KR20160064923A - Pellicle and exposure mask comprising the same - Google Patents

Abstract

The present invention relates to a pellicle and an exposure mask comprising the same. More specifically, the pellicle includes: a pellicle frame enclosing a certain area of a photomask substrate; an attaching element formed on one surface facing the photomask substrate of the pellicle frame; and a pellicle membrane formed on the other surface of the pellicle frame. The attaching element has a primary structure capable of generating sound pressure toward the photomask substrate. According to the present invention, when the pellicle is used, a residue does not remain even after removing the pellicle from the exposure mask. Therefore, it is not required to use chemicals which can damage a mask pattern, and the pellicle can be reused, thereby reducing process costs.

Description

The present invention relates to a pellicle and an exposure mask including the same,

The present invention relates to a pellicle and an exposure mask including the pellicle. More specifically, it is unnecessary to use chemicals that can damage the mask pattern due to no residue remaining after removal from the exposure mask, To a pellicle capable of reducing the process cost and an exposure mask including the pellicle.

As semiconductor devices are reduced in size, the exposure process is also looking to convert from deep UV lithography to EUV (extreme UV) lithography using light of much shorter wavelengths. There are many changes in EUV technology compared to DUV lithography, and development of EUV pellicles is also urgent. Particularly serious problems such as outgassing due to bonding of pellicle and exposure mask with adhesive, residues after separation, and mask pattern damage when removing residues are not yet improved.

A first object of the present invention is to provide a pellicle capable of reducing the process cost by eliminating the need for using chemicals that can damage the mask pattern due to no residue left after the removal from the exposure mask, .

A second object of the present invention is to provide a pellicle which can reduce the process cost by eliminating the need to use chemicals that can damage the mask pattern due to no residue left after the removal from the exposure mask, The present invention also provides an exposure mask having the same.

A third object of the present invention is to provide a method for attaching the pellicle on an exposure mask substrate.

A fourth object of the present invention is to provide a method for detaching the pellicle from the exposure mask substrate.

In order to achieve the first technical object, the present invention provides a pellicle frame which can be attached on a photomask substrate. An attaching element formed on one surface of the pellicle frame facing the photomask substrate; And a pellicle membrane formed on the other surface of the pellicle frame, wherein the attachment member provides a pellicle having a primary structure capable of generating negative pressure on a surface thereof facing the photomask substrate.

At this time, the attachment member may be an elastomer. Particularly, the attaching member may be formed of any one of a polyamide elastomer, an acrylate elastomer, a styrene elastomer, a polyolefin elastomer, a polyoxyalkylene elastomer, a polyester elastomer, an epoxy elastomer, a polyvinyl chloride elastomer, a silicone elastomer, , A nitrile elastomer, a polyurethane elastomer, a copolymer of an ethylene-propylene-diene monomer (EPDM), or a mixture thereof.

Further, the attachment member may be coupled to the pellicle frame by an adhesive layer.

The primary structure of the attachment member may be pores having an average diameter of the openings of about 0.1 탆 to about 500 탆. The primary structure of the attaching member may be irregularly arranged on the surface of the photomask substrate facing the photomask substrate. Alternatively, the primary structure of the attachment member may be regularly arranged on a surface of the attachment member facing the photomask substrate. In particular, the openings of the primary structure may be arranged in a lattice form. The opening of the primary structure may have a polygonal shape.

Further, the primary structure of the attachment member may further include a secondary structure recessed from an inner surface thereof.

Further, at least one side of the attachment member may further include a detachment auxiliary portion for detachably attaching the attachment member from the photomask substrate. In particular, the detachable auxiliary part may include a recess into which the detachable member can be inserted.

[0324] Optionally, the desorption aid may include protrusions projecting laterally of the pellicle frame and causing deformation of the attachment member by application of an external force.

The attachment member may include: a first attachment member extending along an inner edge of the pellicle frame; And a second attachment member located further from the inner edge of the pellicle frame than the first attachment member and extending along the first attachment member. At this time, the first attachment member and the second attachment member may be materials different from each other. Particularly, the first attachment member may be a fluorine-based elastomer or a silicone-based elastomer, and the second attachment member may be a polyurethane-based elastomer.

In addition, the attachment member may be laminated with two or more different substances in the attachment direction of the pellicle. Wherein the attachment member includes a third attachment member disposed closer to the pellicle frame side and a fourth attachment member spaced apart from the pellicle frame, wherein the hardness of the fourth attachment member is smaller than the hardness of the fourth attachment member .

According to another aspect of the present invention, there is provided a photomask substrate comprising: a photomask substrate having a pellicle region; And a pellicle attached to the photomask substrate so as to surround the pellicle region, wherein the pellicle includes a pellicle frame, an attachment member formed on one surface of the pellicle frame, and a pellicle membrane formed on the other surface of the pellicle frame And the attaching member is detachably attached to the photomask substrate.

The attachment member may have a primary structure capable of generating negative pressure on a surface facing the photomask substrate. The attachment member can be maintained adhered to the photomask substrate by a negative pressure formed by the primary structure and a van der Waals force between the attachment member and the photomask substrate.

The attachment member may be detachable from the photomask substrate and then reattachable to the photomask substrate. In addition, the primary structure may be micropores, and the density of the micropores may be from about 1 x 10 ⁶ / cm ² to about 5 x 10 ⁹ / cm ² .

According to a third aspect of the present invention, there is provided a method of manufacturing a photomask substrate, comprising the steps of: preparing a photomask substrate having a pellicle region; Preparing a pellicle including a pellicle frame, an attachment member formed on one surface of the pellicle frame, and a pellicle membrane formed on the other surface of the pellicle frame; Disposing a pellicle at an attachment position of the photomask substrate so as to surround the pellicle region; Applying pressure on the pellicle to bring the pellicle and the photomask substrate into close contact with each other; And removing the pressure. The present invention also provides a method of attaching a pellicle. At this time, the attachment member is deformed by the pressure and is restored by the removal of the pressure, so that a negative pressure is formed between the attachment member and the photomask substrate.

When pressure is applied on the pellicle, heat is not applied. The pellicle may be a pellicle attached to another photomask substrate before it is attached to the photomask substrate. At this time, the step of removing the pellicle from the other photomask substrate may be performed prior to the step of preparing the pellicle.

According to a fourth aspect of the present invention, there is provided a photomask comprising a photomask substrate having a pellicle region and a pellicle attached to the photomask substrate so as to surround the pellicle region, the pellicle including a pellicle frame Preparing a photomask including a mounting member formed on one surface of the pellicle frame, a pellicle membrane formed on the other surface of the pellicle frame, and a detachable auxiliary portion for detaching the mounting member from the photomask substrate; Deforming the attachment member by applying a force to the detachment auxiliary portion; And a step of raising the detachable auxiliary part from the photomask substrate to be detached from the attaching member adjacent to the detachable auxiliary part.

