KR20160099852A - Slit nozzle for slit coater and system for supplying chemical solution usting the same - Google Patents
Slit nozzle for slit coater and system for supplying chemical solution usting the same Download PDFInfo
- Publication number
- KR20160099852A KR20160099852A KR1020150022047A KR20150022047A KR20160099852A KR 20160099852 A KR20160099852 A KR 20160099852A KR 1020150022047 A KR1020150022047 A KR 1020150022047A KR 20150022047 A KR20150022047 A KR 20150022047A KR 20160099852 A KR20160099852 A KR 20160099852A
- Authority
- KR
- South Korea
- Prior art keywords
- nozzle
- chemical solution
- slit
- storage container
- lip
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Abstract
A slit nozzle for a slit coater and a chemical solution supply system using the slit nozzle are disclosed. The slit nozzle for a slit coater according to the present invention and the chemical liquid supply system using the slit nozzle are separately provided with a chemical solution storage part for storing the chemical solution and a nozzle part for receiving the chemical solution stored in the chemical solution storage part and injecting the chemical solution into the substrate. Therefore, when it is necessary to replace the simplex of the nozzle portion or to repair the nozzle portion, the nozzle portion may be separated from the chemical liquid storage portion, and then the nozzle portion alone may be disassembled to perform necessary work. Therefore, maintenance work can have a very convenient effect.
Description
The present invention relates to a slit nozzle for a slit coater having a simple maintenance operation and a chemical supply system using the slit nozzle.
A thin film that performs a specific function such as an oxide film, a metal film, or a semiconductor film is formed on a substrate such as a silicon substrate or a glass substrate at the time of manufacturing a semiconductor and a display device. In order to form a thin film on a substrate, Or the like is coated on the substrate and coated.
An apparatus for coating a substrate with a chemical solution is referred to as a slit coater, and the slit coater includes a slit nozzle. The slit nozzle is provided so as to be movable along the horizontal or vertical direction of the substrate, and is sprayed with the chemical liquid sprayed on the surface of the substrate while moving along the substrate.
A conventional nozzle device 320 disclosed in Korean Patent Laid-Open No. 10-2010-0031271 includes a first lip 322 and a second lip 324 which are mutually correspondingly formed and coupled to each other. A chamber for storing the coating liquid is formed on the opposing surfaces of the first lip 322 and the second lip 324 which are in contact with each other and a lowermost portion 326 of the first lip 322 and the second lip 324, A slit for spraying the coating liquid is formed.
The first lip 322 or the second lip 324 is provided with an inlet pipe (not shown) for supplying a liquid to the chamber, a plurality of discharge pipes (not shown) for discharging bubbles contained in the liquid flowing into the chamber to the outside City) is installed.
A shim plate forming the width of the slit is interposed between the first lip 322 and the second lip 324. That is, since the thickness of the shim plate is equal to the width of the slit, the thickness of the shim plate may be appropriately set according to specifications of the product.
In the conventional nozzle device 320, when the slit portion needs to be cleaned, the inlet pipe and the outlet pipe are separated from each other, and then the first lip 322 and the second lip 324 are separated from each other shall. In order to change the width of the slit by replacing the simple rate, the inlet pipe and the outlet pipe are separated from each other, and then the first lip 322 and the second lip 324 are separated from each other, Replace the simple rate.
Therefore, the conventional nozzle device 320 has a disadvantage that the maintenance work is inconvenient.
It is an object of the present invention to provide a slit nozzle for a slit coater and a drug solution supply system using the slit nozzle for solving all the problems of the conventional art.
It is another object of the present invention to provide a slit nozzle for a slit coater and a drug solution supply system using the slit nozzle for easily performing a maintenance operation.
According to an aspect of the present invention, there is provided a slit nozzle for a slit coater, comprising: a chemical solution storage unit in which a chamber for storing a chemical solution is formed; The upper portion may communicate with the chamber and the lower portion may include a nozzle portion formed with a slit toward the substrate on which the chemical liquid is coated to spray the chemical liquid of the chamber onto the substrate. .
