KR20160083419A - Apparatus and method for treating substrate, and discharge rate measuring unit - Google Patents

Abstract

The present invention relates to a substrate treatment apparatus. According to one embodiment of the present invention, the substrate treatment apparatus comprises: a support unit supporting a substrate; a nozzle unit having one or more heads injecting treatment solution to the substrate supported by the support unit; and a discharge amount measurement unit measuring a discharged amount of the treatment solution discharged from the nozzle. The discharge amount measurement unit comprises: a stage providing a space where the discharged amount of the treatment solution is measured; a roller member supplying a test film to and recovering the test film from the stage, wherein the test film is to measure the discharged amount; and a solidifying member solidifying the treatment solution discharged on the test film.

Description

TECHNICAL FIELD [0001] The present invention relates to a substrate processing apparatus, a discharge amount measuring unit,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus, and more particularly, to an apparatus for ejecting a liquid drop such as a liquid crystal, a polyimide (PI), and a color filter (CF) onto a substrate by an inkjet method.

2. Description of the Related Art In recent years, liquid crystal display devices have been widely used in display portions of electronic devices such as portable telephones and portable computers. Such a liquid crystal display device is formed by injecting liquid crystal into a space between a black matrix, a color filter, a common electrode, and a color filter substrate on which an alignment film is formed, a thin film transistor (TFT), a pixel electrode and an array substrate on which an alignment film is formed, The image effect is obtained by using the difference in the refractive index of the light along.

An ink jet type coating apparatus is used as an apparatus for applying an alignment liquid or a liquid crystal onto a color filter substrate and an array substrate.

A conventional inkjet coating device is a structure that converts electric signals to physical force and discharges the liquid crystal in the form of droplets through a small nozzle. The inkjet type coating apparatus includes a processing liquid supply unit that stores the processing liquid, a head unit that receives the processing liquid from the processing liquid supply unit and ejects the processing liquid onto the substrate surface, and a discharge amount measurement unit that measures the discharge amount of the head unit . At this time, if the process liquid is buried or remains in the discharge amount measurement unit during the discharge amount measurement process, the device may be contaminated and particles may be generated.

An object of the present invention is to provide a discharge amount measurement unit capable of efficiently measuring a discharge amount of a process liquid discharged from a substrate processing apparatus.

The problems to be solved by the present invention are not limited to the above-mentioned problems, and the problems not mentioned can be clearly understood by those skilled in the art from the description and the accompanying drawings will be.

The present invention provides a substrate processing apparatus.

A substrate processing apparatus according to an embodiment of the present invention includes a support unit for supporting a substrate, a nozzle unit including one or a plurality of heads for spraying a treatment liquid onto the substrate supported by the support unit, Wherein the discharge amount measuring unit comprises: a stage for providing a space in which a discharge amount of the processing solution is measured; a stage for supplying and recovering a test film to be measured for the discharge amount to the stage A roller member, and a curing member for curing the treatment liquid discharged onto the test film.

Wherein the roller member includes a supply roller for supplying the test film to the stage and a recovery roller rotated in engagement with the supply roller and recovering the release film from the stage, .

The curing member may include a curing unit for curing the treatment liquid using light and a supporting unit for supporting the curing unit, wherein the curing unit is rotatably provided about a supporting axis of the supporting unit.

The discharge amount measurement unit may further include a suction member for sucking the treatment liquid discharged on the test film.

The suction member may be disposed adjacent to the collection roller.

The discharge amount measurement unit may further include a tension roller provided between the stage and the collection roller to detect the tension of the test film, and the suction member may be disposed adjacent to the tension roller.

The suction member may be disposed closer to the collection roller than the curing member, and the curing process by the curing member may be first performed on the test film by the suction member.

The curing member may use ultraviolet rays.

The discharge amount measurement unit may further include a photographing member for photographing a region on which the treatment liquid is ejected on the stage and a judger for calculating the treatment liquid from the image photographed by the photographing member.

According to the embodiment of the present invention, it is possible to provide a discharge amount measurement unit capable of efficiently measuring the discharge amount of the process liquid discharged from the substrate processing apparatus.

The effects of the present invention are not limited to the above-mentioned effects, and the effects not mentioned can be clearly understood by those skilled in the art from the present specification and attached drawings.