The detachable auxiliary part may be a concave part into which an external detachable member can be inserted, and the step of deforming the detachable auxiliary part may include inserting the detachable member into the detachable auxiliary part.

At this time, the detachable auxiliary portion protrudes from the attaching member in a lateral direction of the pellicle frame, and the step of deforming the attaching member includes a step of applying a force to the projected detachable auxiliary portion in a direction away from the photomask substrate .

In addition, a plurality of the detachable auxiliary portions exist, and they can be disposed at symmetrical positions with respect to the reticle frame.

The use of the pellicle according to the technical idea of the present invention makes it unnecessary to use chemicals that can damage the mask pattern due to no residue left after the mask is removed from the exposure mask and the pellicle can be recycled, There is an effect.

1 is an exploded perspective view of a pellicle according to an embodiment of the present invention.
FIG. 2A is a conceptual view showing a side surface of the pellicle, and FIG. 2B is a partially enlarged view showing an enlarged detail of a portion indicated by B in FIG. 2A.
FIG. 3 is a partial cross-sectional view taken along the line III-III 'of FIG. 2B.
Figs. 4A to 4C are images illustrating the surface shape when the attachment member is viewed in the direction of the arrow IV in Fig. 2B.
Figs. 5A-5C are side cross-sectional views briefly showing in order of an embodiment of a method for obtaining the pore arrangement shown in Figs. 4A and 4B.
FIG. 6 is a side view schematically showing the islands group and the nano cilium in FIG. 4C.
7A to 7C are conceptual diagrams showing various modifications of pores.
8 and 9 are partial perspective sectional views showing a pellicle according to another embodiment of the present invention.
10A and 10B are conceptual views illustrating a method for detaching a pellicle according to an embodiment of the present invention.
11A and 11B are conceptual views illustrating a method of detaching a pellicle according to another embodiment of the present invention.
12 is a flowchart showing a method (A) for attaching a pellicle to a photomask substrate and a method (D) for attaching and detaching the pellicle.
13A to 13C are side cross-sectional views sequentially showing a method of attaching the pellicle to the photomask substrate 120. Fig.
14 is a side view showing the moment when the photomask substrate starts to rise by the distal end of the detachment member while the attachment member starts to be detached from the photomask substrate.
Fig. 15 is a schematic structural view schematically showing an embodiment of a projection exposure apparatus using the exposure mask of the present invention. Fig.
16 is a view for explaining an extreme ultraviolet lithography equipment according to an embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, embodiments of the inventive concept may be modified in various other forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. Embodiments of the inventive concept are desirably construed as providing a more complete understanding of the inventive concept to those skilled in the art. The same reference numerals denote the same elements at all times. Further, various elements and regions in the drawings are schematically drawn. Accordingly, the inventive concept is not limited by the relative size or spacing depicted in the accompanying drawings.

The terms first, second, etc. may be used to describe various components, but the components are not limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and conversely, the second component may be referred to as a first component.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the inventive concept. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this application, the expressions "comprising" or "having ", etc. are intended to specify the presence of stated features, integers, steps, operations, elements, parts, or combinations thereof, It is to be understood that the invention does not preclude the presence or addition of one or more other features, integers, operations, components, parts, or combinations thereof.

Unless otherwise defined, all terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the inventive concept belongs, including technical terms and scientific terms. In addition, commonly used, predefined terms are to be interpreted as having a meaning consistent with what they mean in the context of the relevant art, and unless otherwise expressly defined, have an overly formal meaning It will be understood that it will not be interpreted.

1 is an exploded perspective view of a pellicle 110 according to an embodiment of the present invention.

1, the pellicle 110 includes a pellicle frame 111, an attachment member 115 formed on one surface of the pellicle frame 111, and a pellicle membrane 113 formed on the other surface of the pellicle frame 111 .

The pellicle frame 111 may be configured to surround a predetermined region of the photomask substrate 120. The pellicle frame 111 may be square or rectangular, for example, having two pairs of parallel sides. The size of the pellicle frame 111 may be, for example, 115 mm x 149 mm, 474 mm x 782 mm, 754 mm x 902 mm, 330 mm x 400 mm, 330 mm x 450 mm, 390 mm x 610 mm, 500 mm x 750 mm, 520 mm x 800 mm , 800 mm x 920 mm, 850 mm x 1200 mm, 1220 mm x 1400 mm, or 1800 mm x 2000 mm.

The pellicle frame 111 may be configured to surround the pellicle region 121 of the photomask substrate 120. The pellicle region 121 will be described later in more detail.

The pellicle frame 111 may have a first surface 111a and a second surface 111b parallel to the photomask substrate 120. The first surface 111a may be located near the photomask substrate 120 and may be a surface facing the photomask substrate 120. The second surface 111b may be a surface facing away from the photomask substrate 120 and facing the pellicle membrane 113.

The pellicle frame 111 may be made of an aluminum alloy containing aluminum and zinc (JIS A7000 series aluminum alloy), and may be made of, for example, an A7075 aluminum alloy having high strength.

As another example, the pellicle frame 111 may be made of an aluminum alloy (aluminum alloy of JIS A6000 series) containing aluminum, magnesium and silicon, and may be made of, for example, an A6061 aluminum alloy excellent in cutting ability.

As another example, the pellicle frame 111 may be made of an aluminum alloy containing aluminum and magnesium (JIS A5000 series aluminum alloy), for example, A5052 aluminum alloy.

The side wall of the pellicle frame 111 may be provided with a vent hole 111h to prevent overpressure from being applied to the pellicle frame 111 and to equalize pressure inside and outside the pellicle frame 111. [ The vent holes 111h may be circular, for example, and may be formed of one or more. Although FIG. 1 shows the formation of four vent holes 111h, the number of vent holes 111h may be less or more than four. The pellicle frame may be provided with an air filter having an eye smaller than the particle diameter of the dust to be cut, for example, an air filter capable of blocking passage of particles having a particle diameter of 0.2 micrometer or more .

The pellicle membrane 113 must be dimensionally matched to the pellicle frame 111 and may be attached on the second surface 111b of the pellicle frame 111. The pellicle membrane 113 may be attached to the second surface 111b, for example, by an adhesive layer.

The pellicle membrane 113 may cover the exposed area of the photomask to be manufactured using the pellicle 110. Therefore, the pellicle membrane 113 may have a light-transmitting property capable of maximizing the transmission of light energy at the time of exposure. The pellicle membrane 113 may be made of, for example, quartz glass; Sapphire; A fluorine resin such as an amorphous fluorine polymer, or a cellulose-based material such as nitrocellulose, cellulose acetate or the like. As the amorphous fluoropolymer, for example, Teflon ( ^TM ) (DuPont), Cytot ^TM (Asahi Glass) and the like are commercially available. However, it is not limited thereto.

As the adhesive layer for fixing the pellicle membrane 113 to the pellicle frame 111, for example, a fluorine polymer such as an acrylic resin adhesive, an epoxy resin adhesive, a silicone resin adhesive, and a fluorine-containing silicone resin adhesive can be used, Based polymer.

