and the chemical liquid supply system using the slit nozzle are separately provided with a chemical solution storage part for storing the chemical solution and a nozzle part for receiving the chemical solution stored in the chemical solution storage part and injecting the chemical solution into the substrate. Therefore, when it is necessary to replace the simplex of the nozzle portion or to repair the nozzle portion, the nozzle portion may be separated from the chemical liquid storage portion, and then the nozzle portion alone may be disassembled to perform necessary work. Therefore, maintenance work can have a very convenient effect.

Description

Technical Field [0001] The present invention relates to a slit nozzle for a slit coater,

The present invention relates to a slit nozzle for a slit coater having a simple maintenance operation and a chemical supply system using the slit nozzle.

A thin film that performs a specific function such as an oxide film, a metal film, or a semiconductor film is formed on a substrate such as a silicon substrate or a glass substrate at the time of manufacturing a semiconductor and a display device. In order to form a thin film on a substrate, Or the like is coated on the substrate and coated.

An apparatus for coating a substrate with a chemical solution is referred to as a slit coater, and the slit coater includes a slit nozzle. The slit nozzle is provided so as to be movable along the horizontal or vertical direction of the substrate, and is sprayed with the chemical liquid sprayed on the surface of the substrate while moving along the substrate.

A conventional nozzle device 320 disclosed in Korean Patent Laid-Open No. 10-2010-0031271 includes a first lip 322 and a second lip 324 which are mutually correspondingly formed and coupled to each other. A chamber for storing the coating liquid is formed on the opposing surfaces of the first lip 322 and the second lip 324 which are in contact with each other and a lowermost portion 326 of the first lip 322 and the second lip 324, A slit for spraying the coating liquid is formed.

The first lip 322 or the second lip 324 is provided with an inlet pipe (not shown) for supplying a liquid to the chamber, a plurality of discharge pipes (not shown) for discharging bubbles contained in the liquid flowing into the chamber to the outside City) is installed.

A shim plate forming the width of the slit is interposed between the first lip 322 and the second lip 324. That is, since the thickness of the shim plate is equal to the width of the slit, the thickness of the shim plate may be appropriately set according to specifications of the product.

In the conventional nozzle device 320, when the slit portion needs to be cleaned, the inlet pipe and the outlet pipe are separated from each other, and then the first lip 322 and the second lip 324 are separated from each other shall. In order to change the width of the slit by replacing the simple rate, the inlet pipe and the outlet pipe are separated from each other, and then the first lip 322 and the second lip 324 are separated from each other, Replace the simple rate.

Therefore, the conventional nozzle device 320 has a disadvantage that the maintenance work is inconvenient.

It is an object of the present invention to provide a slit nozzle for a slit coater and a drug solution supply system using the slit nozzle for solving all the problems of the conventional art.

It is another object of the present invention to provide a slit nozzle for a slit coater and a drug solution supply system using the slit nozzle for easily performing a maintenance operation.

According to an aspect of the present invention, there is provided a slit nozzle for a slit coater, comprising: a chemical solution storage unit in which a chamber for storing a chemical solution is formed; The upper portion may communicate with the chamber and the lower portion may include a nozzle portion formed with a slit toward the substrate on which the chemical liquid is coated to spray the chemical liquid of the chamber onto the substrate. .

According to another aspect of the present invention, there is provided a chemical liquid supply system including: a chemical liquid storage part in which a chamber for storing a chemical liquid is formed; a chemical liquid reservoir part detachably coupled to a lower surface of the chemical liquid storage part, A slit nozzle having a nozzle portion formed with a slit facing the substrate to be coated and spraying the chemical solution of the chamber onto the substrate and applying the slit; A casing for receiving and supporting a storage container for storing a chemical solution; a drive module for rotating the storage container; a chemical agent chamber located in the interior of the casing and positioned inside the storage container, And a stirrer for stirring and feeding the slurry to the slit nozzle.

The slit nozzle for a slit coater according to an embodiment of the present invention and the chemical liquid supply system using the slit nozzle according to the embodiment of the present invention are separately provided with a chemical solution storage portion for storing the chemical solution and a nozzle portion for receiving the chemical solution stored in the chemical solution storage portion, Therefore, when it is necessary to replace the simplex of the nozzle portion or to repair the nozzle portion, the nozzle portion may be separated from the chemical liquid storage portion, and then the nozzle portion alone may be disassembled to perform necessary work. Therefore, maintenance work can have a very convenient effect.