1 is a schematic view of a substrate processing apparatus.
2 is a perspective view showing the liquid crystal discharge unit of FIG.
FIG. 3 is a view showing an embodiment of the discharge amount measuring unit of FIG. 2. FIG.
FIGS. 4 to 6 sequentially illustrate how the discharge amount measuring unit of FIG. 3 operates.
7 is a view showing a discharge amount measurement unit according to another embodiment.
FIGS. 8 to 10 are views sequentially showing the operation of the discharge amount measuring unit of FIG.
11 is a view showing a discharge amount measurement unit according to another embodiment.
12 is a view showing a discharge amount measurement unit according to another embodiment.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more fully describe the present invention to those skilled in the art. Thus, the shape of the elements in the figures has been exaggerated to emphasize a clearer description.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The above and other objects, features, and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings. Each drawing has been partially or exaggerated for clarity. It should be noted that, in adding reference numerals to the constituent elements of the respective drawings, the same constituent elements are shown to have the same reference numerals as possible even if they are displayed on different drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

In this embodiment, a substrate processing apparatus for applying a treatment liquid to an object by an inkjet method for ejecting droplets will be described. The object liquid may be a color filter (CF) substrate or a thin film transistor (TFT) substrate of a liquid crystal display panel. The liquid may be a liquid crystal, an alignment liquid, red (R) Green (G), or blue (B) ink. As the alignment liquid, polyimide may be used.

The alignment liquid can be applied to the entire surface of the color filter (CF) substrate and the thin film transistor (TFT) substrate, and the liquid crystal can be applied to the entire surface of the color filter (CF) substrate or the thin film transistor (TFT) substrate. The ink may be applied to the interior area of the black matrix arranged in a lattice pattern on a color filter (CF) substrate.

The substrate processing apparatus 1 of this embodiment is an apparatus for applying liquid crystal (liquid crystal) to a substrate by an inkjet method for ejecting droplets.

The substrate may be a color filter (CF) substrate or a thin film transistor (TFT) substrate of a liquid crystal display panel, and the liquid crystal may be applied to an entire surface of a color filter (CF) substrate or a thin film transistor (TFT) substrate.

1 is a view showing a substrate processing apparatus of an inkjet method. 1, the substrate processing apparatus 1 includes a liquid crystal discharge unit 10, a substrate transfer unit 20, a loading unit 30, an unloading unit 40, a liquid crystal supply unit 50, and a main controller 90 ). The liquid crystal discharge portion 10 and the substrate transfer portion 20 are arranged in a line in the first direction I and can be positioned adjacent to each other. A liquid crystal supply part 50 and a main control part 90 are disposed at positions facing the substrate transfer part 20 with the liquid crystal discharge part 10 as a center. The liquid crystal supply part 50 and the main control part 90 may be arranged in a line in the second direction II. The loading unit 30 and the unloading unit 40 are disposed at positions facing the liquid crystal discharge unit 10 with the substrate transfer unit 20 as a center. The substrate transfer section 20 includes a transfer robot 25. [ The transfer robot 25 transfers the substrate S between the loading section 30, the liquid crystal discharging section 10, and the unloader section 40. The transfer robot 25 transfers the substrate S in a state in which the substrate S is placed on the pallet 105. The pallet 105 is provided in a size corresponding to that of the substrate S. [ The pallet 105 may be provided with a porous material. The substrate S is transferred in a state of being placed on the pallet 105, and the process proceeds to prevent transferring and deflection of the substrate during the process. In addition, it is possible to prevent a decrease in uniformity of the thin film and a decrease in leveling due to vibration. Further, by conveying the pallet 105 itself, it is possible to prevent uneven adsorption of the arm of the transfer robot 25 by the processing liquid on the substrate. The loading section 30 and the unloading section 40 may be arranged in a line in the second direction II.

Here, the first direction I is an arrangement direction of the liquid crystal discharge portion 10 and the substrate transfer portion 20, the second direction II is a direction perpendicular to the first direction I on the horizontal plane, (III) is a direction perpendicular to the first direction (I) and the second direction (II).

