KR20170036590A - Film Touch Sensor and Touch Screen Panel using the same - Google Patents

Abstract

The present invention relates to a film touch sensor and a touchscreen panel comprising the same. The film touch sensor comprises: a separation layer; a first protective layer arranged on the separation layer; and an electrode pattern layer arranged on the first protective layer. The first protective layer has a penetration ratio of 95% or greater. The chromaticity, b*, satisfies -1.5 to 1.5. Accordingly, the film touch sensor has a high penetration ratio and reduced formation of yellowing at high temperatures; thereby realizing excellent visibility when being applied to an image display device.

Description

[0001] The present invention relates to a film touch sensor and a touch screen panel including the same,

The present invention relates to a film touch sensor and a touch screen panel including the same.

The touch screen panel is an input device that allows a user to input a command by selecting an instruction displayed on a screen of a video display device or the like as a human hand or an object. The touch screen panel is provided on the front face of the image display device and converts a contact position in direct contact with a human hand or object into an electrical signal. Thus, the instruction content selected at the contact position is accepted as the input signal.

Such a touch screen panel can be replaced with a separate input device connected to the image display device such as a keyboard and a mouse, and thus the use range thereof is gradually expanding.

The touch screen panel is known as a resistive film type, a light sensing type, and a capacitive type. Among the capacitive touch screen panels, a conductive sensing pattern is formed when a human hand or an object is contacted, The contact position is converted into an electrical signal by detecting a change in capacitance formed with another sensing pattern or a ground electrode or the like.

Such a touch screen panel is generally attached to the outer surface of a flat panel display device such as a liquid crystal display device or an organic light emitting display device and is often commercialized. Therefore, the touch screen panel requires high transparency and thin thickness characteristics.

In addition, in recent years, a flexible flat panel display has been developed, and in this case, the touch screen panel attached on the flexible flat panel display also needs a flexible characteristic.

In such a flexible touch screen panel, a bending such as bending or bending is continuously applied, and a substrate used therefor is required to have a property that it is not broken even when bending fatigue of several tens of thousands or more times is applied.

However, such a substrate having sufficient fatigue fracture resistance has not yet been established.

Korean Patent No. 647701 discloses a flexible substrate, a flexible thin film transistor substrate, and a flat panel display device having the same.

Korean Patent No. 647701

An object of the present invention is to provide a film touch sensor having excellent visibility of an image to be implemented.

An object of the present invention is to provide a film touch sensor with improved heat resistance and hardness.

It is an object of the present invention to provide a touch screen panel having the film touch sensor.

It is another object of the present invention to provide an image display apparatus having the touch screen panel.

1. separation layer;

A first protective layer disposed on the isolation layer; And

And an electrode pattern layer disposed on the first passivation layer,

Wherein the first protective layer has a transmittance of 95% or more and a chromaticity b * of -1.5 to 1.5.

2. The film touch sensor according to 1 above, wherein the first protective layer is formed of a composition for forming a protective layer containing an isocyanurate compound.

3. The film touch sensor of claim 2, wherein the isocyanurate compound comprises a compound represented by the following formula (1):

[Chemical Formula 1]

(Wherein R ₁ , R ₂ and R ₃ are each independently an alkyl group having 1 to 20 carbon atoms whose terminal is substituted with an acrylate group or a hydrophilic group, and the alkyl group includes at least one oxygen atom or an ester group in the carbon chain You can do it).

4. The film touch sensor according to item 3, wherein the compound represented by the formula (1) is at least one selected from compounds represented by the following formulas (2) to (4)

(2)

(3)

[Chemical Formula 4]

(Wherein n, m and l are each independently an integer of 1 to 3).

5. The film touch sensor of 1 above, wherein the first protective layer has a surface roughness (Ra) of 30 A or less.

6. The film touch sensor according to 2 above, wherein the isocyanurate compound is contained in an amount of 10 to 90% by weight based on the total weight of the composition for forming a protective layer based on the solid content.

7. The film touch sensor according to 2 above, wherein the isocyanurate compound has a glass transition temperature (Tg) of 200 ° C to 300 ° C when the homopolymer is formed.

8. The film touch sensor of 2 above, wherein the composition for forming a protective layer further comprises a polymerization initiator and a solvent.

9. The film touch sensor of 2 above, wherein the composition for forming the protective layer further comprises an acrylic copolymer.

10. The film touch sensor according to the above 9, wherein the acrylic copolymer comprises a urethane acrylate resin.

11. The film touch sensor of claim 10, wherein the urethane acrylate resin has an elongation of 30 to 200% when the homopolymer is formed.

12. The film touch sensor of claim 10, wherein the urethane acrylate resin comprises a polymerizable carbon double bond at at least one end.

13. The film touch sensor of 1 above, wherein the first protective layer has an elastic modulus of 2.8 to 4.5 GPa.

14. The film touch sensor of claim 1, wherein the first protective layer is subjected to a heat treatment process at 220 to 240 DEG C for 20 minutes to 100 minutes.

15. A touch screen panel comprising a film touch sensor according to any one of claims 1 to 14.

16. An image display device comprising the touch screen panel of the fifteenth aspect.

The film touch sensor of the present invention has high transmittance and reduced occurrence of yellowing even under high temperature conditions, so that excellent visibility can be realized when applied to an image display apparatus.

The film touch sensor of the present invention has an improved strength and is excellent in resistance to bending fatigue, thereby suppressing breakage due to bending fatigue.

The film touch sensor of the present invention can realize not only the improved strength but also the thermal expansion and the excellent surface roughness.

1 is a schematic cross-sectional view of a film touch sensor according to an embodiment of the present invention.
2 is a schematic cross-sectional view of a film touch sensor according to an embodiment of the present invention.
3 and 4 are schematic flow diagrams of a method of manufacturing a film touch sensor according to an embodiment of the present invention.
5 is a photograph comparing the thermal expansion characteristics of Example 2 and Comparative Example 1 of the present invention.

