KR20160104447A

KR20160104447A - Film Touch Sensor and Method for Fabricating the Same

Info

Publication number: KR20160104447A
Application number: KR1020150027503A
Authority: KR
Inventors: 최한영; 박승준
Original assignee: 동우 화인켐 주식회사
Priority date: 2015-02-26
Filing date: 2015-02-26
Publication date: 2016-09-05

Abstract

The present invention relates to a film touch sensor, and more particularly, A first protective layer located on the isolation layer; And an electrode pattern layer disposed on the first passivation layer, wherein the first passivation layer comprises a composition for forming a first passivation layer comprising an acrylic copolymer having a glass transition temperature of 25 DEG C or lower after curing, an acrylic monomer, and a photoinitiator To a film touch sensor capable of suppressing the occurrence of cracks and a manufacturing method thereof.

Description

Technical Field [0001] The present invention relates to a film touch sensor and a fabrication method thereof,

The present invention relates to a film touch sensor and a method of manufacturing the same.

The touch screen panel is an input device that allows a user to input a command by selecting an instruction displayed on a screen of a video display device or the like as a human hand or an object.

To this end, the touch screen panel is provided on the front face of the image display device and converts the contact position, which is in direct contact with a human hand or an object, into an electrical signal. Thus, the instruction content selected at the contact position is accepted as the input signal.

Such a touch screen panel can be replaced with a separate input device connected to the image display device such as a keyboard and a mouse, and thus the use range thereof is gradually expanding.

The touch screen panel is known as a resistive film type, a light sensing type, and a capacitive type. Among the capacitive touch screen panels, a conductive sensing pattern is formed when a human hand or an object is contacted, The contact position is converted into an electrical signal by detecting a change in capacitance formed with another sensing pattern or a ground electrode or the like.

Such a touch screen panel is generally attached to the outer surface of a flat panel display device such as a liquid crystal display device or an organic light emitting display device and is often commercialized. Therefore, the touch screen panel requires high transparency and thin thickness characteristics.

In addition, in recent years, a flexible flat panel display has been developed, and in this case, the touch screen panel attached on the flexible flat panel display also needs a flexible characteristic.

On the other hand, the capacitive touch screen panel requires a thin film formation process, a pattern formation process, and the like in order to form a sensing pattern for realizing a touch sensor. Therefore, the touch screen panel requires high heat resistance and chemical resistance. Thus, a transparent electrode is formed on a substrate formed by curing a resin such as polyimide excellent in heat resistance.

On the other hand, the flexible touch screen panel is required to use a thin and flexible substrate, and it is difficult to form a transparent electrode on such a flexible substrate. As an alternative thereto, there has been proposed a method of coating a resin on a support to form a transparent electrode on the resin coating layer, and peeling the resin coating layer from the support. However, there is a problem that peeling of the cured resin is not easy.

Korean Patent Laid-Open Publication No. 2012-133848 discloses a flexible touch screen panel, but fails to provide an alternative to the above problem.

Korea Patent Publication No. 2012-133848

An object of the present invention is to provide a film touch sensor in which flexibility is improved and cracks are suppressed.

It is another object of the present invention to provide a method of manufacturing the above-mentioned film touch sensor.

1. separation layer;

A first protective layer located on the isolation layer; And

And an electrode pattern layer disposed on the first passivation layer,

Wherein the first protective layer is formed of a composition for forming a first protective layer including an acrylic copolymer having a glass transition temperature of not higher than 25 ° C after curing, an acrylic monomer, and a photoinitiator.

2. The film touch sensor according to 1 above, wherein the acrylic copolymer is polymerized by including a (meth) acrylate monomer having a glass transition temperature of 25 DEG C or lower when the acrylic copolymer is polymerized singly.

3. The acrylic copolymer according to 1 above, wherein the weight average molecular weight of the acrylic copolymer is 3,000 to 100,000. Film touch sensor.

4. The film touch sensor according to 1 above, wherein the acrylic copolymer is contained in an amount of 15 to 80% by weight of the total solid content of the composition for forming the first protective layer.

5. The film touch sensor of 1 above, wherein the thickness of the first protective layer is 0.1 to 10 mu m.

6. The film touch sensor of claim 1, further comprising a second protective layer disposed on the first protective layer on which the electrode pattern layer is formed.

7. The film touch sensor of claim 6, further comprising a substrate film attached on the second protective layer.

8. The film touch sensor according to 7 above, wherein the base film is attached via an adhesive layer.

9. The electrode pattern layer of claim 1, wherein the electrode pattern layer is made of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) (PEDOT), carbon nanotubes (CNT), metal wires, and metal meshes. The film touch sensor of claim 1,

10. A touch screen panel comprising a film touch sensor of any one of claims 1 to 9.

11. An image display apparatus comprising the touch screen panel of the above 10.

12. forming a separation layer on a carrier substrate;

Forming a first protective layer on the separation layer by applying a composition for forming a first protective layer including an acrylic copolymer, an acrylic monomer and a photoinitiator having a glass transition temperature of 25 ° C or lower after curing;

Forming an electrode pattern layer on the first passivation layer;

Forming an adhesive layer on the first protective layer on which the electrode pattern layer is formed;

Bonding the base film to the adhesive layer; And

And peeling the separation layer and the upper laminate from the carrier substrate at a temperature higher than the glass transition temperature of the acrylic copolymer.