According to another aspect of the present invention, there is provided a chemical liquid supply system including: a chemical liquid storage part in which a chamber for storing a chemical liquid is formed; a chemical liquid reservoir part detachably coupled to a lower surface of the chemical liquid storage part, A slit nozzle having a nozzle portion formed with a slit facing the substrate to be coated and spraying the chemical solution of the chamber onto the substrate and applying the slit; A casing for receiving and supporting a storage container for storing a chemical solution; a drive module for rotating the storage container; a chemical agent chamber located in the interior of the casing and positioned inside the storage container, And a stirrer for stirring and feeding the slurry to the slit nozzle.
The slit nozzle for a slit coater according to an embodiment of the present invention and the chemical liquid supply system using the slit nozzle according to the embodiment of the present invention are separately provided with a chemical solution storage portion for storing the chemical solution and a nozzle portion for receiving the chemical solution stored in the chemical solution storage portion, Therefore, when it is necessary to replace the simplex of the nozzle portion or to repair the nozzle portion, the nozzle portion may be separated from the chemical liquid storage portion, and then the nozzle portion alone may be disassembled to perform necessary work. Therefore, maintenance work can have a very convenient effect.
1 is a perspective view of a slit nozzle according to an embodiment of the present invention;
Fig. 2 is an exploded perspective view of Fig. 1; Fig.
3 is a rear exploded perspective view of Fig. 1; Fig.
4 is a sectional view taken along the line "AA" in Fig.
5 is a perspective view of a chemical supply system according to an embodiment of the present invention.
FIG. 6 is a perspective view showing a state in which the support plate of the chemical liquid supply apparatus shown in FIG. 5 is lowered.
Fig. 7 is a bottom view of Fig. 6; Fig.
8 is a schematic sectional view of the main part of Figs. 6 and 7. Fig.
It should be noted that, in the specification of the present invention, the same reference numerals as in the drawings denote the same elements, but they are numbered as much as possible even if they are shown in different drawings.
Meanwhile, the meaning of the terms described in the present specification should be understood as follows.
The word " first, "" second," and the like, used to distinguish one element from another, are to be understood to include plural representations unless the context clearly dictates otherwise. The scope of the right should not be limited by these terms.
It should be understood that the terms "comprises" or "having" does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.
It should be understood that the term "at least one" includes all possible combinations from one or more related items. For example, the meaning of "at least one of the first item, the second item and the third item" means not only the first item, the second item or the third item, but also the second item and the second item among the first item, Means any combination of items that can be presented from more than one.
The term "above" means not only when a configuration is formed directly on top of another configuration, but also when a third configuration is interposed between these configurations.
Hereinafter, a slit nozzle for a slit coater according to an embodiment of the present invention and a chemical solution supply system using the slit nozzle will be described in detail with reference to the accompanying drawings.
Fig. 1 is a perspective view of a slit nozzle according to an embodiment of the present invention, Fig. 2 is an exploded perspective view of Fig. 1, Fig. 3 is an exploded rear perspective view of Fig. 1 and Fig. 4 is a cross- .
As shown in the drawing, the
The
The chemical
Between the
One side of the
One side of the
A plurality of
The
The
The
A
In detail, one of the
One of the
The upper end of the
The
Next, a chemical liquid supply system according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 5 is a perspective view of a chemical solution supply system according to an embodiment of the present invention, FIG. 6 is a perspective view showing a state where a support plate of the chemical solution supply apparatus shown in FIG. 5 is lowered, FIG. 7 is a bottom perspective view of FIG. 8 is a schematic sectional view of the main part of Figs. 6 and 7. Fig.