The present invention relates to a film touch sensor and a touch screen panel including the touch sensor panel, and more particularly, A first protective layer disposed on the isolation layer; And an electrode pattern layer disposed on the first passivation layer, wherein the first passivation layer has a transmittance of 95% or more and a chromaticity b * of -1.5 to 1.5, whereby the transmittance is high even under high temperature conditions The occurrence of yellowing is reduced, and excellent visibility can be realized when applied to an image display apparatus.

1 and 2 are schematic cross-sectional views of a film touch sensor according to an embodiment of the present invention. Hereinafter, the present invention will be described in detail with reference to the drawings.

A film touch sensor according to the present invention includes a separation layer (10); A first protective layer (20) disposed on the isolation layer (10); And an electrode pattern layer disposed on the first passivation layer 20.

Separation layer (10)

A film touch sensor of thin film is usually manufactured by forming a separation layer 10 on an upper part of a carrier substrate, performing a lamination process on the separation layer 10, and then peeling the carrier substrate from the upper laminate , And therefore, the separation layer 10 is a layer formed for separation from the carrier substrate.

The separation layer 10 according to the present invention is positioned below the first protection layer 20 which is a layer for protecting the electrode pattern covered with the electrode pattern layer.

The material of the separation layer 10 is not particularly limited but may be a polymer organic film. Examples of the material include a polyimide-based polymer, a poly vinyl alcohol-based polymer, a polyamic acid-based polymer, Based polymer, a polyamide-based polymer, a polyethylene-based polymer, a polystylene-based polymer, a polynorbornene-based polymer, a phenylmaleimide copolymer-based polymer, a polyazobenzene- Polymer, polyphenylenephthalamide-based polymer, polyester-based polymer, polymethyl methacrylate-based polymer, polyarylate-based polymer, cinnamate-based polymer, Polymers such as coumarin-based polymers, phthalimidine-based polymers, chalcone-based polymers, and aromatic acetylene-based polymers It may be prepared, but is not limited to this. These may be used alone or in combination of two or more.

The first protective layer 20,

The first passivation layer 20 according to the present invention is disposed on the separation layer 10 and covers the electrode pattern to be described later to serve as a passivation layer for the electrode pattern layer.

Generally, in the case of an organic material used as a material of a protective layer or in a film manufacturing process such as an annealing process of an upper electrode pattern layer or as a product, when it is subjected to various temperature changes such as heating / cooling, There is a problem that the transmittance is decreased and the visibility of the image to be implemented is lowered.

However, in the present invention, even if the first protective layer 20 has a transmittance of 95% or more, preferably 98% or more and a chromaticity b * of 1.5 to 1.5 after the heat treatment environment, The visibility of the display device can be remarkably improved.

In the present invention, the transmittance and the chromaticity of the first protective layer 20 are obtained even after the completion of the curing of the protective layer and subsequent to the subsequent heat treatment environment (process). For example, at 220 to 240 ° C, It may have been measured after heating for 100 minutes. The temperature and time conditions include subsequent annealing conditions such as a range for annealing the electrode pattern layer and a range for baking the second protective layer. When the above-described conventional organic materials are used, deterioration easily occurs under the above conditions , The transmittance is lowered, the hue is changed, and the visibility is lowered.

However, the first protective layer 20 according to the present invention can maintain the transmittance and chromaticity ranges described above even after heating at 220 to 240 ° C for 20 minutes to 100 minutes.

In the present invention, when the transmittance of the first protective layer 20 is less than 95% after heating at 220 to 220 to 240 ° C for 20 minutes to 100 minutes, as the range where deterioration occurs during the manufacturing process of the product, The visibility suitable for the display device can not be realized. When the chromaticity b * of the first protective layer 20 is in the range of -1.5 to 1.5 after the temperature is raised at 220 to 220 to 240 ° C for 20 to 100 minutes, The visibility suitable for the apparatus can not be realized. In particular, blues may occur when the chromaticity b * is less than -1.5, and yellowing may occur when the chromaticity b * exceeds +1.5.

The transmittance and chromaticity of the first protective layer 20 according to the present invention are determined by the material (the glass transition temperature of the polymeric material, etc.) of the first protective layer 20, the conditions of the protective layer forming step, Lt; / RTI >

In one embodiment of the present invention, the first protective layer 20 according to the present invention may be formed of a composition for forming a protective layer containing an isocyanurate compound.

The isocyanurate compound according to the present invention is a compound capable of polymerizing and improving the crosslinking efficiency of the protective layer, and can improve the strength of the film, thereby improving the resistance to bending fatigue of the film. Further, since the isocyanurate compound is polymerized to exhibit a comparatively high glass transition temperature (Tg), the heat resistance of the film is simultaneously improved, thereby reducing yellowing and providing a smooth surface.

When the isocyanurate compound is used, a flat surface can be provided without a wrinkle due to a small thermal expansion even in a high temperature environment during a heat treatment in a subsequent step such as a protective layer forming step and an upper electrode pattern layer forming step. In this respect, the first protective layer 20 according to the present invention may have a surface roughness Ra of 30 Å or less, more preferably 15 Å or less. When the surface roughness is in the above range, the haze can be reduced to improve the visibility, which is preferable.

For reference, when a continuous stress is applied to a solid material, the material is broken at a stress much lower than the tensile strength. The continuous fatigue of the material is the repetitive stress applied to the material, and fatigue failure is called fatigue failure.

The kind of the isocyanurate compound is not particularly limited, and may be, for example, a compound represented by the following formula (1).

