KR20160068672A - Flexible substrate and preparing method thereof - Google Patents

Flexible substrate and preparing method thereof Download PDF

Info

Publication number
KR20160068672A
KR20160068672A KR1020150170586A KR20150170586A KR20160068672A KR 20160068672 A KR20160068672 A KR 20160068672A KR 1020150170586 A KR1020150170586 A KR 1020150170586A KR 20150170586 A KR20150170586 A KR 20150170586A KR 20160068672 A KR20160068672 A KR 20160068672A
Authority
KR
South Korea
Prior art keywords
protective film
flexible substrate
nanofibers
nanofiber
substrate according
Prior art date
Application number
KR1020150170586A
Other languages
Korean (ko)
Inventor
유병묵
송인규
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to TW104140741A priority Critical patent/TWI684119B/en
Priority to PCT/KR2015/013219 priority patent/WO2016089159A1/en
Publication of KR20160068672A publication Critical patent/KR20160068672A/en

Links

Images

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper

Abstract

The present invention relates to a flexible substrate and a manufacturing method thereof and, more specifically, to a flexible substrate comprising: a separation layer; a first protection layer arranged on the separation layer; and an electrode pattern arranged on the first protection layer. The first protection layer includes: a first protection layer material; and a nano-textile scattered in the first protection layer material. Accordingly, the flexible substrate has high strength, thereby having highly resistant flexural fatigue.

Description

[0001] FLEXIBLE SUBSTRATE AND PREPARING METHOD THEREOF [0002]

The present invention relates to a flexible substrate and a method of manufacturing the same.

The touch screen panel is an input device that allows a user to input a command by selecting an instruction displayed on a screen of a video display device or the like as a human hand or an object.

To this end, the touch screen panel is provided on the front face of the image display device and converts the contact position, which is in direct contact with a human hand or an object, into an electrical signal. Thus, the instruction content selected at the contact position is accepted as the input signal.

Such a touch screen panel can be replaced with a separate input device connected to the image display device such as a keyboard and a mouse, and thus the use range thereof is gradually expanding.

The touch screen panel is known as a resistive film type, a light sensing type, and a capacitive type. Among the capacitive touch screen panels, a conductive sensing pattern is formed when a human hand or an object is contacted, The contact position is converted into an electrical signal by detecting a change in capacitance formed with another sensing pattern or a ground electrode or the like.

Such a touch screen panel is generally attached to the outer surface of a flat panel display device such as a liquid crystal display device or an organic light emitting display device and is often commercialized. Therefore, the touch screen panel requires high transparency and thin thickness characteristics.

In addition, in recent years, a flexible flat panel display has been developed, and in this case, the touch screen panel attached on the flexible flat panel display also needs a flexible characteristic.

In such a flexible touch screen panel, a bending such as bending or bending is continuously applied, and a substrate used therefor is required to have a property that it is not broken even when bending fatigue of several tens of thousands or more times is applied.

However, such a substrate having sufficient fatigue fracture resistance has not yet been established.

Korean Patent No. 647701 discloses a flexible substrate, a flexible thin film transistor substrate, and a flat panel display device having the same.

Korean Patent No. 647701

An object of the present invention is to provide a flexible substrate capable of suppressing the occurrence of cracks.

An object of the present invention is to provide a flexible substrate having excellent optical characteristics.

1. separation layer;

A first protective layer disposed on the isolation layer; And

And an electrode pattern disposed on the first protective film,

Wherein the first protective film comprises a first protective film material and nanofibers interspersed in the first protective film material.

2. The nanofiber of claim 1, wherein the nanofiber comprises glass nanofibers; Or at least one nanofiber selected from the group consisting of Al 2 O 3 , MgO and SiO 2 .

3. The flexible substrate according to 1 above, wherein the refractive index difference between the first protective film material and the nanofibers is 0.1 or less.

4. The flexible substrate according to 2 above, wherein the nanofibers have a diameter of 2 to 5 nm and a length of 200 to 500 nm.

5. The flexible substrate according to item 1 above, wherein the nanofibers have a refractive index of 1.46 to 1.56.

6. The flexible substrate according to 2 above, wherein the nanofibers are contained in the first protective film in an amount of 5 to 25% by weight.

7. The flexible substrate according to 1 above, wherein the nanofiber is a cellulose nanofiber.

8. The flexible substrate according to 7 above, wherein the nanofiber has a diameter of 1 to 50 nm and a length of 500 to 2,000 nm.

9. The flexible substrate according to 7 above, wherein the nanofibers are contained in the first protective film in an amount of 1 to 50% by weight.

10. The flexible substrate according to 1 above, wherein the first protective film is formed of a composition for forming a first protective film including an acrylic copolymer, a polyfunctional acrylic monomer, a photoinitiator, a curing aid, a solvent and a nanofiber.

11. The flexible substrate according to 1 above, further comprising a flexible substrate adhered on the first protective film on which the electrode pattern is disposed.

12. The flexible substrate of claim 11, further comprising a second protective film between the first protective film and the flexible substrate.

13. The flexible substrate of claim 12, wherein the second protective film comprises a nanofiber interspersed with a second protective film material and a second protective film material.