1 is a perspective view of a slit nozzle according to an embodiment of the present invention;
Fig. 2 is an exploded perspective view of Fig. 1; Fig.
3 is a rear exploded perspective view of Fig. 1; Fig.
4 is a sectional view taken along the line "AA" in Fig.
5 is a perspective view of a chemical supply system according to an embodiment of the present invention.
FIG. 6 is a perspective view showing a state in which the support plate of the chemical liquid supply apparatus shown in FIG. 5 is lowered.
Fig. 7 is a bottom view of Fig. 6; Fig.
8 is a schematic sectional view of the main part of Figs. 6 and 7. Fig.

It should be noted that, in the specification of the present invention, the same reference numerals as in the drawings denote the same elements, but they are numbered as much as possible even if they are shown in different drawings.

Meanwhile, the meaning of the terms described in the present specification should be understood as follows.

The word " first, "" second," and the like, used to distinguish one element from another, are to be understood to include plural representations unless the context clearly dictates otherwise. The scope of the right should not be limited by these terms.

It should be understood that the terms "comprises" or "having" does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

It should be understood that the term "at least one" includes all possible combinations from one or more related items. For example, the meaning of "at least one of the first item, the second item and the third item" means not only the first item, the second item or the third item, but also the second item and the second item among the first item, Means any combination of items that can be presented from more than one.

The term "above" means not only when a configuration is formed directly on top of another configuration, but also when a third configuration is interposed between these configurations.

Hereinafter, a slit nozzle for a slit coater according to an embodiment of the present invention and a chemical solution supply system using the slit nozzle will be described in detail with reference to the accompanying drawings.

Fig. 1 is a perspective view of a slit nozzle according to an embodiment of the present invention, Fig. 2 is an exploded perspective view of Fig. 1, Fig. 3 is an exploded rear perspective view of Fig. 1 and Fig. 4 is a cross- .

As shown in the drawing, the slit nozzle 100 according to the embodiment of the present invention can be used in a slit coater (not shown) for spraying and coating a chemical solution on the surface of a substrate such as a silicon substrate or a glass substrate. The slit coater may include a frame, a table installed on the frame, a table on which the substrate is mounted and supported, and a transfer rail installed on the frame so as to be movable along the horizontal or vertical direction of the substrate.

The slit nozzle 100 according to the present embodiment may be installed on the conveyance rail and move together with the conveyance rail, and may include a chemical solution storage unit 110 and a nozzle unit 130.

The chemical solution storage part 110 may include a first die 111 and a second die 113 formed in a block shape corresponding to each other, And the inner surface of the second die 113 can be brought into contact with each other. At this time, it is natural that the first die 111 and the second die 113 can be separated from each other.

Between the first die 111 and the second die 113, a chamber 110a (see FIGS. 3 and 4) in which a chemical solution is stored may be formed. The chamber 110a may be formed on the inner surface of the first die 111 and the first die 111 may be provided with an inlet pipe 115 and a discharge pipe 117. [

One side of the inflow pipe 115 can communicate with the chamber 110a and the other side can communicate with the chemical liquid supply device 200 (see Fig. 5) for supplying the chemical liquid. Thus, the chemical liquid supplied from the chemical liquid supply device 200 can be introduced into the chamber 110a through the inlet pipe 115. [

One side of the discharge pipe 117 can communicate with the chamber 110a and the other side can communicate with the outside of the first die 111. [ Bubbles may be contained in the chemical liquid introduced into the chamber 110a from the chemical liquid supply device 200. The bubbles contained in the chemical liquid may be discharged to the outside of the first die 111 through the discharge pipe 117. [

A plurality of discharge pipes 117 may be provided and a guide path 110b for guiding bubbles contained in the chemical solution to the discharge pipe 117 side is formed on the inner surface of the first die 111 located on the upper side of the chamber 110a 3 and 4) may be formed so as to correspond to the discharge pipe 117. At this time, it is natural that one side of the guide path 110b is communicated with the chamber 110a and the other side is communicated with the side of the discharge tube 117.