[Chemical Formula 1]

(Wherein R ₁ , R ₂ and R ₃ are each independently an alkyl group having 1 to 20 carbon atoms whose terminal is substituted with an acrylate group or a hydrophilic group, and the alkyl group includes at least one oxygen atom or an ester group in the carbon chain At this time, the hydrophilic group may preferably be a hydroxyl group, a carboxyl group, etc.).

Specific examples of the compound represented by the formula (1) include compounds represented by the following formulas (2) to (4), which may be used alone or as a mixture of two or more thereof.

(2)

(3)

[Chemical Formula 4]

(Wherein n, m and l are each independently an integer of 1 to 3).

The content of the isocyanurate compound according to the present invention is not particularly limited and may be 10 to 90% by weight, preferably 30 to 90% by weight, based on the total content of the composition for forming a protective layer, ≪ / RTI > When it is included in the above range, it is suitable to satisfy the chromaticity and transmittance range according to the present invention, and it is possible to realize appropriate strength at the same time as securing the bending property (flexibility), and the thermal expansion suppressing effect is further improved. On the other hand, if it is contained in an amount of less than 10% by weight, it is difficult to realize the above-mentioned effect in a very small amount, and if it exceeds 90%, the degree of crosslinking excessively increases and cracking may occur during bending evaluation.

The first protective layer 20 according to the present invention may be formed of only a homopolymer of an isocyanurate compound. In this case, the glass transition temperature (Tg) of the isocyanurate compound during formation of the homopolymer is 200 Lt; 0 > C to 300 < 0 > C, preferably 230 to 300 < 0 > C. When the glass transition temperature is within the above range, it is more preferable that no deterioration occurs in the annealing process of the upper electrode pattern layer.

The composition for forming a protective layer for forming the first protective layer 20 according to the present invention may further comprise a polymerization initiator and a solvent commonly used in the art.

The polymerization initiator according to the present invention can be used alone or in combination with a photoinitiator and a thermal initiator depending on the kind of the polymerizable compound to be used.

When a photoinitiator is used as the polymerization initiator, acetophenone, benzophenone, triazine, benzoin, imidazole, xanthone, etc. may be used alone or in combination.

When a thermal initiator is used as the polymerization initiator, azo type, peroxide type and the like can be used singly or in combination.

The polymerization initiator is preferably included in an amount of 0.5 to 10 parts by weight based on 100 parts by weight of the entire composition for forming a protective layer.

The solvent is used to dissolve the above-mentioned components and to obtain excellent coating properties and a transparent thin film, and appropriate ones used in the art can be adopted in consideration of compatibility with the solid component.

Examples of the solvent include alcohols such as methanol, ethanol, methyl ethylcarbitol and diethylene glycol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and propylene glycol butyl ether acetate; Propylene glycol dialkyl acetates such as propylene glycol methyl ethyl acetate; Propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate and propylene glycol butyl ether propionate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, and 4-hydroxy 4-methyl 2-pentanone; Or an organic acid such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy 2-methylpropionate, ethyl 2-hydroxy 2-methylpropionate, methylhydroxyacetate, Hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, Methyl methoxyacetate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, ethoxyacetate, butyl ethoxyacetate, methylpropoxyacetate Propoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy Ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, methyl 2-ethoxypropionate, methyl 2-ethoxypropionate, Methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, methyl 3-ethoxypropionate, methyl 3-ethoxypropionate, propyl 3-ethoxypropionate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, Ethoxypropionate, propyl 3-ethoxypropionate, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, Esters such as methyl propionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, butyl 3-butoxypropionate, etc. These may be used alone or as a mixture of two or more thereof . Considering the reactivity and the solubility in an alkali solution, it is preferable that the solvent includes glycol ethers, ethylene alkyl ether acetates, diethylene glycol, and the like.

The above-mentioned solvents may also be used in the production of an acrylic copolymer described later.

The solvent may be added so that the entire composition has an appropriate viscosity, and the content thereof is not particularly limited. Other components in the composition for forming the protective layer are added by controlling so as to have the above-mentioned content with respect to 100 parts by weight of the total composition to occupy the remaining amount (remaining amount) of the composition. For example, 11 to 92 parts by weight based on 100 parts by weight of the composition for forming the entire protective layer, but the present invention is not limited thereto.

The composition for forming a protective layer of the present invention may contain only an isocyanurate compound and may be a isocyanurate-based homopolymer as the first protective layer. Alternatively, an acrylic copolymer may be added in addition to the isocyanurate- .

When the acrylic copolymer is further contained, the mixing ratio of the isocyanurate compound and the acrylic copolymer is not particularly limited. For example, the isocyanurate may be added in an amount of 10 to 200 parts by weight per 100 parts by weight of the acrylic copolymer And preferably 50 to 200 parts by weight. In this case, the strength is improved and the bending property is remarkably excellent. At the same time, excellent heat resistance is exhibited and the occurrence of yellowing can be reduced.

When the acrylic copolymer is a urethane acrylic resin, isocyanurate may be mixed in an amount of 20 to 90 parts by weight, preferably 25 to 80 parts by weight, based on 100 parts by weight of the urethane acrylic resin .

As the acrylic copolymer to be used, an acrylic copolymer having a modified epoxy group can be used.

The acrylic copolymer having a modified epoxy group can be obtained by polymerizing monomers comprising an unsaturated carboxylic acid monomer and a monomer containing an unsaturated compound monomer containing an epoxy group, and an olefinically unsaturated monomer.

The content of the unsaturated carboxylic acid monomer may be from 5 to 50% by weight, and preferably from 8 to 30% by weight, based on the total weight of the acrylic copolymer (solid content). When the content of the unsaturated carboxylic acid compound is less than 5% by weight, the solubility in an aqueous alkali solution is lowered. When the content of the unsaturated carboxylic acid compound is more than 50% by weight, solubility in an aqueous alkali solution becomes too large.