The substrate to which the liquid crystal is to be applied is brought into the loading section 30. The substrate transferring unit 20 transfers the substrate loaded into the loading unit 30 to the liquid crystal discharging unit 10. The liquid crystal discharge portion 10 receives the liquid crystal from the liquid crystal supply portion 50 and discharges the liquid crystal onto the substrate by an inkjet method. When the liquid crystal discharge is completed, the substrate transfer section 20 transfers the substrate from the liquid crystal discharge section 10 to the unloading section 40. The substrate coated with the liquid crystal is taken out of the unloading portion 40. The main control unit 90 controls the overall operations of the liquid crystal discharge unit 10, the substrate transfer unit 20, the loading unit 30, the unloading unit 40, and the liquid crystal supply unit 50.

2 is a perspective view showing the liquid crystal discharge unit of FIG. 2, the liquid crystal discharging portion 10 includes a base B, a supporting unit 100, a gantry 200, a gantry moving unit 300, a nozzle unit 400, a process liquid supply unit 450, A head moving unit 500, an individual head control unit (not shown), a heating unit 600, a cleaning unit 700, a discharge amount measuring unit 800 and an inspection unit 900. The base (B) may be provided in a rectangular parallelepiped shape having a constant thickness. On the upper surface of the base (B), a supporting unit (100) is disposed.

The substrate supporting member 100 is disposed on the upper surface of the base B. The base (B) may be provided in a rectangular parallelepiped shape having a constant thickness. The substrate support member 100 has a support plate 110 on which the substrate S is placed. The support plate 110 may be a rectangular plate. The rotation driving member 120 is connected to the lower surface of the support plate 110. The rotation drive member 120 may be a rotary motor. The rotation driving member 120 rotates the support plate 110 around a rotation center axis perpendicular to the support plate 100. [

When the support plate 110 is rotated by the rotation drive member 120, the substrate S can be rotated by the rotation of the support plate 110. [ When the long-side direction of the cell formed on the substrate to which the liquid crystal is to be applied faces the second direction II, the rotation driving member 120 can rotate the substrate such that the long-side direction of the cell is in the first direction I.

The support plate 110 and the rotation driving member 120 may be linearly moved in the first direction I by the linear driving member 130. The linear driving member 130 includes a slider 132 and a guide member 134. The rotation driving member 120 is provided on the upper surface of the slider 132. [ The guide member 134 is elongated in the first direction I in the center of the upper surface of the base B. A linear motor (not shown) may be incorporated in the slider 132 and the slider 132 is linearly moved in the first direction I along the guide member 134 by a linear motor (not shown).

The gantry 200 is provided at an upper portion of a path through which the support member 110 is moved. The gantry 200 is disposed upwardly away from the upper surface of the base B and the gantry 200 is arranged such that its longitudinal direction is in the second direction II.

The gantry moving unit 300 moves the gantry 200 in a first direction I or moves the gantry 200 in such a direction that the longitudinal direction of the gantry 200 is inclined in the first direction I . By rotation of the gantry 200, the nozzle unit 400 can be aligned in an oblique direction in the first direction I.

The nozzle unit 400 discharges droplets of the treatment liquid onto the substrate. The nozzle unit 400 includes a plurality of nozzle heads 410, 420, and 430, and a plurality of nozzles and a nozzle moving unit 500 positioned at the bottom of each nozzle head. In this embodiment, three nozzle heads 410, 420, and 430 are provided, but the present invention is not limited thereto. The nozzle heads 410, 420, and 430 may be arranged in a line in a second direction II and coupled to the gantry 200.

A plurality of nozzles (not shown) are provided on the bottom surfaces of the nozzle heads 410, 420, and 430 to discharge droplets of the liquid crystal. For example, 128 or 256 nozzles (not shown) may be provided in each of the heads. The nozzles (not shown) may be arranged in a line at intervals of a predetermined pitch. The nozzles (not shown) can discharge the liquid crystal in an amount of ㎍ unit.

The number of piezoelectric elements corresponding to the nozzles (not shown) may be provided in each of the nozzle heads 410, 420, and 430, and the droplet discharge amount and discharge timing of the nozzles (not shown) Can be adjusted independently by controlling the voltage to be applied.

Each head 400 is movable to a process position and a standby position by a head moving unit 500 and a gantry moving unit 300. Wherein the process position is a position where the head is opposed to the substrate, and the standby position is a position where the head is out of the process position. According to one example, the standby position may be a position in which the head is opposed to the preliminary ejection unit, the cleaning unit, and the inspection unit.