The chamber 110a may be recessed on the inner surface of the second die 113. At this time, it is natural that the inflow pipe 115, the discharge pipe 117, and the guide path 110b are provided or formed on the second die 113.

The nozzle unit 130 may be detachably coupled to the lower surface of the first die 111 and the lower surface of the second die 113 which are the lower surface of the chemical solution storage unit 110, A slit 130a (see FIG. 4) can be formed.

The nozzle unit 130 may include a first nozzle lip 131 and a second nozzle lip 133 formed to correspond to each other and coupled to each other while being mutually opposed to each other. The lower portion of the first nozzle lip 131 and the lower portion of the second nozzle lip 133 may be inclined so as to correspond to each other. When the first nozzle lip 131 and the second nozzle lip 133 are coupled The lower portion of the first nozzle lip 131 and the lower portion of the second nozzle lip 133 may be inclined so as to gradually approach the lower side. It is a matter of course that the first nozzle lip 131 and the second nozzle lip 133 can be separated from each other.

A shim plate 135 may be interposed between the first nozzle lip 131 and the second nozzle lip 133 and the simplex 135 may be provided in a pair having mutually spaced intervals.

In detail, one of the simplifications 135 can be interposed on the left end side of the first nozzle lip 131 and the second nozzle lip 133, and the other simplification 135 can be interposed between the first nozzle lip 131 and the second nozzle lip 133, And may be interposed at the right end side of the lip 131 and the second nozzle lip 133.

One of the simplifications 135 and the other of the simplifications 135 may be spaced apart from each other by a first nozzle lip 135 formed between one of the simplifications 135 and the other of the shims 135 131 and the second nozzle lip 133 functions as a slit 130a for spraying the chemical solution stored in the chamber 110a. That is, the distance between any one of the simplexes 135 and one of the simplexes 135 corresponds to the length of the slit 130a, and the thickness of the simplex 135 corresponds to the width of the slit 130a .

The upper end of the slit 130a may communicate with the chamber 110a and the lower end of the slit 130a may be directed toward the substrate to spray the chemical solution of the chamber 110a onto the substrate.

The slit nozzle 100 according to the present embodiment has a chemical solution storage part 110 in which a chemical solution is stored and a nozzle part 130 for receiving a chemical solution stored in the chemical solution storage part 110 and injecting the solution into the substrate. The nozzle unit 130 is detached from the chemical solution storage unit 110 and then the nozzle unit 130 is removed from the nozzle unit 130. In this case, It is very convenient to disassemble and perform necessary work.

Next, a chemical liquid supply system according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 5 is a perspective view of a chemical solution supply system according to an embodiment of the present invention, FIG. 6 is a perspective view showing a state where a support plate of the chemical solution supply apparatus shown in FIG. 5 is lowered, FIG. 7 is a bottom perspective view of FIG. 8 is a schematic sectional view of the main part of Figs. 6 and 7. Fig.

As shown, the chemical liquid supply system according to the present embodiment may include a chemical liquid supply device 200, and the chemical liquid supply device 200 may stir the chemical liquid to remove the bubbles contained in the chemical liquid. Then, the chemical liquid supply device 200 can supply the chemical liquid from which the bubbles have been removed to the inlet pipe 115 of the slit nozzle 100.

The chemical solution may include a resist solution, a developer or a color filter, and may be coated on a substrate such as a silicon substrate or a glass substrate. The slit nozzle 100 may be coated with a chemical liquid from which air bubbles have been removed.

The chemical solution supply apparatus 200 according to the present embodiment may include a casing 210, a drive module 230 and a stirrer 250. The chemical solution supply apparatus 200 according to the present embodiment may be configured such that the storage container 50, And causes the chemical liquid to be stirred by the rotation of the storage container 50.

Hereinafter, referring to the directions and surfaces of the components including the casing 210, the direction and the direction of the upper side of the casing 210 are referred to as "upper and upper surfaces", the direction toward the lower side and the surfaces are referred to as " do.