As shown, the chemical liquid supply system according to the present embodiment may include a chemical
The chemical solution may include a resist solution, a developer or a color filter, and may be coated on a substrate such as a silicon substrate or a glass substrate. The
The chemical
Hereinafter, referring to the directions and surfaces of the components including the
The
The
That is, when the
A
The
The
The rotation /
The lower surface of the
The
The
The upper end of the
When the
Air is injected into one side of the
The chemical
The operation of the chemical
And the
In this state, when the rotation /
The chemical
When the user wants to use a different type of chemical solution than the chemical solution in use, it is not necessary to clean the casing since the storage container can be replaced.
It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Will be clear to those who have knowledge of. Therefore, the scope of the present invention is defined by the appended claims, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be interpreted as being included in the scope of the present invention.
110: chemical solution storage part
111: first die
113: second die
130:
131: first nozzle lip
133: second nozzle lip
135: Simplicity
Claims (12)
And a nozzle part connected to the lower surface of the chemical solution storage part in a detachable manner and having an upper end communicating with the chamber and a lower end formed with a slit toward the substrate to be coated with the chemical solution, A slit nozzle for a slit coater.
The chemical-
A first die;
A second die coupled to the first die and defining the chamber between the first die and the second die,
In the nozzle unit,
A first nozzle lip (Lip);
A second nozzle lip coupled to the first nozzle lip;
And a shim plate interposed between the first nozzle lip and the second nozzle lip to allow the slit to be formed between the first nozzle lip and the second nozzle lip. Slit nozzle.
Wherein the pair of simpleples are provided at mutually spaced intervals,
Wherein a space between the first nozzle lip and the second nozzle lip formed between a pair of the simplexes is the slit.
The chemical solution reservoir is provided with an inlet pipe communicating with the chamber on one side and a chemical solution supply device side on the other side for supplying a chemical solution,
Wherein the chemical liquid storage portion is provided with a discharge pipe communicating with the chamber at one side thereof and communicating with the outside of the chemical liquid storage portion at the other side thereof for discharging bubbles contained in the chemical liquid.
Wherein a guide path for guiding bubbles contained in the chemical solution into the discharge tube side is formed in the chemical solution storage portion.
A casing for receiving and supporting a storage container for storing a chemical solution; a drive module for rotating the storage container; a chemical agent chamber located in the interior of the casing and positioned inside the storage container, And a chemical liquid supply device having an agitator for agitating and supplying the slit nozzle to the slit nozzle.
The chemical-
A first die;
A second die coupled to the first die and defining the chamber between the first die and the second die,
In the nozzle unit,
A first nozzle lip (Lip);
A second nozzle lip coupled to the first nozzle lip;
And a shim plate interposed between the first nozzle lip and the second nozzle lip to allow the slit to be formed between the first nozzle lip and the second nozzle lip. .
Wherein the pair of simpleples are provided at mutually spaced intervals,
A space between the first nozzle lip and the second nozzle lip formed between a pair of the simplexes is the slit,
The chemical solution reservoir is provided with an inlet pipe communicating with the chamber on one side and a chemical solution supply device side on the other side for supplying a chemical solution,
The chemical solution reservoir portion is provided with a discharge pipe communicating with the chamber at one side and communicating with the outside of the chemical solution reservoir at the other side for discharging bubbles contained in the chemical solution,
And a guide path for guiding bubbles contained in the chemical liquid into the discharge port side is formed in the chemical liquid storage portion.
The stirrer may include:
A discharge tube for discharging and supplying a chemical solution of the storage container to the slit nozzle, the upper end portion being located on the upper surface of the casing, the lower portion being located inside the casing and located inside the storage container;
And a plurality of blades formed on an outer circumferential surface of the discharge tube, the blades being disposed inside the storage container and allowing the chemical solution of the storage container to be stirred when the storage container is rotated.
The casing includes an upper casing opened at a lower surface thereof;
And a support plate installed to be able to move up and down to close or open the opened lower surface of the upper casing and support the storage container to raise and lower the storage container,
A flange is formed on the lower end face of the upper casing,
A ring-shaped sealing member is interposed between the flange and the receiving plate,
Wherein the flange and the foot plate are provided with a guide passage into which one side portion and the other side portion of the sealing member are inserted.