As the unsaturated carboxylic acid monomer, acrylic acid, methacrylic acid, methylmethacrylic acid, maleic acid, fumaric acid, citraconic acid, metaconic acid, itaconic acid, or anhydrides thereof may be used singly or in combination of two or more.

Examples of the unsaturated compound monomer containing an epoxy group include glycidyl acrylate, glycidyl methacrylate, glycidyl? -Ethyl acrylate, glycidyl? -N-propyl acrylate, glycidyl? -N-butyl acrylate Acrylic acid-beta -methylglycidyl, methacrylic acid-beta -methylglycidyl, acrylic acid-beta -ethylglycidyl, methacrylic acid- beta -ethylglycidyl, Butyl methacrylate-3,4-epoxybutyl acrylate, 6,7-epoxyhexyl acrylate, methacrylic acid-6,7-epoxyheptyl,? -Ethylacrylic acid-6,7-epoxyheptyl, Vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, etc. These may be used alone or in admixture of two or more.

The content of the unsaturated compound monomer containing an epoxy group may be 10 to 40% by weight based on the total weight of the acrylic copolymer (solid content).

Examples of the olefinically unsaturated monomer include methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, tert-butyl methacrylate, methyl acrylate, isopropyl acrylate, Acrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyloxyethyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, dicyclopentanyl methacrylate, , Isobornyl methacrylate, cyclohexyl acrylate, 2-methylcyclohexyl acrylate, dicyclopentanyloxyethyl acrylate, isobornyl acrylate, phenyl methacrylate, phenyl acrylate, benzyl acrylate, 2-hydroxyethyl methacrylate, styrene,? -Methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p (Methoxystyrene), 1,3-butadiene, isoprene, 2,3-dimethyl 1,3-butadiene, 3- (trimethoxysilyl) propyl methacrylate and the like, Can be used.

The content of the olefinic unsaturated compound monomer may be 10 to 85% by weight based on the total weight of the acrylic copolymer (solid content). If it is less than 10% by weight, the stability of the acrylic copolymer is excessively reduced, and if it exceeds 85% by weight, the degree of curing may be rapidly deteriorated.

Further, in the acrylic copolymer according to the present invention, the use of additional monomers in addition to the three monomers is not limited by the consideration of those skilled in the art.

In order to produce an acrylic copolymer, a polymerization initiator can be used. Examples of the polymerization initiator include 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvalero Nitrile), 2,2'-azobis (4-methoxy 2,4-dimethylvaleronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), or dimethyl 2,2'-azo And bisisobutylate.

The acrylic copolymer preferably has a polystyrene reduced weight average molecular weight of 6,000 to 30,000.

In the composition for forming a protective layer of the present invention, the acrylic copolymer having a modified epoxy group (solid content) is preferably included in an amount of 5 to 60 parts by weight based on 100 parts by weight of the entire composition for forming a protective layer. When the content is less than 5 parts by weight, the coating property may be rapidly deteriorated. When the content is more than 60 parts by weight, the curing degree and developability of the composition for forming the first protective layer 20 may be lowered.

In another embodiment of the present invention, the acrylic copolymer may include a urethane acrylate resin. When a urethane acrylate resin is used, the tensile performance is improved, the risk of breakage during manufacture is reduced, and the resistance against bending fatigue is further improved, thereby suppressing the occurrence of cracks during bending.

The urethane acrylate resin according to the present invention preferably contains a polymerizable carbon double bond at at least one end for the formation of a protective layer. The kind of the urethane acrylate resin according to the present invention is not particularly limited, and may be, for example, a compound represented by the following general formula (5).

[Chemical Formula 5]

(Wherein A is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, and the alkylene group may include at least one oxygen atom or an ester bond in the carbon chain, and I is a group derived from a diisocyanate compound 2, wherein R represents a divalent group derived from a diol compound, Y is a methyl group or hydrogen, and n is an integer of 1 to 20,

Examples of the diisocyanate compound include toluene diisocyanate, methylene diphenyl diisocyanate, etc., which may be used alone or in combination of two or more.

Examples of the diol compound include (poly) ethylene glycol and (poly) propylene glycol, which may be used alone or in combination of two or more.

The urethane acrylate resin according to the present invention preferably has an elongation of 30 to 200% when the homopolymer is formed. When a urethane acrylate resin having an elongation in the above range is used, a protective layer having better bending properties can be formed.

The composition of the present invention may further comprise a polyfunctional acrylic monomer as required. As the polyfunctional acrylic monomer, a monomer having at least two ethylenic double bonds can be used. Specific examples include 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, trimethylolpropane diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, penta But are not limited to, ethylene glycol diacrylate, erythritol tetraacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol hexadiacrylate, dipentaerythritol triacrylate, dipentaerythritol diacrylate, sorbitol triacrylate, Dipentaerythritol polyacrylate, or methacrylates thereof, may be used alone or in admixture of two or more.

The polyfunctional acrylic monomer is preferably contained in an amount of 2 to 40 parts by weight based on 100 parts by weight of the entire composition. If the content is less than 2 parts by weight, the thickness of the residual film may be thin and physical properties may be deteriorated. If the content is more than 40 parts by weight, the resolution may be lowered.

Other additives may be further included within the scope of realizing the effects of the present invention. For example, a curing aid, an adhesion promoter, a silicone surfactant, and the like may be further included.

The curing aid acts to help the epoxy ring opening reaction of the acrylic copolymer to occur at a temperature of 140 to 170 캜 which is lower than the conventional temperature of about 220 캜.

As the curing aid, a compound having an isocyanate group can be used. For example, it is preferable to use triglycidyl isocyanurate, tris- (2-carboxyethyl) isocyanurate and dicyanamide each alone or in combination of two or more thereof.