The casing 210 may include an upper casing 211 and a receiving plate 215. A storage container 50 storing a chemical solution may be received in the casing 210. [

The upper casing 211 can be opened on the lower surface and relatively positioned on the upper side. The support plate 215 can be installed on the lower side of the upper casing 211 so as to be able to be raised and lowered, and the lower surface of the upper casing 211 can be closed or opened while being raised or lowered.

That is, when the support plate 215 rises, the upper surface of the support plate 215 contacts with the lower end surface of the upper casing 211, so that the open lower surface of the upper casing 211 can be sealed, The lower face of the upper casing 211 can be opened because the upper face of the receiving plate 215 is spaced apart from the lower end face of the upper casing 211. [

A flange 212 may be formed on the lower end surface of the upper casing 211. A ring-shaped sealing member 213 (see FIGS. 7 and 8) may be provided between the flange 212 and the receiving plate 215, and a sealing member 213 may be provided on the flange 212 and the receiving plate 215. [ Ring shaped recesses 212a and 215a (see FIG. 6 in FIG. 6) in which the upper and lower portions of the ring-shaped recesses are respectively inserted and accommodated can be formed. When the support plate 215 rises, the sealing member 213 is inserted into and adhered to the guide paths 212a and 215a so that the lower surface of the upper case 211 can be firmly sealed.

The storage container 50 can be supported on the upper surface side of the support plate 215 and the storage container 50 can be moved up and down by the support plate 215. One side of the support bracket 216 can be provided on the support plate 215 so that the support plate 215 can be stably lifted and lowered and the other side of the support bracket 216 is supported on a plurality of support bars 217 And can be inserted and supported. It is natural that the support bar 217 is parallel to the lifting and lowering direction of the support plate 215.

The driving module 230 includes a rotation / support member 231 and a motor 235 and supports the storage container 50 inserted into the casing 210 to rotate the storage container 50.

The rotation / support member 231 may be installed on the upper surface of the support plate 215 to move together with the support plate 215 and may be independently rotatable with respect to the support plate 215.

The lower surface of the storage container 50 is mounted on the upper surface of the rotation / support member 231. The rotation / support member 231 is rotatably supported by the rotation / support member 231 so that the storage container 50 can be stably supported on the rotation / May be formed in a cup shape corresponding to a lower portion of the storage container 50. Then, the lower portion of the storage container 50 is inserted and supported in the rotation / support member 231, so that the storage container 50 can be stably supported on the rotation / support member 231.

The motor 235 may be mounted on the lower surface of the support plate 215 to rotate the rotation / support member 231. The rotation of the rotation / support member 231 rotates the storage container 50, and the motor 235 ascends and descends with the support plate 215.

The agitator 250 allows the chemical liquid to be stirred by the rotation of the storage container 50, and may include the discharge pipe 251 and the blade 255.

The upper end of the discharge pipe 251 may be positioned on the upper surface of the upper casing 211 of the casing 210 and the lower portion thereof may be located inside the upper casing 211 to be located inside the storage container 50 . The blade 255 may be formed on the outer circumferential surface of the discharge tube 251 located inside the storage container 50.

When the storage container 50 supported by the rotation / support member 231 of the drive module 230 is rotated by the drive module 230, the chemical solution stored in the storage container 50 is supplied to the blade of the agitator 250 (Not shown). Accordingly, the bubbles contained in the chemical liquid can be removed, and the bubbles are introduced into the casing 210 through the opened upper surface of the storage container 50, and then discharged through a plurality of discharge holes (not shown) formed in the casing 210, To the outside of the casing (210).

Air is injected into one side of the casing 210 to inject air into the casing 210 so that the chemical liquid from which the air bubbles have been removed can be supplied through the discharge pipe 251 to a use place such as the above- A pipe (not shown) can be installed in communication. When the air is injected into the casing 210 through the air injection pipe, the chemical liquid is pressurized by the air, and the chemical liquid from which the air bubbles are removed is discharged through the discharge pipe 251 at a predetermined pressure.

The chemical liquid supply apparatus 200 according to the present embodiment is configured such that the chemical liquid from which air bubbles have been removed is discharged to the place of use through the agitator 250.

The operation of the chemical liquid supply device 200 according to the present embodiment will be described.