The treatment liquid supply unit 450 includes a storage tank 451, a supply line 452, a pressure control line 453, and a filter member 454. The storage tank 451 stores the processing liquid to be supplied to the head unit 400. The treatment liquid is maintained at a constant water level in the storage tank 451. If the level of the processing liquid is not constant, the pressure of the processing liquid moving to the head unit 400 becomes different, and the volume of the processing liquid discharged to the substrate S becomes uneven. In order to prevent this, the processing liquid is supplied to the storage tank 451 as much as the processing liquid is moved to the head unit 400 so that the level of the processing liquid can be maintained constant. However, even if the processing liquid is not supplied to the head unit 400, the processing liquid may be vaporized, so that the level of the processing liquid may not be maintained constant. The supply line 452 connects the storage tank 451 and the head unit 400. The pressure control line 453 may apply positive pressure and negative pressure to adjust the pressure inside the storage tank 451 to a vacuum according to the process. The filter member 640 blocks the process liquid in the storage tank 610 from vaporizing and moving out of the storage tank 610.

A head control unit (not shown) controls the liquid crystal discharge of each of the heads 410, 420, The head control unit may be disposed in the liquid crystal discharge portion 10 adjacent to the heads 410, For example, the head control unit may be disposed at one end of the gantry 200. In this embodiment, the case where the head control unit is disposed at one end of the gantry 200 is described as an example, but the position of the head control unit is not limited thereto.

The head control unit is electrically connected to each of the heads 410, 420, and 430, although not shown, and applies a control signal to each of the heads 410, 420, Each of the heads 410, 420 and 430 may be provided with a number of piezoelectric elements (not shown) corresponding to the processing liquid nozzles (not shown), and the head control unit controls the voltage applied to the piezoelectric elements, (Not shown) can be adjusted.

The discharge amount measurement unit 800 measures the liquid crystal discharge amount of the nozzle heads 410, 420, and 430. Specifically, the discharge amount measurement unit 800 measures the amount of liquid crystal discharged from all of the nozzles (not shown) for each of the nozzle heads 410, 420, and 430. The presence or absence of abnormality in the nozzles (not shown) of the nozzle heads 410, 420 and 430 can be confirmed macroscopically by measuring the liquid crystal discharge amount of the nozzle heads 410, 420 and 430. That is, if the liquid crystal discharge amount of the nozzle heads 410, 420, and 430 is out of the reference value, it is found that at least one of the nozzles (not shown) is abnormal.

The inspection unit 900 confirms whether or not the individual nozzles provided to the heads 410, 420 and 430 through the optical inspection are abnormal. If the inspection unit 900 determines that there is an abnormality in the unspecified treatment liquid nozzle as a result of checking the abnormality of the macroscopic nozzle, the inspection unit 900 checks the abnormality of the individual treatment liquid nozzle, You can proceed with the full examination.

Hereinafter, a discharge amount measurement unit according to an embodiment of the present invention will be described in detail.

FIG. 3 is a view showing an embodiment of the discharge amount measurement unit 800 of FIG. FIGS. 4 to 6 are views sequentially showing the operation of the discharge amount measurement unit 800 of FIG. Hereinafter, the discharge amount measurement unit 800 will be described with reference to Figs. The discharge amount measurement unit 800 includes a stage 810, a roller member 820, a photographing member 840, a judging device 845, and a curing member 830.

The stage 810 provides a space for measuring the liquid crystal discharge amount. The stage 810 has a jetting area A. The jetting area A is a region where the treatment liquid is sprayed onto the substrate. The stage 810 may be provided below the inspection area B. [ The inspection area B is an area in which the treatment liquid is photographed on the test film to check whether the discharge state of the head is normal or not. On the stage 810, a test film is supported. The stage 810 may be provided in a planar shape having a constant height. The liquid crystal discharge amount measurement is performed on the upper surface of the stage 810.

The roller member 820 feeds and retrieves a test film for measuring the discharge amount to the stage 810. At this time, the test film may be a transparent film including a synthetic resin. The roller member 820 includes a supply roller 820a and a collection roller 820b. The supply roller 820a is disposed on one side of the stage 810 and supplies a test film to the stage 810. [ The collection roller 820b is provided so as to be spaced apart from the supply roller 820a. In one example, the collection roller 820b is disposed on the other side of the stage 810. [ The collection roller 820b recovers the test film. At this time, the test film on which the discharge amount measurement process in the collection roller 820b is completed can be discarded. The roller member 820 moves the test film so that the test film can move on the jetting area A, the inspection area B, and the hardening area C.

