KR102379011B1 - Apparatus and method for treating substrate, and discharge rate measuring unit - Google Patents

Abstract

The present invention relates to a substrate processing apparatus. A substrate processing apparatus according to an embodiment of the present invention includes a support unit for supporting a substrate, a nozzle unit including one or a plurality of heads spraying a processing liquid to the substrate supported by the support unit, and discharge from the nozzle a discharge amount measuring unit for measuring the discharge amount of the treatment liquid, wherein the discharge amount measuring unit supplies and retrieves a stage providing a space in which the discharge amount of the treatment liquid is measured, and a test film for measuring the discharge amount to the stage It may include a roller member, and a suction member for sucking the treatment liquid discharged on the test film.

Description

Substrate processing apparatus, discharge amount measuring unit, and substrate processing method

The present invention relates to a substrate processing apparatus, and more particularly, to an apparatus for discharging liquid drops such as liquid crystal, PI (polyimide), and CF (color filter) to a substrate by an inkjet method.

DESCRIPTION OF RELATED ART In recent years, the liquid crystal display device is widely used for the display part of electronic devices, such as a mobile phone and a portable computer. In such a liquid crystal display device, liquid crystal is injected into the space between the color filter substrate on which the black matrix, color filter, common electrode, and alignment layer are formed, and the thin film transistor (TFT), pixel electrode, and the array substrate on which the alignment layer is formed, thereby improving the anisotropy of the liquid crystal. The image effect is obtained by using the difference in the refractive index of light.

An inkjet coating device is used as a device for coating an aligning agent or liquid crystal on a color filter substrate and an array substrate.

The conventional inkjet coating device is a structure that converts an electrical signal into a physical force to discharge the liquid crystal in the form of droplets through a small nozzle. The inkjet coating apparatus includes a processing liquid supply unit storing a processing liquid, a head unit receiving the processing liquid supplied from the processing liquid supply unit and discharging the processing liquid to a surface of a substrate, and a discharge amount measuring unit measuring the discharge amount of the head unit . In this case, when the treatment liquid is buried or remains in the discharge amount measurement unit during the discharge amount measurement process, contamination and particles of the device are caused.

An object of the present invention is to provide a discharge amount measuring unit capable of efficiently measuring the discharge amount of a processing liquid discharged from a substrate processing apparatus.

The problem to be solved by the present invention is not limited to the above-mentioned problems, and the problems not mentioned can be clearly understood by those of ordinary skill in the art to which the present invention belongs from the present specification and the accompanying drawings. will be.

The present invention provides a substrate processing apparatus.

A substrate processing apparatus according to an embodiment of the present invention includes a support unit for supporting a substrate, a nozzle unit including one or a plurality of heads spraying a processing liquid to the substrate supported by the support unit, and discharge from the nozzle a discharge amount measuring unit for measuring the discharge amount of the treatment liquid, wherein the discharge amount measuring unit supplies and retrieves a stage providing a space in which the discharge amount of the treatment liquid is measured, and a test film for measuring the discharge amount to the stage It may include a roller member, and a suction member for sucking the treatment liquid discharged on the test film.

The roller member includes a supply roller for supplying the test film to the stage, and a collection roller rotating in engagement with the supply roller and collecting the test film from the stage, wherein the suction member is adjacent to the collection roller can be arranged.

The discharge amount measuring unit may further include a tension roller provided between the stage and the recovery roller to detect a tension of the test film, and the suction member may be disposed adjacent to the tension roller.

The discharge amount measuring unit may further include a curing member for curing the treatment liquid discharged on the test film.

The hardening member may be disposed adjacent to the recovery roller.

The curing member may include a curing unit configured to harden the treatment solution using light and a support unit supporting the curing unit, wherein the curing unit may be provided rotatably about a support shaft of the supporting unit.

The discharge amount measuring unit may further include a tension roller provided between the stage and the recovery roller to detect a tension of the test film, and the suction member may be disposed adjacent to the tension roller.

The suction member may be disposed closer to the recovery roller than the curing member, so that the curing process by the curing member and the suction process by the suction member may be first performed on the test film.