14. The flexible substrate according to 13 above, wherein the refractive index difference between the material of the second protective film and the nanofibers is 0.1 or less.

The flexible substrate of the present invention has improved strength and is excellent in resistance to bending fatigue. Accordingly, breakage due to bending fatigue can be suppressed.

In addition, the flexible substrate of the present invention can exhibit not only the above improved strength but also excellent optical characteristics.

1 is a schematic cross-sectional view of a flexible substrate according to an embodiment of the present invention.
2 is a schematic cross-sectional view of a flexible substrate according to an embodiment of the present invention.
3 and 4 are schematic flow diagrams of a method of manufacturing a flexible substrate according to an embodiment of the present invention.

The present invention relates to a semiconductor device, A first protective layer disposed on the isolation layer; And an electrode pattern disposed on the first protective film. The first protective film includes the first protective film material and the nanofibers interspersed in the first protective film material, so that the first protective film has improved strength, And a method of manufacturing the same.

FIGS. 1 and 2 are schematic cross-sectional views of a flexible substrate according to an embodiment of the present invention. Hereinafter, the present invention will be described in detail with reference to the drawings.

The separation layer 10 is a layer formed for separation from the carrier substrate 60 and covers the electrode pattern 30 to protect the electrode pattern 30. [

The separation layer 10 may be a polymer organic film, and may be a polyimide-based polymer, a poly vinyl alcohol-based polymer, a polyamic acid-based polymer, a polyamide-based polymer , A polymer based on polyethylene, a polymer based on polystyrene, a polymer based on polynorbornene, a polymer based on phenylmaleimide copolymer, a polymer based on polyazobenzene, a polymer based on polyphenylene phthalamide based polymer, a polyphenylenephthalamide-based polymer, a polyester-based polymer, a polymethyl methacrylate-based polymer, a polyarylate-based polymer, a cinnamate-based polymer, a coumarin- A phthalimidine-based polymer, a chalcone-based polymer, and an aromatic acetylene-based polymer may be used. It is not limited. These may be used alone or in combination of two or more.

The first protective layer 20 is disposed on the separation layer 10 and functions as a passivation layer for the electrode pattern 30 to be described later. The first protective layer 20 covers the electrode pattern 30, Thereby preventing the pattern 30 from being contaminated. In addition, cracking of the flexible substrate due to use such as folding and bending is prevented when the carrier substrate 60 is separated from the substrate.

The first protective film 20 includes a material of the first protective film 20 and nanofibers scattered in the material of the first protective film 20.

The strength of the first protective film 20 is improved by including the nanofibers interspersed in the material, and the breakage due to fatigue of the flexible substrate can be remarkably reduced.

Applying repeated stresses to a solid material destroys the material at a much lower stress than the tensile strength. The continuous fatigue of the material is the repetitive stress applied to the material, and fatigue failure is called fatigue failure.

However, when the refractive index of the nanofiber differs from that of the material of the first protective layer 20, the nanofibers may be visually observed, or the optical characteristics of the display using the flexible substrate may be deteriorated.

Therefore, from the viewpoint of exhibiting excellent strength and having an appropriate refractive index and exhibiting excellent optical characteristics at the same time, the nanofiber is preferably a glass nanofiber; Or at least one kind of nanofiber selected from the group consisting of Al 2 O 3 , MgO and SiO 2 .

As the glass nanofiber, any of those known in the art can be used without limitation. For example, glass nanofibers including Al 2 O 3 , BaO, CaO, MgO, NaO 2 , SiO 2 , It is preferable to use glass nanofibers including Al 2 O 3 , MgO, SiO 2 and the like in view of prevention and optical characteristics. These may be used alone or in combination of two or more.

The difference in refractive index between the nanofiber and the material of the first protective film 20 is preferably 0.1 or less. If the refractive index difference is more than 0.1, there may arise a problem that the nanofiber is visually observed or the optical characteristics are deteriorated. More preferably, the refractive index difference may be 0.05 or less.

The refractive index of the nanofiber is not particularly limited, and may be, for example, 1.46 to 1.56. The above-mentioned refractive index range is preferable in that it exhibits excellent optical characteristics because it has a difference in refractive index with the above-mentioned first protective film material. More preferably, the refractive index may be 1.48 to 1.52.

The nanofibers may have a diameter of 2 nm to 5 nm and a length of 200 nm to 500 nm. If the diameter and length are less than the above range, handling may be difficult, and if the diameter and length are out of the above range, the nanofiber may be visually observed or optical properties may be deteriorated.

The content of the nanofiber is not particularly limited, and may be, for example, 5 to 25% by weight of the first protective film 20. When the content is less than 5% by weight, the strength improving effect may be insufficient. When the content is more than 25% by weight, the transmittance is lowered and the strength may be lowered due to agglomeration of the nanofibers.

According to another embodiment of the present invention, the nanofiber according to the present invention may be a cellulose nanofiber. Cellulose nanofibers are excellent in flexibility, and flexible substrates including them are excellent in flexibility and excellent in resistance to bending fatigue.

The cellulose nanofibers may be, for example, 1 to 50 nm in diameter and 500 to 2,000 nm in length. When the diameter and length are within the above range, handling is easy, and optical property is not deteriorated.