The attachment member 115 may have a fine primary structure on at least a surface of the attachment member 115 facing the photomask substrate 120.

FIG. 2A is a conceptual view showing a side surface of the photomask 100, and FIG. 2B is a partially enlarged view showing an enlarged detail of a portion indicated by B in FIG. 2A.

2A and 2B, the attachment member 115 has a fine primary structure on the first surface 111a facing the photomask substrate 120. As shown in FIG. In FIG. 2B, the dimensions may be exaggerated for ease of understanding.

The primary structure of the attachment member 115 may be any structure capable of generating negative pressure. Here, 'sound pressure' means a pressure lower than the atmosphere outside the pellicle. When a negative pressure is generated between the attachment member 115 and the photomask substrate 120 by the primary structure, a force generated by a difference between the pressure of the atmosphere outside the pellicle and the pressure inside the primary structure is applied to the attachment The member 115 and the photomask substrate 120 can be brought into close contact with each other.

The structure capable of generating negative pressure of the attachment member 115 may be, for example, a pore structure having an opening. The pores 115p can have various cross-sectional shapes, and in particular, the internal volume can be changed by deformation of the attachment member 115. [

The internal volume of the pores 115p can be reduced by deformation of the attachment member 115 when the attachment member 115 is pressed against the photomask substrate 120 by applying pressure. Further, as the pressure is removed, the inner volume of the pores 115p may increase while the attachment member 115 is restored to its original shape. At this time, since the number of moles of the gas existing in the pores 115p is the same and only the volume increases, the pressure inside the pores 115p decreases, so that the negative pressure can be formed.

The pores 115p may be micro-pores having micro-scale dimensions, and the pores 115p may have a circular, elliptical, polygonal, or other arbitrary shape. In addition, when the diameter when converted into a circle of equivalent area is defined as a characteristic diameter, the characteristic diameter d of the pores 115p may have an average size of about 0.1 to about 500 mu m. The characteristic diameter d may be a value obtained by processing the surface image by software. Thus, fine pores that are not detected in the image processing can be excluded from the calculation of the average value.

Further, the number of pores (115p) (that is, the pore density) per unit area of the attachment member 115, there also may be controlled constant, for example, the pore density of about 1x10 ⁶ / cm ² to about 5x10 ⁹ / cm < ² >. If the pore density is too low, the contribution of the pores 115p to the adhesion between the attachment member 115 and the photomask substrate 120 may be insufficient. On the other hand, if the pore density is too high, the pore size may become excessively small. In this case, the contribution of the pores 115p to the adhesion force may become insufficient, as in the case where the pore density is too low.

In FIG. 2B, the individual pores 115p are shown separated from each other, but the pores 115p may be connected to each other through the attachment member 115. FIG.

The attachment member 115 may have a contact surface 115f that is in close contact with the surface of the photomask substrate 120. [ The contact surface 115f may be attached to each other by a van der Waals force by making a molecular level contact with the photomask substrate 120. That is, adhesion of the contact surface 115f to the photomask substrate 120 can be maintained by van der Waals force formed by intimate contact with the photomask substrate 120. [

In other words, the attachment member 115 is fixed to the photomask substrate 120 (e.g., by a negative pressure generated in the primary structure and / or a van der Waals force between the adhesion surface 115f and the photomask substrate 120) ). ≪ / RTI >

However, since the attachment is not a chemical bond, physical attachment and detachment is possible without remaining residues on the surface of the photomask substrate 120 by a method such as re-deformation of the attachment member 115 or application of stress from the side .

FIG. 3 is a partial cross-sectional view taken along the line III-III 'of FIG. 2B.

3, an attaching member 115 is interposed between the pellicle frame 111 and the photomask substrate 120 to physically couple the pellicle frame 111 and the photomask substrate 120 to each other. have.

The width W2 of the attachment member 115 may be smaller than or equal to the lateral thickness W1 of the pellicle frame 111. [ Further, although the cross section of the attachment member 115 is shown as being rectangular in Fig. 3, the attachment member 115 may have various cross-sectional shapes. However, the surface where the attachment member 115 contacts the pellicle frame 111 and the surface where the attachment member 115 contacts the photomask substrate 120 may be planar for better airtightness.

3, the attaching member 115 can maintain airtightness to such an extent that the flow of particles between the inside and the outside of the pellicle frame 111 can be blocked.

The attachment member 115 may be attached to the pellicle frame 111 by a variety of methods, wherein an embodiment that is coupled by the adhesive layer 117 is shown. As the adhesive layer 117, for example, a fluorine polymer such as an acrylic resin adhesive, an epoxy resin adhesive, a silicone resin adhesive, or a fluorine-containing silicone resin adhesive may be used, and in particular, it may be a fluorine-based polymer.

In another embodiment, the attachment member 115 may be attached by being fused to the pellicle frame 111 by heating.

In another embodiment, the attachment surfaces of the attachment member 115 and / or the pellicle frame 111 can be attached to each other by denaturing them. For example, when the adhesion surface of the attachment member 115 and / or the pellicle frame 111 is subjected to plasma treatment, the surface energy can be changed and the affinity can be enhanced have. In another embodiment, the surface can be treated using chemicals instead of plasma.

Figs. 4A to 4C are images illustrating the surface shape when the attachment member 115 is viewed in the direction of the arrow IV in Fig. 2B. These are only examples, and the technical idea of the present invention is not limited thereto.

Referring to FIG. 4A, the pores 115p may be irregularly arranged. Also, the inlet size of the pores p is not constant and can have a predetermined distribution.

Referring to FIG. 4B, unlike FIG. 4A, pores 115p may be regularly arranged. In addition, the pores 115p may be arranged in a lattice form. In FIG. 4B, an example of arranging in a lattice form is shown, but they may be arranged in a honeycomb form.

The primary structure in the form as shown in Figs. 4A and 4B can be obtained in various ways. For example, irregularly shaped pores as shown in FIG. 4A may be obtained from the bubbles due to gas byproducts that arise when manufacturing the attachment member 115. In other words, in selecting the raw material for manufacturing the attachment member 115, a substance capable of generating gas can be selected in the course of obtaining the product, and the reaction temperature, the pressure and the concentration of the reactant can be controlled, The frequency can be adjusted. In addition, the density, inlet diameter (characteristic diameter) and the like of the primary structure (that is, the pores 115p in this case) obtained according to the bubbles can be controlled thereby.

Alternatively, an imprint method can be used to obtain the arrangement of pores 115p as shown in FIGS. 4A and 4B, and FIGS. 5A-5C are cross-sectional side views schematically illustrating the method in order.

Referring to FIG. 5A, particles PA having the same or similar size as the pore size are distributed on the matrix 115 'of the attachment member 115. If an irregular arrangement of the pores 115p is desired, as in Fig. 4A, the particles PA can be arranged irregularly. Alternatively, if a regular arrangement of pores 115p is desired, as in Fig. 4b, the particles PA can be arranged regularly.