The curing member may use ultraviolet rays.

The discharge amount measuring unit may further include a photographing member for photographing an area on the stage from which the processing liquid is discharged, and a determiner for calculating the processing liquid from an image photographed by the photographing member.

According to an embodiment of the present invention, it is possible to provide a discharge amount measuring unit capable of efficiently measuring the discharge amount of a processing liquid discharged from a substrate processing apparatus.

The effects of the present invention are not limited to the above-described effects, and the effects not mentioned will be clearly understood by those of ordinary skill in the art to which the present invention belongs from the present specification and accompanying drawings.

1 is a diagram schematically showing a substrate processing apparatus.
FIG. 2 is a perspective view showing the liquid crystal discharge unit of FIG. 1 .
FIG. 3 is a view showing an embodiment of the discharge amount measuring unit of FIG. 2 .
4 to 6 are views sequentially illustrating an operation of the discharge amount measuring unit of FIG. 3 .
7 is a view showing a discharge amount measuring unit according to another exemplary embodiment.
8 to 10 are views sequentially illustrating the operation of the discharge amount measuring unit of FIG. 7 .
11 is a diagram illustrating a discharge amount measuring unit according to another exemplary embodiment.
12 is a diagram illustrating a discharge amount measuring unit according to another exemplary embodiment.

Hereinafter, an embodiment of the present invention will be described in more detail with reference to the accompanying drawings. Embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more completely explain the present invention to those of ordinary skill in the art. Accordingly, the shapes of elements in the drawings are exaggerated to emphasize a clearer description.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The problem to be solved by the present invention described above, the problem solving means, and the effect will be easily understood through the embodiments associated with the accompanying drawings. Each drawing is expressed in a simplified or exaggerated part for clear explanation. In adding reference numerals to components in each drawing, it should be noted that the same components are shown to have the same reference numerals as possible even though they are indicated in different drawings. In addition, in describing the present invention, if it is determined that a detailed description of a related known configuration or function may obscure the gist of the present invention, the detailed description thereof will be omitted.

In this embodiment, a substrate processing apparatus for applying a processing liquid to an object by an inkjet method for discharging droplets will be described. For example, the object may be a color filter (CF) substrate or a thin film transistor (TFT) substrate of a liquid crystal display panel, and the treatment liquid is liquid crystal, aligning agent, red (R) in which pigment particles are mixed in a solvent, It may be green (G) or blue (B) ink. As the aligning agent, polyimide may be used.

The aligning agent may be applied to the entire surface of the color filter (CF) substrate and the thin film transistor (TFT) substrate, and the liquid crystal may be applied to the entire surface of the color filter (CF) substrate or the thin film transistor (TFT) substrate. Ink may be applied to the inner region of a black matrix arranged in a grid-like pattern on a color filter (CF) substrate.

The substrate processing apparatus 1 of this embodiment is a facility for applying liquid crystal to a substrate by an inkjet method for discharging droplets.

The substrate may be a color filter (CF) substrate or a thin film transistor (TFT) substrate of the liquid crystal display panel, and the liquid crystal may be applied to the entire surface of the color filter (CF) substrate or the thin film transistor (TFT) substrate.

1 is a view showing an inkjet substrate processing apparatus. Referring to FIG. 1 , the substrate processing apparatus 1 includes a liquid crystal discharge unit 10 , a substrate transfer unit 20 , a loading unit 30 , an unloading unit 40 , a liquid crystal supply unit 50 , and a main control unit 90 . ) is included. The liquid crystal ejection unit 10 and the substrate transfer unit 20 may be arranged in a line in the first direction (I) and located adjacent to each other. A liquid crystal supply unit 50 and a main control unit 90 are disposed at a position facing the substrate transfer unit 20 around the liquid crystal discharge unit 10 . The liquid crystal supply unit 50 and the main control unit 90 may be arranged in a line in the second direction (II). The loading unit 30 and the unloading unit 40 are disposed at positions facing the liquid crystal discharge unit 10 with respect to the substrate transfer unit 20 . The substrate transfer unit 20 includes a transfer robot 25 . The transfer robot 25 transfers the substrate S between the loading unit 30 , the liquid crystal discharge unit 10 , and the unloader unit 40 . The transfer robot 25 transfers the substrate S in a state placed on the pallet 105 . The pallet 105 is provided in a size corresponding to the substrate (S). The pallet 105 may be provided with a porous material. The substrate S is transferred in a state placed on the pallet 105 and the process proceeds, thereby preventing sagging of the substrate during transfer and processing. In addition, it is possible to prevent a decrease in thin film uniformity and a decrease in leveling due to vibration. In addition, by transferring the pallet 105 itself, it is possible to prevent the adsorption unevenness of the arm of the transfer robot 25 by the processing liquid on the substrate. The loading unit 30 and the unloading unit 40 may be arranged in a line in the second direction (II).