The curing assistant is preferably contained in an amount of 0.1 to 3 parts by weight based on 100 parts by weight of the entire composition for forming a protective layer. When the content is less than 0.1 parts by weight, sufficient hardening of the epoxy group is not achieved, and physical properties such as hardness may be deteriorated. If the content is more than 3 parts by weight, unreacted monomer may remain to deteriorate long term reliability.

Examples of the adhesion promoter include 4,4 ', 4 "-methylidyne trisphenol, 4,4', 4" -ethylidine trisphenol, 4- [bis (4-hydroxyphenyl) methyl] -2- methoxyphenol , 4,4 '- [(2-hydroxyphenyl) methylene] bis [2-methylphenol] (4-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4 '- [(3-hydroxyphenyl) methylene] Ethoxysilane, etc. may be used alone or in combination of two or more.

The adhesion promoting agent is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the entire composition for forming a protective layer.

Alternatively, the composition for forming the first protective layer 20 of the present invention may further comprise a silicone surfactant for uniform dispersion of each component.

Examples of the silicone surfactant include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, (3- (3-glycidoxypropyl) dimethylethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3,4 -Epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltrimethoxysilane May be used alone or in combination of two or more.

The silicone surfactant is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the entire composition for forming a protective layer

The first passivation layer 20 according to the present invention may have an elastic modulus of 2.8 to 4.5 GPa or less. The crack can be more effectively suppressed in the above-mentioned modulus of elasticity, and the surface roughness of the transparent conductive film can be further improved.

The electrode pattern layer 30 according to the present invention is disposed on the first protective layer 20.

The material of the electrode pattern layer 30 is not particularly limited and may be any material as long as it is a conductive material. For example, indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO) , Indium zinc oxide (AZO), gallium zinc oxide (GZO), flintine oxide (FTO), indium tin oxide-silver-indium tin oxide (ITO-Ag-ITO), indium zinc oxide- -Ag-IZO), indium zinc tin oxide-silver-indium zinc-tin oxide (IZTO-Ag-IZTO) and aluminum zinc oxide-silver-aluminum zinc oxide (AZO-Ag-AZO); Metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), molybdenum (Mo) and APC; Nanowires of metals selected from the group consisting of gold, silver, copper and lead; Carbon-based materials selected from the group consisting of carbon nanotubes (CNT) and graphene; And a conductive polymer material selected from the group consisting of poly (3,4-ethylenedioxythiophene) (PEDOT) and polyaniline (PANI). These may be used alone or in combination of two or more.

The electrode pattern layer 30 may further include a photosensitive resist pattern on the pattern.

The flexible touch panel may further include a flexible substrate 50 on the first protective layer 20 on which the electrode pattern layer 30 of the film touch sensor of the present invention is disposed. The flexible substrate 50 is disposed on the uppermost portion of the laminated film touch sensor and may be disposed opposite to the separation layer 10.

The flexible substrate 50 can be used without limitation to a transparent film made of a material widely used in the art, for example, a cellulose ester (e.g., cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate pro Polyanhydrides such as polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane- 4,4'-dicarboxylate and polybutylene terephthalate, polystyrenes such as syndiotactic polystyrene, polyolefins such as polypropylene, polyethylene and polymethylpentene, polysulfone, polyethersulfone, Polyarylate, polyether-imide, polymethylmethacrylate, polyetherketone, poly Vinyl alcohol, and polyvinyl chloride, or a mixture thereof.

The flexible substrate 50 may be adhered using a water-based adhesive, an adhesive, or a photo-curing or thermosetting adhesive or an adhesive known in the art.

If necessary, the film touch sensor of the present invention may further include a second protective layer 40 between the first protective layer 20 and the flexible substrate 50.

In the film touch sensor of the present invention, the second electrode pattern layer may be disposed on the second protective layer 40. In this case, the second electrode pattern layer may be formed of the same material as the electrode pattern layer. In this case, a third passivation layer may be further disposed on the second passivation layer 40 on which the second electrode pattern layer is formed.

As the second protective layer 40 and / or the third protective layer, organic or inorganic insulating materials known in the art may be used without limitation.

Hereinafter, a method of manufacturing the film touch sensor of the present invention will be described.

FIGS. 3 and 4 are schematic views of a method of manufacturing a film touch sensor according to an embodiment of the present invention, and the present invention will be described in detail with reference to the drawings.

First, as shown in Fig. 3 (a), a separation layer 10 is formed on a carrier base material 60. As shown in Fig.

The carrier substrate 60 can be used without any particular limitation as long as it is of a material which provides adequate strength to be fixed without being bent or twisted during the process, and which has little effect on heat or chemical treatment. For example, glass, quartz, silicon wafer, cloth or the like can be used, and preferably, glass can be used.

The separation layer 10 can be formed of the above-mentioned polymer material.

The method of forming the separation layer 10 is not particularly limited and the polymer composition may be applied by a slit coating method, a knife coating method, a spin coating method, a casting method, a micro gravure coating method, a gravure coating method, Such as a wire bar coating method, a dip coating method, a spray coating method, a screen printing method, a gravure printing method, a flexo printing method, an offset printing method, an ink jet coating method, a dispenser printing method, a nozzle coating method, Or may be formed by coating by a known method.

The separation layer 10 may be further roughened after the application.

After the separation layer 10 has been formed by the above-described method, an additional curing process may be further roughened.

The curing method is not particularly limited, and it is possible to use both of the above methods by photocuring or thermosetting. The order of the photo-curing and the thermal curing is not particularly limited.

3 (b), the first passivation layer 20 is formed on the isolation layer 10. Then, as shown in FIG.

The first protective layer 20 can be formed by applying a composition for forming a protective layer with the above-described material onto the separation layer 10 and curing it.