When the cellulose nanofiber is used as the nanofiber, the content thereof is not particularly limited and may be, for example, 1 to 50% by weight of the first protective film 20. If the content is less than 1% by weight, the effect of improving strength and flexibility may be insignificant. If the content is more than 50% by weight, the transmittance may be lowered and the strength may be lowered due to agglomeration of nanofibers. More preferably 20 to 40% by weight. Cellulose nanofibers are organic materials and have a smaller specific gravity than inorganic nanofibers. Therefore, the cellulose nanofibers do not sink well. Therefore, the cellulose nanofibers are larger in diameter and length than the inorganic nanofibers described above, and even when added in an excess amount, coagulation and lowering of transmittance are less likely to occur.

As the first protective film 20, an organic or inorganic polymer material known in the art may be used as long as it satisfies the refractive index difference. Specific examples thereof include acrylic copolymer, polyfunctional acrylic monomer, photoinitiator, , A solvent, and a composition for forming the first protective film including the nanofibers.

As the acrylic copolymer, an acrylic copolymer having a modified epoxy group can be used.

The acrylic copolymer having a modified epoxy group can be obtained by polymerizing monomers comprising an unsaturated carboxylic acid monomer and a monomer containing an unsaturated compound monomer containing an epoxy group, and an olefinically unsaturated monomer.

The content of the unsaturated carboxylic acid monomer may be from 5 to 50% by weight, and preferably from 8 to 30% by weight, based on the total weight of the acrylic copolymer (solid content). When the content of the unsaturated carboxylic acid compound is less than 5% by weight, the solubility in an aqueous alkali solution is lowered. When the content of the unsaturated carboxylic acid compound is more than 50% by weight, solubility in an aqueous alkali solution becomes too large.

As the unsaturated carboxylic acid monomer, acrylic acid, methacrylic acid, methylmethacrylic acid, maleic acid, fumaric acid, citraconic acid, metaconic acid, itaconic acid, or anhydrides thereof may be used singly or in combination of two or more.

Examples of the unsaturated compound monomer containing an epoxy group include glycidyl acrylate, glycidyl methacrylate, glycidyl? -Ethyl acrylate, glycidyl? -N-propyl acrylate, glycidyl? -N-butyl acrylate Acrylic acid-beta -methylglycidyl, methacrylic acid-beta -methylglycidyl, acrylic acid-beta -ethylglycidyl, methacrylic acid- beta -ethylglycidyl, Butyl methacrylate-3,4-epoxybutyl acrylate, 6,7-epoxyhexyl acrylate, methacrylic acid-6,7-epoxyheptyl,? -Ethylacrylic acid-6,7-epoxyheptyl, Vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, etc. These may be used alone or in admixture of two or more.

The content of the unsaturated compound monomer containing an epoxy group may be 10 to 40% by weight based on the total weight of the acrylic copolymer (solid content).

Examples of the olefinically unsaturated monomer include methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, tert-butyl methacrylate, methyl acrylate, isopropyl acrylate, Acrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyloxyethyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, , Isobornyl methacrylate, cyclohexyl acrylate, 2-methylcyclohexyl acrylate, dicyclopentanyloxyethyl acrylate, isobornyl acrylate, phenyl methacrylate, phenyl acrylate, benzyl acrylate, 2-hydroxyethyl methacrylate, styrene,? -Methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p (Methoxystyrene), 1,3-butadiene, isoprene, 2,3-dimethyl 1,3-butadiene, 3- (trimethoxysilyl) propyl methacrylate and the like, Can be used.

The content of the olefinic unsaturated compound monomer may be 10 to 85% by weight based on the total weight of the acrylic copolymer (solid content). If it is less than 10% by weight, the stability of the acrylic copolymer is excessively reduced, and if it exceeds 85% by weight, the degree of curing may be rapidly deteriorated.

Further, in the acrylic copolymer according to the present invention, the use of additional monomers in addition to the three monomers is not limited by the consideration of those skilled in the art.

In order to produce an acrylic copolymer, a polymerization initiator can be used. Examples of the polymerization initiator include 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvalero Nitrile), 2,2'-azobis (4-methoxy 2,4-dimethylvaleronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), or dimethyl 2,2'-azo And bisisobutylate.

The acrylic copolymer preferably has a polystyrene reduced weight average molecular weight of 6,000 to 30,000.

In the composition for forming a first protective film of the present invention, the acrylic copolymer having a modified epoxy group (solid content) is preferably included in an amount of 5 to 60 parts by weight based on 100 parts by weight of the entire composition. When the content is less than 5 parts by weight, the coating property may be rapidly deteriorated. When the content is more than 60 parts by weight, the curing degree and developability of the composition for forming the first protective film may be lowered.

As the polyfunctional acrylic monomer, a monomer having at least two ethylenic double bonds can be used. Specific examples include 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, trimethylolpropane diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, penta But are not limited to, ethylene glycol diacrylate, erythritol tetraacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol hexadiacrylate, dipentaerythritol triacrylate, dipentaerythritol diacrylate, sorbitol triacrylate, Dipentaerythritol polyacrylate, or methacrylates thereof, may be used alone or in admixture of two or more.