Here, the first direction (I) is the arrangement direction of the liquid crystal discharge unit 10 and the substrate transfer unit 20, the second direction (II) is a direction perpendicular to the first direction (I) on the horizontal plane, the third direction (III) is a direction perpendicular to the first direction (I) and the second direction (II).

The substrate on which the liquid crystal is to be applied is loaded into the loading unit 30 . The substrate transfer unit 20 transfers the substrate loaded into the loading unit 30 to the liquid crystal discharge unit 10 . The liquid crystal discharge unit 10 receives liquid crystal from the liquid crystal supply unit 50 and discharges the liquid crystal onto the substrate in an inkjet method. When the liquid crystal discharge is completed, the substrate transfer unit 20 transfers the substrate from the liquid crystal discharge unit 10 to the unloading unit 40 . The liquid crystal-coated substrate is carried out from the unloading unit 40 . The main controller 90 controls overall operations of the liquid crystal discharge unit 10 , the substrate transfer unit 20 , the loading unit 30 , the unloading unit 40 , and the liquid crystal supply unit 50 .

FIG. 2 is a perspective view showing the liquid crystal discharge unit of FIG. 1 . Referring to FIG. 2 , the liquid crystal discharge unit 10 includes a base B, a support unit 100 , a gantry 200 , a gantry moving unit 300 , a nozzle unit 400 , a treatment liquid supply unit 450 , It includes a head moving unit 500 , an individual head control unit (not shown), a heating unit 600 , a cleaning unit 700 , a discharge amount measuring unit 800 , and an inspection unit 900 . The base (B) may be provided in a rectangular parallelepiped shape having a constant thickness. The support unit 100 is disposed on the upper surface of the base (B).

The substrate support member 100 is disposed on the upper surface of the base (B). The base (B) may be provided in a rectangular parallelepiped shape having a constant thickness. The substrate support member 100 has a support plate 110 on which the substrate S is placed. The support plate 110 may be a plate having a rectangular shape. A rotation driving member 120 is connected to the lower surface of the support plate 110 . The rotation driving member 120 may be a rotation motor. The rotation driving member 120 rotates the support plate 110 about a rotation center axis perpendicular to the support plate 100 .

When the support plate 110 is rotated by the rotation driving member 120 , the substrate S may be rotated by the rotation of the support plate 110 . When the long side direction of the cell formed on the substrate on which the liquid crystal is to be applied faces the second direction (II), the rotation driving member 120 may rotate the substrate such that the long side direction of the cell faces the first direction (I).

The support plate 110 and the rotation driving member 120 may be linearly moved in the first direction (I) by the linear driving member 130 . The linear driving member 130 includes a slider 132 and a guide member 134 . The rotation driving member 120 is installed on the upper surface of the slider 132 . The guide member 134 extends long in the first direction (I) to the center of the upper surface of the base (B). A linear motor (not shown) may be built in the slider 132 , and the slider 132 is linearly moved in the first direction (I) along the guide member 134 by the linear motor (not shown).

The gantry 200 is provided above the path along which the support member 110 moves. The gantry 200 is disposed upwardly spaced apart from the upper surface of the base B, and the gantry 200 is disposed so that its longitudinal direction faces the second direction II.