The coating method is not particularly limited, and the same method as the coating method of the composition for forming the separation layer 10 can be used.

The photocuring condition of the first protective layer 20 is not particularly limited as long as it is controlled to such an extent that sufficient curing can be achieved without compromising the physical properties of the cured product. For example, within 24 hours.

The light amount, for example from 10 to 1,000mJ / cm ^2, and preferably may be from 10 to 500mJ / cm ^2. When the amount of light is less than 10 mJ / cm ² , sufficient curing does not occur, and when it exceeds 1,000 mJ / cm ² , yellowing or cracking may occur.

In addition, the first passivation layer 20 may be more thermally hardened after the photocuring.

As a specific example, after performing the photo-curing for 30 seconds to 5 minutes, thermal curing can be performed.

The thermosetting may be performed at, for example, less than 300 ° C, preferably not more than 230 ° C. When the thermal curing is carried out at 300 ° C or higher, there is a problem that the carrier base material 60 can not be used when the thermal expansion coefficient of the carrier base material 60 is high or when the glass transition temperature Tg is low.

The thermosetting may be carried out, for example, for 10 minutes to 120 minutes.

To increase the thermal curing rate, the composition for forming the first protective layer 20 may further include a thermosetting auxiliary.

In addition, the protective layer can be cured only by heat curing without photo curing, and the curing temperature and time are as mentioned above.

Thereafter, as shown in FIG. 3 (c), the first electrode pattern 30 is formed on the first passivation layer 20.

The electrode pattern layer 30 can be formed of a material such as the above-mentioned metal oxide materials, metals, metal nanowires, carbon-based materials, and conductive polymer materials.

The method of forming the electrode pattern layer 30 is not particularly limited and may be selected from physical vapor deposition, chemical vapor deposition, plasma deposition, plasma polymerization, thermal vapor deposition, thermal oxidation, anodization, Printing methods such as LEXO printing method, offset printing method, inkjet coating method, and dispenser printing method.

The method of manufacturing a film touch sensor of the present invention further includes the step of attaching the flexible substrate 50 to the first protective layer 20 on which the electrode pattern layer 30 is formed.

The flexible substrate 50 may be adhered using a water-based adhesive, an adhesive, or a photo-curable or thermosetting adhesive or an adhesive known in the art.

As the flexible substrate 50, the above-mentioned transparent film can be used.

The method of manufacturing a film touch sensor of the present invention may further comprise forming a second protective layer 40 on the first protective layer 20 on which the electrode pattern 30 is formed before the flexible substrate 50 is attached Step < / RTI >

Further, a second electrode may be further disposed on the second passivation layer 40. In this case, a third passivation layer may be further formed on the second passivation layer 40 on which the second electrode is formed can do.

FIG. 4 is a process diagram for forming the second protective layer 40 before the flexible substrate 50 is attached, but the present invention is not limited thereto and the second protective layer 40 may not be formed.

In the case of forming the second protective layer 40 and the third protective layer, the crack prevention effect can be further improved.

The method of forming the second protective layer 40 and the third protective layer is not particularly limited, and can be formed in the same manner as the first protective layer 20, for example.

The film touch sensor may be manufactured by separating the separation layer 10 from the carrier substrate 60. The separation timing is not particularly limited and may be, for example, after the formation of the electrode pattern layer 30, After the formation of the second electrode, after the formation of the third protective layer, or after the attachment of the flexible substrate 50.

The method of manufacturing a film touch sensor of the present invention can suppress cracks that may occur during separation from the carrier substrate or during use by forming the first protective layer 20 that satisfies a specific transmittance and chromaticity b * , Degradation of the optical characteristics can be minimized.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

Synthetic example  1. Preparation of acrylic copolymer

70 parts by weight of propylene glycol methyl ethyl acetate (PGMEA) as a solvent, 10 parts by weight of glycidyl methacrylate, 1 part by weight of 3- (trimethoxysilyl) propyl methacrylate, 8 parts by weight of methyl methacrylate, 10 parts by weight of methyl methacrylate was added, and 1 part by weight of 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile) was added as an initiator, followed by stirring the mixture. The temperature of the reaction solution was increased to 70 ° C. and reacted for 6 hours to form an acrylic copolymer.

Synthetic example  2. Preparation of Acrylic Copolymer

70 parts by weight of propylene glycol methyl ethyl acetate (PGMEA) as a solvent, 1 part by weight of 3- (trimethoxysilyl) propyl methacrylate, 8 parts by weight of methyl methacrylic acid and 20 parts by weight of methyl methacrylate as a solvent, 1 part by weight of 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile) was added, and the mixture was stirred. The temperature of the reaction solution was increased to 70 ° C. and reacted for 6 hours to form an acrylic copolymer.

Manufacturing example  A. Preparation of composition for forming protective layer

A composition for forming a protective layer was prepared with the contents and components shown in Table 1.