13. The film touch sensor of claim 12, further comprising forming an electrode pattern layer on the first protective layer and then forming a second protective layer on the first protective layer on which the electrode pattern layer is formed, Gt;

14. The acrylic polymer of claim 12, wherein the weight average molecular weight of the acrylic copolymer is from 3,000 to 100,000. A method of manufacturing a film touch sensor.

15. The method of manufacturing a film touch sensor according to 12 above, wherein the acrylic copolymer is contained in an amount of 15 to 80% by weight of the total solid content of the composition for forming the first protective layer.

16. The film touch sensor of 12 above, wherein the thickness of the first protective layer is 0.1 to 10 mu m.

17. The electrode of claim 12, wherein the electrode pattern layer comprises at least one of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) (PEDOT), carbon nanotubes (CNT), metal wires, and metal meshes. The method of manufacturing a film touch sensor according to claim 1,

The film touch sensor of the present invention is excellent in durability because the occurrence of cracks is reduced even when there is deformation due to an external force.

INDUSTRIAL APPLICABILITY The method of manufacturing a film touch sensor of the present invention can easily peel off a film touch sensor from a carrier substrate, and can prevent cracks from occurring.

FIG. 1 is a schematic cross-sectional view of a film touch sensor according to an embodiment of the present invention.
2 is a schematic cross-sectional view of a film touch sensor according to another embodiment of the present invention.
3 is a schematic view illustrating a method of manufacturing a film touch sensor according to an embodiment of the present invention.

The present invention relates to a film touch sensor, and more particularly, A first protective layer located on the isolation layer; And an electrode pattern layer disposed on the first passivation layer, wherein the first passivation layer comprises a composition for forming a first passivation layer comprising an acrylic copolymer having a glass transition temperature of 25 DEG C or lower after curing, an acrylic monomer, and a photoinitiator The present invention relates to a film touch sensor in which the flexibility of a film touch sensor is remarkably improved, the occurrence of cracks is reduced even with deformation due to an external force, and the durability is remarkably improved, and a manufacturing method thereof.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with reference to the drawings. It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. And shall not be construed as limited to such matters.

<Film touch sensor>

1 and 2 are schematic cross-sectional views of a film touch sensor 100, 110 according to an embodiment of the present invention.

The film touch sensor 100 of the present invention includes a separation layer 10; A first protective layer (20) located on the isolation layer (10); And an electrode pattern layer 30 disposed on the first passivation layer 20.

Separation layer (10)

The separation layer 10 according to the present invention is a layer formed for separation from the carrier substrate 70.

The separation layer 20 may be a polymer organic film, and may be a polyimide-based polymer, a poly vinyl alcohol-based polymer, a polyamic acid-based polymer, a polyamide-based polymer , A polymer based on polyethylene, a polymer based on polystyrene, a polymer based on polynorbornene, a polymer based on phenylmaleimide copolymer, a polymer based on polyazobenzene, a polymer based on polyphenylene phthalamide based polymer, a polyphenylenephthalamide-based polymer, a polyester-based polymer, a polymethyl methacrylate-based polymer, a polyarylate-based polymer, a cinnamate-based polymer, a coumarin- A phthalimidine-based polymer, a chalcone-based polymer, and an aromatic acetylene-based polymer may be used. It is not limited. These may be used alone or in combination of two or more.

The thickness of the separation layer 10 according to the present invention is preferably 0.05 to 1 탆, but is not limited thereto.

The first protective layer 20,

The first passivation layer 20 according to the present invention serves as a base on which the electrode pattern layer 30 is formed and is disposed on the separation layer 10 to serve as a passivation layer for the electrode pattern layer 30 Thereby preventing the electrode pattern layer 30 from being contaminated. Further, cracks are prevented from occurring in the film touch sensor by separation from the carrier substrate 60 and by use such as folding and bending.

In addition, the first passivation layer 20 according to the present invention serves to insulate the conductive patterns.

Flexible displays are used as folded, curved or rolled, so they are lightweight, thin, resistant to impact, and free from bending. However, when the flexible substrate used in the flexible display is subjected to an excessive external bending stress, there is a problem that a crack is generated in the bent portion. In particular, a crack mainly occurs in the first protective film portion.

However, the first protective layer 20 according to the present invention is formed of the composition for forming the first protective layer including the acrylic copolymer, the acrylic monomer and the photoinitiator having a glass transition temperature of 25 ° C or lower after curing, Is remarkably improved to suppress the occurrence of cracks.

Specifically, when the film touch sensor is manufactured by peeling off from the carrier substrate, stress is concentrated on the first protective layer, so that a large amount of cracks are generated in the first protective layer, thereby deteriorating the durability of the film touch sensor as a whole. However, since the first protective layer according to the present invention exhibits excellent flexibility and relieves the stress applied to the film touch sensor, it is possible to prevent cracks in the first protective layer, But it is not construed as being limited thereto.

The acrylic copolymer may be used without limitation as long as it has a glass transition temperature (Tg) of 25 ° C or less, for example, at least one (meth) acrylate monomer may be polymerized. More specifically, it may be a polymer obtained by polymerizing a (meta) acrylate monomer having a glass transition temperature of 25 ° C or less when polymerized singly (hereinafter, a monomer having a limited glass transition temperature is referred to as a It will do. (Meth) acrylate monomer having a glass transition temperature of 25 占 폚 or lower. Or alternatively, (meth) acrylate monomers having a glass transition temperature of 25 占 폚 or lower and a monomer having a glass transition temperature of higher than 25 占 폚. It is preferable that the polymer containing a monomer having a glass transition temperature of 25 DEG C or lower is in terms of a glass transition temperature after curing of 25 DEG C or less regardless of the weight fraction of the monomer.