The gantry moving unit 300 moves the gantry 200 in a straight line in the first direction (I) or moves the gantry 200 so that the longitudinal direction of the gantry 200 is inclined in the first direction (I). can be rotated By rotation of the gantry 200, the nozzle unit 400 may be aligned in a direction inclined to the first direction (I).

The nozzle unit 400 discharges droplets of the processing liquid to the substrate. The nozzle unit 400 includes a plurality of nozzle heads 410 , 420 , 430 , and a plurality of nozzles and a nozzle moving unit 500 positioned on a bottom surface of each nozzle head. In this embodiment, three nozzle heads 410, 420, 430 are provided as an example, but the present invention is not limited thereto. The nozzle heads 410 , 420 , and 430 may be arranged side by side in a line in the second direction (II), and are coupled to the gantry 200 .

A plurality of nozzles (not shown) for discharging liquid crystal droplets are provided on the bottom surfaces of the nozzle heads 410 , 420 , and 430 . For example, each of the heads may be provided with 128 or 256 nozzles (not shown). Nozzles (not shown) may be arranged in a line at intervals of a predetermined pitch. The nozzles (not shown) may discharge liquid crystal in an amount of μg.

Each nozzle head 410 , 420 , 430 may be provided with a number of piezoelectric elements corresponding to the number of nozzles (not shown), and the droplet ejection amount and ejection timing of the nozzles (not shown) are applied to the piezoelectric elements. Each of them can be independently adjusted by controlling the applied voltage.

Each head 400 is movable to a process position and a standby position by the head moving unit 500 and the gantry moving unit 300 . Here, the process position is a position where the head faces the substrate, and the standby position is a position where the head is out of the process position. According to an example, the standby position may be a position in which the head faces the preliminary discharge unit, the cleaning unit, and the inspection unit.

The treatment liquid supply unit 450 includes a storage tank 451 , a supply line 452 , a pressure control line 453 , and a filter member 454 . The storage tank 451 stores the processing liquid supplied to the head unit 400 . The treatment liquid is maintained at a constant level in the storage tank 451 . If the water level of the processing liquid is not constant, the pressure of the processing liquid moving to the head unit 400 is different, and thus the volume of the processing liquid discharged to the substrate S is not constant. In order to prevent this, the treatment liquid is supplied to the storage tank 451 as much as the treatment liquid moves to the head unit 400 so that the water level of the treatment liquid is constantly maintained. However, even when the treatment liquid is not supplied to the head unit 400 , the water level of the treatment liquid may not be constantly maintained as the treatment liquid is vaporized. The supply line 452 connects the storage tank 451 and the head unit 400 . The pressure control line 453 may apply positive pressure and negative pressure to adjust the pressure inside the storage tank 451 to a vacuum state according to a process. The filter member 640 prevents the processing liquid inside the storage tank 610 from being vaporized and moving to the outside of the storage tank 610 .

A head control unit (not shown) controls liquid crystal ejection of each of the heads 410 , 420 , and 430 . The head control unit may be disposed in the liquid crystal discharge unit 10 adjacent to the heads 410 , 420 , and 430 . For example, the head control unit may be disposed at one end of the gantry 200 . In the present embodiment, a case in which the head control unit is disposed at one end of the gantry 200 is described as an example, but the position of the head control unit is not limited thereto.

Although not shown, the head control unit is electrically connected to each of the heads 410 , 420 and 430 and applies a control signal to each of the heads 410 , 420 and 430 . Each of the heads 410 , 420 , and 430 may be provided with a number of piezoelectric elements (not shown) corresponding to the treatment liquid nozzles (not shown), and the head control unit controls the voltage applied to the piezoelectric elements to control the treatment liquid nozzles. It is possible to adjust the droplet discharge amount of the fields (not shown).