The polyfunctional acrylic monomer is preferably contained in an amount of 2 to 40 parts by weight based on 100 parts by weight of the entire composition. If the content is less than 2 parts by weight, the thickness of the residual film may be thin and physical properties may be deteriorated. If the content is more than 40 parts by weight, the resolution may be lowered.

As the photoinitiator, acetophenone, benzophenone, triazine, benzoin, imidazole, xanthone, etc. may be used alone or in combination. The photoinitiator is preferably included in an amount of 0.5 to 10 parts by weight based on 100 parts by weight of the entire composition.

The curing aid acts to help the epoxy ring opening reaction of the acrylic copolymer to occur at a temperature of 140 to 170 캜 which is lower than the conventional temperature of about 220 캜.

As the curing aid, a compound having an isocyanate group can be used. For example, it is preferable to use triglycidyl isocyanurate, tris- (2-carboxyethyl) isocyanurate and dicyanamide each alone or in combination of two or more thereof.

The curing aid is preferably contained in an amount of 0.1 to 3 parts by weight based on 100 parts by weight of the total composition. When the content is less than 0.1 parts by weight, sufficient hardening of the epoxy group is not achieved, and physical properties such as hardness may be deteriorated. If the content is more than 3 parts by weight, unreacted monomer may remain to deteriorate long term reliability.

The solvent is used to dissolve the above-mentioned components and to obtain excellent coating properties and a transparent thin film, and a suitable one used in this field can be adopted in consideration of compatibility with the solid component.

Examples of the solvent include alcohols such as methanol, ethanol, methyl ethylcarbitol and diethylene glycol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and propylene glycol butyl ether acetate; Propylene glycol dialkyl acetates such as propylene glycol methyl ethyl acetate; Propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate and propylene glycol butyl ether propionate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, and 4-hydroxy 4-methyl 2-pentanone; Or an organic acid such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy 2-methylpropionate, ethyl 2-hydroxy 2-methylpropionate, methylhydroxyacetate, Hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, Methyl methoxyacetate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, ethoxyacetate, butyl ethoxyacetate, methylpropoxyacetate Propoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy Ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, methyl 2-ethoxypropionate, methyl 2-ethoxypropionate, Methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, methyl 3-ethoxypropionate, methyl 3-ethoxypropionate, propyl 3-ethoxypropionate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, Ethoxypropionate, propyl 3-ethoxypropionate, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, Esters such as methyl propionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, butyl 3-butoxypropionate, etc. These may be used alone or as a mixture of two or more thereof . Considering the reactivity and the solubility in an alkali solution, it is preferable that the solvent includes a glycol ether system, an ethylene alkyl ether acetate system, diethylene glycol, and the like.

The above-mentioned solvents may also be used in the production of the acrylic copolymer.

The solvent may be added so that the entire composition has an appropriate viscosity, and the content thereof is not particularly limited. The other ingredients in the composition are added to the composition so as to have the above-mentioned content with respect to 100 parts by weight of the total composition to occupy the remaining amount (remaining amount) of the composition. For example, from 11 to 92 parts by weight based on 100 parts by weight of the total composition, but the present invention is not limited thereto.

Alternatively, the composition for forming a first protective layer of the present invention may further include an adhesion promoting agent to improve adhesion of the first protective layer 20 to the separation layer 10.

Examples of the adhesion promoter include 4,4 ', 4 "-methylidyne trisphenol, 4,4', 4" -ethylidine trisphenol, 4- [bis (4-hydroxyphenyl) methyl] -2- methoxyphenol , 4,4 '- [(2-hydroxyphenyl) methylene] bis [2-methylphenol] (4-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4 '- [(3-hydroxyphenyl) methylene] Ethoxysilane, etc. may be used alone or in combination of two or more.

The adhesion promoting agent is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the entire composition.

Alternatively, the first protective film forming composition of the present invention may further comprise a silicone surfactant for uniform dispersion of each component.

Examples of the silicone surfactant include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, (3- (3-glycidoxypropyl) dimethylethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3,4 -Epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltrimethoxysilane May be used alone or in combination of two or more.

The silicone surfactant is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.

The composition for forming the first protective film may be, for example, one that has been adjusted to exhibit the refractive index difference with the nanofiber described above. Specifically, since inorganic nanofibers have a refractive index somewhat higher than that of cellulose nanofibers, glass nanofibers; Or when at least one kind of nanofiber selected from the group consisting of Al 2 O 3 , MgO and SiO 2 is used, a treatment for increasing the refractive index may be performed. Examples of such a method include a method of increasing the proportion of the aromatic acrylic monomer to the constituent components of the composition for forming the first protective film and the like.

The electrode pattern (30) is disposed on the first protective film (20).