And the storage container 50 in which the chemical liquid is stored is supported on the rotation / support member 231 while the support plate 215 is lowered. Thereafter, when the support plate 215 is raised, the lower surface of the upper casing 211 is closed by the support plate 215, and the storage container 50 is raised. Then, the discharge tube 251 and the blade 255 of the stirrer 250 are positioned inside the storage container 50. [

In this state, when the rotation / support member 231 is rotated, the chemical solution in the storage container 50 is stirred, so that the bubbles contained in the chemical solution are removed. The chemical liquid from which the air bubbles have been removed is discharged to the place of use through the discharge pipe 251 by the pressure of the air injected into the casing 210.

The chemical liquid supply apparatus 200 according to the present embodiment is installed inside the casing 210 and rotates the storage container 50 in which the chemical liquid is stored. That is, since the bubble is removed by rotating the storage container 50 itself, the defoaming process time can be shortened as compared with the case where bubbles are removed after the chemical liquid in the storage container 50 is injected into the casing 210.

When the user wants to use a different type of chemical solution than the chemical solution in use, it is not necessary to clean the casing since the storage container can be replaced.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Will be clear to those who have knowledge of. Therefore, the scope of the present invention is defined by the appended claims, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be interpreted as being included in the scope of the present invention.

110: chemical solution storage part
111: first die
113: second die
130:
131: first nozzle lip
133: second nozzle lip
135: Simplicity

Claims (12)

A chemical solution storage portion in which a chamber for storing a chemical solution is formed;
And a nozzle part connected to the lower surface of the chemical solution storage part in a detachable manner and having an upper end communicating with the chamber and a lower end formed with a slit toward the substrate to be coated with the chemical solution, A slit nozzle for a slit coater. The method according to claim 1,
The chemical-
A first die;
A second die coupled to the first die and defining the chamber between the first die and the second die,
In the nozzle unit,
A first nozzle lip (Lip);
A second nozzle lip coupled to the first nozzle lip;
And a shim plate interposed between the first nozzle lip and the second nozzle lip to allow the slit to be formed between the first nozzle lip and the second nozzle lip. Slit nozzle. 3. The method of claim 2,
Wherein the pair of simpleples are provided at mutually spaced intervals,
Wherein a space between the first nozzle lip and the second nozzle lip formed between a pair of the simplexes is the slit. The method according to claim 1,
The chemical solution reservoir is provided with an inlet pipe communicating with the chamber on one side and a chemical solution supply device side on the other side for supplying a chemical solution,
Wherein the chemical liquid storage portion is provided with a discharge pipe communicating with the chamber at one side thereof and communicating with the outside of the chemical liquid storage portion at the other side thereof for discharging bubbles contained in the chemical liquid. 5. The method of claim 4,
Wherein a guide path for guiding bubbles contained in the chemical solution into the discharge tube side is formed in the chemical solution storage portion. A chemical solution storage portion in which a chamber for storing a chemical solution is formed, a slit that is detachably coupled to a lower surface of the chemical solution storage portion, the upper portion communicates with the chamber, and the lower portion has a slit toward a substrate on which the chemical solution is coated, A slit nozzle having a nozzle portion for spraying and applying;
A casing for receiving and supporting a storage container for storing a chemical solution; a drive module for rotating the storage container; a chemical agent chamber located in the interior of the casing and positioned inside the storage container, And a chemical liquid supply device having an agitator for agitating and supplying the slit nozzle to the slit nozzle. The method according to claim 6,
The chemical-
A first die;
A second die coupled to the first die and defining the chamber between the first die and the second die,
In the nozzle unit,
A first nozzle lip (Lip);
A second nozzle lip coupled to the first nozzle lip;
And a shim plate interposed between the first nozzle lip and the second nozzle lip to allow the slit to be formed between the first nozzle lip and the second nozzle lip. . 8. The method of claim 7,
Wherein the pair of simpleples are provided at mutually spaced intervals,
A space between the first nozzle lip and the second nozzle lip formed between a pair of the simplexes is the slit,
The chemical solution reservoir is provided with an inlet pipe communicating with the chamber on one side and a chemical solution supply device side on the other side for supplying a chemical solution,
The chemical solution reservoir portion is provided with a discharge pipe communicating with the chamber at one side and communicating with the outside of the chemical solution reservoir at the other side for discharging bubbles contained in the chemical solution,
And a guide path for guiding bubbles contained in the chemical liquid into the discharge port side is formed in the chemical liquid storage portion. The method according to claim 6,
The stirrer may include:
A discharge tube for discharging and supplying a chemical solution of the storage container to the slit nozzle, the upper end portion being located on the upper surface of the casing, the lower portion being located inside the casing and located inside the storage container;
And a plurality of blades formed on an outer circumferential surface of the discharge tube, the blades being disposed inside the storage container and allowing the chemical solution of the storage container to be stirred when the storage container is rotated. The method according to claim 6,
The casing includes an upper casing opened at a lower surface thereof;
And a support plate installed to be able to move up and down to close or open the opened lower surface of the upper casing and support the storage container to raise and lower the storage container,
A flange is formed on the lower end face of the upper casing,
A ring-shaped sealing member is interposed between the flange and the receiving plate,
Wherein the flange and the foot plate are provided with a guide passage into which one side portion and the other side portion of the sealing member are inserted. 11. The method of claim 10,
The support plate is provided with a support bracket,
Wherein the support bracket is inserted into and supported by a support bar provided in parallel with the elevation direction of the support plate to support the elevation of the support plate. The method according to claim 6,
The driving module includes:
A rotation / support member installed on an upper surface of the support plate, moving together with the support plate, rotatably installed independently of the support plate, and supporting the storage container to rotate the storage container;
And a motor installed on a lower surface of the support plate for rotating the rotation / support member,
Wherein the rotation / support member is formed in a cup shape to receive a lower portion of the storage container.
KR1020150022047A 2015-02-13 2015-02-13 Slit nozzle for slit coater and system for supplying chemical solution usting the same KR101692525B1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200131620A (en) * 2019-05-14 2020-11-24 주식회사 엘지화학 Slot die coating device having air vent
CN113976393A (en) * 2021-11-15 2022-01-28 安徽吉曜玻璃微纤有限公司 Cotton rubberizing device of wainscot glass
EP4190456A4 (en) * 2020-11-13 2024-02-21 Lg Energy Solution Ltd Dual slot die coater comprising air vent