In the present invention, (meth) acrylate means acrylate, methacrylate or both.

Examples of the (meth) acrylate monomer having a glass transition temperature of 25 占 폚 or less include butyl acrylate, benzyl acrylate, isobutyl acrylate, isooctyl acrylate isodecyl acrylate, isostearyl acrylate, 2- Acrylate, 2-methoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, butanediol monoacryl (meth) acrylate, (Meth) acrylate, n-hexyl acrylate, n-decyl methacrylate, n-dodecyl (meth) acrylate , N (n-dodecyl) methacrylamide, 2-propylheptyl acrylate, 2-phenylethyl acrylate, tridecyl methacrylate, stearyl methacrylate, N, N-diethylaminoethyl methacrylate, N, N-diethylaminoethyl methacrylate, N, N-diethylaminoethyl methacrylate, N, N-diethylaminoethyl methacrylate, , N-dimethylaminoethyl methacrylate, 2,2,2-trifluoroethyl acrylate, and the like, but are not limited thereto. These may be used alone or in combination of two or more.

Monomers having a glass transition temperature of higher than 25 占 폚 include, for example, tert-allyl butyl (meth) acrylate, dihydrodicyclopentadienyl acrylate, N-vinylformamide, cyclohexyl methacrylate, (Meth) acrylate, tert-butylaminoethyl methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, benzyl methacrylate, glycidyl methacrylate and the like. no. These may be used alone or in combination of two or more.

The production method of the acrylic copolymer is not particularly limited and can be produced by methods such as bulk polymerization, solution polymerization, emulsion polymerization or suspension polymerization which are generally used in the art, and solution polymerization is preferable. In addition, a solvent, a polymerization initiator, a chain transfer agent for molecular weight control and the like which are usually used in polymerization can be used.

The acrylic copolymer preferably has a weight average molecular weight (polystyrene conversion, Mw) of 3,000 to 100,000, more preferably 5,000 to 30,000, as measured by Gel Permeation Chromatography (GPC). When the weight average molecular weight is less than 3,000, cohesion between the copolymers is insufficient, which may cause wrinkling of the ITO layer during the vacuum deposition of indium tin oxide (ITO). When the weight average molecular weight is more than 100,000, a large amount of diluting solvent You may need it.

The glass transition temperature of the acrylic copolymer can be adjusted to 25 ° C or lower by adjusting the type of monomers, the weight ratio of the monomers, and the like.

The acrylic copolymer may be contained in an amount of 15 to 80% by weight, preferably 45 to 60% by weight, based on the total solid weight of the composition for forming the first protective layer. If the content of the acrylic copolymer is less than 15%, the effect of suppressing cracking may be insufficient at the time of peeling. If the content of the acrylic copolymer is more than 80%, wrinkles of the ITO layer may be caused during the ITO vacuum deposition.

As the acrylic monomer used in the composition for forming the protective layer, monomers known in the art can be used without particular limitation, for example, a monofunctional, polyfunctional acrylic monomer and a mixture thereof can be used, Acrylic monomers may be used.

Examples of polyfunctional acrylic monomers include tris (2-acryloxyethyl) isocyanurate, ethoxylated isocyanuric acid triacrylate, ethoxylated glycerin triacrylate, ethoxylated pentaerythritol tetra Acrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, trimethylolpropane diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, di Trimethylol propane tetraacrylate, tetramethylol methane tetraacrylate, pentaerythritol tetraacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol hexadiacrylate, dipentaerythritol triacrylate, Dipentaerythritol diacrylate, Carbitol triacrylate, can be used as a mixture of bisphenol A diacrylate derivative, dipentaerythritol polyacrylate or a methacrylates such as each alone, or two or more kinds. Preferably, the ethylene oxide-modified (ethoxylated) polyfunctional acrylic monomer is excellent in flexibility and is more preferable because cracking can be further suppressed at the time of peeling.

The acrylic monomer is preferably contained in an amount of 15 to 80% by weight based on the total solid weight of the composition for forming the first protective layer. When the content is less than 15% by weight, the hardness is insufficient, which may cause wrinkling of the ITO layer during the ITO vacuum deposition. If the content is more than 80% by weight, crosslinking may occur more than necessary and cracking may occur during peeling.

The photoinitiator used in the composition for forming the protective layer can be used without particular limitation as long as it can be used in the composition for forming the first protective layer of the present invention. For example, acetophenone, benzophenone, triazine, benzoin, imidazole, xanthone, etc. may be used alone or in combination. The photoinitiator is preferably contained in an amount of 0.1 to 10% by weight based on the total solid weight of the composition for forming the first protective layer. When the content is within the above range, smoothness tends to be favorable.

The composition for forming a protective layer according to the present invention may further comprise a solvent for dissolving the components to be used, and may be appropriately used in the art in view of compatibility with the solid component. Preferably, those which can obtain excellent coating properties and a transparent thin film can be used.