The discharge amount measuring unit 800 measures the liquid crystal discharge amount of the nozzle heads 410 , 420 , and 430 . Specifically, the discharge amount measuring unit 800 measures the amount of liquid crystal discharged from all nozzles (not shown) for each nozzle head 410 , 420 , and 430 . By measuring the liquid crystal discharge amount of the nozzle heads 410 , 420 , and 430 , it is possible to macroscopically check whether or not the nozzles (not shown) of the nozzle heads 410 , 420 , 430 are abnormal. That is, when the liquid crystal discharge amount of the nozzle heads 410 , 420 , and 430 deviates from the reference value, it can be seen that there is an abnormality in at least one of the nozzles (not shown).

The inspection unit 900 checks whether individual nozzles provided to the heads 410 , 420 , and 430 are abnormal through an optical inspection. As a result of checking whether the macroscopic nozzle is abnormal, when it is determined that there is an abnormality in the unspecified processing liquid nozzle, the inspection unit 900 checks whether an individual processing liquid nozzle is abnormal and inspects the processing liquid nozzle. You can proceed with a full-scale inspection.

Hereinafter, a discharge amount measuring unit according to an embodiment of the present invention will be described in detail.

FIG. 3 is a view showing an embodiment of the discharge amount measuring unit 800 of FIG. 2 . 4 to 6 are views sequentially illustrating the operation of the discharge amount measuring unit 800 of FIG. 3 . Hereinafter, the discharge amount measuring unit 800 will be described with reference to FIGS. 3 to 6 . The discharge amount measuring unit 800 includes a stage 810 , a roller member 820 , a tension roller 812 , a photographing member 840 , a determiner 845 , and a suction member 830 .

The stage 810 provides a space for measuring the liquid crystal discharge amount. The stage 810 has a spray area A. The spraying area A is an area in which the processing liquid is sprayed on the substrate. The stage 810 may be provided under the inspection area B. The inspection area (B) is an area for inspecting whether the discharge state of the head is normal by photographing the treatment liquid on the test film. A test film is supported on the stage 810 . The stage 810 may be provided in a planar shape having a constant height. The liquid crystal discharge amount is measured on the upper surface of the stage 810 .

The roller member 820 supplies and collects the test film for measuring the discharge amount to the stage 810 . In this case, the test film may be a transparent film including a synthetic resin. The roller member 820 includes a supply roller 820a and a recovery roller 820b. The supply roller 820a is disposed on one side of the stage 810 to supply the test film to the stage 810 . The recovery roller 820b is provided to be spaced apart from the supply roller 820a. For example, the recovery roller 820b is disposed on the other side of the stage 810 . The recovery roller 820b collects the test film. At this time, the test film on which the discharge amount measurement process is completed in the collection roller 820b may be discarded. The roller member 820 moves the test film so that the test film can move on the spray area A, the inspection area B, and the suction area C.

The photographing member 840 photographs the processing liquid discharged to the inspection area B. According to an example, the photographing member 840 may photograph the processing liquid vertically upward of the processing liquid discharged to the discharge plate 8120 . Alternatively, the position may be moved above the treatment liquid discharged to the discharge plate 8120 to be photographed. The determiner 845 determines whether or not the ejection state of the head is normal from the image photographed by the photographing member. For example, the determiner 845 may determine the discharge amount of the head.

A tension roller 812 is provided between the stage 810 and the recovery roller 820b. As an example, the tension roller 812 may be attached to the stage 810 . The tension roller 812 may apply a tension to the test film and detect the tension. The suction member 830 is disposed adjacent to the recovery roller 820b. For example, the suction member 830 may be disposed on the tension roller 812 and adjacent to the tension roller 812 . The suction member 830 may suck the treatment liquid discharged on the test film. The suction member 830 sucks the treatment liquid on the test film passing through the suction region C. For example, the suction member 830 may suck the treatment liquid in a vacuum. For example, the treatment liquid may be a liquid crystal. Optionally, the treatment liquid may be polyamide.

In general, when measuring the discharge amount of liquid crystal, the conventional general discharge amount measuring device measures the liquid crystal discharged on the upper surface of the discharge plate after the liquid crystal is dried to a certain degree. At this time, there was a problem in that the measured discharge amount was not accurate due to the non-uniform drying time. For this reason, the discharge amount measurement time is delayed, and contamination of the discharge amount measurement unit may be caused. In addition, liquid crystal may be generated as particles, and processing accuracy may be lowered. However, the discharge amount measuring device 800 according to the present invention can prevent contamination and defects of the discharge amount measuring unit by sucking the treatment liquid through the test film before collection. In addition, by shortening the measurement time, process efficiency may be improved.