5B, fluidized matrix 115 '' is formed by applying energy such as heat or light to the matrix 115 ', whereby the particles PA are dispersed in the fluidized matrix 115' '. . ≪ / RTI > This can be controlled by adjusting the degree of fluidization of the matrix 115 '.

The fluidized matrix 115 "can then be cured by methods such as temperature control, blocking of irradiated light, and the like.

Referring to FIG. 5C, the particles PA are dissolved and removed to obtain the attachment member 115 having the pores 115p formed therein. A solvent capable of dissolving the particles PA to dissolve them, an etchant, and the like may be used.

As another embodiment for obtaining a primary structure of the type as shown in Fig. 4B, photolithography can be used. That is, the photosensitive member may be coated on the matrix of the attachment member 115, exposed after the pattern, and then developed to expose a part of the matrix according to the pattern. The exposed portions of the matrix may then be subjected to a wet or dry etch to form uniformly arranged pores 115p.

4C shows a primary structure, in which a plurality of island groups are formed on the surface of the attachment member 115, not the pores. Alternatively, nano cilia may be attached to the ends of each cilia constituting the syllable group.

FIG. 6 is a side view schematically showing the islands group and the nano cilium in FIG. 4C.

6, by forming a filament group (CLG) composed of a large number of cilia (CL) on the attachment member 115 as in the foot surface of a Gecko lizard, A large Van der Waals force can be applied between the mask substrate 120. [ Furthermore, by forming nano cilia (NCL) at the respective ends of the cilia (CL), van der Waals force between the attachment member (115) and the photomask substrate (120) can be maximized.

In FIG. 6, the surface facing the photomask substrate 120 faces upward for convenience of illustration.

In addition, it can be made easily removable by imparting directionality to the filamentous fungi (CLG) and / or the nano ciliates (NCL). That is, when the attachment member 115 is subjected to a predetermined deformation by the CLG and / or NCL having a specific shape or a specific direction, it is easily detached from the photomask substrate 120 .

The material of the attachment member 115 may be an elastomer. Here, "elastomer" is defined in accordance with ASTM D1566, that is, "material that can be recovered from a large deformation and transformed into a state that is substantially insoluble (but capable of being swollen) ≪ / RTI > is meant any polymer or composition of the polymer. The elastomer may also be referred to as rubber, and in this specification the elastomer and rubber may be used in an equivalent sense.

Examples of the elastomer include, but are not limited to, polyamide elastomer, acrylate elastomer, styrene elastomer, polyolefin elastomer, polyoxyalkylene elastomer, polyester elastomer, epoxy elastomer, polyvinyl chloride elastomer, A copolymer of an elastomer, a fluorine-based elastomer, a polyurethane-based elastomer, a nitrile-based elastomer, an ethylene-propylene-diene monomer (EPDM) or a mixture thereof.

The polyamide-based elastomer may be at least one selected from the group consisting of polyethylene adipamide, polytetramethylene adipamide, polyhexamethylene adipamide, polyhexamethylene azelaamide, polyhexamethylene sebacamide, polyhexamethylene undecaamide, But are not limited to, polytetramethylene terephthalamide, polyhexamethylene dodecaamide, polyhexamethylene terephthalamide, polyhexamethylene isophthalamide, polononemethylene dodecaamide, polydecamethylene dodecaamide, polydodecamethylene dodecaamide, polymethylaylene adipamide, (3-methyl-4-aminocyclohexyl) methanedodecaamide, polynonamethylene terephthalamide, polydecamethylene terephthalamide, polydimethyleneterephthalamide, Methylene terephthalamide, polyundecamethylene terephthalamide, polydodecamethylene terephthalate Amides, or copolymers thereof.

The acrylate elastomer may be at least one selected from the group consisting of acrylonitrile, ethacrylonitrile, methacrylonitrile, alpha-chloroacrylonitrile, beta-chloroacrylonitrile, alpha-bromoacrylonitrile, (Meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, t- May be polymers or copolymers of ethylhexyl (meth) acrylate, iso-octyl acrylate, 6-methyloctyl acrylate, 7-methyloctyl acrylate, or 6-methylheptyl acrylate.

Examples of the styrene elastomer include styrene-butadiene (SB) block copolymer, styrene-ethylene / butadiene (SEB) block copolymer, styrene-isoprene (SI) block copolymer, styrene- Butadiene-styrene block copolymer (ABS), acrylonitrile-styrene-acrylate block copolymer (ASA), styrene-isoprene-styrene block copolymer (SIS) Butylene-styrene block copolymer (SIBS), styrene-ethylene / propylene-styrene block copolymer (SEPS), styrene-butadiene-styrene block copolymer (SBS), styrene homopolymer, -Methylstyrene block copolymer and? -Methylstyrene-isoprene-? -Methylstyrene block copolymer or a mixture thereof.

Examples of the polyolefin elastomer include polyolefins such as ethylene, propylene, 1-butene, 1-pentene, 3-methyl-1-butene, 1-hexene, 1-octene, 1-decene, 1-dodecene, 1-tetradecene, 1-hexadecene, 1-octadecene and 1-eicosene, cyclopentene, cycloheptene, norbornene, Tetradecyclododecene, and 2-methyl-1,4,5,8-dimethano-1,2,3,4,4a, 5,8,8a-octahydronaphthalene, butadiene, isoprene, 4 1,3-pentadiene, 1,4-pentadiene, 1,5-hexadiene, 1,4-hexadiene, 1,3-hexadiene, 1,3-octadiene, Diene, 1,4-octadiene, 1,5-octadiene, 1,6-octadiene, 1,7-octadiene, ethylidene norbornene, vinyl norbornene, dicyclopentadiene, 1,6-octadiene, 4-ethylidene-8-methyl-1,7-nonadiene, and 5,9-dimethyl-1,4,8-decatriene; And polymers or copolymers of 3-phenylpropene, 4-phenylpropene, 1,2-difluoroethylene, tetrafluoroethylene, or 3,3,3-trifluoro-1-propene .

The polyoxyalkylene elastomer may be, for example, polyoxymethylene, polyoxyethylene, polyoxypropylene, polyoxybutylene, polyoxytetramethylene, or a copolymer thereof.