Examples of the solvent include alcohols such as methanol, ethanol, methyl ethylcarbitol and diethylene glycol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and propylene glycol butyl ether acetate; Propylene glycol dialkyl acetates such as propylene glycol methyl ethyl acetate; Propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate and propylene glycol butyl ether propionate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, and 4-hydroxy 4-methyl 2-pentanone; Or an organic acid such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy 2-methylpropionate, ethyl 2-hydroxy 2-methylpropionate, methylhydroxyacetate, Hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, Methyl methoxyacetate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, ethoxyacetate, butyl ethoxyacetate, methylpropoxyacetate Propoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy Ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, methyl 2-ethoxypropionate, methyl 2-ethoxypropionate, Methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, methyl 3-ethoxypropionate, methyl 3-ethoxypropionate, propyl 3-ethoxypropionate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, Ethoxypropionate, propyl 3-ethoxypropionate, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, Esters such as methyl propionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate and butyl 3-butoxypropionate may be used alone or in combination of two or more thereof But is not limited thereto. Considering the reactivity and the solubility in an alkali solution, it is preferable that the solvent includes glycol ethers, ethylene alkyl ether acetates, diethylene glycol, and the like.

The above-mentioned solvents may also be used in the production of the acrylic copolymer.

The solvent may be added so that the entire composition has an appropriate viscosity, and the content thereof is not particularly limited. The other ingredients in the composition are added to adjust to have the above-mentioned content relative to 100 wt% of the total composition to account for the balance (balance) of the composition. For example, from 11 to 92% by weight, based on 100% by weight of the total composition, but is not limited thereto.

Alternatively, the composition for forming the first protective layer of the present invention may further include an adhesion promoting agent to improve the adhesion of the first protective layer 20 to the separation layer 10.

Examples of the adhesion promoter include 4,4 ', 4 "-methylidyne trisphenol, 4,4', 4" -ethylidine trisphenol, 4- [bis (4-hydroxyphenyl) methyl] -2- methoxyphenol , 4,4 '- [(2-hydroxyphenyl) methylene] bis [2-methylphenol] (4-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4 '- [(3-hydroxyphenyl) methylene] Ethoxysilane, etc. may be used alone or in combination of two or more.

The adhesion promoting agent is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the entire composition.

Alternatively, the composition for forming the first protective layer of the present invention may further comprise a silicone surfactant for uniform dispersion of each component.

Examples of the silicone surfactant include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, (3- (3-glycidoxypropyl) dimethylethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3,4 -Epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltrimethoxysilane May be used alone or in combination of two or more.

The silicone surfactant is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.

The thickness of the first protective layer 20 is not particularly limited, and may be, for example, 0.1 to 10 탆, and preferably 0.5 to 5 탆. When the thickness of the first protective layer 20 is less than 0.1 탆, impact is accumulated at the time of deposition of ITO, so that the peeling force from the carrier substrate is increased. As a result, the film touch sensor can be torn during peeling. There is a fear that the protective layer is discolored during the subsequent high-temperature process such as the process, and the transmittance is lowered.

electrode Pattern layer (30)

The electrode pattern layer 30 according to the present invention is formed on the first protective layer 20.

The electrode pattern layer 30 may include a conductive pattern to serve as an electrode when applied to an electronic device, and the conductive pattern may be formed in an appropriate shape according to requirements of an applied electronic device. For example, when applied to a touch screen panel, the electrode pattern may be formed of two kinds of electrode patterns, that is, an electrode pattern for sensing the x coordinate and an electrode pattern for sensing the y coordinate. However, the present invention is not limited thereto.

As the electrode pattern layer 30, any conductive material may be used without limitation, and examples thereof include indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO) Indium zinc oxide (IZO-Ag-IZO), indium zinc oxide (ITO-Ag-ITO), gallium zinc oxide (GZO), florine tin oxide (FTO), indium tin oxide- Metal oxide materials selected from the group consisting of tin oxide-silver-indium zinc tin oxide (IZTO-Ag-IZTO) and aluminum zinc oxide-silver-aluminum zinc oxide (AZO-Ag-AZO); Metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), molybdenum (Mo) and APC; Nanowires of metals selected from the group consisting of gold, silver, copper and lead; Carbon-based materials selected from the group consisting of carbon nanotubes (CNT) and graphene; And a conductive polymer material selected from the group consisting of poly (3,4-ethylenedioxythiophene) (PEDOT) and polyaniline (PANI). These may be used alone or in combination of two or more.

The unit patterns of the electrode pattern layer 30 may be, for example, polygonal patterns of triangular, tetragonal, pentagonal, hexagonal, or hexagonal or more.

In addition, the electrode pattern layer 30 may include a regular pattern. A rule pattern means that the pattern form has regularity. For example, the unit patterns may include, independently of each other, a mesh shape such as a rectangle or a square, or a pattern such as a hexagon.

In addition, the electrode pattern layer 30 may include an irregular pattern. The irregular pattern means that the shape of the pattern does not have regularity.

When the electrode pattern layer 30 is formed of a material such as a metal nanowire, a carbon-based material, or a polymer material, the electrode pattern layer 30 may have a network structure.

In the case of having a network structure, since signals are sequentially transmitted to adjacent patterns in contact with each other, a pattern having high sensitivity can be realized.

The electrode pattern layer 30 may be formed by a method commonly used in the art. For example, the step of coating a conductive compound on the first protective layer 20 may be performed have. The film formation step may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition, but is not limited thereto.