The photographing member 840 photographs the treatment liquid discharged in the inspection area B. According to one example, the photographing member 840 can photograph the processing liquid at a position vertically above the processing liquid discharged to the overlay 8120. Alternatively, the position may be shifted from above the processing liquid discharged to the overlay 8120 and photographed. The judging device 845 judges whether the discharge state of the head is normal or not based on the image picked up by the photographing member. As an example, the judging device 845 can judge the discharge amount of the head.

The curing member 830 is provided between the inspection area B and the collection roller 820b. As an example, the curing member 830 may be disposed adjacent to the collection roller 820b. As an example, the curing member 830 may be provided at a height higher than the collection roller 820b on the side of the collection roller 820b. The hardening member 830 hardens the treatment liquid discharged onto the test film. The curing member 830 may have an ultraviolet irradiator. The curing member 830 has a hardened portion 832 and a support portion 834. The hardening unit 832 hardens the treatment liquid using light. At this time, the light may be ultraviolet light. Alternatively, the curing unit 832 may use a separate curing means other than light. The support portion 834 supports the hardened portion 832. At this time, the hardened portion 832 can be provided to be rotatable about the support shaft of the support portion 834. As a result, the hardened portion 832 can secure the hardened region C on the test film.

Generally, a conventional general discharge amount measuring apparatus measures the discharge amount of the liquid crystal after the discharged liquid crystal on the top surface of the discharge plate is dried to a certain extent. At this time, there is a problem that the discharge amount measured due to the non-uniform drying time is inaccurate. As a result, the discharge amount measurement time is delayed and the discharge amount measurement unit may be contaminated. Further, the liquid crystal can be generated as particles, and the process accuracy can be lowered. However, the apparatus for measuring the amount of discharge according to the present invention can prevent contamination and defects of the discharge amount measurement unit by curing the test film before collection. In addition, the measurement time can be shortened, so that the process efficiency can be improved.

Hereinafter, another embodiment of the discharge amount measurement unit according to the present invention will be described.

7 is a view showing a discharge amount measurement unit 850 according to another embodiment. 8 to 10 are views sequentially showing the operation of the discharge amount measurement unit 850 of FIG. 11 is a view showing a discharge amount measurement unit 890 according to another embodiment. Hereinafter, the discharge amount measurement unit 850 will be described with reference to Figs. The discharge amount measurement unit 850 includes a stage 860, a roller member 870, a tension roller 862, a photographing member 840, a judging device 845 and a suction member 880. The stage 860, the roller member 870, the photographing member 840 and the judging device 845 in FIG. 6 are the same as the stage 810, the roller member 820, the photographing member 840, Regular 845 has generally the same or similar shape and function. The discharge amount measurement unit 850 further includes a tension roller 862. A tension roller 862 is provided between the stage 860 and the collection roller 870b. In one example, a tension roller 862 may be attached to the stage 860. The tension roller 862 can apply a tension to the test film and detect the tension. The suction member 880 is disposed adjacent to the collection roller 870b. In one example, the suction member 880 may be disposed adjacent to the tension roller 862. The suction member 880 can suck the treatment liquid discharged onto the test film. The suction member 880 can suck the treatment liquid in vacuum. For example, the treatment liquid may be a liquid crystal. Alternately, as shown in FIG. 9, the discharge amount measurement unit 890 may include both the curing member 830 and the suction member 880. At this time, the suction member 880 may be disposed closer to the collection roller than the curing member 830. Therefore, after the curing process has been carried out, the suction process can proceed to the remaining process liquid on the test film. Therefore, contamination and defects of the discharge amount measurement unit can be prevented. In addition, the measurement time can be shortened, so that the process efficiency can be improved. In particular, in the case of liquid crystals, the suction process may be more efficient than the curing process.