Examples of the polyester elastomer include terephthalic acid, isophthalic acid, phthalic acid, naphthalene-2,6-dicarboxylic acid, naphthalene-2,7-dicarboxylic acid, anthracene dicarboxylic acid, diphenyl- Dicarboxylic acid, diphenoxyethane dicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 5-sulfoisophthalic acid, 3-sulfoisophthalic acid, 1,4-naphthalene dicarboxylic acid, 4 , 4'-biphenyldicarboxylic acid, 3,3'-biphenyldicarboxylic acid, 4,4'-methylene dibenzoic acid, 1,4-cyclohexanedicarboxylic acid, cyclopentanedicarboxylic acid, 4'-dicyclohexyldicarboxylic acid, adipic acid, succinic acid, oxalic acid, sebacic acid, dodecanedioic acid, and dimer acid; And aliphatic diols such as 1,4-butanediol, ethylene glycol, trimethylene glycol, pentamethylene glycol, hexamethylene glycol, neopentyl glycol, decamethylene glycol, 1,1-cyclohexanedimethanol, Bis (p-hydroxy) diphenyl propane, 2,2'-bis [4- (2-hydroxyethoxy) phenyl] propane, Bis [4- (2-hydroxyethoxy) phenyl] cyclohexane, 4,4'-dihydroxy-p-terphenyl , And 4,4'-dihydroxy-p-quaterphenyl. For example, polyethylene terephthalate, polyethylene naphthalate, polyglycolic acid, and the like.

The polyvinyl chloride elastomer may be, for example, polyvinylidene chloride.

Examples of the epoxy-based elastomer include bisphenol type epoxy resins such as bisphenol A type, bisphenol F type, bisphenol S type and water additives thereof; Novolak types such as phenol novolac type and cresol novolak type; Nitrogen-containing cyclic rings such as triglycidyl isocyanurate type and hydantoin type; Alicyclic type; Fat type; Aromatic types such as naphthalene type and biphenyl type; N, N, O-triglycidyl-m-aminophenol, N, N, O-triglycidyl- , N, N ', N'-tetraglycidyl-4,4'-methylenedianiline, N, N, N' -Methylenedianiline, N, N, N ', N'-tetraglycidyl-m-xylylenediamine, N, N-diglycidyl aniline, N, N-diglycidyl- Glycidyl amine type, glycidyl ether type, and glycidyl ester type; Dicyclopentane type such as dicyclopentadiene type; Ester type; Ether ester type, or a mixture thereof.

The silicone-based elastomer may be selected from, for example, polydimethylsiloxane, polydiethylsiloxane, polymethylethylsiloxane, polymethylphenylsiloxane, polydiphenylsiloxane, polyvinylsiloxane, dimethicone dimethicone / vinyl dimethicone crosspolymer, dimethicone / Dimethicone / vinyldimethicone crosspolymer, dimethicone crosspolymer, dimethicone copolyol crosspolymer, polysilicon, dimethicone / PEG crosspolymer, Dimethicone / polyglycerin crosspolymer, and the like.

The fluorine-based elastomer may be at least one selected from the group consisting of polytrifluoroethylene, polytetrafluoroethylene, polychlorotrifluoroethylene, polyhexafluoropropylene, polyfluorinated vinylidene, polyfluorinated vinyl, polyfluorinated ethylene propylene , Tetrafluoroethylene-ethylene copolymer polymer, vinylidene fluoride-hexafluoropropylene-tetrafluoroethylene terpolymer polymer, vinylidene fluoride rubber, tetrafluoroethylene-propylene rubber, tetrafluoroethylene-perfluoromethyl vinyl ether Rubber, phosphazene-based fluorine rubber, fluoropolyether, fluoronitrosomorph, perfluorotriazine, or copolymers thereof.

The EPDM elastomer may be, for example, a straight chain acyclic diene such as 1,4-hexadiene, 1,6-octadiene, 1,7-octadiene, 1,9-decadiene; Branched chain acyclic dienes such as 5-methyl-1,4-hexadiene, 3,7-dimethyl-1,6-octadiene, 3,7-dimethyl-1,7-octadiene and dihydro- Mixed isomers of oxycinene; Monocyclic alicyclic dienes such as 1,3-cyclopentadiene, 1,4-cyclohexadiene, 1,5-cyclooctadiene and 1,5-cyclododecadiene; And multicyclic alicyclic conjugated and bridged cyclic dienes such as tetrahydroindene, methyltetrahydroindene, 5-ethylidene-2-norbornene (ENB), 5-vinylidene-2-norbornene (VNB) Cyclopentadiene (DCPD), bicyclo- (2,2,1) -hepta-2,5-diene; Alkenyl; Alkylidene; Cycloalkenyl; And cycloalkylidene norbornenes such as 5-methylene-2-norbornene (MNB); Cyclopentenyl-2-norbornene, 5-cyclopentenyl-2-norbornene, 5- Vinyl-2-norbornene, and norbornadiene, and a copolymer of ethylene and propylene.

The nitrile elastomer may be, for example, a copolymer of a diene monomer and an unsaturated nitrile. The diene monomer may be any monomer comprising two conjugated or unconjugated carbon-carbon double bonds. In particular, any conjugated diene monomer having from 4 to 12 carbon atoms may be selected from the group consisting of isoprene, 1,3-butadiene, 2-methyl-1,3-butadiene, , 3-butadiene, 1-methylbutadiene, 2-methylbutadiene, 2,3-dimethyl-1,3-butadiene, 2,4- Pentadiene, 3-methyl-1,3-pentadiene, 2,3-dimethyl-1,3-pentadiene, dicyclopentadiene, 1,3-hexadiene, 1,4-hexadiene, 1,5-hexadiene, 2-methyl-1,5-hexadiene, 2-methyl- 1,3-hexadiene, 2,5-dimethyl-1,3-hexadiene, 3-methyl-1,3-hexadiene, Dimethyl-1,3-hexadiene, 2-neopentylbutadiene, 1,3-cyclopentadiene, 1,3-cyclohexadiene, 1-vinyl-1,3-cyclohexadiene, Dienes, 8-methyl-4-ethylidene-1,7-octadiene, 1,9-octadecadienes, vinylnorbornene, 5 Norbornene, norbornene, 5- (5-hexenyl) -2-norbornene, 1,2-heneicosadiene, and mixtures of these monomers ≪ / RTI >