As the electrode pattern 30, any conductive material may be used without limitation, and examples thereof include indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO) (ITO-Ag-ITO), indium zinc oxide-silver-indium zinc oxide (IZO-Ag-IZO), indium zinc tin oxide (GZO), florine tin oxide (FTO), indium tin oxide Metal oxide materials selected from the group consisting of oxide-silver-indium zinc tin oxide (IZTO-Ag-IZTO) and aluminum zinc oxide-silver-aluminum zinc oxide (AZO-Ag-AZO); Metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), molybdenum (Mo) and APC; Nanowires of metals selected from the group consisting of gold, silver, copper and lead; Carbon-based materials selected from the group consisting of carbon nanotubes (CNT) and graphene; And a conductive polymer material selected from the group consisting of poly (3,4-ethylenedioxythiophene) (PEDOT) and polyaniline (PANI). These may be used alone or in combination of two or more.

The electrode pattern 30 may further include a photosensitive resist pattern on the pattern.

The flexible substrate of the present invention further includes a flexible substrate 50 attached on the first protective film 20 on which the electrode pattern 30 is disposed.

The flexible substrate 50 can be used without limitation to a transparent film made of a material widely used in the art, for example, a cellulose ester (e.g., cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate pro Polyanhydrides such as polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane- 4,4'-dicarboxylate and polybutylene terephthalate, polystyrenes such as syndiotactic polystyrene, polyolefins such as polypropylene, polyethylene and polymethylpentene, polysulfone, polyethersulfone, Polyarylate, polyether-imide, polymethylmethacrylate, polyetherketone, poly Vinyl alcohol, and polyvinyl chloride, or a mixture thereof.

The flexible substrate 50 may be adhered using a water-based adhesive, an adhesive, or a photo-curing or thermosetting adhesive or an adhesive known in the art.

If necessary, the flexible substrate of the present invention may further include a second protective film 40 between the first protective film 20 and the flexible substrate 50. Fig. 2 schematically shows a cross section of such a case.

When the second protective film 40 is further included, the flexible substrate 50 can be simultaneously protected from above and below to further improve the crack suppressing effect.

As the second protective film 40, organic or inorganic insulating materials known in the art can be used without limitation.

As the second protective film 40, a composition except for the nanofiber may be used in the composition for forming the first protective film, and the same composition as the composition for forming the first protective film may be used.

In other words, the second protective layer 40 may include scattered nanofibers. In this case, the refractive index difference of the nanofibers dispersed in the second protective layer 40 and the second protective layer 40 may be 0.1 or less. In such a case, the optical characteristics can be prevented from deteriorating while improving the strength.

The present invention also provides a method of manufacturing the flexible substrate.

3 and 4 are schematic process diagrams of a method of manufacturing a flexible substrate according to an embodiment of the present invention, and the present invention will be described in detail with reference to the drawings.

First, as shown in Fig. 3 (a), a separation layer 10 is formed on a carrier base material 60. As shown in Fig.

The carrier substrate 60 can be used without any particular limitation as long as it is of a material which provides adequate strength to be fixed without being bent or twisted during the process, and which has little effect on heat or chemical treatment. For example, glass, quartz, silicon wafer, cloth or the like can be used, and preferably, glass can be used.

The separation layer 10 can be formed of the above-mentioned polymer material.

The method of forming the separation layer 10 is not particularly limited and the polymer composition may be applied by a slit coating method, a knife coating method, a spin coating method, a casting method, a micro gravure coating method, a gravure coating method, Such as a wire bar coating method, a dip coating method, a spray coating method, a screen printing method, a gravure printing method, a flexo printing method, an offset printing method, an ink jet coating method, a dispenser printing method, a nozzle coating method, Or may be formed by coating by a known method.

The separation layer 10 may be further roughened after the application.

After the separation layer 10 has been formed by the above-described method, an additional curing process may be further roughened.

The curing method is not particularly limited, and it is possible to use both of the above methods by photocuring or thermosetting. The order of the photo-curing and the thermal curing is not particularly limited.

Thereafter, as shown in FIG. 3 (b), a first protective film 20 is formed on the separation layer 10.

The first protective film 20 includes a material of the first protective film 20 and nanofibers scattered in the material of the first protective film 20.

As the nanofiber, the nanofiber described above can be used.

The nanofiber may have a refractive index difference of 0.1 or less with respect to the material of the first protective film 20 and 5 to 25% by weight of the nanofiber may be included in the first protective film 20, for example.

The first protective film 20 can be formed by applying a composition for forming a first protective film including the nanofibers described above on the separation layer 10 and curing the same.

The coating method is not particularly limited, and the same method as the coating method of the composition for forming the separation layer 10 can be used.

The photocuring condition of the first protective film 20 is not particularly limited as long as it is controlled to such an extent that sufficient curing can be achieved without compromising the physical properties of the cured product. For example, within 24 hours.

The light amount, for example from 10 to 1,000mJ / cm 2, and preferably may be from 10 to 500mJ / cm 2. When the amount of light is less than 10 mJ / cm 2 , sufficient curing does not occur, and when it exceeds 1,000 mJ / cm 2 , yellowing or cracking may occur.

In addition, the first protective film 20 may be more thermally hardened after the photocuring.

As a specific example, after performing the photo-curing for 30 seconds to 5 minutes, thermal curing can be performed.

The thermosetting may be performed at, for example, less than 220 ° C, preferably 200 ° C or less. When the thermal curing is performed at 220 캜 or higher, there is a problem that the carrier base material 60 can not be used when its thermal expansion coefficient is high or its glass transition temperature Tg is low.