Thereafter, a step of forming a photoresist layer on the upper surface of the conductive compound film may be performed to form a desired pattern.

The photosensitive resin composition for forming the photoresist layer is not particularly limited, and a photosensitive resin composition commonly used in the art can be used.

The photosensitive resin composition is coated on a film made of the conductive compound and then heated and dried to remove a volatile component such as a solvent to obtain a smooth photoresist layer.

The photoresist layer thus obtained is irradiated with ultraviolet rays through a mask for forming a desired pattern (exposure). At this time, it is preferable to use an apparatus such as a mask aligner or a stepper so as to uniformly irradiate a parallel light beam onto the entire exposed portion and accurately align the mask and the substrate. When ultraviolet light is irradiated, the site irradiated with ultraviolet light is cured.

The ultraviolet rays may be g-line (wavelength: 436 nm), h-line, i-line (wavelength: 365 nm), or the like. The dose of ultraviolet rays can be appropriately selected according to need, and the present invention is not limited thereto.

When the photoresist layer which has been cured is brought into contact with a developing solution to dissolve and develop the non-visible portion, a desired pattern can be obtained.

The developing method may be any of a liquid addition method, a dipping method, and a spraying method. Further, the substrate may be inclined at an arbitrary angle during development.

The developer is usually an aqueous solution containing an alkaline compound and a surfactant, and can be used without any particular limitation as long as it is commonly used in the art.

Thereafter, an etching process may be performed to form a conductive pattern according to the photoresist pattern.

The etchant composition used in the etching process is not particularly limited, and an etchant composition commonly used in the art may be used, and a hydrogen peroxide etchant composition may be preferably used.

Through the etching process, the electrode pattern layer 30 including the conductive pattern of the desired pattern can be formed.

The thickness of the electrode pattern layer 30 according to the present invention is not particularly limited, but it is preferably 0.01 to 5 占 퐉, preferably 0.05 to 0.5 占 퐉.

The second protective layer 40,

If necessary, the film touch sensor of the present invention may further include a second protective layer 40 disposed on the first protective layer 20 on which the electrode pattern layer 30 is formed. Fig. 2 schematically shows a cross section of such a case.

The second passivation layer 40 according to the present invention may serve as a base material itself and as a passivation layer. In addition, corrosion of the electrode pattern layer 30 is prevented, and the surface is planarized, whereby generation of fine bubbles can be suppressed when the base film 60 is adhered. It can also serve as an adhesive layer.

When the second protective layer 40 is further included, the base film 60 can be simultaneously protected at the top and bottom to further improve the crack suppressing effect.

When the second protective layer 60 serves as a substrate or a passivation layer, a silicone-based polymer such as polydimethylsiloxane (PDMS) or polyorganosiloxane (POS); Polyimide-based polymers; Polyurethane-based polymers, and the like, but the present invention is not limited thereto. These may be used alone or in combination of two or more.

When the second protective layer 60 serves as an adhesive layer, a thermosetting or photo-curable pressure-sensitive adhesive or adhesive known in the art can be used without limitation. For example, thermosetting or photo-curable pressure-sensitive adhesives or adhesives such as polyester-based, polyether-based, urethane-based, epoxy-based, silicone-based or acrylic-

The second protective layer 40 may be the same composition as the first protective layer forming composition.

The thickness of the second protective layer 40 may be the same as the thickness of the first protective layer 20 described above.

The second protective layer 40 may be formed on the first protective layer 20 having the electrode pattern layer 30 formed thereon in the same manner as the first protective layer 20 according to the present invention.

The base film (60)

As shown in FIG. 2, the film touch sensor of the present invention may further include a base film 60 adhered on the second protective layer 40.

When the second protective layer 40 is an adhesive layer, the base film 60 is formed on the second protective layer 40, and if not, the adhesive layer 50 on the second protective layer 40 as shown in Fig. Lt; / RTI >

As the base film 60, a transparent film made of a material widely used in the art can be used without limitation, for example, a cellulose ester (e.g., cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate Propionate, and nitrocellulose), polyimides, polycarbonates, polyesters such as polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane 4,4'-dicarboxylate and polybutylene terephthalate, polystyrenes such as syndiotactic polystyrenes, polyolefins such as polypropylene, polyethylene and polymethylpentene, polysulfone, polyethersulfone , Polyarylate, polyether-imide, polymethylmethacrylate, polyetherketone, Polyvinyl alcohol and polyvinyl chloride, or a film made of a mixture thereof.

Further, the transparent film may be an isotropic film or a retardation film.

Nx and ny are the main indices of refraction in the film plane, nz is the refractive index in the film thickness direction, d is the film thickness) is 40 nm or less, and 15 nm And the retardation in the thickness direction (Rth, Rth = [(nx + ny) / 2-nz] xd) is from -90 nm to +75 nm, preferably -80 nm to +60 nm, desirable.

The retardation film is a film produced by the uniaxial stretching, biaxial stretching, polymer coating and liquid crystal coating method of a polymer film, and is generally used for improving the viewing angle of the display, improving the color feeling, improving the light leakage, do.

A polarizing plate may also be used as the base film 60.

The polarizing plate may be one having a polarizer protective film attached on one side or both sides of a polyvinyl alcohol polarizer.

Further, a protective film may be used as the base film 60.