The unsaturated nitrile may be, for example, acetonitrile, propionitrile, butyronitrile, isobutyronitrile, valeronitrile, isovaleronitrile, laurethonitrile, 2-methylbutyronitrile, trimethylacetonitrile, hexane But are not limited to, nitrile, cyclopentanecarbonitrile, cyclohexanecarbonitrile, acrylonitrile, methacrylonitrile, crotononitrile, 3-methylcrotononitrile, 2-pentenenitrile, 2-hexenenitrile, fluoroacetonitrile, difluoroacetonitrile, trifluoroacetonitrile, 2-fluoropropionitrile, 3-fluoropropion Nitrile, 2,2-difluoropropionitrile, 2,3-difluoropropionitrile, 3,3-difluoropropionitrile, 2,2,3-trifluoropropionitrile, 3,3-trifluoropropionitrile, 3,3'-oxydipropio A casting reel, 3,3'-thiodiethylene propionitrile, 1,2,3-tri-carbonitrile, 1,3,5-pentane-carbonitrile tree, pentafluoro-propionitrile; But are not limited to, malononitrile, succinonitrile, glutaronitrile, adiponitrile, pimelonitrile, suberonitrile, azelanitrile, sebaconitrile, undecaneditrile, dodecaneditrile, methylmalononitrile, ethylmalononitrile, iso Propyl malononitrile, tert-butyl malononitrile, methyl succinonitrile, 2,2-dimethyl succinonitrile, 2,3-dimethyl succinonitrile, 2,3,3-trimethyl suinonitrile, 3,3-dimethyl succinonitrile, 2,2-diethyl-3,3-dimethyl succinonitrile, bicyclohexyl-1,1- Dicarbonitrile, bicyclohexyl-2,2-dicarbonitrile, bicyclohexyl-3,3-dicarbonitrile, 2,5-dimethyl-2,5-hexanedicarbonitrile, 2,3-diisobutyl Dimethyl succinonitrile, 2,2-diisobutyl-3,3-dimethyl succinonitrile, 2-methylglutaronitrile, 2,3-dimethylglutaronitrile, 2,4- Nitrile, 2,2,3,3-tetra Trimethylglutaronitrile, 2,2,4,4-tetramethylglutaronitrile, 2,2,3,4-tetramethylglutaronitrile, 2,3,3,4-tetramethylglutaronitrile, maleore Dicyanohexane, 2,6-dicyanoquinoline, 1,6-dicyanononane, 1,6-dicyanodecane, 1,2- Dicyanobenzene, 1,3-dicyanobenzene, 3,3 '- (ethylene dioxy) dipropionitrile, 3,3' - (ethylene dithio) dipropionitrile , Cyclohexanetricarbonitrile, triscyanoethylamine, trisanoethoxypropane, tricyanoethylene, pentanetricarbonitrile, propane tricarbonitrile, or heptanetricarbonitrile.

Although the materials of the attachment member 115 are exemplified above, the present invention is not limited to these materials as they are illustrative rather than limiting.

Further, the elastomers constituting the attachment member 115 may have a number average molecular weight (Mn) of about 5000 to about 500,000 g / mol. Alternatively, the elastomers may have Mn of about 7000 to about 400,000 g / mol. The Mn may be a value measured by gel permeation chromatography using polystyrene as a standard.

7A to 7C are conceptual diagrams showing various modifications of the pores 115p.

Referring to FIG. 7A, when the characteristic diameter of the inlet of the pore 115p is d and the depth is H, the aspect ratio can be defined as H / d. In this embodiment, the characteristic diameter d of the inlet may be larger than the depth H of the pores 115p. Thus, in this case, the aspect ratio H / d may be less than one.

Further, the angle? Formed by the contact surface 115f in close contact with the photomask substrate 120 and the tangent at the entrance of the pores 115p may be greater than 90 degrees.

Referring to FIG. 7B, the characteristic diameter d 'of the inlet may be smaller than the depth H' of the pores 115p. Thus, in this case, the aspect ratio H '/ d' may be greater than one.

Further, the angle? 'Formed by the contact surface 115f in close contact with the photomask substrate 120 with the tangent at the entrance of the pores 115p may be smaller than 90 degrees.

7A and 7B, the aspect ratio may be smaller than 1 and the angle? May be smaller than 90 degrees. Conversely, if the aspect ratio is greater than 1 and θ is greater than 90 degrees,

Referring to FIG. 7, a nanopore 115s having a secondary structure may be further formed on the inner surface of the pores 115p forming the primary structure. The size of the pores 115p may be several to several hundreds of micrometers, and the size of the nanopores 115s may be several tens to several hundreds of nanometers.

If the nano pores 115s having the secondary structure are formed as described above, the suction cup effect due to the negative pressure can be obtained more strongly, so that the pellicle 110 can be more strongly attached to the photomask substrate 120 have.

8 is a partial perspective sectional view showing a pellicle 110a according to another embodiment of the present invention.

Referring to FIG. 8, the attachment member 115 may be formed in two rows on the first surface 111a of the pellicle frame 111. As shown in FIG. That is, the attaching member 115 includes a first attaching member 115a extending along the inner edge of the pellicle frame 111 and a second attaching member 115b located farther from the inner edge than the first attaching member 115a, And a second attachment member 115b extending along the attachment member 115a.

In other words, the first attachment member 115a may extend along the inner edge adjacent to the inner edge of the pellicle frame 111 and the second attachment member 115b may extend along the outer edge of the pellicle frame 111 And may extend along the outer edge.

The first attachment member 115a and the second attachment member 115b may be made of the same material or different materials.

When the first attachment member 115a and the second attachment member 115b are made of materials that are different from each other, the first attachment member 115a, which is relatively inwardly closer to the inside, may be made of a material having less outgassing . At this time, the second attachment member 115b, which is located relatively far from the inside, can be selected as a material having better adhesion than the first attachment member 115a.

For example, the first attachment member 115a may be a fluorine-based elastomer or a silicone-based elastomer, and the second attachment member 115b may be a polyurethane-based elastomer.

9 is a partial perspective sectional view showing a pellicle 110b according to another embodiment of the present invention.

9, the attachment member 115 includes a third attachment member 115c and a fourth attachment member 115d on the first surface 111a of the pellicle frame 111, (See arrows). In other words, a third attaching member 115c may be formed close to the first surface 111a, and a fourth attaching member 115d may be formed on the third attaching member 115c close to the first surface 111a.

The third attachment member 115c and the fourth attachment member 115d may be made of the same material or different materials.

When the third attaching member 115c and the fourth attaching member 115d are made of materials different from each other, the third attaching member 115c is harder than the fourth attaching member 115d hardness can be selected as the lower material.

By arranging the material having a lower hardness on the side in direct contact with the photomask substrate 120, it is possible to make the attachment member 115 better correspond to the incomplete flatness of the surface of the photomask substrate 120.

For example, the third attachment member 115c may be a fluorine-based elastomer or a styrene-based elastomer, and the fourth attachment member 115d may be a silicone-based elastomer.

FIGS. 10A and 10B are conceptual diagrams illustrating a method of attaching and detaching a pellicle 110 according to an embodiment of the present invention.

Referring to FIGS. 10A and 10B, the attaching member 115 may have a detachable auxiliary portion 115h. More specifically, as shown in FIG. 10A, after the desorption member 101 is inserted between the pellicle frame 111 and the photomask substrate 120, when a force is applied in a direction away from the pellicle frame 111, The part is raised by the lever principle. As a result, the pellicle frame 111 is also raised together with the rising end of the detachable member 101, and eventually it is separated from the photomask substrate 120.

If the detachable member 101 is made to act on only one side of the pellicle frame 111, the pellicle frame 111 may be slightly deformed, thereby damaging the pellicle membrane 113. Therefore, as shown in FIG. 10B, it is possible to provide a detachment auxiliary portion 115h at a plurality of positions. Further, the plurality of detachable auxiliary portions 115h may be arranged symmetrically with respect to the pellicle frame 111. [

10b, each of the detachable auxiliary portions 115h is symmetrical with respect to an imaginary line passing through the center of the pellicle frame 111. However, it may be arranged so as to form point symmetry with respect to the center of gravity of the pellicle frame 111 .