The support plate is provided with a support bracket,
Wherein the support bracket is inserted into and supported by a support bar provided in parallel with the elevation direction of the support plate to support the elevation of the support plate.
The driving module includes:
A rotation / support member installed on an upper surface of the support plate, moving together with the support plate, rotatably installed independently of the support plate, and supporting the storage container to rotate the storage container;
And a motor installed on a lower surface of the support plate for rotating the rotation / support member,
Wherein the rotation / support member is formed in a cup shape to receive a lower portion of the storage container.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150022047A KR101692525B1 (en) | 2015-02-13 | 2015-02-13 | Slit nozzle for slit coater and system for supplying chemical solution usting the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150022047A KR101692525B1 (en) | 2015-02-13 | 2015-02-13 | Slit nozzle for slit coater and system for supplying chemical solution usting the same |
Publications (2)
Publication Number | Publication Date |
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KR20160099852A true KR20160099852A (en) | 2016-08-23 |
KR101692525B1 KR101692525B1 (en) | 2017-01-03 |
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KR1020150022047A KR101692525B1 (en) | 2015-02-13 | 2015-02-13 | Slit nozzle for slit coater and system for supplying chemical solution usting the same |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200131620A (en) * | 2019-05-14 | 2020-11-24 | 주식회사 엘지화학 | Slot die coating device having air vent |
CN113976393A (en) * | 2021-11-15 | 2022-01-28 | 安徽吉曜玻璃微纤有限公司 | Cotton rubberizing device of wainscot glass |
EP4190456A4 (en) * | 2020-11-13 | 2024-02-21 | LG Energy Solution, Ltd. | Dual slot die coater comprising air vent |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004216202A (en) * | 2003-01-09 | 2004-08-05 | Mitsubishi Materials Corp | Applicator |
JP2004283820A (en) * | 2003-03-03 | 2004-10-14 | Toray Ind Inc | Slit dye and method and device for manufacturing base having coating film |
KR20070122100A (en) * | 2006-06-23 | 2007-12-28 | 엘지.필립스 엘시디 주식회사 | Slit coater |
KR101363391B1 (en) * | 2013-07-30 | 2014-02-20 | 에이시디(주) | Device for supplying the non-bubble fluid |
-
2015
- 2015-02-13 KR KR1020150022047A patent/KR101692525B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004216202A (en) * | 2003-01-09 | 2004-08-05 | Mitsubishi Materials Corp | Applicator |
JP2004283820A (en) * | 2003-03-03 | 2004-10-14 | Toray Ind Inc | Slit dye and method and device for manufacturing base having coating film |
KR20070122100A (en) * | 2006-06-23 | 2007-12-28 | 엘지.필립스 엘시디 주식회사 | Slit coater |
KR101363391B1 (en) * | 2013-07-30 | 2014-02-20 | 에이시디(주) | Device for supplying the non-bubble fluid |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200131620A (en) * | 2019-05-14 | 2020-11-24 | 주식회사 엘지화학 | Slot die coating device having air vent |
EP3915687A4 (en) * | 2019-05-14 | 2022-04-13 | LG Energy Solution, Ltd. | Slot-die coating apparatus comprising air vent |
US11819876B2 (en) | 2019-05-14 | 2023-11-21 | Lg Energy Solution, Ltd. | Slot die coating device having air vent |
EP4243110A3 (en) * | 2019-05-14 | 2023-12-13 | LG Energy Solution, Ltd. | Slot-die coating apparatus comprising air vent |
EP4190456A4 (en) * | 2020-11-13 | 2024-02-21 | LG Energy Solution, Ltd. | Dual slot die coater comprising air vent |
CN113976393A (en) * | 2021-11-15 | 2022-01-28 | 安徽吉曜玻璃微纤有限公司 | Cotton rubberizing device of wainscot glass |
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Publication number | Publication date |
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KR101692525B1 (en) | 2017-01-03 |
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