The protective film may be a film including an adhesive layer on at least one side of a film made of a polymer resin, or a self-adhesive film such as polypropylene, and may be used for protecting the surface of the touch sensor and improving the process precision.

The light transmittance of the base film 60 is preferably 85% or more, and more preferably 90% or more. The haze value of the base film 70 measured according to JIS K7136 is preferably 10% or less, and more preferably 7% or less.

The thickness of the base film 60 is not limited, but is preferably 30 to 150 占 퐉, and more preferably 70 to 120 占 퐉.

The adhesive layer (50)

The base film 60 according to the present invention may be adhered using a water-based adhesive, an adhesive, or a photocurable or thermosetting adhesive or an adhesive known in the art.

The film touch sensor of the present invention as described above can be used as a film touch sensor after being peeled off from the carrier substrate 70.

The present invention also provides a touch screen panel including the film touch sensor, and an image display device including the touch screen panel.

The touch screen panel of the present invention is applicable not only to a conventional liquid crystal display but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device. It can be particularly usefully applied to an image display device having a flexible characteristic.

<Manufacturing Method of Film Touch Sensor>

The present invention also provides a method of manufacturing the film touch sensor.

FIGS. 3 and 4 are schematic views of a method of manufacturing a film touch sensor according to an embodiment of the present invention, and the present invention will be described in detail with reference to the drawings.

First, as shown in FIG. 3A, a separation layer 10 is formed on a carrier substrate 70.

The carrier substrate 70 can be used without any particular limitation as long as it is a material that provides an adequate strength to be fixed without being bent or twisted during the process, and has little influence on heat or chemical treatment. For example, glass, quartz, silicon wafer, cloth or the like can be used, and preferably, glass can be used.

The separation layer 10 can be formed of the above-mentioned polymer material.

The method of forming the separation layer 10 is not particularly limited and the polymer composition may be applied by a slit coating method, a knife coating method, a spin coating method, a casting method, a micro gravure coating method, a gravure coating method, Such as a wire bar coating method, a dip coating method, a spray coating method, a screen printing method, a gravure printing method, a flexo printing method, an offset printing method, an ink jet coating method, a dispenser printing method, a nozzle coating method, Or may be formed by coating by a known method.

The separation layer 10 may be further roughened after the application.

After the separation layer 10 has been formed by the above-described method, an additional curing process may be further roughened.

The curing method is not particularly limited, and it is possible to use both of the above methods by photocuring or thermosetting. The order of the photo-curing and the thermal curing is not particularly limited.

3 (b), the first passivation layer 20 is formed on the isolation layer 10. Then, as shown in FIG.

The first protective layer 20 can be formed by applying a composition for forming a first protective layer including an acrylic copolymer having a glass transition temperature of 25 DEG C or lower after curing described above onto the separation layer 10 and curing the same.

The coating method is not particularly limited, and the same method as the coating method of the composition for forming the separation layer 10 can be used.

The photocuring condition of the first protective layer 20 is not particularly limited as long as it is controlled to such an extent that sufficient curing can be achieved without compromising the physical properties of the cured product. For example, within 24 hours.

The light amount, for example from 10 to 1,000mJ / cm ^2, and preferably may be from 10 to 500mJ / cm ^2. When the amount of light is less than 10 mJ / cm ² , sufficient curing does not occur, and when it exceeds 1,000 mJ / cm ² , yellowing or cracking may occur.

In addition, the first passivation layer 20 may be more thermally hardened after the photocuring.

As a specific example, after performing the photo-curing for 30 seconds to 5 minutes, thermal curing can be performed.

The thermosetting may be performed at, for example, less than 220 ° C, preferably 200 ° C or less. When the thermal curing is performed at 220 ° C or higher, there is a problem that the carrier substrate 60 can not be used when the thermal expansion coefficient of the carrier substrate 60 is high or when the glass transition temperature Tg is low.

The thermosetting can be carried out, for example, for 30 minutes to 120 minutes.

To increase the thermal curing rate, the composition for forming the first protective layer may further include a thermosetting auxiliary.

3 (c), an electrode pattern layer 30 is formed on the first passivation layer 20. Then, as shown in FIG.

The electrode pattern layer 30 can be formed of a material such as the above-mentioned metal oxide materials, metals, metal nanowires, carbon-based materials, and conductive polymer materials.

The method of forming the electrode pattern layer 30 is not particularly limited and may be selected from physical vapor deposition, chemical vapor deposition, plasma deposition, plasma polymerization, thermal vapor deposition, thermal oxidation, anodization, Printing methods such as LEXO printing method, offset printing method, inkjet coating method, and dispenser printing method.

The method of manufacturing a film touch sensor of the present invention further includes the step of attaching the base film 60 on the first protective layer 20 on which the electrode pattern layer 30 is formed.

3 (d) is a process diagram for forming the second protective layer 40 before the base film 60 is attached, but the present invention is not limited thereto, and the second protective layer 40 may not be formed .

The base film 60 can be adhered to the base film 60 through the adhesive layer 50 by using a water-based adhesive, an adhesive, or a photo-curable or thermosetting adhesive or an adhesive known in the art as shown in Fig. 4 (e).

The base film 60 may be a film made of the above-mentioned material, or a polarizing plate, a retardation film, or a protective film.

The method of manufacturing a film touch sensor of the present invention may further comprise forming a second protective layer 40 on the first protective layer 20 on which the electrode pattern layer 30 is formed before attaching the base film 60 The method comprising the steps of:

In the case of forming the second protective layer 40, the crack prevention effect can be further improved.