Referring to FIG. 10A, when a force is exerted on the detachable member 101, the pellicle frame 111 is slightly elevated and deforms the attachment member 115. At this time, the attaching member 115 adjacent to the detachable member 101 can be most deformed.

The deformation of the attaching member 115 is increased with the elevation of the pellicle frame 111 as an additional force is gradually applied to the detachable member 101. After a certain critical point, And may begin to separate from the photomask substrate 120. At this time, the position where the photomask substrate 120 starts to be separated from the photomask substrate 120 may be the position where the attachment member 115 is most deformed.

Once the attachment member 115 begins to separate from the photomask substrate 120, the separation propagates to a point adjacent to the attachment member 115 and finally the entire attachment member 115 is detached from the photomask substrate 120 .

11A and 11B are conceptual views illustrating a method of detaching pellicle 110 according to another embodiment of the present invention.

Referring to FIGS. 11A and 11B, it can be seen that the detachable auxiliary part 115j protrudes outwardly from the pellicle frame 111. FIG.

In addition, the desorption member 103 can be configured to exert a force on the protruding detachable auxiliary part 115j. For example, the detachable member 103 may have a tongue-like configuration to hold the protruding detachable auxiliary part 115j. However, the present invention is not limited to such a configuration.

The detachment auxiliary portion 115j may be disposed at a position similar to the detachment auxiliary portion 115h of Figs. 10A and 10B.

When the detachable member 103 directly exerts a force on the detachable auxiliary part 115j, the detachable auxiliary part 115j can be deformed around the detachable auxiliary part 115j formed of an elastomeric material. At this time, when the direction of the force applied to the detachment auxiliary part 115j is outwardly obliquely upward as shown in FIG. 11A, the outer edge of the part of the detachment auxiliary part 115j, which contacts the photomask substrate 120, It is likely to start to separate.

Subsequently, when a force is applied in the direction as shown in FIG. 11A, the separation propagates from the outer edge to an adjacent point, and finally the entire attachment member 115 is separated from the photomask substrate 120 .

The schemes shown in Figs. 10A, 10B, 11A and 11B can be used in combination with each other.

12 is a flowchart showing a method (A) for attaching the pellicle 110 to the photomask substrate 120 and a method (D) for attaching and detaching the pellicle 110 to the photomask substrate 120. FIG. 13A to 13C are side cross-sectional views sequentially showing a method of attaching the pellicle 110 to the photomask substrate 120. FIG.

12 and 13A, a photomask substrate 120 having a pellicle region is prepared (SA100). A pellicle 110 to be coupled to the pellicle region of the photomask substrate 120 is also prepared (SA200). Since the pellicle 110 and the photomask substrate 120 have been described in detail above, further explanation is omitted here.

The step of preparing the photomask substrate 120 and the step of preparing the pellicle 110 do not need to be particularly related to each other and can be performed at the same time. In addition, the pellicle 110 can be moved to a suitable position on the photomask substrate 120.

Referring to FIGS. 12 and 13B, the pellicle 110 may be disposed at an attachment position of the photomask substrate 120 so as to surround the pellicle region (SA300).

Referring to FIGS. 12 and 13C, the pellicle 110 and the photomask substrate 120 can be brought into close contact with each other by applying pressure on the pellicle 110 (SA400). 13C, the pressure is applied in the direction from the pellicle 110 toward the photomask substrate 120, but it is also possible to apply pressure in the opposite direction. In particular, unlike the conventional method of bonding a pellicle and a photomask substrate using an adhesive, there is no need to apply heat.

This pressure application causes deformation of the attachment member 115 as shown in Fig. 13C.

Then, when the pressure is released, the attachment member 115 is restored to its original shape, whereby the attachment member 115 and the photomask substrate 120 are attached to each other (SA500). The principle that the attachment member 115 and the photomask substrate 120 are attached to each other due to the deformation and restoration has been described in detail above, and a further explanation will be omitted here.

As described above, the photomask having the pellicle can be charged in the exposure equipment and used for the exposure process. This will be described later in more detail.

When the pellicle needs to be replaced, it is necessary to separate the pellicle from the photomask substrate. Hereinafter, the pellicle detachment method will be described.

The photomask containing the pellicle is assumed to include a photomask substrate and a pellicle attached to the pellicle region thereon as shown in FIG. 13C. In particular, it is assumed that the pellicle includes a pellicle frame, an attachment member formed on one side of the pellicle frame, a pellicle membrane formed on the other side of the pellicle frame, and a detachment auxiliary portion for detachably attaching the attachment member from the photomask substrate.

12 and 10B, it is possible to insert a detachment member 101 into the detachable auxiliary part 115h and apply a force in a direction away from the pellicle frame 111 (SD100). Then, as described with reference to Figs. 10A and 10B, the pellicle frame 111 and the attaching member 115 at the portion adjacent to the detachable auxiliary portion 115h begin to be slightly deformed.

Also, as the deformation is developed, the attachment member 115 also starts to be detached from the photomask substrate 120. 14 is a side view showing the moment when the photomask substrate 120 begins to rise by the end of the detachable member 101 while the attachment member 115 starts to be detached from the photomask substrate 120 to be.

12 and 14, the pellicle frame 111 can be raised in the direction away from the photomask substrate 120 by the end of the detachable member 101 (SD200). As a result, the shape of the attachment member 115 can be changed compared to when the shape of the attachment member 115 is attached.

When the force is continuously applied to the detachable member 101, the pellicle frame 111 can be continuously raised by the distal end of the detachable member 101. Finally, the pellicle frame 111 is detached from the photomask substrate 120 So that it can be desorbed.

In the prior art in which the pellicle 110 and the photomask substrate 120 are bonded using an adhesive, it is necessary to apply heat to separate them, but in the present invention, it is not necessary to apply heat. In addition, in the prior art, residues of the adhesive remained on the photomask substrate 120, and chemicals such as sulfuric acid had to be used to remove them. However, these chemicals could damage patterns on the photomask substrate 120.

However, in the present invention, the pellicle 110 is not attached to the photomask substrate 120 by the adhesive, and the problem is solved because the pellicle 110 can be easily attached and detached without leaving any residue.

In addition, the pellicle 110 thus separated can be recycled. In other words, the pellicle separated from the photomask substrate can be attached and used on a new photomask substrate. Therefore, the cost of manufacturing the pellicle can be greatly reduced.