Hereinafter, another embodiment of the discharge amount measuring unit according to the present invention will be described.

7 is a diagram illustrating a discharge amount measuring unit 850 according to another exemplary embodiment. 8 to 10 are views sequentially illustrating the operation of the discharge amount measuring unit 850 of FIG. 7 . 11 is a diagram illustrating a discharge amount measuring unit 890 according to another exemplary embodiment. Hereinafter, the discharge amount measuring unit 850 will be described with reference to FIGS. 7 to 11 . The discharge amount measuring unit 850 includes a stage 860 , a roller member 870 , a photographing member 840 , a determiner 845 , and a curing member 880 . The stage 860, the roller member 870, the photographing member 840, and the determiner 845 of FIG. 6 are the stage 810, the roller member 820, the photographing member 840, and the plate of FIG. 2, respectively. Regular 845 has substantially the same or similar shape and function. The discharge amount measuring unit 850 may not include the tension roller 812 and the suction member 830 . Instead, the discharge amount measuring unit 850 may include a curing member 880 . The hardening member 880 may be disposed adjacent to the recovery roller 870 . For example, the hardening member 880 may be provided on the side of the recovery roller 870b at a height higher than that of the recovery roller 870b. The curing member 880 cures the treatment liquid discharged on the test film. The hardening member 830 includes a hardening part 882 and a supporting part 884 in the hardening member 880 . The curing unit 882 hardens the processing liquid using light. In this case, the light may be ultraviolet rays. Alternatively, the curing unit 882 may optionally use a curing means other than light. The support 884 supports the hardened portion 882 . In this case, the hardening part 882 may be provided rotatably about the support shaft of the support part 884 . For this reason, the hardening part 882 can secure a wide hardening area|region on the test film. Alternatively, as shown in FIG. 9 , the discharge amount measuring unit 890 may include both the suction member 830 and the hardening member 880 . In this case, the suction member 830 may be disposed closer to the recovery roller than the curing member 880 . Accordingly, after the curing process is performed on the treatment liquid remaining on the test film, the suction process may be performed by the suction member. Accordingly, it is possible to prevent contamination and failure of the discharge amount measuring unit. In addition, as the measurement time is shortened, process efficiency may be improved. In particular, in the case of liquid crystal, the suction process may be more efficient than the curing process.

12 is a view showing a discharge amount measuring unit according to another embodiment. The discharge amount measuring unit 850a includes a roller member 820 , a suction member 830 , a photographing member 840 , and a determiner 845 . The roller member 820, the suction member 830, the photographing member 840, and the determiner 845 of FIG. 10 are the roller member 820, the suction member 830, the photographing member 840 of FIG. 2, respectively. And it has substantially the same or similar shape and function as the determiner 845 . On the other hand, the discharge amount measuring unit may not include a stage. The supply roller 820a, the spraying area A, the inspection area B, the suction area C, and the recovery roller 820b may be provided sequentially spaced apart from each other in one direction. The spraying area (A) is an area in which the head supplies the treatment liquid onto the test film. The inspection area (B) is an area in which the processing liquid on the test film is photographed to determine whether the head is normally discharged. The suction region C is a region in which a suction process is performed on the treatment liquid on the test film. Accordingly, after the test film is positioned in the injection region (A) and the treatment liquid is sprayed, the test film is moved and positioned in the inspection region (B) to proceed with the inspection process. Thereafter, the substrate on which the inspection process has been performed may be recovered after the suction process is performed in the suction region C while being moved again. In addition, optionally, the test film may perform a substrate processing process while moving between the spraying area A, the inspection area B, and the suction area C.