12 is a view showing a discharge amount measurement unit of another embodiment. The discharge amount measurement unit 850a includes a roller member 820, a curing member 830, a photographing member 840, and a judging unit 845. [ The roller member 820, the curing member 830, the image taking member 840 and the judging device 845 in FIG. 12 are respectively provided with the roller member 820, the curing member 830, the image taking member 840, And has substantially the same or similar shape and function as the judging device 845. On the other hand, the discharge amount measurement unit may not include a stage. The supply roller 820a, the jetting area A, the inspection area B, the hardening area C, and the collection roller 820b may be sequentially provided along one direction. The jetting area A is a region where the head supplies the treatment liquid onto the test film. The inspection area B is an area for judging whether or not the head is ejected normally by photographing the treatment liquid on the test film. The curing region (C) is the region where the curing process proceeds on the treatment liquid on the test film. Therefore, after the test film is positioned in the ejection area A and the process liquid is ejected, the test film is moved to be positioned in the inspection area B and the inspection process can proceed. Thereafter, the substrate on which the inspection process has been performed can be recovered after the hardening process proceeds in the hardened region C while being moved again. Alternatively, the test film may be moved between the jetting area A, the inspection area B, and the hardening area C to perform the substrate processing process.

The foregoing detailed description is illustrative of the present invention. In addition, the foregoing is intended to illustrate and explain the preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, it is possible to make changes or modifications within the scope of the concept of the invention disclosed in this specification, within the scope of the disclosure, and / or within the skill and knowledge of the art. The embodiments described herein are intended to illustrate the best mode for implementing the technical idea of the present invention and various modifications required for specific applications and uses of the present invention are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. It is also to be understood that the appended claims are intended to cover such other embodiments.

1: substrate processing apparatus
100: support unit
200: Gantry
300: Gantry moving unit
400: nozzle unit
700: Cleaning unit
800: Discharge amount measuring unit
810: stage
820: roller member
830: Curing member

Claims (15)

In the substrate processing apparatus,
A support unit for supporting the substrate;
A nozzle unit including a head for jetting a treatment liquid onto the substrate supported by the support unit; And
And a discharge amount measuring unit for measuring a discharge amount of the processing liquid discharged from the head,
Wherein the discharge amount measurement unit comprises:
Feed roller;
A recovery roller provided apart from the supply roller;
A photographing member for photographing an inspection area on which the treatment liquid is discharged onto the test film that is moved from the supply roller to the collection roller;
A judging device for judging whether the ejection state of the head is normal or not from an image photographed by the photographing member; And
And a curing member for curing the treatment liquid discharged onto the test film. The method according to claim 1,
Wherein the discharge amount measurement unit further comprises a stage provided below the inspection area,
And the test film is supported on the stage. 3. The method of claim 2,
The curing member
A curing unit for curing the treatment liquid using light; And
And a support for supporting the hardened portion,
Wherein the hardened portion is rotatably provided about a support shaft of the support portion. The method of claim 3,
Wherein the curing member is provided between the inspection area and the collection roller. 5. The method of claim 4,
Wherein the stage is provided with a vacuum hole for vacuum-adsorbing the test film. 6. The method of claim 5,
Wherein the head discharges the treatment liquid by an inkjet method. The method according to claim 6,
Wherein the treatment liquid is polyamide. The method according to claim 5 or 6,
Wherein the curing member includes an ultraviolet ray irradiator. A substrate processing method for determining whether a discharge state of a head for jetting a processing liquid onto a substrate is normal or not, the method comprising: ejecting the processing liquid onto the substrate on the substrate, photographing the inspection area in which the processing liquid is ejected, And determining whether the discharge state is normal, wherein the substrate is recovered after curing the treatment liquid on the substrate. 10. The method of claim 9,
The substrate is placed in an ejection region through which the process liquid is ejected, and the process liquid is supplied. After the substrate is moved and inspected, the process liquid is cured while moving the substrate, And recovering the substrate. Feed roller;
A recovery roller provided apart from the supply roller;
A photographing member for photographing an inspection area on which the treatment liquid is discharged onto the test film that is moved from the supply roller to the collection roller;
A judging device for judging whether the ejection state of the head is normal or not from an image photographed by the photographing member; And
And a curing member for curing the treatment liquid discharged onto the test film. 12. The method of claim 11,
Wherein the discharge amount measurement unit further comprises a stage provided below the inspection area,
And the test film is supported on the stage. 13. The method of claim 12,
The curing member
A curing unit for curing the treatment liquid using light; And
And a support for supporting the hardened portion,
Wherein the hardening portion is rotatably provided about a support shaft of the support portion. 14. The method according to any one of claims 11 to 13,
Wherein the treatment liquid is polyamide. 14. The method according to one of claims 11 to 13,
Wherein the curing member includes an ultraviolet ray irradiator.

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