Fig. 15 is a schematic structural view schematically showing an embodiment of a projection exposure apparatus using the exposure mask R of the present invention. Fig. The projection exposure apparatus shown in Fig. 15 is provided with a wafer stage (hereinafter, simply referred to as " substrate W ") on which a substrate 8 on which a photosensitive agent 7 placed on a surface 3a 3), an illumination optical system 1 for irradiating vacuum ultraviolet light of a wavelength prepared as exposure light and transferring a prepared pattern (exposure mask R) onto the substrate W, A first surface P1 (an object surface) on which an exposure mask R for projecting a pattern image of an exposure mask R is disposed on a substrate W, and a second surface P1 And a projection optical system 5 placed between a second surface (image plane) where the surfaces are matched. The illumination optical system 1 also includes an alignment optical system 510 for adjusting the relative position between the exposure mask R and the wafer W. The exposure mask R is disposed on the surface of the wafer stage 3 Which is movable in parallel with respect to the stage 2. The reticle exchange system 200 exchanges and transfers the exposure mask R set on the stage 2. The reticle exchange system 200 may include a stage driver for moving the stage 2 parallel to the surface 3a of the wafer stage 3. [ The projection optical system 5 has an alignment optical system applied to a scanning type exposure apparatus.

In this exposure apparatus, a pellicle or an exposure mask according to embodiments of the present invention can be used.

16 is a view for explaining an extreme ultraviolet lithography equipment according to an embodiment of the present invention.

Referring to FIG. 16, the extreme ultraviolet lithography equipment according to an embodiment of the present invention includes a source 500a for providing extreme ultraviolet (EUV) light for exposure as exposure light. A slit 40 for limiting the size of exposure light is introduced onto a reflective mask R on which a circuit pattern to be transferred onto the wafer W is realized as a mask pattern, To the surface of the mask R. The incident exposure light is reflected from the surface of the mask R and reflected from the mask R through the slit portion 40 with the image of the mask pattern.

A plurality of reflective lenses 50 are combined to provide a lens system so as to provide a light path so that the reflected exposure light reaches the wafer W. [ At this time, the reflection type lens 50 may be combined in four ways to provide a light path for transmitting the reflected exposure light having the pattern image on the wafer W. [

On the other hand, the mask R is mounted on the mask stage 60. At this time, the mask stage 60 may include a cooling unit for cooling the mounted mask R by a Peltier effect.

Referring again to FIG. 16, an extreme ultraviolet lithography apparatus further includes a lens cooling unit 700 attached to the rear of the reflective lens 50 forming an optical system to cool the lens 50 by a Peltier effect .

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. The present invention may be modified in various ways. Therefore, modifications of the embodiments of the present invention will not depart from the scope of the present invention.

The present invention can be usefully used in the semiconductor industry.

100: Photomask 101, 103: Desorption member
110: Pellicle 111: Pellicle frame
113: Pellicle membrane 115: Attachment member
115a: first attachment member 115b: second attachment member
115c: third attachment member 115d: fourth attachment member
115f: close contact surface 115h, 115j:
115p: Pore 115s: Nano pore
117: adhesive layer 120: photomask substrate

Claims (20)

A pellicle frame that can be attached onto the photomask substrate;
An attaching element formed on one surface of the pellicle frame facing the photomask substrate; And
A pellicle membrane formed on the other surface of the pellicle frame;
Lt; / RTI >
Wherein the attaching member has a primary structure capable of generating negative pressure on a surface facing the photomask substrate. The method according to claim 1,
Wherein the attachment member is an elastomer. 3. The method of claim 2,
The attachment member may be formed of any one of a polyamide elastomer, an acrylate elastomer, a styrene elastomer, a polyolefin elastomer, a polyoxyalkylene elastomer, a polyester elastomer, an epoxy elastomer, a polyvinyl chloride elastomer, a silicone elastomer, A polyurethane elastomer, a copolymer of an ethylene-propylene-diene monomer (EPDM), or a mixture thereof. The method according to claim 1,
Wherein the primary structure of the attachment member is a pore having an opening diameter of from about 0.1 占 퐉 to about 500 占 퐉. 5. The method of claim 4,
Wherein the primary structure of the attachment member is irregularly arranged on the surface of the photomask substrate facing the photomask substrate. 5. The method of claim 4,
Wherein the primary structure of the attaching member is regularly arranged on a surface of the attaching member facing the photomask substrate. The method according to claim 6,
Wherein the openings of the primary structure are arranged in a lattice form. The method according to claim 1,
Wherein the primary structure of the attachment member further comprises a secondary structure recessed from an inner surface thereof. The method according to claim 1,
Further comprising a detachment auxiliary portion for detachably attaching the attachment member from the photomask substrate to at least one side of the attachment member. 10. The method of claim 9,
And the detachable auxiliary portion includes a recess into which the detachable member can be inserted. The method according to claim 1,
Wherein the attachment member comprises:
A first attachment member extending along an inner edge of the pellicle frame; And
A second attachment member located further from the inner edge of the pellicle frame than the first attachment member and extending along the first attachment member;
≪ / RTI > 12. The method of claim 11,
Wherein the first attachment member and the second attachment member are materials different from each other. The method according to claim 1,
Wherein the attachment member is formed by stacking two or more different materials in the attachment direction of the pellicle. 14. The method of claim 13,
The attachment member includes a third attachment member disposed closer to the pellicle frame side and a fourth attachment member spaced apart from the pellicle frame,
Wherein a hardness of the fourth attachment member is smaller than that of the third attachment member. The method according to claim 1,
Wherein the pellicle is for deep UV exposure or EUV (extreme UV) exposure. A photomask substrate having a pellicle region; And
A pellicle attached to the photomask substrate to surround the pellicle region;
A photomask comprising:
Wherein the pellicle includes a pellicle frame, an attachment member formed on one surface of the pellicle frame, and a pellicle membrane formed on the other surface of the pellicle frame,
Wherein the attaching member is detachably attached to the photomask substrate. 17. The method of claim 16,
Wherein the attaching member has a primary structure capable of generating negative pressure on a surface facing the photomask substrate. 18. The method of claim 17,
Wherein the attaching member is detachable from the photomask substrate and then reattachable to the photomask substrate. Preparing a photomask substrate having a pellicle region;
Preparing a pellicle comprising a pellicle frame, an attachment member formed on one surface of the pellicle frame, and a pellicle membrane formed on the other surface of the pellicle frame;
Disposing a pellicle at an attachment position of the photomask substrate so as to surround the pellicle region;
Applying pressure on the pellicle to bring the pellicle and the photomask substrate into close contact with each other; And
Removing the pressure;
A method of attaching a pellicle comprising:
Wherein the mounting member is deformed by the pressure and is restored by removing the pressure, so that a negative pressure is formed between the mounting member and the photomask substrate. Preparing a photomask comprising a photomask substrate having a pellicle region and a pellicle attached to the photomask substrate so as to surround the pellicle region, wherein the pellicle includes a pellicle frame, a mounting member formed on one surface of the pellicle frame, Preparing a photomask including a pellicle membrane formed on the other surface of the pellicle frame and a detachment auxiliary portion for detaching the attachment member from the photomask substrate;
Deforming the attachment member by applying a force to the detachment auxiliary portion; And
A step of raising the detachable auxiliary part from the photomask substrate to be detached from the attaching member adjacent to the detachable auxiliary part;
/ RTI >

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