The above detailed description is illustrative of the present invention. In addition, the above description shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications are possible within the scope of the concept of the invention disclosed herein, the scope equivalent to the written disclosure, and/or within the scope of skill or knowledge in the art. The written embodiment describes the best state for implementing the technical idea of the present invention, and various changes required in specific application fields and uses of the present invention are possible. Accordingly, the detailed description of the present invention is not intended to limit the present invention to the disclosed embodiments. Also, the appended claims should be construed to include other embodiments.

1: Substrate processing apparatus
100: support unit
200: gantry
300: gantry moving unit
400: nozzle unit
700: cleaning unit
800: discharge amount measurement unit
810: stage
820: roller member
830: suction member

Claims (14)

A substrate processing apparatus comprising:
a support unit for supporting the substrate;
a nozzle unit including one or a plurality of heads for spraying a processing liquid to the substrate supported by the support unit; And
a discharge amount measuring unit for measuring the discharge amount of the treatment liquid discharged from the head;
The discharge amount measurement unit,
feed roller;
a recovery roller provided to be spaced apart from the supply roller;
a photographing member for photographing an inspection area in which the treatment liquid is discharged on the test film moved from the supply roller to the collection roller;
a determiner that determines whether the ejection state of the head is normal from the image photographed by the photographing member; And
and a suction member for sucking the treatment liquid discharged on the test film,
The suction member is disposed between the collection roller and the photographing member, wherein the suction member is disposed closer to the collection roller than the photographing member. The method of claim 1,
The discharge amount measuring unit further includes a stage provided below the inspection area,
A substrate processing apparatus in which the test film is supported on the stage. 3. The method of claim 2,
The suction member is provided between the inspection area and the collection roller. 4. The method of claim 3,
The discharge amount measuring unit may further include a tension roller provided between the supply roller and the recovery roller to detect a tension of the test film, wherein the suction member includes: the suction member is disposed adjacent to the tension roller Device. 5. The method of claim 4,
The discharge amount measuring unit includes a curing member disposed adjacent to the recovery roller,
The hardening member is disposed closer to the recovery roller than the suction member,
The curing member is a substrate processing apparatus for curing the processing liquid discharged onto the test film. 6. The method of claim 5,
The head is a substrate processing apparatus for discharging the processing liquid in an inkjet method. 7. The method of claim 6,
The processing liquid is a substrate processing apparatus of polyamide. 7. The method of claim 6,
The processing liquid is a liquid crystal substrate processing apparatus. A substrate processing method for determining whether a discharge state of a head for spraying a processing liquid on a substrate is normal, the method comprising:
The treatment liquid is sprayed with the head on a test film moved by a supply roller and a collection roller that are provided spaced apart from each other, and an inspection area where the treatment liquid is discharged is photographed to determine whether the discharge state of the head is normal,
After determining whether the discharge state of the head is normal, the test film is recovered after sucking the treatment liquid on the test film before the test film is recovered by the recovery roller,
The suction of the treatment liquid is provided between the inspection area and the collection roller, and is performed by a suction member positioned closer to the collection roller than the inspection area. 10. The method of claim 9,
After the test film is placed in the spraying area to which the treatment liquid is sprayed to supply the treatment liquid, the test film is moved to the inspection area to be inspected, and then the treatment liquid is sucked while moving the test film, and A substrate processing method for recovering the test film. feed roller;
a recovery roller provided to be spaced apart from the supply roller;
a photographing member for photographing an inspection area in which the treatment liquid is discharged on the test film moved from the supply roller to the collection roller;
a determining unit that determines whether a discharge state of the head for discharging the processing liquid is normal from the image photographed by the photographing member; And
and a suction member for sucking the treatment liquid discharged on the test film,
wherein the suction member is disposed between the collection roller and the photographing member, and wherein the suction member is disposed closer to the collection roller than the photographing member. 12. The method of claim 11,
The discharge amount measuring unit further includes a stage provided below the inspection area,
A discharge amount measurement unit in which the test film is supported on the stage. 13. The method according to claim 11 or 12,
The discharge amount measurement unit wherein the treatment liquid is polyamide. 13. The method according to claim 11 or 12,
The treatment liquid is a discharge amount measuring unit including liquid crystal.

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