The thermosetting can be carried out, for example, for 30 minutes to 120 minutes.

To increase the thermal curing rate, the composition for forming the first protective film may further include a thermosetting auxiliary.

3 (c), the electrode pattern 30 is formed on the first protective film 20. Then, as shown in FIG.

The electrode pattern 30 can be formed of a material such as the above-mentioned metal oxide materials, metals, metal nanowires, carbon-based materials, and conductive polymer materials.

The method of forming the electrode pattern 30 is not particularly limited and may be selected from a physical vapor deposition method, a chemical vapor deposition method, a plasma deposition method, a plasma polymerization method, a thermal polymerization method, a thermal deposition method, a thermal oxidation method, an anodic oxidation method, a cluster ion beam deposition method, A printing method, an offset printing method, an ink jet coating method, a dispenser printing method, and the like.

The method of manufacturing a flexible substrate according to the present invention further includes the step of attaching the flexible substrate 50 onto the first protective film 20 on which the electrode pattern 30 is formed.

FIG. 4 is a process diagram for forming the second protective film 40 before the flexible substrate 50 is attached, but the present invention is not limited thereto and the second protective film 40 may not be formed.

The flexible substrate 50 may be adhered using a water-based adhesive, an adhesive, or a photo-curable or thermosetting adhesive or an adhesive known in the art.

As the flexible substrate 50, the above-mentioned transparent film can be used.

The method of manufacturing a flexible substrate according to the present invention may further comprise the step of forming a second protective film 40 on the first protective film 20 on which the electrode pattern 30 is formed before attaching the flexible substrate 50 .

In the case of forming the second protective film 40, the crack preventing effect can be further improved.

The second protective film 40 may be formed of the same composition as the composition for forming the first protective film or the composition for forming the first protective film except for the organic or inorganic insulating material, nanofiber, and the like.

The method of forming the second protective film 40 is not particularly limited, and can be formed in the same manner as the first protective film 20, for example.

The flexible substrate can be manufactured by separating the separation layer 10 from the carrier substrate, and the separation timing is not particularly limited. For example, after the formation of the electrode pattern 30, after the formation of the second protective film 40, or It may be separated after the attachment of the flexible substrate 50.

The method for producing a flexible substrate according to the present invention can suppress cracks that may occur at the time of separation from the carrier substrate or at the time of use by forming the first protective layer in which the nanofibers are scattered, can do.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

Synthesis Example 1 . Preparation of acrylic copolymer

70 parts by weight of propylene glycol methyl ethyl acetate (PGMEA), 10 parts by weight of glycidyl methacrylate, 1 part by weight of 3- (trimethoxysilyl) propyl methacrylate, 8 parts by weight of methyl methacrylate, 10 parts by weight of methyl methacrylate was added, and 1 part by weight of 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile) was added as an initiator, followed by stirring the mixture. The temperature of the reaction solution was increased to 70 ° C. and reacted for 6 hours to form an acrylic copolymer.

Synthetic example  2. Preparation of Acrylic Copolymer

70 parts by weight of propylene glycol methyl ethyl acetate (PGMEA) as a solvent, 1 part by weight of 3- (trimethoxysilyl) propyl methacrylate, 8 parts by weight of methyl methacrylic acid and 20 parts by weight of methyl methacrylate were added to the flask, 1 part by weight of 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile) was added, and the mixture was stirred. The temperature of the reaction solution was increased to 70 ° C. and reacted for 6 hours to form an acrylic copolymer.

Manufacturing example . Preparation of composition for forming protective film

27 parts by weight of an acrylic copolymer of Synthesis Example 1, 27 parts by weight of an acrylic copolymer of Synthesis Example 2, 36 parts by weight of dipentaerythritol hexaacrylate as a multifunctional acrylate monomer, 4.3 parts by weight of? -Hydroxyalkylphenone as a photoinitiator , 3 parts by weight of tris- (2-carboxyethyl) isocyanurate as a curing aid, 2.7 parts by weight of a silane coupling agent for improving adhesiveness, 30 parts by weight of diethylene glycol methyl ethyl ether (MEDG) as a solvent and 30 parts by weight of propylene glycol monomethyl 40 parts by weight of ether acetate (PGMEA) and 30 parts by weight of 3-methoxybutanol were mixed.

Then, a composition for forming a protective film was prepared by adding the components and the contents (weight% in the total weight of the protective film forming composition) shown in Table 1 to the mixture.

division Nanofiber ingredient content Production Example 1 A 5 Production Example 2 A 15 Production Example 3 A 20 Production Example 4 A 3 Production Example 5 A 30 Production Example 6 B 15 Production Example 7 C 15 Production Example 8 - - Production Example 9 D One Production Example 10 D 50 Production Example 11 D 53 A: Glass nanofiber (diameter: 2 to 5 nm, length: 200 to 500 nm, S-glass fiber, ASAHI KASEI)
B: Al 2 O 3 nanofiber (diameter: 2 to 5 nm, length: 200 to 500 nm, manufactured by CNVISION)
C: SiO 2 nanofiber (diameter: 2 to 5 nm, length: 200 to 500 nm, manufactured by MEMPRO)
D: Cellulose nanofibers (diameter: 1 to 50 nm, length: 500 to 2000 nm,

Example

A separating layer containing polyimide was coated to a thickness of 0.13 占 퐉 on a soda lime glass having a thickness of 700 占 퐉. Thereafter, the composition for forming a protective film of the above production example was coated on the separation layer and cured under a condition of 180 mJ / cm 2 to form a first protective film having a thickness of 1.5 탆.