The second protective layer 40 may be formed of the same composition as the composition for forming the organic or inorganic insulating material and the first protective layer described above.

The method of forming the second protective layer 40 is not particularly limited, and can be formed in the same manner as the first protective layer 20, for example.

The film touch sensor can be manufactured by separating the separation layer 10 from the carrier substrate. The separation timing is not particularly limited. For example, after the formation of the electrode pattern 30, after the formation of the second protection layer 40 , Or after the attachment of the base film 60 as shown in Fig. 4 (g).

The method of manufacturing a film touch sensor of the present invention includes peeling the separation layer and the upper laminate from the carrier substrate at a temperature higher than the glass transition temperature of the acrylic copolymer, It is possible to suppress cracks that may occur during use, and the degradation of optical characteristics can be minimized. Preferably, the occurrence of cracking can be minimized by peeling at a temperature higher than the glass transition temperature of the acrylic copolymer by 50 캜 or more.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention. Such variations and modifications are intended to be within the scope of the appended claims.

Synthetic example 1. Preparation of acrylic copolymer

370 parts by weight of propylene glycol monomethyl ether acetate was placed in a reaction vessel and heated to 80 DEG C while introducing nitrogen gas into the vessel. Then, 60 parts by weight of benzyl acrylate (Tg 6 DEG C) and 30 parts by weight of hydroxyethyl methacrylate (Tg 55 ° C) and 3.5 parts by weight of azobisisobutyronitrile as a thermal polymerization initiator were added dropwise over 1 hour to carry out polymerization reaction. After dropwise addition, the mixture was further reacted at 100 DEG C for 3 hours. Then, 1.0 part by weight of azobisisobutyronitrile was dissolved in 50 parts by weight of cyclohexanone, and the reaction was further continued at 100 DEG C for 1 hour to obtain a solution of the acrylic copolymer . The weight average molecular weight of the synthesized acrylic copolymer was about 15,000 and the Tg was 24 캜.

Synthetic example 2. Preparation of Acrylic Copolymer

, 80 parts by weight of benzyl acrylate (Tg 6 ° C), 40 parts by weight of hydroxyethyl methacrylate (Tg 55 ° C.), 40 parts by weight of benzyl acrylate (Tg 6 ° C.) and 40 parts by weight of hydroxyethyl methacrylate C) was used in place of 20 parts by weight of the acrylic copolymer, to obtain an acrylic copolymer having a weight average molecular weight of about 14,500 and a Tg of 14 캜.

Synthetic example 3. Preparation of Acrylic Copolymer

20 parts by weight of benzyl acrylate (Tg 6 ° C), 20 parts by weight of hydroxyethyl methacrylate (Tg 55 ° C.), 40 parts by weight of benzyl acrylate (Tg 6 ° C.) and 40 parts by weight of hydroxyethyl methacrylate Was used in place of 80 parts by weight of the acrylic copolymer, to obtain an acrylic copolymer having a weight average molecular weight of about 16,000 and a Tg of 44 캜.

Manufacturing example 1 to 6. Preparation of composition for forming protective layer

A composition for forming a protective layer having the components and contents shown in Table 1 below was prepared.

division Acrylic copolymer Acrylic monomer Photoinitiator menstruum Kinds Glass transition temperature
(° C) content
(weight%) Kinds content
(weight%) Kinds content
(weight%) Kinds content
(ml) Production Example 1 A-1 24 50 B-1 45 C-1 5 D-1 100 Production Example 2 A-1 24 65 B-1 30 C-1 5 D-1 100 Production Example 3 A-2 14 50 B-1 45 C-1 5 D-1 100 Production Example 4 A-2 14 55 B-2 40 C-1 5 D-1 100 Production Example 5 A-2 14 50 B-3 45 C-1 5 D-1 100 Production Example 6 A-3 44 50 B-1 45 C-1 5 D-1 100 A-1: An acrylic copolymer of Synthesis Example 1
A-2: An acrylic copolymer of Synthesis Example 2
A-3: An acrylic copolymer of Synthesis Example 3

B-1: Pentaerythritol tetraacrylate
B-2: Trimethylolpropane triacrylate
B-3: Ethoxylated glycerin triacrylate

C-1:? -Hydroxydimethylacetophenone

D-1: Propylene glycol monomethyl ether acetate

Example And Comparative Example

(One) Example One

A separating layer containing an aromatic liquid crystal was coated on a soda lime glass having a thickness of 700 mu m to a thickness of 0.13 mu m. Thereafter, the protective layer-forming composition of Preparation Example 1 was coated on the separation layer and cured under the condition of 180 mJ / cm ² to form a first protective layer having a thickness of 1.5 탆.

Thereafter, an ITO layer was formed on the first protective layer by a vacuum deposition method to a thickness of 0.05 mu m, and a photosensitive resist was coated on the ITO layer to form an electrode pattern layer.

Thereafter, the protective layer-forming composition of Production Example 1 was applied onto the first protective layer on which the electrode pattern layer was formed and the second protective layer was formed in the same manner as the first protective layer forming method, Sensitive adhesive layer, and then a polycarbonate base material having a thickness of 50 占 퐉 was attached thereto to produce a film touch sensor.

Thereafter, the glass substrate was peeled from the separating layer and the upper laminate at a temperature of 80 캜 to prepare a film touch sensor.