division
(Parts by weight) Acrylic copolymer Polymerizable compound Light curing
Initiator
(C) additive menstruum
(E) A-1 A-2 B-1 B-2 B-3 Coupling agent
(D-1) Leveling agent
(D-2) Production Example 1 41 41 8 - - 8 1.8 0.2 100 Production Example 2 30 30 30 - - 8 1.8 0.2 100 Production Example 3 15 15 60 - - 8 1.8 0.2 100 Production Example 4 - - 90 - - 8 1.8 0.2 100 Production Example 5 30 30 - 30 - 8 1.8 0.2 100 Production Example 6 15 15 - 60 - 8 1.8 0.2 100 Production Example 7 30 30 - - 30 8 1.8 0.2 100 Production Example 8 15 15 - - 60 8 1.8 0.2 100 Production Example 9 - - - - 90 8 1.8 0.2 100 A: Acrylic copolymer
A-1: An acrylic copolymer of Synthesis Example 1
A-2: An acrylic copolymer of Synthesis Example 2
B: Polymerizable compound
B-1: Ethoxylated isocyanuric acid triacrylate (A-9300, Shin-Nakamura Chemical), Tg =
B-2: Ethoxylated isocyanuric acid diacrylate / Ethoxylated isocyanuric acid triacrylate (A-9200YN, Shin-Nakamura Chemical), Tg =
B-3: Ethoxylated pentaerythritol (ATM-4E, Shin-Nakamura Chemical), Tg =
C: IRGACURE 369 (Ciba Specialty Chemicals)
D-1: KBM-503 (Shin-Etsu Chemical)
D-2: SH-8400 (Dow Corning Toray)
E: Solvent
30 parts by weight of diethylene glycol methyl ethyl ether (MEDG), 40 parts by weight of propylene glycol monomethyl ether acetate (PGMEA) and 30 parts by weight of 3-methoxybutanol

Example  1 to 6 and Comparative Example  1 to 3

A separating layer containing polyimide was coated to a thickness of 0.13 占 퐉 on a soda lime glass having a thickness of 700 占 퐉. Thereafter, the protective layer-forming composition of Production Example A (Examples 1 to 6 - Production Examples 1 to 6 / Comparative Examples 1 to 3 - Production Examples 7 to 9) was applied on the separation layer, / 3 minutes, 180 mJ / cm < ² >, post-baking 230 DEG C / 30 minutes to form a first protective layer having a thickness of 1.5 mu m.

Thereafter, an ITO layer having a thickness of 0.05 占 퐉 was formed on the first protective layer, and a photosensitive resist was coated on the ITO layer to form an electrode pattern layer (annealing condition: heating at 230 占 폚 for 30 minutes) .

Thereafter, a second protective layer was formed on the first protective layer on which the electrode pattern layer was formed, an acrylic adhesive layer was formed on the second protective layer, and then a polycarbonate base material with a thickness of 50 탆 was attached, .

Manufacturing example  B. Preparation of composition for forming protective layer

A composition for forming a protective layer was prepared with the contents and components shown in Table 2.

Item The urethane resin (A) The polymerizable compound (B) Initiator
(C) additive
(D) menstruum
(E) A-1 A-2 A-3 B-1 B-2 B-3 C D E Production Example 10 20.3 - - 8.7 - - 0.5 0.5 70 Production Example 11 17.4 - - 11.6 - - 0.5 0.5 70 Production Example 12 17.4 - - - 11.6 0.5 0.5 70 Production Example 13 - 17.4 11.6 - - 0.5 0.5 70 Production Example 14 - - 17.4 11.6 - - 0.5 0.5 70 Production Example 15 20.3 - - - - 8.7 0.5 0.5 70 Production Example 16 - 20.3 - - - 8.7 0.5 0.5 70 Production Example 17 - - 20.3 - - 8.7 0.5 0.5 70 A: urethane resin
A-1: bifunctional urethane acrylate (UA-122P, Shin-Nakamura Chemical), elongation (%) = 50
A-2: bifunctional urethane acrylate (UA-160TM, Shin-Nakamura Chemical), elongation (%) = 80
A-3: bifunctional urethane acrylate (UA-232P, Shin-Nakamura Chemical), elongation (%) = 135
B: Polymerizable compound
B-1: Ethoxylated isocyanuric acid triacrylate (A-9300, Shin-Nakamura Chemical), Tg =
B-2: Ethoxylated isocyanuric acid diacrylate / Ethoxylated isocyanuric acid triacrylate (A-9200YN, Shin-Nakamura Chemical), Tg =
B-3: Ethoxylated pentaerythritol (ATM-4E, Shin-Nakamura Chemical), Tg =
C: Thermal initiator V-601 (Wako Pure Chemical)
D: leveling agent SH-8400 (Dow Corning Toray)
E: Solvent Propylene glycol monomethyl ether acetate

Example  7 to 12 and Comparative Example  4 to 6

The composition for forming a protective layer was applied to the protective layer forming composition of Production Example B (Examples 7 to 12 - Production Examples 10 to 14 / Comparative Examples 4 to 6 - Production Examples 15 to 17), prebaked at 100 ° C / 3 Minute, post bake 230 DEG C / 30 minutes, and a film touch sensor was manufactured in the same manner as in Example 1. [

Experimental Example

(1) Bending crack  evaluation

The film touch sensors of Examples and Comparative Examples were cut into 100 mm x 10 mm and mounted on a bending tester (JIRBT-210, Juniltech) to bend 10,000 times. Then, whether or not a crack occurred in the flexible substrate was visually evaluated. Lt; tb >

<Evaluation Criteria>

○: No crack occurred

DELTA: Micro crack occurred

X: Film touch sensor break

(2) Measurement of elastic modulus

Aside from the above-mentioned film touch sensor of Examples and Comparative Examples, only a protective layer was formed on a glass having a thickness of 700 탆 in the same manner as in Examples and Comparative Examples. The modulus of elasticity was measured according to the method of KS M ISO 6721-4.

(3) heat resistance Optical property  evaluation

(%) And chromaticity value (b *) were measured by a colorimetric measuring instrument (OPS), and the results were shown in Table 1. The results are shown in Table 1. -SP2000, Olympus). The results are shown in Table 3.

If the chromaticity b * exceeds +1.5, it can be regarded as yellowing.

(4) Thermal durability  And surface roughness evaluation

The ITO layer was formed as an electrode pattern on the first protective layer of each of Examples and Comparative Examples to a thickness of 0.05 탆 and annealed in a convection oven at 230 캜 for 20 minutes and then the surface roughness was measured and the results are shown in Table 3.