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JP2004216202A (en) * 2003-01-09 2004-08-05 Mitsubishi Materials Corp Applicator
JP2004283820A (en) * 2003-03-03 2004-10-14 Toray Ind Inc Slit dye and method and device for manufacturing base having coating film
KR20070122100A (en) * 2006-06-23 2007-12-28 엘지.필립스 엘시디 주식회사 Slit coater
KR101363391B1 (en) * 2013-07-30 2014-02-20 에이시디(주) Device for supplying the non-bubble fluid

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Publication number Priority date Publication date Assignee Title
JP2004216202A (en) * 2003-01-09 2004-08-05 Mitsubishi Materials Corp Applicator
JP2004283820A (en) * 2003-03-03 2004-10-14 Toray Ind Inc Slit dye and method and device for manufacturing base having coating film
KR20070122100A (en) * 2006-06-23 2007-12-28 엘지.필립스 엘시디 주식회사 Slit coater
KR101363391B1 (en) * 2013-07-30 2014-02-20 에이시디(주) Device for supplying the non-bubble fluid

Cited By (6)

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Publication number Priority date Publication date Assignee Title
KR20200131620A (en) * 2019-05-14 2020-11-24 주식회사 엘지화학 Slot die coating device having air vent
EP3915687A4 (en) * 2019-05-14 2022-04-13 LG Energy Solution, Ltd. Slot-die coating apparatus comprising air vent
US11819876B2 (en) 2019-05-14 2023-11-21 Lg Energy Solution, Ltd. Slot die coating device having air vent
EP4243110A3 (en) * 2019-05-14 2023-12-13 LG Energy Solution, Ltd. Slot-die coating apparatus comprising air vent
EP4190456A4 (en) * 2020-11-13 2024-02-21 Lg Energy Solution Ltd Dual slot die coater comprising air vent
CN113976393A (en) * 2021-11-15 2022-01-28 安徽吉曜玻璃微纤有限公司 Cotton rubberizing device of wainscot glass

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