Thereafter, an ITO layer having a thickness of 0.05 mu m was formed on the first protective film, and a photosensitive resist was coated on the ITO layer to form an electrode pattern.

Thereafter, a second protective film was formed on the first protective film on which the electrode pattern was formed, an acrylic adhesive layer was formed on the second protective film, and then a polycarbonate substrate having a thickness of 50 占 퐉 was adhered to prepare a flexible substrate.

division The composition for forming the first protective film Example 1 Production Example 1 Example 2 Production Example 2 Example 3 Production Example 3 Example 4 Production Example 4 Example 5 Production Example 5 Example 6 Production Example 6 Example 7 Production Example 7 Example 8 Production Example 9 Example 9 Production Example 10 Example 10 Production Example 11 Comparative Example 1 Production Example 8

Experimental Example

(1) flexion crack  evaluation

The flexible substrate of the sealer and the comparative example was cut into 100 mm x 10 mm and mounted on a flexural tester (JIRBT-210, Juniltech). After flexing 10,000 times, the occurrence of cracks in the flexible substrate was visually evaluated.

<Evaluation Criteria>

○: No crack occurred

DELTA: Micro crack occurred

X: Flexible substrate rupture

(2) Measurement of transmittance

Visible light transmittances of the flexible substrates of Examples and Comparative Examples were measured with a haze measuring device (HM-150, Murasaki).

division Refractive index of nanofiber The refractive index of the first protective film material
(Excluding nanofiber) Crack evaluation Transmittance
(%) Example 1 1.52 1.50 ○ 92.1 Example 2 1.52 1.50 ○ 89.8 Example 3 1.52 1.50 ○ 88.6 Example 4 1.52 1.50 △ 93.6 Example 5 1.52 1.50 △ 83.3 Example 6 1.68 1.50 ○ 71.7 Example 7 1.46 1.50 ○ 82.5 Example 8 1.48 1.50 ? 94.2 Example 9 1.48 1.50 ? 88.0 Example 10 1.48 1.50 ? 86.9 Comparative Example 1 - 1.50 X 95.4

Referring to Table 3, it can be confirmed that the flexible substrates of Examples 1 to 3 have improved strength and bending properties remarkably, and at the same time have a high transmittance.

Examples 4 and 5 confirm that the content of the glass nanofibers is out of the preferable range, but still exhibits excellent bending properties and transmittance.

In Example 6, it was confirmed that the refractive index difference was out of the preferable range, but exhibited remarkably excellent bending properties.

In Example 7, it was confirmed that the strength of the flexible substrate was improved and the bending property was remarkably excellent, and at the same time, it had a high transmittance.

It was confirmed that Examples 8 and 9 exhibit excellent bending properties and transmittance using cellulose nanofibers.

In Example 10, although the cellulose nanofibers were used in a somewhat excessive amount, it was confirmed that the cellulose nanofibers still exhibited excellent bending properties and transmittance.

However, the flexible substrate of Comparative Example 1 was completely broken by the flexural evaluation.

10: Separation layer 20: First protective film
30: electrode pattern 40: second protective film
50: flexible substrate 60: carrier substrate

Claims (14)

A separation layer;
A first protective layer disposed on the isolation layer; And
And an electrode pattern disposed on the first protective film,
Wherein the first protective film comprises a first protective film material and nanofibers interspersed in the first protective film material.
[2] The nanofiber according to claim 1, wherein the nanofiber comprises glass nanofibers; Or at least one nanofiber selected from the group consisting of Al 2 O 3 , MgO and SiO 2 .
The flexible substrate according to claim 1, wherein a refractive index difference between the first protective film material and the nanofibers is 0.1 or less.
The flexible substrate according to claim 2, wherein the nanofiber has a diameter of 2 to 5 nm and a length of 200 to 500 nm.
The flexible substrate according to claim 1, wherein the nanofibers have a refractive index of 1.46 to 1.56.
The flexible substrate according to claim 2, wherein the nanofibers are contained in the first protective film in an amount of 5 to 25% by weight.
The flexible substrate according to claim 1, wherein the nanofiber is a cellulose nanofiber.
The flexible substrate according to claim 7, wherein the nanofibers have a diameter of 1 to 50 nm and a length of 500 to 2,000 nm.
The flexible substrate according to claim 7, wherein the nanofibers are contained in the first protective film in an amount of 1 to 50 wt%.
The flexible substrate according to claim 1, wherein the first protective film is formed of a composition for forming a first protective film including an acrylic copolymer, a polyfunctional acrylic monomer, a photoinitiator, a curing aid, a solvent, and a nanofiber.
The flexible substrate according to claim 1, further comprising a flexible substrate adhered on the first protective film on which the electrode pattern is disposed.
12. The flexible substrate according to claim 11, further comprising a second protective film between the first protective film and the flexible substrate.
The flexible substrate according to claim 12, wherein the second protective film comprises a second protective film material and nanofibers interspersed in the second protective film material.
[14] The flexible substrate according to claim 13, wherein the refractive index difference between the material of the second protective film and the nanofibers is 0.1 or less.
KR1020150170586A 2014-12-05 2015-12-02 Flexible substrate and preparing method thereof KR20160068672A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW104140741A TWI684119B (en) 2014-12-05 2015-12-04 Flexible substrate and preparing method thereof
PCT/KR2015/013219 WO2016089159A1 (en) 2014-12-05 2015-12-04 Flexible substrate and method for manufacturing same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140174355 2014-12-05
KR20140174355 2014-12-05