(2) Example 2 to 8 and Comparative Example 1 to 2

A film touch sensor was manufactured in the same manner as in Example 1, except for that shown in Table 2.

Experimental Example

(One) crack evaluation

The film touch sensor of Examples and Comparative Examples was cut into 100 mm x 10 mm, and an PET protective film including a pressure sensitive adhesive layer was bonded to the upper portion. Then, the protective film and the film touch sensor were peeled at the same time.

After peeling, the occurrence of cracks in the film touch sensor was visually evaluated. The results are shown in Table 2 below.

○: No crack occurred

DELTA: Micro crack occurred

X: occurrence of crack front

(2) ITO Layer Pattern layer ) Evaluation of wrinkle occurrence

The film touch sensors of the examples and comparative examples were cut into 100 mm x 10 mm, and whether or not the ITO layer (electrode pattern layer) of the touch sensor film was wrinkled under a fluorescent lamp was visually evaluated. The results are shown in Table 2 below.

○: Crease Mishin

△: Wrinkles were not visibly recognized

X: Wrinkles are visible from the front

division The composition for forming the first protective layer Peeling temperature
(° C) Crack evaluation ITO layer wrinkle evaluation Example 1 Production Example 1 80 ○ ○ Example 2 Production Example 2 50 ○ △ Example 3 Production Example 3 70 ○ △ Example 4 Production Example 4 70 ○ △ Example 5 Production Example 1 50 △ ○ Example 6 Production Example 3 50 △ △ Example 7 Production Example 4 45 △ △ Example 8 Production Example 5 70 ○ ○ Comparative Example 1 Production Example 6 50 X △ Comparative Example 2 Production Example 6 25 X △

Referring to Table 3, it was confirmed that the occurrence of cracks in the film touch sensor was remarkably reduced and the occurrence of wrinkles in the ITO layer was suppressed in the case of the examples. In particular, it was confirmed that no crack occurred when peeling at a temperature higher than the glass transition temperature of the acrylic copolymer of the present invention by 50 ° C.

However, in the case of the comparative example, it was confirmed that cracks were generated on the entire surface at the peeling of the film touch sensor, and wrinkles of the ITO layer were generated.

10: Separation layer 20: First protective layer
30: electrode pattern layer 40: second protective layer
50: adhesive layer 60: substrate film
70: carrier substrate

Claims

A separation layer;
A first protective layer located on the isolation layer; And
And an electrode pattern layer disposed on the first passivation layer,
Wherein the first protective layer is formed of a composition for forming a first protective layer including an acrylic copolymer having a glass transition temperature of not higher than 25 ° C after curing, an acrylic monomer, and a photoinitiator.

The film touch sensor according to claim 1, wherein the acrylic copolymer is polymerized by including a (meth) acrylate monomer having a glass transition temperature of 25 ° C or lower when the acrylic copolymer is polymerized singly.

The acrylic copolymer according to claim 1, wherein the weight average molecular weight of the acrylic copolymer is 3,000 to 100,000. Film touch sensor.

The film touch sensor according to claim 1, wherein the acrylic copolymer is contained in an amount of 15 to 80% by weight of the total solid content of the composition for forming the first protective layer.

The film touch sensor of claim 1, wherein the thickness of the first passivation layer is 0.1 to 10 占 퐉.

The film touch sensor of claim 1, further comprising a second protective layer located on a first protective layer on which the electrode pattern layer is formed.

7. The film touch sensor of claim 6, further comprising a substrate film deposited on the second protective layer.

The film touch sensor according to claim 7, wherein the base film is attached via an adhesive layer.

The method according to claim 1, wherein the electrode pattern layer comprises at least one of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) (PEDOT), carbon nanotubes (CNTs), metal wires, and metal meshes. &Lt; Desc / Clms Page number 13 >

A touch screen panel comprising the film touch sensor of any one of claims 1 to 9.

An image display device comprising the touch screen panel of claim 10.

Forming a separation layer on the carrier substrate;
Forming a first protective layer on the separation layer by applying a composition for forming a first protective layer including an acrylic copolymer, an acrylic monomer and a photoinitiator having a glass transition temperature of 25 ° C or lower after curing;
Forming an electrode pattern layer on the first passivation layer;
Forming an adhesive layer on the first protective layer on which the electrode pattern layer is formed;
Bonding the base film to the adhesive layer; And
And peeling the separation layer and the upper laminate from the carrier substrate at a temperature higher than the glass transition temperature of the acrylic copolymer.

The method of manufacturing a film touch sensor according to claim 12, further comprising forming an electrode pattern layer on the first protective layer, and then forming a second protective layer on the first protective layer on which the electrode pattern layer is formed .

[Claim 12] The method of claim 12, wherein the acrylic copolymer has a weight average molecular weight of 3,000 to 100,000. A method of manufacturing a film touch sensor.

[14] The method of claim 12, wherein the acrylic copolymer is contained in an amount of 15 to 80% by weight based on the total solid weight of the composition for forming the first protective layer.

13. The film touch sensor of claim 12, wherein the thickness of the first protective layer is 0.1 to 10 mu m.

[14] The method of claim 12, wherein the electrode pattern layer is formed of at least one of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) Wherein the conductive pattern comprises at least one selected from the group consisting of PEDOT, carbon nanotubes (CNT), metal wires, and metal mesh.