Further, after observing the appearance of Example 2 and Comparative Example 1, a comparative image thereof is shown in Fig.

division Heat-resistant property Elastic modulus
(GPa) Crack evaluation Surface roughness (Å) Step difference between wrinkles (탆) b * Transmittance (%) Example 1
[Production Example 1] 0.76 99.08 2.8 △ 20.3 - Example 2
[Production Example 2] 0.52 99.33 3.9 ○ 17.4 - Example 3
[Production Example 3] 0.41 99.46 4.3 ○ 16.0 - Example 4
[Production Example 4] 0.34 99.54 4.5 ○ 10.2 - Example 5
[Production Example 5] 0.50 99.18 3.7 ○ 17.9 - Example 6
[Production Example 6] 0.46 99.34 4.3 ○ 17.2 - Example 7
[Production Example 10] 0.90 98.9 3.9 ○ 18.8 - Example 8
[Production Example 11] 0.66 99.0 4.1 ○ 16.2 - Example 9
[Production Example 12] 0.65 98.9 4.0 ○ 18.0 - Example 10
[Production Example 13] 0.98 96.1 3.6 ○ 21.2 - Example 11
[Production Example 14] 0.89 97.8 3.4 ○ 24.6 - Comparative Example 1
[Production Example 7] 1.21 94.23 2.9 X - 0.20 Comparative Example 2
[Production Example 8] 1.85 92.87 3.1 X - 0.35 Comparative Example 3
[Production Example 9] 2.32 90.20 3.0 X - 0.42 Comparative Example 4
[Production Example 15] 1.55 94.80 2.5 X - 0.43 Comparative Example 5
[Production Example 16] 1.87 93.10 2.4 X - 0.51 Comparative Example 6
[Production Example 17] 1.77 93.60 2.4 X - 0.48

Referring to Table 3, it is confirmed that the film touch sensors of Examples 1 to 11 have improved bending properties due to improved strength, and at the same time have low yellowing characteristics and high transmittance.

In addition, it was confirmed that the examples showed almost no wrinkles on the surface compared with the comparative examples and excellent heat durability. In all of the embodiments, the surface roughness is as small as 30 Å or less, which does not affect the visibility of the image.

However, in the case of Example 1 in which the content of the compound (A) was somewhat low, it was confirmed that the strength was slightly lowered and the chromaticity b * was slightly higher than those of the other Examples in comparison with the Preparation Example A group.

On the other hand, it was confirmed that the film touch sensors of Comparative Examples 1 to 6 were completely broken or cracked during bending evaluation, and the transmittance and chromaticity b * values were significantly increased compared to the Examples.

In addition, it was confirmed that the comparative examples had wrinkles that were visibly visible.

Referring to FIG. 5, in Example 2 according to the present invention, it was confirmed that wrinkles were not generated to such an extent that the surface roughness was visually observed to be 17.4 Å, and the thermal expansion characteristics were excellent. However, in the case of Comparative Example 1, it was confirmed that a large amount of wrinkles occurred on the surface due to the difference in thermal expansion coefficient between the first protective layer 20 and the ITO electrode pattern. In Comparative Example 2, And the width increased.

10: Separation layer 20: First protective layer
30: electrode pattern 40: second protective layer
50: flexible substrate 60: carrier substrate

Claims (16)

A separation layer;
A first protective layer disposed on the isolation layer; And
And an electrode pattern layer disposed on the first passivation layer,
Wherein the first protective layer has a transmittance of 95% or more and a chromaticity b * of -1.5 to 1.5.
The film touch sensor according to claim 1, wherein the first protective layer is formed of a composition for forming a protective layer containing an isocyanurate compound.
The film touch sensor according to claim 2, wherein the isocyanurate compound comprises a compound represented by the following Formula 1:
[Chemical Formula 1]

(Wherein R ₁ , R ₂ and R ₃ are each independently an alkyl group having 1 to 20 carbon atoms whose terminal is substituted with an acrylate group or a hydrophilic group, and the alkyl group includes at least one oxygen atom or an ester group in the carbon chain You can do it).
[4] The film touch sensor of claim 3, wherein the compound represented by Formula 1 is at least one selected from compounds represented by Chemical Formulas 2 to 4:
(2)

(3)

[Chemical Formula 4]

(Wherein n, m and l are each independently an integer of 1 to 3).
The film touch sensor of claim 1, wherein the first protective layer has a surface roughness (Ra) of 30 A or less.
The film touch sensor according to claim 2, wherein the isocyanurate compound is contained in an amount of 10 to 90% by weight based on the total content of the composition for forming a protective layer based on the solid content.
The film touch sensor according to claim 2, wherein the isocyanurate compound has a glass transition temperature (Tg) of 200 ° C to 300 ° C when the homopolymer is formed.
The film touch sensor according to claim 2, wherein the composition for forming the protective layer further comprises a polymerization initiator and a solvent.
The film touch sensor according to claim 2, wherein the protective layer forming composition further comprises an acrylic copolymer.
The film touch sensor of claim 9, wherein the acrylic copolymer comprises a urethane acrylate resin.
The film touch sensor according to claim 10, wherein the urethane acrylate resin has an elongation of 30 to 200% when the homopolymer is formed.
The film touch sensor of claim 10, wherein the urethane acrylate resin comprises a polymerizable carbon double bond at least at one end.
The film touch sensor of claim 1, wherein the first protective layer has an elastic modulus of 2.8 to 4.5 GPa.
The film touch sensor of claim 1, wherein the first passivation layer is subjected to a heat treatment process at 220 to 240 ° C for 20 minutes to 100 minutes.
A touch screen panel comprising a film touch sensor according to any one of claims 1 to 14.
The image display apparatus according to claim 15, comprising the touch screen panel.

Images