Publications (1)

Publication Number Publication Date
KR20160068672A true KR20160068672A (en) 2016-06-15

Family

ID=56135282

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150170586A KR20160068672A (en) 2014-12-05 2015-12-02 Flexible substrate and preparing method thereof

Country Status (2)

Country Link
KR (1) KR20160068672A (en)
TW (1) TWI684119B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190068882A (en) * 2017-12-11 2019-06-19 한국과학기술원 Touch input device
KR20200053946A (en) * 2018-11-09 2020-05-19 단국대학교 천안캠퍼스 산학협력단 Foldable substrate for foldable display with glass fiber buffer layer and buffer layer in neutral point area

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100647701B1 (en) 2005-09-15 2006-11-23 삼성에스디아이 주식회사 Flexible substrate, flexible thin film transistor substrate and flat panel display apparatus comprising the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011003522A (en) * 2008-10-16 2011-01-06 Semiconductor Energy Lab Co Ltd Flexible light-emitting device, electronic equipment, and method of manufacturing flexible light-emitting device
TWI451317B (en) * 2010-11-26 2014-09-01 Innolux Corp Touch panel
JP5646433B2 (en) * 2011-10-31 2014-12-24 日本写真印刷株式会社 Conductive sheet and manufacturing method thereof
CN103946778B (en) * 2011-11-17 2016-09-21 郡是株式会社 Contact panel and manufacture method thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100647701B1 (en) 2005-09-15 2006-11-23 삼성에스디아이 주식회사 Flexible substrate, flexible thin film transistor substrate and flat panel display apparatus comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190068882A (en) * 2017-12-11 2019-06-19 한국과학기술원 Touch input device
KR20200053946A (en) * 2018-11-09 2020-05-19 단국대학교 천안캠퍼스 산학협력단 Foldable substrate for foldable display with glass fiber buffer layer and buffer layer in neutral point area

Also Published As

Publication number Publication date
TW201631455A (en) 2016-09-01
TWI684119B (en) 2020-02-01

Similar Documents

Publication Publication Date Title
US10336043B2 (en) Transfer film, transparent laminate, method for producing transparent laminate, capacitive input device, and image display device
TWI550349B (en) Method of forming resin cured film pattern, photosensitive resin composition, photosensitive element, method of fabricating touch panel, and rein cured film
KR101475780B1 (en) Organic-inorganic complex resin composition which is useful as a protecting layer
KR20170083284A (en) Film Touch Sensor and Method for Fabricating the Same
JPWO2013038624A1 (en) Capacitive touch panel sensor substrate manufacturing method, capacitive touch panel sensor substrate, and display device
JP2014085771A (en) Capacitance type touch panel sensor substrate and method for manufacturing the same and display device
JP2013064973A (en) Photosensitive resin composition, material for touch panel, touch panel protective film, touch panel insulating film, and touch panel
KR101938882B1 (en) Film Touch Sensor and Method for Fabricating the Same
TW201601935A (en) Transfer type photosensitive refractive index-regulating film
KR101318870B1 (en) Negative photoresist compositions with low temperature curable property
KR20160068672A (en) Flexible substrate and preparing method thereof
US10353293B2 (en) Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate
KR20170083287A (en) Film Touch Sensor and Method for Fabricating the Same
KR20170112012A (en) Film Touch Sensor and Touch Screen Panel using the same
KR20160100143A (en) Film Touch Sensor
JP2013205991A (en) Capacitive touch panel substrate formed on transparent base material and display device
JP2016151748A (en) Photosensitive conductive film, method for forming conductive pattern using the same, conductive pattern substrate, and touch panel sensor
JP6375847B2 (en) Touch panel sensor and manufacturing method thereof, touch panel sensor substrate
JP2015194799A (en) Substrate for touch panel sensor and touch panel sensor
WO2016089159A1 (en) Flexible substrate and method for manufacturing same
WO2020251004A1 (en) Curable resin composition, insulating cured film provided by curing said composition and insulating cured touch panel film provided by curing said composition, and touch panel
US20180284920A1 (en) Transfer-type photosensitive film for refractive-index modulation
KR20180097337A (en) Touch sensor and display device including the same
JP2013214271A (en) Capacitance type touch panel substrate, method for manufacturing the same, and display device
KR20170036590A (en) Film Touch Sensor and Touch Screen Panel using the same